CN109355635A - Substrate frame bias introducing device in a kind of continuous coating production line - Google Patents
Substrate frame bias introducing device in a kind of continuous coating production line Download PDFInfo
- Publication number
- CN109355635A CN109355635A CN201811537919.9A CN201811537919A CN109355635A CN 109355635 A CN109355635 A CN 109355635A CN 201811537919 A CN201811537919 A CN 201811537919A CN 109355635 A CN109355635 A CN 109355635A
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- China
- Prior art keywords
- electrode
- substrate frame
- elastic slice
- pulley
- introduces
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses substrate frame bias introducing devices in a kind of continuous coating production line, including introducing electrode, the introducing electrode jacket is connected to insulation sleeve and passes through vacuum chamber body wall and protrudes into vacuum cavity, it introduces between electrode and vacuum chamber body wall and is tightly connected, it introduces electrode and passes through cable connection grid bias power supply in atmospheric side, hole is equipped on the cavity dam for introducing electrode side in vacuum cavity, it introduces electrode one end in vacuum cavity and is connected with elastic slice, elastic slice is connected with pulley, elastic slice and pulley pass through the hole on cavity dam and can be with substrate frame Interference contacts.Bias introducing device of the invention introduces electrode and passes through elastic slice and pulley and substrate frame Interference contact, elastic slice, which applies certain power, contacts pulley with substrate frame completely, it is face contact between pulley and substrate frame, it does not influence the back and forth movement of substrate frame simultaneously, solve the problems, such as bias introducing device and substrate frame poor contact and does not reach.
Description
Technical field
The present invention relates to vacuum coating equipment field, substrate frame bias is introduced in specially a kind of continuous coating production line
Device.
Background technique
In vacuum coating, the main function of bias is the energy for improving charged particle in vacuum plasma body, and bombardment is clear
Workpiece surface is washed, brand-new surface layer is obtained after so that workpiece surface is subjected to energetic particle hits, to improve subsequent deposition film layer
Binding force.It is commonplace using bias in single devices at present, and there is presently no universal on continuous coating device.Tradition
Introducing device above single devices mainly remains static, and outside atmosphere one end connects grid bias power supply, inner vacuum end
It is directly connected in workpiece frame, is in stationary state.It can be applied to continuously by bias introducing device to improve film quality
On production line, and since workpiece frame is the unconnected state of multiple independences on continuous coating device, introduces and fill relative to bias
Setting is to be kept in motion, the feelings for inevitably having poor contact when each independent contact therewith in this way or not reaching
Phenomena such as condition, substrate frame are easy to appear bias during the motion and introduce poor contact, strike sparks, short-circuit.
Summary of the invention
The purpose of the present invention, which is taken notice of, provides substrate frame bias introducing device in a kind of continuous coating production line, solves even
With the poor contact of bias introducing device or the problem of do not reach in substrate frame motion process in continuous coating film production line.
The technical solution adopted by the invention is as follows: substrate frame bias introducing device in a kind of continuous coating production line, packet
Introducing electrode is included, the introducing electrode jacket is connected to insulation sleeve and passes through vacuum chamber body wall and protrudes into vacuum cavity, introduces electrode
It is tightly connected between vacuum chamber body wall, introduces electrode in atmospheric side by cable connection grid bias power supply, leaned in vacuum cavity
The nearly cavity dam for introducing electrode side is equipped with hole, introduces electrode one end in vacuum cavity and is connected with elastic slice, elastic slice connects
It is connected to pulley, elastic slice and pulley pass through the hole on cavity dam and can be with substrate frame Interference contacts.
Further, it is introducing at electrode and cable connection equipped with protective cover.
Bias is introduced electrode by cable and connected to power supply by bias introducing device of the invention, introduces electrode jacket
It is connected to insulation sleeve and passes through vacuum chamber body wall and protrude into vacuum cavity, introduce electrode and pass through elastic slice and pulley and substrate frame interference
Contact, elastic slice, which applies certain power, contacts pulley with substrate frame completely, is face contact between pulley and substrate frame, simultaneously
The back and forth movement for not influencing substrate frame solves bias introducing device and substrate frame poor contact and what is do not reached asks
Topic.
Detailed description of the invention
Fig. 1 is structural schematic diagram of the invention.
Specific embodiment
To facilitate the understanding of the present invention, the present invention is made below in conjunction with Figure of description and preferred embodiment more complete
Face meticulously describes, but the protection scope of the present invention is not limited to the following specific embodiments.
As shown in Figure 1, substrate frame bias introducing device in a kind of continuous coating production line of the invention, including introduce electricity
Pole 3 is socketed with insulation sleeve 4 and passes through vacuum chamber body wall 7 outside the introducing electrode 3 and protrudes into vacuum cavity, introduces electrode 3 and true
It is tightly connected between cavity body wall 7, introduces electrode 3 in atmospheric side and grid bias power supply is connected by cable 1, introducing electrode 3 and electricity
1 junction of cable is equipped with protective cover 2, close to electrode side is introduced equipped with cavity dam 8 in vacuum cavity, introduces electrode 3 true
One end is connected with elastic slice 5 in cavity body, and elastic slice 5 is connected with pulley 6, and pulley 6 passes through cavity dam 8 and can be with 9 mistake of substrate frame
It is full of contact.
Bias is introduced electrode by cable and connected to power supply by bias introducing device of the invention, introduces electrode jacket
It is connected to insulation sleeve and passes through vacuum chamber body wall and protrude into vacuum cavity, introduce electrode and pass through elastic slice and pulley and substrate frame interference
Contact, elastic slice, which applies certain power, contacts pulley with substrate frame completely, is face contact between pulley and substrate frame, simultaneously
The back and forth movement of substrate frame is not influenced.
With the help of the introduction present in aforementioned specification and relevant drawings, those skilled in the art in the invention will
It will recognize that many modifications and other embodiments of the invention.It will consequently be understood that the present invention is not limited to disclosed specific realities
Scheme is applied, modification and other embodiments are to be considered as included in scope of the appended claims.Although spy is used herein
Determine term, they are only used with generic and descriptive sense, rather than limitation.
Claims (2)
1. substrate frame bias introducing device in a kind of continuous coating production line, including introduce electrode, it is characterised in that: it is described to draw
Enter electrode jacket to be connected to insulation sleeve and protrude into vacuum cavity across vacuum chamber body wall, introduce close between electrode and vacuum chamber body wall
Envelope connection introduces electrode in atmospheric side by cable connection grid bias power supply, close to the chamber for introducing electrode side in vacuum cavity
Body baffle is equipped with hole, introduces electrode one end in vacuum cavity and is connected with elastic slice, elastic slice is connected with pulley, elastic slice and pulley
Hole on cavity dam simultaneously can be with substrate frame Interference contact.
2. substrate frame bias introducing device in a kind of continuous coating production line as described in claim 1, it is characterised in that:
It introduces and is equipped with protective cover at electrode and cable connection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811537919.9A CN109355635A (en) | 2018-12-15 | 2018-12-15 | Substrate frame bias introducing device in a kind of continuous coating production line |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811537919.9A CN109355635A (en) | 2018-12-15 | 2018-12-15 | Substrate frame bias introducing device in a kind of continuous coating production line |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109355635A true CN109355635A (en) | 2019-02-19 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811537919.9A Pending CN109355635A (en) | 2018-12-15 | 2018-12-15 | Substrate frame bias introducing device in a kind of continuous coating production line |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109355635A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112795896A (en) * | 2021-04-15 | 2021-05-14 | 苏州迈为科技股份有限公司 | Vacuum coating device |
| CN116732502A (en) * | 2023-03-28 | 2023-09-12 | 成都沃特塞恩电子技术有限公司 | Sample stage assembly with bias leads and MPCVD system |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2666929Y (en) * | 2003-12-03 | 2004-12-29 | 刘晓荫 | Radio frequency electric power leading-in apparatus |
| JP2009049028A (en) * | 2007-08-13 | 2009-03-05 | Fuji Electric Systems Co Ltd | Apparatus for manufacturing thin film solar cell |
| CN101796222A (en) * | 2008-05-30 | 2010-08-04 | 瑞纳股份有限公司 | Apparatus and method for providing electrical contact for planar material in straight-through installations |
| CN202465871U (en) * | 2012-02-16 | 2012-10-03 | 肇庆市腾胜真空技术工程有限公司 | Automatic input electrode bonding mechanism for vacuum coating |
| JP2014047405A (en) * | 2012-08-31 | 2014-03-17 | Oji Holdings Corp | Plasma vapor deposition device, plasma vapor deposition device cleaning method, and plasma vapor deposition device operating method |
| CN104831247A (en) * | 2015-04-15 | 2015-08-12 | 赫得纳米科技(昆山)有限公司 | Horizontal continuous magnetron sputtering film plating machine online panel constant-temperature heating apparatus |
| CN205491411U (en) * | 2016-02-01 | 2016-08-17 | 江苏微导纳米装备科技有限公司 | Developments parallel -plate plasma generator |
-
2018
- 2018-12-15 CN CN201811537919.9A patent/CN109355635A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2666929Y (en) * | 2003-12-03 | 2004-12-29 | 刘晓荫 | Radio frequency electric power leading-in apparatus |
| JP2009049028A (en) * | 2007-08-13 | 2009-03-05 | Fuji Electric Systems Co Ltd | Apparatus for manufacturing thin film solar cell |
| CN101796222A (en) * | 2008-05-30 | 2010-08-04 | 瑞纳股份有限公司 | Apparatus and method for providing electrical contact for planar material in straight-through installations |
| CN202465871U (en) * | 2012-02-16 | 2012-10-03 | 肇庆市腾胜真空技术工程有限公司 | Automatic input electrode bonding mechanism for vacuum coating |
| JP2014047405A (en) * | 2012-08-31 | 2014-03-17 | Oji Holdings Corp | Plasma vapor deposition device, plasma vapor deposition device cleaning method, and plasma vapor deposition device operating method |
| CN104831247A (en) * | 2015-04-15 | 2015-08-12 | 赫得纳米科技(昆山)有限公司 | Horizontal continuous magnetron sputtering film plating machine online panel constant-temperature heating apparatus |
| CN205491411U (en) * | 2016-02-01 | 2016-08-17 | 江苏微导纳米装备科技有限公司 | Developments parallel -plate plasma generator |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112795896A (en) * | 2021-04-15 | 2021-05-14 | 苏州迈为科技股份有限公司 | Vacuum coating device |
| CN116732502A (en) * | 2023-03-28 | 2023-09-12 | 成都沃特塞恩电子技术有限公司 | Sample stage assembly with bias leads and MPCVD system |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190219 |