CN109132996A - A kind of fast deposition process for the Magnetic Nanowire Arrays that the period is orderly - Google Patents
A kind of fast deposition process for the Magnetic Nanowire Arrays that the period is orderly Download PDFInfo
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- CN109132996A CN109132996A CN201811187585.7A CN201811187585A CN109132996A CN 109132996 A CN109132996 A CN 109132996A CN 201811187585 A CN201811187585 A CN 201811187585A CN 109132996 A CN109132996 A CN 109132996A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/04—Networks or arrays of similar microstructural devices
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Abstract
The present invention relates to a kind of fast deposition process of Magnetic Nanowire Arrays that the period is orderly, which is to be induced using Halbach array magnet in substrate surface fast deposition magnetic nanometer oldered array.The preparation method includes dispersing magnetic nanometer in a solvent, it is tightly attached to Halbach array magnet magnetism face in the face of substrate, a certain amount of magnetic nanometer solution is in contact with substrate another side, in substrate surface fast deposition and align Magnetic Nanowire Arrays, recycling design, substrate of the preparation surface with periodical Magnetic Nanowire Arrays and etc..The present invention, so that magnetic nanometer is separated and is aligned with solvent using the high-intensity magnetic field attraction of Halbach array, realizes the quick assembling of magnetic nanometer array and the recycling of solvent, it reduces environmental pollution, promotes the development of opto-electronic device and information engineering.
Description
Technical field
The present invention relates to a kind of fast deposition process of Magnetic Nanowire Arrays that the period is orderly, belong to opto-electronic device or
Information engineering field.
Background technique
Nanometer line ordered array is potentially answered since the structure of its optimization has in fields such as magnetics, sensing, transparent electrodes
With value.The acquisition of traditional ordered nano linear array mainly has the magnetic field between the technologies such as nano impression, self assembly, traditional two magnetic poles
Induction.
Nano impression, which mainly passes through lay photoetching mask plate and prepares nanoarray templates, needs complicated photoetching technique, size by
Limit.Self-assembling method mainly generates ordered arrangement by solvent action, and multi-party bit array arrangement is difficult to.Traditional magnetic field lures
Inducing defecation by enema and suppository is to generate uniform magnetic field between two magnetic poles by high electromagnetic field or alnico magnets, can control magnetic nanometer
Ordered arrangement, but the equipment is expensive, need solvent flashing solvent process period long period long and solvent largely volatilizees appearance
It is also easy to produce environmental pollution, the wasting of resources.Not using the orderly Magnetic Nanowire Arrays of the quick assembling cycle of Halbach array magnet
It appears in the newspapers.
Summary of the invention
It asks present invention aim to address the tradition assembling Magnetic Nanowire Arrays period is long, solvent can not recycle etc.
Topic, provides that environmental-friendly, orientation is controllable, fast deposition magnetic nanometer oldered array method.
It is provided by the invention to induce magnetic nanowire deposition in substrate surface using Halbach array magnet, utilize magnetism
Attraction realizes magnetic nanometer and solvent quick separating, obtains period orderly Magnetic Nanowire Arrays in substrate surface.
Technical scheme is as follows:
It is 0.01-10mg/ml that concentration will be configured to containing magnetic nanometer dispersion liquid.Using oscillator or blender or surpass
Sound instrument mixing 2min, forms the dispersion liquid of stable and uniform；
Substrate material is close to the surface in Halbach array magnet magnetism face；
The exposure of substrate is contacted with the dispersion liquid containing magnetic nanometer, due to the sucking action in magnetic field, magnetism is received
Nanowire arrays fast deposition in substrate surface, by surface there is the substrate of orderly Magnetic Nanowire Arrays to separate with solvent, be placed on
After drying up under infra-red drying lamp or in the air of flowing, surface is had to the substrate and Halbach of orderly Magnetic Nanowire Arrays
Array magnet separates, and obtains the substrate that surface has periodic magnetic nanometer oldered array.
The magnetic nanometer mainly includes nickel base nanometer line, cobalt-based nano wire, iron-based nano wire.Nickel base nanometer line master
It to include nickel nano wire, ni au category or oxide composite nano-line, wherein metal includes one of cobalt, iron, copper, silver, gold,
Wherein oxide includes one of titanium dioxide, tin indium oxide, tin oxide, zinc oxide or a variety of.Cobalt-based nano wire mainly wraps
Cobalt nanowire, cobalt/metal or oxide composite nano-line are included, wherein metal includes one of nickel, iron, copper, silver, gold, wherein
Oxide includes one of titanium dioxide, tin indium oxide, tin oxide, zinc oxide or a variety of.Iron-based nano wire mainly includes iron
Rice noodles, iron/metal or oxide composite nano-line, wherein metal includes one of nickel, cobalt, copper, silver, gold, wherein oxide
Including one of titanium dioxide, tin indium oxide, tin oxide, zinc oxide or a variety of.
The substrate is nonmagnetic substrate, and the substrates such as main glass, quartz, silicon wafer including hard and resistance to deflection have
Machine plastic substrate such as PET, the flexible substrates such as polyimides.
There are many Halbach array magnet periodic structure arrangement modes, mainly includes linear array, circle ring array
Deng preferred linear array.
The exposure of the substrate and the dispersion liquid way of contact containing magnetic nanometer, including dispersion liquid are placed on substrate
Side, substrate are placed in above dispersion liquid.
The mode that there is the substrate of orderly Magnetic Nanowire Arrays to separate with solvent on the surface mainly includes above substrate
Solvent, recycled by toppling over or detaching mode, the solvent below substrate by detach solvent or lifting substrate recycling design.
Compared with traditional method, have that unit area nano wire line density is controllable, deposition velocity is fast, the spies such as environmental-friendly
Sign.This method can be applied to prepare magnetic memory device, senser element, transparent conductive film etc..
Detailed description of the invention
Fig. 1 is the embodiment of the present invention 4 in linear array type halbach magnets surface deposition cycle magnetic Nano linear array
The schematic diagram of column；
Fig. 2 is micro- under 100 multiplying powers for the mono-oriented nickel nano-wire array that the embodiment of the present invention 4 prepares different coverage rates
Photo, (a) coverage rate 10%, (b) coverage rate 30%；
Fig. 3 is that the embodiment of the present invention 5 prepares micro- photograph of the nano thread ordered grid of nickel of longitudinal stack under 100 multiplying powers
Piece, (a) coverage rate are 10% mono-oriented magnetic nickel nano longitudinal stack, and (b) coverage rate is hung down for 30% mono-oriented magnetic nickel nano
Straight superposition.
Specific embodiment
The technical solution of the design is described in detail below with reference to embodiment and experimental example, but protection scope is without being limited thereto.
Embodiment 1
1.2g sodium hydroxide is dissolved in 35ml ethylene glycol, stirring 2h obtains uniform solution；In the above solution plus
Enter 10ml hydrazine hydrate solution (mass content 80%), be uniformly mixed, is placed in above 0.2T Nd-Fe-B permanent magnet, in 60 DEG C of water
It is heated in bath.5ml 0.1M nickel chloride ethylene glycol solution is added dropwise using syringe, is taken out after reacting 10min, on solution
The nickel nano wire for the grey that side is floated.Nano wire is separated with solution, isopropanol washs 3 times, obtains being dispersed in isopropanol
In nickel nanowire dispersion, be used to prepare surface deposition nickel nano-wire array.
Embodiment 2
Nickel nano wire in embodiment 1 is dispersed in a certain amount of isopropanol, the nickel nano wire of different content is made
Dispersion liquid obtains evenly dispersed nickel nanowire dispersion using oscillator mixing 2min.PET substrate is close to Halbach
Magnet (magnetic pole pitch 0.5mm, suction 65g/cm2) magnetic face, in the fixed liquid with certain area in the surface of PET substrate
Slot.Nickel nanowire dispersion is poured into liquid bath, static 1min, solvent is detached into recycling using needle tubing, using natural wind dry method
A small amount of solvent of substrate surface volatilizees.Substrate is separated with halbach magnets, liquid bath after drying, obtains surface with mono-oriented
Periodical Magnetic Nanowire Arrays substrate.
By the content of nickel in regulation nickel nanowire dispersion, the magnetic nanometer array base of surface difference coverage rate is prepared
Piece.Table 1 gives the coverage rate of substrate surface magnetic nanometer and the relationship of nickel nano wire dosage.
The coverage rate of 1 substrate surface magnetic nanometer of table and the relationship of nickel nano wire dosage
As shown in Table 1, the Magnetic Nanowire Arrays of substrate surface are in the area coverage of substrate surface with nickel nano wire
The increase of dosage and increase, and the relationship that is in line, it can thus be concluded that the usage amount of nickel nanowire dispersion can Effective Regulation nanometer out
The coverage rate of linear array provides data for the application of different coverage rate nano-arrays.
Embodiment 3
The substrate for being 10% by the surface nickel nano wire coverage rate in embodiment 2 is dried for 24 hours at 80 DEG C.Surface is had
Single-orientated PET substrate, is rotated by 90 °, and is tightly attached to Haier's shell magnet surface again, repeats deposition in embodiment 2, molten
Agent recycling and baking step, obtaining surface has the vertically oriented nano thread ordered grid substrate of nickel.
Embodiment 4
Surface in embodiment 3 is had to the PET substrate of the nano thread ordered grid of nickel, is immersed in 0.1M dilute hydrochloric acid solution,
1min takes out, and immerses in deionized water and rinses, and 80 DEG C of drying obtain conductive transparent electrode.
Claims (7)
1. a kind of fast deposition process for the Magnetic Nanowire Arrays that the period is orderly, which is characterized in that the fast deposition process is
Using Halbach array magnet in the quick assembling cycle Magnetic Nanowire Arrays of substrate surface, nano wire and solvent are realized
Quick separating.
2. the method as described in claim 1, which is characterized in that the Halbach array form mainly include linear array,
Circle ring array, preferably linear array.
3. the method as described in claim 1, which is characterized in that the magnetic nanometer, predominantly nickel base nanometer line, cobalt-based are received
Rice noodles or iron-based nano wire, preferably nickel base nanometer line.
4. method as claimed in claim 3, which is characterized in that the nickel base nanometer line mainly includes nickel nano wire, ni au category
Or oxide composite nano-line, wherein metal includes one of cobalt, iron, copper, silver, gold, wherein oxide include titanium dioxide,
One of tin indium oxide, tin oxide, zinc oxide are a variety of；The cobalt-based nano wire mainly include cobalt nanowire, cobalt/metal or
Oxide composite nano-line, wherein metal includes one of nickel, iron, copper, silver, gold, and wherein oxide includes titanium dioxide, oxygen
Change one of indium tin, tin oxide, zinc oxide or a variety of；The iron-based nano wire mainly includes iron rice noodles, iron/metal or oxidation
Object composite nano-line, wherein metal includes one of nickel, cobalt, copper, silver, gold, and wherein oxide includes titanium dioxide, indium oxide
One of tin, tin oxide, zinc oxide are a variety of.
5. the method as described in claim 1-4 is any, which is characterized in that comprise the concrete steps that, magnetic nanometer has been dispersed in
In solvent, it is stirred the dispersion liquid to form stable and uniform；Halbach magnets surface is placed the substrate in again, then by substrate
It is contacted with the dispersion liquid of appropriate amount, finally there is the substrate of orderly Magnetic Nanowire Arrays to separate with solvent surface.
6. method as claimed in claim 5, which is characterized in that the specific steps of the dispersion liquid contact of the substrate appropriate amount
For nanowire dispersion is poured into substrate surface, dispersion liquid sprays to substrate surface, substrate immerses the dispersion liquid containing nano wire
In.
7. method as claimed in claim 6, which is characterized in that the surface have orderly Magnetic Nanowire Arrays substrate with
The concrete mode of solvent separation are as follows: the solvent above substrate is recycled by toppling over or detaching mode, and the solvent below substrate passes through
Detach solvent or lifting substrate recycling design.
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| CN201811187585.7A CN109132996B (en) | 2018-10-12 | 2018-10-12 | Rapid deposition method of magnetic nanowire array with ordered period |
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Citations (6)
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| CN101399167A (en) * | 2008-07-15 | 2009-04-01 | 北方工业大学 | Method for assembling silicon nano-wire |
| CN101549406A (en) * | 2009-04-03 | 2009-10-07 | 北京航空航天大学 | A method for controllable growth of uniform nano nickel chain array induced by magnetic field |
| CN101986418A (en) * | 2006-08-08 | 2011-03-16 | 韩国科学技术院 | Method for manufacturing a field emitter electrode using the array of nanowires |
| CN105947971A (en) * | 2016-05-26 | 2016-09-21 | 清华大学深圳研究生院 | Preparation method of ferromagnetic nanowire array |
| CN107078573A (en) * | 2014-10-16 | 2017-08-18 | 伦斯勒理工学院 | Use the orientation self assembly of the maglev electronic building brick of diamagnetism |
| US20180237293A1 (en) * | 2017-02-21 | 2018-08-23 | Stmicroelectronics S.R.L. | Probe card for a magnetically-actuable device and test system including the probe card |
-
2018
- 2018-10-12 CN CN201811187585.7A patent/CN109132996B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101986418A (en) * | 2006-08-08 | 2011-03-16 | 韩国科学技术院 | Method for manufacturing a field emitter electrode using the array of nanowires |
| CN101399167A (en) * | 2008-07-15 | 2009-04-01 | 北方工业大学 | Method for assembling silicon nano-wire |
| CN101549406A (en) * | 2009-04-03 | 2009-10-07 | 北京航空航天大学 | A method for controllable growth of uniform nano nickel chain array induced by magnetic field |
| CN107078573A (en) * | 2014-10-16 | 2017-08-18 | 伦斯勒理工学院 | Use the orientation self assembly of the maglev electronic building brick of diamagnetism |
| CN105947971A (en) * | 2016-05-26 | 2016-09-21 | 清华大学深圳研究生院 | Preparation method of ferromagnetic nanowire array |
| US20180237293A1 (en) * | 2017-02-21 | 2018-08-23 | Stmicroelectronics S.R.L. | Probe card for a magnetically-actuable device and test system including the probe card |
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