CN109375481A - A kind of novel photoresist developing device and developing method - Google Patents
A kind of novel photoresist developing device and developing method Download PDFInfo
- Publication number
- CN109375481A CN109375481A CN201811636147.4A CN201811636147A CN109375481A CN 109375481 A CN109375481 A CN 109375481A CN 201811636147 A CN201811636147 A CN 201811636147A CN 109375481 A CN109375481 A CN 109375481A
- Authority
- CN
- China
- Prior art keywords
- fixed link
- photoresist
- photoresist sheet
- leading truck
- development
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
Abstract
The invention discloses a kind of novel photoresist developing devices, including base station fixed frame, photoresist sheet fixed frame, development flow container, ultrapure water pot, cache slot and liquid flow port；Develop flow container, the ultrapure water pot are selective to be connected to the dashpot, and the liquid in the dashpot is connected to by liquid flow port with outside；The liquid flow port is located above photoresist fixed frame, developing process is that chemical reaction occurs by developer solution and photoresist to generate textured pattern, developer solution uniform flows photoresist surface when due to present apparatus development, the problem of development unevenly and on photoengraving pattern remains bubble is avoided, the quality of product is improved.
Description
Technical field
The invention belongs to developing apparatus technical field, a kind of novel photoresist developing device and development are concretely related to
Method.
Background technique
Photoetching is the important ring in modern micro-nano technology technology, how perfect as one of important process after photoetching
The flawless photoengraving pattern that shows on photoresist sheet is the target that developing process is pursued.Traditional developing process is used light
Mechanical to be put into development basin, static or hand mode is developed, and static development has the possible incomplete problem of development, hand development
There are hand speed is unstable, the problem that causes development uneven.And it is likely in developing process generate bubble in pattern area.
In conclusion the present invention relates to a kind of easy photoresist sheets to develop to solve the visualization problems of photoresist sheet
Device and method facilitates the development of photoresist sheet easy to operate, simultaneously because developer solution uniformly contacts photoresist sheet when development, keeps away
Development unevenly and on photoengraving pattern remains the problem of bubble when having exempted from conventional developer method.
Summary of the invention
The object of the present invention is to provide a kind of novel photoresist developing device and developing method, the carry out light that can be convenient
The development operation of photoresist plate effectively avoids the problem that the development of conventional developer method unevenly and on photoengraving pattern remains bubble.
In order to solve the above technical problems, the object of the present invention is achieved like this:
A kind of novel photoresist developing device, including base station fixed frame, photoresist sheet fixed frame, development flow container, ultrapure water
Tank, cache slot and liquid flow port；
Develop flow container, the ultrapure water pot are selective to be connected to the dashpot, and the liquid in the dashpot passes through
Liquid flow port is connected to outside；
The liquid flow port is located above photoresist fixed frame.
Preferred embodiment on the basis of above scheme and as above scheme: the development flow container, ultrapure water pot and institute
It states and is provided with liquid flow valve in the communication paths of dashpot.
Preferred embodiment on the basis of above scheme and as above scheme: the photoresist sheet fixed frame is by the first light
Photoresist plate fixed link, the first fixed link leading truck, the second photoresist sheet fixed link, the second fixed link leading truck, third photoresist
Plate fixed link, third fixed link leading truck enclose rectangular-shaped, the first photoresist sheet fixed link, the second light after being sequentially connected
Photoresist plate fixed link, third photoresist sheet fixed link inside offer fixed card slot, the edge of photoresist sheet is accepted in
In the fixed card slot.
Preferred embodiment on the basis of above scheme and as above scheme: further including retaining mechanism, and described first is solid
Fixed pole leading truck, the second fixed link leading truck, third fixed link leading truck offer guide groove, and first photoresist sheet is fixed
Bar, the second photoresist sheet fixed link, third photoresist sheet fixed link can be respectively in first fixed link guiding of its connecting pin
Frame, the second fixed link leading truck, sliding in the guide groove in third fixed link leading truck, the retaining mechanism optionally limit
Make the sliding of the first fixed link leading truck, the second fixed link leading truck, third fixed link leading truck.
Preferred embodiment on the basis of above scheme and as above scheme: the retaining mechanism includes multiple locking screws
Nail, the first fixed link leading truck, the second fixed link leading truck, third fixed link leading truck respectively close to its both ends and
Threaded hole is offered on the side wall of one its vertical axis, the lock-screw is threadedly connected in the threaded hole, is screwed described
Lock-screw can hold out against the first photoresist sheet fixed link, the second photoresist sheet fixed link, third photoresist sheet fixed link
In the guide groove.
Preferred embodiment on the basis of above scheme and as above scheme: the first photoresist sheet fixed link and
Three photoresist sheet fixed links are that rectangular-shaped and the two is adjacent, and the second photoresist sheet fixed link is strip and is located at described first
The opposite side of photoresist sheet fixed link and third photoresist sheet fixed link.
Preferred embodiment on the basis of above scheme and as above scheme: the photoresist sheet fixed frame and horizontal plane
It is tilted in 45 °.
Preferred embodiment on the basis of above scheme and as above scheme: the liquid flow port is flat port.
Preferred embodiment on the basis of above scheme and as above scheme: it is based on above-mentioned novel photoresist developing device
Developing method, it is characterised in that: include the following steps
S1: configured developer solution and ultrapure water are respectively charged into stand-by in development flow container and ultrapure water pot；
S2: the photoresist sheet exposed is stuck in photoresist sheet fixed frame；
S3: development flow container is connected to dashpot, developer solution is flow on photoresist sheet, and development starts；
S4: cutting off developer solution after development, ultrapure water pot is connected to dashpot, is rinsed to photoresist sheet；
S5: cutting off ultrapure water after flushing, by photoresist sheet with being dried with nitrogen.
Developing process is by developer solution and photoresist to the present invention for prominent and beneficial having the technical effect that compared with prior art
Chemical reaction occurs and generates textured pattern, developer solution uniform flows photoresist surface when due to present apparatus development, avoids
Development unevenly and on photoengraving pattern remains the problem of bubble, improves the quality of product.
Detailed description of the invention
Fig. 1 is overall structure diagram of the invention；
Fig. 2 is that liquid flows to schematic diagram；
Fig. 3 is photoresist fixed rack structure schematic diagram；
Fig. 4 is the first photoresist sheet fixed link, third photoresist sheet fixed rod structure schematic diagram；
Fig. 5 is the first photoresist sheet fixed link, another angled arrangement schematic diagram of third photoresist sheet fixed link；
Fig. 6 is the second photoresist sheet fixed rod structure schematic diagram；
Fig. 7 is the second photoresist sheet fixed link fixed card slot structural schematic diagram.
Specific embodiment
To keep the purposes, technical schemes and advantages of the application clearer, below in conjunction with the attached drawing 1-7 in embodiment,
Technical solution in embodiment is clearly and completely described.
A kind of novel photoresist developing device, including base station fixed frame 1, photoresist sheet fixed frame 2, development flow container 4, ultrapure
Water pot 5, cache slot 8 and liquid flow port 7；
In the present embodiment, the two sides of photoresist sheet fixed frame 2 are connect by telescopic rod 11 with base station fixed frame 1, are needed
Bright is that telescopic rod 11 is the prior art, it is the scalable hollow cylinder made of sheet metal strip or plastic sheet roll
Bar.
The development flow container 4, the selectivity of ultrapure water pot 5 are connected to the dashpot 8, the liquid in the dashpot 8
It is connected to by liquid flow port 7 with outside；The present embodiment preferred liquid communication port 7 and cache slot 8 are integrally formed.
The liquid flow port 7 is located at 2 top of photoresist fixed frame, and preferred liquid communication port 7 is away from photoetching in the present embodiment
Offset plate apparent height 5mm.
It is provided with liquid flow valve 6 in the communication paths of the development flow container 4, ultrapure water pot 5 and the dashpot 8, is had
Body, liquid flow valve 6 includes development flow container flow valve 61 and ultrapure water flow valve 62.
In the present embodiment, the preferably volume of development flow container 4 and ultrapure water pot 5 is respectively 1.5L, and liquid flow valve 6 can draining
Body flow.
The photoresist sheet fixed frame 2 is by the first photoresist sheet fixed link 21, the first fixed link leading truck 22, the second photoetching
Offset plate fixed link 23, the second fixed link leading truck 24, third photoresist sheet fixed link 25, third fixed link leading truck 26 successively connect
Enclose rectangular-shaped after connecing, the first photoresist sheet fixed link 21, the second photoresist sheet fixed link 23, third photoresist sheet are solid
The inside of fixed pole 25 offers fixed card slot, and the edge of photoresist sheet is accepted in the fixed card slot, fixing card groove width
Degree should meet conventional lithographic offset plate thickness, be 3-5mm.
It further include retaining mechanism 3, the first fixed link leading truck 22, the second fixed link leading truck 24, third fixed link
Leading truck 26 offers guide groove, the first photoresist sheet fixed link 21, the second photoresist sheet fixed link 23, third photoresist
Plate fixed link 25 can be solid in the first fixed link leading truck 22 of its connecting pin, the second fixed link leading truck 24, third respectively
Sliding, the retaining mechanism 3 optionally limit the first fixed link leading truck in guide groove in fixed pole leading truck 26
22, the sliding of the second fixed link leading truck 24, third fixed link leading truck 26, can so realize photoresist sheet fixed frame 2
Width and length direction are adjusted, convenient for photoresist sheet is carried out clamping and fixation, its preferred adjustable model in the present embodiment
It encloses for 20-35cm.
Retaining mechanism 3 includes multiple lock-screws 31, the first fixed link leading truck 22, the second fixed link leading truck
24, third fixed link leading truck 26 offers threaded hole on the side wall close to its both ends and its vertical axis respectively, institute
It states lock-screw 31 to be threadedly connected in the threaded hole, first photoresist sheet can be fixed by screwing the lock-screw 31
Bar 21, the second photoresist sheet fixed link 23, third photoresist sheet fixed link 25 are held out against in the guide groove.
First photoresist sheet fixed link 21 is that rectangular-shaped and the two is adjacent with third photoresist sheet fixed link 25, described second
Photoresist sheet fixed link 23 is strip and is located at the first photoresist sheet fixed link 21 and third photoresist sheet fixed link 25
Opposite side, in this way to photoresist sheet formed supported at three point, a side at two turnings and opposite side including photoresist sheet,
Such fixed structure is simple and convenient, and stability is good.
Specifically, can be by the first photoresist sheet fixed link 21, the second photoresist sheet when unscrewing each lock-screw 31
Fixed link 23, third photoresist sheet fixed link 25 are respectively along the first fixed link leading truck 22, the second fixed link leading truck 24, third
Guide groove on fixed link leading truck 26 is pushed home into or pulls out to realize the width for adjusting photoresist sheet fixed frame 20
Degree and length are adapted it with photoresist sheet, so that photoresist sheet be made to be stuck in fixed card slot, screw lock-screw 31 at this time
The movement for limiting the first photoresist sheet fixed link 21, the second photoresist sheet fixed link 23, third photoresist sheet fixed link 25 afterwards, from
And guarantee that two right angles of photoresist sheet and the side stuck fast of opposite side will not shake, complete photoresist sheet clamping and
Fixed, structure is simple, convenient for mounting and clamping, and using reliable, equipment input cost is low.
The photoresist sheet fixed frame 2 is tilted horizontal by 45 °, is convenient for developer solution and ultrapure water flowing.
Further, in order to which the liquid for flowing out liquid flow port 7 is more uniform, set flat for liquid flow port 7
Mouthful.
Specific implementation steps are as follows: configured developer solution and ultrapure water are respectively charged into development flow container 4 and ultrapure water pot 5
In it is stand-by, by adjustment fixing plate length adjustment screw 3, photoresist sheet expose is stuck in photoresist sheet fixed frame 2, guarantor
Four angle stuck fasts of card photoresist sheet will not shake.Development flow container flow valve 61 is opened, appropriate flow velocity is transferred to, at this point, aobvious
Shadow liquid can at the uniform velocity flow out from liquid flow port and flow through photoresist sheet, and development starts to carry out.After development, turn off development flow container
Flow valve 61, opens ultrapure water flow valve 62, and flushing starts to carry out, after flushing, turns off ultrapure water flow valve 62, remove light
Photoresist plate is dried with nitrogen.
Wherein, the flow of developer solution is adjustable, according to the thickness of photoresist in institute's workpieces processing, when adjusting flow velocity and development
It is long.
Development and pure water rinsing are continuous conversion process, i.e. pure water content transits directly to 100% from 0, this process can be with
Excessive development is efficiently controlled, better development effect is obtained.
Adjustment photoresist sheet fixture is horizontal by 45 ° of angles, the line of developer solution and ultrapure water when convenient for developing and rinse
Property flowing, improve development effect.
Such as Fig. 2, cache slot 8 guarantees cache slot 8 when being the interim reservoir chamber of developer solution and ultrapure water, development and flushing offset plate
Interior liquid is at least half-full state, at this point, the size for adjusting liquid flow port controls fluid flow.
Above-described embodiment is only presently preferred embodiments of the present invention, is not limited the scope of the invention according to this, therefore: it is all according to
The equivalence changes that structure of the invention, shape, principle are done, should all be covered by within protection scope of the present invention.
Claims (9)
1. a kind of novel photoresist developing device, it is characterised in that: including base station fixed frame (1), photoresist sheet fixed frame (2),
Development flow container (4), ultrapure water pot (5), cache slot (8) and liquid flow port (7)；
It is described development flow container (4), ultrapure water pot (5) selectivity be connected to the dashpot (8), in the dashpot (8)
Liquid is connected to by liquid flow port (7) with outside；
The liquid flow port (7) is located above photoresist fixed frame (2).
2. a kind of novel photoresist developing device according to claim 1, it is characterised in that: the development flow container (4) surpasses
Liquid flow valve (6) are provided in the communication paths of pure water tank (5) and the dashpot (8).
3. a kind of novel photoresist developing device according to claim 1, it is characterised in that: the photoresist sheet fixed frame
(2) by the first photoresist sheet fixed link (21), the first fixed link leading truck (22), the second photoresist sheet fixed link (23), second
Fixed link leading truck (24), third photoresist sheet fixed link (25), third fixed link leading truck (26) enclose after being sequentially connected
It is rectangular-shaped, the first photoresist sheet fixed link (21), the second photoresist sheet fixed link (23), third photoresist sheet fixed link
(25) inside offers fixed card slot, and the edge of photoresist sheet is accepted in the fixed card slot.
4. a kind of novel photoresist developing device according to claim 3, it is characterised in that: it further include retaining mechanism (3),
The first fixed link leading truck (22), the second fixed link leading truck (24), third fixed link leading truck (26) offer guiding
Slot, the first photoresist sheet fixed link (21), the second photoresist sheet fixed link (23), third photoresist sheet fixed link (25) can
Respectively in the first fixed link leading truck (22) of its connecting pin, the second fixed link leading truck (24), third fixed link guiding
Sliding in guide groove in frame (26), the retaining mechanism (3) optionally limit the first fixed link leading truck (22),
The sliding of second fixed link leading truck (24), third fixed link leading truck (26).
5. a kind of novel photoresist developing device according to claim 4, it is characterised in that: retaining mechanism (3) packet
Containing multiple lock-screws (31), the first fixed link leading truck (22), the second fixed link leading truck (24), third fixed link are led
Threaded hole, the lock-screw (31) are offered on the side wall close to its both ends and its vertical axis respectively to frame (26)
It is threadedly connected in the threaded hole, screwing the lock-screw (31) can be by the first photoresist sheet fixed link (21),
Two photoresist sheet fixed links (23), third photoresist sheet fixed link (25) are held out against in the guide groove.
6. a kind of novel photoresist developing device according to claim 5, it is characterised in that: first photoresist sheet is solid
Fixed pole (21) and third photoresist sheet fixed link (25) are that rectangular-shaped and the two is adjacent, the second photoresist sheet fixed link (23)
For strip and positioned at the opposite side of the first photoresist sheet fixed link (21) and third photoresist sheet fixed link (25).
7. a kind of novel photoresist developing device according to claim 1, it is characterised in that: the photoresist sheet fixed frame
(2) it is tilted horizontal by 45 °.
8. a kind of novel photoresist developing device according to claim 1, it is characterised in that: the liquid flow port (7)
For flat port.
9. the developing method based on a kind of novel photoresist developing device described in claim 1-8, it is characterised in that: including with
Lower step
S1: configured developer solution and ultrapure water are respectively charged into stand-by in development flow container (4) and ultrapure water pot (5)；
S2: the photoresist sheet exposed is stuck in photoresist sheet fixed frame (2)；
S3: development flow container (4) is connected to dashpot (8), developer solution is flow on photoresist sheet, and development starts；
S4: cutting off developer solution after development, ultrapure water pot (5) is connected to dashpot (8), is rinsed to photoresist sheet；
S5: cutting off ultrapure water after flushing, by photoresist sheet with being dried with nitrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811636147.4A CN109375481A (en) | 2018-12-29 | 2018-12-29 | A kind of novel photoresist developing device and developing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811636147.4A CN109375481A (en) | 2018-12-29 | 2018-12-29 | A kind of novel photoresist developing device and developing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109375481A true CN109375481A (en) | 2019-02-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811636147.4A Pending CN109375481A (en) | 2018-12-29 | 2018-12-29 | A kind of novel photoresist developing device and developing method |
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| US20050081996A1 (en) * | 2002-08-30 | 2005-04-21 | Kabushiki Kaisha Toshiba | Developing method, substrate treating method, and substrate treating apparartus |
| CN101369105A (en) * | 2008-10-14 | 2009-02-18 | 上海市激光技术研究所 | Automatic spraying development apparatus and method after exposure of large-face optical resist glass plate |
| CN102109776A (en) * | 2011-03-18 | 2011-06-29 | 常州瑞择微电子科技有限公司 | Process for developing photoresist, and device thereof |
| CN203630511U (en) * | 2013-12-20 | 2014-06-04 | 徐州同鑫光电科技有限公司 | Photoresist developing device |
| CN105319871A (en) * | 2014-05-30 | 2016-02-10 | 盛美半导体设备（上海）有限公司 | Semiconductor substrate developing apparatus and semiconductor substrate developing method |
| CN209590540U (en) * | 2018-12-29 | 2019-11-05 | 上海彩丞新材料科技有限公司 | A kind of novel photoresist developing device |
-
2018
- 2018-12-29 CN CN201811636147.4A patent/CN109375481A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050081996A1 (en) * | 2002-08-30 | 2005-04-21 | Kabushiki Kaisha Toshiba | Developing method, substrate treating method, and substrate treating apparartus |
| CN101369105A (en) * | 2008-10-14 | 2009-02-18 | 上海市激光技术研究所 | Automatic spraying development apparatus and method after exposure of large-face optical resist glass plate |
| CN102109776A (en) * | 2011-03-18 | 2011-06-29 | 常州瑞择微电子科技有限公司 | Process for developing photoresist, and device thereof |
| CN203630511U (en) * | 2013-12-20 | 2014-06-04 | 徐州同鑫光电科技有限公司 | Photoresist developing device |
| CN105319871A (en) * | 2014-05-30 | 2016-02-10 | 盛美半导体设备（上海）有限公司 | Semiconductor substrate developing apparatus and semiconductor substrate developing method |
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Application publication date: 20190222 |