CN109253548A - Hot water facility control method and the hot water facility controlled using this method - Google Patents

Hot water facility control method and the hot water facility controlled using this method Download PDF

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Publication number
CN109253548A
CN109253548A CN201711246436.9A CN201711246436A CN109253548A CN 109253548 A CN109253548 A CN 109253548A CN 201711246436 A CN201711246436 A CN 201711246436A CN 109253548 A CN109253548 A CN 109253548A
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CN
China
Prior art keywords
water
temperature
target temperature
control method
hot water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN201711246436.9A
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Chinese (zh)
Inventor
谢壮德
顾文靖
应俊
H·格克
赵存梓
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bosch Thermotechnology Shanghai Co Ltd
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Bosch Thermotechnology Shanghai Co Ltd
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Publication date
Application filed by Bosch Thermotechnology Shanghai Co Ltd filed Critical Bosch Thermotechnology Shanghai Co Ltd
Publication of CN109253548A publication Critical patent/CN109253548A/en
Withdrawn legal-status Critical Current

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H9/00Details
    • F24H9/20Arrangement or mounting of control or safety devices
    • F24H9/2007Arrangement or mounting of control or safety devices for water heaters
    • F24H9/2035Arrangement or mounting of control or safety devices for water heaters using fluid fuel

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Devices For Medical Bathing And Washing (AREA)

Abstract

This application discloses a kind of hot water facility control method and equipment, this method includes at least following first water supply pattern: providing two subpatterns that can be set;Set the first object temperature and the first duration of subpattern once;Set the second target temperature and the second duration under subpattern two;And with two alternative water-supply of the subpattern one and the subpattern;Wherein, the subpattern one is after supply water temperature to be adjusted to the first object temperature of setting, the temperature is kept to supply water in first duration, the subpattern two is after supply water temperature to be adjusted to second target temperature of setting, the temperature to be kept to supply water in second duration;The first object temperature and second target temperature be not identical.

Description

Hot water facility control method and the hot water facility controlled using this method
Technical field
This application involves field of water heaters more particularly to a kind of hot water facility control method and using the heat of this method control Wetting system.
Background technique
It is some scientific investigations showed that, stimulate skin to potentially contribute to the health of people using the alternate mode of hot and cold water. When hot and cold water alternately sprays on the skin, the blood vessel of people quickly alternately will be expanded and be shunk by the caloric stimulation of water flow, To improve blood vessel dilatation contractility, improves blood circulation and boost metabolism.In order to meet the market demand, in shower Diversified hot water facility control method is provided and is necessary using the hot water facility of this method control.
Summary of the invention
The application's is designed to provide a kind of hot water facility control method and the hot water facility using this method control, It can satisfy the diversified water demand of people.
Hot water facility control method provided by the present application includes at least following first water supply pattern:
Two subpatterns that can be set are provided;
Set the first object temperature and the first duration of subpattern once;
Set the second target temperature and the second duration under subpattern two;And
With two alternative water-supply of the subpattern one and the subpattern;
Wherein, the subpattern one is after supply water temperature to be adjusted to the first object temperature of setting, described the The temperature is kept to supply water in one duration, the subpattern two is that supply water temperature is adjusted to the second target temperature of setting After degree, the temperature is kept to supply water in second duration;The first object temperature and second target temperature are not It is identical.
In feasible embodiment, the setting range of the first object temperature is 30 DEG C -60 DEG C, and described first continues The setting range of duration is 0-10 minutes.
In feasible embodiment, the setting range of second target temperature is 15 DEG C -55 DEG C, and described second continues The setting range of duration is 0-10 minutes.
In feasible embodiment, the first object temperature is higher than second target temperature.
It in feasible embodiment, further include the second water supply pattern, under second water supply pattern, with target temperature 45 DEG C and 25 DEG C of water temperature alternative water-supplies, persistently supply water under each target temperature when it is 5 minutes a length of.
It in feasible embodiment, further include third water supply pattern, under the third water supply pattern, with a setting Thermostatic supplies water.
In feasible embodiment, further include the 4th water supply pattern: setting third target temperature and the 4th target temperature, Wherein, the third target temperature is higher than the 4th target temperature;Cooling rate is set, the Cooling rate is often to increase or decrease Duration required for one set temperature section;And with the Cooling rate of setting in the third target temperature and the 4th At the uniform velocity change water temperature water supply between target temperature;Wherein, the temperature between the third target temperature and the 4th target temperature Difference is the integral multiple in the set temperature section.
In feasible embodiment, the Cooling rate is 1~20 second, and the set temperature section is 1 DEG C.
In feasible embodiment, further include the steps that one selection/resetting water supply pattern, the selection/resetting is supplied water The step of mode, setting was before water supply or in water supply.
It in feasible embodiment, further include a water flow detecting step, when detecting that water flow meets setting, with Currently selected water supply pattern supplies water.
In feasible embodiment, the current water supply pattern of real-time display and supply water temperature.
Present invention also provides a kind of gas and hot water equipment, and using control method above-mentioned, the gas and hot water equipment is Water heater or wall-hung boiler.
In order to be further understood that the feature and technology contents of the application, please refer to below in connection with the detailed of the application Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not used to limit the application.
Detailed description of the invention
The aforementioned and other aspects of the application will more completely be managed and that is done with reference to the accompanying drawings is discussed in detail Solution and understanding, in the accompanying drawings:
Fig. 1 shows the flow chart of the first water supply pattern of the application;
Fig. 2 is shown in the variation schematic diagram of the water temperature under the first water supply pattern of the application;
Fig. 3 shows the flow chart of the 4th water supply pattern of the application;
Fig. 4 is shown in the variation schematic diagram of the water temperature under the 4th water supply pattern of the application;
Fig. 5 shows the flow chart of one specific embodiment of the application.
Specific embodiment
For help those skilled in the art definitely understand this application claims theme, with reference to the accompanying drawing in detail The specific embodiment of the application is described.
As shown in Figure 1, a kind of hot water facility control method, includes at least following first water supply pattern:
In step s101, two subpatterns that can be set: subpattern one and subpattern two are provided;In step s 102, Set the first object temperature and the first duration of subpattern once;In step s 103, second under subpattern two is set Target temperature and the second duration;And in step S104, alternately supplied with the subpattern one and the subpattern two Water.
As shown in Fig. 2, specifically, the subpattern one is that supply water temperature is adjusted to the first object temperature of setting After spending Th, kept in the first duration th with temperature Th water supply, the subpattern two is to be adjusted to supply water temperature After the second target temperature Tl of setting, kept in the second duration tl with temperature Tl water supply;It is specific real at this It applies in mode, the first object temperature Th is higher than the second target temperature Tl.In view of being conducive to the water temperature of human health Range, the setting range of the first object temperature Th are 30 DEG C -60 DEG C, and the setting range of the first duration th is 0- 10 minutes.The setting range of the second target temperature Tl is 15 DEG C -55 DEG C, and the setting range of the second duration tl is 0-10 minutes.The transition stage that section TR in Fig. 2 is converted between high/low temperature.Continue it is worth noting that, working as described first When the setting range of duration th and/or the second duration tl are 0, it is meant that water temperature just changes immediately after reaching target temperature Temperature, this setting can play the massage effect of impulse form.
In addition, further including the second water supply pattern, third water supply pattern and the 4th water supply mould in this embodiment Formula, with 45 DEG C and 25 DEG C water temperature alternative water-supplies of target temperature, persistently supplies under second water supply pattern under each target temperature Water when it is 5 minutes a length of.Under the third water supply pattern, then supplied water with the thermostatic of a setting.
Referring to shown in Fig. 3 and Fig. 4, under the 4th water supply pattern, in step S301, third target temperature Th ' and the is set Four target temperature Tl ', and the third target temperature Th ' is higher than the 4th target temperature Tl ';For example, third target temperature Th ' is 45 DEG C, the 4th target temperature Tl ' is 25 DEG C.In step S302, Cooling rate is set, the Cooling rate is often to increase or decrease Duration required for one set temperature section;In this embodiment, such as Cooling rate is set as 1 second, set temperature Section is 1 DEG C.Typically, the Cooling rate is between 1~20 second, the third target temperature Th ' and the 4th mesh The integral multiple that the temperature difference between temperature Tl ' is the set temperature section is marked, the body ability to bear of people is more conform with.Step In S303, at the uniform velocity changed between the third target temperature Th ' and the 4th target temperature Tl ' with the Cooling rate of setting Water temperature supplies water;I.e. in this embodiment, water temperature between 45 DEG C~25 DEG C, increase or decrease within every 1 second 1 DEG C and reciprocal rise Temperature or cooling.Under this water supply pattern, the change of temperature is the process of a slow gradual change, relative to the first water supply pattern For the second water supply pattern, which makes user have the process gradually adapted to, year preferably to the variation of water temperature Old children or weak and sickly special population.
It is understood that can also according to actual needs only include part water supply pattern in other embodiments, or Person includes more water supply patterns.
As shown in figure 5, being the flow diagram of one specific embodiment of the application.In this embodiment, by In there are many water supply patterns, in step s 201, a water supply pattern is selected first.Present embodiment further includes a water flow Amount detecting step S202 is entered step in S203 when sensor detects that water flow meets setting, with currently selected confession Aqueous mode supplies water;If not meeting sets requirement through sensor detection water flow, wait after meeting setting again with selection Water supply pattern supplies water.In this embodiment, allow to change water supply pattern in water supply process, as shown in step S204, If needing to change water supply pattern in water supply process, water supply pattern is reselected back to step S201, confirms water flow In the case where reaching requirement, supplied water with the water supply pattern of newest selection.Otherwise existing water supply pattern is kept persistently to supply water, Until user terminates bathing.For the ease of user's operation, the current water supply pattern of real-time display and supply water temperature in water supply process.
It is understood that can satisfy under different water supply patterns using the gas and hot water equipment of this control method Alternating temperature water requirements, these gas and hot water equipment can be water heater or wall-hung boiler.
Although having been shown and described the application based on specific embodiment, the application is not restricted to shown thin Section.On the contrary, the various details of the application can be modified in the range of claim and its equivalent replacement.

Claims (12)

1. a kind of hot water facility control method, which is characterized in that include at least following first water supply pattern:
Two subpatterns that can be set are provided;
Set the first object temperature and the first duration of subpattern once;
Set the second target temperature and the second duration under subpattern two;And
With two alternative water-supply of the subpattern one and the subpattern;
Wherein, the subpattern one is after supply water temperature to be adjusted to the first object temperature of setting, to hold described first The temperature is kept to supply water in continuous duration, the subpattern two is second target temperature that supply water temperature is adjusted to setting Afterwards, the temperature is kept to supply water in second duration;The first object temperature and second target temperature not phase Together.
2. hot water facility control method according to claim 1, which is characterized in that the setting model of the first object temperature Enclosing is 30 DEG C -60 DEG C, and the setting range of first duration is 0-10 minutes.
3. hot water facility control method according to claim 1, which is characterized in that the setting model of second target temperature Enclosing is 15 DEG C -55 DEG C, and the setting range of second duration is 0-10 minutes.
4. hot water facility control method according to claim 1, which is characterized in that the first object temperature is higher than described Second target temperature.
5. hot water facility control method according to claim 1, which is characterized in that further include the second water supply pattern, in institute State under the second water supply pattern, with 45 DEG C and 25 DEG C water temperature alternative water-supplies of target temperature, persistently supply water under each target temperature when A length of 5 minutes.
6. hot water facility control method according to claim 1, which is characterized in that further include third water supply pattern, in institute It states under third water supply pattern, is supplied water with the thermostatic of a setting.
7. control method according to claim 1, which is characterized in that further include the 4th water supply pattern:
Set third target temperature and the 4th target temperature, wherein the third target temperature is higher than the 4th target temperature;
Cooling rate is set, the Cooling rate is often to increase or decrease duration required for a set temperature section;And
At the uniform velocity change water temperature water supply between the third target temperature and the 4th target temperature with the Cooling rate of setting;
Wherein, the temperature difference between the third target temperature and the 4th target temperature is the integer in the set temperature section Times.
8. hot water facility control method according to claim 7, which is characterized in that the Cooling rate is 1~20 second, institute Stating set temperature section is 1 DEG C.
9. the hot water facility control method according to any one of claim 5~7, which is characterized in that further include a choosing It selects/the step of resetting water supply pattern, during the step of selection/resetting water supply pattern is arranged before water supply or supplies water.
10. hot water facility control method according to claim 9, which is characterized in that it further include a water flow detecting step, When detecting that water flow meets setting, supplied water with currently selected water supply pattern.
11. the hot water facility control method according to any one of claim 5~7, which is characterized in that real-time display is worked as Preceding water supply pattern and supply water temperature.
12. a kind of gas and hot water equipment, which is characterized in that using the control method control such as any one of claim 1~11 System, the gas and hot water equipment are water heater or wall-hung boiler.
CN201711246436.9A 2017-07-14 2017-12-01 Hot water facility control method and the hot water facility controlled using this method Withdrawn CN109253548A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710574219 2017-07-14
CN2017105742196 2017-07-14

Publications (1)

Publication Number Publication Date
CN109253548A true CN109253548A (en) 2019-01-22

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1959287A (en) * 2006-09-27 2007-05-09 孟东昕 Unit for controlling temperature and pulsating flow in electric water heater
CN101303161A (en) * 2008-06-12 2008-11-12 中山华帝燃具股份有限公司 Intelligent gas water heater and control method thereof
CN205561288U (en) * 2016-04-28 2016-09-07 佛山市顺德区速惠尔电器有限公司 It bathes water heater heating structure of function in turn to possess changes in temperature
CN106595061A (en) * 2016-11-18 2017-04-26 广东万家乐燃气具有限公司 Surfing mode control method and terminal system device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1959287A (en) * 2006-09-27 2007-05-09 孟东昕 Unit for controlling temperature and pulsating flow in electric water heater
CN101303161A (en) * 2008-06-12 2008-11-12 中山华帝燃具股份有限公司 Intelligent gas water heater and control method thereof
CN205561288U (en) * 2016-04-28 2016-09-07 佛山市顺德区速惠尔电器有限公司 It bathes water heater heating structure of function in turn to possess changes in temperature
CN106595061A (en) * 2016-11-18 2017-04-26 广东万家乐燃气具有限公司 Surfing mode control method and terminal system device

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Application publication date: 20190122