CN109402578B - Method for preparing high-entropy alloy coating based on reactive magnetron sputtering technology - Google Patents
Method for preparing high-entropy alloy coating based on reactive magnetron sputtering technology Download PDFInfo
- Publication number
- CN109402578B CN109402578B CN201910017536.7A CN201910017536A CN109402578B CN 109402578 B CN109402578 B CN 109402578B CN 201910017536 A CN201910017536 A CN 201910017536A CN 109402578 B CN109402578 B CN 109402578B
- Authority
- CN
- China
- Prior art keywords
- magnetron sputtering
- entropy alloy
- minutes
- alloy coating
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 54
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 45
- 239000000956 alloy Substances 0.000 title claims abstract description 45
- 239000011248 coating agent Substances 0.000 title claims abstract description 45
- 238000000576 coating method Methods 0.000 title claims abstract description 45
- 238000005516 engineering process Methods 0.000 title claims abstract description 12
- 238000000034 method Methods 0.000 title claims description 39
- 238000000498 ball milling Methods 0.000 claims abstract description 30
- 239000000843 powder Substances 0.000 claims abstract description 29
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 28
- 239000010959 steel Substances 0.000 claims abstract description 28
- 229910052786 argon Inorganic materials 0.000 claims abstract description 20
- 238000005245 sintering Methods 0.000 claims abstract description 20
- 238000002156 mixing Methods 0.000 claims abstract description 18
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 15
- 229910052742 iron Inorganic materials 0.000 claims abstract description 15
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 15
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 14
- 238000004140 cleaning Methods 0.000 claims abstract description 14
- 229910052802 copper Inorganic materials 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000010849 ion bombardment Methods 0.000 claims abstract description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 38
- 239000007789 gas Substances 0.000 claims description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 12
- 230000001105 regulatory effect Effects 0.000 claims description 11
- 238000000227 grinding Methods 0.000 claims description 10
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 7
- 238000005275 alloying Methods 0.000 claims description 6
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 238000007514 turning Methods 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 2
- 238000005086 pumping Methods 0.000 claims description 2
- 238000011049 filling Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000003801 milling Methods 0.000 claims 1
- 239000011159 matrix material Substances 0.000 abstract description 7
- 230000007797 corrosion Effects 0.000 abstract description 6
- 238000005260 corrosion Methods 0.000 abstract description 6
- 238000002360 preparation method Methods 0.000 abstract description 5
- 229910000838 Al alloy Inorganic materials 0.000 abstract 1
- 239000000463 material Substances 0.000 description 8
- 150000004767 nitrides Chemical class 0.000 description 8
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- 238000007781 pre-processing Methods 0.000 description 4
- 238000005253 cladding Methods 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 244000137852 Petrea volubilis Species 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910017536.7A CN109402578B (en) | 2019-01-09 | 2019-01-09 | Method for preparing high-entropy alloy coating based on reactive magnetron sputtering technology |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910017536.7A CN109402578B (en) | 2019-01-09 | 2019-01-09 | Method for preparing high-entropy alloy coating based on reactive magnetron sputtering technology |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109402578A CN109402578A (en) | 2019-03-01 |
CN109402578B true CN109402578B (en) | 2020-10-09 |
Family
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Family Applications (1)
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CN201910017536.7A Expired - Fee Related CN109402578B (en) | 2019-01-09 | 2019-01-09 | Method for preparing high-entropy alloy coating based on reactive magnetron sputtering technology |
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CN (1) | CN109402578B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111411319B (en) * | 2020-03-01 | 2022-03-18 | 苏州科技大学 | Method for preparing nitride-enhanced high-entropy alloy coating by plasma cladding |
CN112921267B (en) * | 2020-06-08 | 2023-06-09 | 自贡市量子金属制造有限公司 | TiVZrCrAl high-entropy alloy coating on ball valve round head surface and preparation method thereof |
CN111676361A (en) * | 2020-07-20 | 2020-09-18 | 安徽省巢湖市共力链条有限公司 | Heat treatment process for high-strength corrosion-resistant chain |
CN114318208B (en) * | 2022-01-07 | 2023-12-08 | 中国科学院合肥物质科学研究院 | Composite coating for lead-based reactor pump impeller and preparation method thereof |
CN114875373A (en) * | 2022-05-18 | 2022-08-09 | 上海大学 | High-entropy ceramic composite coating preparation method based on magnetron sputtering and high-entropy ceramic composite coating |
CN115305444B (en) * | 2022-07-06 | 2023-09-05 | 成都理工大学 | Zirconium alloy-based AlCrNbTiZr high-entropy alloy coating resistant to high-temperature water corrosion and preparation method thereof |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11098403B2 (en) * | 2017-02-07 | 2021-08-24 | City University Of Hong Kong | High entropy alloy thin film coating and method for preparing the same |
CN108411272A (en) * | 2018-05-30 | 2018-08-17 | 上海电机学院 | A kind of preparation method of bearing AlCrCuFeNi systems high-entropy alloy coating |
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2019
- 2019-01-09 CN CN201910017536.7A patent/CN109402578B/en not_active Expired - Fee Related
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CN109402578A (en) | 2019-03-01 |
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TR01 | Transfer of patent right |
Effective date of registration: 20221201 Address after: 230000 Room 203, building 2, phase I, e-commerce Park, Jinggang Road, Shushan Economic Development Zone, Hefei City, Anhui Province Patentee after: Hefei Jiuzhou Longteng scientific and technological achievement transformation Co.,Ltd. Address before: 215009 CREE Road, Suzhou hi tech Zone, Suzhou, Jiangsu Province, No. 1 Patentee before: SUZHOU University OF SCIENCE AND TECHNOLOGY Effective date of registration: 20221201 Address after: West 1st Floor, C1, Industrial Investment Liheng Industrial Plaza, Fanhua Avenue, Feixi County Economic Development Zone, Hefei City, Anhui Province, 230000 Patentee after: Hefei liandunke Intelligent Technology Co.,Ltd. Address before: 230000 Room 203, building 2, phase I, e-commerce Park, Jinggang Road, Shushan Economic Development Zone, Hefei City, Anhui Province Patentee before: Hefei Jiuzhou Longteng scientific and technological achievement transformation Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20201009 |