CN109277269A - A kind of epoxy nano coating and preparation method thereof - Google Patents
A kind of epoxy nano coating and preparation method thereof Download PDFInfo
- Publication number
- CN109277269A CN109277269A CN201811242687.4A CN201811242687A CN109277269A CN 109277269 A CN109277269 A CN 109277269A CN 201811242687 A CN201811242687 A CN 201811242687A CN 109277269 A CN109277269 A CN 109277269A
- Authority
- CN
- China
- Prior art keywords
- plasma
- discharge
- nano coating
- preparation
- epoxy nano
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
- B05D3/141—Plasma treatment
- B05D3/142—Pretreatment
Abstract
The present invention provides a kind of epoxy nano coatings and preparation method thereof, substrate are exposed in monomer of the invention, and chemical reaction occurs in substrate surface by plasma discharge and forms protective coating.The present invention causes the polymerization reaction of epoxide using plasma technique, pass through the process conditions such as control flow of monomer, plasma discharge power, destruction of the high power discharge means to monomer molecule structural intergrity is avoided, while avoiding the problem that epoxides implode causes heat dissipation difficult.
Description
Technical field
The present invention relates to plasma chemical vapor deposition technique fields, and in particular to a kind of epoxy nano coating and its
Preparation method.
Background technique
Epoxide refers to the compound of oxygen heterocycle propane, contains ehter bond in main chain after ring-opening polymerisation, has excellent
Good chemical resistance performance, especially acid-fast alkali-proof, resistance to oxidation.In addition, adhesive force of the epoxide to numerous substrate surfaces
Very well, especially metal surface, after crosslinked, rigidity is strong, heat-resisting, wear-resisting；Compound contains ternary cyclic ether structure, tension
Greatly, thermodynamically very big, polymer easy to form is inclined in open loop, therefore epoxy resin has obtained answering extensively in coatings industry
With.CN102229777A " a kind of hydro-oleophobicity epoxy coating and its preparation and application " is by introducing low-surface energy substance
And nanoparticle, using microphase-separated principle, the epoxy coating prepared has strong hydro-oleophobicity, reachable to the contact angle of water
To 149 °, 101 ° are up to the contact angle of oil.Preparation method and application method are as follows: the first step, first by fluorinated acrylate,
It is multinomial through demulsification, washing and drying etc. according to certain mass proportion mixing containing raw materials such as vinyltriethoxysilane, styrene
Technique prepares fluorine-silicon copolymer object；Second step is by epoxy colored paint, the fluorine-silicon copolymer object of preparation, mixed solvent, nanometer titanium dioxide calcium, solid
The raw materials such as agent are mixed with to obtain low-surface-energy epoxy coating according to the quality proportioning that feeds intake；Third step, by the low-surface-energy ring
In the coating on substrate surface of oxygen coating, it is placed in 1~5h of solidification at 50 DEG C, then is warming up to 1~5h of solidification at 120 DEG C~200 DEG C.
This method preparation process is complicated, is easy to produce pollution using a variety of organic solvents in formula.A kind of CN 107694881 A " raising
The method of epoxy coating bond strength " provide a kind of method for improving epoxy coating bond strength, i.e., it is carried out in matrix surface
Apply epoxy resin before, normal pressure gas plasma processing is carried out to it, by the grease stain of matrix surface, adsorbate etc. bombard from
Cleaved surface increases the roughness on some material matrix surfaces, improves the effective bond area and infiltration surface area of coating and matrix.
After matrix surface is plasma-treated in 2h, the preparation of epoxy coating is carried out using spread coating, spray coating method or fluidized bed process.
As described in this two patents, the construction technology of epoxy resin is all to carry out liquid phase coating in substrate surface at present, then using solid
Change means make coating material further be cross-linked to form protective coating, and film thickness is generally all at tens microns or more.But in this thickness
Under, the barrier property of coating itself is easy to cause the degradations such as matrix thermal diffusivity, electric conductivity.It is particularly used in electronic component
When on the position more demanding to electronic signal such as interface, the electronic signal for being easy to appear product processed substantially decays, cannot
The case where normal use；The technique of construction also determines these epoxy coatings, and there are matrix surfaces to cover uneven, device portion
Quartile sets the case where failing coated effective protection.Using method for plasma deposition, epoxy polymer coating can kept strong
In the case of degree and binding force, its thickness controllable precise in nanometer and micro-scaled range is realized.
Summary of the invention
The present invention is to provide to overcome disadvantage mentioned above and prepare asphalt mixtures modified by epoxy resin using plasma chemical vapor deposition technique
The method of rouge nano coating and the nano coating obtained using this method.It is high viscous the present invention also provides being prepared under a kind of low-power
The method of relay coating.
The present invention is achieved by the following technical solutions:
A kind of epoxy nano coating, which is characterized in that substrate is exposed to structures alone shown in formula (I), is passed through
Gas ions means occur chemical reaction in substrate surface and form protective coating:
Monomer:
Wherein, R1、R2、R3It is the group being connected with three-membered ring, independently selected from hydrogen, alkyl, aryl, halogen, halogenated alkyl
Or hydroxyl；M is 0-8 integer, and n is the integer of 1-15.Group R on three-membered ring1、R2、R3Supplied character and group size are to ternary
The stability of ring and open loop tendency have important influence.Alkyl, aryl, halogenated alkyl can be used as power supplying groups and stablize three-membered ring,
And hydroxyl, halogen etc. are that electron-withdrawing group can then be such that the carbon atom electropositivity of electron deficient in three-membered ring further strengthens, lower
Power plasma can rapid ring-opening polymerisation under causing.
Further, R1、R2、R3For hydrophobic group, independently selected from hydrogen, alkyl, halogen or halogenated alkyl.
Further, the halogen is fluorine, and halogenated alkyl is perfluoroalkyl of the carbon number in 1-10, and the fluoro-alkyl can be with
It is straight chain, is also possible to containing branch.
Further, when the X is hydrogen or halogen, since carbon-hydrogen, carbon-halogen bond energy are higher, monomer structure is more steady
It is fixed, resistant to chemical etching excellent.In addition, active force is big between fluorine atom when X is preferably fluorine, C-F key is symmetrically distributed in entire molecule
Around, keep the surface of molecule very low, the coating polymerizeing has good hydrophobicity.
When m > 5, n > 10, monomer boiling point is higher, is unfavorable for vaporizing.Preferably, 0,1,2 or 3 m, n are the integer of 1-8.
The epoxy nano coating can be used for carrying out the surfaces of different substrate materials it is resistant to chemical etching it is hydrophobic protect, base
Material can be the solid materials such as metal, optical instrument, apparel fabrics, electronic device, medical instrument.
The invention also discloses a kind of preparation method of nano coating the following steps are included:
(1) substrate is placed in the reaction cavity of plasma chamber, the intracorporal vacuum degree of reaction chamber is extracted into 0.1-1000
Millitorr；
(2) it is passed through plasma source gas, deposition plasma discharge is opened by monomer and imports reaction chamber after vaporizing
Body carries out chemical vapour deposition reaction；
(3) deposition plasma discharge is closed, clean compressed air or inert gas is passed through and restores to normal pressure, beat
It begins to speak body, takes out substrate.
The monomer is to introduce reaction cavity after decompression vaporization.
Further, plasma source gas described in step (2) can be helium, argon gas, nitrogen, one in hydrogen
Kind or several mixture.
Further, the volume of the plasma chamber is 1L-2000L, and plasma source gas flow is 1-
1000sccm, the flow for being passed through monomer vapours is 1-2000 μ L/min.
Further, in the step (2), after being passed through the plasma source gas and the deposition with etc. from
It further include that pretreatment plasma discharge process is carried out to substrate before daughter electric discharge.
After being passed through plasma source gas in step (2), opens preconditioning plasma electric discharge and first substrate is located in advance
Reason.The power of the pretreatment stage plasma discharge is 1-1000W, continuous discharging time 1-6000s.
Entering the depositional phase after pretreatment stage, (pretreatment is converted to deposition plasma with plasma discharge
Electric discharge), the plasma discharge manner and parameter in two stages can be the same or different.
Further, in the step (2), the power of deposition plasma discharge is during monomer importing cavity
2-500W, continuous discharging time 600-18000s.
It is further preferable that the deposition preferred 2-50W of plasma discharge power.
Further, the plasma discharge (put with plasma by pretreatment plasma discharge and/or deposition
Electricity) mode is radio frequency discharge, microwave discharge, intermediate frequency electric discharge, Penning discharge or spark discharge.
Further, the plasma discharge (put with plasma by pretreatment plasma discharge and/or deposition
It is electric) for radio frequency discharge, the energy way of output that plasma rf is controlled during radio frequency discharge is pulse or continuously exports, etc.
When the energy way of output of gas ions radio frequency is that pulse exports, pulsewidth is 10 μ s-50ms, repetition rate 20Hz-10kHz.
Compared with prior art, monomer polymerization mechanism of the present invention is the plasma of required excitation based on epoxy addition
Power is low, avoids destruction of the high power discharge means to monomer molecule structural intergrity.Present invention employs viscous with substrate
The good epoxide of performance is connect, the binding force of nano coating and substrate is substantially increased.The present invention utilizes plasma skill
Art causes the polymerization reaction of epoxide, by process conditions such as control flow of monomer, plasma discharge power, avoids
The problem that epoxides implode causes heat dissipation difficult.
Specific embodiment
Embodiment 1
A kind of epoxy nano coating and preparation method thereof, by following steps:
(1) iron block is placed in 200L plasma vacuum reaction cavity, continuously vacuumizing to reaction cavity makes vacuum
Degree reaches 0.8 millitorr.
(2) it is passed through helium, flow 50sccm opens RF Plasma Discharge and pre-processed (i.e. to iron block substrate
Open the pretreatment plasma discharge of radio frequency method), pretreatment stage discharge power is 20W, continuous discharge 100s.
(3) it is passed through monomer S1 and prepares nano coating in substrate surface progress chemical vapor deposition, flow of monomer is 150 μ L/
Min is passed through reaction cavity after the vaporization of 1 millitorr high vacuum, and being passed through the time is 2000s.Pretreatment plasma discharge tune
Whole is deposition plasma discharge.The generation of plasma uses radio frequency discharge mode, output side in the depositional phase cavity
Formula is pulse, and pulse width is 5 μ s, repetition rate 3000Hz, discharge power 10W, discharge time 2000s.
(4) after coating preparation, it is passed through nitrogen, restores reaction cavity to normal pressure, opens cavity, take out metallic iron
Block.
(5) sample coatings protective performance is detected, detection content include coating layer thickness, hydrophobicity (water contact angle),
Situation resistant to chemical etching, coating adhesion, contact resistance.
Wherein, pretreatment plasma discharge apparatus and deposition can be a set of with plasma discharge apparatus, can also
To be independent two covering devices.Pretreatment is preferably provided in reaction cavity with plasma discharge apparatus (such as electrode),
And be arranged around substrate, consequently facilitating being quickly connected with coating process after pretreatment；Deposition plasma discharge apparatus can be with
Be laid in except reaction cavity and far from reaction cavity be arranged, thus selectively or be avoided as much as coating procedure it is medium from
The negative influence that daughter is discharged to substrate.
Embodiment 2
A kind of epoxy nano coating and preparation method thereof, by following steps:
(1) magnesium alloy is placed in 800L plasma vacuum reaction cavity, continuously vacuumizing to reaction cavity makes very
Reciprocal of duty cycle reaches 50 millitorrs.
(2) it is passed through helium, flow 50sccm opens RF Plasma Discharge and pre-processes to magnesium alloy substrates
(opening the pretreatment plasma discharge of radio frequency method), pretreatment stage discharge power are 20W, continuous discharge 100s.
(3) it is passed through monomer S2 and prepares nano coating in substrate surface progress chemical vapor deposition, flow of monomer is 300 μ L/
Min is passed through reaction cavity after the vaporization of 10 millitorr high vacuum, and being passed through the time is 2500s.Pretreatment plasma discharge tune
Whole is deposition plasma discharge.
The generation of plasma uses radio frequency discharge mode in the depositional phase cavity, and the way of output is pulse, and pulse is wide
Degree is 100 μ s, repetition rate 5000Hz, discharge power 20W, discharge time 2500s.(4) after coating preparation, lead to
Enter nitrogen, restores reaction cavity to normal pressure, open cavity, take out magnesium alloy.(5) sample coatings protective performance is examined
It surveys, detection content includes coating layer thickness, hydrophobicity (water contact angle), resistant to chemical etching, coating adhesion, contact resistance.
Embodiment 3
Compared with Example 1, step (1) is evacuated to 100 millitorrs；Monomer S1 is changed to monomer S3, step in step (2)
(3) monomer is passed through the time, discharge time is changed to 3000s, and other conditions are identical.
Embodiment 4
Compared with Example 1, step (1) is evacuated to 150 millitorrs；Monomer S1 is changed to monomer S4, step in step (2)
(3) monomer is passed through the time and discharge time is changed to 3500s, and other conditions are identical.
Embodiment 5
Compared with Example 2, step (2) helium is changed to nitrogen；Monomer S1 is changed to monomer S5, step (3) in step (2)
Monomer is passed through the time, discharge time is changed to 4000s, and other conditions are identical.
Embodiment 6
Compared with Example 1, monomer S1 is changed to S2, other conditions are identical.
Embodiment 7
Compared with Example 2, substrate is changed to Mobile phone PCB, other conditions are identical.
Embodiment 8
Compared with Example 2, the discharge power in step (3) is changed to 5W, other conditions are identical
Embodiment 9
Compared with Example 2, by the monomer in step (3) is passed through the time, discharge time is changed to 12000s, other
Part is identical.
Embodiment 10
Compared with Example 2, the flow of monomer in step (3) is changed to 800 μ L/min, other conditions are identical.
By the substrate after the various embodiments described above plating, progress coating layer thickness, water contact angle, alkali resistance corrosion, adhesive force are connect
Touch the test of resistance value.
Nano coating thickness is detected using U.S. Filmetrics-F20-UV- measured film thickness instrument.
Nano coating water contact angle is tested according to GB/T 30447-2013 standard.
It is resistant to chemical etching, it is tested referring to GB1763-79 (89) paint film chemical reagent resistance measuring method standard.Adhesive force
Test method carries out cross-cut tester cross cut test according to GB/T 9286-1998 standard.
The test method of contact resistance, is tested referring to GB/T5095.2-1997.
Table 1
Epoxy coating process is prepared using the technical program, compared with Traditional liquid phase method, does not need to use curing agent, organic
The environmental contaminants such as solvent, and the coating that this technology is prepared can realize alkaline-resisting, high adherency in nanoscale range, connect simultaneously
Electric shock resistance is very low.In electronic product junction, it is a critical index that coated coating, which has excellent conduction,；It passes
For the painting thickness of system method preparation up to tens microns, resistance is very big, may not apply to the connecting portion of electronic product.
Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention., rather than its limitations；To the greatest extent
Pipe present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that: its according to
So be possible to modify the technical solutions described in the foregoing embodiments, or to some or all of the technical features into
Row equivalent replacement；And these are modified or replaceed, various embodiments of the present invention technology that it does not separate the essence of the corresponding technical solution
The range of scheme.
Claims (14)
1. a kind of epoxy nano coating, which is characterized in that substrate is exposed in the monomer vapours with structure shown in formula (I),
Chemical reaction occurs in substrate surface by plasma discharge and forms protective coating:
Wherein, R1、R2、R3For independently selected from hydrogen, alkyl, aryl, halogen, halogenated alkyl or hydroxyl；X is hydrogen or halogen, and m is
0-8 integer, n are the integer of 1-15.
2. a kind of epoxy nano coating according to claim 1, which is characterized in that R1、R2、R3Independently selected from hydrogen, alkane
Base, halogen or halogenated alkyl.
3. a kind of epoxy nano coating according to claim 2, which is characterized in that the halogen is fluorine, the alkyl halide
Base is straight chain of the carbon number in 1-10 or the perfluoroalkyl containing branch.
4. a kind of epoxy nano coating according to claim 1, which is characterized in that the X is fluorine, m 0,1,2 or 3, n
For the integer of 1-8.
5. a kind of epoxy nano coating according to claim 1, which is characterized in that the substrate be metal, optical instrument,
Apparel fabrics, electronic device or medical instrument.
6. a kind of described in any item preparation methods of epoxy nano coating of claim 1-5, comprising the following steps:
(1) substrate is placed in the reaction cavity of plasma chamber, the intracorporal vacuum degree of reaction chamber is extracted into 0.1-1000 millitorr；
(2) be passed through plasma source gas, open deposition plasma discharge, monomer is imported after vaporizing reaction cavity into
Row chemical vapour deposition reaction；
(3) deposition plasma discharge is closed, clean compressed air or inert gas is passed through and restores to normal pressure, open chamber
Body takes out substrate.
7. the preparation method of epoxy nano coating as claimed in claim 6, which is characterized in that the monomer is by depressurizing vapour
Reaction cavity is introduced after change.
8. the preparation method of epoxy nano coating as claimed in claim 6, which is characterized in that plasma described in step (2)
Source gas is one of helium, argon gas, nitrogen, hydrogen or several mixture.
9. the preparation method of epoxy nano coating as claimed in claim 6, which is characterized in that the volume of the plasma chamber
For 1L-2000L, the plasma source gas flow is 1-1000sccm, and the flow for being passed through monomer vapours is 1-2000 μ L/
min。
10. the preparation method of epoxy nano coating as claimed in claim 6, which is characterized in that in the step (2), logical
Enter after the plasma source gas and before the deposition plasma discharge, further includes being pre-processed to substrate
With plasma discharge process.
11. the preparation method of epoxy nano coating as claimed in claim 10, which is characterized in that the preconditioning plasma
Discharge power is 1-1000W, continuous discharging time 1-6000s.
12. the preparation method of epoxy nano coating as claimed in claim 6, which is characterized in that in the step (2), deposition
It is 2-500W, continuous discharging time 600-18000s with the power of plasma discharge.
13. the preparation method of the epoxy nano coating as described in claim 6 or 10, which is characterized in that the plasma is put
Electric mode is radio frequency discharge, microwave discharge, intermediate frequency electric discharge, Penning discharge or spark discharge.
14. the preparation method of the nano coating as described in claim 6 or 10, which is characterized in that the plasma discharge side
Formula is radio frequency discharge, and the energy way of output that plasma rf is controlled during radio frequency discharge is pulse or continuously exports, etc.
When the energy way of output of gas ions radio frequency is that pulse exports, pulsewidth is 10 μ s-50ms, repetition rate 20Hz-10kHz.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811242687.4A CN109277269B (en) | 2018-10-24 | 2018-10-24 | Epoxy nano coating and preparation method thereof |
| PCT/CN2019/079114 WO2020082679A1 (en) | 2018-10-24 | 2019-03-21 | Epoxy nano-coating and preparation method therefor |
| TW108137922A TWI728517B (en) | 2018-10-24 | 2019-10-21 | An epoxy nano coating and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811242687.4A CN109277269B (en) | 2018-10-24 | 2018-10-24 | Epoxy nano coating and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109277269A true CN109277269A (en) | 2019-01-29 |
| CN109277269B CN109277269B (en) | 2020-07-14 |
Family
ID=65177728
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811242687.4A Active CN109277269B (en) | 2018-10-24 | 2018-10-24 | Epoxy nano coating and preparation method thereof |
Country Status (3)
| Country | Link |
|---|---|
| CN (1) | CN109277269B (en) |
| TW (1) | TWI728517B (en) |
| WO (1) | WO2020082679A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110129769A (en) * | 2019-05-17 | 2019-08-16 | 江苏菲沃泰纳米科技有限公司 | Hydrophobic film having low dielectric constant and preparation method thereof |
| WO2020082679A1 (en) * | 2018-10-24 | 2020-04-30 | 江苏菲沃泰纳米科技有限公司 | Epoxy nano-coating and preparation method therefor |
| CN114438477A (en) * | 2020-11-02 | 2022-05-06 | 江苏菲沃泰纳米科技股份有限公司 | Cyclic coating method, coating and product |
| US11904352B2 (en) | 2019-05-17 | 2024-02-20 | Jiangsu Favored Nanotechnology Co., Ltd. | Low dielectric constant film and preparation method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107022072A (en) * | 2017-03-16 | 2017-08-08 | 孔庆刚 | A kind of readily soluble side chain fluorochemical polyether glycol by perfluor substituted epoxy ethane and polynary cyclic ethers copolymerization |
| CN107699868A (en) * | 2017-08-23 | 2018-02-16 | 江苏菲沃泰纳米科技有限公司 | A kind of preparation method of high-insulativity nano protecting coating |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107686986B (en) * | 2017-08-23 | 2018-12-18 | 江苏菲沃泰纳米科技有限公司 | A kind of preparation method of the organic silicon nano protective coating of modulated structure |
| CN107587119B (en) * | 2017-08-23 | 2018-11-13 | 江苏菲沃泰纳米科技有限公司 | A kind of preparation method of the high insulating rigid nano protecting coating of composite construction |
| CN109277269B (en) * | 2018-10-24 | 2020-07-14 | 江苏菲沃泰纳米科技有限公司 | Epoxy nano coating and preparation method thereof |
-
2018
- 2018-10-24 CN CN201811242687.4A patent/CN109277269B/en active Active
-
2019
- 2019-03-21 WO PCT/CN2019/079114 patent/WO2020082679A1/en active Application Filing
- 2019-10-21 TW TW108137922A patent/TWI728517B/en active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107022072A (en) * | 2017-03-16 | 2017-08-08 | 孔庆刚 | A kind of readily soluble side chain fluorochemical polyether glycol by perfluor substituted epoxy ethane and polynary cyclic ethers copolymerization |
| CN107699868A (en) * | 2017-08-23 | 2018-02-16 | 江苏菲沃泰纳米科技有限公司 | A kind of preparation method of high-insulativity nano protecting coating |
Non-Patent Citations (5)
| Title |
|---|
| 周孝重等: "《等离子体热处理技术》", 30 April 1990, 机械工业出版社 * |
| 王成彪等: "《摩擦学材料及表面工程》", 29 February 2012, 国防工业出版社 * |
| 王永康等: "《纳米材料科学与技术》", 31 March 2002, 浙江大学出版社 * |
| 陈杰瑢: "《低温等离子体化学及其应用》", 31 July 2001, 科学出版社 * |
| 鲁潇等: "环氧丙烷的脉冲等离子体聚合及其聚合物的稳定性", 《塑料》 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020082679A1 (en) * | 2018-10-24 | 2020-04-30 | 江苏菲沃泰纳米科技有限公司 | Epoxy nano-coating and preparation method therefor |
| CN110129769A (en) * | 2019-05-17 | 2019-08-16 | 江苏菲沃泰纳米科技有限公司 | Hydrophobic film having low dielectric constant and preparation method thereof |
| CN110129769B (en) * | 2019-05-17 | 2021-05-14 | 江苏菲沃泰纳米科技股份有限公司 | Hydrophobic low dielectric constant film and method for preparing same |
| US11904352B2 (en) | 2019-05-17 | 2024-02-20 | Jiangsu Favored Nanotechnology Co., Ltd. | Low dielectric constant film and preparation method thereof |
| CN114438477A (en) * | 2020-11-02 | 2022-05-06 | 江苏菲沃泰纳米科技股份有限公司 | Cyclic coating method, coating and product |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202016348A (en) | 2020-05-01 |
| TWI728517B (en) | 2021-05-21 |
| WO2020082679A1 (en) | 2020-04-30 |
| CN109277269B (en) | 2020-07-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109277269A (en) | A kind of epoxy nano coating and preparation method thereof | |
| EP3628756B1 (en) | Substrate-moving type apparatus and method for preparing nano coating by means of plasma discharge | |
| JP7336019B2 (en) | Water-repellent nano-membrane and its manufacturing method, application, and product | |
| TWI717870B (en) | A high-adhesive anti-aging nano-coating and a preparation method thereof | |
| WO2019037445A1 (en) | Preparation method for high insulation nano-protective coating | |
| EP1487590A2 (en) | Method and apparatus for the formation of hydrophobic surfaces | |
| BE1023839B1 (en) | Coating | |
| CN109267038B (en) | Wear-resistant self-crosslinking nano coating and preparation method thereof | |
| TWI717869B (en) | A acrylamide nano coating and preparation method thereof | |
| Chen et al. | Enhancing adhesion performance of sputtering Ti/Cu film on pretreated composite prepreg for stacking structure of IC substrates | |
| CN109354903A (en) | A kind of high transparency low aberration nano coating and preparation method thereof | |
| Fernandes et al. | Plasma-polymerised coatings used as pre-treatment for aluminium alloys | |
| Herbert et al. | A comparison between gas and atomized liquid precursor states in the deposition of functional coatings by pin corona plasma | |
| Vogelsang et al. | Fluorocarbon plasma polymer deposition by an atmospheric pressure microplasma jet using different precursor molecules–A comparative study | |
| Al‐Bataineh et al. | Design of a microplasma device for spatially localised plasma polymerisation | |
| Xie et al. | Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation | |
| Chen et al. | Three different low-temperature plasma-based methods for hydrophilicity improvement of polyethylene films at atmospheric pressure | |
| Vogelsang et al. | Deposition of thin films from amino group containing precursors with an atmospheric pressure microplasma jet | |
| ES2219922T3 (en) | PLASMA POLYMERIZATION ON A MATERIAL SURFACE. | |
| WO2014078488A1 (en) | Apparatus and methods for plasma enhanced chemical vapor deposition of polymer coatings | |
| JP2006131938A (en) | Method and device for producing super-water repellent film and product thereby | |
| GB2535988A (en) | Patterned functional surface | |
| Kato et al. | Synchrotron radiation effect in the soft X-ray region on the surface properties of pyromellitic dianhydride-oxydianline polyimide | |
| BE1025386B1 (en) | Coating | |
| JPS58180503A (en) | Preparation of thin film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: No.182, East Ring Road, Yuqi supporting area, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Patentee after: Jiangsu feiwotai nanotechnology Co.,Ltd. Address before: 214183 East Ring Road, Yuqi supporting area, Huishan Economic Development Zone, Wuxi City, Jiangsu Province Patentee before: Jiangsu Favored Nanotechnology Co.,Ltd. |
|
| CP03 | Change of name, title or address |