CN109133663A - The preparation method and photovoltaic module of anti-reflective glass - Google Patents
The preparation method and photovoltaic module of anti-reflective glass Download PDFInfo
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- CN109133663A CN109133663A CN201710454565.0A CN201710454565A CN109133663A CN 109133663 A CN109133663 A CN 109133663A CN 201710454565 A CN201710454565 A CN 201710454565A CN 109133663 A CN109133663 A CN 109133663A
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- reflective glass
- glass
- silica
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- 239000011521 glass Substances 0.000 title claims abstract description 84
- 230000003667 anti-reflective effect Effects 0.000 title claims abstract description 53
- 238000002360 preparation method Methods 0.000 title claims abstract description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 101
- 238000000576 coating method Methods 0.000 claims abstract description 50
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 48
- 239000011248 coating agent Substances 0.000 claims abstract description 46
- 239000002131 composite material Substances 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 17
- 239000010703 silicon Substances 0.000 claims abstract description 17
- 239000000017 hydrogel Substances 0.000 claims abstract description 16
- 239000002344 surface layer Substances 0.000 claims abstract description 14
- 238000007711 solidification Methods 0.000 claims abstract description 12
- 239000000499 gel Substances 0.000 claims abstract description 11
- 238000005245 sintering Methods 0.000 claims abstract description 11
- 230000008023 solidification Effects 0.000 claims abstract description 11
- 238000005496 tempering Methods 0.000 claims abstract description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 18
- 239000010410 layer Substances 0.000 claims description 17
- 239000004814 polyurethane Substances 0.000 claims description 14
- 229920002635 polyurethane Polymers 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 10
- 239000002243 precursor Substances 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 5
- 239000004094 surface-active agent Substances 0.000 claims description 5
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- -1 cell piece Substances 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- 238000007761 roller coating Methods 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 abstract description 4
- 239000000463 material Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 241000790917 Dioxys <bee> Species 0.000 description 2
- 229910003978 SiClx Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 238000013082 photovoltaic technology Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000002987 primer (paints) Substances 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/012—Tempering or quenching glass products by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/049—Protective back sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/118—Deposition methods from solutions or suspensions by roller-coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
The present invention provides a kind of preparation methods of anti-reflective glass, comprising the following steps: S1, using sol method-gel method prepares the first dioxide composite Silica hydrogel and the second dioxide composite Silica hydrogel；The preparation of S2, low refractive index silica solution and high refractive index silicon dioxde solution；The anti-coating pole solidification for subtracting coating of S3, bottom；S4, the anti-coating for subtracting coating in surface layer, solidify and the tempering of anti-reflective glass sintering.The anti-reflective glass of the preparation method preparation of anti-reflective glass of the invention can effectively prevent incident light that reflection and refraction occurs in glass surface, promote the light transmission rate of glass；Simultaneously using anti-reflective glass made from preparation method of the invention, it can be widely used in photovoltaic art and the photovoltaic module with high photovoltaic power be made.
Description
Technical field
The present invention relates to a kind of preparation method of anti-reflective glass more particularly to a kind of photovoltaic module and apply in the light
Lie prostrate the preparation method of the anti-reflective glass in component.
Background technique
With the fast development of photovoltaic technology, photovoltaic cell obtains more next as a kind of new energy materials of cleanliness without any pollution
More concerns.
Currently, with the continuous intensification and the extensive use of photovoltaic module of photovoltaic technology research, photovoltaic module uses visitor
Family is higher and higher to the power requirement of photovoltaic module.On the one hand high-power photovoltaic module can effectively improve photovoltaic module array
Whole service efficiency；On the other hand, the non-component such as header box, inverter can be effectively reduced in the application of high-power photovoltaic module
BOS cost.
From the production technology of existing photovoltaic module, determine that the power height of photovoltaic module is relied primarily on excellent
The cell piece of performance, is limited by the influence of existing cell piece production material and production technology, and the performance of existing cell piece has reached
The high level of industry, therefore the power for wanting to be promoted photovoltaic module cannot be only from the property for promoting the cell piece in photovoltaic module
It can set about, with greater need for the whole photovoltaic power for improving existing photovoltaic module from other angles.
It is existing studies have shown that it is high performance encapsulation or assembled material to promoted photovoltaic module power also have positive effect
Fruit, when the surface encapsulation layer of photovoltaic module transmitance with higher, the solar radiation for being radiated at photovoltaic module surface is more held
It is easily absorbed by cell piece, to be further converted to electric energy.However existing photovoltaic module is in actual use, due to surface
Encapsulated layer, that is, glass plate is easy anti-raw reflection and refraction in use, causes the power of existing photovoltaic module that reason is not achieved
By level, limits the use scope of photovoltaic module and use power.
In view of this, it is necessory to be improved to existing photovoltaic module and anti-reflective glass preparation method, to solve
The above problem.
Summary of the invention
The purpose of the present invention is to provide a kind of preparation method of anti-reflective glass, the antireflection as made from the preparation method
Glass can effectively prevent incident light that reflection and refraction occurs in glass surface, promote the light transmission rate of anti-reflective glass；Make simultaneously
The anti-reflective glass made from preparation method of the invention can be widely used in photovoltaic art and be made with high photovoltaic power
Photovoltaic module.
For achieving the above object, the present invention provides a kind of preparation methods of anti-reflective glass, comprising the following steps:
S1, surfactant is added, is made using teos solution as composite precursor using sol method-gel method
It obtains the hydrolysis in composite precursor and is distributed silica out, form the colloidal sol containing silica, silica in the colloidal sol
Mass percentage content be 1.0%-5.0%, the particle size range of the silica is between 10nm-100nm, to described molten
Polyurethane is added in glue, wherein the polyurethane using partial size for 25nm-45nm is used as condensate center, the first compound dioxy of preparation
SiClx gel, using partial size for 10nm-25nm polyurethane as condensate center, prepare the second dioxide composite Silica hydrogel；
S2, isopropanol solvent is provided, the first dioxide composite Silica hydrogel, the second composite silicon dioxide described in S1 is coagulated
Glue is mixed respectively with the isopropanol solvent, is respectively formed low-refraction two of the solid content between 2.0%-8.0%
Silica solution and high refractive index silicon dioxde solution；
S3, glass is provided, low refractive index silica solution manufactured in S2 is coated on the glass, is solidified,
The bottom for obtaining low-refraction counter subtracts coating；
S4, subtract on coating the bottom is counter, high refractive index silicon dioxde solution manufactured in S2 is coated in the bottom
Counter subtract is solidified on coating, and after solidification carry out tempering sintering, obtain high refractive index surface layer it is counter subtract coating, thus
The anti-reflective glass is made.
As a further improvement of the present invention, the time range mixed in the step S2 is respectively 3-5 hours.
As a further improvement of the present invention, in the step S1 and S2, ambient humidity control is 50 ± 10%.
As a further improvement of the present invention, in the step S1 and S2, environment temperature control is 25 ± 5 degree.
As a further improvement of the present invention, using rolling method that the low refractive index silica is molten in the step S3
Liquid is coated on the glass top surface, forms that the bottom is counter to subtract coating, and the anti-thickness range for subtracting coating of the bottom is 50-
120nm。
As a further improvement of the present invention, the anti-thickness range for subtracting coating in the surface layer formed in the step S4 is
50-120nm。
As a further improvement of the present invention, in the step S3 and S4, the solidification temperature of solidification process is 200 ± 50
Degree, curing time are 50 ± 20s.
As a further improvement of the present invention, the tempering sintering temperature of anti-reflective glass is 700 ± 100 in the step S4
Degree.
As a further improvement of the present invention, in the step S4 anti-reflective glass tempering sintering time be 150 ±
50s。
For achieving the above object, the present invention also provides a kind of photovoltaic modulies, including what is from top to bottom successively arranged
Anti-reflective glass, EVA layer, cell piece, EVA layer and backsheet layer, wherein system of the anti-reflective glass through aforementioned anti-reflective glass
Preparation Method is prepared.
The beneficial effects of the present invention are: the preparation method of anti-reflective glass of the invention is by subtracting coating and table to bottom is counter
Low-refraction and high refractive index coating solution is made in the anti-control for subtracting coating making material of layer respectively, reuses double plating works
Skill processes glass, i.e., first carried out on glass low-refraction bottom it is counter subtract curing of coatings, then at the bottom of low-refraction
The anti-surface layer for subtracting progress high refractive index on coating of layer is counter to subtract curing of coatings, so that it is guaranteed that the glass after double platings is with good
Light transmission.When being applied on photovoltaic module using anti-reflective glass made of preparation method of the present invention, it is able to ascend photovoltaic
The photovoltaic power of component.
Detailed description of the invention
Fig. 1 is the flow diagram of the preparation method of anti-reflective glass of the present invention.
Fig. 2 is the structural schematic diagram of photovoltaic module of the present invention.
Specific embodiment
To make the objectives, technical solutions, and advantages of the present invention clearer, right in the following with reference to the drawings and specific embodiments
The present invention is described in detail.Refering to Figure 1, the flow chart of the preparation method for anti-reflective glass of the present invention.The anti-reflective
Penetrate the preparation method of glass, comprising the following steps:
S1, surfactant is added, is made using teos solution as composite precursor using sol method-gel method
It obtains the hydrolysis in composite precursor and is distributed silica out, form the colloidal sol containing silica, silica in the colloidal sol
Mass percentage content be 1.0%-5.0%, the particle size range of the silica is between 10nm-100nm, to described molten
Polyurethane is added in glue, wherein the polyurethane using partial size for 25nm-45nm is used as condensate center, the first compound dioxy of preparation
SiClx gel, using partial size for 10nm-25nm polyurethane as condensate center, prepare the second dioxide composite Silica hydrogel；
S2, isopropanol solvent is provided, the first dioxide composite Silica hydrogel, the second composite silicon dioxide described in S1 is coagulated
Glue is mixed respectively with the isopropanol solvent, is respectively formed low-refraction two of the solid content between 2.0%-8.0%
Silica solution and high refractive index silicon dioxde solution；
S3, glass is provided, low refractive index silica solution manufactured in S2 is coated on the glass, is solidified,
The bottom for obtaining low-refraction counter subtracts coating；
S4, subtract on coating the bottom is counter, high refractive index silicon dioxde solution manufactured in S2 is coated in the bottom
Counter subtract is solidified on coating, and after solidification carry out tempering sintering, obtain high refractive index surface layer it is counter subtract coating, thus
The anti-reflective glass is made.
Following description part will illustrate step S1-S4.
In the step S1, using ethyl orthosilicate as composite precursor, a certain amount of surfactant is added thereto,
And sol-gel method is used to produce silicon dioxide gel of the mass percent for 1.0-5.0%, partial size between 10-100nm,
It reply colloidal sol should constantly be stirred in the process, to guarantee that the silica of hydrolysis is evenly distributed in colloidal sol；To
Polyurethane is added in the colloidal sol, since the silicon dioxide granule in colloidal sol has negative electrical charge, therefore two described in whipping process
Silicon oxide particle is adsorbed on formation composite sphere structure around polyurethane, to be made using polyurethane as compound the two of condensate center
Silica gel；Further, described multiple when the polyurethane diameter range added in the colloidal sol is between 25nm-45nm
Conjunction silica dioxide gel is the first dioxide composite Silica hydrogel；It is described when the polyurethane diameter range of addition is 10nm-25nm
Dioxide composite Silica hydrogel is the second dioxide composite Silica hydrogel.
In fact, in the sol-gel process, the concrete type of the surfactant can be selected according to the actual situation
It selects, is not limited in this.
Using blending technology by S1 the first dioxide composite Silica hydrogel, the second dioxide composite Silica hydrogel respectively with it is different
Propanol solvent is mixed, and blend solution of the solid content between 2.0%-8.0% is formed.Specifically, when described first is multiple
When conjunction silica dioxide gel is mixed with isopropanol solvent, low refractive index silica solution is made；When described second compound
When silica dioxide gel is mixed with isopropanol solvent, high refractive index silicon dioxde solution is made.
Further, in step S2 the first dioxide composite Silica hydrogel, the second dioxide composite Silica hydrogel respectively with isopropyl
When alcoholic solvent is mixed, should control incorporation time is respectively 3-5 hours.In addition, low refraction prepared in the step S2
Rate silicon dioxde solution and high refractive index silicon dioxde solution are required within 48h using finishing, prevent isopropanol volatilize and
Cause solid content to change, and then influences the performance of refractive index silica solution and high refractive index silicon dioxde solution.
Further, in the step S1 and S2, need to control ambient humidity is 50 ± 10%, and temperature is 25 ± 5 degree, with
Ensure the preparation quality of low refractive index silica solution and high refractive index silicon dioxde solution, while guaranteeing the low refraction of preparation
Rate silicon dioxde solution and high refractive index silicon dioxde solution have good light transmission rate and ductility.
The step S3 specifically: the low refractive index silica solution in S2 is uniformly coated on by glass using rolling method
In glass plate and solidified, is formed and have the anti-anti-reflective glass matrix for subtracting coating of bottom, in the process, the bottom is counter to be subtracted
The solidification temperature of coating be 200 ± 50 degree, curing time be 50 ± 20s, and formation the bottom it is counter subtract coating with a thickness of
50-120nm。
It in the step S3, should be using dustless, oil-free and smooth dry tack free glass plate as primer coating solution
The substrate of coating, there are gaps to prevent between low refractive index silica solution and glass plate, so that the anti-coating that subtracts of bottom exists
Occur protrusion or rupture in solidification process.Certainly, in the coating process of low refractive index silica solution, it can also be selected
His method, specific coating method can be selected according to the actual needs of user.
The step S4 is specifically, be uniformly coated on institute for the high refractive index silicon dioxde solution in S2 using rolling method
It states that bottom is counter to be subtracted on coating, and the anti-reflective glass matrix after coating high refractive index silicon dioxde solution is solidified again,
To form that surface layer with a thickness of 50-120nm is counter to subtract coating in the anti-coating that subtracts of the bottom, meanwhile, control that the surface layer is counter to subtract painting
Solidification temperature in layer solidification process is 200 ± 50 degree, and curing time is 50 ± 20s.
In the step S4, the tempering sintering temperature of the anti-reflective glass is 700 ± 100 degree, and tempering sintering time is
150 ± 50s, so set, on the one hand can guarantee that surface layer is counter subtracts coating and the anti-coating that subtracts of the bottom is combined closely and consolidated
It is attached to the surface of glass plate, prevents falling off for surface coating and primer coating；On the other hand, it is ensured that the antireflection glass of preparation
Glass uses rigidity and intensity with good.
It please refers to shown in Fig. 2, is a kind of photovoltaic module 100 provided by the invention.The photovoltaic module 100 include by up to
Under anti-reflective glass 1, EVA layer 2, cell piece 3, EVA layer 2 and the backsheet layer 4 successively arranged.
Specifically, the anti-reflective glass 1 is prepared by the preparation method of anti-reflective glass of the invention, by up to
Under successively to include that surface layer is counter subtract that coating 11, bottom are counter to subtract coating 12 and glass plate 13, the setting of the anti-reflective glass can be protected
The photovoltaic module 100 is demonstrate,proved with good anti-reflective and photopermeability.
The backsheet layer 4 can select glassy layer or component backboard according to the concrete form of photovoltaic module 100, specifically can root
It is selected according to actual needs, is not limited in this.
In conclusion the preparation method of anti-reflective glass of the invention, by subtracting coating and bottom is counter subtracts painting to surface layer is counter
Layer prepare material and preparation process selects, on the one hand, can guarantee that anti-reflective glass has and good photopermeability and prolong
Malleability；Meanwhile the bottom is counter to subtract coating and glass plate, the anti-solidification for subtracting coating Yu anti-reflective glass matrix in surface layer by controlling
Parameter guarantees that surface layer is counter and subtracts coating and the anti-surface for being attached to glass plate that subtracts coating and can consolidate of bottom, and cracky does not fall off；And
The setting of tempering sintering parameter further ensures the rigidity and intensity of finished product anti-reflective glass, prevents anti-reflective glass from making
It is damaged with occurring in the process.
Meanwhile photovoltaic module 100 of the invention, resisted as made from selecting the preparation method of the aforementioned anti-reflective glass of application
Reflecting glass 1 can effectively reduce incident light in the reflection and refraction on 100 surface of photovoltaic module (i.e. anti-reflective glass 1), effectively mention
The high photopermeability of photovoltaic module 100, further improves the photovoltaic power of photovoltaic module 100.
The above examples are only used to illustrate the technical scheme of the present invention and are not limiting, although referring to preferred embodiment to this hair
It is bright to be described in detail, those skilled in the art should understand that, it can modify to technical solution of the present invention
Or equivalent replacement, without departing from the spirit and scope of the technical solution of the present invention.
Claims (10)
1. a kind of preparation method of anti-reflective glass, comprising the following steps:
S1, surfactant is added using teos solution as composite precursor using sol method-gel method, so that
Hydrolysis is distributed silica out in composite precursor, forms the colloidal sol containing silica, the matter of silica in the colloidal sol
Amount degree is 1.0%-5.0%, and the particle size range of the silica is between 10nm-100nm, into the colloidal sol
Add polyurethane, wherein using partial size for 25nm-45nm polyurethane be used as condensate center, preparation the first composite silicon dioxide
Gel, using partial size for 10nm-25nm polyurethane as condensate center, prepare the second dioxide composite Silica hydrogel；
S2, provide isopropanol solvent, by the first dioxide composite Silica hydrogel described in S1, the second dioxide composite Silica hydrogel with
The isopropanol solvent is mixed respectively, is respectively formed low-refraction titanium dioxide of the solid content between 2.0%-8.0%
Silicon solution and high refractive index silicon dioxde solution；
S3, glass is provided, low refractive index silica solution manufactured in S2 is coated on the glass, is solidified, is obtained
The bottom of low-refraction is counter to subtract coating；
S4, subtract on coating the bottom is counter, high refractive index silicon dioxde solution manufactured in S2 is coated in the bottom is counter to be subtracted
Solidified on coating, and after solidification carry out tempering sintering, obtain high refractive index surface layer it is counter subtract coating, to be made
The anti-reflective glass.
2. the preparation method of anti-reflective glass according to claim 1, it is characterised in that: mixed in the step S2
The time range of conjunction is respectively 3-5 hours.
3. the preparation method of anti-reflective glass according to claim 1, it is characterised in that: in the step S1 and S2,
Ambient humidity control is 50 ± 10%.
4. the preparation method of anti-reflective glass according to claim 1, it is characterised in that: in the step S1 and S2,
Environment temperature control is 25 ± 5 degree.
5. the preparation method of anti-reflective glass according to claim 1, it is characterised in that: use roller coating in the step S3
The low refractive index silica solution coating on the glass top surface, is formed that the bottom is counter to subtract coating by method, described
The anti-thickness range for subtracting coating of bottom is 50-120nm.
6. the preparation method of anti-reflective glass according to claim 1, it is characterised in that: the institute formed in the step S4
Stating the anti-thickness range for subtracting coating in surface layer is 50-120nm.
7. the preparation method of anti-reflective glass according to claim 1, it is characterised in that: in the step S3 and S4, Gu
The solidification temperature of change process is 200 ± 50 degree, and curing time is 50 ± 20s.
8. the preparation method of anti-reflective glass according to claim 1, it is characterised in that: antireflection glass in the step S4
The tempering sintering temperature of glass is 700 ± 100 degree.
9. the preparation method of anti-reflective glass according to claim 1, it is characterised in that: antireflection glass in the step S4
The tempering sintering time of glass is 150 ± 50s.
10. a kind of photovoltaic module, including anti-reflective glass, EVA layer, cell piece, EVA layer and the backboard from top to bottom successively arranged
Layer, it is characterised in that: the anti-reflective glass is prepared through the preparation method of the described in any item anti-reflective glass of claim 1-9
It forms.
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