CN109168244B - Preparation method of ionization cavity based on plasma antenna - Google Patents
Preparation method of ionization cavity based on plasma antenna Download PDFInfo
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- CN109168244B CN109168244B CN201811245064.2A CN201811245064A CN109168244B CN 109168244 B CN109168244 B CN 109168244B CN 201811245064 A CN201811245064 A CN 201811245064A CN 109168244 B CN109168244 B CN 109168244B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
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Abstract
The invention relates to a preparation method of an ionization cavity based on a plasma antenna, wherein the plasma antenna comprises the following components: a coupling cavity (2) and an ionization cavity (1); the ionization cavity (1) is a hollow cylindrical insulating medium cavity which contains low-pressure inert gas and is closed at two ends; the coupling cavity (2) is used for fixing the ionization cavity (1); it includes: step 1) acquiring geometric parameters of an ionization cavity; the geometric parameters include: the inner diameter of the ionization chamber, the thickness of the outer wall of the ionization chamber and the length of the ionization chamber; step 2) obtaining gas parameters of inert gas filled in the ionization cavity; the gas parameters include: the gas pressure and the gas type of the inert gas; step 3), acquiring radio frequency parameters of the ionization cavity; the radio frequency parameters include: excitation power and signal frequency; and 4) obtaining an ionization cavity according to the geometric parameters, the gas parameters and the radio frequency parameters obtained in the steps 1) to 3).
Description
Technical Field
The invention belongs to the technical field of plasma antennas, and particularly relates to a preparation method of an ionization cavity based on a plasma antenna.
Background
The plasma antenna technology is to generate high-density plasma by ionizing inert gas enclosed in a dielectric cavity, and simulate a metal antenna by utilizing the conductivity of the plasma.
The principle of plasma antennas is not complicated and can be easily prototyped. However, the principle prototype made according to the basic principle of the plasma antenna has very low gain, which is usually 20 db lower than that of the metal antenna, and has no practical value. Because the most basic performance of the antenna is gain, even under the premise of impedance matching, the gain of the plasma antenna is difficult to achieve the same or similar level as that of the common metal antenna. Therefore, although many years of research have been conducted, the plasma antenna has not been put to practical use so far.
The gain problem aiming at the plasma antenna is the first main technical bottleneck in the development process of the plasma antenna, and the plasma antenna which is really qualified can be called only if the ideal gain performance similar to that of a metal antenna is realized. In the prior art, the gain performance of the plasma antenna depends on the ionization cavity (1), and only the ionization cavity with proper design parameters (formula) can realize ideal gain of the plasma antenna; therefore, in order to achieve the same gain of the plasma antenna as that of the metal antenna, it is critical to meet the design parameters of the appropriate dielectric ionization cavity. However, the prior art does not disclose how to prepare a suitable dielectric ionization chamber, and the gain of the plasma antenna in the prior art cannot reach the same gain as that of the metal antenna. At present, the design of plasma antenna ionization cavities published at home and abroad is often only a qualitative description, and quantitative analysis or calculation is difficult to perform due to the complexity of plasma related theories.
Disclosure of Invention
The invention aims to overcome the defects that the existing plasma antenna has poor gain performance and cannot achieve the same gain as a metal antenna, and provides a preparation method of an ionization cavity based on a plasma antenna, which can achieve the same antenna gain performance as the metal antenna; the plasma antenna includes: a coupling cavity and an ionization cavity; the ionization cavity is a hollow cylindrical insulating medium cavity which contains low-pressure inert gas and is closed at two ends, and the coupling cavity is used for fixing the ionization cavity at the bottom; the method specifically comprises the following steps:
step 1) acquiring geometric parameters of an ionization cavity; the geometric parameters include: the inner diameter of the ionization chamber, the thickness of the outer wall of the ionization chamber and the length of the ionization chamber;
step 2) obtaining gas parameters of inert gas filled in the ionization cavity; the gas parameters include: the gas pressure and the gas type of the inert gas;
step 3), acquiring radio frequency parameters of the ionization cavity; the radio frequency parameters include: excitation power and signal frequency;
and 4) obtaining an ionization cavity according to the geometric parameters, the gas parameters and the radio frequency parameters obtained in the steps 1) to 3).
As an improvement of the above technical solution, in the step 1), the geometric parameters specifically include:
the inner diameter of the ionization cavity is 12-18mm, and the thickness of the outer wall of the ionization cavity is 0.5-1 mm; the length of the ionization cavity is 40-100mm, preferably 40-60mm, and the ionization cavity is suitable for the working frequency of 100-500MHz, and the higher the working frequency is, the shorter the tube length of the ionization cavity is; if the plasma antenna is required to have a self-reconfiguration function, the working frequency is changed by changing the excitation power, and the length of the ionization cavity is correspondingly changed; specifically, reducing the excitation power, and thus the operating frequency, increases the length of the ionization chamber.
As one improvement of the above technical solution, the gas parameters are specifically:
the inert gas is pure argon, and is not doped with other gases or impurities; the pressure of the gas in the ionization chamber is 18-22 Pa.
As one improvement of the above technical solution, the radio frequency parameters specifically include:
the signal frequency is 100-500 MHz; the exciting power is not less than 25-30W, and the required plasma power density cannot be achieved if the exciting power is too low and is less than 25-30W.
As an improvement of the above technical solution, the ionization chamber is made of a non-conductive insulating material, and the insulating material has good transmission performance and can be transparent or opaque, such as glass or resin material.
As an improvement of the above technical solution, the coupling cavity includes: an excitation port and a signal port; the excitation port provides radio frequency excitation power for the ionization cavity, and a plasma column is excited in the ionization cavity to form a plasma antenna; the exciting power of the exciting port, namely the input power, is used for ionizing the inert gas sealed in the medium ionization cavity, so that a plasma cylinder with conductive performance is formed, and the plasma cylinder has the same function as a metal cylinder antenna with the same shape; the signal port is used for coupling radio frequency signals to the plasma antenna and is the same as the signal receiving port and the signal transmitting port of the common metal antenna.
The invention has the advantages that:
the plasma antenna composed of the ionization cavity and the coupling cavity manufactured by the method can realize ideal gain performance equal to that of a common metal antenna when the plasma antenna works normally.
Drawings
FIG. 1 is a flow chart of a method of making a plasma antenna based ionization chamber of the present invention;
FIG. 2 is a schematic structural diagram of a plasma antenna composed of an ionization chamber and a coupling chamber, which is manufactured by the method for manufacturing the ionization chamber based on the plasma antenna;
fig. 3 is a graph comparing the gains of the plasmon antenna of the present invention and a metal antenna.
Reference numerals:
1. ionization cavity 2 and coupling cavity
3. Signal port 4, excitation port
Detailed Description
The invention will now be further described with reference to the accompanying drawings.
As shown in fig. 1 and 2, the present invention provides a method for preparing an ionization chamber based on a plasma antenna, which can achieve the same antenna gain performance as a metal antenna; the plasma antenna includes: a coupling cavity 2 and an ionization cavity 1; the ionization cavity 1 is a hollow cylindrical insulating medium cavity with two closed ends and containing low-pressure inert gas, and the coupling cavity 2 is used for fixing the ionization cavity at the bottom; the method specifically comprises the following steps:
step 1) acquiring geometric parameters of an ionization cavity; the geometric parameters include: the inner diameter of the ionization chamber, the thickness of the outer wall of the ionization chamber and the length of the ionization chamber;
step 2) obtaining gas parameters of inert gas filled in the ionization cavity; the gas parameters include: the gas pressure and the gas type of the inert gas;
step 3), acquiring radio frequency parameters of the ionization cavity; the radio frequency parameters include: excitation power and signal frequency;
and 4) obtaining an ionization cavity according to the geometric parameters, the gas parameters and the radio frequency parameters obtained in the steps 1) to 3).
As an improvement of the above technical solution, in the step 1), the geometric parameters specifically include:
the inner diameter of the ionization cavity is 15mm, and the thickness of the outer wall of the ionization cavity is 0.5-1 mm; the length of the ionization cavity is 40-100mm, preferably 40-60mm, and the ionization cavity is suitable for the working frequency of 100-500MHz, and the higher the working frequency is, the shorter the tube length of the ionization cavity is; if the plasma antenna is required to have a self-reconfiguration function, the working frequency is changed by changing the excitation power, and the length of the ionization cavity is correspondingly changed; specifically, reducing the excitation power, and thus the operating frequency, increases the length of the ionization chamber.
As one improvement of the above technical solution, the gas parameters are specifically:
the inert gas is pure argon, and is not doped with other gases or impurities; the gas pressure in the ionization chamber was 20 Pa.
As one improvement of the above technical solution, the radio frequency parameters specifically include:
the signal frequency is 100-500 MHz; the exciting power is not less than 25-30W, and the required plasma power density cannot be achieved if the exciting power is too low and is less than 25-30W.
As an improvement of the above technical solution, the ionization chamber is made of a non-conductive insulating material, and the insulating material has good transmission performance and can be transparent or opaque, such as glass or resin material.
As an improvement of the above technical solution, the coupling cavity 2 includes: excitation port 4 and signal port 3; the excitation port 4 provides radio frequency excitation power for the ionization cavity, and a plasma column is excited in the ionization cavity to form a plasma antenna; the exciting power, namely the input power, of the exciting port 4 is used for ionizing the inert gas sealed in the medium ionization cavity, so that a plasma cylinder with conductive performance is formed, and the plasma cylinder has the same function as a metal cylinder antenna with the same shape; the signal port 3 is used for coupling radio frequency signals to the plasma antenna, and is the same as the signal receiving port and the signal transmitting port of the common metal antenna.
As shown in fig. 2, the plasma antenna composed of the ionization chamber and the coupling chamber manufactured by the method of the present invention can realize ideal gain performance equivalent to that of a common metal antenna when the plasma antenna normally works. The normal work of the plasma antenna means that the signal port 3 and the excitation port 4 can realize radio frequency matching. Wherein, the signal port 3 is used for receiving and transmitting radio frequency signals.
The ionization cavity 1 manufactured by the method is inserted into a coupling cavity 2 with good impedance matching, and radio frequency power is coupled through a signal port 3 on the coupling cavity 2 so as to form a columnar plasma antenna in the ionization cavity 1. When the signal frequency is in the range of 100MHz-500MHz, the excitation power input through the excitation port 4 should be not less than 25W-30W, and the excitation power is lower than 25-30W, the required plasma ionization density cannot be achieved.
The transmission and reception of radio frequency signals is achieved through the signal port 3. During the operation of the practical plasma antenna, the signal port 3 and the excitation port 4 need to be matched with impedance in the coupling cavity 2. The signal frequency of the signal port 3 and the excitation frequency of the excitation port 4 should be selected in different frequency bands to prevent mutual interference and be isolated from each other by the filtering device.
As shown in fig. 3, fig. 3 is a comparison result of the gains from 380MHz to 420MHz of the metal antenna and the plasma antenna with the gain of 3.0; the metal antenna and the plasma antenna reach maximum gain near 400MHz, the received signal power of the plasma antenna is closest to that of the metal antenna near the working frequency of 400MHz, and the minimum difference of the gain is 2.1 dB. Therefore, at the 400MHz test frequency, the gain of the plasma antenna is close to 1 dB.
Finally, it should be noted that the above embodiments are only used for illustrating the technical solutions of the present invention and are not limited. Although the present invention has been described in detail with reference to the embodiments, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (2)
1. A preparation method of an ionization cavity based on a plasma antenna is characterized in that the plasma antenna comprises the following steps: a coupling cavity (2) and an ionization cavity (1); the ionization cavity (1) is a hollow cylindrical insulating medium cavity which contains low-pressure inert gas and is closed at two ends; the coupling cavity (2) is used for fixing the ionization cavity (1); the method specifically comprises the following steps:
step 1) acquiring geometric parameters of an ionization cavity; the geometric parameters include: the inner diameter of the ionization cavity, the thickness of the outer wall of the ionization cavity and the length of the ionization cavity;
in the step 1), the geometric parameters are specifically:
the inner diameter of the ionization cavity is 12-18mm, and the thickness of the outer wall of the ionization cavity is 0.5-1 mm; the length of the ionization cavity is 40-100mm, and the ionization cavity is suitable for the working frequency of 100-500 MHz;
step 2) obtaining gas parameters of inert gas filled in the ionization cavity; the gas parameters include: the gas pressure and the gas type of the inert gas;
the gas parameters are specifically as follows:
the gas type of the inert gas is pure argon; the pressure of the gas in the ionization cavity is 18-22 Pa;
step 3), acquiring radio frequency parameters of the ionization cavity; the radio frequency parameters include: excitation power and signal frequency;
the radio frequency parameters are specifically:
the signal frequency is 100-500 MHz; the excitation power is 25-30W;
and 4) obtaining an ionization cavity according to the geometric parameters, the gas parameters and the radio frequency parameters obtained in the steps 1) to 3).
2. The method according to claim 1, characterized in that the ionization chamber (1) is made of a non-conductive insulating material.
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| CN201811245064.2A CN109168244B (en) | 2018-10-24 | 2018-10-24 | Preparation method of ionization cavity based on plasma antenna |
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| CN201811245064.2A CN109168244B (en) | 2018-10-24 | 2018-10-24 | Preparation method of ionization cavity based on plasma antenna |
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| AUPP635298A0 (en) * | 1998-10-06 | 1998-10-29 | Australian National University, The | Plasma antenna |
| US6843178B2 (en) * | 2002-08-22 | 2005-01-18 | Lockheed Martin Corporation | Electromagnetic pulse transmitting system and method |
| CN100388559C (en) * | 2005-12-29 | 2008-05-14 | 上海交通大学 | Self-reconstruction plasma antenna |
| CN101286587B (en) * | 2008-05-27 | 2012-01-11 | 南京航空航天大学 | Yagi antenna of electric-controlled plasma |
| CN101938035B (en) * | 2010-07-15 | 2013-10-30 | 华南理工大学 | Array plasma antenna with omni-directional scanning function |
| CN202308283U (en) * | 2011-08-17 | 2012-07-04 | 华南理工大学 | Plasma antenna array with alterable magnetic control beam |
| CN103730723B (en) * | 2014-01-07 | 2017-06-06 | 北京卫星环境工程研究所 | A kind of spaceborne plasma antenna is produced and emitter and its communication means |
| WO2016014790A1 (en) * | 2014-07-23 | 2016-01-28 | Georgia Tech Research Corporation | Electrically short antennas with enhanced radiation resistance |
| CN104573271B (en) * | 2015-01-27 | 2018-05-22 | 中国空间技术研究院 | A kind of accurate plasma antenna radiance emulation mode of changeable parameters |
| CN105932404B (en) * | 2016-04-21 | 2018-10-02 | 上海海事大学 | Plasma flexible antenna system |
| CN106972239B (en) * | 2017-04-06 | 2019-05-03 | 皖西学院 | A kind of novel plasma body antenna and application method |
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