CN109099871B - Interference detection alignment method based on circular target - Google Patents
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- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
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- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
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Abstract
The invention discloses a method based on a circleThe interference detection alignment method of the target is characterized by comprising the following steps: (1) sticking a circular target on the surface of the optical reflector; (2) carrying out interference detection on the optical reflector, and recording the interference detection result as Maptest(ii) a (3) For MaptestThe area of the corresponding Target is calibrated and is marked as Targettest(ii) a (4) Moving the optical reflector to a processing machine tool, and respectively calibrating the position coordinates of the centers of all the targets as the focus of the cross line by using a measuring head of the processing machine tool to obtain Targetprocess(ii) a (5) Detecting result Map of interference of optical reflectortestCarrying out distortion correction and alignment to obtain a result Mapcorrect(ii) a (6) Calculating pair Map based on interpolationcorrectFilling data in the area corresponding to the target to obtain Mapinterp. Compared with the prior art, the invention can effectively solve the problems of detection result and subsequent processing alignment in the manufacturing process of the reflector by improving the overall alignment flow setting of the alignment method.
Description
Technical Field
The invention belongs to the technical field of optical alignment, and particularly relates to an interference detection alignment method based on a circular target, which can align an interference detection result of an optical reflector to a coordinate system of a processing machine tool so as to finish further polishing processing of the optical reflector and is finished based on the circular target.
Background
Large-aperture optical reflectors are increasingly used in optical systems, such as large foundation telescopes, astronomical telescopes, etc.; in the current TMT (Thirty meter telescope, Thirty meters in the united states), the system primary mirror reaches the order of 30m, and is composed of 82 optical mirrors with the order of 2m, and in the machining and manufacturing of each mirror, the interference detection result of the mirror needs to be converted into the coordinate system of a machining tool, so that the mirror is further machined until the machining result of the mirror surface meets the design requirement. The size of the single optical reflector reaches 8.4m in foreign countries, and the size of the single optical reflector reaches 4m magnitude in China at present. In the process of the reflector, the conversion of the interference detection result of the reflector to the machine tool machining coordinate system is one of the core steps of the final convergence of the shape of the reflector, and has important significance for the manufacture of the reflector.
Disclosure of Invention
Aiming at the defects or improvement requirements of the prior art, the invention aims to provide an interference detection alignment method based on a circular target, wherein the alignment flow setting of the whole alignment method is improved, and compared with the prior art, the problem of alignment between the detection result and subsequent processing in the manufacturing process of a reflector can be effectively solved; in addition, the invention can effectively ensure the accuracy of alignment conversion by controlling the number of targets and the arrangement mode of the targets.
In order to achieve the above object, according to the present invention, there is provided an interference detection alignment method based on a circular target, comprising the steps of:
(1) the method comprises the following steps that circular targets are pasted on the surface of an optical reflector, the centers of the circular targets are cross lines, the pasting number of the targets is not less than 3, and the centers of the projections of the targets on a plane perpendicular to the optical axis of the optical reflector are not on the same straight line;
(2) performing interference detection on the optical reflector, and recording the interference detection result as Maptest；
(3) For Map obtained in the step (2)testThe areas corresponding to the targets are calibrated, the edge positions of the areas corresponding to the targets are determined, and then for any one of the circular targets, the interference detection result Map is obtainedtestRespectively marking the maximum pixel value X in the horizontal X direction of the pixel corresponding to the circular targetmaxAnd the minimum pixel value xminMaximum pixel value Y in the vertical Y-direction of the pixelmaxAnd the minimum pixel value yminObtaining the central point pixel coordinate (x) corresponding to the circular target centermax+xmin)/2,(ymax+ymin) 2); calibrating all circular targets one by one to obtain position calibration results corresponding to the centers of all circular targets in an interferometer CCD coordinate system, and recording the calibration results as Targettest；
(4) Moving the optical reflector to a processing machine tool, respectively calibrating the center of each Target as the position coordinate of the cross line focus by using a measuring head of the processing machine tool to obtain the position coordinate result corresponding to the centers of all the circular targets in the coordinate system of the processing machine tool, and recording the result as Targetprocess；
(5) Utilizing the Target obtained in the step (3)testAnd the Target obtained in the step (4)processFor the result Map of the interference detection of the optical mirrortestPerforming distortion correction and alignment, and recording the result of the distortion correction and alignment as Mapcorrect；
(6) Based on interpolation calculation, the result Map after the distortion correction and alignment obtained in the step (5) is obtainedcorrectFilling data in the area corresponding to the target, and recording the result after filling as Mapinterp(ii) a The result MapinterpThe surface shape result is the surface shape result of the optical reflector after being aligned to the processing machine tool, so that the interference detection alignment is completed.
As a further preferred embodiment of the present invention, when the optical mirror is an aspherical mirror, the interference detection in the step (2) is null detection using a compensation element, and the MaptestThe area of the target is represented as an ellipse;
the interference detection result MaptestThe form of the interference detection result data corresponding to any position in the non-target sticking area is x, y and z, wherein x and y are pixel point coordinates in the interferometer, and z is a phase value at the corresponding pixel point coordinate (x and y); to pairThe form of the interference detection result data of any position in the area corresponding to the target is x, y and No data, wherein x and y are the coordinates of pixel points in the interferometer.
As a further preferred aspect of the present invention, the aspherical mirror equation is written as:
wherein c is the curvature of the aspheric surface primary mirror vertex, K is the cone coefficient, S2＝ξ2+ζ2Where eta is the direction of the optical axis, xi, zeta are the coordinate system of the plane perpendicular to the optical axis, then the normal vector of the coordinate point on the aspheric surface (xi, zeta, eta) under the coordinate system xi-zeta-eta of the aspheric mirror is
Wherein:
then, the distortion correction and alignment in the step (5) satisfy the following distortion correction equation:
in the equation (5), d is the length of a preset line between the vertex of the aspheric reflector and the focal point of the plane of the compensating element along the optical axis; alpha is an included angle between the preset aspheric surface reflector optical axis and the compensating element plane; k is the magnification factor of converting the interference detection result into a coordinate system of the processing machine tool; thetainterferometerConverting the interference detection result into a rotation angle of a coordinate system of the processing machine tool; x is the number ofcompensatorThe horizontal coordinate in the mirror surface is transformed to the horizontal coordinate in the plane of the compensation element; y iscompensatorFor transformation of the vertical coordinates in the mirror plane into the vertical coordinates in the plane of the compensating elementCoordinates; (x)mir,ymir,zmir) Is a mirror surface one-point coordinate under a machine tool machining coordinate system; (0, y)po,zpo) The coordinate value of the origin of the aspherical mirror coordinate system xi-zeta-eta is under the machine tool processing coordinate system; (x)interferometer,yinterferometer) Is a mirror surface point (x) under a machine tool machining coordinate systemmir,ymir) Converting to pixel coordinates under a CCD coordinate system of the interferometer; (x)interferometer0,yinterferometer0) The center origin of the mirror surface is transformed to the pixel coordinate of the interferometer CCD coordinate system under the machine tool machining coordinate system;
subjecting the Target obtained in the step (3) totestAnd the Target obtained in the step (4)processSubstituting into the equation (5), and calculating and solving k and theta according to least square fittinginterferometerAnd substituting the updated equation (5) into the equation (5);
then, using the updated equation (5) to pair the Map obtained in the step (2)testCarrying out distortion correction and alignment so as to obtain a result Map after the distortion correction and alignmentcorrect。
As a further preferred embodiment of the present invention, if the total number of the labeled targets is N, the Target obtained in step (3) istestComprises (x)i,yi),i＝1,2,3...,N；
The Target obtained in the step (4)processComprises (X)i,Yi),i＝1,2,3...,N；
And N is more than or equal to 5.
As a further preferred aspect of the present invention, in the step (6), the data padding is based on interpolation calculation, and the interpolation calculation is preferably triangulation interpolation.
Through the technical scheme, compared with the prior art, due to the adoption of the circular target with the cross-shaped center, the alignment relation is found through the circular target with the cross-shaped center, the number of the targets is controlled to be at least 3 (preferably at least 5), and the targets are arranged on different straight lines (when the number of the targets is 3, the targets can be just corresponding to the targetsOut of line) ensures that the interference detection result is converted to the magnification k and the rotation angle theta of the machine tool coordinate systeminterferometerThe fitting accuracy of the method provides guarantee for obtaining subsequent alignment relation and ensures the alignment precision. The invention specifically finds a corresponding distortion correction relational expression by analyzing and calculating the detected light path, as shown in formula (5). And performing parameter solution on the target by using the target, and after the solution is completed, performing distortion correction on the detection result so as to complete data conversion of the detection result from the detection coordinate system to the coordinate system of the processing machine tool. After the conversion data result is obtained, interpolation calculation can be carried out on missing data, and the interpolation mode preferably adopts triangulation interpolation, so that a complete surface shape result of the optical reflector aligned to the processing machine tool is obtained.
In summary, in the present invention, based on the alignment method of converting and aligning the interference detection result to the coordinate system of the machine tool based on the circular target, the alignment relationship between the interference detection coordinate system and the machine tool processing coordinate system is found through the circular target with the cross wire at the center, and the corresponding distortion correction relational expression, that is, the relational expression shown in equation (5), is found through the analysis and calculation of the detected optical path. And (3) carrying out parameter solution on the relation by using the target, after the solution is completed, carrying out distortion correction on the detection result, then carrying out interpolation calculation on the distortion-corrected shape-corrected result (the interpolation mode can preferably adopt triangulation interpolation), and after the interpolation calculation is completed, finishing the alignment conversion of the interference detection data from the detection coordinate system to the machine tool machining coordinate system. The invention can finish the operation of converting the detection result into the coordinate system of the processing machine tool, provides guarantee for the final convergence of the surface shape, and has the advantages of high alignment precision, simple calibration step and the like.
Drawings
FIG. 1 is a schematic diagram of a circular target.
FIG. 2 is a schematic diagram of an interference detection optical path.
FIG. 3 is a schematic diagram of the results of target interference detection.
FIG. 4 is a schematic view of the target in the mirror position.
FIG. 5 is a schematic diagram of the distortion corrected back profile of the interference result.
FIG. 6 is a diagram illustrating the result of interpolation calculation.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
In general, the splicing alignment method comprises the following steps:
firstly, circular targets are pasted on the surface of an optical reflector, the centers of the circular targets are cross lines, the pasting number of the targets is not less than 3 (particularly not less than 5), and meanwhile, the targets are not on the same straight line (taking an aspheric reflector as an example, because the aspheric reflector is a curved surface, the projection of each target on a plane vertical to an optical axis is not on the same straight line, namely, the targets are out of the straight line);
secondly, completing interference detection on the optical reflector, and recording the interference detection result as Maptest；
Thirdly, calibrating the position of the target in the detection result 1, wherein the circular target is represented as a circle or an ellipse in the interference detection result (for an aspheric mirror, the interference detection result is distorted, so the circular target is represented as an ellipse in the interference detection result), the edge position of the ellipse can be read out from the interference detection result (for an ellipse, for a circle display result, the ellipse can be regarded as an ellipse with a long axis and a short axis equal to each other without loss of generality), and the maximum pixel value and the minimum pixel value of the circular target in the horizontal X direction can be respectively marked as X and respectively in the interference detection resultmaxAnd xmin(ii) a The maximum and minimum pixel values in the vertical Y direction are YmaxAnd ymin. The pixel coordinate of the center of the circular target is ((x)max+xmin)/2,(ymax+ymin) /2), the calibration result is marked as Targettest；
Moving the reflector to a processing machine tool, respectively calibrating the position coordinates of the centers of the targets at the focus of the cross line by using a measuring head of the processing machine tool, and recording the calibration result as Targetprocess；
Fifthly, Target in the step three is utilizedtestWith Target in step fourprocessCompleting the detection result Map of the interference of the optical reflectortestThe distortion correction and the alignment are carried out, and the result after the distortion correction and the alignment is recorded as Mapcorrect；
Sixthly, correcting the distortion and aligning the result MapcorrectFilling data at the target position, wherein the filling is completed based on triangulation interpolation, and the filled result is recorded as Mapinterp；
Seventhly, after the interpolation calculation in the step 6 is finished, the result MapinterpNamely the surface shape result after being aligned to the processing machine tool, and the alignment is finished.
By means of the method, the interference detection result of the reflecting mirror can be converted into the coordinate system of the processing machine tool.
Example 1
As shown in fig. 1, which is a schematic view of a circular target, the center of the circular target is provided with a cross line; before interference detection is carried out on the aspherical mirror, the circular targets are pasted on the surface of the mirror surface, the number of the targets is not less than five, and meanwhile, the targets are ensured to be not on the same straight line;
for the aspheric mirror, the interference detection light path can be as shown in fig. 2, and in the interference detection, the aspheric mirror needs to be compensated by a compensation element to realize zero detection on the aspheric mirror (i.e. each incident light ray is incident along the normal of the aspheric mirror and simultaneously exits along the normal). For compensation detection, distortion is introduced in the interference detection result, i.e. for a circular mirror surface, the interference detection result shows an elliptical shape. For a circular target pasted on the surface of the circular reflector, the interference detection result shows an elliptic black hole; in the data format expression form, the data form of the target which is not pasted in the interference detection result is (x, y, z), wherein x and y are pixel point coordinates in the interferometer, and z is a phase value at the corresponding pixel point coordinates (x, y); for the position where the target is pasted in the interference detection result, the data format is (x, y, No data), namely No detection data exists at the pixel point corresponding to the target;
after the aspheric mirror is subjected to interference detection to obtain a corresponding interference detection result, as shown in fig. 3 (a black part in the figure indicates that no detection data exists at a position, and an un-painted black part indicates that qualified detection data exists at the position), the coordinates (x, y) of the pixel point at the center of each target in the interference detection result need to be read. Taking target 1 as an example, the coordinate of the pixel point at the left edge of the x pixel direction is xminThe coordinate of the pixel point at the right edge of the x pixel direction is xmaxThen the coordinate of the center of the target 1 in the x pixel direction is (x)max+xmin) 2; similarly, the coordinate of the pixel point at the lower edge of the target 1 in the y pixel direction is yminThe coordinate of the pixel point at the edge in the y pixel direction is ymaxThen the coordinate of the center of the target 1 in the y pixel direction is (y)max+ymin)/2。
Reading out the pixel position (x) of each target center in the interference detection resulti,yi) I 1,2,3, the optical mirror is moved to the machine tool, and the machine tool measuring head is used to read the position coordinates (X) of the center of each target reticle in the machine tool coordinate systemi,Yi),i＝1,2,3...。
After the reading of the center position of each target is completed, distortion correction needs to be performed on the interference detection result.
The aspherical mirror equation can be expressed as:
wherein c is the curvature of the vertex of the aspheric mother lens, K is the conic coefficient, S2＝ξ2+ζ2Where eta is the direction of the optical axis, xi, zeta are the coordinate system of the plane perpendicular to the optical axis, then the normal vector of the coordinate point on the aspheric surface (xi, zeta, eta) under the coordinate system xi-zeta-eta of the aspheric mirror is
Wherein:
for a compensation element, it can be expressed as:
y’×sinα+(z’-d)×cosα＝0 (4)
d is the length of the line segment at the focal point of the aspheric mirror vertex along the optical axis and the compensating element plane; alpha is the included angle between the optical axis of the aspherical mirror and the plane of the compensation element; can be preset;
by derivation, based on the above basic definition, an equation for distortion correction can be obtained:
wherein k is the magnification of converting the interference detection result into a coordinate system of the processing machine tool; thetainterferometerConverting the interference detection result into a rotation angle of a coordinate system of the processing machine tool; x is the number ofcompensatorThe horizontal coordinate in the mirror surface is transformed to the horizontal coordinate in the plane of the compensation element; y iscompensatorThe coordinate in the vertical direction in the mirror surface is transformed into a vertical coordinate in the plane of the compensation element; (x)mir,ymir,zmir) Is a coordinate of one point of the mirror surface; (0, y)po,zpo) The coordinate value of the origin of the aspherical mirror coordinate system xi-zeta-eta under the machine tool processing coordinate system is set (the origin of the aspherical mirror coordinate system xi-zeta-eta can be ensured by presetting, namely the origin of the mirror surface center, and the x coordinate value under the machine tool processing coordinate system is 0); (x)interferometer,yinterferometer) Is a point (x) of a mirror surfacemir,ymir) Transforming to pixel coordinates in the interferometer CCD; (x)interferometer0,yinterferometer0) The center origin of the mirror surface is transformed to the pixel coordinate of the interferometer CCD coordinate system under the machine tool machining coordinate system;
the mirror coordinate system and the machine tool coordinate system both correspond to a Cartesian rectangular space coordinate system, and a specific machine tool coordinate system can be adopted; except for thetainterferometerIn addition, the subscript of equation (5) with the interferometer corresponds to the CCD coordinate system of the interferometer, i.e., the pixel coordinates.
Based on the transformation relation of equation (5) and the test results of the target in the coordinate system of the interference detection and the coordinate system of the processing machine tool, k and theta in equation (5) can be obtained by least square fitting calculationinterferometer。
The result of transforming the interference detection result to the coordinate system of the processing machine tool according to the solution result and the transformation relation of the equation (5) is shown in fig. 5, and it can be seen from fig. 5 that the shape of the elliptical target is changed into a circle shape consistent with the actual shape after distortion correction, and the mirror surface test shape is also corrected into the real mirror surface shape. In fig. 5, the data points at the target are still missing, and need to be filled by using an interpolation method, which uses Delaunay triangulation interpolation. Firstly, Delaunay triangulation calculation is performed on the data shown in fig. 5, after the triangulation calculation is completed, each pixel point at the target position is within one triangle, and taking a certain pixel point (x, y) in the target as an example, the certain pixel point is located at (x, y)1,y1,z1)，(x2,y2,z2)，(x3,y3,z3) And in a plane formed by the three points, constructing a plane equation by using the three coordinate points:
ax+by+z+d＝0 (6)
will (x)1,y1,z1)，(x2,y2,z2)，(x3,y3,z3) The three-point coordinate is brought into formula (6) to obtain the plane equation coefficients a, b and d, as shown in formula (7).
And (3) bringing the coordinates (x, y) of the corresponding pixel point in the target into the obtained plane equation (6), so as to obtain the phase value z corresponding to the pixel point, thereby completing the corresponding interpolation calculation.
After the interpolation calculation is completed for all the points in the target, the obtained corresponding mirror surface shape alignment result is shown in fig. 6.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (3)
1. An interference detection alignment method based on a circular target is characterized by comprising the following steps:
(1) the method comprises the following steps that circular targets are pasted on the surface of an optical reflector, the centers of the circular targets are cross lines, the pasting number of the targets is not less than 3, and the centers of the projections of the targets on a plane perpendicular to the optical axis of the optical reflector are not on the same straight line;
(2) performing interference detection on the optical reflector, and recording the interference detection result as Maptest；
(3) For Map obtained in the step (2)testThe areas corresponding to the targets are calibrated, the edge positions of the areas corresponding to the targets are determined, and then for any one of the circular targets, the interference detection result Map is obtainedtestRespectively marking the maximum pixel value X in the horizontal X direction of the pixel corresponding to the circular targetmaxAnd the minimum pixel value xminMaximum pixel value Y in the vertical Y-direction of the pixelmaxAnd the minimum pixel value yminObtaining the central point pixel coordinate (x) corresponding to the circular target centermax+xmin)/2，(ymax+ymin) 2); calibrating all circular targets one by one to obtain position calibration results corresponding to the centers of all circular targets in an interferometer CCD coordinate system, and recording the calibration results as Targettest；
(4) Moving the optical reflector to a processing machine tool, and respectively calibrating the position coordinates of the centers of the targets as the focus of the cross line by using a measuring head of the processing machine tool to obtainTo the position coordinate result corresponding to all the circular Target centers in the coordinate system of the processing machine tool, and the result is recorded as Targetprocess；
(5) Utilizing the Target obtained in the step (3)testAnd the Target obtained in the step (4)processFor the result Map of the interference detection of the optical mirrortestPerforming distortion correction and alignment, and recording the result of the distortion correction and alignment as Mapcorrect；
(6) Based on interpolation calculation, the result Map after the distortion correction and alignment obtained in the step (5) is obtainedcorrectFilling data in the area corresponding to the target, and recording the result after filling as Mapinterp(ii) a The result MapinterpThe surface shape result is the surface shape result of the optical reflector after being aligned to the processing machine tool, so that the interference detection alignment is completed;
and the optical mirror is an aspherical mirror, the interference detection in the step (2) is null detection using a compensation element, and the MaptestThe area of the target is represented as an ellipse;
the interference detection result MaptestThe form of the interference detection result data corresponding to any position in the non-target sticking area is x, y and z, wherein x and y are pixel point coordinates in the interferometer, and z is a phase value at the corresponding pixel point coordinate (x and y); the form of the interference detection result data of any position in the area corresponding to the target is x, y and No data, wherein x and y are still the coordinates of pixel points in the interferometer;
the aspherical mirror equation is written as:
wherein c is the curvature of the aspheric surface primary mirror vertex, K is the cone coefficient, S2＝ξ2+ζ2Where eta is the direction of the optical axis, xi, zeta are the coordinate system of the plane perpendicular to the optical axis, then the normal vector of the coordinate point on the aspheric surface (xi, zeta, eta) under the coordinate system xi-zeta-eta of the aspheric mirror is
Wherein:
then, the distortion correction and alignment in the step (5) satisfy the following distortion correction equation:
in the equation (5), d is the length of a preset line between the vertex of the aspheric reflector and the focal point of the plane of the compensating element along the optical axis; alpha is an included angle between the preset aspheric surface reflector optical axis and the compensating element plane; k is the magnification factor of converting the interference detection result into a coordinate system of the processing machine tool; thetainterferometerConverting the interference detection result into a rotation angle of a coordinate system of the processing machine tool; x is the number ofcompensatorThe horizontal coordinate in the mirror surface is transformed to the horizontal coordinate in the plane of the compensation element; y iscompensatorThe coordinate in the vertical direction in the mirror surface is transformed into a vertical coordinate in the plane of the compensation element; (x)mir,ymir,zmir) Is a mirror surface one-point coordinate under a machine tool machining coordinate system; (0, y)po,zpo) The coordinate value of the origin of the aspherical mirror coordinate system xi-zeta-eta is under the machine tool processing coordinate system; (x)interferometer,yinterferometer) Is a mirror surface point (x) under a machine tool machining coordinate systemmir,ymir) Converting to pixel coordinates under a CCD coordinate system of the interferometer; (x)interferometer0,yinterferometer0) The center origin of the mirror surface is transformed to the pixel coordinate of the interferometer CCD coordinate system under the machine tool machining coordinate system;
subjecting the Target obtained in the step (3) totestAnd the Target obtained in the step (4)processInto said equation (5) according to least squaresFitting calculation to solve k and thetainterferometerAnd substituting the updated equation (5) into the equation (5);
then, using the updated equation (5) to pair the Map obtained in the step (2)testCarrying out distortion correction and alignment so as to obtain a result Map after the distortion correction and alignmentcorrect。
2. The circular Target-based interferometric detection alignment method of claim 1, wherein if the total number of the targets is N, the Target obtained in step (3) is obtainedtestComprises (x)i,yi),i＝1,2,3...,N；
The Target obtained in the step (4)processComprises (X)i,Yi),i＝1,2,3...,N；
And N is more than or equal to 5.
3. The circular target-based interferometric detection alignment method of claim 1, wherein in step (6), the data padding is based on interpolation, and the interpolation is triangulation interpolation.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103386640A (en) * | 2013-07-29 | 2013-11-13 | 中国科学院长春光学精密机械与物理研究所 | Accurate alignment method for large aperture mirror machine tool |
| CN106705888A (en) * | 2016-12-05 | 2017-05-24 | 北京空间机电研究所 | CCD coordinate system and mirror coordinate system nonlinear relation calibration method in interference detection |
| CN106840023A (en) * | 2016-07-25 | 2017-06-13 | 中国科学院长春光学精密机械与物理研究所 | The complex-curved optical parametric of heavy caliber is accurately tested and caliberating device and method |
| CN106871831A (en) * | 2017-03-07 | 2017-06-20 | 湖北航天技术研究院总体设计所 | A kind of heavy-calibre planar speculum processing and detection coordinates system alignment methods |
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| CN107110637B (en) * | 2014-12-22 | 2019-11-01 | 赛博光学公司 | The calibration of three-dimension measuring system is updated |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103386640A (en) * | 2013-07-29 | 2013-11-13 | 中国科学院长春光学精密机械与物理研究所 | Accurate alignment method for large aperture mirror machine tool |
| CN106840023A (en) * | 2016-07-25 | 2017-06-13 | 中国科学院长春光学精密机械与物理研究所 | The complex-curved optical parametric of heavy caliber is accurately tested and caliberating device and method |
| CN106705888A (en) * | 2016-12-05 | 2017-05-24 | 北京空间机电研究所 | CCD coordinate system and mirror coordinate system nonlinear relation calibration method in interference detection |
| CN106871831A (en) * | 2017-03-07 | 2017-06-20 | 湖北航天技术研究院总体设计所 | A kind of heavy-calibre planar speculum processing and detection coordinates system alignment methods |
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