CN109507850A - Exposure parameter determination method and device and terminal equipment - Google Patents
Exposure parameter determination method and device and terminal equipment Download PDFInfo
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- CN109507850A CN109507850A CN201811556355.3A CN201811556355A CN109507850A CN 109507850 A CN109507850 A CN 109507850A CN 201811556355 A CN201811556355 A CN 201811556355A CN 109507850 A CN109507850 A CN 109507850A
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- 238000000034 method Methods 0.000 title claims abstract description 47
- 238000005259 measurement Methods 0.000 claims abstract description 45
- 238000004590 computer program Methods 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000003550 marker Substances 0.000 claims description 5
- 235000013399 edible fruits Nutrition 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 13
- 230000006870 function Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 241000208340 Araliaceae Species 0.000 description 3
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 3
- 235000003140 Panax quinquefolius Nutrition 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 235000008434 ginseng Nutrition 0.000 description 3
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- 238000013461 design Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The application provides a method and a device for determining exposure parameters and a terminal device, wherein the method comprises the following steps: acquiring at least one set of reference exposure parameters of an exposure device; respectively exposing the first sample according to each group of reference exposure parameters to obtain an exposure graph corresponding to each group of reference exposure parameters; and measuring the exposure patterns corresponding to each group of reference exposure parameters to obtain a measurement result, and determining the standard exposure parameters of the exposure equipment according to the measurement result. Through the technical scheme in this application, can effectively reduce because of the colour difference that light energy's unbalance caused the exposure product.
Description
Technical field
This application involves field of display technology more particularly to determination method, determining device and the terminals of a kind of exposure parameter
Equipment.
Background technique
In liquid crystal display (LCD, Liquid Crystal Display) preparation process, mainly there are array process, panel
Molding procedure and mould group structure fill these three important procedures of process.Wherein, array process mainly manufactures TFT (Thin Film
Transistor, thin film transistor (TFT)) substrate and CF (color filter, colored filter) substrate.In array process, need
By in the pattern transfer on mask plate to coated glass substrate, that is, expose.
In exposure process, the levelness of the focal length of exposure machine, the flatness of exposure machine objective table and mask plate all can be straight
The quality for influencing and exposing piece is connect, wherein any one parameter is bad, is likely to cause liquid crystal because of the imbalance of light energy
Show the color difference of device.
Apply for content
In view of this, the embodiment of the present application provides determination method, determining device and the terminal device of a kind of exposure parameter,
To solve the problems, such as to cause the color difference of exposure product because of the imbalance of light energy.
The first aspect of the embodiment of the present application provides a kind of determination method of exposure parameter, comprising:
Obtain at least one set of reference exposure parameter of exposure sources；
The first sample is exposed according to every group of reference exposure parameter respectively, is obtained corresponding with every group of reference exposure parameter
Exposure figure；
Respectively the corresponding exposure figure of every group of reference exposure parameter measure and obtain measurement, and according to this
Measurement determines the standard exposure parameter of the exposure sources.
The second aspect of the embodiment of the present application provides a kind of determining device of exposure parameter, comprising:
Acquiring unit, for obtaining at least one set of reference exposure parameter of exposure sources；
Exposing unit obtains and every group of ginseng for being exposed respectively according to every group of reference exposure parameter to the first sample
Examine the corresponding exposure figure of exposure parameter；
Determination unit, for measured to the corresponding exposure figure of every group of reference exposure parameter respectively
As a result, and determining the standard exposure parameters of the exposure sources according to the measurement.
The third aspect of the embodiment of the present application provides a kind of terminal device, including memory, processor and is stored in
In the memory and the computer program that can run on the processor, when the processor executes the computer program
The step of realizing the method that first aspect of the embodiment of the present invention provides.
At least one set of reference exposure parameter that the application passes through acquisition exposure sources；Respectively according to every group of reference exposure parameter
First sample is exposed, exposure figure corresponding with every group of reference exposure parameter is obtained；Respectively to described every group with reference to exposure
The corresponding exposure figure of optical parameter, which measure, obtains measurement, and the mark of the exposure sources is determined according to the measurement
Quasi- exposure parameter can effectively reduce the color difference that exposure product is caused because of the imbalance of light energy.
Detailed description of the invention
It in order to more clearly explain the technical solutions in the embodiments of the present application, below will be to institute in embodiment or example description
Attached drawing to be used is needed to be briefly described, it should be apparent that, the accompanying drawings in the following description is only some implementations of the application
Example, for those of ordinary skill in the art, without any creative labor, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 is the implementation process schematic diagram of the determination method of exposure parameter provided by the embodiments of the present application；
Fig. 2 is the schematic diagram of the determining device of exposure parameter provided by the embodiments of the present application；
Fig. 3 is the gloomy curve synoptic diagram of pa provided by the embodiments of the present application；
Fig. 4 is the loss late statistical form that exposure parameter provided by the embodiments of the present application determines front and back；
Fig. 5 is the yield comparison diagram that exposure parameter provided by the embodiments of the present application determines front and back；
Fig. 6 is the schematic diagram of terminal device provided by the embodiments of the present application.
Specific embodiment
In being described below, for illustration and not for limitation, the tool of such as particular system structure, technology etc is proposed
Body details, to understand thoroughly the embodiment of the present invention.However, it will be clear to one skilled in the art that there is no these specific
The application also may be implemented in the other embodiments of details.In other situations, it omits to well-known system, device, electricity
The detailed description of road and method, so as not to obscure the description of the present application with unnecessary details.
It should be appreciated that ought use in this specification and in the appended claims, term " includes " instruction is described special
Sign, entirety, step, operation, the presence of element and/or component, but be not precluded one or more of the other feature, entirety, step,
Operation, the presence or addition of element, component and/or its set.
It is also understood that mesh of the term used in this present specification merely for the sake of description specific embodiment
And be not intended to limit the present invention.As present specification and it is used in the attached claims, unless on
Other situations are hereafter clearly indicated, otherwise " one " of singular, "one" and "the" are intended to include plural form.
It will be further appreciated that the term "and/or" used in present specification and the appended claims is
Refer to any combination and all possible combinations of one or more of associated item listed, and including these combinations.
As used in this specification and in the appended claims, term " if " can be according to context quilt
Be construed to " when ... " or " once " or " in response to determination " or " in response to detecting ".Similarly, phrase " if it is determined that " or
" if detecting [described condition or event] " can be interpreted to mean according to context " once it is determined that " or " in response to true
It is fixed " or " once detecting [described condition or event] " or " in response to detecting [described condition or event] ".
In order to illustrate technical solution described herein, the following is a description of specific embodiments.
Fig. 1 is the implementation process schematic diagram of the determination method of exposure parameter provided by the embodiments of the present application, as shown, institute
The method of stating may comprise steps of:
Step S101 obtains at least one set of reference exposure parameter of exposure sources.
Wherein, the reference exposure parameter includes:
The focal length of the exposure sources, the pressure value of mask plate and objective table flatness.
In the application, the preparation process of liquid crystal display (LCD, Liquid Crystal Display) mainly has array work
Sequence, panel forming process and mould group structure fill these three important procedures of process.Wherein, array process mainly manufactures TFT (Thin
Film Transistor, thin film transistor (TFT)) substrate and CF (color filter, colored filter) substrate.In array process
In, it needs to expose (sample can be glass substrate) in the pattern transfer on mask plate to coated sample.It is exposing
In the process, the selection of exposure parameter will directly influence the quality of exposure product.Illustratively, if the focal length of exposure sources
(the distance between the camera lens of exposure sources and mask plate) is not adjusted, and may result in the fuzzy of figure on exposure product；
Since exposure sources precision is very high, the objective table of exposure sources slightly has some bumps to will lead to expose product because of light energy not
It balances and generates color difference；If mask plate be not it is horizontal, also result in exposure product because light energy imbalance due to generate color
The variation of difference, even figure.So the determination of exposure parameter has important influence to the quality of exposure product.
In the application, at least one set of reference exposure parameter of exposure sources is obtained first, and reference exposure parameter refers to exposure
The currently used exposure parameter of equipment, in other words, reference exposure parameter are unascertained exposure parameters, are needed through this Shen
Please in technical solution, determine that from least one set of reference exposure parameter, can obtain a top-quality exposure product
Standard exposure parameter.Wherein, reference exposure parameter includes: that the focal length of exposure sources, the pressure value of mask plate and objective table are flat
Degree.Objective table flatness in the reference exposure parameter of acquisition can be exposure sources objective table flatness currently in use,
The initial objective table flatness that can be exposure sources, can also be and have passed through the objective table flatness artificially pre-adjusted.Show
Example property, before determining the parameter of exposure sources, objective table flatness is (0, -1 ,+1), artificially by objective table flatness tune
Whole is ideal (0,0,0), and by objective table flatness adjusted input exposure sources, then in the reference exposure parameter obtained
Objective table flatness be (0,0,0).In addition, the focal length of exposure sources has certain range, in every group of reference exposure parameter
The focal length of exposure sources all corresponds to a focal length value within the scope of this, in other words, in the focal ranges of exposure sources how many
A focal length value, it is corresponding that reference exposure parameter is organized with regard to how many.Illustratively, it is assumed that the objective table flatness of acquisition be (0,0,
0), the focal range of exposure sources is -90~90, is spacing with 1, then available 180 focal length values (- 90, -89, -
88 ..., 89,90), then corresponding available 180 groups of reference exposure parameters, respectively (- 90,0,0,0), (- 89,0,
0,0),……,(89,0,0,0),(90,0,0,0).It should be noted that the example of above-mentioned only step S101, not to ginseng
The representation, numerical value, range etc. for examining exposure parameter are specifically limited.In the application, the adjustment usually in ± 35 μ ms
The focal length of exposure sources can form an exposure piece at interval of 3 focal length values, can obtain sufficient amount of exposure piece in this way, make
It is more accurate to obtain result.It is of course also possible to form a piece at interval of 1 focal length value, although can obtain it is more accurate as a result,
The exposure piece quantity being obtained by is more, so comprehensively considering, each 3 focal length values form an exposure piece.Referring to Fig. 3,
Fig. 3 shows the gloomy curve synoptic diagram of pa provided by the embodiments of the present application, as shown, x-axis indicates the focal length of exposure sources, y-axis
The measurement of exposure product is indicated, it can be seen from the figure that exposing the measurement of product than burnt when focal length is 20
Measurement when away from for other values is good.
In one embodiment, at least one set of reference exposure parameter for obtaining exposure sources, comprising:
The pressure value of the mask plate is adjusted in preset range；
The gloomy curve graph of pa is generated according to the pressure value of each mask plate in the preset range, and by the gloomy curve graph of the pa
It is shown to user；
Receive the pressure value for the mask plate that user determines according to the gloomy curve graph of the pa, and by the pressure value mark of the mask plate
It is denoted as the reference exposure parameter.
In practical applications, the gloomy curve graph of pa is sent to user, user can manually find out the wave in the gloomy curve graph of pa
Peak and trough, then 5 groups of pressure values for being accurate to the mask plate of 2 significant digits are chosen around peak value, according to this 5 groups of pressure
Value determines the pressure value of the mask plate of reference.
Step S102 is respectively exposed the first sample according to every group of reference exposure parameter, obtains with every group with reference to exposure
The corresponding exposure figure of optical parameter.
Wherein, the first sample can be the glass substrate for being covered with photoresist layer and plated film；Exposure figure can be number, letter
Or other patterns, exposure figure can be made of a figure, can also be made of multiple figures, be not specifically limited here.
In practical applications, step S102 can be, and be exposed according to one group of reference exposure parameter to first sample
Light, correspondence obtain an exposure piece.Illustratively, there are 2 groups of reference exposure parameters, according to the 1st group of reference exposure parameter to the first sample
Product A, which is exposed to obtain, exposes piece A ', is exposed to obtain exposure piece B ' to the first sample B according to the 2nd group of reference exposure parameter, altogether
Using 2 the first samples, 2 exposure pieces are obtained；Since the mask plate of double exposure is identical, so exposing piece A ' and exposing the exposure on piece B '
Light figure is identical, and the used reference exposure parameter that only double exposes is different.Step S102 is also possible that according to every group of reference
Exposure parameter is respectively exposed the different zones on same first sample, has to an exposure piece.Illustratively, have 2
Group reference exposure parameter and a first sample A, are exposed the first sample A according to the 1st group of reference exposure parameter, further according to
2nd group of exposure parameter is exposed the blank parts (unexposed part) of the first sample A, uses 1 the first sample altogether
Product obtain 1 exposure piece, this 1 exposure on piece shares 2 exposure figures, and this 2 exposure figures are identical, only this 2 exposure diagrams
Shape is different in the position for exposing on piece, and corresponding reference exposure parameter is different.It should be noted that above-mentioned only step S102
Example is used only to illustrate the specific implementation process of step S102, and is not specifically limited.
Step S103 measure to the corresponding exposure figure of every group of reference exposure parameter obtaining to measure and be tied respectively
Fruit, and determine according to the measurement standard exposure parameter of the exposure sources.
Wherein, exposure figure is measured specifically, measuring the line width of exposure figure.By the line width of each exposure figure with
Standard line width compares, and then judges the quality of exposure figure.Illustratively, it is assumed that standard line width is 5, exposure figure A's
Line width is 3, and the line width of exposure figure B is 4, then the absolute value of the difference of the line width of exposure figure A and standard line width is 2, exposure diagram
The line width of shape B and the absolute value of the difference of standard line width are 1,1 < 2, so the quality of exposure figure B is better than exposure figure A.It needs
Illustrate, the example that only exposure figure quality compares here, not to standard line width, the line width of exposure figure, exposes
The number etc. of light figure is specifically limited.
Standard exposure parameter be selected from each group reference exposure parameter, that the corresponding group reference of target light exposure product
Exposure parameter.
Optionally, step S103 can specifically include:
The corresponding exposure figure of every group of reference exposure parameter is divided at least one region according to preset rules, and by institute
Stating the identical zone marker in position on the corresponding exposure figure of every group of reference exposure parameter is same class.
Each region on the corresponding exposure figure of every group of reference exposure parameter is measured respectively.
According to measurement, every a kind of region is found out respectively from the corresponding exposure figure of every group of reference exposure parameter
Corresponding target light exposure product.
According to the corresponding target light exposure product in every a kind of region, the standard exposure parameter of the exposure sources is determined.
In one embodiment, described according to the corresponding target light exposure product in every a kind of region, determine the exposure
The standard exposure parameter of equipment, comprising:
Using the corresponding target light exposure product in every a kind of region such region reference exposure parameter as such area
The standard exposure parameter in domain.
In the application, preset rules can be artificial preset, for example, preset rules can be according to size
Exposure figure is equally divided into several regions, is also possible to that exposure figure is split as several parts according to the structure of exposure figure
(region), is not specifically limited herein.It should be noted that once preset rules have determined, to all exposure figures all in accordance with
The same preset rules carry out region division, and the result to guarantee region division on each exposure figure is identical.In addition, target exposes
Light product refers to that (exposure of the line width measured closest to standard line width produces top-quality exposure product in all exposure products
Product).
Illustratively, there are 2 groups of reference exposure parameters, according to the 1st group of reference exposure parameter (0,0,0,30) to the first sample A
It is exposed to obtain exposure figure A ', the first sample B is exposed to obtain according to the 2nd group of reference exposure parameter (0,0,0,50)
Exposure figure B ', exposure figure A ' and the size of exposure figure B ', shape are all the same.According to preset rules by exposure figure
A ' is averagely divided into 2 regions a and b according to size, according to preset rules that exposure figure B ' is average according to size
It is divided into 2 regions c and d；Wherein, position of the region a and region c on exposure figure is identical, therefore region a and region c is marked
It is denoted as I class, region b is identical with position of the region d on exposure figure, therefore region b and region d is labeled as II class；It is right respectively
Exposure figure in region a, b, c, d is measured, and according to measurement, region a's is best in quality in I class region, II class area
Region d's is best in quality in domain, therefore the target light exposure product in I class region is exposure figure A ', and the target light exposure in II class region produces
Product are exposure figure B '；Then by exposure figure A ' I class region reference exposure parameter (0,0,0,30) as I class region
Standard exposure parameter, standard of the reference exposure parameter (0,0,0,50) as II class region by exposure figure B ' in II class region
Exposure parameter.It should be noted that an example of above-mentioned only step S103, is used only to illustrate determining standard exposure
The step of parameter, and be not specifically limited.
In one embodiment, after the standard exposure parameter for determining the exposure sources according to the measurement, institute
State method further include:
Step S104 is exposed the second sample according to the standard exposure parameter, obtains at least one and the mark
The corresponding exposure figure of quasi- exposure parameter, and count the yield of the exposure figure corresponding with the standard exposure parameter.
In the application, the second sample can be the white space (i.e. unexposed part) on the first sample, the second sample
Product are also possible to the sample different from the first sample.
Step S105, if the yield of the exposure figure corresponding with the standard exposure parameter is less than default yield,
Respectively each exposure figure corresponding with the standard exposure parameter measure and obtain measurement, and according to the measurement knot
Fruit redefines the standard exposure parameter of the exposure sources.
Wherein, default yield can be artificial preset.It is good when exposure figure corresponding with standard exposure parameter
When rate is less than default yield, illustrate that the exposure product for meeting measuring standard out cannot be exposed according to determining standard exposure parameter,
So needing to redefine standard exposure parameter at this time, i.e., repeatedly step S103, until exposure corresponding with standard exposure parameter
The yield of figure is equal to or more than default yield.
Referring to fig. 4 and Fig. 5, Fig. 4 show the loss late statistics that exposure parameter provided by the embodiments of the present application determines front and back
Table, Fig. 5 show the yield comparison diagram that exposure parameter provided by the embodiments of the present application determines front and back.It can be seen from the figure that sharp
After obtaining standard exposure parameter with the determination method of the exposure parameter of the application, sample is exposed according to standard exposure parameter
The loss late for the exposure product that light obtains greatly reduces.Illustrate, by the technical solution in the application, efficiently solve because
The imbalance of light energy and cause exposure product color difference the problem of, substantially increase exposure product yield.
At least one set of reference exposure parameter that the embodiment of the present application passes through acquisition exposure sources；Respectively according to every group with reference to exposure
Optical parameter is exposed the first sample, obtains exposure figure corresponding with every group of reference exposure parameter；Respectively to described every group
The corresponding exposure figure of reference exposure parameter, which measure, obtains measurement, and determines that the exposure is set according to the measurement
Standby standard exposure parameter can effectively reduce the color difference that exposure product is caused because of the imbalance of light energy.
It should be understood that the size of the serial number of each step is not meant that the order of the execution order in above-described embodiment, each process
Execution sequence should be determined by its function and internal logic, the implementation process without coping with the embodiment of the present application constitutes any limit
It is fixed.
Fig. 2 is that the schematic diagram of the determining device of exposure parameter provided by the embodiments of the present application is only shown for ease of description
Part relevant to the embodiment of the present application.
The determining device 2 of the exposure parameter includes:
Acquiring unit 21, for obtaining at least one set of reference exposure parameter of exposure sources.
Exposing unit 22 obtains and every group for being exposed respectively according to every group of reference exposure parameter to the first sample
The corresponding exposure figure of reference exposure parameter.
Determination unit 23 measures acquisition amount for carrying out respectively to the corresponding exposure figure of every group of reference exposure parameter
It surveys as a result, and determining the standard exposure parameters of the exposure sources according to the measurement.
Wherein, the reference exposure parameter includes:
The focal length and objective table flatness of the exposure sources.
Optionally, the determination unit 23 includes:
Division module 231, for according to preset rules by the corresponding exposure figure of every group of reference exposure parameter be divided into
A few region, and be same by the identical zone marker in position on the corresponding exposure figure of every group of reference exposure parameter
Class.
Measurement module 232, for respectively to each region on the corresponding exposure figure of every group of reference exposure parameter
It is measured.
Searching module 233, for dividing from the corresponding exposure figure of every group of reference exposure parameter according to measurement
The corresponding target light exposure product in every a kind of region is not found out.
Determining module 234, for determining the exposure sources according to the corresponding target light exposure product in every a kind of region
Standard exposure parameter.
Further, the determining module 234 includes:
Computational submodule, for the reference exposure by the corresponding target light exposure product in every a kind of region in such region
Standard exposure parameter of the parameter as such region.
Optionally, described device 2 further include:
Statistic unit 24, for after the standard exposure parameter for determining the exposure sources according to the measurement, root
The second sample is exposed according to the standard exposure parameter, obtains at least one exposure corresponding with the standard exposure parameter
Figure, and count the yield of the exposure figure corresponding with the standard exposure parameter.
Measurement unit 25, if the yield for the exposure figure corresponding with the standard exposure parameter is good less than presetting
Rate then respectively carries out each exposure figure corresponding with the standard exposure parameter to measure acquisition measurement, and according to this
Measurement redefines the standard exposure parameter of the exposure sources.
Optionally, the acquiring unit 21 includes:
Module is adjusted, for the pressure value of the mask plate to be adjusted in preset range.
Generation module, for generating the gloomy curve graph of pa according to the pressure value of each mask plate in the preset range, and will
The gloomy curve graph of pa is shown to user.
Receiving module for receiving the pressure value for the mask plate that user determines according to the gloomy curve graph of the pa, and this is covered
The pressure value of diaphragm plate is labeled as the reference exposure parameter.
In a particular application, each module in detection device can be self-existent processor, can also integrate jointly
For a processor, the software program module in the processor of detection device can also be.Alleged processor can be centre
It manages unit (Central Processing Unit, CPU), can also be other general processors, digital signal processor
(Digital Signal Processor, DSP), specific integrated circuit (Application Specific Integrated
Circuit, ASIC), ready-made programmable gate array (Field-Programmable Gate Array, FPGA) or other can
Programmed logic device, discrete gate or transistor logic, discrete hardware components etc..General processor can be microprocessor
Or the processor is also possible to any conventional processor etc..
At least one set of reference exposure parameter that the embodiment of the present application passes through acquisition exposure sources；Respectively according to every group with reference to exposure
Optical parameter is exposed the first sample, obtains exposure figure corresponding with every group of reference exposure parameter；Respectively to described every group
The corresponding exposure figure of reference exposure parameter, which measure, obtains measurement, and determines that the exposure is set according to the measurement
Standby standard exposure parameter can effectively reduce the color difference that exposure product is caused because of the imbalance of light energy.
Fig. 6 is the schematic diagram of terminal device provided by the embodiments of the present application.As shown in fig. 6, the terminal device 6 of the embodiment
Include: processor 60, memory 61 and is stored in the calculating that can be run in the memory 61 and on the processor 60
Machine program 62.The processor 60 realizes that the determination method of above-mentioned each exposure parameter is implemented when executing the computer program 62
Step in example, such as step S101 to S105 shown in FIG. 1.Alternatively, the processor 60 executes the computer program 62
The function of each module/unit in the above-mentioned each Installation practice of Shi Shixian, such as the function of module 21 to 25 shown in Fig. 2.
Illustratively, the computer program 62 can be divided into one or more module/units, it is one or
Multiple module/units are stored in the memory 61, and are executed by the processor 60, to complete the application.Described one
A or multiple module/units can be the series of computation machine program instruction section that can complete specific function, which is used for
Implementation procedure of the computer program 62 in the terminal device 6 is described.For example, the computer program 62 can be divided
It is cut into acquiring unit, exposing unit, determination unit, each unit concrete function is as follows:
Acquiring unit, for obtaining at least one set of reference exposure parameter of exposure sources.
Exposing unit obtains and every group of ginseng for being exposed respectively according to every group of reference exposure parameter to the first sample
Examine the corresponding exposure figure of exposure parameter.
Determination unit, for measured to the corresponding exposure figure of every group of reference exposure parameter respectively
As a result, and determining the standard exposure parameters of the exposure sources according to the measurement.
Wherein, the reference exposure parameter includes:
The focal length and objective table flatness of the exposure sources.
Optionally, the determination unit includes:
Division module, for the corresponding exposure figure of every group of reference exposure parameter to be divided at least one according to preset rules
A region, and be same class by the identical zone marker in position on the corresponding exposure figure of every group of reference exposure parameter.
Measurement module, for being carried out respectively to each region on the corresponding exposure figure of every group of reference exposure parameter
It measures.
Searching module, for being distinguished from the corresponding exposure figure of every group of reference exposure parameter according to measurement
Find out the corresponding target light exposure product in every a kind of region.
Determining module, for determining the exposure sources according to the corresponding target light exposure product in every a kind of region
Standard exposure parameter.
Further, the determining module includes:
Computational submodule, for the reference exposure by the corresponding target light exposure product in every a kind of region in such region
Standard exposure parameter of the parameter as such region.
Optionally, described device further include:
Statistic unit, for after the standard exposure parameter for determining the exposure sources according to the measurement, according to
The standard exposure parameter is exposed the second sample, obtains at least one exposure diagram corresponding with the standard exposure parameter
Shape, and count the yield of the exposure figure corresponding with the standard exposure parameter.
Measurement unit, if the yield for the exposure figure corresponding with the standard exposure parameter is good less than presetting
Rate then respectively carries out each exposure figure corresponding with the standard exposure parameter to measure acquisition measurement, and according to this
Measurement redefines the standard exposure parameter of the exposure sources.
Optionally, the acquiring unit includes:
Module is adjusted, for the pressure value of the mask plate to be adjusted in preset range.
Generation module, for generating the gloomy curve graph of pa according to the pressure value of each mask plate in the preset range, and will
The gloomy curve graph of pa is shown to user.
Receiving module for receiving the pressure value for the mask plate that user determines according to the gloomy curve graph of the pa, and this is covered
The pressure value of diaphragm plate is labeled as the reference exposure parameter.
The terminal device 6 can be the calculating such as desktop PC, notebook, palm PC and cloud server and set
It is standby.The terminal device may include, but be not limited only to, processor 60, memory 61.It will be understood by those skilled in the art that Fig. 6
The only example of terminal device 6 does not constitute the restriction to terminal device 6, may include than illustrating more or fewer portions
Part perhaps combines certain components or different components, such as the terminal device can also include input-output equipment, net
Network access device, bus etc..
Alleged processor 60 can be central processing unit (Central Processing Unit, CPU), can also be
Other general processors, digital signal processor (Digital Signal Processor, DSP), specific integrated circuit
(Application Specific Integrated Circuit, ASIC), ready-made programmable gate array (Field-
Programmable Gate Array, FPGA) either other programmable logic device, discrete gate or transistor logic,
Discrete hardware components etc..General processor can be microprocessor or the processor is also possible to any conventional processor
Deng.
The memory 61 can be the internal storage unit of the terminal device 6, such as the hard disk or interior of terminal device 6
It deposits.The memory 61 is also possible to the External memory equipment of the terminal device 6, such as be equipped on the terminal device 6
Plug-in type hard disk, intelligent memory card (Smart Media Card, SMC), secure digital (Secure Digital, SD) card dodge
Deposit card (Flash Card) etc..Further, the memory 61 can also both include the storage inside list of the terminal device 6
Member also includes External memory equipment.The memory 61 is for storing needed for the computer program and the terminal device
Other programs and data.The memory 61 can be also used for temporarily storing the data that has exported or will export.
In the above-described embodiments, it all emphasizes particularly on different fields to the description of each embodiment, is not described in detail or remembers in some embodiment
The part of load may refer to the associated description of other embodiments.
Those of ordinary skill in the art may be aware that list described in conjunction with the examples disclosed in the embodiments of the present disclosure
Member and algorithm steps can be realized with the combination of electronic hardware or computer software and electronic hardware.These functions are actually
It is implemented in hardware or software, the specific application and design constraint depending on technical solution.Professional technician
Each specific application can be used different methods to achieve the described function, but this realization is it is not considered that exceed
Scope of the present application.
In embodiment provided herein, it should be understood that disclosed device/terminal device and method, it can be with
It realizes by another way.For example, device described above/terminal device embodiment is only schematical, for example, institute
The division of module or unit is stated, only a kind of logical function partition, there may be another division manner in actual implementation, such as
Multiple units or components can be combined or can be integrated into another system, or some features can be ignored or not executed.Separately
A bit, shown or discussed mutual coupling or direct-coupling or communication connection can be through some interfaces, device
Or the INDIRECT COUPLING or communication connection of unit, it can be electrical property, mechanical or other forms.
The unit as illustrated by the separation member may or may not be physically separated, aobvious as unit
The component shown may or may not be physical unit, it can and it is in one place, or may be distributed over multiple
In network unit.It can select some or all of unit therein according to the actual needs to realize the mesh of this embodiment scheme
's.
It, can also be in addition, each functional unit in each embodiment of the application can integrate in one processing unit
It is that each unit physically exists alone, can also be integrated in one unit with two or more units.Above-mentioned integrated list
Member both can take the form of hardware realization, can also realize in the form of software functional units.
If the integrated module/unit be realized in the form of SFU software functional unit and as independent product sale or
In use, can store in a computer readable storage medium.Based on this understanding, the application realizes above-mentioned implementation
All or part of the process in example method, can also instruct relevant hardware to complete, the meter by computer program
Calculation machine program can be stored in a computer readable storage medium, the computer program when being executed by processor, it can be achieved that on
The step of stating each embodiment of the method.Wherein, the computer program includes computer program code, the computer program generation
Code can be source code form, object identification code form, executable file or certain intermediate forms etc..The computer-readable medium
It may include: any entity or device, recording medium, USB flash disk, mobile hard disk, magnetic that can carry the computer program code
Dish, CD, computer storage, read-only memory (ROM, Read-Only Memory), random access memory (RAM,
Random Access Memory), electric carrier signal, telecommunication signal and software distribution medium etc..It should be noted that described
The content that computer-readable medium includes can carry out increasing appropriate according to the requirement made laws in jurisdiction with patent practice
Subtract, such as in certain jurisdictions, according to legislation and patent practice, computer-readable medium do not include be electric carrier signal and
Telecommunication signal.
Embodiment described above is only to illustrate the technical solution of the application, rather than its limitations；Although referring to aforementioned reality
Example is applied the application is described in detail, those skilled in the art should understand that: it still can be to aforementioned each
Technical solution documented by embodiment is modified or equivalent replacement of some of the technical features；And these are modified
Or replacement, the spirit and scope of each embodiment technical solution of the application that it does not separate the essence of the corresponding technical solution should all
Comprising within the scope of protection of this application.
Claims (10)
1. a kind of determination method of exposure parameter characterized by comprising
Obtain at least one set of reference exposure parameter of exposure sources；
The first sample is exposed according to every group of reference exposure parameter respectively, obtains exposure corresponding with every group of reference exposure parameter
Light figure；
Respectively the corresponding exposure figure of every group of reference exposure parameter measure and obtain measurement, and according to the measurement
As a result the standard exposure parameter of the exposure sources is determined.
2. the determination method of exposure parameter as described in claim 1, which is characterized in that the reference exposure parameter includes:
The focal length of the exposure sources, the pressure value of mask plate and objective table flatness.
3. the determination method of exposure parameter as claimed in claim 2, which is characterized in that described respectively to described every group with reference to exposure
The corresponding exposure figure of optical parameter, which measure, obtains measurement, and the mark of the exposure sources is determined according to the measurement
Quasi- exposure parameter, comprising:
The corresponding exposure figure of every group of reference exposure parameter is divided at least one region according to preset rules, and will be described every
The identical zone marker in position is same class on the corresponding exposure figure of group reference exposure parameter；
Each region on the corresponding exposure figure of every group of reference exposure parameter is measured respectively；
According to measurement, it is corresponding to find out every a kind of region respectively from the corresponding exposure figure of every group of reference exposure parameter
Target light exposure product；
According to the corresponding target light exposure product in every a kind of region, the standard exposure parameter of the exposure sources is determined.
4. the determination method of exposure parameter as claimed in claim 3, which is characterized in that described according to every a kind of region pair
The target light exposure product answered determines the standard exposure parameter of the exposure sources, comprising:
Using the corresponding target light exposure product in every a kind of region such region reference exposure parameter as such region
Standard exposure parameter.
5. the determination method of exposure parameter as described in claim 1, which is characterized in that according to measurement determination
After the standard exposure parameter of exposure sources, further includes:
The second sample is exposed according to the standard exposure parameter, it is corresponding with the standard exposure parameter to obtain at least one
Exposure figure, and count the yield of the exposure figure corresponding with the standard exposure parameter；
If the yield of the exposure figure corresponding with the standard exposure parameter is less than default yield, respectively to each and institute
It states the corresponding exposure figure of standard exposure parameter and measure and obtain measurement, and redefined according to the measurement described
The standard exposure parameter of exposure sources.
6. the determination method of exposure parameter as claimed in claim 2, which is characterized in that described to obtain at least the one of exposure sources
Group reference exposure parameter, comprising:
The pressure value of the mask plate is adjusted in preset range；
The gloomy curve graph of pa is generated according to the pressure value of each mask plate in the preset range, and the gloomy curve graph of the pa is shown
To user；
The pressure value for the mask plate that user determines according to the gloomy curve graph of the pa is received, and the pressure value of the mask plate is labeled as
The reference exposure parameter.
7. a kind of determining device of exposure parameter characterized by comprising
Acquiring unit, for obtaining at least one set of reference exposure parameter of exposure sources；
Exposing unit is obtained with every group for being exposed respectively according to every group of reference exposure parameter to the first sample with reference to exposure
The corresponding exposure figure of optical parameter；
Determination unit measures knot for measure obtaining to the corresponding exposure figure of every group of reference exposure parameter respectively
Fruit, and determine according to the measurement standard exposure parameter of the exposure sources.
8. the determining device of exposure parameter as claimed in claim 7, which is characterized in that the reference exposure parameter includes:
The focal length and objective table flatness of the exposure sources.
9. the determining device of exposure parameter as claimed in claim 8, which is characterized in that the determination unit includes:
Division module, for the corresponding exposure figure of every group of reference exposure parameter to be divided at least one area according to preset rules
Domain, and be same class by the identical zone marker in position on the corresponding exposure figure of every group of reference exposure parameter；
Measurement module, for respectively to each region amount of progress on the corresponding exposure figure of every group of reference exposure parameter
It surveys；
Searching module, for being found out respectively from the corresponding exposure figure of every group of reference exposure parameter according to measurement
The corresponding target light exposure product in every one kind region；
Determining module, for determining the standard of the exposure sources according to the corresponding target light exposure product in every a kind of region
Exposure parameter.
10. a kind of terminal device, including memory, processor and storage are in the memory and can be on the processor
The computer program of operation, which is characterized in that the processor realizes such as claim 1 to 8 when executing the computer program
The step of any one the method.
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| CN201811556355.3A CN109507850B (en) | 2018-12-19 | 2018-12-19 | Exposure parameter determination method and device and terminal equipment |
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| CN201811556355.3A CN109507850B (en) | 2018-12-19 | 2018-12-19 | Exposure parameter determination method and device and terminal equipment |
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Cited By (1)
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| WO2023245511A1 (en) * | 2022-06-22 | 2023-12-28 | 重庆康佳光电技术研究院有限公司 | Process parameter adjustment method and system, and production system and computer device |
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