CN109411391A - A kind of sensor monocrystalline silicon etching device with refrigerating function - Google Patents
A kind of sensor monocrystalline silicon etching device with refrigerating function Download PDFInfo
- Publication number
- CN109411391A CN109411391A CN201811148641.6A CN201811148641A CN109411391A CN 109411391 A CN109411391 A CN 109411391A CN 201811148641 A CN201811148641 A CN 201811148641A CN 109411391 A CN109411391 A CN 109411391A
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- CN
- China
- Prior art keywords
- reaction chamber
- water inlet
- bracket
- monocrystalline silicon
- cooling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
Abstract
The present invention is to be related to the technical field of sensor monocrystalline silicon, it is specifically related to a kind of sensor monocrystalline silicon etching device with refrigerating function, the Rotational Cylindrical and reaction chamber are rotatablely connected, the Rotational Cylindrical lower plane offers comb channel, cooling chamber is offered in the Circular Plate, the cooling chamber is connected to comb channel；Cooling tube is provided in the cooling chamber, the reaction chamber lower end is fixedly connected with bracket, drainpipe and water inlet pipe through bracket is fixedly connected on the bracket, and drainpipe and water inlet pipe protrude into comb channel；The water inlet of the cooling tube is connected to water inlet pipe, and the water outlet of cooling tube is connected to outlet pipe, and the present invention has many advantages, such as easy to use, raising etching effect, good cooling effect.
Description
Technical field
The present invention is to be related to the technical field of sensor monocrystalline silicon, is specifically related to a kind of sensor with refrigerating function
Monocrystalline silicon etching device.
Background technique
Sensor in process, is both needed to perform etching it processing with monocrystalline silicon；During existing lithography,
It is overlayed on horse often through by multiple monocrystalline silicon, and by importing reaction gas to horse position, and is made
Reaction gas generates plasma under electric field environment, to perform etching to monocrystalline silicon；Horse usually requires in etching process
It is rotated to increase contact evenness of the monocrystalline silicon with plasma, during present sensor monocrystalline silicon etching device, meeting
A large amount of heat is generated, if heat cannot be removed timely, certain destruction will be caused to the etching of monocrystalline silicon, influence product
Quality, and existing monocrystalline silicon etching device heat dissipation effect is weaker.
Summary of the invention
In view of the foregoing deficiencies of prior art, the purpose of the present invention is to provide a kind of sensings with refrigerating function
Device monocrystalline silicon etching device, for solving the problems, such as that existing sensor monocrystalline silicon etching device heat-sinking capability is weak.
In order to achieve the above objects and other related objects, the invention discloses a kind of sensor monocrystalline with refrigerating function
Silicon etching device includes reaction chamber, and the upper end of reaction chamber is provided with air duct, is connected to and is arranged outside reaction chamber
Gas source room, the lower end of reaction chamber is provided with pump-line, is connected to the vacuum pump being arranged in outside reaction chamber；It is described anti-
Outside is answered to be provided with electromagnetic coil；The axial location of the reaction chamber is provided with horse, and the horse is by Rotational Cylindrical and uniformly
It is fixedly connected on the Circular Plate composition of rotation column outer wall；
The Rotational Cylindrical and reaction chamber are rotatablely connected, and the Rotational Cylindrical lower plane offers comb channel, opens in the Circular Plate
Equipped with cooling chamber, the cooling chamber is connected to comb channel；Cooling tube is provided in the cooling chamber, the reaction chamber lower end is solid
Surely it is connected with bracket, drainpipe and water inlet pipe through bracket are fixedly connected on the bracket, and drainpipe is stretched with water inlet pipe
Enter in comb channel；The water inlet of the cooling tube is connected to water inlet pipe, and the water outlet of cooling tube is connected to outlet pipe.
It is preferred: to be fixedly connected with servo motor on the bracket, be fixedly connected on the output shaft of the servo motor
Gear two, the Rotational Cylindrical lower end are fixedly connected with the gear one ratcheting with gear two.
Preferred: the cooling tube is spiral shape.
As described above, a kind of sensor monocrystalline silicon etching device with refrigerating function of the invention, has beneficial below
Effect: cooling chamber is opened up in the Circular Plate for placing monocrystalline silicon piece, and cooling tube is placed in cooling chamber, in irrigation and drainage channel
Setting water inlet pipe and outlet pipe are connected to cooling tube respectively, and outlet pipe and water inlet pipe are fixed on bracket, so that water inlet pipe,
Cooling tube, outlet pipe will not follow Rotational Cylindrical and Circular Plate to rotate, then can be to Circular Plate by injecting cold water into water inlet pipe
Play the role of cooling, cooling effect is obvious.
Detailed description of the invention
Fig. 1 is a kind of main view of the sensor monocrystalline silicon etching device with refrigerating function of the present invention.
Fig. 2 is the cross-sectional view of horse of the present invention.
Fig. 3 is the top view of cooling tube of the present invention.
Wherein: reaction chamber 1, air duct 2, gas source room 3, pump-line 4, vacuum pump 5, horse 6, Rotational Cylindrical 61, comb
Channel 611, Circular Plate 62, cooling chamber 621, servo motor 7, electromagnetic coil 8, gear 1, bracket 10, gear 2 11, drainpipe
12, cooling tube 13, water inlet pipe 14.
Specific embodiment
Embodiments of the present invention are illustrated by particular specific embodiment below, those skilled in the art can be by this explanation
Content disclosed by book is understood other advantages and efficacy of the present invention easily.
Embodiment 1
As shown in Figure 1-3, the invention discloses a kind of sensor monocrystalline silicon etching device with refrigerating function, includes reaction
Room 1, the upper end of reaction chamber 1 are provided with air duct 2, are connected to the gas source room 3 being arranged in outside reaction chamber 1, reaction chamber 1
Lower end be provided with pump-line 4, be connected to the vacuum pump 5 being arranged in outside reaction chamber 1；It is set on the outside of the reaction chamber 1
It is equipped with electromagnetic coil 8；The axial location of the reaction chamber 1 is provided with horse 6, and the horse 6 is fixed by Rotational Cylindrical 61 and uniformly
The Circular Plate 62 for being connected to 61 outer wall of Rotational Cylindrical forms；
The Rotational Cylindrical 61 is rotatablely connected with reaction chamber 1, and 61 lower plane of Rotational Cylindrical offers comb channel 611, the circle
Cooling chamber 621 is offered in ring flat-plate 62, the cooling chamber 621 is connected to comb channel 611；It is provided in the cooling chamber 621
Cooling tube 13,1 lower end of reaction chamber are fixedly connected with bracket 10, the row through bracket 10 are fixedly connected on the bracket 10
Water pipe 12 and water inlet pipe 14, and drainpipe 12 and water inlet pipe 14 protrude into comb channel 611；The water inlet of the cooling tube 13 with
Water inlet pipe 14 is connected to, and the water outlet of cooling tube 13 is connected to outlet pipe 12.
It is preferred: servo motor 7, fixed company on the output shaft of the servo motor 7 are fixedly connected on the bracket 10
It is connected to gear 2 11,61 lower end of Rotational Cylindrical is fixedly connected with the gear one 9 ratcheting with gear 2 11.
Preferred: the cooling tube 13 is spiral shape.
The present invention is implemented:
According to [Fig. 1] [Fig. 2] [Fig. 3], rotated by servo motor 7 by 2 11 band moving gear 1 of gear, gear 1 drives
Rotational Cylindrical 61 rotates, and Rotational Cylindrical 61 drives Circular Plate 62 to rotate, since 1 lower end of reaction chamber is fixedly connected with bracket 10, bracket 10
On be fixedly connected with drainpipe 12 and water inlet pipe 14 through bracket 10, therefore water inlet pipe 14, cooling tube 13, outlet pipe 12 will not
Rotational Cylindrical 61 and Circular Plate 62 is followed to rotate, by the coolant liquid by cooling tube 13 by the heat absorption in Circular Plate 62, and
It is discharged by outlet pipe 12, temperature protection effectively is carried out to the etching process of sensor monocrystalline silicon.
Beneficial effects of the present invention:
Cooling chamber 621 is opened up in the Circular Plate 62 for placing monocrystalline silicon piece, and cooling tube 13 is placed in cooling Room 621,
Setting water inlet pipe 14 and outlet pipe 12 are connected to cooling tube 13 respectively in irrigation and drainage channel 611, and by outlet pipe 12 and water inlet pipe 14
It fixes over the mount 10, so that water inlet pipe 14, cooling tube 13, outlet pipe 12 will not follow Rotational Cylindrical 61 and Circular Plate 62 to rotate,
It can play the role of cooling to Circular Plate 62 by injecting cold water into water inlet pipe 14 again, cooling effect is obvious.
Finally, it should be noted that above embodiments are only to illustrate the present invention and not limit technology described in the invention
Scheme；Therefore, although this specification is referring to above-mentioned each embodiment, the present invention has been described in detail, this
Field it is to be appreciated by one skilled in the art that still can modify to the present invention or equivalent replacement；And all do not depart from this
The technical solution and its improvement of the spirit and scope of invention, should all cover within the scope of the claims of the present invention.
Claims (3)
1. a kind of sensor monocrystalline silicon etching device with refrigerating function includes reaction chamber, the upper end setting of reaction chamber
There is air duct, be connected to the gas source room being arranged in outside reaction chamber, the lower end of reaction chamber is provided with pump-line, connects
It is connected to the vacuum pump being arranged in outside reaction chamber；Electromagnetic coil is provided on the outside of the reaction chamber；The axis position of the reaction chamber
It installs and is equipped with horse, the horse is made of Rotational Cylindrical with the Circular Plate for being uniformly fixedly connected on rotation column outer wall；Its feature exists
In:
The Rotational Cylindrical and reaction chamber are rotatablely connected, and the Rotational Cylindrical lower plane offers comb channel, opens in the Circular Plate
Equipped with cooling chamber, the cooling chamber is connected to comb channel；Cooling tube is provided in the cooling chamber, the reaction chamber lower end is solid
Surely it is connected with bracket, drainpipe and water inlet pipe through bracket are fixedly connected on the bracket, and drainpipe is stretched with water inlet pipe
Enter in comb channel；The water inlet of the cooling tube is connected to water inlet pipe, and the water outlet of cooling tube is connected to outlet pipe.
2. a kind of sensor monocrystalline silicon etching device with refrigerating function according to claim 1, it is characterised in that: institute
It states and is fixedly connected with servo motor on bracket, gear two, the Rotational Cylindrical are fixedly connected on the output shaft of the servo motor
Lower end is fixedly connected with the gear one ratcheting with gear two.
3. a kind of sensor monocrystalline silicon etching device with refrigerating function according to claim 2, it is characterised in that: institute
Stating cooling tube is spiral shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811148641.6A CN109411391A (en) | 2018-09-29 | 2018-09-29 | A kind of sensor monocrystalline silicon etching device with refrigerating function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811148641.6A CN109411391A (en) | 2018-09-29 | 2018-09-29 | A kind of sensor monocrystalline silicon etching device with refrigerating function |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109411391A true CN109411391A (en) | 2019-03-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811148641.6A Pending CN109411391A (en) | 2018-09-29 | 2018-09-29 | A kind of sensor monocrystalline silicon etching device with refrigerating function |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109411391A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1582489A (en) * | 2001-09-03 | 2005-02-16 | 东京毅力科创株式会社 | Substrate treating device and substrate treating method |
| US20060191482A1 (en) * | 2005-02-04 | 2006-08-31 | Seiichiro Kanno | Apparatus and method for processing wafer |
| US8372212B2 (en) * | 2011-04-04 | 2013-02-12 | Kabushiki Kaisha Toshiba | Supercritical drying method and apparatus for semiconductor substrates |
| CN105161411A (en) * | 2015-07-09 | 2015-12-16 | 江苏德尔森传感器科技有限公司 | Sensor monocrystal silicon etching device capable of realizing positioning and processing |
-
2018
- 2018-09-29 CN CN201811148641.6A patent/CN109411391A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1582489A (en) * | 2001-09-03 | 2005-02-16 | 东京毅力科创株式会社 | Substrate treating device and substrate treating method |
| US20060191482A1 (en) * | 2005-02-04 | 2006-08-31 | Seiichiro Kanno | Apparatus and method for processing wafer |
| US8372212B2 (en) * | 2011-04-04 | 2013-02-12 | Kabushiki Kaisha Toshiba | Supercritical drying method and apparatus for semiconductor substrates |
| CN105161411A (en) * | 2015-07-09 | 2015-12-16 | 江苏德尔森传感器科技有限公司 | Sensor monocrystal silicon etching device capable of realizing positioning and processing |
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Application publication date: 20190301 |