CN109200764B - Use method for preparing electronic-grade hydrogen fluoride washing and absorbing device - Google Patents

Use method for preparing electronic-grade hydrogen fluoride washing and absorbing device Download PDF

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Publication number
CN109200764B
CN109200764B CN201811207305.4A CN201811207305A CN109200764B CN 109200764 B CN109200764 B CN 109200764B CN 201811207305 A CN201811207305 A CN 201811207305A CN 109200764 B CN109200764 B CN 109200764B
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tail gas
hydrofluoric acid
washing
storage tank
tower
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CN109200764A (en
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杨松
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Dongying Ruigang Pipeline Engineering Co ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/1456—Removing acid components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2047—Hydrofluoric acid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)

Abstract

The invention relates to the technical field of fluorine chemical industry, in particular to a use method for preparing an electronic-grade hydrogen fluoride washing and absorbing device. The method is characterized in that: the tail gas is guided in through an air inlet guide pipe, the temperature of the tail gas is 19-21 ℃, the tail gas flows upwards through a filler and a liquid distribution grid plate in a washing absorption tower body, the tail gas and hydrofluoric acid condensate sprayed by a spraying pipe are subjected to mass transfer and heat transfer, the cooled tail gas enters a tail gas inlet of a condensation tower through an exhaust guide pipe, the tail gas is subjected to heat exchange through a condensation pipe plate and then is discharged through a liquid removing device and a tail gas discharge port, the temperature of the tail gas discharge port is controlled to be 9-10 ℃, the hydrofluoric acid condensate condensed by the washing absorption tower is collected through the filler and flows along the wall of the washing absorption tower body to be recycled into a circulation storage tank through a liquid collecting pipe, the hydrofluoric acid condensate condensed by the condensation tower is recycled into the circulation storage tank through a condensate outlet.

Description

Use method for preparing electronic-grade hydrogen fluoride washing and absorbing device
Technical Field
The invention relates to the technical field of fluorine chemical industry, in particular to a use method for preparing an electronic-grade hydrogen fluoride washing and absorbing device.
Background
Electronic grade hydrogen fluoride is mainly used as a cleaning agent and an etching agent in the industries of photovoltaics, integrated circuits and the like, is one of key auxiliary materials in the industries, and because arsenic impurity has a serious influence on the performance of electronic devices, the removal of arsenic is a key technology for purifying hydrogen fluoride. The Chinese invention patent (with the patent number of CN201110276860.4, the patent name is a method for preparing electronic-grade hydrofluoric acid) discloses a method for preparing electronic-grade hydrofluoric acid, which comprises the following steps: (1) gasification of technical grade anhydrous HF feedstock: gasifying industrial HF at 35 deg.c; (2) fluorine gas oxidation and light component removal, wherein gasified HF and fluorine gas are continuously introduced into a fluorine gas oxidation reactor, the fluorine gas oxidation reactor is provided with a cooling heat exchanger for adjusting the temperature of reaction materials and an absorption tower internally provided with fillers, HF is continuously injected into the top of the absorption tower through a circulating pump, and the unreacted fluorine gas is in countercurrent contact with circulating HF flowing down from the absorption tower; the dosage of fluorine gas is 1-2g/kgHF, the temperature of the oxidation reaction of the fluorine gas is controlled at 0-20 ℃, the pressure of the equipment is normal pressure, and the circulating amount of the pump is 10 times of the mass of the feed HF; (3) HF after the high-boiling rectification is oxidized at the upper part and light components are removed enters a high-boiling rectification tower, the temperature of the HF at the top of the high-boiling rectification tower is controlled at 20 ℃, and the reflux ratio of the high-boiling rectification tower is 1-3; (4) HF and fresh electronic-grade high-purity water which are subjected to high-boiling rectification in water washing rectification are respectively injected into a tower kettle of a water washing rectification tower, the water washing rectification tower is divided into two sections, the lower section is a washing section, and the upper section is a rectification section; in the washing section, under the action of a tower kettle heater, hydrofluoric acid is gasified, refluxed hydrofluoric acid and newly added high-purity water are uniformly distributed on a filler through a liquid distributor and are in countercurrent contact with hydrofluoric acid steam rising from a tower kettle to wash impurities in HF, the concentration of liquid led out from the tower kettle is controlled to be 70-80%, and the temperature of liquid in a constant-temperature reboiler at the bottom of a water-washing rectifying tower is 48-65 ℃; the washed hydrofluoric acid enters a rectifying section, is rectified and purified and then enters a tower top condenser, after condensation, partial reflux is carried out, the reflux ratio is controlled to be 2-4, the operating pressure of the tower is 110kPa, and a product extracted from the tower top is anhydrous HF meeting the quality requirement of an electronic grade product; wherein: the anhydrous HF is absorbed by water to prepare electronic grade hydrofluoric acid products with various concentrations. The Chinese invention patent (with the patent number of CN201310052553.7, the patent name is a preparation method of electronic-grade hydrofluoric acid) discloses a preparation method of electronic-grade hydrofluoric acid, which is characterized in that industrial anhydrous hydrogen fluoride liquid and pure water are introduced into a rectifying tower to form hydrofluoric acid with a first concentration; then adding hydrogen peroxide solution to oxidize arsenic and silicon impurities in the solution, and then rectifying the solution; condensing the hydrogen fluoride gas obtained by rectification into hydrogen fluoride liquid, carrying out first filtration, absorbing the hydrogen fluoride liquid into hydrofluoric acid with a second concentration by using pure water, and carrying out second filtration to obtain an electronic grade hydrofluoric acid product; absorbing the tail gas with pure water to prepare industrial hydrofluoric acid. The preparation method has the advantages of simple preparation process, no introduction of extra impurities, high yield and low cost, and the prepared electronic-grade hydrofluoric acid reaches the semiconductor equipment and material international standard SEMI-C7, and can be used for preparing both electronic-grade hydrofluoric acid and analytically pure hydrofluoric acid by one production process.
Prior art 1 uses fluorine gas as oxidant to oxidize impurities in hydrogen fluoride, and uses washing rectification method to respectively remove high-boiling-point substances such as HAsF6、MAsF6、H2SO4、H2O、H2SiF6、H3PO4Iso and volatile component SO2、SiF4、PF3、POF3、AsF5、SF6、PF5The problems to be solved are that, firstly, fluorine gas is extremely toxic, highly chemically active and strongly oxidizing, and the sealing problem of the existing conveying machinery such as a circulating pump is difficult to solveThe leakage is easy to cause serious safety accidents; secondly, rectification and washing are integrated in a rectifying tower to finish the process which does not meet the technical specifications; the prior art 2 indicates that arsenic, an impurity in hydrogen fluoride, has a serious influence on the performance of an electronic device, and the removal of arsenic is a key technology for the purification of hydrogen fluoride, the prior art generally adopts a method that trivalent arsenic is oxidized into a high-boiling-point pentavalent arsenic compound by using an oxidant, and then the trivalent arsenic compound is removed by using a distillation process, the oxidant is generally potassium permanganate, hydrogen peroxide, potassium dichromate and the like, and the problems to be solved are that firstly, other impurities are introduced to increase the difficulty and the cost of subsequent treatment; secondly, the oxidation time is long, generally reaching 6 to 48 hours, and the energy consumption is high.
Disclosure of Invention
In view of the defects of the prior art, the invention aims to provide a using method for preparing an electronic grade hydrogen fluoride washing and absorbing device, which is characterized by comprising the following steps:
before use, the liquid level conditions of the washing absorption tower, the circulating storage tank and the condensing tower are observed by a liquid level meter, the liquid level is ensured to be 1000mm away from the gas inlet guide pipe and the tail gas discharge port and more than 300 mm higher than the outlet end of the circulating storage tank, an exhaust valve of the circulating storage tank is opened to exhaust a small amount of mixed gas, and the liquid seal is ensured to be in a normal working state.
And step two, introducing tail gas through an air inlet guide pipe, wherein the temperature of the tail gas is 19-21 ℃, enabling the tail gas to flow upwards through a filler and a liquid distribution grid plate in a washing absorption tower body, transferring heat with hydrofluoric acid condensate sprayed by a spraying pipe fitting, enabling the cooled tail gas to enter a tail gas inlet of a condensing tower through an exhaust guide pipe, enabling the tail gas inlet of the condensing tower and the condensing tower body to adopt a Venturi tube principle design, enabling the tail gas to enter the condensing tower body with a larger diameter after being compressed through the tail gas inlet with a smaller diameter and to be diffused, enabling liquid drops to be uniformly distributed in the tail gas, improving the condensing efficiency of the condensing tube plate, enabling the tail gas to be discharged through a liquid removing device and a tail gas discharge port after heat exchange is completed through the condensing tube plate, controlling the temperature of the tail gas discharge port to be 9-10 ℃, enabling the hydrofluoric acid condensate condensed by the washing, the hydrofluoric acid condensate condensed by the condensing tower is recycled into the circulating storage tank through the condensate outlet, the circulating pump assembly returns the hydrofluoric acid condensate in the circulating storage tank to the spraying pipe fitting to wash condensed tail gas, and as the bottoms of the washing absorption tower and the condensing tower are communicated with the circulating storage tank, washing liquid of the washing absorption tower and the condensate of the condensing tower are converged into the circulating storage tank, the condensate is conveyed by the circulating pump assembly to return the washing absorption tower to continuously cool the washing tail gas, so that the concentration of hydrofluoric acid absorbed by pure water in the circulating storage tank is higher and higher, and industrial hydrofluoric acid with various concentrations can be obtained as required.
The inventor finds that international standard SEMI-C7 for ultra-clean high-purity reagent of international semiconductor equipment and materials organization requires less than 10ppb of metal impurities, and arsenic is a doping element for semiconductor manufacture, so that the requirement on the content of arsenic impurities in hydrofluoric acid standard is particularly strict. In the prior art, arsenic removal is usually carried out by oxidizing volatile trivalent arsenic fluoride with an oxidant to generate a metal salt or complex of high boiling point pentavalent arsenic, and then removing the metal salt or complex by a rectification method. The fluorine gas is adopted to oxidize arsenic impurities in the hydrogen fluoride to generate high-boiling-point substance HAsF6、MAsF6(metal salt or complex of pentavalent arsenic), and reusing HAsF as high boiling substance6、MAsF6Compared with volatility difference of HF and other components, the method adopts multiple equilibrium processes to separate pure electronic grade hydrogen fluoride from a multi-component mixture. The rectification process flow adopts reflux liquid and ascending gas to form gas-liquid countercurrent contact in a distillation tower, the non-volatile components in the ascending gas are continuously condensed, and simultaneously the non-volatile components are continuously received from the reflux liquid flowing from top to bottom, so that the content of the volatile components is continuously improved in the ascending process, the volatile components with higher purity can be obtained from the top of the tower, and on the other hand, the volatile components in the reflux liquid are continuously gasified in the flowing process, and simultaneously the non-volatile components condensed in the ascending steam are continuously received, so that the content of the non-volatile components is continuously improved, and the non-volatile components with higher purity can be obtained at the bottom of the tower. The tail gas generated in the rectification of the hydrogen fluoride mainly comprises HF steam and volatile component SO2、SiF4、PF3、POF3、AsF5、SF6、PF5And the tail gas can be completely washed by pure water and condensed to prepare industrial hydrofluoric acid.
The inventor finds that HF steam and normal-temperature non-condensable gas SO in tail gas2、SiF4、PF3、POF3、AsF5、SF6、PF5The method can be recycled by using pure water to wash, condense and absorb, the problem that the liquid level of condensate rises to block an air inlet conduit and reflux is often generated in the implementation process of using the washing absorption tower and the condensing tower together because the washing absorption tower and the condensing tower can not be effectively communicated to realize gas-liquid two-phase balance, the gas-liquid two phases in the washing absorption tower and the condensing tower are in a violent mass and heat transfer working state, the temperature and the pressure of the device are in extremely complex changes, the requirement of balancing gas phase and liquid phase of any working surface in the working environment is difficult to realize, for example, the gas in the circulating storage tank is more, the gas seal phenomenon can occur when the washing absorption tower is conveyed to the pipeline of the circulating storage tank, the problem that the liquid level is increased and the liquid level submerges the gas inlet guide pipe and flows back is caused because the liquid storage at the bottom of the washing absorption tower can not be conveyed, therefore, under the condition of process conditions, the effective communication between the washing absorption tower and the condensation tower is definitely good. The specific implementation mode is that the bottoms of the washing absorption tower and the condensing tower are communicated with a circulating storage tank to form a U-shaped communicating vessel, hydrofluoric acid condensate of the washing absorption tower and the condensing tower is converged in the circulating storage tank, and the liquid level of the hydrofluoric acid condensate is more than 1000mm away from an air inlet guide pipe and a tail gas discharge port, so that liquid seal is formed at the bottoms of the washing absorption tower and the condensing tower, and even if the hydrofluoric acid condensate in the circulating storage tank is continuously prepared or returns to the washing absorption tower to condense and wash tail gas in work, the liquid level can be effectively balanced due to the mutual communication, and the liquid seal is always kept in an effective working state. Tail gas passes through an air inlet guide pipe, a filler, a liquid distribution grid plate, a spraying pipe fitting, an exhaust guide pipe, a tail gas inlet, a condensing pipe plate, a liquid removing device and a tail gas discharge port in sequence to finish the condensation process, condensed hydrofluoric acid condensate is separated from gas and collected into a circulating storage tank through a liquid collecting pipe and a condensate outlet, and due to the effect of liquid seal, the tail gas cannot flow into the circulating storage tank in a channeling mode to generate a back mixing phenomenon, so that the tail gas is subjected to back mixingThe problem that an air inlet duct for conveying tail gas is blocked or even reflows can not occur.
The inventor finds that the tail gas inlet and the condensation tower body of the condensation tower are designed by adopting the venturi tube principle, and aims to enable tail gas to enter the condensation tower body with a larger diameter for diffusion after being compressed by the tail gas inlet with a smaller diameter, so that liquid drops are uniformly distributed in the tail gas, and the condensation efficiency of the condensation tower in a condensation pipe plate is improved.
The inventor finds that as the bottoms of the washing absorption tower and the condensing tower are communicated with the circulating storage tank, the washing liquid of the washing absorption tower and the condensate of the condensing tower are collected in the circulating storage tank, and the condensate is conveyed back to the washing absorption tower through the circulating pump assembly to continuously cool the washing tail gas, the concentration of hydrofluoric acid absorbed by pure water in the circulating storage tank is higher and higher, and industrial hydrofluoric acid with various concentrations can be obtained according to requirements.
Compared with the prior art, the invention at least has the following advantages: firstly, the bottoms of a washing absorption tower and a condensing tower are communicated with a circulating storage tank to form a U-shaped communicating vessel, hydrofluoric acid condensate of the washing absorption tower and the condensing tower is converged in the circulating storage tank, and the liquid level of the hydrofluoric acid condensate is more than 1000mm away from an air inlet guide pipe and a tail gas discharge port, so that liquid seal is formed at the bottoms of the washing absorption tower and the condensing tower, and even if the hydrofluoric acid condensate in the circulating storage tank continuously prepares products or returns to the washing absorption tower to condense and wash tail gas in work, the liquid level can be effectively balanced due to the mutual communication, and the liquid seal always keeps an effective working state; secondly, due to the effect of liquid seal, the tail gas can not flow into the circulating storage tank in a channeling way to generate a back mixing phenomenon, so that the problem that an air inlet duct for conveying the tail gas is blocked and even flows back can not occur.
Drawings
FIG. 1 is a schematic front view of an apparatus for preparing an electronic grade hydrogen fluoride scrubbing-absorbing device according to the present invention.
FIG. 2 is a schematic top view of an apparatus for preparing an electronic grade HF scrubbing-absorber according to the present invention.
FIG. 3 is a schematic diagram of the arrangement of section A-A of the use of the apparatus for the preparation of an electronic grade hydrogen fluoride scrubbing-absorption unit according to the present invention.
1-washing absorption tower 2-circulating storage tank 3-circulating pump assembly 4-condensing tower
5-liquid collecting pipe 6-washing absorption tower body 7-air inlet guide pipe 8-filler 9-liquid distribution grid plate
10-spraying pipe fitting 11-exhaust conduit 12-tail gas inlet 13-condensation tower
14-condenser tube plate 15-liquid removing device 16-tail gas discharge port 17-condensate outlet.
Detailed Description
The invention is further described with reference to the following detailed description of embodiments and drawings.
As shown in fig. 1, fig. 2 and fig. 3, the use method of the electronic grade hydrogen fluoride washing and absorbing device is characterized in that: firstly, liquid level conditions of the washing absorption tower 1, the circulating storage tank 2 and the condensing tower 4 are observed through a liquid level meter before use, the liquid level is ensured to be 1000mm away from the gas inlet guide pipe 7 and the tail gas discharge port 16 and is more than 300 mm higher than the outlet end of the circulating storage tank 2, an exhaust valve of the circulating storage tank 2 is opened to exhaust a small amount of mixed gas, and the liquid seal is ensured to be in a normal working state.
Step two, leading in tail gas through an air inlet guide pipe 7, leading the tail gas into the washing and absorbing tower body 6 at the temperature of 19-21 ℃, enabling the tail gas to flow upwards through a filler 8 and a liquid distribution grid plate 9, transferring heat with hydrofluoric acid condensate sprayed by a spraying pipe 10 in a mass transfer manner, enabling the cooled tail gas to enter a tail gas inlet 12 of a condensing tower 4 through an exhaust guide pipe 11, designing the tail gas inlet 12 and the condensing tower body 13 of the condensing tower 4 by adopting a Venturi tube principle, aiming at enabling the tail gas to enter a condensing tower body 13 with a larger diameter after being compressed by the tail gas inlet 12 with a smaller diameter and to be diffused, enabling liquid drops to be uniformly distributed in the tail gas, thereby improving the condensing efficiency of the condensing pipe plate 14, enabling the tail gas to be discharged through a liquid removing device 15 and a tail gas discharge port 16 after completing heat exchange through the tail gas pipe plate 14, controlling the temperature of the tail gas discharge port 16 to be 9-10 ℃, enabling the hydrofluoric acid condensate condensed by, hydrofluoric acid condensate condensed by the condensing tower 4 is recycled into the circulating storage tank 2 through the condensate outlet 17, the circulating pump assembly 3 returns the hydrofluoric acid condensate in the circulating storage tank 2 to the spraying pipe fitting 10 to wash condensed tail gas, as the bottoms of the washing absorption tower 1 and the condensing tower 4 are communicated with the circulating storage tank 2, washing liquid of the washing absorption tower 1 and the condensate of the condensing tower 4 are converged into the circulating storage tank 2, and the condensate is conveyed by the circulating pump assembly 3 to return the washing absorption tower 1 to continuously cool the washing tail gas, the concentration of hydrofluoric acid absorbed by pure water in the circulating storage tank 2 is higher and higher, and industrial hydrofluoric acid with various concentrations can be obtained according to needs.
Variations and modifications to the above-described embodiments may occur to those skilled in the art, which fall within the scope and spirit of the above description. Therefore, the present invention is not limited to the specific embodiments disclosed and described above, and some modifications and variations of the present invention should fall within the scope of the claims of the present invention. Furthermore, although specific terms are employed herein, they are used in a generic and descriptive sense only and not for purposes of limitation.

Claims (3)

1. The use method of the washing and absorbing device for preparing the electronic-grade hydrogen fluoride is characterized by comprising the following steps of: before use, observing the liquid level conditions of a washing absorption tower, a circulating storage tank and a condensing tower through a liquid level meter, ensuring that the liquid level position is 1000mm lower than a gas inlet guide pipe and a tail gas discharge port and more than 300 mm higher than the outlet end of the circulating storage tank, opening an exhaust valve of the circulating storage tank to empty a small amount of mixed gas, and ensuring that a liquid seal is in a normal working state; and step two, introducing tail gas through an air inlet guide pipe, enabling the tail gas to have a temperature of 19-21 ℃, enabling the tail gas to flow upwards through a filler and a liquid distribution grid plate in a washing absorption tower body, enabling the tail gas to transfer heat with hydrofluoric acid condensate sprayed by a spraying pipe, enabling the cooled tail gas to enter a tail gas inlet of a condensing tower through an exhaust guide pipe, enabling the tail gas to be discharged through a liquid removing device and a tail gas discharge port after heat exchange of the tail gas is completed through a condensing pipe plate, controlling the temperature of the tail gas discharge port to be 9-10 ℃, enabling the hydrofluoric acid condensate condensed by the washing absorption tower to be collected through the filler, enabling the hydrofluoric acid condensate to flow along the wall of the washing absorption tower body and be recycled into a circulating storage tank through a liquid collecting pipe, enabling the hydrofluoric acid condensate condensed by the condensing.
2. The use of the apparatus of claim 1 for the preparation of an electronic grade hydrogen fluoride scrubbing absorber, wherein: the tail gas import and the condensation tower body of condensing tower adopt venturi principle design, and the purpose makes tail gas get into the great condensation tower body diffusion of diameter behind the less tail gas import compression of diameter, makes the liquid drop evenly distributed in tail gas to improve the condensation efficiency at the condensation tube sheet.
3. The use of the apparatus of claim 1 for the preparation of an electronic grade hydrogen fluoride scrubbing absorber, wherein: because the bottoms of the washing absorption tower and the condensing tower are communicated with the circulating storage tank, washing liquid of the washing absorption tower and condensate of the condensing tower are collected in the circulating storage tank, the condensate is conveyed to the washing absorption tower through the circulating pump assembly to continuously cool washing tail gas, the concentration of hydrofluoric acid absorbed by pure water in the circulating storage tank is higher and higher, and industrial hydrofluoric acid with various concentrations can be obtained according to requirements.
CN201811207305.4A 2018-10-17 2018-10-17 Use method for preparing electronic-grade hydrogen fluoride washing and absorbing device Active CN109200764B (en)

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Effective date of registration: 20221117

Address after: No. 19, Gangcheng Road, Dongying Port Economic Development Zone, Dongying City, Shandong Province 257237

Patentee after: Dongying Ruigang Pipeline Engineering Co.,Ltd.

Address before: 362000 the 2 floor of 32 new gate Street and 1916 Creative Industrial Park, Licheng District, Quanzhou, Fujian, China, 1916

Patentee before: Yang Song