CN109164657A - A kind of electrochromic and preparation method thereof - Google Patents

A kind of electrochromic and preparation method thereof Download PDF

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Publication number
CN109164657A
CN109164657A CN201811127667.2A CN201811127667A CN109164657A CN 109164657 A CN109164657 A CN 109164657A CN 201811127667 A CN201811127667 A CN 201811127667A CN 109164657 A CN109164657 A CN 109164657A
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CN
China
Prior art keywords
glass substrate
active matrix
electrochromic
tft active
electrode
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Pending
Application number
CN201811127667.2A
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Chinese (zh)
Inventor
姚若河
韩静
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South China University of Technology SCUT
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South China University of Technology SCUT
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Priority to CN201811127667.2A priority Critical patent/CN109164657A/en
Publication of CN109164657A publication Critical patent/CN109164657A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153Constructional details
    • G02F1/1533Constructional details structural features not otherwise provided for
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153Constructional details
    • G02F1/155Electrodes
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153Constructional details
    • G02F1/157Structural association of cells with optical devices, e.g. reflectors or illuminating devices

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The invention discloses a kind of electrochromics, comprising: the first polaroid for setting gradually, the first glass substrate, CF piece, ITO electrode, composition layer, tft active matrix, the second glass substrate, the second polaroid that light transmission can be changed under electric field action.The invention also discloses the preparation methods based on above-mentioned electrochromic, include the following steps: first to put into the first glass substrate and the second glass substrate, tft active matrix is prepared on the second glass substrate, CF piece, ITO electrode are prepared on the first glass substrate again, it carries out orientation coating and matches the first glass substrate and the second glass substrate, two panels glass substrate is aligned and is bonded, the composition that light transmission can be changed under electric field action is refilled and carries out polaroid fitting.The present invention can control tft active matrix by external control module, so that color-changing window is shown multicolour pattern, change simultaneously the light transmittance of window.

Description

A kind of electrochromic and preparation method thereof
Technical field
The present invention relates to electrochromism technology and its application field, in particular to it is a kind of can display pattern electrochromic And preparation method thereof.
Background technique
In daily life, window-glass is generally transparent or coloured transparent glass material.Transparent glass is in strong illumination Under can make one not feeling good.And the good coloured glass of light-proofness can cause indoor light dim when cloudy day or illumination are weaker, one As strong illumination bring sense of discomfort solved by setting curtain.
Electrochromism refers to the optical properties (reflectivity, transmitance, absorptivity etc.) of material under the action of extra electric field Color change there is a phenomenon where stablizing, reversible shows as the reversible change of color and transparency in appearance.Current is electroluminescent Discoloration window setting technique mostly use be coated on original glass one layer of Electro-Discolor Coating (it is typical as tungstic acid or polythiophene class, Purple sieve essence class etc.) change colour to realize.The solar radiation entered in window is dynamically controlled using electrochromic, is realized not The same time absorbs and reflects suitable light and heat, the energy efficiency of building is promoted, to reduce the refrigeration or system of building The cost of heat achievees the purpose that reduce room conditioning heat load and reduce energy consumption, while playing improvement natural lighting intensity etc. to make With.But existing electrochromism technology can not make windowpane display pattern, there is a problem of that display is single.
Summary of the invention
The purpose of the present invention is to overcome the shortcomings of the existing technology with it is insufficient, a kind of electrochromic and its preparation side are provided Method, this device and method can realize that dynamically control enters the solar radiation in window, and can show various multicolour patterns, bring Richer visual enjoyment.
The purpose of the present invention is realized by the following technical solution: a kind of electrochromic, comprising: first set gradually Polaroid, the first glass substrate, CF piece (colored filter), ITO electrode, under electric field action can be changed light transmission combination Nitride layer, tft active matrix, the second glass substrate, the second polaroid;The tft active matrix is changed colour when being powered by control The chromatic filter layer of any pixel point of CF piece, makes color-changing window show multicolour pattern in forms.
Preferably, the electrochromic further includes external control module, and external control module includes data storage Device, single-chip microcontroller and level shifting circuit;Pattern data to be shown is stored in data storage, reads pattern numbers by single-chip microcontroller According to, formation row, column driving signal, then the row and column by level shifting circuit input tft active matrix.
Preferably, the tft active matrix includes: the gate electrode being sequentially prepared, active island, source-drain electrode, passivation layer, connects Contact hole and pixel electrode.
Further, the gate electrode of tft active matrix is prepared by metal, gate metal Cr, gate electrode thickness 180- 220 nanometers;Active island is IGZO material;Source-drain electrode is Cr, 180-220 nanometers thick;Passivation layer is SiNx, and thick 225-275 receives Rice;45-55 nanometers of pixel electrode thickness.
Preferably, the pixel of the tft active matrix output electric signal control CF on piece, makes its display pattern and changes The light transmittance of color-changing window, thus the display pattern on the window of larger area, control mode simple and flexible, outdoor optical illumination change When, keep indoor illumination more comfortable.
A kind of preparation method of electrochromic, includes the following steps:
S1, the first glass substrate of investment and the second glass substrate;
S2, it prepares tft active matrix: gate electrode, active island, source and drain being sequentially prepared by photoetching on the second glass substrate Electrode, passivation layer, contact hole and pixel electrode arrange to prepare the active square of TFT;
S3, CF piece is prepared: in the inside of the first glass substrate, by three color pigment solution spraying of red, green, blue in respective area Domain forms CF piece;
S4, preparation ITO electrode: ito film is sputtered on above-mentioned first glass substrate, is formed by processes such as photoetching, etchings ITO electrode figure;
S5, orientation coating: first the first glass substrate after completing above-mentioned preparation process and the second glass baseplate surface into TOP layers of row coating, are coated with oriented layer;
S6, the first glass substrate of matching and the second glass substrate, two panels electro-conductive glass is aligned and is bonded and solidifies, is formed with The glass case in certain thickness gap;
S7, the composition of changeable light transmission under electric field action is filled in into glass case and is sealed;
S8, polaroid are bonded: it is orthogonal to be respectively bonded polarization direction on the outside of the first glass substrate and the second glass substrate The first polaroid and the second polaroid.
Preferably, in the step S2, gate metal is sputtered on the second glass substrate first, by photoetching process by grid The processing of pole metal patternization, obtains the figure of gate electrode;Then active island is deposited on the gate metal after graphical;It splashes again Metal source and drain electrodes layer is penetrated, the source-drain electrode of tft active matrix is obtained after graphical treatment;Then deposit passivation layer, graphically Dry etching punches to form contact hole after processing;Redeposited one layer of pixel electrode, is graphically fabricated to pixel electrode structure.
Preferably, in the step S3, prepare CF piece when, be initially formed black matrix pattern with limit pixel ink hole, then Three color dyestuff photoresist of red, green, blue is sprayed onto each ink hole with inkjet printing technology again.
Further, make the unit one of CF pattern and tft active matrix a pair of just in the step S3, be then solidified into Type, and prepare layer protecting film.
Preferably, the step S5 carries out orientation coating by applying alignment agent, solidification, being orientated friction.
Compared with the prior art, the invention has the following advantages and beneficial effects:
1, the present invention can be controlled the tft active matrix in color-changing window by external control module, thus show multicolour pattern, It is single to solve the problems, such as that current electrochromic is shown, brings richer visual enjoyment.
2, the present invention can be reached in regulation room by user according to the autonomous change display different pattern of the power of outdoor light The purpose of intensity of illumination.
Detailed description of the invention
Fig. 1 is the structure chart of 1 electrochromic of the embodiment of the present invention.
Fig. 2 is that the invention shows pattern control flow charts.
Wherein: the 1-the first polaroid, the 2-the first glass substrate, 3-CF pieces, 4-ITO electrodes, 5-bis- fluorine bis cyclohexanes Compound composition, 6-tft active matrixs, the 7-the second glass substrate, the 8-the second polaroid, 9-sealing compounds.
Specific embodiment
For a better understanding of the technical solution of the present invention, the implementation that the present invention is described in detail provides with reference to the accompanying drawing Example, embodiments of the present invention are not limited thereto.
Embodiment 1
As shown in Figure 1, a kind of electrochromic, comprising: the first polaroid 1, the first glass substrate 2, CF being sequentially prepared Piece (colored filter) 3, ITO electrode 4, the composition layer of changeable light transmission (is selected in the present embodiment under electric field action Double fluorine bis cyclohexane compound compositions) 5, tft active matrix 6, the second glass substrate 7, the second polaroid 8, this electrochromism Window further includes external control module, and external control module includes data storage, single-chip microcontroller and level shifting circuit.This electroluminescent change Pellucidity or opaque state are presented when being not powered on for color window.Data storage is for storing pattern numbers to be shown According to single-chip microcontroller forms row, column driving signal after reading pattern data, then inputs tft active matrix by level shifting circuit Row and column, and the pixel of CF piece is further controlled, so that color-changing window is shown multicolour pattern, and change its light transmittance.
The tft active matrix include: the gate electrode being sequentially prepared, active island, source-drain electrode, passivation layer, contact hole and Pixel electrode.Gate metal is Cr, and gate electrode is formed after photoetching, etching, and gate electrode is 200 nanometers thick;Semiconductor active island is IGZO material;Source-drain electrode is Cr, 200 nanometers thick;Passivation layer is SiNx, 250 nanometers thick, prepares contact hole using etching;It is heavy Product ito film forms pixel electrode by lithography and etching, with a thickness of 50 nanometers.Wherein, a- also may be selected in semiconductor active island Si:H material.
Embodiment 2
The preparation process of electrochromic of the present invention is as follows:
S1, prepare tft active matrix on the second glass substrate: the tft active matrix is IGZO TFT first the Gate metal Cr is sputtered on two glass substrates obtains the figure of gate electrode by photoetching process by gate metal graphical treatment, Gate electrode is 200 nanometers thick;Then active island is deposited on the gate metal after graphical, semiconductor active island is IGZO material Material;Splash-proofing sputtering metal source-drain electrode Cr again obtains the source-drain electrode of tft active matrix after graphical treatment, 200 nanometers thick;Then Deposit passivation layer SiNx, 250 nanometers thick, dry etching punches to form contact hole after graphical treatment;Redeposited one layer of pixel electrode, figure Shape is fabricated to pixel electrode structure, 50 nanometers thick.
S2, the first glass substrate inside prepare CF piece: be initially formed black matrix pattern with limit pixel ink hole, then Three color pigment solution of red, green, blue is sprayed onto each ink hole with ink-jet printing, makes the CF pattern to be formed and tft active matrix Unit one is a pair of just, then curing molding, then prepares layer protecting film, forms CF piece, 2 microns thick;Then in the first glass base One layer of ITO layer is prepared on plate, and ITO electrode is formed by lithography and etching, it is 150 nanometers thick.
S3, to the first glass substrate after above-mentioned preparation process is completed and before the second glass substrate carries out orientation coating, first TOP layers of coating are carried out, TOP layer material selects SiO2, 50 nanometers, 300 DEG C of solidification temperature thick;
Thick 300 microns of polyimide film is respectively coated to the first glass substrate and the second glass substrate, and passes through friction Technique, which is formed, can induce the alignment films that double fluorine bis cyclohexane compound composition molecules arrange as required, orientation coating solidification temperature It is 230 DEG C.
S4, edging material is stamped into frame adhesive to the first glass substrate and the second glass substrate respectively with silk screen print method (epoxy resin) and conducting resinl, by the first glass substrate and the contraposition bonding of the second glass substrate, frame sealing temperatures are 175 DEG C, Environment temperature is room temperature, and the gap of the first glass substrate and the second glass substrate is 5 microns, and being made one, there are the glass of inlet Glass box.
S5, double fluorine bis cyclohexane compound compositions are filled into it is made above into glass case, with sealing resin by two Side opening blocks up, and irradiates sealing compound 9 with ultraviolet light, keeps sealing secured.
S6, mutually perpendicular first polaroid in polarization direction and the second polaroid are sticked on the outside of two glass substrates.
The above embodiment is a preferred embodiment of the present invention, but embodiments of the present invention are not by above-described embodiment Limitation, other any changes, modifications, substitutions, combinations, simplifications made without departing from the spirit and principles of the present invention, It should be equivalent substitute mode, be included within the scope of the present invention.

Claims (10)

1. a kind of electrochromic characterized by comprising the first polaroid for setting gradually, the first glass substrate, CF piece, ITO electrode, the composition layer that light transmission can be changed under electric field action, tft active matrix, the second glass substrate, second are partially Mating plate;For the tft active matrix when being powered, the chromatic filter layer of any pixel point by controlling CF piece keeps color-changing window aobvious Multicolour pattern is shown.
2. electrochromic according to claim 1, which is characterized in that the electrochromic further includes external control Module, external control module include data storage, single-chip microcontroller and level shifting circuit;Pattern data to be shown is stored in In data storage, pattern data is read by single-chip microcontroller, forms row, column driving signal, then TFT is inputted by level shifting circuit The row and column of active matrix.
3. electrochromic according to claim 1, which is characterized in that the tft active matrix includes: to be sequentially prepared Gate electrode, active island, source-drain electrode, passivation layer, contact hole and pixel electrode.
4. electrochromic according to claim 3, which is characterized in that the gate electrode of tft active matrix is standby by made of metal It forms, gate metal Cr, 180-220 nanometers of gate electrode thickness;Active island is IGZO material;Source-drain electrode is Cr, thick 180-220 Nanometer;Passivation layer is SiNx, 225-275 nanometers thick;45-55 nanometers of pixel electrode thickness.
5. electrochromic according to claim 1, which is characterized in that the tft active matrix output electric signal control The pixel of CF on piece makes its display pattern and changes light transmittance.
6. a kind of preparation method of electrochromic, which comprises the steps of:
S1, the first glass substrate of investment and the second glass substrate;
S2, it prepares tft active matrix: gate electrode, active island, source and drain electricity being sequentially prepared by photoetching on the second glass substrate Pole, passivation layer, contact hole and pixel electrode prepare tft active matrix;
S3, CF piece is prepared: in the inside of the first glass substrate, by three color pigment solution spraying of red, green, blue in corresponding region, shape At CF piece;
S4, preparation ITO electrode: sputtering ito film on above-mentioned first glass substrate, forms ITO electrode by photoetching, etching process Figure;
S5, orientation coating: first the first glass substrate after completing above-mentioned preparation process and the second glass baseplate surface carry out TOP Layer coating, is coated with oriented layer;
S6, the first glass substrate of matching and the second glass substrate, two panels electro-conductive glass is aligned and is bonded and solidifies, and is formed with certain The glass case of thickness gap;
S7, the composition of changeable light transmission under electric field action is filled in into glass case and is sealed;
S8, polaroid fitting: polarization direction mutually perpendicular the is respectively bonded on the outside of the first glass substrate and the second glass substrate One polaroid and the second polaroid.
7. the preparation method of electrochromic according to claim 6, which is characterized in that in the step S2, exist first Gate metal is sputtered on second glass substrate, by photoetching process by gate metal graphical treatment, obtains the figure of gate electrode; Then active island is deposited on the gate metal after graphical;Splash-proofing sputtering metal source-drain electrode layer again obtains after graphical treatment The source-drain electrode of tft active matrix;Then deposit passivation layer, dry etching punches to form contact hole after graphical treatment;Redeposition one Layer pixel electrode, is graphically fabricated to pixel electrode structure.
8. the preparation method of electrochromic according to claim 6, which is characterized in that in the step S3, prepare CF When piece, be initially formed black matrix pattern with limit pixel ink hole, then again with inkjet printing technology by three color dyestuff of red, green, blue Photoresist is sprayed onto each ink hole.
9. the preparation method of electrochromic according to claim 8, which is characterized in that make CF pattern in the step S3 It is a pair of just with the unit one of tft active matrix, then curing molding, and prepare layer protecting film.
10. the preparation method of electrochromic according to claim 5, which is characterized in that the step S5 is taken by applying Orientation coating is carried out to agent, solidification, orientation friction.
CN201811127667.2A 2018-09-27 2018-09-27 A kind of electrochromic and preparation method thereof Pending CN109164657A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111478989A (en) * 2020-03-17 2020-07-31 江西沃格光电股份有限公司 Cover plate assembly and electronic equipment

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101644128A (en) * 2009-08-24 2010-02-10 沈国宝 Liquid crystal window
CN102707487A (en) * 2012-06-04 2012-10-03 青岛海信电器股份有限公司 Transparent display device and electronic equipment employing same
CN103740376A (en) * 2013-12-30 2014-04-23 北京八亿时空液晶科技股份有限公司 Negative dielectric anisotropic liquid crystal composition containing dichlorobicyclohexyl compounds and application thereof
CN105929593A (en) * 2016-07-11 2016-09-07 京东方科技集团股份有限公司 Array substrate, transparent display substrate and transparent display device
US9494719B2 (en) * 2014-05-04 2016-11-15 Shenzhen China Star Optoelectronics Technology Co., Ltd. Color filter and method of making the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101644128A (en) * 2009-08-24 2010-02-10 沈国宝 Liquid crystal window
CN102707487A (en) * 2012-06-04 2012-10-03 青岛海信电器股份有限公司 Transparent display device and electronic equipment employing same
CN103740376A (en) * 2013-12-30 2014-04-23 北京八亿时空液晶科技股份有限公司 Negative dielectric anisotropic liquid crystal composition containing dichlorobicyclohexyl compounds and application thereof
US9494719B2 (en) * 2014-05-04 2016-11-15 Shenzhen China Star Optoelectronics Technology Co., Ltd. Color filter and method of making the same
CN105929593A (en) * 2016-07-11 2016-09-07 京东方科技集团股份有限公司 Array substrate, transparent display substrate and transparent display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111478989A (en) * 2020-03-17 2020-07-31 江西沃格光电股份有限公司 Cover plate assembly and electronic equipment

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