CN109388029A - A kind of reticle stage system and litho machine - Google Patents
A kind of reticle stage system and litho machine Download PDFInfo
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- CN109388029A CN109388029A CN201710682505.4A CN201710682505A CN109388029A CN 109388029 A CN109388029 A CN 109388029A CN 201710682505 A CN201710682505 A CN 201710682505A CN 109388029 A CN109388029 A CN 109388029A
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- mask platform
- reticle stage
- stage system
- hanging box
- pedestal
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
Abstract
The invention discloses a kind of reticle stage systems, the reticle stage system is mounted in litho machine by hanging box, including mask platform, mask platform pedestal, mask platform driving unit, motion control unit and buffer gear, the buffer gear is fixed in the hanging box and connect with the mask platform pedestal, for weakening the driving counter-force being applied on mask platform pedestal because of mask platform driving unit driving mask platform.The system balance regulation that the present invention passes through the mechanical vibration damping and motion control unit of buffer gear, it can be effectively reduced the mask platform due to caused by driving counter-force to vibrate, improve the kinematic accuracy and stability of mask platform, and then improve the complete machine damping property and dynamic performance of litho machine, maintain the alignment and line width index of lithographic equipment, it ensure that the precision and stability of equipment, while the present invention also has many advantages, such as that light weight, small in size and structure are reliable.
Description
Technical field
The present invention relates to technical field of lithography, more particularly, to a kind of reticle stage system and include the light of the reticle stage system
Quarter machine.
Background technique
Photoetching is one of very important process in semiconductor fabrication, it is by a series of chip figure on masks
The technical process that shape is successively transferred on silicon wafer equivalent layer by exposure, it is considered to be the core in large scale integrated circuit manufacture
Step.A series of complex in semiconductors manufacture and time-consuming photoetching process mainly completed by corresponding litho machine.
Litho machine is a kind of equipment that mask pattern is imaged in target base plate by lithographic equipment, in lithographic equipment
In, mask platform is moved with nano-precision.With the raising of yield, litho machine substrate size, mask platform size and
Motor driving force all becomes increasing, while in order to guarantee precision and stability, it is desirable that alignment and line width, gage frame are dynamic
State index, servo performance index are basically unchanged, furthermore, it is desirable that the vibration of litho machine lower portion is the smaller the better.However, substrate ruler
Very little increase causes the size of mask platform and motor driven counter-force to be multiplied, so that residual oscillation increases, leads to integral vibration damping
Performance and dynamic performance reduce, alignment and line width index decline, and are unfavorable for guaranteeing the precision and stability of equipment.
To offset the vibration that motor driven counter-force generates in litho machine, two methods are generallyd use: balance mass method and anti-
Draw method outside power.It balances mass method and is based on principle of conservation of momentum, offset motor driven counter-force using balance quality, can theoretically eliminate
It is transmitted to the disturbance of frame, but quality is big, volume is big, is difficult to carry out in structure；Drawing method outside counter-force will be electric using special entity
Machine driving counter-force acts on the external world, reduces the interference to Inner-world, but needs to build and draw outside a very high counter-force
Pillar, to connect ground and counter-force Wai Yin mechanism, and strut lengths get higher rigidity are caused to weaken, it is difficult to meet actual production need
It asks.
Therefore, how to use more preferable more effective way weaken vibrated because of caused by the motor driven counter-force of mask platform with
The problem of kinematic accuracy and stability of raising mask platform, this is current urgent need to resolve.
Summary of the invention
The purpose of the present invention is to provide a kind of mask platform buffer units, are caused with reducing the motor driven counter-force of mask platform
Vibration, improve the kinematic accuracy and stability of mask platform, improve the damping property and dynamic performance of photoetching complete machine, maintain light
The alignment and line width index of engraving device, improve the precision and stability of lithographic equipment.
In order to achieve the above object, it the present invention provides a kind of reticle stage system, is mounted in litho machine by hanging box, institute
Stating reticle stage system includes mask platform, mask platform pedestal, mask platform driving unit and motion control unit, the reticle stage system
Further include buffer gear, the buffer gear is fixed in the hanging box and connect with the mask platform pedestal, for weaken because
Mask platform driving unit drives mask platform and is applied to the driving counter-force on mask platform pedestal.
Optionally, the buffer gear includes elastic element, damper and two sets of mounting assemblies, the elastic element and institute
Damper is stated to be connected in parallel between two sets of mounting assemblies, two sets of mounting assemblies respectively with the mask platform pedestal and
The hanging box connection.
Optionally, a set of mounting assembly connecting in two sets of mounting assemblies with the mask platform pedestal includes successively phase
Damping link block, the first adjustment plate, the first vibration insulation and the first link block even, in two sets of mounting assemblies with the hanging box
A set of mounting assembly of connection includes sequentially connected second link block, the second vibration insulation, second adjustment plate and pedestal, described
Elastic element and damper are connected in parallel between first link block and second link block, the damping link block with
The mask platform pedestal is fixed, and the pedestal is fixed with the hanging box, and the first adjustment plate adjusts the first vibration insulation phase
To the position of the damping link block, the second adjustment plate adjusts the position of the relatively described pedestal of second vibration insulation.
Optionally, the both ends of the elastic element are fixed on first link block and described by elastic element pedestal
The middle of two link blocks.
Optionally, the both ends of the damper are fixed on first link block and second link block by Coupling Shaft
On.
Optionally, the axial direction along the elastic element is looked, and multiple dampers are in center about the elastic element
It is symmetrical.
Optionally, first vibration insulation and the second vibration insulation are laminated rubber.
Optionally, the elastic element is compressed spring.
Optionally, the reticle stage system further includes acceleration transducer, and the acceleration transducer setting is hung described
On frame, for measuring the vibration acceleration signal of the hanging box and feeding back to the motion control unit, the motion control list
Member regulates and controls the driving force of the mask platform driving unit output according to the vibration acceleration signal of the hanging box.
In order to achieve the above object, the present invention also provides a kind of litho machine, the litho machine includes at least a set of above-mentioned
Reticle stage system.
In reticle stage system of the invention, buffer gear carries out the storage of energy using the elastic element with intrinsic frequency
It deposits and discharges, so that the high frequency under counter-force impact will be driven to be converted into low-frequency component, then offset by the energy dissipation behavior of damper
Mask platform drives counter-force, weakens driving counter-force, to reduce the amplitude that driving counter-force causes vibration；Further, mask
The motion control unit of platform system is defeated according to the feedback signal adjustment amendment mask platform driving unit of acceleration transducer in hanging box
Driving force out is to compensate the vibration of hanging box, so that remaining low-frequency vibration of preventing, effectively improves the movement of mask platform
Precision and stability, and then the damping property and dynamic performance of litho machine complete machine are improved, be conducive to maintain lithographic equipment
Alignment and line width index, ensure that the precision and stability of equipment.
Detailed description of the invention
Fig. 1 is the reticle stage system and hanging box connection schematic diagram of the embodiment of the present invention one；
Fig. 2 is the buffer gear schematic diagram of the embodiment of the present invention one；
Fig. 3 is the hanging box vibration acceleration curve comparison figure of the embodiment of the present invention one；
Fig. 4 is that the mask platform of the embodiment of the present invention one controls error curve comparison diagram；
Fig. 5 is the control method flow chart of the motion control unit of the embodiment of the present invention one；
Fig. 6 is the reticle stage system and hanging box connection schematic diagram of the embodiment of the present invention two；
In figure, 101- hanging box, 111,112- mask platform, 121,122- buffer gear, 131,132- acceleration transducer,
201- elastic element, 202- elastic element pedestal, 211- damper, 212- Coupling Shaft, the first link block of 221-, 222- second connect
Connect block, the first vibration insulation of 231-, the second vibration insulation of 232-, 241- the first adjustment plate, 242- second adjustment plate, 251- damping connection
Block, 252- pedestal.
Specific embodiment
A specific embodiment of the invention is described in more detail below in conjunction with schematic diagram.According to following description and
Claims, advantages and features of the invention will become apparent from.It should be noted that attached drawing is all made of very simplified form and
Using non-accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
Inventor studies discovery: in litho machine, when motor driven mask platform works, counter-force is generated to mask platform pedestal,
Especially in electric motor starting, peak value driving force will occur, motor driven counter-force is applied to photoetching machine frame by mask platform pedestal
On frame, to generate vibration, the measuring system of mask platform is affected, reduces the movenent performance of mask platform.And with yield
It improves, litho machine substrate size, the size of mask platform and motor driving force all become increasing, are commonly used to offset motor drive
The method effect that dynamical reaction generates vibration is limited: theoretically can using the balance mass method that balance quality offsets motor driven counter-force
The vibration for being transmitted to frame is eliminated, but quality is big, volume is big, is difficult to carry out in practical structures；It will be electric using special entity
Machine driving counter-force, which acts on outside the counter-force in the external world to draw method and need to build, draws pillar outside a very high counter-force, to connect ground
With counter-force Wai Yin mechanism, but strut lengths are higher that rigidity is caused to weaken, it is difficult to meet demand.
Increase to solve mask platform driving counter-force, residual oscillation caused by substrate size increases, litho machine complete machine vibration damping
The series of technical such as performance and dynamic performance decline, the present invention is based on draw method outside counter-force to propose a kind of reticle stage system.
Reticle stage system of the invention includes buffer gear and motion control unit: the present invention is based on counter-force buffering frequency,
Ratio of damping devises a buffer gear, which is fixed between mask platform pedestal and hanging box, rationally intrinsic using having
The elastic element of frequency carries out the storage and release of energy, to convert low frequency for the high frequency under mask platform driving counter-force impact
Ingredient recycles the energy dissipation behavior of damper to offset part mask platform driving counter-force, reduces vibration amplitude；The present invention is also based on adding
The Closed-loop Control Strategy of velocity feed forward devises a motion control unit, can be added by the hanging box vibration that acceleration transducer is fed back
Speed signal adjusts the driving force of mask platform driving unit output, to compensate remaining low-frequency vibration in hanging box of preventing, to drop
The vibration of low mask platform improves its kinematic accuracy and stability.
Embodiment one
The present invention provides a kind of reticle stage systems, as shown in Figure 1, the reticle stage system is mounted on light by hanging box 101
In quarter machine, reticle stage system includes mask platform 111, mask platform pedestal, mask platform driving unit, buffer gear 121 and movement
Control unit.
Wherein, reticle stage system is fixed in hanging box 101 by mask platform pedestal；Mask platform driving unit drives mask platform
111 mostly use driving motor relative to mask platform base motions, mask platform driving unit；Buffer gear 121 is fixed on hanging box 101
It above and with mask platform pedestal connect, is applied to mask platform pedestal because mask platform driving unit drives mask platform 111 for weakening
On driving counter-force；Adding when motion control unit is by comparing the Motion trajectory for analyzing mask platform 111 and actual motion
The driving force of speed signal and position signal regulation mask platform driving unit output, so that the movement for regulating and controlling mask platform 111 accelerates
Degree and position, to improve the kinematic accuracy and stability of mask platform 111.
Further, as shown in Fig. 2, buffer gear 121 includes elastic element 201, damper 211 and two sets of installation groups
Part, wherein elastic element 201 and damper 211 are connected in parallel between two sets of mounting assemblies, two sets of mounting assemblies
It is connect respectively with mask platform pedestal and hanging box 101.
Optionally, a set of mounting assembly connecting in two sets of mounting assemblies with mask platform pedestal is denoted as the first installation group
Part, including damping link block 251, the first adjustment plate 241, the first vibration insulation 231 and the first link block 221 being sequentially connected；Institute
It states a set of mounting assembly connecting in two sets of mounting assemblies with hanging box 101 and is denoted as the second mounting assembly, including sequentially connected
Two link blocks 222, the second vibration insulation 232, second adjustment plate 242 and pedestal 252.
Wherein, elastic element 201 and damper 211 be connected in parallel to the first link block 221 and the second link block 222 it
Between；Damping link block 251 is fixed with mask platform pedestal, and pedestal 252 and hanging box 101 are fixed；The first adjustment plate 241 is for adjusting the
Position of one vibration insulation 231 relative to damping link block 251, second adjustment plate 242 is for adjusting the opposite bottom of the second vibration insulation 232
The position of seat 252.
Optionally, in buffer gear 121, damping link block 251 is connected by screw with mask platform pedestal, pedestal 252
It is connected by screw with hanging box 101.
Since reticle stage system is fixed in hanging box 101 by mask platform pedestal, when mask platform driving unit drives mask
When platform 111 is relative to mask platform base motions, the driving counter-force for being applied to mask platform pedestal can be introduced, is applied in hanging box 101,
Cause the vibration of hanging box 101, so that mask platform pedestal and mask platform 111 be driven and then to vibrate, the kinematic accuracy of mask platform 111 and
Stability is affected.
And after being fixed with buffer gear 121 between mask platform pedestal and hanging box 101, the first installation of buffer gear 121
The first vibration insulation 231 in component and the first Isolation and decoupling of the second vibration insulation in the second mounting assembly 232 part mask platform pedestal
Driving counter-force caused by vibration；Then compressed elastic element 201, which is driven counter-force effect, can carry out the storage of energy
It deposits and discharges, so that the high frequency under counter-force impact will be driven to be converted into low-frequency component；It is supported again by the energy dissipation behavior of damper 211
Disappear the driving counter-force of part mask platform pedestal, to reduce hanging box 101, mask platform pedestal and mask platform caused by driving counter-force
111 vibration amplitude, and then improve the kinematic accuracy and stability of mask platform 111.
Optionally, the both ends of elastic element 201 are fixed on the first link block 221 and second by elastic element pedestal 202
The middle of link block 222.
Optionally, the both ends of damper 211 are fixed on the first link block 221 and the second connection 222 by Coupling Shaft 212
On.
Optionally, it looks along the axial direction of elastic element 201, multiple dampers 211 are in center pair about elastic element 201
Claim distribution.In the present embodiment, two dampers 211 are distributed in the first company about 201 central symmetry of elastic element (axial symmetry)
It connects between block 221 and the second link block 222.Multiple 211 central symmetries of damper are distributed in around elastic element 201, Ke Yijun
Weighing apparatus ground consumption driving counter-force is transmitted through the energy come, balancedly weakens driving counter-force as far as possible, so that it is anti-more effectively to weaken driving
Vibration caused by power.
Optionally, the first vibration insulation 231 and the second vibration insulation 232 are laminated rubber.
Optionally, elastic element 201 uses compressed spring.
Further, by test of many times, show that the optimal intrinsic frequency of buffer gear 121 and ratio of damping parameter are as follows:
201 intrinsic frequency/3 of intrinsic frequency=elastic element of buffer gear 121, ratio of damping 0.2, at this point, 121 pairs of buffer gear drives
The conversion consumption efficiency highest of dynamical reaction.
Buffer gear 121 of the invention is emulated by the simulink of Matlab, obtains the imitative of buffer gear 121
True performance is as shown in Figures 3 and 4.Fig. 3 is the vibration acceleration curve comparison figure of hanging box 101, from figure 3, it can be seen that increasing slow
After punch mechanism 121, the radio-frequency component that driving counter-force is introduced into the vibration acceleration signal being applied in hanging box 101 is effectively turned
The residual vibration of low frequency is turned to, the Oscillation Amplitude of hanging box 101 is greatly reduced；Fig. 4 is that the control error curve of mask platform 111 compares
Figure, is clear that from Fig. 4, after increasing buffer gear 121, effectively eliminates the high-frequency percussion of hanging box 101, makes to control
Error can quickly restrain, and effectively improve the movenent performance of mask platform 111, thus improve complete machine damping property and
Dynamic performance ensure that alignment and line width index, the precision and stability for improving equipment.
In addition, the present invention is also on the basis of buffer gear 121 in order to further increase the movenent performance of mask platform 111
A motion control unit is increased, (planning adds as shown in figure 5, motion control unit is according to the Motion trajectory of mask platform 111
Speed signal and planned position signal) and the 111 real time kinematics Signal Regulation mask platform driving unit of mask platform that feeds back it is defeated
Driving force out, so that the real time acceleration and real time position to mask platform 111 are adjusted, to improve the fortune of mask platform 111
Dynamic precision and stability.
As shown in figure 5, the motion control unit is advised by motion profile of the driving close loop control circuit to mask platform 111
Compensation is adjusted in the deviation drawn between the real time kinematics signal (acceleration and position) of mask platform 111, the motion control list
Member control method include:
S1, the driving close loop control circuit of a mask platform 111 is provided, the driving close loop control circuit acquires mask in real time
The acceleration signal and position signal of the Motion trajectory of platform 111；
S2, the driving close loop control circuit acquire the actual acceleration signal and actual bit confidence of mask platform 111 in real time
Number；
S3, by it is described driving close loop control circuit analysis compare mask platform 111 Motion trajectory acceleration signal,
Position signal and actual acceleration signal, position signal, and accordingly to one control signal of mask platform driving unit output to adjust
The driving force of output improves the fortune of mask platform 111 so that the acceleration bias and position deviation to mask platform 111 compensate
Dynamic precision and stability.
However, the effect due to driving counter-force, causes the vibration of hanging box 101, mask platform pedestal and mask platform 111, thus
Many vibration interferences are brought to the actual acceleration signal and actual position signal of mask platform 111, affect the reality of feedback
The accuracy rate of acceleration signal and actual position signal.The acceleration signal especially fed back is relatively high to required precision, if
The acceleration bias that the actual acceleration signal inaccuracy of feed back input will lead to the mask platform 111 that subsequent regulation obtains is larger,
Therefore it is the kinematic accuracy and stability that further increase mask platform 111, needs to compensate the vibration acceleration signal of hanging box 101
Into the actual acceleration signal of feedback.
Further, the reticle stage system further includes the acceleration transducer 131 being set in hanging box 101, acceleration
Sensor 131 is used to measure the vibration acceleration signal of hanging box 101 and feeds back to the motion control unit, in order to the fortune
Dynamic control unit regulates and controls the driving force of the mask platform driving unit output according to the vibration acceleration signal of hanging box 101.
It, can be on the basis of above-mentioned control method using the drive of vibration acceleration feedforward by acceleration transducer 131
Dynamic Closed-loop Control Strategy operates the motion control unit, in the driving close loop control circuit increases hanging box 101
The actual acceleration deviation of vibration acceleration feedforward, mask platform 111 caused by vibrating to driving counter-force compensates, such as Fig. 5 institute
Show, comprising steps of
S1, the driving close loop control circuit acquire the vibration acceleration of hanging box 101 by acceleration transducer 131 in real time
Signal, and feedover through amplifier into the driving close loop control circuit；
The control signal is corrected in S2, the driving close loop control circuit accordingly, further corrects the driving force, to mend
The actual acceleration signal of mask platform 111 is repaid, to reduce influence of the vibration of hanging box 101 to mask platform 111.
As shown in figure 4, being feedovered on the basis of increasing buffer gear 121 by the vibration acceleration of motion control unit
After driving Closed-loop Control Strategy to carry out vibration compensation to hanging box 101, the elimination of the low-frequency vibration in the control error of mask platform 111
Effect is more preferable, and control error convergence speed improves, to effectively increase the motilities such as the polarization of mask platform 111, repeatability
Energy and kinematic accuracy.
Further, the present invention also provides a kind of litho machine, the litho machine includes at least a set of aforementioned mask platform system
System, the kinematic accuracy and stability of mask platform is effectively improved by aforementioned mask platform system, and then improve the quarter machine
The damping property and dynamic performance of complete machine are conducive to the alignment for maintaining the litho machine and line width index, ensure that the light
Quarter machine precision and stability.
Embodiment two
Embodiment, can each mask if there is multiple mask platforms in litho machine first is that for single mask platform
Platform all presses embodiment one and carries out buffer shock-absorbing, can also advanced optimize, multiple mask platforms are fixed in the same hanging box.Such as
Shown in Fig. 6, the present embodiment provides a kind of dual masks platform system, fixed in hanging box 101 there are two the mask platforms of axial symmetry distribution
The acceleration transducer of buffer gear (121 and 122) and the distribution of two axial symmetry that (111 and 112), two axial symmetry are distributed
The vibration acceleration of (131 and 132), hanging box 101 can be obtained by the acquisition signal weighting of two acceleration transducers (131 and 132)
It arrives.
Processing first is weighted to two acceleration transducers (131 and 132) collected vibration acceleration signal, then is divided
It is not introduced into respective vibration acceleration feedforward driving close loop control circuit, driving force is modified to compensate hanging box 101
The influence to mask platform (111 and 112) movenent performance is vibrated, the movenent performance of mask platform (111 and 112) is improved.Subsequent control
Method is as in the first embodiment, repeat no more.
In conclusion buffer gear is utilized with intrinsic frequency in reticle stage system provided in an embodiment of the present invention
Elastic element carries out the storage and release of energy, the high frequency under counter-force impact will be driven to be converted into low-frequency component, then pass through damping
The energy dissipation behavior of device offsets part driving counter-force, effectively reduces mask platform residual oscillation caused by driving counter-force, improves whole
The damping property of machine and the dynamic performance of mask platform；Motion control unit is using vibration acceleration feedforward driving closed-loop control plan
Slightly come the vibration for compensating hanging box, the driving force of amendment output is adjusted to compensate hanging box according to the hanging box vibration acceleration signal of feedback
Vibration further improve the kinematic accuracy and stability of mask platform so that compensation is prevented remaining low-frequency vibration, guarantee
The precision and stability of equipment, convenient for technical indicators such as the alignment and the line widths that maintain lithographic equipment.
The above is only a preferred embodiment of the present invention, does not play the role of any restrictions to the present invention.Belonging to any
Those skilled in the art, in the range of not departing from technical solution of the present invention, to the invention discloses technical solution and
Technology contents make the variation such as any type of equivalent replacement or modification, belong to the content without departing from technical solution of the present invention, still
Within belonging to the scope of protection of the present invention.
Claims (10)
1. a kind of reticle stage system, is mounted in litho machine by hanging box, the reticle stage system includes mask platform, mask platform bottom
Seat, mask platform driving unit and motion control unit, which is characterized in that the reticle stage system further includes buffer gear, described
Buffer gear is fixed in the hanging box and connect with the mask platform pedestal, for weakening because the driving of mask platform driving unit is covered
Die station and be applied to the driving counter-force on mask platform pedestal.
2. reticle stage system as described in claim 1, which is characterized in that the buffer gear includes elastic element, damper
And two sets of mounting assemblies, the elastic element and the damper are connected in parallel between two sets of mounting assemblies, described two
Set mounting assembly is connect with the mask platform pedestal and the hanging box respectively.
3. reticle stage system as claimed in claim 2, which is characterized in that in two sets of mounting assemblies with the mask platform bottom
A set of mounting assembly of seat connection includes the damping link block being sequentially connected, the first adjustment plate, the first vibration insulation and the first connection
Block, a set of mounting assembly being connect in two sets of mounting assemblies with the hanging box includes sequentially connected second link block,
Two vibration insulations, second adjustment plate and pedestal, the elastic element and damper are connected in parallel to first link block and institute
It states between the second link block, the damping link block is fixed with the mask platform pedestal, and the pedestal is fixed with the hanging box, institute
The position that the first adjustment plate adjusts the relatively described damping link block of first vibration insulation is stated, described in second adjustment plate adjustment
The position of the relatively described pedestal of second vibration insulation.
4. reticle stage system as claimed in claim 3, which is characterized in that the both ends of the elastic element pass through elastic element bottom
Seat is fixed on the middle of first link block and second link block.
5. reticle stage system as claimed in claim 3, which is characterized in that the both ends of the damper are fixed on by Coupling Shaft
On first link block and second link block.
6. reticle stage system as claimed in claim 4, which is characterized in that the axial direction along the elastic element is looked, Duo Gesuo
Damper is stated to be centrosymmetric distribution about the elastic element.
7. reticle stage system as claimed in claim 3, which is characterized in that first vibration insulation and the second vibration insulation are folded
Layer rubber.
8. reticle stage system as claimed in claim 2, which is characterized in that the elastic element is compressed spring.
9. reticle stage system as described in claim 1, which is characterized in that the reticle stage system further includes acceleration sensing
Device, the acceleration transducer is arranged in the hanging box, for measuring the vibration acceleration signal of the hanging box and feeding back to
The motion control unit, the motion control unit regulate and control the mask platform according to the vibration acceleration signal of the hanging box and drive
The driving force of moving cell output.
10. a kind of litho machine, which is characterized in that including at least a set of mask platform as in one of claimed in any of claims 1 to 9
System.
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| CN201710682505.4A CN109388029A (en) | 2017-08-10 | 2017-08-10 | A kind of reticle stage system and litho machine |
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Application publication date: 20190226 |