CN109500721A - A kind of metal polishing procedure - Google Patents

A kind of metal polishing procedure Download PDF

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Publication number
CN109500721A
CN109500721A CN201811576514.6A CN201811576514A CN109500721A CN 109500721 A CN109500721 A CN 109500721A CN 201811576514 A CN201811576514 A CN 201811576514A CN 109500721 A CN109500721 A CN 109500721A
Authority
CN
China
Prior art keywords
polishing
grinding machine
profile
annealing
polishing fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811576514.6A
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Chinese (zh)
Inventor
周恩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhejiang Hongtai Precision Technology Co Ltd
Original Assignee
Zhejiang Hongtai Precision Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhejiang Hongtai Precision Technology Co Ltd filed Critical Zhejiang Hongtai Precision Technology Co Ltd
Priority to CN201811576514.6A priority Critical patent/CN109500721A/en
Publication of CN109500721A publication Critical patent/CN109500721A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/10Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
    • B24B31/116Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using plastically deformable grinding compound, moved relatively to the workpiece under the influence of pressure
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

The invention discloses a kind of metal polishing procedures, comprising the following steps: S1, makes annealing treatment to cold rolled strip coil profile, annealing profile is made;S2, annealing profile is sent into the first grinding machine, initial chemical mechanical polishing is carried out to annealing profile using the first polishing fluid on the first grinding machine, polishing profile is made;S3, polishing profile feeding service sink is cleaned, products material is made;S4, products material feeding punching machine is punched, head product is made;S5, head product is sent into the first grinding machine, secondary chemically mechanical polishing is carried out to head product using the second polishing fluid on the first grinding machine, product is made.The polishing process process is simple, polishing efficiency is high.

Description

A kind of metal polishing procedure
Technical field
The present invention relates to field of machining, especially a kind of metal polishing procedure.
Background technique
Shell class profiled metal part, such as handset shell etc. can reach mirror effect after being chemically-mechanicapolish polished. Chemically mechanical polishing polishing is carried out for profiled metal part, the profiled metal part being punched mostly is put into storage polishing fluid In container, polishing purpose is reached by profiled metal part and the phase mutual friction of polishing fluid.The polishing process is complex, and non- Often time-consuming, reason is: in order to enable profiled metal part and polishing fluid mutually shake friction, and must avoid abnormity simultaneously It collides between metal parts or between profiled metal part and container and generates deeper scratch, so needing profiled metal Part is fixed in a reservoir, needs one by one to take out profiled metal part again after the completion of polishing, this has resulted in the structure of container Complexity places the problem complicated for operation of profiled metal part;And due to complex technical process, cause to be unable to continuous production, So that polishing process is very time-consuming, polishing efficiency is low.
Summary of the invention
The technical problem to be solved by the present invention is the CMP process mistake of profiled metal part in the prior art Problem more than journey is complicated, polishing is time-consuming.
The solution that the present invention solves its technical problem is:
A kind of metal polishing procedure, comprising the following steps: S1, cold rolled strip coil profile is made annealing treatment, annealing is made Profile;S2, annealing profile is sent into the first grinding machine, annealing profile is tentatively changed using the first polishing fluid on the first grinding machine Mechanical polishing is learned, polishing profile is made;S3, polishing profile feeding service sink is cleaned, products material is made;S4, it will produce Product raw material is sent into punching machine and is punched, and head product is made;S5, head product is sent into the first grinding machine, the is used on the first grinding machine Two polishing fluids carry out secondary chemically mechanical polishing to head product, and product is made.
Further, first polishing fluid in step S2 includes deionized water, metal oxide abrasive particle, dioxygen Water, dispersing agent.
Further, the grain size of the annealing profile in step S2 is 5.5-6.5 grades.
Further, the first grinding machine in step S2 is the first grinding machine of plane, and the first grinding machine of plane includes the first grinding machine sheet The top setting of body, the first grinding machine ontology is fluted, and the first polishing fluid is set in groove, and lower work is additionally provided in groove Platform, the top surface of lower table are lower than the liquid level of the first polishing fluid, upper table are provided with above lower table, and upper table passes It is dynamic to be connected with hydraulic cylinder.
Further, second polishing fluid in step S5 includes nano silica, water-soluble poly ether amines, deionization Water and one or both of polyacrylic acid or polyacrylate, wherein the partial size of nano silica is 50~70 nanometers.
The beneficial effects of the present invention are: annealing profile is tentatively changed due to being polished using the first grinding machine and the first grinding machine It can disposably be polished with large area when learning mechanical polishing, when secondary chemically mechanical polishing, shell product can be arranged in first Batch polishing is carried out on grinding machine, the polishing process process is simple, polishing efficiency is high.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment Attached drawing is briefly described.Obviously, described attached drawing is a part of the embodiments of the present invention, rather than is all implemented Example, those skilled in the art without creative efforts, can also be obtained according to these attached drawings other designs Scheme and attached drawing.
Fig. 1 is the cross-sectional view of the first grinding machine of the invention.
Specific embodiment
It is the embodiment of the present invention referring to Fig.1:
A kind of metal polishing procedure, comprising the following steps: S1, cold rolled strip coil profile is made annealing treatment, annealing is made Profile;S2, annealing profile is sent into the first grinding machine, annealing profile is tentatively changed using the first polishing fluid on the first grinding machine Mechanical polishing is learned, polishing profile is made;S3, polishing profile feeding service sink is cleaned, products material is made;S4, it will produce Product raw material is sent into punching machine and is punched, and head product is made;S5, head product is sent into the first grinding machine, the is used on the first grinding machine Two polishing fluids carry out secondary chemically mechanical polishing to head product, and product is made.
The surface quality of cold rolled strip coil profile is good, highly polished, dimensional accuracy is high, the surface roughness of cold rolled strip coil profile The surface roughness of the pressure roller used with cold-rolling mill is closely related, moreover, cold rolled strip coil Surface of profile have it is macroscopic, bright The aobvious texture along its direction of motion in cold-rolling mill.Since cold rolled strip coil profile mechanical performance is crisp and hard, so using annealing Processing can just be such that its toughness increases, and facilitate polishing.It is polished after annealing profile using the first polishing fluid, the texture annealed on profile becomes It obtains and is visually difficult to find.The step of washing the first polishing fluid in service sink, generally taking acid washing and water washing, by products material It is punched into head product, at this point, the surface of head product is smooth but edge roughness.Using the second polishing fluid to primiparity on the first grinding machine When product carry out secondary chemically mechanical polishing, polishing time needed for required polishing time is much smaller than step S2, because shell class produces Product are lower to the roughness requirements of shell rim.And due to being polished using the first grinding machine and the first grinding machine, profile of annealing Initial chemical can disposably be polished when mechanically polishing with large area, when secondary chemically mechanical polishing, shell product can be arranged Batch polishing is carried out on the first grinding machine, polishing process process is simple, polishing efficiency is high.
Further, first polishing fluid in step S2 includes deionized water, metal oxide abrasive particle, oxidation Agent, dispersing agent.Metal oxide abrasive particle can be aluminium oxide, colcother powder etc., and oxidant can be hydrogen peroxide etc., oxidant It will anneal after Surface of profile oxidation, and grind off oxide scale layer through abrasive particle, can be prepared by the smooth polishing profile in surface.
Further, the grain size of the annealing profile in step S2 is 5.5-6.5 grades.The annealing profile of the grain size Good processing performance and intensity are had both, is the preferred material as case material.
Further, the first grinding machine in step S2 is the first grinding machine of plane, and the first grinding machine of plane includes the first grinding machine sheet Body 1, the top setting fluted 10 of the first grinding machine ontology 1, the first polishing fluid is set in groove 10, is additionally provided in groove 10 Lower table 11, the top surface of lower table 11 are lower than the liquid level of the first polishing fluid, and the top of lower table 11 is provided with work Platform 12, upper table 12 are sequentially connected with hydraulic cylinder 2.The working principle of first grinding machine is: annealing profile is from lower table 11 It is passed through between upper table 12, upper table 12 is pressed downward by hydraulic cylinder 2, the first polishing fluid above and below profile of annealing It is all larger to the pressure of annealing profile, thus, the first polishing fluid generates sliding friction to the mobile annealing profile of the next step Power.Therefore, which can sequentially enter the first grinding machine, clear from annealing operation with can connect with continuous production, processed profile Wash pool, punching machine, greatly improve production efficiency.
Further, second polishing fluid in step S5 includes nano silica, water-soluble poly ether amines, deionization Water and one or both of polyacrylic acid or polyacrylate, wherein the partial size of nano silica is 50~70 nanometers. In this way, step S5 both can the section to head product polished to a certain extent, can also further polish through the first grinding machine The smooth face polished.Since punching machine makes head product produce the peripheral portion of tensile deformation, especially shell product, but It is not generate obvious deformation on the main face of shell product, and the quality requirement of the section of shell product is generally told somebody what one's real intentions are, institute The quality in main face can be improved with the process, while also meeting the requirement of section, the shell product surface quality of polishing is high.
The above is only the preferred embodiment of the present invention, therefore cannot be limited the scope of implementation of the present invention with this, i.e., according to Equivalent changes and modifications made by scope of the present invention patent and description should still belong to the model that the invention patent covers In enclosing.

Claims (5)

1. a kind of metal polishing procedure, which comprises the following steps:
S1, cold rolled strip coil profile is made annealing treatment, annealing profile is made;
S2, annealing profile is sent into the first grinding machine, annealing profile is tentatively changed using the first polishing fluid on the first grinding machine Mechanical polishing is learned, polishing profile is made;
S3, polishing profile feeding service sink is cleaned, products material is made;
S4, products material feeding punching machine is punched, head product is made;
S5, head product is sent into the first grinding machine, secondary chemical machine is carried out to head product using the second polishing fluid on the first grinding machine Tool polishing, is made product.
2. a kind of metal polishing procedure according to claim 1, it is characterised in that: first polishing fluid in step S2 Including deionized water, metal oxide abrasive particle, hydrogen peroxide, dispersing agent.
3. a kind of metal polishing procedure according to claim 1, it is characterised in that: the annealing profile in step S2 Grain size is 5.5-6.5 grades.
4. a kind of metal polishing procedure according to claim 1, it is characterised in that: the first grinding machine in step S2 is plane First grinding machine, the first grinding machine of plane include the first grinding machine ontology (1), and the top setting of the first grinding machine ontology (1) is fluted (10), the first polishing fluid is set in groove (10), is additionally provided in groove (10) lower table (11), the top surface of lower table (11) It lower than the liquid level of the first polishing fluid, is provided with above lower table (11) upper table (12), upper table (12) transmission connects It is connected to hydraulic cylinder (2).
5. a kind of metal polishing procedure according to claim 1, it is characterised in that: second polishing fluid in step S5 Including nano silica, water-soluble poly ether amines, deionized water and one of polyacrylic acid or polyacrylate or two Kind, wherein the partial size of nano silica is 50~70 nanometers.
CN201811576514.6A 2018-12-22 2018-12-22 A kind of metal polishing procedure Pending CN109500721A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811576514.6A CN109500721A (en) 2018-12-22 2018-12-22 A kind of metal polishing procedure

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Application Number Priority Date Filing Date Title
CN201811576514.6A CN109500721A (en) 2018-12-22 2018-12-22 A kind of metal polishing procedure

Publications (1)

Publication Number Publication Date
CN109500721A true CN109500721A (en) 2019-03-22

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112720142A (en) * 2020-12-25 2021-04-30 扬州奇力新能源科技有限公司 Aluminum tube polishing process method
WO2021121049A1 (en) * 2019-12-19 2021-06-24 安集微电子科技(上海)股份有限公司 Chemical mechanical polishing liquid

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50119756A (en) * 1974-03-07 1975-09-19
CN1746122A (en) * 2004-12-03 2006-03-15 李凡 Production of fibre-optical panel
CN102699811A (en) * 2012-05-29 2012-10-03 上海瑞钼特金属新材料有限公司 Infusible metal alloy foil part with high surface smoothness and preparation method thereof
CN105014309A (en) * 2014-04-30 2015-11-04 深圳市鑫韵珠宝有限公司 Double-surface cold pressing process of thin noble metal
CN105150031A (en) * 2015-06-18 2015-12-16 江苏苏创光学器材有限公司 Production method for sapphire frameless touch screen panel
CN205271690U (en) * 2015-12-30 2016-06-01 河南工业职业技术学院 Automatic change grinder
CN105908011A (en) * 2016-05-11 2016-08-31 万安达精密零组件(深圳)有限公司 Machining process for conductive contact piece
CN106112791A (en) * 2016-07-01 2016-11-16 大连理工常州研究院有限公司 Titanium alloy grinds and cmp method
CN205799144U (en) * 2016-05-27 2016-12-14 深圳市联懋塑胶有限公司 A kind of mobile phone shell processing polished device
CN108315609A (en) * 2018-01-24 2018-07-24 合肥同佑电子科技有限公司 A kind of aluminum alloy casing of electronic product

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50119756A (en) * 1974-03-07 1975-09-19
CN1746122A (en) * 2004-12-03 2006-03-15 李凡 Production of fibre-optical panel
CN102699811A (en) * 2012-05-29 2012-10-03 上海瑞钼特金属新材料有限公司 Infusible metal alloy foil part with high surface smoothness and preparation method thereof
CN105014309A (en) * 2014-04-30 2015-11-04 深圳市鑫韵珠宝有限公司 Double-surface cold pressing process of thin noble metal
CN105150031A (en) * 2015-06-18 2015-12-16 江苏苏创光学器材有限公司 Production method for sapphire frameless touch screen panel
CN205271690U (en) * 2015-12-30 2016-06-01 河南工业职业技术学院 Automatic change grinder
CN105908011A (en) * 2016-05-11 2016-08-31 万安达精密零组件(深圳)有限公司 Machining process for conductive contact piece
CN205799144U (en) * 2016-05-27 2016-12-14 深圳市联懋塑胶有限公司 A kind of mobile phone shell processing polished device
CN106112791A (en) * 2016-07-01 2016-11-16 大连理工常州研究院有限公司 Titanium alloy grinds and cmp method
CN108315609A (en) * 2018-01-24 2018-07-24 合肥同佑电子科技有限公司 A kind of aluminum alloy casing of electronic product

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021121049A1 (en) * 2019-12-19 2021-06-24 安集微电子科技(上海)股份有限公司 Chemical mechanical polishing liquid
CN112720142A (en) * 2020-12-25 2021-04-30 扬州奇力新能源科技有限公司 Aluminum tube polishing process method

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Application publication date: 20190322