CN109553309B - Laminated glass for building and preparation method thereof - Google Patents
Laminated glass for building and preparation method thereof Download PDFInfo
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- CN109553309B CN109553309B CN201910007399.9A CN201910007399A CN109553309B CN 109553309 B CN109553309 B CN 109553309B CN 201910007399 A CN201910007399 A CN 201910007399A CN 109553309 B CN109553309 B CN 109553309B
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- 239000005340 laminated glass Substances 0.000 title claims abstract description 38
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000010410 layer Substances 0.000 claims abstract description 208
- 239000011521 glass Substances 0.000 claims abstract description 181
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 123
- 239000002131 composite material Substances 0.000 claims abstract description 75
- 239000011229 interlayer Substances 0.000 claims abstract description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- 239000011241 protective layer Substances 0.000 claims description 27
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 16
- 238000010276 construction Methods 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 11
- 238000007747 plating Methods 0.000 claims description 10
- 238000005507 spraying Methods 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 13
- 238000001755 magnetron sputter deposition Methods 0.000 description 9
- 229910020286 SiOxNy Inorganic materials 0.000 description 6
- 230000003667 anti-reflective effect Effects 0.000 description 6
- 229910052681 coesite Inorganic materials 0.000 description 6
- 229910052906 cristobalite Inorganic materials 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 230000002209 hydrophobic effect Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000001579 optical reflectometry Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 229910052682 stishovite Inorganic materials 0.000 description 6
- 229910052905 tridymite Inorganic materials 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000010702 perfluoropolyether Substances 0.000 description 4
- 239000010955 niobium Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 description 2
- FNUBKINEQIEODM-UHFFFAOYSA-N 3,3,4,4,5,5,5-heptafluoropentanal Chemical compound FC(F)(F)C(F)(F)C(F)(F)CC=O FNUBKINEQIEODM-UHFFFAOYSA-N 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229920001059 synthetic polymer Polymers 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000007688 edging Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000005543 nano-size silicon particle Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000012946 outsourcing Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C27/00—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
- C03C27/06—Joining glass to glass by processes other than fusing
- C03C27/10—Joining glass to glass by processes other than fusing with the aid of adhesive specially adapted for that purpose
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Abstract
The invention discloses a laminated glass for a building, which comprises a first high-alumina glass raw sheet, a second high-alumina glass raw sheet and an interlayer positioned between the first high-alumina glass raw sheet and the second high-alumina glass raw sheet, wherein a first antireflection composite medium layer and a first top protection layer are sequentially formed on the surface of the first high-alumina glass raw sheet far away from the second high-alumina glass raw sheet, a second antireflection composite medium layer and a second top protection layer are sequentially formed on the surface of the second high-alumina glass raw sheet far away from the first high-alumina glass raw sheet, and the first antireflection composite medium layer and the second antireflection composite medium layer respectively comprise at least four refractive index layers. The invention also discloses a preparation method of the laminated glass for the building. The laminated glass for building has the advantages of thin thickness, good optical performance and high strength.
Description
Technical Field
The invention relates to the field of glass preparation, in particular to laminated glass for buildings and a preparation method thereof.
Background
Light is reflected at the interface between the two media, and when the light is perpendicularly irradiated to the surface of the uncoated glass, the reflected light accounts for about 8% of the incident light. In many applications of optical elements, the reflection of the surface not only affects the light passing energy of the optical element, but the reflected light also creates stray light in the instrument, which affects the imaging quality of the optical instrument. In order to solve these problems, a single-layer or multi-layer optical adjustment film is generally coated on the surface of an optical element to reduce the reflected light on the surface of the element, and such an optical adjustment film is an antireflection film (antireflection film).
The main function of the antireflection film is to reduce or eliminate reflected light from the surfaces of the optical elements, thereby increasing the light transmission of these elements.
The common glass has higher reflection coefficient, and can generate a reflection phenomenon under the irradiation of sunlight, so that people cannot see objects behind the glass clearly. In order to reduce reflection, enhance visual effect, reduce reflection coefficient of glass surface, ensure good transmittance of glass in sunlight, and the anti-reflection glass coated with anti-reflection film on common glass is appeared.
Most of the prior anti-reflection films are plated on the common float glass raw sheet by adopting a single-sheet coating structure. The existing processing method of large-area anti-reflection coated glass is usually PECVD or sol-gel method, and the anti-reflection composite dielectric layer deposited on the surface of the glass is usually made of porous nano silicon material, such as patent CN105440742A, CN 101885586B. However, when coated glass is required to have good optical and mechanical properties, the total film thickness is generally relatively thick and the production efficiency is low.
Disclosure of Invention
Based on this, an object of the present invention is to provide a laminated glass for construction and a method for producing the same.
The utility model provides a laminated glass for building, it includes first high alumina glass former piece, the former piece of second high alumina glass and is located the intermediate layer between this first high alumina glass former piece and this second high alumina glass former piece, be formed with first antireflection composite medium layer and first top protective layer on the surface that this first high alumina glass former piece kept away from this second high alumina glass former piece in proper order, be formed with second antireflection composite medium layer and second top protective layer on the surface that this second high alumina glass former piece kept away from this first high alumina glass former piece in proper order, this first antireflection composite medium layer and this second antireflection composite medium layer include at least four-layer refracting index layers respectively.
The first anti-reflection composite medium layer comprises a first refractive index layer, a second refractive index layer and/or a third refractive index layer with different refractive indexes.
In the direction that the first high alumina glass raw sheet is far away from the second high alumina glass raw sheet, the first anti-reflection composite dielectric layer sequentially comprises a niobium pentoxide layer, a silicon dioxide layer, a niobium pentoxide layer, a silicon dioxide layer and a silicon nitride layer.
In the direction that the first high alumina glass raw sheet is far away from the second high alumina glass raw sheet, the first anti-reflection composite dielectric layer sequentially comprises a silicon oxynitride layer, niobium pentoxide, a silicon dioxide layer and a silicon nitride layer.
In the direction that the first high alumina glass raw sheet is far away from the second high alumina glass raw sheet, the first anti-reflection composite dielectric layer sequentially comprises a silicon nitride layer, a silicon oxide layer, a silicon nitride layer, a silicon oxide layer and a silicon nitride layer.
In the direction that the first high alumina glass raw sheet is far away from the second high alumina glass raw sheet, the first anti-reflection composite dielectric layer sequentially comprises a silicon oxynitride layer, silicon nitride, a silicon dioxide layer and a silicon nitride layer.
The thickness of the first anti-reflection composite dielectric layer is 200 nm-270 nm.
The thickness of the first high alumina glass raw sheet or the second high alumina glass raw sheet is 1-15 mm.
The second anti-reflection composite dielectric layer has the same structure as the first anti-reflection composite dielectric layer.
A method for preparing laminated glass for construction, comprising the steps of: cleaning a high-alumina glass raw sheet; plating a bottom dielectric layer on the surface of the high-alumina glass raw sheet by using an intermediate frequency alternating current power supply and a rotating cathode; plating an anti-reflection composite dielectric layer on the bottom dielectric layer by using an intermediate frequency alternating current power supply and a rotating cathode, wherein the anti-reflection composite dielectric layer comprises at least four refractive index layers; spraying a top protective layer on the anti-reflection composite dielectric layer to form anti-reflection coated glass; and (3) carrying out interlayer treatment on the anti-reflection coated glass.
The matching structure of each layer in the laminated glass for the building enables the laminated glass film to be thinner, not only has excellent optical performance, but also has extremely high mechanical performance and antifouling performance, and can be better applied to the fields of building window wall glass and indoor decorative glass.
Drawings
FIG. 1 is a schematic cross-sectional view of a laminated glass for construction according to an embodiment of the present invention.
Fig. 2 is an enlarged schematic view of the first anti-reflective composite dielectric layer of fig. 1.
FIG. 3 is an enlarged schematic view of a first anti-reflective composite dielectric layer according to another embodiment of the present invention.
Fig. 4 is a schematic cross-sectional view of a laminated glass for construction according to another embodiment of the present invention.
Detailed Description
The present invention is described more fully below in order to facilitate an understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Referring to fig. 1, a schematic cross-sectional view of a laminated glass for construction according to an embodiment of the present invention is shown. The laminated glass 10 for construction comprises an interlayer 11, a first raw sheet of high alumina glass 12, a second raw sheet of high alumina glass 13, a first bottom dielectric layer 14, a second bottom dielectric layer 15, a first anti-reflection composite dielectric layer 16, a second anti-reflection composite dielectric layer 17, a first top protective layer 18 and a second top protective layer 19. Wherein the interlayer 11 is located between a first raw high alumina glass sheet 12 and a second raw high alumina glass sheet 13. The first bottom dielectric layer 14, the first anti-reflection composite dielectric layer 16 and the first top protective layer 18 are sequentially formed on the surface of the first raw high-alumina glass sheet 12 far away from the second raw high-alumina glass sheet 13; a second bottom dielectric layer 15, a second anti-reflective composite dielectric layer 17 and a second top protective layer 19 are formed in sequence on the surface of the second raw high alumina glass sheet 13 remote from the first raw high alumina glass sheet 12.
In particular, in this embodiment, the interlayer 11 may be made of high-transmission polyvinyl butyral (PVB) and may have a thickness of 0.38 to 1.52 mm.
The thickness of the first raw high alumina glass sheet 12 or the second raw high alumina glass sheet 13 may be 1 to 15 millimeters (mm), for example, 1.6mm, 2mm, 3mm, 4mm,5mm,6mm,8mm,10mm; its maximum size is 2440mm by 3660mm, for example.
The first top protective layer 18 and the second top protective layer 19 are made of hydrophobic materials, and can be used for fingerprint prevention or stain prevention; the material can be prepared by taking synthetic polymer of perfluoropolyether (PFPE) as a main material and taking mixed solution of methyl-nonafluorobutyl ether and ethyl-nonafluorobutyl ether as a diluent. The water drop angle of the first top protective layer 18 or the second top protective layer 19 may be greater than or equal to 110 °.
The thickness of the first or second anti-reflection composite dielectric layer 16 or 17 may be 100 nanometers (nm) to 500 nm, preferably 200 nm to 270 nm. The first or second anti-reflective composite dielectric layer 16 or 17 may comprise at least four refractive index layers, for example at least four refractive index layers comprising first, second and/or third refractive index layers of different refractive index. The refractive index of the first refractive index layer is maximum, the refractive index of the third refractive index layer is minimum, and the refractive index of the second refractive index layer is centered; wherein the refractive index of the first refractive index layer is between 2.0 and 2.5, which may be formed of silicon nitride (Si 3N4), niobium pentoxide (Nb 2O5), or titanium dioxide (TiO 2); the second refractive index layer has a refractive index of between 1.77 and 1.9, and may be formed of silicon oxynitride (SiOxNy), wherein x/y ranges between 2/10 and 3/10; the third refractive index layer has a refractive index of 1.47 to 1.53, and may be formed of silicon dioxide (SiO 2).
Referring to fig. 2, taking the first anti-reflection composite dielectric layer 16 as an example, in a direction that the first raw high-alumina glass sheet 12 is away from the second raw high-alumina glass sheet 13, the first anti-reflection composite dielectric layer 16 includes a second refractive index layer 162, a first refractive index layer 161, a third refractive index layer 163, and a first refractive index layer 161 in sequence. Referring to fig. 3, in the first anti-reflection composite dielectric layer 26 of the other embodiment, in the direction that the first raw high-alumina glass sheet is far away from the second raw high-alumina glass sheet, the first anti-reflection composite dielectric layer 26 sequentially includes a first refractive index layer 261, a third refractive index layer 263, a first refractive index layer 261, a third refractive index layer 263 and a first refractive index layer 261.
The laminated glass 10 for construction comprises an interlayer, a bottom dielectric layer, an anti-reflection composite dielectric layer and a top protective layer, wherein the bottom dielectric layer can improve the connection strength between a glass original sheet and the anti-reflection composite dielectric layer and the subsequent processability of the laminated glass 10 for construction; the anti-reflection composite medium layer can apply the optical interference reflection principle, so that the visible light reflectivity of the single piece of coated glass and the high-alumina glass after being sandwiched is less than or equal to 5 percent, the visible light reflectivity of the two pieces of coated glass after being sandwiched is less than or equal to 1 percent, and the appearance of the single piece of coated glass and the high-alumina glass after being sandwiched is natural neutral; the top protection layer not only can protect the surface of the coated glass from being polluted and cleaned easily, but also can prevent the coated layer from being scratched, chemically corroded and the like, and ensures the integrity of the product in the transportation, installation and use processes. The matching structure of each layer in the laminated glass 10 for the building enables the laminated glass film to be thinner, not only has excellent optical performance, but also has extremely high mechanical performance and antifouling performance, and can be better applied to the fields of building window wall glass and indoor decorative glass.
Referring to fig. 4, a schematic cross-sectional view of a laminated glass for construction according to another embodiment of the present invention is shown. The laminated glass 30 for construction is similar to the laminated glass 10 for construction and includes a interlayer 31, a first raw sheet of high alumina glass 32, a second raw sheet of high alumina glass 33, a first bottom dielectric layer 34, a first anti-reflective composite dielectric layer 36, and a first top protective layer 38. Wherein the interlayer 31 is located between a first raw high alumina glass sheet 32 and a second raw high alumina glass sheet 33. A first bottom dielectric layer 34, a first anti-reflective composite dielectric layer 36, and a first top protective layer 38 are formed in sequence on the surface of the first raw high alumina glass sheet 32 remote from the second raw high alumina glass sheet 33.
Furthermore, it is understood that when the refractive index layer closest to the high alumina glass precursor in the anti-reflection composite dielectric layer is formed of SiOxNy or SiO 2, the bottom dielectric layer may also be omitted.
The invention also provides a preparation method of the laminated glass for the building, which can comprise the following steps.
First, the high alumina glass raw sheet is cleaned. The high-alumina glass raw sheet can be cleaned and polished by a large-scale automatic cleaning and polishing machine after being loaded by an automatic loading table.
Then, a bottom dielectric layer is plated on the surface of the high alumina glass raw sheet by using an intermediate frequency alternating current power supply and a rotating cathode. After the cleaned high-alumina glass raw sheet is dried, a bottom dielectric layer can be plated on the surface of the high-alumina glass raw sheet by using an intermediate frequency alternating current power supply and a rotating cathode, wherein the background vacuum degree of the magnetron sputtering coating equipment can be required to be more than 10 -6～10-7 mbar, and the vacuum degree of the sputtering process can be required to be between 3 and 8 x 10 -3 mbar.
Then, an intermediate frequency alternating current power supply and a rotating cathode are used for plating an anti-reflection composite dielectric layer on the bottom dielectric layer. An anti-reflection composite dielectric layer is plated above the bottom dielectric layer, the anti-reflection composite dielectric layer can have larger adhesive force, the background vacuum degree of the magnetron sputtering coating equipment during plating can be required to be above 10 -6～10-7 mbar, and the vacuum degree of the sputtering process can be required to be between 3 and 8 x 10 -3 mbar. The first refractive index layer, the second refractive index layer and/or the third refractive index layer with different refractive indexes in the anti-reflection composite dielectric layer can be formed by respectively plating different targets in sequence.
And then spraying a top protective layer on the anti-reflection composite dielectric layer to form the anti-reflection coated glass. The top protective layer may be formed using a spray coating process. Specifically, the spraying material can be prepared by taking synthetic polymer of perfluoropolyether (PFPE) as a main material and taking mixed solution of methyl-nonafluorobutyl ether and ethyl-nonafluorobutyl ether as a diluent; when spraying, the spraying distance can be 200-300 mm, the running speed of the spray gun or glass can be 400-500 mm/s, and the spraying coincidence rate is kept at 20% -30%. According to the time requirement of the subsequent interlayer process, the anti-reflection coated glass sprayed with the top protection layer, which is subjected to the interlayer process after more than 48 hours, can be subjected to interlayer process within 48 hours without heating and curing the top protection layer, and the top protection layer is required to be cured by heating for 20-30 minutes at 120-150 ℃.
Then, the antireflection coated glass is cut. In this step, the anti-reflection coated glass may be cut or edging according to the subsequent product requirements.
Finally, the anti-reflection coated glass is subjected to interlayer treatment. In the step, two types of structures of high-alumina glass raw sheet, interlayer, antireflection coated glass and antireflection coated glass, interlayer and antireflection coated glass can be formed according to the requirements of subsequent products. Wherein the visible light reflectivity of the laminated glass of the high-alumina glass raw sheet/interlayer/antireflection film-coated glass structure can be less than or equal to 5%; the visible light reflectivity of the laminated glass of the antireflection coated glass/interlayer/antireflection coated glass structure can be less than or equal to 1%.
The preparation method of the laminated glass for the building adopts a magnetron sputtering off-line film plating process mode, various inorganic materials with different thicknesses are plated on the surface of the high-alumina glass, a hydrophobic film layer is coated on the surface of the glass, and an optical interference reflection principle is applied, so that the visible light reflectivity of the laminated glass of a single piece of coated glass and the original laminated glass of the high-alumina glass is less than or equal to 5 percent, the visible light reflectivity of the laminated glass of the two pieces of coated glass is less than or equal to 1 percent, and the appearance of the laminated glass of the single piece of coated glass is natural neutral. The thickness of the film layer is nano-scale, and the film layer structure does not contain noble metals such as Ag, au and the like, so that the production cost is greatly reduced. Furthermore, because the large-scale magnetron sputtering coating equipment is adopted, the large-scale magnetron sputtering coating equipment can be produced in large-area and large-size batch. In addition, the anti-reflection coated glass prepared by the method has good processing resistance and weather resistance, can realize the subsequent processing of a product outsourcing factory, drives the whole glass deep processing enterprise, and can be further integrated and improve the production efficiency and reduce the cost.
Example 1
A20 nm bottom SiO 2 bottom dielectric layer is plated on a 3mm high-alumina glass original sheet, then Nb 2O5/SiO2/Nb2O5/SiO2/Si3N4 is plated in sequence to form an antireflection composite dielectric layer, the total thickness is 235nm, and the thickness of each refractive index layer is 12.5/33/117.5/67/5nm in sequence. The sputtering dynamic deposition rate of each refractive index layer is 2.8nm (m/min)/KW-4.5 nm (m/min)/KW; the vacuum degree of the magnetron sputtering is 3×10 -3mbar～8*10-3 mbar.
After the anti-reflection composite dielectric layer is sprayed with the hydrophobic top protective layer, the glass is kept in a heating furnace at 150 ℃ for 25min.
And (3) respectively carrying out interlayer treatment on the high-alumina glass plated with the antireflection film and the high-alumina glass raw sheet with the same thickness and the high-alumina antireflection coated glass with the same thickness, wherein the film adopts high-transmittance PVB with the thickness of 0.38mm.
After the product is manufactured, the high-alumina glass raw sheet/film/high-alumina antireflection coated glass forms a single-sheet coated glass sandwich structure, the high-alumina antireflection coated glass/film/high-alumina antireflection coated glass forms a double-sheet coated glass sandwich structure, and the visible light reflection and transmission properties of the sandwich glass with the two structures are shown in the following table.
Example 2
SiOxNy/Nb 2O5/SiO2/Si3N4 is plated on a 3mm high-alumina glass raw sheet in sequence to form an antireflection composite dielectric layer, the total thickness is 204.6nm, and the thickness of each refractive index layer is 92.5/24.3/82.8/5nm in sequence. The sputtering dynamic deposition rate of each refractive index layer is 2.8nm (m/min)/KW-4.5 nm (m/min)/KW; the vacuum degree of the magnetron sputtering is 3 x 10 -3mbar～8*10-3 mbar, and the flow rate ratio of the reaction gas O 2/N2 for plating the SiOxNy layer is 2.5/10.
After the anti-reflection composite dielectric layer is sprayed with the hydrophobic top protective layer, the glass is kept in a heating furnace at 150 ℃ for 25min.
And (3) respectively carrying out interlayer treatment on the high-alumina glass plated with the antireflection film and the high-alumina glass raw sheet with the same thickness and the high-alumina antireflection coated glass with the same thickness, wherein the film is selected as high-permeability PVB, and the thickness is 0.38mm.
After the product is manufactured, the high-alumina glass raw sheet/film/high-alumina antireflection coated glass forms a single-sheet coated glass sandwich structure, the high-alumina antireflection coated glass/film/high-alumina antireflection coated glass forms a double-sheet coated glass sandwich structure, and the visible light reflection and transmission properties of the sandwich glass with the two structures are shown in the following table.
Example 3
A20 nm bottom SiO 2 dielectric layer is plated on a 6mm high-alumina glass raw sheet, then Si 3N4/SiO2/Si3N4/SiO2/Si3N4 is plated in sequence to form an antireflection composite dielectric layer, the total thickness is 233.1nm, and the thickness of each refractive index layer is 14.3/30/118.8/64/6nm in sequence. The sputtering dynamic deposition rate of each refractive index layer is 2.8nm (m/min)/KW-4.5 nm (m/min)/KW; the vacuum degree of the magnetron sputtering is 3×10 -3mbar～8*10-3 mbar.
After the anti-reflection composite dielectric layer is sprayed with the hydrophobic top protective layer, the glass is kept in a heating furnace at 150 ℃ for 25min.
And (3) respectively carrying out interlayer treatment on the high-alumina glass plated with the antireflection film and the high-alumina glass raw sheet with the same thickness and the high-alumina antireflection coated glass with the same thickness, wherein the film is selected as high-permeability PVB, and the thickness is 0.76mm.
After the product is manufactured, the high-alumina glass raw sheet/film/high-alumina antireflection coated glass forms a single-sheet coated glass sandwich structure, the high-alumina antireflection coated glass/film/high-alumina antireflection coated glass forms a double-sheet coated glass sandwich structure, and the visible light reflection and transmission properties of the sandwich glass with the two structures are shown in the following table.
Example 4
SiOxNy/Si 3N4/SiO2/Si3N4 is plated on the 6mm high alumina glass raw sheet in turn to form an antireflection composite dielectric layer, the total thickness is 209.8nm, and the thickness of each refractive index layer is 95/20/88.8/6nm in turn. The sputtering dynamic deposition rate of each refractive index layer is 2.8nm (m/min)/KW-4.5 nm (m/min)/KW; the vacuum degree of the magnetron sputtering is 3 x 10 -3mbar～8*10-3 mbar, and the flow rate ratio of the reaction gas O 2/N2 for plating the SiOxNy layer is 3/10.
After the anti-reflection composite dielectric layer is sprayed with the hydrophobic top protective layer, the glass is kept in a heating furnace at 150 ℃ for 25min.
And (3) respectively sandwiching the high-alumina glass plated with the antireflection film with the same thickness of the high-alumina glass raw sheet and the same thickness of the high-alumina antireflection coated glass, wherein the film is selected as high-transmittance pvc with the thickness of 0.76mm.
After the product is manufactured, the high-alumina glass raw sheet/film/high-alumina antireflection coated glass forms a single-sheet coated glass sandwich structure, the high-alumina antireflection coated glass/film/high-alumina antireflection coated glass forms a double-sheet coated glass sandwich structure, and the visible light reflection and transmission properties of the sandwich glass with the two structures are shown in the following table.
The present invention is not limited to the above-mentioned embodiments, but is intended to be limited to the following embodiments, and any modifications, equivalent changes and variations in the above-mentioned embodiments can be made by those skilled in the art without departing from the scope of the present invention.
Claims (7)
1. The laminated glass for the building comprises a first high-alumina glass raw sheet, a second high-alumina glass raw sheet and an interlayer positioned between the first high-alumina glass raw sheet and the second high-alumina glass raw sheet, and is characterized in that a first antireflection composite medium layer and a first top protection layer are sequentially formed on the surface of the first high-alumina glass raw sheet far away from the second high-alumina glass raw sheet, a second antireflection composite medium layer and a second top protection layer are sequentially formed on the surface of the second high-alumina glass raw sheet far away from the first high-alumina glass raw sheet, and the first antireflection composite medium layer and the second antireflection composite medium layer respectively comprise at least four refractive index layers; the laminated glass for the building further comprises a first bottom dielectric layer and a second bottom dielectric layer, wherein the first bottom dielectric layer, the first anti-reflection composite dielectric layer and the first top protective layer are sequentially formed on the surface, far away from the second high-alumina glass raw sheet, of the first high-alumina glass raw sheet; the second bottom dielectric layer, the second anti-reflection composite dielectric layer and the second top protective layer are sequentially formed on the surface of the second high-alumina glass raw sheet far away from the first high-alumina glass raw sheet; the first anti-reflection composite dielectric layer comprises a first refractive index layer, a second refractive index layer and a third refractive index layer with different refractive indexes, wherein the refractive index of the first refractive index layer is the largest, the refractive index of the third refractive index layer is the smallest, the refractive index of the second refractive index layer is centered, the refractive index of the second refractive index layer is 1.77-1.9, the second refractive index layer is formed by silicon oxynitride SiO xNy, and the range of x/y is 2/10-3/10; the first anti-reflection composite medium layer sequentially comprises the second refractive index layer, the first refractive index layer, the third refractive index layer and the first refractive index layer.
2. The laminated glass for construction according to claim 1, wherein the first antireflection composite dielectric layer comprises a silicon oxynitride layer, niobium pentoxide, silicon dioxide layer and silicon nitride layer in this order in a direction in which the first raw high-alumina glass sheet is away from the second raw high-alumina glass sheet.
3. The laminated glass for construction according to claim 1, wherein the first antireflection composite dielectric layer comprises a silicon oxynitride layer, a silicon nitride layer, a silicon dioxide layer and a silicon nitride layer in this order in a direction in which the first raw high-alumina glass sheet is away from the second raw high-alumina glass sheet.
4. The laminated glass for building according to claim 1, wherein the thickness of the first antireflection composite dielectric layer is 200nm to 270nm.
5. The laminated glass for construction according to claim 1, wherein the thickness of the first raw high-alumina glass sheet or the second raw high-alumina glass sheet is 1 to 15 mm.
6. The laminated glass for construction according to claim 1, wherein the second antireflection composite medium layer has the same structure as the first antireflection composite medium layer.
7. A method for preparing laminated glass for construction, comprising the steps of:
cleaning a high-alumina glass raw sheet;
plating a bottom dielectric layer on the surface of the high-alumina glass raw sheet by using an intermediate frequency alternating current power supply and a rotating cathode;
plating an anti-reflection composite dielectric layer on the bottom dielectric layer by using an intermediate frequency alternating current power supply and a rotating cathode, wherein the anti-reflection composite dielectric layer comprises at least four refractive index layers;
Spraying a top protective layer on the anti-reflection composite dielectric layer to form anti-reflection coated glass; and
Interlayer treatment is carried out on the anti-reflection coated glass;
The high-alumina glass raw sheet comprises a first high-alumina glass raw sheet and a second high-alumina glass raw sheet, the bottom dielectric layer comprises a first bottom dielectric layer and a second bottom dielectric layer, a first antireflection composite dielectric layer and a first top protective layer are sequentially formed on the surface, far away from the second high-alumina glass raw sheet, of the first high-alumina glass raw sheet, a second antireflection composite dielectric layer and a second top protective layer are sequentially formed on the surface, far away from the first high-alumina glass raw sheet, of the second high-alumina glass raw sheet, and the first antireflection composite dielectric layer and the second antireflection composite dielectric layer respectively comprise at least four refractive index layers;
The first bottom dielectric layer, the first anti-reflection composite dielectric layer and the first top protective layer are sequentially formed on the surface of the first high-alumina glass raw sheet far away from the second high-alumina glass raw sheet; the second bottom dielectric layer, the second anti-reflection composite dielectric layer and the second top protective layer are sequentially formed on the surface of the second high-alumina glass raw sheet far away from the first high-alumina glass raw sheet; the first anti-reflection composite dielectric layer comprises a first refractive index layer, a second refractive index layer and a third refractive index layer with different refractive indexes, wherein the refractive index of the first refractive index layer is the largest, the refractive index of the third refractive index layer is the smallest, the refractive index of the second refractive index layer is centered, the refractive index of the second refractive index layer is 1.77-1.9, the second refractive index layer is formed by silicon oxynitride SiO xNy, and the range of x/y is 2/10-3/10; the first anti-reflection composite medium layer sequentially comprises the second refractive index layer, the first refractive index layer, the third refractive index layer and the first refractive index layer.
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