CN109402584B - Magnetron sputtering vacuum coating device with adjustable sputtering distance - Google Patents
Magnetron sputtering vacuum coating device with adjustable sputtering distance Download PDFInfo
- Publication number
- CN109402584B CN109402584B CN201811461918.0A CN201811461918A CN109402584B CN 109402584 B CN109402584 B CN 109402584B CN 201811461918 A CN201811461918 A CN 201811461918A CN 109402584 B CN109402584 B CN 109402584B
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- China
- Prior art keywords
- lifting
- substrate frame
- translation
- magnetron sputtering
- vacuum coating
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- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 24
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 14
- 238000004544 sputter deposition Methods 0.000 title abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 75
- 230000007246 mechanism Effects 0.000 claims abstract description 57
- 238000000227 grinding Methods 0.000 claims abstract description 15
- 230000005540 biological transmission Effects 0.000 claims description 7
- 238000005498 polishing Methods 0.000 claims description 2
- 230000013011 mating Effects 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 9
- 230000033001 locomotion Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 3
- 230000000670 limiting effect Effects 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a magnetron sputtering vacuum coating device with adjustable sputtering distance, which comprises: the vacuum chamber is internally provided with a substrate frame and a conveying mechanism for conveying the substrate frame, and the bottom of the substrate frame is provided with a grinding rod; the lifting mechanism for supporting the substrate frame comprises a lifting sliding block capable of vertically lifting and a lifting sliding seat matched with the lifting sliding block, and the lifting sliding block is provided with a supporting part matched with the end part of the grinding rod; and a translation mechanism for driving the lifting mechanism and the substrate frame to move along the advancing direction of the vertical conveying mechanism after the substrate frame is lifted. According to the invention, the translation mechanism and the lifting mechanism are arranged, before the substrate frame is translated, the substrate frame is supported, and then the translation mechanism is utilized to carry out integral movement, so that the distance between the substrate and the target can be adjusted according to the process requirement, and the coating quality is improved.
Description
Technical Field
The invention relates to a vacuum coating device, in particular to a magnetron sputtering vacuum coating device with an adjustable sputtering distance.
Background
The existing continuous vacuum coating device generally comprises a plurality of vacuum chambers which are connected in sequence, wherein a transmission device is arranged at the bottom of each vacuum chamber, a substrate frame for vertically fixing a substrate is carried on the transmission device, the distance between the conventional substrate frame and a target is fixed, but due to the process, the distance between some substrate frames and the target is too far or too close, so that the coating quality is poor.
As CN101838799B discloses a horizontal high-temperature vacuum coating production line, which comprises a frame, vacuum buffer boxes, a vacuum coating box, a substrate frame conveying mechanism and an automatic loading and unloading mechanism, wherein the vacuum coating box is arranged in the middle of the upper part of the frame, the vacuum buffer boxes are divided into two groups and are respectively arranged on the frames at two ends of the vacuum coating box, pneumatic flap valves are arranged between the vacuum buffer boxes and the vacuum coating box, and the two ends of the frame are respectively provided with an automatic loading and unloading mechanism; a substrate frame conveying mechanism connected with the automatic loading and unloading mechanism is respectively arranged at the lower part of the frame and the bottoms of the vacuum buffer box body and the vacuum coating box body; the vacuum coating box body is also internally provided with a target gun and a heater.
As another example, CN108774731a discloses a vacuum chamber substrate frame lifting mechanism of a vacuum coating machine, two cylinders are fixed below a bottom plate of the vacuum chamber, piston rod ends of the two cylinders are connected to the same end plate, two ends of the end plate are respectively provided with a support rod, the support rods penetrate through the bottom plate of the vacuum chamber and extend into the vacuum chamber, top ends of the support rods are connected with a support seat, a sealing plate is arranged at the position of the support rods penetrating through the bottom plate of the vacuum chamber, a corrugated pipe is sleeved outside the support rods between the vacuum chamber and the end plate, and two ends of the corrugated pipe are respectively connected with the sealing plate and the end plate in a sealing manner. The lifting mechanism is mainly used for supporting the substrate frames, so that a plurality of substrate frames can independently operate and the distance between the substrate frames and the target cannot be changed.
Disclosure of Invention
The invention discloses a magnetron sputtering vacuum coating device with an adjustable sputtering distance, which can adjust the distance between a substrate and a target material and improve the coating quality.
A magnetron sputtering vacuum coating device with adjustable sputtering distance comprises:
the vacuum chamber is internally provided with a substrate frame and a conveying mechanism for conveying the substrate frame, and the bottom of the substrate frame is provided with a grinding rod;
the lifting mechanism for supporting the substrate frame comprises a lifting sliding block capable of vertically lifting and a lifting sliding seat matched with the lifting sliding block, and the lifting sliding block is provided with a supporting part matched with the end part of the grinding rod;
and a translation mechanism for driving the lifting mechanism and the substrate frame to move along the advancing direction of the vertical conveying mechanism after the substrate frame is lifted.
Under the condition that other limiting mechanisms are not arranged, the independent supporting parts are insufficient to ensure that the substrate is in an upright state, in order to solve the problem, hooks which are rotationally connected with the lifting sliding seat are arranged on the lifting sliding seat, a linkage rod which drives the hooks to rotate and then lift the substrate frame is arranged between the hooks and the lifting sliding block, and positioning blocks matched with the hooks are arranged on the side edges of the substrate frame. By providing two support points on each side edge of each substrate holder, the substrate holders are not tilted.
Preferably, the lifting mechanism comprises a lifting screw rod for driving the sliding block to lift, and the lifting screw rod is connected with the lifting motor through a transmission mechanism. The sliding block is driven to lift through the screw rod mechanism, so that the moving precision of the sliding block can be ensured.
Because the space below the lifting slide is small enough to put the motor, in one embodiment of the invention, the translation mechanism comprises a translation slide block, the lifting motor is fixed on the translation slide block, a base is arranged below the lifting slide block and is in sliding fit with the lifting slide block, and the translation slide block and the lifting slide block are connected through a connecting rod.
More preferably, the lifting motor and the translation mechanism are positioned outside the vacuum chamber, the connecting rod passes through the side wall of the vacuum chamber, and a corrugated pipe sleeved outside the connecting rod is arranged between the translation sliding seat and the side wall of the vacuum chamber. Because the connecting rod passes through the side wall of the vacuum chamber and can slide relatively, the corrugated pipe is arranged between the translation sliding seat and the side wall of the vacuum chamber, and can stretch out and draw back without influencing the movement of the connecting rod, and external air can not enter the vacuum chamber to keep a vacuum state.
More preferably, the transmission mechanism is a bevel gear set, and the motion of the motor output shaft is transmitted to the screw rod of the screw rod through the bevel gear set.
More preferably, the lifting slide seat is hollow, the lifting screw rod is vertically arranged in the hollow cavity of the lifting slide seat, and the nut of the lifting screw rod is connected with the lifting slide seat through the connecting piece.
Preferably, the support part is provided with a V-shaped groove matched with the grinding rod, and the V-shaped groove can prevent the grinding rod from sliding off the support part.
Preferably, the conveying mechanism comprises a plurality of rollers which are positioned on the same horizontal line, and grooves matched with the grinding rods are formed in the circumferential surfaces of the rollers.
Preferably, the top of the substrate frame is provided with a lifting magnetic conduction mechanism.
According to the invention, the translation mechanism and the lifting mechanism are arranged, before the substrate frame is translated, the substrate frame is supported, and then the translation mechanism is utilized to carry out integral movement, so that the distance between the substrate and the target can be adjusted according to the process requirement, and the coating quality is improved.
Drawings
FIG. 1 is a schematic perspective view of a coating device according to the present invention.
Fig. 2 is a schematic diagram of the front structure of the coating device of the present invention.
Fig. 3 is a partial enlarged view of fig. 1.
FIG. 4 is a schematic view of the structure of the coating device before the substrate rack is supported.
FIG. 5 is a schematic view showing the structure of the film plating apparatus of the present invention when the substrate holder is lifted.
FIG. 6 is a schematic view of the structure of the coating device of the present invention after translating the substrate holder.
Detailed Description
As shown in fig. 1, a magnetron sputtering vacuum coating device comprises a vacuum chamber 6, wherein a conveying mechanism consisting of a plurality of rollers 5 which are positioned on the same horizontal straight line is arranged at the bottom of the vacuum chamber 6, a substrate frame 1 is arranged above the conveying mechanism, the substrate frame 1 is used for fixing a substrate to be coated, a target is arranged on the right opposite side of the substrate frame 1, and a coating film is formed on the substrate by depositing the target after sputtering.
The bottom of the substrate frame 1 is provided with a grinding rod 11, the circumferential surface of the roller 5 is provided with a groove matched with the grinding rod 11, and the groove has a limiting effect on the substrate frame 1 and prevents the substrate frame from moving transversely. The upper part of the substrate frame 1 is also provided with a magnetic conduction mechanism 4, and the magnetic conduction mechanism 4 has magnetic attraction to the substrate frame 1, so that the substrate frame 1 can be in an upright state.
In order to be able to adjust the distance between the substrate holder 1 and the target, the substrate holder 1 is provided with a lifting mechanism 2 and a translation mechanism 3 on both sides. As described above, the polishing rod is clamped in the groove of the roller 5 and cannot move laterally, and the substrate holder 1 needs to be lifted by the lifting mechanism 2, separated from the groove of the roller 5, and then translated.
The lifting mechanism 2 comprises a lifting slide seat 21 and a lifting slide block 22, the inside of the lifting slide seat 21 is hollow, a lifting screw rod 25 is arranged in the hollow cavity of the inside, a nut 251 of the lifting screw rod 25 is connected with the lifting slide block 22 through a connecting piece, and the side wall of the lifting slide seat 21 is provided with a notch for avoiding the movement of the connecting piece. As shown in fig. 3, the bottom of the screw 252 of the lifting screw 25 is in transmission connection with the output shaft of the lifting motor 26 through a bevel gear set 27.
The bottom of the lifting slider 22 is provided with a support portion 221, the support portion 221 is provided with a V-shaped groove 222 which is matched with the end portion of the grinding rod 11, and the V-shaped groove 222 is composed of two stoppers provided on the support portion 221. The top of the lifting slide seat 21 is provided with a hook 23 which is rotationally connected with the lifting slide seat, a linkage rod 24 is arranged between the hook 23 and the lifting slide seat 22, and two ends of the linkage rod 24 are respectively hinged with the hook and the lifting slide seat.
When the lifting slide block 22 moves along the lifting slide seat 21, the linkage rod 24 drives the hook 23 to rotate, so that the hook 23 can be matched with the positioning block 12 at the side edge of the substrate frame 1. By the support of the two support points, the substrate holder 1 can be kept in an upright state while the substrate holder 1 is held up. Of course, the hooks are not required, and only the limiting blocks or the guide grooves are arranged on the sliding seat, and the side walls of the limiting blocks or the guide grooves are attached to the two side surfaces of the substrate frame 1, so that the substrate frame is kept in an upright state.
The translation mechanism 3 comprises a translation sliding seat 31, a translation sliding block 32 and a translation motor 34, an output shaft of the translation motor 34 is connected with a translation screw rod, the translation sliding block 32 is fixed with a nut of the translation screw rod, and the lifting motor 26 is fixed on the translation sliding block 32. In order to enable the lifting slide carriage 21 to translate along with the lifting slide carriage, a connecting rod 27 is arranged between the lifting slide carriage 21 and the translation slide carriage 31, and an output shaft of the lifting motor 26 penetrates through the connecting rod 27 and is linked with the bottom end of the lifting screw rod 25 through a bevel gear set. The bottom of the translation slide 21 is provided with a seat 33 in sliding engagement therewith, the sliding direction of which coincides with the sliding direction of the translation slide 31. The purpose of this arrangement is mainly to enable the lifting motor to be placed horizontally, the bottom of the vacuum chamber 6 having insufficient room for the lifting motor 26.
The connecting rod 27 passes through the side wall of the vacuum chamber 6 and can slide relatively, so that a corrugated pipe 28 is sleeved at the connecting rod, and two ends of the corrugated pipe 28 are respectively connected with the side wall of the vacuum chamber 6 and the translation sliding seat 31 in a sealing way. As the link 27 slides relative to the vacuum chamber 6, the bellows 28 expands or contracts, so that the movement of the mechanisms is not hindered, and the air tightness of the vacuum chamber 6 can be ensured.
As shown in fig. 2, the magnetic conduction mechanism 4 comprises a magnetic guide block 41, a magnetic conduction lifting slide block 43 and a magnetic conduction block lifting motor 42, an output shaft of the lifting motor 42 is connected with a lead screw, a nut of the lead screw is fixedly connected with the magnetic conduction lifting slide block 43, the magnetic conduction lifting slide block 43 is connected with a magnetic conduction installation seat through a connecting rod 44, and the magnetic conduction block 41 is fixed on the magnetic conduction installation seat. The connecting rod 44 is also sleeved with a corrugated pipe 45, and two ends of the corrugated pipe 45 are respectively connected with the base 46 and the magnetic conduction lifting slide block 43 so as to ensure the air tightness of the vacuum chamber 6. In this embodiment, two groups of magnetic guiding mechanisms 4 are provided, one group is used for feeding and the other group is used for discharging, so that the length of the production line can be reduced.
The working principle of the invention is as follows:
in the initial state, as shown in fig. 4, when the lifting mechanism 2 is completely separated from the substrate frame 1 and the distance between the substrate frame 1 and the target needs to be adjusted, as shown in fig. 5, the lifting motor 26 is started to drive the lifting slide block 22 to lift, the supporting part 221 of the lifting slide block 22 supports the grinding rod 11, the hook 23 hooks the positioning block 12, so that the substrate frame 1 is lifted vertically and integrally until the grinding rod is separated from the roller 5, and then the magnetic guide block 41 is lifted until the magnetic attraction force of the magnetic guide block on the substrate frame 1 disappears or is weakened so as not to affect the translation of the substrate frame.
As shown in fig. 6, the translation motor 34 is started, the translation slide block 32, the lifting motor 26 and the lifting slide carriage 21 are driven to translate simultaneously, the distance between the substrate frame 1 and the target is adjusted, after the film plating is completed, the translation motor 24 is started, the position of the substrate frame 1 returns to be right above the roller 5, then the magnetic guide block 41 descends, the magnetic attraction force on the substrate frame 1 is maintained, finally the lifting motor 26 is started, and the lifting slide block 22 descends until the substrate frame 1 falls on the roller 5.
Claims (7)
1. The utility model provides a magnetron sputtering vacuum coating device of sputter distance adjustable which characterized in that includes:
the vacuum chamber is internally provided with a substrate frame and a conveying mechanism for conveying the substrate frame, and the bottom of the substrate frame is provided with a grinding rod;
the lifting mechanism for supporting the substrate frame comprises a lifting sliding block capable of vertically lifting and a lifting sliding seat matched with the lifting sliding block, and the lifting sliding block is provided with a supporting part matched with the end part of the grinding rod;
and a translation mechanism for driving the lifting mechanism and the substrate frame to move along the advancing direction of the vertical conveying mechanism after the substrate frame is supported;
the lifting slide seat is provided with a hook which is rotationally connected with the lifting slide seat, a linkage rod which drives the hook to rotate and then supports the substrate frame is arranged between the hook and the lifting slide block, and the side edge of the substrate frame is provided with a positioning block matched with the hook;
the lifting mechanism comprises a lifting screw rod for driving the sliding block to lift, and the lifting screw rod is connected with the lifting motor through the transmission mechanism;
the translation mechanism comprises a translation sliding seat, a translation sliding block and a translation motor, wherein the lifting motor is fixed on the translation sliding block, a base is arranged below the translation sliding seat and is in sliding fit with the translation sliding seat, and the translation sliding seat is connected with the lifting sliding seat through a connecting rod.
2. The magnetron sputtering vacuum coating apparatus as in claim 1 wherein the lift motor and translation mechanism are located outside the vacuum chamber, the link passes through a vacuum chamber sidewall, and a bellows is provided between the translation carriage and the vacuum chamber sidewall that is sleeved outside the link.
3. The magnetron sputtering vacuum coating apparatus as in claim 1 wherein the transmission mechanism is a bevel gear set.
4. The magnetron sputtering vacuum coating device according to claim 1, wherein the lifting slide seat is hollow, the lifting screw rod is vertically arranged in the cavity of the lifting slide seat, and a nut of the lifting screw rod is connected with the lifting slide seat through a connecting piece.
5. The magnetron sputtering vacuum coating apparatus as in claim 1 wherein the support portion is provided with a V-shaped groove that mates with the grinding rod.
6. The magnetron sputtering vacuum coating apparatus as in claim 1 wherein the transfer mechanism comprises a plurality of rollers on the same horizontal line, the circumferential surfaces of the rollers having grooves for mating with the polishing bars.
7. The magnetron sputtering vacuum coating device as in claim 1 wherein the top of the substrate holder is provided with a lifting magnetic guide mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811461918.0A CN109402584B (en) | 2018-11-30 | 2018-11-30 | Magnetron sputtering vacuum coating device with adjustable sputtering distance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811461918.0A CN109402584B (en) | 2018-11-30 | 2018-11-30 | Magnetron sputtering vacuum coating device with adjustable sputtering distance |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109402584A CN109402584A (en) | 2019-03-01 |
| CN109402584B true CN109402584B (en) | 2024-03-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811461918.0A Active CN109402584B (en) | 2018-11-30 | 2018-11-30 | Magnetron sputtering vacuum coating device with adjustable sputtering distance |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111485218B (en) * | 2020-04-22 | 2022-06-17 | 广东生波尔光电技术有限公司 | Automatic control system for auxiliary coating of special workpiece |
| CN113445013B (en) * | 2021-06-28 | 2022-06-03 | 哈尔滨工业大学 | High-power magnetron sputtering film deposition device and method for inner wall of rotor bearing inner ring |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108866504A (en) * | 2018-07-31 | 2018-11-23 | 湖南玉丰真空科学技术有限公司 | A kind of vacuum coating equipment substrate frame conveyer system |
| CN209669342U (en) * | 2018-11-30 | 2019-11-22 | 浙江上方电子装备有限公司 | It is a kind of to sputter apart from adjustable magnetic control sputtering vacuum coating device |
-
2018
- 2018-11-30 CN CN201811461918.0A patent/CN109402584B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108866504A (en) * | 2018-07-31 | 2018-11-23 | 湖南玉丰真空科学技术有限公司 | A kind of vacuum coating equipment substrate frame conveyer system |
| CN209669342U (en) * | 2018-11-30 | 2019-11-22 | 浙江上方电子装备有限公司 | It is a kind of to sputter apart from adjustable magnetic control sputtering vacuum coating device |
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|---|---|
| CN109402584A (en) | 2019-03-01 |
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