CN109283722A - A kind of display panel and preparation method thereof, display device - Google Patents
A kind of display panel and preparation method thereof, display device Download PDFInfo
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- CN109283722A CN109283722A CN201811156669.4A CN201811156669A CN109283722A CN 109283722 A CN109283722 A CN 109283722A CN 201811156669 A CN201811156669 A CN 201811156669A CN 109283722 A CN109283722 A CN 109283722A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
Abstract
This application discloses a kind of display panels and preparation method thereof, display device, to improve the light transmittance of display panel light transmission bore region.Display panel provided by the present application has viewing area, frontier district, light transmission bore region；Display panel includes first substrate and the second substrate；First substrate includes the first transparent substrates substrate, and the second substrate includes the second transparent substrates substrate；It include display dielectric layer between viewing area first substrate and the second substrate；It include isolated part between frontier district first substrate and the second substrate；In light transmission bore region, it include the first insulating medium layer between first transparent substrates substrate and the second transparent substrates substrate, it is non-solid dielectric that first insulating medium layer includes at least a kind of under normal temperature and pressure conditions, medium in non-solid dielectric and display dielectric layer is different material, and the first transparent substrates substrate, the second transparent substrates substrate and the first insulating medium layer form light transmission passage；The light transmittance of light transmission passage is greater than the first preset value.
Description
Technical field
This application involves field of display technology more particularly to a kind of display panel and preparation method thereof, display device.
Background technique
With the continuous development of display technology, the display screens such as " Rimless ", " screen " become and grind comprehensively in the field of display
Study carefully hot spot.Bigger accounts for screen than bringing superior visual experience to user, can also show more information, therefore, pursue
Bigger screen accounting has become the mainstream development trend of display product.
In the prior art, display product is in order to pursue high screen accounting, constantly compression frame, while designing special-shaped screen,
Comprehensive screen with hole configurations will become the recent tendency of design, and hole location can place camera, the devices such as earpiece.?
The viewing area split shed of display screen places camera maximizing and improves screen accounting, currently, forming the one of hole in the prior art
Kind mode is to form hole using borehole technology, but borehole technical requirements glass-cutting precision and technological ability are very harsh,
And the shape of hole is limited, therefore the problem that this mode is faced with that production capacity is low, yield is low, at high cost etc..With LCD display
For plate, formed hole another way be cover board, array substrate glass and color membrane substrates glass and its between region not
Borehole, still, due to the not borehole of the region between array substrate glass and color membrane substrates glass, the transmitance of light is lower, photosensitive
For element such as camera in the case where dark, the decline of shooting picture quality influences user experience.
Summary of the invention
The embodiment of the present application provides a kind of display panel and preparation method thereof, display device, to improve display panel
The light transmittance of light transmission bore region.
A kind of display panel provided by the embodiments of the present application, the display panel have viewing area, are surrounded by the viewing area
Frontier district and the light transmission bore region that is surrounded by the frontier district；The display panel includes: the first substrate being oppositely arranged
And the second substrate；The first substrate includes the first transparent substrates substrate, and the second substrate includes the second transparent substrates substrate；
It include display dielectric layer between the viewing area, the first substrate and the second substrate；In the frontier district, described
It include isolated part between one substrate and the second substrate；In the light transmission bore region, the first transparent substrates substrate and
It include the first insulating medium layer between the second transparent substrates substrate, first insulating medium layer includes at least one kind normal
It is non-solid dielectric under the conditions of normal temperature and pressure, the non-solid dielectric is with the medium in the display dielectric layer
Different material；The first transparent substrates substrate, the second transparent substrates substrate and first insulating medium layer composition
Light transmission passage；The light transmittance of the light transmission passage is greater than the first preset value.
A kind of display device provided by the embodiments of the present application, including above-mentioned display panel provided by the embodiments of the present application.
A kind of preparation method of display panel provided by the embodiments of the present application, this method comprises:
First substrate is formed, the first substrate includes the first transparent substrates substrate, and the first substrate is saturating with first
Light aperture region；
Form the second substrate；The second substrate includes the second transparent substrates substrate and shown area is arranged in surrounds
The isolated part of frontier district, the second substrate have the second light transmission bore region surrounded by the frontier district；
By the first substrate and the second substrate to box, so that the first light transmission bore region and described second is thoroughly
Light aperture region is overlapped to form light transmission bore region in the orthographic projection perpendicular to first underlay substrate direction, also, described aobvious
Show area, so that display dielectric layer is filled between the first substrate and the second substrate, in the light transmission bore region, so that institute
It is non-solid for stating formation between the first underlay substrate and second underlay substrate and including at least a kind of under normal temperature and pressure conditions
Dielectric the first insulating medium layer.
Display panel provided by the embodiments of the present application and preparation method thereof, display device, by the first transparent substrates base
It is provided with the first insulating medium layer between plate and the second transparent substrates substrate, which can be situated between using suitable light transmission
Matter, improves the light transmittance of light transmission passage, improves the light transmittance of light transmission bore region, without to the first transparent substrates substrate and the
Two transparent substrates substrates are cut, can be so that light transmission passage meets preset light transmission requirement, so that light transmission bore region is full
The light transmission requirement set enough, can promote user experience in the case where guaranteeing that display panel prepares yield.
Detailed description of the invention
In order to more clearly explain the technical solutions in the embodiments of the present application, make required in being described below to embodiment
Attached drawing is briefly introduced, it should be apparent that, the drawings in the following description are only some examples of the present application, for this
For the those of ordinary skill in field, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.
Fig. 1 is a kind of structural schematic diagram of display panel provided by the embodiments of the present application；
Fig. 2 is the structural schematic diagram of another display panel provided by the embodiments of the present application；
Fig. 3 is the structural schematic diagram of another display panel provided by the embodiments of the present application；
Fig. 4 is the structural schematic diagram of another display panel provided by the embodiments of the present application；
Fig. 5 is the structural schematic diagram of another display panel provided by the embodiments of the present application；
Fig. 6 is the structural schematic diagram of another display panel provided by the embodiments of the present application；
Fig. 7 is a kind of structural schematic diagram of first substrate provided by the embodiments of the present application；
Fig. 8 is the structural schematic diagram of another first substrate provided by the embodiments of the present application；
Fig. 9 is the structural schematic diagram of another first substrate provided by the embodiments of the present application；
Figure 10 is a kind of structural schematic diagram of the second substrate provided by the embodiments of the present application；
Figure 11 is the structural schematic diagram of another display panel provided by the embodiments of the present application；
Figure 12 is a kind of structural schematic diagram of display device provided by the embodiments of the present application；
Figure 13 is a kind of display panel preparation method flow diagram provided by the embodiments of the present application.
Specific embodiment
The embodiment of the present application provides a kind of display panel, as shown in Figure 1, the display panel has viewing area 1, described
The frontier district 2 and the light transmission bore region 3 surrounded by the frontier district 2 that viewing area 1 surrounds；Along the section of AA ' such as Fig. 2 in Fig. 1
Shown, the display panel includes: the first substrate 4 being oppositely arranged and the second substrate 5；The first substrate 4 includes first saturating
Bright underlay substrate 6, the second substrate 5 include the second transparent substrates substrate 7；In the viewing area 1,4 He of first substrate
It include display dielectric layer 8 between the second substrate 5；In the frontier district 2, the first substrate 4 and the second substrate 5 it
Between include isolated part 9；In the light transmission bore region 3, the first transparent substrates substrate 6 and the second transparent substrates substrate
It include the first insulating medium layer 10 between 7, first insulating medium layer 10 includes at least one kind and is under normal temperature and pressure conditions
Medium in non-solid dielectric, the non-solid dielectric and the display dielectric layer 8 is different material, described
First transparent substrates substrate 6, the second transparent substrates substrate 7 and first insulating medium layer 10 form light transmission passage
11；The light transmittance of the light transmission passage is greater than the first preset value.
Display panel provided by the embodiments of the present application, by the first transparent substrates substrate and the second transparent substrates substrate it
Between be provided with the first insulating medium layer, the insulating medium layer can use suitable light transmission medium, improve the light transmission of light transmission passage
Rate improves the light transmittance of light transmission bore region, without cutting to the first transparent substrates substrate and the second transparent substrates substrate
It cuts, can be so that light transmission passage meet preset light transmission requirement, so that light transmission bore region meets the light transmission requirement of setting, it can be with
User experience is promoted in the case where guaranteeing that display panel prepares yield.
It should be noted that in display panel provided by the embodiments of the present application, can according to the first transparent substrates substrate and
The refractive index of second transparent substrate determines so that light transmission passage meets the first insulating medium layer of default light transmittance condition.Specifically
Ground is respectively n for adjacent refractive index1And n2Two media, when light is to approach normal direction through between both media
Interface when, the reflectivity of lightThe transmissivity of lightI.e. light passes through the saturating of some interface
Light rate is related with the refractive index of two media at the interface is formed.And when light passes through m interface by a certain structure, wherein m
For integer and m >=2, light is respectively T by the transmissivity at each interface1~Tm, then light transmittance of the light Jing Guo the structure is T1×…
×Tm, i.e. the light transmittance of the structure is related with the transmissivity at each interface.For in display panel provided by the embodiments of the present application
Light transmission passage, in the case where the refractive index of the first transparent substrates substrate and the refractive index of the second transparent substrates substrate determine,
The interface of outgoing light transmission passage and the transmission of above-mentioned light can be penetrated into according to the requirement of the light transmittance to light transmission passage, light
Rate, transmittance formula select suitable dielectric so that the light transmittance of light transmission passage meets preset condition.
It should be noted that with display panel including the shape of a light transmission bore region and light transmission bore region for circle in Fig. 1
It is illustrated for shape, the quantity of light transmission bore region, the shape of light transmission bore region can be set according to actual needs in a particular application
Shape can also be selected according to actual needs.
In practical applications, if necessary to when photosensitive element is arranged in the lower section of light transmission bore region, then need light transmission porose area
Domain light transmission with higher, thus in order to meet the actual needs, optionally, display surface provided by the embodiments of the present application
In plate, the light transmittance of light transmission passage can be within the scope of 83%-100%.
Optionally, in display panel provided by the embodiments of the present application, described be non-solid exhausted under normal temperature and pressure conditions
Edge medium is gas-insulated medium or liquid insulating medium.Gas-insulated medium for example can be air.When non-solid insulation
When medium is air, without additionally increasing the technique of setting gas-insulated medium, so as to save display panel production cost.
When non-solid dielectric is liquid insulating medium, can choose refractive index with and the adjacent medium of the liquid insulating medium
The close material of refractive index as liquid insulating medium, further increase the light transmittance of light transmission passage.
Optionally, as seen in figures 3-5, in display panel provided by the embodiments of the present application, it is described under normal temperature and pressure conditions
It is contacted for non-solid dielectric 12 with the first transparent substrates substrate 6 and/or the second transparent substrates substrate 7.Fig. 3
In, in light transmission bore region 3, non-solid dielectric 12 is contacted with the first transparent substrates substrate 6, non-solid dielectric 12 with
It further include other dielectrics between second transparent substrates substrate 7.In Fig. 4, in light transmission bore region 3, non-solid dielectric
12 contact with the second transparent substrates substrate 7, further include that other are exhausted between non-solid dielectric 12 and the first transparent substrates substrate 6
Edge medium.In Fig. 5, in light transmission bore region 3, non-solid dielectric 12 and the first transparent substrates substrate 6 and the second transparent lining
Substrate 7 contacts.
Display panel provided by the embodiments of the present application, non-solid dielectric and the first transparent substrates substrate and/
Or the second transparent substrates substrate contact can be with so as to reduce the number of interfaces that light penetrates light transmission passage as far as possible
Reduce the reflectivity that light penetrates light transmission passage.When light transmission passage only include the first transparent substrates substrate, non-solid dielectric with
And when the second transparent substrates substrate, light is less through the number of interfaces of light transmission passage, can not cut the first transparent substrates base
It in the case where plate and the second transparent substrates substrate, further decreases light and penetrates the reflectivity of light transmission passage, so that it is logical to improve light transmission
The light transmittance in road.
In Fig. 3~5, non-solid dielectric 12 is gas-insulated medium or liquid insulating medium.According to the application reality
For the transmissivity of light and the formula of reflectivity for applying example offer it is found that the refractive index of two kinds of adjacent materials is closer, light penetrates this
The reflectivity at the interface that two kinds of materials are formed is about small, transmissivity is higher, when non-solid dielectric is liquid insulating medium,
Can choose refractive index with and the adjacent medium of the liquid insulating medium the close material of refractive index as liquid insulating medium.
By taking liquid insulating medium is contacted with the first transparent substrates substrate and the second transparent substrates substrate as an example, due to light with
Penetrating refractive index close to normal direction is respectively n1And n2Two media between interface when, the reflectivity of lightThe material of the transmissivity T=1-R of light, usual first transparent substrates substrate and the second transparent substrates substrate is
Glass, when making light through the transmissivity at interface between liquid insulating medium and glass not less than t, T=1-R >=t, then R
≤ 1-t, the refractive index n of liquid insulating mediumLiquid insulating mediumWith the refractive index n of glassGlassMeet:Such as it can choose fluent material similar in refractive index and glass refraction as liquid
Dielectric to guarantee light transmission passage light transmittance with higher, such as can make light through liquid insulating medium and glass
Between interface transmissivity be not less than 99%, i.e. t=99%, T=1-R >=99%, R≤1%, in this way, can be penetrated in light
In the case that the number of interfaces of light transmission passage is less, passed through thoroughly by selecting the fluent material of appropriate index to further decrease light
The reflectivity of optical channel improves light transmittance of the light by light transmission passage, such situation, the refractive index of liquid insulating medium
nLiquid insulating mediumWith the refractive index n of glassGlassNeed to meet following condition:The refractive index of glass
nGlassEqual to 1.5, then the refractive index n of liquid insulating mediumLiquid insulating mediumRange be 1.286≤nLiquid insulating medium≤1.833.Also, light
Through the interface between liquid insulating medium and glass transmissivity be not less than 99% when, due to the refractive index of liquid insulating medium
It is approached with the refractive index of glass, the reflectivity between liquid insulating medium and glass is very small to be ignored, thus fluid insulation
The light transmission passage that medium and the first transparent substrates substrate and the second transparent substrates substrate are constituted can be equivalent at one block of glass, thus
It can be scattered to avoid light, further increase the light transmittance of light transmission passage.In order to obtain light transmission bore region with higher light transmittance
Display panel, can make light through the transmissivity at interface between liquid insulating medium and glass not less than 99.36%, i.e.,
T=99.36%, then the refractive index n of liquid insulating mediumLiquid insulating medium1.389≤n of rangeLiquid insulating medium≤1.761.When first thoroughly
When the material of bright underlay substrate and the second transparent substrates substrate is glass, liquid insulating medium for example can choose benzene (C6H6)、
Carbon disulfide (CS2), carbon tetrachloride (CCl14), glycerol (C3H8O3) etc. the fluent material that meets the requirements of refractive index, wherein C6H6's
Refractive index is 1.5012, CS2Refractive index be 1.6276, CCl14Refractive index be 1.4607, C3H8O3Refractive index be 1.473.
Certainly, consider display panel preparation process difficulty and complexity, display panel provided by the embodiments of the present application can also
As shown in fig. 6, non-solid dielectric 12 does not contact with the first transparent substrates substrate 6 and the second transparent substrates substrate 7.
For non-solid dielectric and the first transparent substrates substrate and/or the second discontiguous feelings of transparent substrates substrate
Condition, by taking Fig. 3,4,6 as an example, other dielectrics between non-solid dielectric 12 and the second transparent substrates substrate 7 be may be from
In the insulating materials used in the second substrate manufacturing process, non-solid dielectric 12 and the first transparent substrates substrate 6 it
Between other dielectrics may be from the insulating materials used in first substrate manufacturing process.In this way, selection is suitable
Insulating materials, the technique without additionally increasing setting dielectric can be so that the light transmittance of light transmission passage meets the saturating of setting
Light demand.
For other dielectrics between non-solid dielectric and the first transparent substrates substrate from the first base
The case where insulating materials used in plate manufacturing process, optionally, as shown in fig. 7, the first substrate 6 further include: be located at
The display function layer 13 of the first transparent substrates substrate 6 towards the second substrate side, and it is located at the display function
Layer 13 deviates from the first alignment layer 14 of 6 side of the first transparent substrates substrate；
Wherein, the first alignment layer 14 exists only in the viewing area 1 and the frontier district 2, the display function
Layer 13 includes multiple insulating layers, in the display function layer 13 at least partly described insulating layer be both present in the viewing area 1 or
It is present in the frontier district 2 and the light transmission bore region 3；First insulating medium layer further includes by being present in the light transmission
The composite insulation layer 21 of the insulating layer composition of bore region 3.
Optionally, in Fig. 7, the composite insulation layer 21 includes: positioned at the first transparent substrates substrate 6 towards described
The buffer layer (Buffer) 15 of two substrate sides, positioned at the buffer layer 15 away from 4 side of the first transparent substrates substrate
Gate insulation layer (Gate Insulato, GI) 16 deviates from the layer insulation of 15 side of buffer layer positioned at the gate insulation layer 16
Layer (Interlevel dielectric, ILD) 17, positioned at the interlayer insulating film 17 away from the flat of 15 side of buffer layer
Smoothization layer (Planarization layer, PLN) 18, positioned at the planarization layer 18 away from the of 15 side of buffer layer
One passivation layer (Passivation layer, PV) 19.
It should be noted that the non-insulated layer in display function layer is not shown in Fig. 7, when first substrate is film crystal
When pipe array substrate, by taking thin film transistor (TFT) is top gate structure as an example, in viewing area, display function layer further include: Buffer and GI
Between active layer, the first metal layer between GI and ILD, the second metal layer between ILD and PLN, PLN and the first passivation layer it
Between pixel electrode layer.Display panel including above structure is without touch function only display surface having a display function
Plate.And for both having touch function to have display panel having a display function, it is also necessary to third metal layer be arranged, and need
Increase insulating layer.
For both there is touch function to have display panel having a display function, optionally, as shown in figure 8, described compound
Insulating layer further includes the second passivation layer 20 for deviating from 15 side of buffer layer positioned at first passivation layer 19.Equally, it shows
Non-insulated layer in functional layer is not shown in fig. 8, still by taking thin film transistor (TFT) is top gate structure as an example, in viewing area, shows function
Ergosphere further include: active layer between Buffer and GI, the first metal layer between GI and ILD, the second gold medal between ILD and PLN
Belong to layer, the pixel electrode between third electrode layer and the first passivation layer and the second passivation layer between PLN and the first passivation layer
Layer.
Optionally, the insulating layer material in composite insulation layer is identical.So as to reduce interface of the light by light transmission passage.
Optionally, the first transparent substrates substrate is glass substrate, each insulating layer in the composite insulation layer
Material be silica (SixOy).The refractive index of glass is 1.5, and the refractive index of silica is about 1.48, i.e. composite insulation layer
Refractive index and the refractive index of glass are close, so as to reduce the reflectivity between composite insulation layer and glass, improve transmissivity,
And then the light transmittance of light transmission passage can be improved.
It should be noted that by parameters such as control rate of film build, film forming atmosphere gas percentage, voltages, so that being formed
In the technique of each silicon oxide film, the parameter of above-mentioned influence silicon oxide film refractive index is identical as far as possible, compound exhausted so as to avoid
The refractive index difference of different insulative layer is larger in edge layer, and then avoids increasing the light transmission interface of light transmission passage.
It should be noted that it is exhausted as display function layer to generally select silica, silicon nitride when preparing first substrate
Edge layer, when the first transparent substrates substrate is glass substrate, the material of each insulating layer is in the composite insulation layer
When silica, each insulating layer that can be in display function layer is silicon oxide film, i.e. Fig. 7, buffer layer 15, gate insulation in 8
Layer 16, interlayer insulating film 17, planarization layer 18, the first passivation layer 19, the second passivation layer 20 are silicon oxide film；It is also possible to show
The material for showing a part of insulating layer in functional layer is silica, and the material of remaining insulating layer is silicon nitride, and such situation is being formed
After flood silicon nitride dielectric layer, the silicon nitride dielectric layer positioned at light transmission bore region can be etched away, it is subsequent that silica is set again
Planarization layer planarization；It is of course also possible to etch away several layers of silicon oxide films of light transmission bore region, subsequent that silica is arranged again is flat
Change layer planarization, avoid the refractive index difference of different insulative layer in composite insulation layer larger, avoids the light transmission for increasing light transmission passage
Interface, for example, as shown in figure 9, the buffer layer 15 of light transmission bore region 3, gate insulation layer 16 and interlayer insulating film 17 etch away, after
It is continuous to be planarized by planarization layer 18.
For other dielectrics between non-solid dielectric and the second transparent substrates substrate from the second base
The case where insulating materials used in plate manufacturing process, optionally, as shown in Figure 10, the second substrate further include: be located at
Spaced multiple light shield layers 22 of the second transparent substrates substrate 7 towards one side surface of first substrate are located at institute
The color filter film block 24 of the interval region between light shield layer 23 is stated, each color filter film block 24 and the shading are located at
Layer 22 deviates from the protective layer 25 of 7 side of the second transparent substrates substrate, and is located at the protective layer 25 and deviates from the colour
The multiple spacer materials 26 and second orientation layer 27 of filter coating block side；
Wherein, the color filter film block 24, the light shield layer 22 and the second orientation layer 27 exist only in described
In viewing area 1 and the frontier district 2, the protective layer 25 be both present in the viewing area 1 exist in the frontier district 2 and
The light transmission bore region 3, first insulating medium layer further include the protective layer 25.
It should be noted that protective layer is preferable over material similar in the second transparent substrates substrate index, such as can make
The transmissivity that light is obtained through the interface between protective layer and the second transparent substrates substrate is not less than 99%, so as to further mention
The light transmittance in high light transmission channel.
Display panel provided by the embodiments of the present application, spacer material can be provided only on viewing area, also can be set and showing
Area and light transmission bore region, when light transmission bore region is provided with spacer material, for guarantee the light transmittance of light transmission passage, selection is suitable
Translucent material is as spacer material, when light transmission passage includes protective layer, such as can choose the material with protective layer refractive index close
Material, so that light is not less than 99% through the transmissivity at the interface between protective layer and spacer material.
Optionally, the display dielectric layer is liquid crystal layer.Display panel i.e. provided by the embodiments of the present application is liquid crystal display
Panel.For example, display dielectric layer 8 is liquid crystal layer in the display panel provided by the embodiments of the present application as shown in Fig. 1~5.
Optionally, as shown in figure 11, the display panel further includes being located at the second transparent substrates substrate away from described
Upper polaroid 28, optical cement 29 (Optically Clear Adhesive, OCA) and the cover board that light shield layer side is set gradually
30, the upper polarisation 28 and the optical cement 29 exist only in the viewing area 1 and the frontier district 2.
It optionally, may include the second insulating medium layer between light transmission bore region, cover board and the second transparent substrates substrate, the
Material similar in two insulating medium layer preferred index and cover board and/or the second transparent substrates substrate index.Such as it can make
The transmissivity that light is obtained through the interface between the second insulating medium layer and cover board or the second transparent substrates substrate is not less than 99%, from
And it can be further improved the light transmittance of light transmission bore region.
Optionally, in display panel provided by the embodiments of the present application, isolated part is frame glue.
The embodiment of the present application provides a kind of display device, including above-mentioned display panel provided by the embodiments of the present application.
Display device provided by the embodiments of the present application, such as can be the devices such as mobile phone, computer, TV.
Display device provided by the embodiments of the present application further includes backing structure, and display panel is located on backing structure.With
For display device includes display panel as shown in figure 11, display device provided by the embodiments of the present application is as shown in figure 12, back
Photo structure includes backlight assembly (BackLight Unit, BLU) 31 and the down polaroid 32 on BLU 31, display
The first transparent substrates substrate 6 in panel is located on down polaroid 32, and BLU 31 and down polaroid 32 are only located at viewing area 1
The sense such as camera can be set in the region 33 that BLU 31 and down polaroid 32 are surrounded in light transmission bore region 3 with frontier district 2
Optical element.
Based on the same inventive concept, the embodiment of the present application also provides a kind of preparation methods of display panel, such as Figure 13 institute
Show, this method comprises:
S101, first substrate is formed, the first substrate includes the first transparent substrates substrate, and the first substrate has the
One light transmission bore region；
S102, the second substrate is formed；The second substrate includes the second transparent substrates substrate and is arranged in shown area
The isolated part of the frontier district of encirclement, the second substrate have the second light transmission bore region surrounded by the frontier district；
S103, by the first substrate and the second substrate to box so that the first light transmission bore region and described
Second light transmission bore region is overlapped to form light transmission bore region in the orthographic projection perpendicular to first underlay substrate direction, also,
The viewing area, so that fill display dielectric layer between the first substrate and the second substrate, in the light transmission bore region,
So that between first underlay substrate and second underlay substrate formed include at least one kind be under normal temperature and pressure conditions
First insulating medium layer of non-solid dielectric.
Optionally, formation first substrate described in step S101 specifically includes:
Display function layer is formed on the first transparent substrates substrate；
First alignment layer is formed on the display function layer；
The graphical first alignment layer exposes the display function layer in the first light transmission bore region；
Alternatively, formation first substrate described in step S101 specifically includes:
Display function layer is formed on the first transparent substrates substrate；
Graphically remove the display function layer of the first light transmission bore region；
First alignment layer is formed on the display function layer；
The graphical first alignment layer exposes first underlay substrate in the first light transmission bore region；
Alternatively, formation first substrate described in step S101 specifically includes:
Display function layer is formed on the first transparent substrates substrate；
First alignment layer is formed on the display function layer；
The graphical display function layer and the first alignment layer, so that the first substrate is in first loophole
Expose first underlay substrate in region.
Include the steps that forming insulating layer it should be noted that forming display function layer, for example including formation buffer layer, grid
The step of insulating layer, interlayer insulating film, smoothization layer, passivation layer, the material of above-mentioned insulating layer can choose silicon oxide or silicon nitride.
The display panel contacted for preparing non-solid dielectric with the first transparent substrates substrate, in the step of forming first substrate
In, display function layer can be initially formed, form first alignment layer on display function layer later, formed first alignment layer it
Afterwards, the first alignment layer of the first light transmission bore region and display function layer are all removed, exposes the first underlay substrate；It can also be
The display function layer of the first light transmission bore region is graphically removed after formation display function layer, first orientation is arranged in flood again later
Layer, the graphical first alignment layer for removing the first light transmission bore region.For non-solid dielectric and the first transparent substrates substrate
Between other dielectrics from the insulating materials used in first substrate manufacturing process the case where, formed first
In the step of substrate, so that the first light transmission bore region of first substrate only includes insulating layer of silicon oxide.When each insulation of formation
When layer is membranous layer of silicon oxide, after forming first alignment layer, according to process conditions when being embodied, can only it etch away
The first alignment layer of first light transmission porose area can also cross the partial insulative layer for carving the first light transmission porose area.When the insulating layer of formation
When including silicon nitride film layer, after forming silicon nitride film layer, the silicon nitride film layer positioned at the first light transmission bore region is etched away, after
It is continuous to re-form membranous layer of silicon oxide planarization.It is of course also possible to several layers of silicon oxide films of the first light transmission bore region are etched away, for example,
Before forming planarization layer, etch away the buffer layer gate insulation layer and interlayer insulating film of the first light transmission bore region, it is subsequent again
Membranous layer of silicon oxide is arranged to planarize.
Optionally, step S102 forms the second substrate and specifically includes:
The second substrate is formed to specifically include:
Viewing area on the second transparent substrates substrate forms the figure of light shield layer；
In the viewing area, color filter film is formed on the second transparent substrates substrate and the light shield layer
Figure；
Protection is formed on the second transparent substrates substrate of the color filter film, the light shield layer and exposure
Layer；
Second orientation layer is formed on the protective layer and forms spacer material in the viewing area；
The graphical second orientation layer exposes the protective layer in the second light transmission bore region；Alternatively, graphical institute
Second orientation layer and the protective layer are stated, exposes the second transparent substrates substrate in the second light transmission bore region；
Isolated part is formed in the frontier district.
It should be noted that the display surface contacted for preparing non-solid dielectric with the second transparent substrates substrate
Plate after forming second orientation layer and spacer material on protective layer, is needed second in the step of forming the second substrate
The second orientation layer and protective layer of light transmission bore region remove, and expose the second underlay substrate.For non-solid dielectric and second
The feelings of other dielectrics between transparent substrates substrate from the insulating materials used in the second substrate manufacturing process
Condition, on the second transparent substrates substrate of the color filter film, the light shield layer and exposure formed refractive index with
The close protective layer of second transparent substrates substrate index, it is subsequent after forming second orientation layer and spacer material, it etches away
The second orientation layer of second light transmission bore region.
Optionally, when the non-solid dielectric in display panel is liquid insulating medium, by the first substrate
And before the second substrate is to box, this method further include:
Liquid insulating medium is instilled in the first light transmission bore region using formula injection technology is dripped.
Liquid insulating medium is under normal temperature and pressure conditions be liquid material.
Optionally, for the preparation of liquid crystal display panel, this method further includes using to drip formula injection technology in the first base
The display area of plate instills the step of liquid crystal.It, can be using the formula note that drips for needing the case where liquid insulating medium is arranged
Enter technique before the first light transmission bore region instills liquid insulating medium, using formula injection technology of dripping in first substrate
Display area instills liquid crystal.
In conclusion display panel provided by the embodiments of the present application and preparation method thereof, display device, by saturating first
It is provided with the first insulating medium layer between bright underlay substrate and the second transparent substrates substrate, which can be using suitable
Light transmission medium, improve the light transmittance of light transmission passage, the light transmittance of light transmission bore region improved, without to the first transparent substrates
Substrate and the second transparent substrates substrate are cut, can be so that light transmission passage meets preset light transmission requirement, so that light transmission
Bore region meets the light transmission requirement of setting, and user experience can be promoted in the case where guaranteeing that display panel prepares yield.
Obviously, those skilled in the art can carry out various modification and variations without departing from the essence of the application to the application
Mind and range.In this way, if these modifications and variations of the application belong to the range of the claim of this application and its equivalent technologies
Within, then the application is also intended to include these modifications and variations.
Claims (16)
1. a kind of display panel, which is characterized in that the display panel have viewing area, the frontier district that is surrounded by the viewing area with
And the light transmission bore region surrounded by the frontier district；The display panel includes: the first substrate being oppositely arranged and the second substrate；
The first substrate includes the first transparent substrates substrate, and the second substrate includes the second transparent substrates substrate；In the display
Area includes display dielectric layer between the first substrate and the second substrate；In the frontier district, the first substrate and institute
Stating includes isolated part between the second substrate；In the light transmission bore region, the first transparent substrates substrate and described second is thoroughly
It include the first insulating medium layer between bright underlay substrate, first insulating medium layer includes at least one kind in normal temperature and pressure conditions
It is down non-solid dielectric, the medium in the non-solid dielectric and the display dielectric layer is different material,
The first transparent substrates substrate, the second transparent substrates substrate and first insulating medium layer form light transmission passage；
The light transmittance of the light transmission passage is greater than the first preset value.
2. display panel according to claim 1, which is characterized in that the light transmittance of institute's light transmission passage is 83%-100%.
3. display panel according to claim 1, which is characterized in that described be non-solid exhausted under normal temperature and pressure conditions
Edge medium is gas-insulated medium or liquid insulating medium.
4. display panel according to claim 1, which is characterized in that described be non-solid exhausted under normal temperature and pressure conditions
Edge medium is contacted with the first transparent substrates substrate and/or the second transparent substrates substrate.
5. display panel according to claim 3, which is characterized in that the first substrate further include: be located at described first
Display function layer of the transparent substrates substrate towards the second substrate side, and it is located at the display function layer away from described the
The first alignment layer of one transparent substrates substrate side；
Wherein, the first alignment layer exists only in the viewing area and the frontier district, and the display function layer includes more
A insulating layer, at least partly described insulating layer had both been present in the viewing area and exists in the boundary in the display function layer
Area and the light transmission bore region；First insulating medium layer further includes the insulation by being present in the light transmission bore region
The composite insulation layer of layer composition.
6. display panel according to claim 5, which is characterized in that the composite insulation layer includes: positioned at described first
Buffer layer of the transparent substrates substrate towards the second substrate side is located at the buffer layer and deviates from the first transparent substrates base
The gate insulation layer of plate side deviates from the interlayer insulating film of the buffer layer side positioned at the gate insulation layer, is located at the interlayer
Insulating layer deviates from the planarization layer of the gate insulation layer side, deviates from the first of the buffer layer side positioned at the planarization layer
Passivation layer.
7. display panel according to claim 6, which is characterized in that the composite insulation layer further includes being located at described first
Passivation layer deviates from the second passivation layer of the buffer layer side.
8. display panel according to claim 6 or 7, which is characterized in that the first transparent substrates substrate is glass base
Plate, the material of each insulating layer is silica in the composite insulation layer.
9. display panel according to claim 3, which is characterized in that the second substrate further include: be located at described second thoroughly
Spaced multiple light shield layers of the bright underlay substrate towards one side surface of first substrate, between the light shield layer
The color filter film block of interval region, is located at each color filter film block and the light shield layer deviates from the described second transparent lining
The protective layer of substrate side, and positioned at the protective layer away from multiple spacer materials of color filter film block side and the
Two oriented layer；
Wherein, the color filter film block, the light shield layer and the second orientation layer exist only in the viewing area and
In the frontier district, the protective layer had both been present in the viewing area and has existed in the frontier district and the light transmission bore region,
First insulating medium layer further includes the protective layer.
10. according to right want 1 described in display panel, which is characterized in that the display dielectric layer be liquid crystal layer.
11. display panel according to claim 1, which is characterized in that the display panel further includes being located at described second
Transparent substrates substrate deviates from upper polaroid, optical cement and the cover board that the light shield layer side is set gradually, the upper polaroid
And the optical cement exists only in the viewing area and the frontier district.
12. a kind of display device, which is characterized in that including described in any item display panels according to claim 1~11.
13. a kind of preparation method of display panels described in any item according to claim 1~11, which is characterized in that this method
Include:
First substrate is formed, the first substrate includes the first transparent substrates substrate, and the first substrate has the first loophole
Region；
Form the second substrate；The second substrate includes the second transparent substrates substrate and the boundary that shown area's encirclement is arranged in
The isolated part in area, the second substrate have the second light transmission bore region surrounded by the frontier district；
By the first substrate and the second substrate to box, so that the first light transmission bore region and second loophole
Region is overlapped to form light transmission bore region in the orthographic projection perpendicular to first underlay substrate direction, also, in the viewing area,
So that display dielectric layer is filled between the first substrate and the second substrate, in the light transmission bore region, so that described
Form that include at least a kind of be non-solid exhausted under normal temperature and pressure conditions between one underlay substrate and second underlay substrate
First insulating medium layer of edge medium.
14. according to the method for claim 13, which is characterized in that the formation first substrate specifically includes:
Display function layer is formed on the first transparent substrates substrate；
Graphically remove the display function layer of the first light transmission bore region；
First alignment layer is formed on the display function layer；
The graphical first alignment layer exposes first underlay substrate in the first light transmission bore region；
Alternatively, the formation first substrate specifically includes:
Display function layer is formed on the first transparent substrates substrate；
First alignment layer is formed on the display function layer；
The graphical display function layer and the first alignment layer, so that the first substrate is in the first light transmission bore region
Expose first underlay substrate.
15. according to the method for claim 14, which is characterized in that form the second substrate and specifically include:
The second substrate is formed to specifically include:
Viewing area on the second transparent substrates substrate forms the figure of light shield layer；
In the viewing area, the figure of color filter film is formed on the second transparent substrates substrate and the light shield layer
Shape；
Protective layer is formed on the second transparent substrates substrate of the color filter film, the light shield layer and exposure；
Second orientation layer is formed on the protective layer and forms spacer material in the viewing area；
The graphical second orientation layer exposes the protective layer in the second light transmission bore region；Alternatively, graphical described the
Two oriented layer and the protective layer expose the second transparent substrates substrate in the second light transmission bore region；
Isolated part is formed in the frontier district.
16. according to the method for claim 13, which is characterized in that by the first substrate and the second substrate pair
Before box, this method further include:
Liquid insulating medium is instilled in the first light transmission bore region using formula injection technology is dripped.
Priority Applications (1)
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| CN201811156669.4A CN109283722A (en) | 2018-09-30 | 2018-09-30 | A kind of display panel and preparation method thereof, display device |
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| CN201811156669.4A CN109283722A (en) | 2018-09-30 | 2018-09-30 | A kind of display panel and preparation method thereof, display device |
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| CN110609419A (en) * | 2019-08-23 | 2019-12-24 | 武汉华星光电技术有限公司 | Display panel preparation method and display panel |
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| CN114296573A (en) * | 2021-06-22 | 2022-04-08 | 友达光电股份有限公司 | Display device |
| CN114690468A (en) * | 2022-04-12 | 2022-07-01 | 广州华星光电半导体显示技术有限公司 | Display panel and display device |
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