CN109212901A - A kind of colored filter novel photoresist and preparation method thereof - Google Patents
A kind of colored filter novel photoresist and preparation method thereof Download PDFInfo
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- CN109212901A CN109212901A CN201811308279.4A CN201811308279A CN109212901A CN 109212901 A CN109212901 A CN 109212901A CN 201811308279 A CN201811308279 A CN 201811308279A CN 109212901 A CN109212901 A CN 109212901A
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- colored filter
- group
- photoinitiators
- novel photoresist
- bisphenol
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Abstract
The invention discloses a kind of novel photoresists of colored filter, it is characterized in that, it includes the following components'mass percentage: 1 ~ 20% stickiness resin containing carboxyl functional group, 0.5 ~ 10% photoinitiators that can absorb light energy under ultraviolet light, 0.5 ~ 10% unsaturated compound with C=C double bond, 50 ~ 90% organic solvent and 5 ~ 20% composition black matrix" used in charcoal blacks.Meanwhile the invention also discloses the above-mentioned colored filter preparation methods of novel photoresist.The present invention can improve repeated exposure CD and reduce the yield for improving product, it is ensured that the resolution ratio of matrix pattern is greatly improved；Black matrix" is solved in scan exposure process, caused by the line width CD of appearance is not of uniform size, the repeated exposure CD as caused by lenz reduces.
Description
Technical field
The invention belongs to photosensitive material chemical technology fields, and in particular to a kind of novel photoresist of colored filter and
Preparation method.
Background technique
Currently, the colored display of thin film transistor liquid crystal display technology (abbreviation LCD-TFT) is by colored filter (letter
Claim CF) come what is completed, colored filter is a kind of a kind of diaphragm that can show optical characteristics, can choose different-waveband
Light filters out other unwanted light by generally selecting red, green, blue (abbreviation RGB) three kinds of colors as three primary colors, by
RGB forms pixel and forms the light of seven kinds of different colours, and human eye is made to receive some light black matrix" of saturation as one
Narrow wire frame keeps apart other three primary colors on the surface of glass substrate, prevents colour mixture, and making one will not colour mixture conduct in viewing
A component part in colored filter, black matrix" play important function wherein when making black matrix" to colour developing, mesh
Preceding more popular exposure technology is the exposure of proximity, and pattern is imprinted on glass substrate by mask plate for light source by principle
On, mask plate and glass substrate have certain spacing for 100 ~ 300um, mask plate are aligned and be adjusted in exposure process
Expose spacing, consuming the regular hour affects working efficiency, if while to expose spacing too small, although available and mask
The immediate pattern of plate, but mask plate is easy to encounter the glass substrate of lower section and pollute mask plate, if exposure spacing mistake
Greatly, then the pattern on mask plate accurately can not project.With the expansion of production capacity and producing line, the glass substrate that uses
Can be increasing, the requirement to exposure technology is higher and higher, and proximity printing method has been poorly suitable for High Accuracy and High Resolution
The production of the black matrix" of rate.So CF producer can be gradually using the scanning type exposure method (scan for capableing of continuous production
Exposure machine), light source is projected directly on mask plate when scan exposes, and is prism (lenz) below mask plate, can be by mask
Pattern on plate projects the surface of glass substrate in most true method, is not deposit between mask plate and glass substrate at this moment
In exposure spacing this problem, the mode of scan has higher production efficiency and preferably keeps the pattern on mask plate.But
To use scan exposure machine, light by after lenz can between lenz working group and group crossover location to same lines into
Row twice sweep, due to lenz itself, twice sweep the result is that the same line compared to other matrix patterns CD reduce,
But the precision of CD has progress than proximity printing, and the repeated exposure CD generated due to lenz is reduced, it can be to production
Product yield affects.
Black matrix" photoresist, general process is made using photoetching process are as follows: cleaning element glass → apply in element glass
Novel photoresist → the vacuum drying (VCD) of cloth → removal edge photoresist → carry out prebake conditions → using scan to film element glass exposes
Ray machine is exposed coated glass, and curing of coating is made to develop on element glass surface → using developer solution to film, removes
Unexposed cured portion → put coated glass and toast in an oven, sets baking temperature as 230 DEG C, baking time 30min,
Obtain post bake matrix pattern.Especially in scan exposure process, the photoinitiators of demand high sensitive, and have uniform
CD line width, belonging to will attempt to solve the problems, such as, the characteristics of due to general photoresist itself, easily cause in scan exposure process
CD's is bad, influences the progress of subsequent handling, and such as others color RGB permeates between each other, causes color chaotic, in order to save
Production cost and energy consumption improve the display color performance of LCD, it is therefore desirable to which exploitation has height photosensitive, and CD is uniformly black
Color matrix material.
Summary of the invention
Goal of the invention: in view of the above-mentioned deficiencies in the prior art, it is an object of the present invention to provide a kind of colored filter with novel
Photoresist.
Another object of the present invention is to provide the above-mentioned colored filter preparation methods of novel photoresist.
Technical solution: in order to achieve the above object of the invention, the present invention is specifically achieved like this: a kind of colored filter
With novel photoresist, include the following components'mass percentage: 1 ~ 20% stickiness resin containing carboxyl functional group, 0.5 ~ 10%
The photoinitiators that can absorb light energy under ultraviolet light, 0.5 ~ 10% unsaturated compound with C=C double bond, 50 ~
90% organic solvent and 5 ~ 20% composition black matrix" used in charcoal blacks wherein, can also include other components be it is non-
Neccessary composition, such as surfactant can improve the coating performance of photoresist ingredient, so that the dispersity of pigment is stablized, system
At film coated surface it is smooth, roughness is uniform, provides safeguard for the stability of product, and surfactant is selected from following:
Anionic surfactant, cationic surfactant, zwitterionic surfactant, nonionic surfactant.These tables
Face activating agent or straight chain, branch, fragrant chain, fluorine-containing long-chain etc.；In addition, being that functionality is carried out using preceding to other components
Carry out the dilution of solvent, solvent can be selected from following: propylene glycol methyl ether acetate, glycol monoethyl ether, ethylene glycol only son
Ether, diethylene glycol ethylmethyl ether, propylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, dihydroxypropane single-ether, cyclohexanone,
Ethylene glycol monoethyl ether acetate.Wherein charcoal blacks dosage is very few, and coated glass is easy light leakage, and blocking property reduces, and three color RGB hold
Easy colour mixture；Dosage excessively then reduced by other film forming matter parts, then the adhesive ability decline between film and glass substrate, film
It is easy to fall off from element glass surface；Preferred charcoal blacks are carbon black dispersion: by sakatainxIndustries, Ltd, being mentioned
The BR1011 product of confession, solid content are 35.5% content.
Wherein, the stickiness resin containing carboxyl functional group is the unsaturated structure with C=C double bond, and belongs to propylene
The polymer of acids is alkali-soluble tree by that can chemically react with containing-OH basic group containing-COOH group
Rouge；The compound containing-COOH group is selected from acrylic acid, 1,2,4,5- hexamethylene tetracarboxylic dianhydrides, butane tetracarboxylic acid dianhydride,
Tricyclic [6,4,0,0 (2,7)] dodecane -1,2,7,8- tetracarboxylic acid dianhydrides, it is poly- (3,3 ', 4,4'- biphenyltetracarboxylic dianhydride-CO-1,
4- phenylenediamine), heterochromatic dilute simultaneously (6,5,4-DEF) the heterochromatic alkene -1,3 of 4,9- dibromo, 6,8- tetrones, 1,2,3,4- tetramethyls -1,2,
3,4- cyclobutane tetracarboxylic dianhydrides, N, N'- bis- (2- decyl alkyl) -1,7- bis- bromo- 3,4,9,10- tetracarboxylic dianhydrides,
Meso-butane -1,2,3,4- tetracarboxylic dianhydrides, bicyclic [2.2.2] octyl- 7- alkene -2,3,5,6- tetracarboxylic dianhydrides, 3,3', 4,
4'- biphenyltetracarboxylic dianhydride, 1,7- bis- bromo- 3,4,9,10- tetracarboxylics double acid anhydride, 1,2,3, penta tetracarboxylic dianhydrides of 4- ring, 3,3',
4,4'- benzophenone tetracarboxylic dianhydrides, 1,2,3,4- butane tetracarboxylic acid dianhydrides, 3,4,9,10- tetracarboxylic anhydrides, cyclobutanetetracarboxylic
Dianhydride, 2,3,3', 4'- bibenzene tetracarboxylic dianhydride, pyromellitic acid anhydride, Isosorbide-5-Nitrae, one of 5,8- naphthalenetetracarbacidic acidic acid anhydrides；It is described
Compound containing-OH basic group is selected from bisphenol Z, bisphenol fluorene, bisphenol b, 4,4'-(1- methyl ethylidene) bis- (2- methylbenzenes
Phenol), A, A, A'- tri- (4- hydroxyphenyl) -1- ethyl -4- second propyl benzene, 4,4'-(1,3- dimethylbutyl) biphenol, bisphenol-ap, 9,
One of 9- bis- [(4- hydroxy ethoxy) phenyl] fluorenes.
Wherein, the stickiness resin chemical formula containing carboxyl functional group is
, wherein R is selected from bisphenol Z, bisphenol fluorene, bis-phenol
B, 4,4 '-(1- methyl ethylidene) bis- (2- methylphenols), A, A, A'- tri- (4- hydroxyphenyl) -1- ethyl -4- second propyl benzene, 4,4 ' -
One of (1,3- dimethylbutyl) biphenol, bisphenol-ap, 9,9- bis- [(4- hydroxy ethoxy) phenyl] fluorenes.
Wherein, 3000 ~ 10000, weight average molecular weight exists the molecular weight of the stickiness resin containing carboxyl functional group
4800~5000。
Wherein, the photoinitiators that can absorb light energy under ultraviolet light are greater than 300nm or more in spectrum and have to light
It absorbs, and divides the free radical for generating and lacking free electron, reactivity with higher comprising chromophoric group and freedom
Base, skeleton symbol are as follows: PI (UV) → R+R1, wherein R represents free radical, and R1 represents chromophoric group, photic to draw
Send out the function of not having free radical group after agent cracks；The photoinitiators that light energy can be absorbed under ultraviolet light include extremely
A kind of few initiator with methyl free radicals, at least one initiator with benzene ring structure and at least one band auxochrome group, can
Make the initiator for realizing red shift to the absorption of spectrum line such as such as chlorine atom, NO2Group, benzene ring structure, S atom, N atom ,-OH base
Group or=O group.
Wherein, the photoinitiators that can absorb light energy under ultraviolet light are selected from the compound of following P1 ~ P17:
、、
、、
、、
、
、、
、、
、、
、、
Or。
Wherein, the unsaturated compound with C=C double bond is enol form compound, described to inhale under ultraviolet light
The photoinitiators for receiving light energy can be such that C=C double bond opens, and become the constituent of cross-linked polymeric, form solidification post bake；C=the C
The unsaturated compound of double bond is selected from tri (propylene glycol) diacrylate, dipentaerythritol hexaacrylate, hexylene glycol dipropyl
Olefin(e) acid ester, two propylene olefin(e) acid ester of diethylene glycol phthalate, neopentylglycol diacrylate, pentaerythritol triacrylate, three
Hydroxymethyl-propane triacrylate, ethoxylated trimethylolpropane triacrylate, isobornyl methacrylate, Ji Wusi
One of alcohol tetraacrylate is a variety of.Wherein, neopentylglycol diacrylate has wearability good as function monomer,
The characteristics of resistance to delineation, propoxylation (2) neopentylglycol diacrylate have lower skin irritation, the improvement to adhesive force
It has certain effect.Stickiness resin and the ratio of the unsaturated compound with C=C double bond can be controlled in 15:85(mass ratio) it arrives
85:15(mass ratio) between, therefrom select 80:20(mass ratio), if the ratio of unsaturated compound is excessive, it is strong to will cause film
Degree decline.
Wherein, the organic solvent has good dissolubility to the stickiness resin containing carboxyl functional group, selected from the third two
Alcohol methyl ether acetate, glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol ethylmethyl ether, propylene glycol monoethyl ether acetate, the third two
One of alcohol monomethyl ether acetate, dihydroxypropane single-ether, cyclohexanone, ethylene glycol monoethyl ether acetate are a variety of.
A method of colored filter is prepared with novel photoresist, comprising the following steps:
(1) each ingredient mixing is measured by formula, cleans glass substrate, mixture is coated on glass baseplate surface, is fabricated to
The black thin film of 1.0um thickness；
(2) using the 80 ~ 95% of VCD extraction organic solvent gross mass, and coated glass substrate is placed in 100 DEG C of heating plate
Prebake conditions 100s, so that the organic solvent volatilization in mixture is complete；
(3) glass substrate is put in scan exposure machine and is exposed, under the action of mask plate, light source is thrown light by lenz
It is mapped to black thin film surface, completes exposure using the light that wavelength is 350 ~ 450nm；
(4) glass substrate after exposure is put in developing machine and is developed, visualization way is spray development, development temperature 23
DEG C, developer solution is alkaline-based developer, by reacting with the acid ingredient in light resistance composition, and unexposed portion is washed away, is stayed
Lower exposed portion and become prefabricated matrix pattern；
(5) coated glass substrate of prefabricated matrix pattern is put in 230 DEG C of baking oven and toasts 30m, so that matrix pattern is final
It is solidified into post bake.
Wherein, step (2) is a key point of the invention using VCD extraction section organic solvent, is to extract solvent out
The viscosity for increasing photoresist, prevents the flow regime of photoresist, it is made to be molded over the surface of glass substrate.
The detection that CD value is carried out to matrix pattern assesses the severity that repeated exposure CD reduces according to CD value size, with
CD bias indicates that the CD value of double exposure subtracts the CD value of single exposure, and CD bias value is closer to 0, then mura is lighter
It is micro-.Formula is CD-1 shot CD of bias=2 time CD shot；2 shot CD: the CD value that exposure machine scanning obtains twice is big
Small, twice sweep light exposure is added the light exposure for being equal to 1 scanning；1 shot CD: the CD value that exposure machine run-down obtains
Size；The measurement of resolution ratio: it under identical developing time, is observed at microscope (Keyence, model VHX-5000)
The smallest CD line is defined as resolution ratio/um under mask plate；The measurement of CD value: microscope (Keyence, model VHX- are used
5000) automatic CD line width is carried out to the lines under target mask plate to measure；The confirmation of photo sensitivity obtains corresponding to CD line under mask plate
The suitable light exposure of width, unit mJ/cm2。
Repeated exposure CD reduce severity determined according to the size of CD bias, when CD bias value is less than 0 then
Mura is more serious, if CD bias is excessive, then influences mask plate and projects authenticity on glass, so should be close to 0
Place, photoresist of the invention can solve repeated exposure CD reduction the problem of bringing, can in terms of photosensitivity holding pattern
Line width (CD) it is constant, have more excellent developability.There is good effect to the yield for improving product.
The utility model has the advantages that the present invention, which compared with traditional technology, can improve repeated exposure CD, reduces the yield for improving product, it is ensured that
The resolution ratio of matrix pattern is greatly improved；Black matrix" is solved in scan exposure process, the line width CD of appearance is big
It is small it is different caused by, the repeated exposure CD as caused by lenz reduce.
Specific embodiment
Embodiment 1:
A kind of colored filter novel photoresist, including following components in percentage by weight: 20% containing carboxyl functional group
Stickiness resin, the unsaturated compound with C=C double bond of 5% photoinitiators 5% that can absorb light energy under ultraviolet light,
50% organic solvent and 20% composition black matrix" used in charcoal blacks；Wherein, the stickiness resin containing carboxyl functional group
Chemical formula is
, wherein R is selected from bisphenol Z；It can be under ultraviolet light
The photoinitiators for absorbing light energy are selected from；Unsaturated compound with C=C double bond
Selected from tri (propylene glycol) diacrylate；The organic solvent is selected from propylene glycol methyl ether acetate.
Embodiment 2:
A kind of colored filter novel photoresist, including following components in percentage by weight: 20% containing carboxyl functional group
Stickiness resin, 9.5% photoinitiators that can absorb light energy under ultraviolet light, 0.5% unsaturationization with C=C double bond
Close object, 55% organic solvent and 15% composition black matrix" used in charcoal blacks wherein, the stickiness containing carboxyl functional group
Resin chemical formula is
, wherein R is selected from bisphenol fluorene；It can be in ultraviolet light
The lower photoinitiators for absorbing light energy are selected from；Unsaturationization with C=C double bond
It closes object and is selected from dipentaerythritol hexaacrylate；The organic solvent is selected from glycol monoethyl ether.
Embodiment 3:
A kind of colored filter novel photoresist, including following components in percentage by weight: 10% containing carboxyl functional group
Stickiness resin, 0.5% photoinitiators that can absorb light energy under ultraviolet light, 9.5% unsaturationization with C=C double bond
Close object, 60% organic solvent and 20% composition black matrix" used in charcoal blacks wherein, the stickiness containing carboxyl functional group
Resin chemical formula is
, wherein R is selected from bisphenol b；It can be under ultraviolet light
The photoinitiators for absorbing light energy are selected from；Unsaturated chemical combination with C=C double bond
Object is selected from hexanediyl ester；The organic solvent is selected from ethylene glycol monobutyl ether.
Embodiment 4:
A kind of colored filter novel photoresist, including following components in percentage by weight: 10% containing carboxyl functional group
Stickiness resin, 10% photoinitiators that can absorb light energy under ultraviolet light, the 10% unsaturated chemical combination with C=C double bond
Object, 65% organic solvent and 5% composition black matrix" used in charcoal blacks wherein, the stickiness tree containing carboxyl functional group
Rouge chemical formula is
, wherein R is selected from 4,4'-(1- methyl Asia second
Base) bis- (2- methylphenols)；The photoinitiators that light energy can be absorbed under ultraviolet light are selected from
；Unsaturated compound with C=C double bond is selected from two propylene olefin(e) acid ester of diethylene glycol phthalate；The organic solvent is selected from two
Ethylene glycol methyl ether；
Embodiment 5:
A kind of colored filter novel photoresist, including following components in percentage by weight: 1% containing carboxyl functional group
Stickiness resin, 10% photoinitiators that can absorb light energy under ultraviolet light, the 10% unsaturated chemical combination with C=C double bond
Object, 70% organic solvent and 9% composition black matrix" used in charcoal blacks wherein, the stickiness tree containing carboxyl functional group
Rouge chemical formula is
, wherein R is selected from A, A, A'- tri- (4- hydroxyphenyl) -1-
Ethyl -4- second propyl benzene；The photoinitiators that light energy can be absorbed under ultraviolet light are selected from；
Unsaturated compound with C=C double bond is selected from neopentylglycol diacrylate；The organic solvent is selected from dihydroxypropane single-ether
Acetic acid esters.
Embodiment 6:
A kind of colored filter novel photoresist, including following components in percentage by weight: 15% containing carboxyl functional group
Stickiness resin, 1% photoinitiators that can absorb light energy under ultraviolet light, the 1% unsaturated chemical combination with C=C double bond
Object, 75% organic solvent and 8% composition black matrix" used in charcoal blacks wherein, the stickiness tree containing carboxyl functional group
Rouge chemical formula is
, wherein R is selected from 4,4'-(1,3- dimethyl butyrate
Base) biphenol；The photoinitiators that light energy can be absorbed under ultraviolet light are selected from
；Unsaturated compound with C=C double bond is selected from three acrylic acid of pentaerythrite
Ester；The organic solvent is selected from propylene glycol monomethyl ether acetate.
Embodiment 7:
A kind of colored filter novel photoresist, including following components in percentage by weight: 5% containing carboxyl functional group
Stickiness resin, the unsaturated compound with C=C double bond of 3% photoinitiators 2% that can absorb light energy under ultraviolet light,
80% organic solvent and 10% composition black matrix" used in charcoal blacks wherein, the stickiness resin containing carboxyl functional group
Chemical formula is
, wherein R is selected from bisphenol-ap；It can be in ultraviolet light
The lower photoinitiators for absorbing light energy are selected from；Unsaturated chemical combination with C=C double bond
Object is selected from trimethylolpropane trimethacrylate；The organic solvent is selected from dihydroxypropane single-ether.
Embodiment 8:
A kind of colored filter novel photoresist, including following components in percentage by weight: 2% containing carboxyl functional group
Stickiness resin, the unsaturationization with C=C double bond of 0.5% photoinitiators 2.5% that can absorb light energy under ultraviolet light
Close object, 85% organic solvent and 10% composition black matrix" used in charcoal blacks wherein, the stickiness containing carboxyl functional group
Resin chemical formula is
, wherein R is selected from bis- [(4- hydroxyl ethoxy of double 9,9-
Base) phenyl] fluorenes；The photoinitiators that light energy can be absorbed under ultraviolet light are selected from；Have
The unsaturated compound of C=C double bond is selected from ethoxylated trimethylolpropane triacrylate and isobornyl methacrylate；
The organic solvent is selected from cyclohexanone and ethylene glycol monoethyl ether acetate.
Embodiment 9:
A kind of colored filter novel photoresist, including following components in percentage by weight: 3% containing carboxyl functional group
Stickiness resin, 1% photoinitiators that can absorb light energy under ultraviolet light, the 1% unsaturated chemical combination with C=C double bond
Object, 90% organic solvent and 5% composition black matrix" used in charcoal blacks wherein, the stickiness tree containing carboxyl functional group
Rouge chemical formula is
, wherein R is selected from bisphenol Z；It can absorb under ultraviolet light
The photoinitiators of light energy are selected from、；Tool
There is the unsaturated compound of C=C double bond to be selected from hexanediyl ester and pentaerythritol tetraacrylate；The organic solvent
Selected from diethylene glycol ethylmethyl ether and dihydroxypropane single-ether.
Embodiment 10:
It prepares the colored filter method of novel photoresist: measuring each ingredient mixing by formula, clean glass substrate, will mix
Object is coated on glass baseplate surface, is fabricated to the black thin film of 1.0um thickness；Using VCD extraction organic solvent gross mass 80 ~
95%, and coated glass substrate is placed on to prebake conditions 100s in 100 DEG C of heating plate, so that the organic solvent in mixture volatilizees
Completely；Glass substrate is put in scan exposure machine and is exposed, under the action of mask plate, light source passes through lenz for light projection
To black thin film surface, exposure is completed using the light that wavelength is 350 ~ 450nm；Glass substrate after exposure is put in developing machine
Develop, visualization way is spray development, and development temperature is 23 DEG C, and developer solution is alkaline-based developer, by combining with photoresist
Acid ingredient reaction in object, and unexposed portion is washed away, it leaves exposed portion and becomes prefabricated matrix pattern；By prefabricated square
The coated glass substrate of system of battle formations case is put in 230 DEG C of baking oven and toasts 30m, so that matrix pattern is finally solidified into post bake.
Claims (9)
1. a kind of novel photoresist of colored filter, which is characterized in that include the following components'mass percentage: 1 ~ 20%
Stickiness resin containing carboxyl functional group, 0.5 ~ 10% photoinitiators that can absorb light energy under ultraviolet light, 0.5 ~ 10%
The unsaturated compound with C=C double bond, 50 ~ 90% organic solvent and 5 ~ 20% composition black matrix" used in carbon black face
Material.
2. the novel photoresist of colored filter according to claim 1, which is characterized in that described to contain carboxyl functional group
Stickiness resin be the unsaturated structure with C=C double bond, and belong to the polymer of acrylic compounds, can by containing-COOH group
It is chemically reacted with containing-OH basic group, is alkali soluble resin；The compound choosing containing-COOH group
From acrylic acid, 1,2,4,5- hexamethylene tetracarboxylic dianhydrides, butane tetracarboxylic acid dianhydride, tricyclic [6,4,0,0 (2,7)] dodecane -1,2,
7,8- tetracarboxylic acid dianhydrides, poly- (3,3 ', 4,4 '-biphenyltetracarboxylic dianhydride-CO-1,4- phenylenediamine), 4,9- dibromo it is heterochromatic it is dilute simultaneously (6,
5,4-DEF) heterochromatic alkene -1,3,6,8- tetrones, 1,2,3,4- tetramethyls -1,2,3,4- cyclobutane tetracarboxylic dianhydrides, N, N'- bis-
(2- decyl alkyl) -1,7- bis- bromo- 3,4,9,10- tetracarboxylic dianhydrides, meso-butane -1,2,3,4- tetrabasic carboxylic acids two
Acid anhydride, bicyclic [2.2.2] octyl- 7- alkene -2,3,5,6- tetracarboxylic dianhydrides, 3,3', 4,4'- biphenyltetracarboxylic dianhydrides, 1,7- bis- bromo- 3,
4,9,10- tetracarboxylics double acid anhydride, 1,2,3, penta tetracarboxylic dianhydride of 4- ring, 3,3', 4,4'- benzophenone tetracarboxylic dianhydrides, 1,2,
3,4- butane tetracarboxylic acid dianhydrides, 3,4,9,10- tetracarboxylic anhydrides, cyclobutanetetracarboxylic dianhydride, 2,3,3', 4'- bibenzene tetracarboxylic two
Acid anhydride, pyromellitic acid anhydride, Isosorbide-5-Nitrae, one of 5,8- naphthalenetetracarbacidic acidic acid anhydrides；The compound containing-OH basic group is selected from
Bisphenol Z, bisphenol fluorene, bisphenol b, 4,4 '-(1- methyl ethylidene) bis- (2- methylphenols), A, A, A '-three (4- hydroxyphenyl) -1- second
Base -4- second propyl benzene, 4,4 '-(1,3- dimethylbutyl) biphenols, bisphenol-ap, in 9,9- bis- [(4- hydroxy ethoxy) phenyl] fluorenes
It is a kind of.
3. the novel photoresist of colored filter according to claim 2, which is characterized in that described to contain carboxyl functional group
Stickiness resin chemical formula be
, wherein R be selected from bisphenol Z, bisphenol fluorene, bisphenol b,
4,4'-(1- methyl ethylidene) bis- (2- methylphenols), A, A, A'- tri- (4- hydroxyphenyl) -1- ethyl -4- second propyl benzene, 4,4'-
One of (1,3- dimethylbutyl) biphenol, bisphenol-ap, 9,9- bis- [(4- hydroxy ethoxy) phenyl] fluorenes.
4. the novel photoresist of colored filter according to claim 2 or 3, which is characterized in that described to contain carboxyl official
The molecular weight for the stickiness resin that can be rolled into a ball is 3000 ~ 10000, and weight average molecular weight is 4800 ~ 5000.
5. the novel photoresist of colored filter according to claim 1, which is characterized in that described to inhale under ultraviolet light
The photoinitiators for receiving light energy, which are greater than 300nm or more in spectrum, has an absorption to light, and divide generate lack free electron from
By base, reactivity with higher comprising chromophoric group and free radical, skeleton symbol are as follows: PI (UV) → R
+ R1, wherein R represents free radical, and R1 represents chromophoric group, do not have the function of free radical group after photoinitiators cracking；
The photoinitiators that light energy can be absorbed under ultraviolet light include at least one initiator with methyl free radicals, and at least one
Kind of the initiator with benzene ring structure and it is at least one with auxochrome group, can make to realize the initiator of red shift such as to the absorption of spectrum line
Such as chlorine atom, NO2Group, benzene ring structure, S atom, N atom ,-OH group or=O group.
6. the novel photoresist of colored filter according to claim 5, which is characterized in that described to inhale under ultraviolet light
The photoinitiators for receiving light energy are selected from the compound of following P1 ~ P17:
、、、、、、、、、、、、、、、
Or。
7. the novel photoresist of colored filter according to claim 1, which is characterized in that described with C=C double bond
Unsaturated compound, is enol form compound, and the photoinitiators that can absorb light energy under ultraviolet light can make C=C double bond
It opens, becomes the constituent of cross-linked polymeric, form solidification post bake；The unsaturated compound of C=C double bond is selected from two contractings 3 third
Omega-diol diacrylate, dipentaerythritol hexaacrylate, hexanediyl ester, two propylene alkene of diethylene glycol phthalate
Acid esters, neopentylglycol diacrylate, pentaerythritol triacrylate, trimethylolpropane trimethacrylate, ethoxylation three
One of hydroxymethyl-propane triacrylate, isobornyl methacrylate, pentaerythritol tetraacrylate are a variety of.
8. the novel photoresist of colored filter according to claim 1, which is characterized in that the organic solvent is to containing
The stickiness resin of carboxyl functional group has good dissolubility, is selected from propylene glycol methyl ether acetate, glycol monoethyl ether, ethylene glycol
Monobutyl ether, diethylene glycol ethylmethyl ether, propylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, dihydroxypropane single-ether, hexamethylene
One of ketone, ethylene glycol monoethyl ether acetate are a variety of.
9. a kind of method for preparing any novel photoresist of the colored filter of claim 1 ~ 8, which is characterized in that including
Following steps:
(1) each ingredient mixing is measured by formula, cleans glass substrate, mixture is coated on glass baseplate surface, is fabricated to
The black thin film of 1.0um thickness；
(2) using the 80 ~ 95% of VCD extraction organic solvent gross mass, and coated glass substrate is placed in 100 DEG C of heating plate
Prebake conditions 100s, so that the organic solvent volatilization in mixture is complete；
(3) glass substrate is put in scan exposure machine and is exposed, under the action of mask plate, light source is thrown light by lenz
It is mapped to black thin film surface, completes exposure using the light that wavelength is 350 ~ 450nm；
(4) glass substrate after exposure is put in developing machine and is developed, visualization way is spray development, development temperature 23
DEG C, developer solution is alkaline-based developer, by reacting with the acid ingredient in light resistance composition, and unexposed portion is washed away, is stayed
Lower exposed portion and become prefabricated matrix pattern；
(5) coated glass substrate of prefabricated matrix pattern is put in 230 DEG C of baking oven and toasts 30m, so that matrix pattern is final
It is solidified into post bake.
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