CN109148364A - A kind of manufacture craft of high resolution matrix screen - Google Patents

A kind of manufacture craft of high resolution matrix screen Download PDF

Info

Publication number
CN109148364A
CN109148364A CN201810995430.XA CN201810995430A CN109148364A CN 109148364 A CN109148364 A CN 109148364A CN 201810995430 A CN201810995430 A CN 201810995430A CN 109148364 A CN109148364 A CN 109148364A
Authority
CN
China
Prior art keywords
display material
flexible
material area
flexible substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810995430.XA
Other languages
Chinese (zh)
Inventor
宋爱民
杜军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Huaxin Jiayuan Technology Co Ltd
Original Assignee
Shenzhen Huaxin Jiayuan Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Huaxin Jiayuan Technology Co Ltd filed Critical Shenzhen Huaxin Jiayuan Technology Co Ltd
Priority to CN201810995430.XA priority Critical patent/CN109148364A/en
Publication of CN109148364A publication Critical patent/CN109148364A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate

Abstract

The manufacture craft of high resolution matrix screen of the invention, comprising: 1) chooses substrate;2) coats display material;3) is cut by laser.Also can be used: a) chooses substrate;B) resist coating;C) exposure-processed;D) development treatment;E) prepares display layer;F) removes extra display material area, to form flexible matrix screen.Manufacture craft of the invention, laser cutting parameter can be used to cut the flexible display material layer of coating on flexible substrates, also photoetching process can be used and prepare effective display material area (i.e. pixel) that size is met the requirements on flexible substrates, then extra display material area is being removed using laser cutting, dry etching or grinding method, to form high-resolution flexible matrix screen, solves the technical issues of prior art can not prepare high-resolution flexible display screen, beneficial effect is significant, is suitable for the application of popularization.

Description

A kind of manufacture craft of high resolution matrix screen
Technical field
The present invention relates to a kind of manufacture crafts of matrix panel, more specifically, more particularly to a kind of high resolution matrix screen Manufacture craft.
Background technique
Flexible display screen has good bending property, has broad application prospects in fields such as wearable devices, Flexible display screen uses flexible display material, and flexible display material develops the color under the action of extra electric field, and extra electric field moves back It can keep developing the color after going, only can just fade after application reversed electric field, this makes its power consumption extremely low.Existing flexible display screen is basic All using printing or spraying process production, according to requiring to make text to display, figure etc. on flexible substrates, after energization The display of i.e. controllable text or graphical information.In order to realize the display to variable characters or graphical information, this just needs flexibility Display screen resolution ratio with higher, however by printing or spraying process is limited, it is difficult the dimensioned of pixel extremely Grade is hereinafter, this is just that the production of high-resolution flexible display screen brings challenge, a kind of target effective processing not yet The method of high-resolution (size of such as pixel is 0.1mm × 0.1mm) flexible display screen.
Summary of the invention
The present invention in order to overcome the shortcomings of the above technical problems, provides a kind of manufacture craft of high resolution matrix screen.
The manufacture craft of high resolution matrix screen of the invention, which is characterized in that realized by following steps:
1) chooses substrate, chooses suitable flexible substrate, then that the surface clean of flexible substrate is clean and dry up;2) is coated Display material coats display material on the surface of flexible substrate, to form display material layer flexible;3) is cut by laser, and is used Display material layer is cut into the pixel according to matrix arrangement by laser cutting parameter, to form high-resolution flexible matrix screen.
The manufacture craft of high resolution matrix screen of the invention, which is characterized in that realized by following steps:
A) chooses substrate, chooses suitable flexible substrate, then that the surface clean of flexible substrate is clean and dry up;B) applies light Photoresist coats a layer photoresist on the surface of flexible substrate setting display material, forms photoresist layer;C) exposure-processed, according to The pixel size of the flexible matrix of being made screen is exposed processing to the photoresist layer in flexible substrate;D) at development Photoresist layer after exposure is carried out development treatment, to remove the exposure position of photoresist layer, the photoresist layer shape that do not remove by reason At divider wall, the fill area for accommodating display material is formed between divider wall;E) prepares display layer, in the flexibility that step d) is obtained Display material layer is prepared on substrate, display material layer is by effective display material area in fill area and on divider wall Extra display material district's groups at;F) removes extra display material area, will be more using laser cutting, dry etching or grinding method Remaining display material area removal, to form pixel mutually disjunct flexible matrix screen.
The manufacture craft of high resolution matrix screen of the invention, dry etching described in step f) by following steps come It realizes: preparing layer protecting film in the upper surface in effective display material area and extra display material area first, to avoid dry method quarter It, then will be more on divider wall using the dry etch process of such as ion beam to the destruction in effective display material area during erosion Remaining display material area removal, that is, form pixel mutually disjunct high-resolution flexible matrix screen;
Grinding method described in step f) are as follows: first with abrasive sheet to the upper surface of the intermediary device obtained in step e) into Row grinding, grinding thickness be subject to the extra display material area only removed on divider wall, without to effective display material area destroy, Form pixel mutually disjunct high-resolution flexible matrix screen.
The beneficial effects of the present invention are: the manufacture craft of high resolution matrix screen of the invention, can be used laser cutting work Skill cuts the flexible display material layer of coating on flexible substrates, forming smaller size (such as 0.1mm × 0.1mm) Mutual disjunct pixel, also can be used photoetching process and prepares effective display material area that size is met the requirements on flexible substrates (i.e. pixel) is then being removed extra display material area using laser cutting, dry etching or grinding method, to form height Resolution ratio flexible matrix screen, solves the technical issues of prior art can not prepare high-resolution flexible display screen, beneficial effect Significantly, it is suitable for the application of popularization.
Detailed description of the invention
Fig. 1 is the schematic diagram for preparing high-resolution flexible matrix screen in the present invention using laser cutting parameter;
Fig. 2 is the schematic diagram for preparing high-resolution flexible matrix screen in the present invention using photoetching process.
In figure: 1 flexible substrate, 2 display material layers, 3 pixels, 4 photoresist layers, 5 fill areas, 6 divider walls, 7 is effectively aobvious Show material sections, 8 extra display material areas, 9 protective films, 10 abrasive sheets.
Specific embodiment
The invention will be further described with embodiment with reference to the accompanying drawing.
As shown in Figure 1, giving in the present invention using the signal of laser cutting parameter preparation high-resolution flexible matrix screen Figure, is realized by following steps:
1) chooses substrate, chooses suitable flexible substrate 1, then that the surface clean of flexible substrate is clean and dry up;
Under normal conditions, flexible substrate 1 selects transparent conductive film, and a surface of transparent conductive film is conductive.
2) coats display material, display material is coated on the surface of flexible substrate 1, to form display material layer flexible 2;
In the step, display material layer is prepared on the surface of the conductive energy of flexible substrate 1;
3) is cut by laser, and display material layer 2 is cut into the pixel 3 according to matrix arrangement using laser cutting parameter, with shape At high-resolution flexible matrix screen.
Although laser cutting parameter can obtain high-resolution flexible matrix screen, but if control is bad, laser cutting is very It is easy that flexible substrate 1 is caused to damage.
As shown in Fig. 2, the schematic diagram for preparing high-resolution flexible matrix screen in the present invention using photoetching process is given, It is implemented by the following steps:
A) chooses substrate, chooses suitable flexible substrate 1, then that the surface clean of flexible substrate 1 is clean and dry up;
Similarly, it is generally the case that flexible substrate 1 selects transparent conductive film, and a surface of transparent conductive film is conductive.
B) resist coating coats a layer photoresist on the surface that display material is arranged in flexible substrate 1, forms photoresist layer 4;
In the step, photoresist is coated on the conductive surface of flexible substrate 1.
C) exposure-processed, according to the pixel size of the flexible matrix of being made screen, to the photoresist layer in flexible substrate 4 are exposed processing;
Photoresist layer 4 after exposure is carried out development treatment, to remove the exposure position of photoresist layer 4, not by d) development treatment The photoresist layer 4 removed forms divider wall 6, forms the fill area 5 for accommodating display material between divider wall;
E) prepares display layer, display material layer is prepared in the flexible substrate that step d) is obtained, display material layer is by being located at filling Effective display material area 7 in area and extra display material area 8 composition on divider wall;
F) removes extra display material area, is gone to extra display material area using laser cutting, dry etching or grinding method It removes, to form pixel mutually disjunct flexible matrix screen.
As shown in Figure 2,1. label indicates the step of laser cutting method removes extra display material area, is cut by laser work If skill control is bad, it is easy that flexible substrate 1 is caused to damage.2. label indicates to use dry etching by extra display material area The step of removal, the step are realized by the following method: first in effective display material area 7 and extra display material area 8 Upper surface prepares layer protecting film 9, to avoid the destruction during dry etching to effective display material area 8, then using all If the dry etch process of ion beam removes the extra display material area 8 on divider wall, that is, forms pixel and be mutually not attached to High-resolution flexible matrix screen,
3. label is indicated is removed extra display material area using grinding method, uses following steps to realize: first with Abrasive sheet grinds the upper surface of the intermediary device obtained in step e), and grinding thickness is extra on divider wall only to remove Display material area 8, without to effective display material area 7 destroy subject to, that is, foring pixel, mutually disjunct high-resolution is soft Property matrix panel.

Claims (3)

1. a kind of manufacture craft of high resolution matrix screen, which is characterized in that realized by following steps:
1) chooses substrate, chooses suitable flexible substrate (1), then that the surface clean of flexible substrate is clean and dry up;
2) coats display material, display material is coated on the surface of flexible substrate, to form display material layer flexible (2);
3) is cut by laser, and display material layer is cut into the pixel (3) according to matrix arrangement using laser cutting parameter, with Form high-resolution flexible matrix screen.
2. a kind of manufacture craft of high resolution matrix screen, which is characterized in that realized by following steps:
A) chooses substrate, chooses suitable flexible substrate (1), then that the surface clean of flexible substrate is clean and dry up;
B) resist coating coats a layer photoresist on the surface of flexible substrate setting display material, is formed photoresist layer (4);
C) exposure-processed carries out the photoresist layer in flexible substrate according to the pixel size of the flexible matrix of being made screen Exposure-processed;
Photoresist layer after exposure is carried out development treatment and is not gone with removing the exposure position of photoresist layer by d) development treatment The photoresist layer fallen forms divider wall (6), and the fill area (5) for accommodating display material is formed between divider wall;
E) prepares display layer, display material layer is prepared in the flexible substrate that step d) is obtained, display material layer is by being located at filling Effective display material area (7) in area and extra display material area (8) composition on divider wall;
F) removes extra display material area, is gone to extra display material area using laser cutting, dry etching or grinding method It removes, to form pixel mutually disjunct flexible matrix screen.
3. the manufacture craft of high resolution matrix screen according to claim 2, it is characterised in that: done described in step f) Method is etching through following steps to realize: preparing a floor in the upper surface in effective display material area and extra display material area first Then protective film (9) uses the dry method of such as ion beam to avoid the destruction during dry etching to effective display material area Etching technics removes the extra display material area on divider wall, that is, forms pixel mutually disjunct high-resolution flexibility square Battle array screen;
Grinding method described in step f) are as follows: first with abrasive sheet to the upper surface of the intermediary device obtained in step e) into Row grinding, grinding thickness be subject to the extra display material area only removed on divider wall, without to effective display material area destroy, Form pixel mutually disjunct high-resolution flexible matrix screen.
CN201810995430.XA 2018-08-29 2018-08-29 A kind of manufacture craft of high resolution matrix screen Pending CN109148364A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810995430.XA CN109148364A (en) 2018-08-29 2018-08-29 A kind of manufacture craft of high resolution matrix screen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810995430.XA CN109148364A (en) 2018-08-29 2018-08-29 A kind of manufacture craft of high resolution matrix screen

Publications (1)

Publication Number Publication Date
CN109148364A true CN109148364A (en) 2019-01-04

Family

ID=64829059

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810995430.XA Pending CN109148364A (en) 2018-08-29 2018-08-29 A kind of manufacture craft of high resolution matrix screen

Country Status (1)

Country Link
CN (1) CN109148364A (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101393891A (en) * 2008-10-10 2009-03-25 中国科学院微电子研究所 Fabrication method for surface silver electrode of silicon based organic light emitting micro display device
CN102169959A (en) * 2010-01-11 2011-08-31 三星移动显示器株式会社 Method of manufacturing high resolution organic thin film pattern
CN103000817A (en) * 2012-11-29 2013-03-27 无锡格菲电子薄膜科技有限公司 Flexible organic light emitting diode
CN104752365A (en) * 2013-12-27 2015-07-01 昆山国显光电有限公司 Flexible display and manufacturing method thereof
CN107240599A (en) * 2017-06-23 2017-10-10 京东方科技集团股份有限公司 Display device, OLED display panel and its manufacture method
CN107732031A (en) * 2017-09-29 2018-02-23 京东方科技集团股份有限公司 The preparation method and organic electroluminescence display panel of organic electroluminescence display panel
CN108258135A (en) * 2016-12-29 2018-07-06 乐金显示有限公司 Use the lighting apparatus and its manufacturing method of organic luminescent device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101393891A (en) * 2008-10-10 2009-03-25 中国科学院微电子研究所 Fabrication method for surface silver electrode of silicon based organic light emitting micro display device
CN102169959A (en) * 2010-01-11 2011-08-31 三星移动显示器株式会社 Method of manufacturing high resolution organic thin film pattern
CN103000817A (en) * 2012-11-29 2013-03-27 无锡格菲电子薄膜科技有限公司 Flexible organic light emitting diode
CN104752365A (en) * 2013-12-27 2015-07-01 昆山国显光电有限公司 Flexible display and manufacturing method thereof
CN108258135A (en) * 2016-12-29 2018-07-06 乐金显示有限公司 Use the lighting apparatus and its manufacturing method of organic luminescent device
CN107240599A (en) * 2017-06-23 2017-10-10 京东方科技集团股份有限公司 Display device, OLED display panel and its manufacture method
CN107732031A (en) * 2017-09-29 2018-02-23 京东方科技集团股份有限公司 The preparation method and organic electroluminescence display panel of organic electroluminescence display panel

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
中国感光学会: "《2016-2017 感光影像学学科发展报告》", 31 March 2018 *
于军胜主编;蒋泉,张磊副主编: "《显示器件技术 第2版》", 31 August 2014 *

Similar Documents

Publication Publication Date Title
Yamamoto et al. Development of Ga-doped ZnO transparent electrodes for liquid crystal display panels
CN104062842B (en) A kind of mask plate and its manufacturing method, process unit
CN103592815B (en) A kind of mask plate, substrate and display unit
CN108400150A (en) Array substrate and preparation method thereof, display panel and display device
CN105161514A (en) Organic light emitting diode (OLED) display panel, preparation method thereof and display device
CN110673239A (en) Naked eye 3D mobile phone backboard film, preparation method thereof and mobile phone
CN104950527A (en) Display substrate, manufacturing method thereof, display panel and display device
CN105590957A (en) Organic light-emitting display device based on ink-jet printing technology and manufacturing method thereof
CN106775039A (en) A kind of In-cell touch panel, its preparation method and display device
KR20150105187A (en) Gravure offset printing method, gravure offset printing device, and gravure plate
CN103646852A (en) Manufacturing method of substrate
CN109713019A (en) OLED display panel and preparation method thereof
CN106909258A (en) A kind of structure of touch screen function piece lead and preparation method thereof
CN107658327A (en) Dot structure, display panel and display device
CN103698932A (en) Display panel mother board and manufacturing method thereof
CN108281467A (en) Pixel defining layer, display base plate and preparation method thereof, display device
CN107145038A (en) A kind of figure carving and writing method based on large area super-resolution laser direct writing system
CN103760749A (en) Manufacturing method of film patterns and display substrate
CN109148364A (en) A kind of manufacture craft of high resolution matrix screen
CN105182580A (en) Liquid crystal display (LCD) panel, manufacturing method thereof, and LCD panel mother board
CN107369777A (en) A kind of oled substrate and preparation method thereof, display device
CN104882450A (en) Array substrate, manufacturing method thereof, and display device
KR20080024311A (en) Front filter of plasma display panel and method for manufacturing plasma diplay panel including the same
CN107546246A (en) Flexible OLED display part and preparation method
CN100552858C (en) A kind of restorative procedure of plasma display screen transparent electrode

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20190104