CN109536966A - A kind of chemical polishing solution for aluminum products and the polishing method using the polishing fluid - Google Patents

A kind of chemical polishing solution for aluminum products and the polishing method using the polishing fluid Download PDF

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Publication number
CN109536966A
CN109536966A CN201910048549.0A CN201910048549A CN109536966A CN 109536966 A CN109536966 A CN 109536966A CN 201910048549 A CN201910048549 A CN 201910048549A CN 109536966 A CN109536966 A CN 109536966A
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CN
China
Prior art keywords
aluminum products
polishing
tap water
rinsed well
chemical polishing
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CN201910048549.0A
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Chinese (zh)
Inventor
阮家良
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Dongguan Zhide precision parts Co.,Ltd.
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Huizhou Zhide Precision Parts Co Ltd
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Priority to CN201910048549.0A priority Critical patent/CN109536966A/en
Publication of CN109536966A publication Critical patent/CN109536966A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00Brightening metals by chemical means
    • C23F3/02Light metals
    • C23F3/03Light metals with acidic solutions

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

The present invention relates to the polishing technology fields of aluminum products, more particularly to a kind of chemical polishing solution for aluminum products, it includes the following composition for accounting for mass percent: phosphoric acid 68%~70%, sulfuric acid 15%~25% and corrosion inhibiter 10~15%, use the polishing method of the polishing fluid, include the following steps: S1, the aluminum products polished are placed in temperature to take out after 15~30S of immersion in 60~65 DEG C of alkaline degreaser, and is rinsed well with tap water;S2, the aluminum products after step S1 are placed in the polishing fluid that temperature is 105~115 DEG C, polishing time is 10~15S, is rinsed well later with tap water;S3, the aluminum products after step S2 are placed in neutralizer, the neutralization time is 3~15S, is rinsed well later with tap water;Between when light out, accelerate light action out, reduces the consumption of surface aluminum substrate, to reach the luster effect of product, spue line caused by solving the problems, such as because of corrosion depth relatively depth can meet the market demand, polishing process is simple, required at low cost and pollution-free.

Description

A kind of chemical polishing solution for aluminum products and the polishing method using the polishing fluid
Technical field
The present invention relates to the polishing technology field of aluminum products more particularly to a kind of chemical polishing solution for aluminum products and use the throwing The polishing method of light liquid.
Background technique
The chemical polishing of aluminum products is the selectivity being produced in acid or alkaline electrolyte solution using aluminium and aluminium alloy From dissolution, to reduce the chemical processes of its surface roughness, PH.Chemical polishing has energy consumption small, easy to operate, raw High-efficient, the advantages that not suffering from the product shape and size restrictions is produced, is in the processing of aluminum products surface finishing and its important process.Tradition Surface with chemical polishing technology generally use phosphoric acid, sulfuric acid, nitric acid cooperation " three acid " technique, have quality of finish good, brightness height etc. Advantage, but due to the use of nitric acid, have a large amount of tobacco (i.e. nitrogen oxides) generation during the polishing process, cause serious environment Pollution, endangers operator's health significantly.
Research of the country to aluminum products without tobacco chemical polishing probably starts from the 1980s, achieve some achievements, But from the point of view of total situation, the polishing brightness (reflectivity) of no tobacco polishing not enough, cannot reach the bright of traditional three acid polishing Degree and production requirement.Therefore, no tobacco surface with chemical polishing technology is above limited by very large in application.
In addition, the bad main cause of spue line that the anodic oxidation of existing aluminium extruded type material occurs: mold bridge location designs not It is good, it repairs a die, extrusion ratio discomfort etc., processing method major way are as follows: preceding workshop section's change, the die change tune of aluminium extruded molding procedure Whole, this mode is at high cost and effect cannot be completed to prevent, and is unable to satisfy the market demand.
Summary of the invention
It is high that the purpose of the present invention is to provide a kind of polishing brightness, and pollution-free, spue line is uniform, can meet market need The chemical polishing solution asked and the polishing method using the polishing fluid.
To achieve the above object, the present invention is achieved by the following technical programs:
A kind of chemical polishing solution for aluminum products, the following composition including accounting for mass percent: phosphoric acid 68%~70%, sulfuric acid 15%~25% and corrosion inhibiter 10~15%.
Further, the corrosion inhibiter is anhydrous cupric sulfate.
Further, the mass concentration ratio of the phosphoric acid is 85%.
Further, the mass concentration ratio of the sulfuric acid is 98%.
A kind of polishing method using chemical polishing solution for aluminum products, includes the following steps:
S1, the aluminum products polished are placed in the alkaline degreaser that temperature is 60~65 DEG C and impregnate 15~30S After take out, and rinsed well with tap water;
S2, the aluminum products after step S1 are placed in temperature it being in 105~115 DEG C of polishing fluid, polishing time is 10~ 15S is rinsed well with tap water later;
S3, the aluminum products after step S2 are placed in neutralizer, the neutralization time is 3~15S, is rushed later with tap water Wash clean.
In conclusion compared with prior art, the present invention has the advantages that following substantive distinguishing features outstanding and significant:
(1) polishing fluid of the invention is after reducing the ratio of phosphoric acid and sulfuric acid, then adds copper sulphate, it is possible to reduce 30% is left Between when the light out on the right side, accelerates light action out, the consumption of surface aluminum substrate is reduced, to reach the luster effect of product;
(2) spue line caused by also solving the problems, such as because of corrosion depth relatively depth can meet the market demand;
(3) polishing process of the invention is simple, required at low cost and pollution-free.
Specific embodiment
Invention is further described With reference to embodiment:
Embodiment one:
A kind of chemical polishing solution for aluminum products, the following composition including accounting for mass percent: phosphoric acid 68%, sulfuric acid 17% are gentle Lose agent 15%.
Wherein, the corrosion inhibiter is anhydrous cupric sulfate.
Wherein, the mass concentration ratio of the phosphoric acid is 85%.
Wherein, the mass concentration ratio of the sulfuric acid is 98%.
A kind of polishing method using chemical polishing solution for aluminum products, includes the following steps:
S1, the aluminum products polished are placed in the alkaline degreaser that temperature is 65 DEG C and are taken out after immersion 30S, and It is rinsed well with tap water;
S2, the aluminum products after step S1 are placed in the polishing fluid that temperature is 115 DEG C, polishing time 15S, later with certainly Water is rinsed well;
S3, the aluminum products after step S2 are placed in neutralizer, the neutralization time is 15S, is rinsed later with tap water It is clean.
Embodiment two:
A kind of chemical polishing solution for aluminum products, the following composition including accounting for mass percent: phosphoric acid 68.5%, sulfuric acid 21.5% With corrosion inhibiter 10%.
Wherein, the corrosion inhibiter is anhydrous cupric sulfate.
Wherein, the mass concentration ratio of the phosphoric acid is 85%.
Wherein, the mass concentration ratio of the sulfuric acid is 98%.
A kind of polishing method using chemical polishing solution for aluminum products, includes the following steps:
S1, the aluminum products polished are placed in the alkaline degreaser that temperature is 63 DEG C and are taken out after immersion 25S, and It is rinsed well with tap water;
S2, the aluminum products after step S1 are placed in the polishing fluid that temperature is 112 DEG C, polishing time 13S, later with certainly Water is rinsed well;
S3, the aluminum products after step S2 are placed in neutralizer, the neutralization time is 12S, is rinsed later with tap water It is clean.
Embodiment three:
A kind of chemical polishing solution for aluminum products, the following composition including accounting for mass percent: phosphoric acid 69%, sulfuric acid 19% are gentle Lose agent 12%.
Wherein, the corrosion inhibiter is anhydrous cupric sulfate.
Wherein, the mass concentration ratio of the phosphoric acid is 85%.
Wherein, the mass concentration ratio of the sulfuric acid is 98%.
A kind of polishing method using chemical polishing solution for aluminum products, includes the following steps:
S1, the aluminum products polished are placed in the alkaline degreaser that temperature is 62 DEG C and are taken out after immersion 20S, and It is rinsed well with tap water;
S2, the aluminum products after step S1 are placed in the polishing fluid that temperature is 109 DEG C, polishing time 12S, later with certainly Water is rinsed well;
S3, the aluminum products after step S2 are placed in neutralizer, the neutralization time is 10S, is rinsed later with tap water It is clean.
Example IV:
A kind of chemical polishing solution for aluminum products, the following composition including accounting for mass percent: phosphoric acid 70%, sulfuric acid 20% are gentle Lose agent 10%.
Wherein, the corrosion inhibiter is anhydrous cupric sulfate.
Wherein, the mass concentration ratio of the phosphoric acid is 85%.
Wherein, the mass concentration ratio of the sulfuric acid is 98%.
A kind of polishing method using chemical polishing solution for aluminum products, includes the following steps:
S1, the aluminum products polished are placed in the alkaline degreaser that temperature is 60 DEG C and are taken out after immersion 15S, and It is rinsed well with tap water;
S2, the aluminum products after step S1 are placed in the polishing fluid that temperature is 105 DEG C, polishing time 10S, later with certainly Water is rinsed well;
S3, the aluminum products after step S2 are placed in neutralizer, the neutralization time is 8S, is rinsed later with tap water dry It is net.
Polishing fluid in the present invention is after reducing the ratio of phosphoric acid and sulfuric acid, then adds copper sulphate, it is possible to reduce 30% is left Between when the light out on the right side, accelerate light action out, the consumption for reducing surface aluminum substrate also solves to reach the luster effect of product Because of spue line problem caused by corrosion depth relatively depth.
The technique is the adjustment of rear process,, can be with using this polishing fluid in the chemical polishing process in anode oxidation process It is bad to complete solution material spue line, and does not increase cost, manufacture craft of the invention is simple, low manufacture cost, can meet city Field demand,
For those skilled in the art, it is various corresponding that other can be made according to above technical scheme and design Change and deformation, and all these change and modification all should belong within the scope of protection of the claims of the present invention.

Claims (5)

1. a kind of chemical polishing solution for aluminum products, which is characterized in that the following composition including accounting for mass percent: phosphoric acid 68%~ 70%, sulfuric acid 15%~25% and corrosion inhibiter 10~15%.
2. a kind of chemical polishing solution for aluminum products according to claim 1, which is characterized in that the corrosion inhibiter is anhydrous slufuric acid Copper.
3. a kind of chemical polishing solution for aluminum products according to claim 1, which is characterized in that the mass concentration ratio of the phosphoric acid It is 85%.
4. a kind of chemical polishing solution for aluminum products according to claim 1, which is characterized in that the mass concentration ratio of the sulfuric acid It is 98%.
5. a kind of polishing method using chemical polishing solution for aluminum products according to any one of claims 1 to 4, feature exist In including the following steps:
S1, the aluminum products polished are placed in temperature to take after 15~30S of immersion in 60~65 DEG C of alkaline degreaser Out, and with tap water it is rinsed well;
S2, the aluminum products after step S1 being placed in the polishing fluid that temperature is 105~115 DEG C, polishing time is 10~15S, it It is rinsed well afterwards with tap water;
S3, the aluminum products after step S2 are placed in neutralizer, the neutralization time is 3~15S, is rinsed later with tap water dry It is net.
CN201910048549.0A 2019-01-18 2019-01-18 A kind of chemical polishing solution for aluminum products and the polishing method using the polishing fluid Pending CN109536966A (en)

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CN201910048549.0A CN109536966A (en) 2019-01-18 2019-01-18 A kind of chemical polishing solution for aluminum products and the polishing method using the polishing fluid

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Application Number Priority Date Filing Date Title
CN201910048549.0A CN109536966A (en) 2019-01-18 2019-01-18 A kind of chemical polishing solution for aluminum products and the polishing method using the polishing fluid

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CN109536966A true CN109536966A (en) 2019-03-29

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1869286A (en) * 2005-05-27 2006-11-29 佛山市顺德区汉达精密电子科技有限公司 Polishing agent
CN102747369A (en) * 2012-06-18 2012-10-24 合肥华清金属表面处理有限责任公司 Yellow fume-free aluminium alloy chemical polishing solution and preparation method thereof
CN105200431A (en) * 2015-10-13 2015-12-30 深圳市沙特尔工业材料有限公司 Aluminium product polishing method
CN105506639A (en) * 2015-11-09 2016-04-20 广东长盈精密技术有限公司 Aluminum alloy surface treatment method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1869286A (en) * 2005-05-27 2006-11-29 佛山市顺德区汉达精密电子科技有限公司 Polishing agent
CN102747369A (en) * 2012-06-18 2012-10-24 合肥华清金属表面处理有限责任公司 Yellow fume-free aluminium alloy chemical polishing solution and preparation method thereof
CN105200431A (en) * 2015-10-13 2015-12-30 深圳市沙特尔工业材料有限公司 Aluminium product polishing method
CN105506639A (en) * 2015-11-09 2016-04-20 广东长盈精密技术有限公司 Aluminum alloy surface treatment method

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Effective date of registration: 20210127

Address after: 523000 room 106, building 4, No.3, Xiegang Yinxing Road, Xiegang Town, Dongguan City, Guangdong Province

Applicant after: Dongguan Zhide precision parts Co.,Ltd.

Address before: 516000 factory building of Mingyang company, north of Lianfa Avenue, Tongqiao Town, Zhongkai high tech Zone, Huizhou City, Guangdong Province

Applicant before: HUIZHOU CITY ZHIDE PRECISION COMPONENTS Co.,Ltd.

RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20190329