CN109055907A - A kind of magnetic control sputtering plating equipment - Google Patents
A kind of magnetic control sputtering plating equipment Download PDFInfo
- Publication number
- CN109055907A CN109055907A CN201810988891.4A CN201810988891A CN109055907A CN 109055907 A CN109055907 A CN 109055907A CN 201810988891 A CN201810988891 A CN 201810988891A CN 109055907 A CN109055907 A CN 109055907A
- Authority
- CN
- China
- Prior art keywords
- sliding block
- fixedly connected
- magnet
- turntable
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 24
- 238000007747 plating Methods 0.000 title claims abstract description 13
- 238000003475 lamination Methods 0.000 claims description 31
- 239000012528 membrane Substances 0.000 claims description 26
- 239000002775 capsule Substances 0.000 claims description 3
- 238000009434 installation Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 11
- 238000001816 cooling Methods 0.000 description 6
- 210000004712 air sac Anatomy 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003032 molecular docking Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000001739 rebound effect Effects 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention belongs to sputtering process field, specifically a kind of magnetic control sputtering plating equipment, including outer housing, inner housing, target, workbench, motor and magnet assembly；Motor is fixedly connected on the bottom plate of outer housing, and motor output shaft is connected to magnet assembly, and magnet assembly includes cam, turntable, fixed ring, support air bag, the first sliding block, guide rod and magnet；Cam is fixedly connected on motor output shaft end, and cam slide is mounted in the middle part of turntable；Turntable bottom is uniformly arranged one group of sliding slot, and sliding slot end is equipped with support air bag, and be slidably installed the first sliding block in sliding slot, and the first sliding block can be radially slided along turntable, and first sliding block one end is fixedly connected with guide rod；First slider bottom is fixedly connected with one group of magnet, and the polarity of two neighboring magnet is opposite.The present invention is moved back and forth by the first sliding block with magnet, so that magnetic field of the magnet load on target becomes uniformly, to consume target in sputtering process uniformly, and then improves the utilization rate of target.
Description
Technical field
The invention belongs to sputtering process field, specifically a kind of magnetic control sputtering plating equipment.
Background technique
Sputter (Sputter) refers under vacuum conditions, is passed through inert gas appropriate as medium, by inert gas plus
Speed bombards sputter target (Target), to cause the target atom of sputter target surface (front) to be scattered, and in base-plates surface
Form one layer of deposit metal films.
Column type anode for sputter coating generally comprises cylinder-like shell, a cylindrical tube shape being placed in the cylinder-like shell
Target and a group of magnets being placed in the cylindrical tube shape target.The group of magnets is generally made of multiple independent magnet, the magnetic
Iron group forms a superposition magnetic field.Since independently of one another, the superposition magnetic field is general in the distribution of the target material surface between multiple magnet
It is all uneven.When sputter, the high regional Electronic concentration degree of target material surface magnetic field strength is higher, the frequency which is bombarded
Therefore also higher.After Reusability, the part target is more relative to the target consumption of other magnetic field strength lower parts.When the portion
Divide target consumption net, when needing to change target, other parts but there remains target, and target utilization is low.
Summary of the invention
In order to make up for the deficiencies of the prior art, a kind of magnetic control sputtering plating equipment proposed by the present invention, passes through arc air sac pressing
Guide rod, so that the first sliding block pops up, the first sliding block after pop-up resets again under the rebound effect of support air bag, by the
One sliding block is moved back and forth with magnet, so that magnetic field of the magnet load on target becomes uniformly, to make target in sputtering process
Consumption uniformly, and then improves the utilization rate of target.
The technical solution adopted by the present invention to solve the technical problems is: a kind of magnetic control sputtering plating equipment of the present invention,
Including outer housing, inner housing, target, workbench, motor and magnet assembly；The inner housing will be divided into sputter sky in outer housing
Between and accommodating space；The target is fixedly connected on the top in sputter space, and the lower section of target is equipped with workbench；The workbench
It is fixedly connected on the bottom plate of outer housing；The motor is located in accommodating space, and is fixedly connected on the bottom plate of outer housing, institute
It states motor output shaft and is connected to magnet assembly, the magnet assembly is located in accommodating space；The magnet assembly includes cam, turns
Disk, fixed ring, support air bag, the first sliding block, guide rod and magnet；The cam is fixedly connected on motor output shaft end, described
Cam slide is mounted in the middle part of turntable；The turntable is slidably mounted on fixed ring bottom, and the fixed ring is fixedly mounted on shell
Body top plate bottom；The turntable bottom is uniformly arranged one group of sliding slot, and the sliding slot end is equipped with support air bag, slides in the sliding slot
Dynamic to be installed with the first sliding block, first sliding block can be radially slided along turntable, and first sliding block one end is fixedly connected with guide rod；
First slider bottom is fixedly connected with one group of magnet, and the polarity of two neighboring magnet is opposite；
Wherein, the cam is made of an arc air bag of disk and disk outer ring, arc air bag and the fixed company of disk
It connects, disk is fixedly connected with motor output shaft.When work, when motor band moving cam rotates, arc air sac pressing leads to guide rod
It crosses guide rod to pop up the first sliding block, the first sliding block is slided along the chute, and after sliding into sliding slot end, by support gas
Capsule rebound is returned, and realizes that the first sliding block is moved back and forth with magnet；Simultaneously because oblique thrust of the arc air bag to guide rod, so that turning
Disk is rotated in fixed ring bottom, by enabling magnet to rotate while moving radially around motor output shaft, so that magnet
The magnetic field loaded on target becomes uniformly, to consume target in sputtering process uniformly, and then improves the utilization rate of target.
Preferably, described sliding slot one end is fixedly connected with elastic membrane；The elastic membrane is equipped with perforation, sets in the middle part of the guide rod
There is boss, the boss squeezes elastic membrane and can pass through the perforation in elastic membrane.By the constraint of elastic membrane, guide rod is in arc gas
Under the extruding of capsule, elastic membrane is squeezed toward side, after elastic membrane sufficiently extends, guide rod moment is detached from elastic membrane, so that
Second sliding block obtains biggish kinetic energy, and the second sliding block squeezes support air bag, generates air-flow by squeezing support air bag, can
The hot-air in accommodating space is exported outer housing, device cooling efficiency is improved；Subsequent second sliding block is supported air bag rebound
When back, elastic membrane is buffered and is held tightly to guide rod, to prepare for next periodic motion.
Preferably, the boss side setting is tapered.Convenient for when guide rod returns, boss is passed through and is set in elastic membrane
There is perforation, improves docking efficiency.
Preferably, cams mounted round groove sidewall is equipped with one group of groove, is equipped on the outside of the arc air bag corresponding convex
It rises.In cam rotation, pass through the round groove sidewall of arc air bag friction, driving turntable rotation, so that magnet load is on target
Magnetic field become uniformly, to consume target in sputtering process uniformly, and then improve target utilization rate.
Preferably, one end of the sliding slot is symmetrically installed two arc spring laminations, is equipped with boss, arc bullet in the middle part of the guide rod
Piece can block guide rod by boss.So that the second sliding block by arc air bag pop up when so that the second sliding block obtain it is biggish
Kinetic energy, the second sliding block squeeze support air bag, generate air-flow by squeezing support air bag, can be by the heat in accommodating space
Air exports outer housing, improves cooling efficiency.
Preferably, it is rotatably installed on turntable in the middle part of the arc spring lamination, the articulated connecting rod in arc spring lamination end
One end, articulated second sliding block of the connecting rod other end, the second sliding block are slidably mounted on turntable；First sliding block side is solid
Surely block is connected；It is connected between the block and the second sliding block by drawstring.When work, boss compresses arc spring lamination to certain journey
After degree, guide rod is detached from the support of arc spring lamination, and with the movement of the first sliding block, block pushes the second sliding block and pulled by connecting rod
Arc spring lamination rotation, when the first sliding block back slides, after boss first crosses arc spring lamination, the second sliding block is retracted original by block
Position, so that arc spring lamination realizes that guide rod does not hit arc spring lamination when returning, to improve arc again to boss detent
The service life of shape elastic slice.
Beneficial effects of the present invention are as follows:
1. the present invention is by arc air sac pressing guide rod, so that the first sliding block pops up, the first sliding block after pop-up is being supported
It under the rebound effect of air bag, resets, is moved back and forth by the first sliding block with magnet again, so that magnet load is on target
Magnetic field becomes uniformly, to consume target in sputtering process uniformly, and then improves the utilization rate of target.
2. the present invention is by setting elastic membrane or arc spring lamination, so that the second sliding block obtains biggish kinetic energy, the second sliding block
Support air bag is squeezed, generates air-flow by squeezing support air bag, the hot-air in accommodating space can be exported into shell
Body improves device cooling efficiency.
3. the present invention pushes the second sliding block simultaneously to pull arc spring lamination to rotate by connecting rod by setting block, block, the
When one sliding block back slides, after boss first crosses arc spring lamination, the second sliding block is retracted original position by block, so that arc spring lamination is again
To boss detent, realize that guide rod does not hit arc spring lamination when returning, to improve the service life of arc spring lamination.
Detailed description of the invention
The present invention will be further explained below with reference to the attached drawings.
Fig. 1 is main view of the invention；
Fig. 2 is A-A cross-sectional view in Fig. 1；
Fig. 3 is the first partial enlarged view in Fig. 2 at E；
Fig. 4 is second of partial enlarged view in Fig. 2 at E；
In figure: outer housing 1, inner housing 11, sputter space 12, accommodating space 13, target 2, workbench 21, motor 22, magnetic
Property component 3, cam 31, disk 311, arc air bag 312, turntable 32, sliding slot 321, fixed ring 33, support air bag 34, first it is sliding
Block 35, guide rod 36, boss 361, magnet 37, elastic membrane 4, circular trough 5, arc spring lamination 6, connecting rod 7, the second sliding block 8, block 9.
Specific embodiment
In order to be easy to understand the technical means, the creative features, the aims and the efficiencies achieved by the present invention, tie below
Specific embodiment is closed, the present invention is further explained.
As shown in Figures 1 to 4, a kind of magnetic control sputtering plating equipment of the present invention, including outer housing 1, inner housing 11, target
2, workbench 21, motor 22 and magnet assembly 3；The inner housing 11 will be divided into sputter space 12 in outer housing 1 and accommodating is empty
Between 13；The target 2 is fixedly connected on the top in sputter space 12, and the lower section of target 2 is equipped with workbench 21；The workbench 21
It is fixedly connected on the bottom plate of outer housing 1；The motor 22 is located in accommodating space 13, and is fixedly connected on the bottom of outer housing 1
On plate, 22 output shaft of motor is connected to magnet assembly 3, and the magnet assembly 3 is located in accommodating space 13；The magnetism group
Part 3 includes cam 31, turntable 32, fixed ring 33, support air bag 34, the first sliding block 35, guide rod 36 and magnet 37；The cam 31
It is fixedly connected on 22 output shaft end of motor, the cam 31 is slidably mounted on 32 middle part of turntable；The turntable 32 is slidably installed
In 33 bottom of fixed ring, the fixed ring 33 is fixedly mounted on 1 top plate bottom of outer housing；32 bottom of turntable is uniformly arranged one
Group sliding slot 321,321 end of sliding slot are equipped with support air bag 34, and be slidably installed the first sliding block 35 in the sliding slot 321, institute
Stating the first sliding block 35 can radially slide along turntable 32, and described first sliding block, 35 one end is fixedly connected with guide rod 36；Described first is sliding
35 bottom of block is fixedly connected with one group of magnet 37, and the polarity of two neighboring magnet 37 is opposite；
Wherein, the cam 31 is made of an arc air bag 312 of 311 outer ring of disk 311 and disk, arc air bag
312 are fixedly connected with disk 311, and disk 311 is fixedly connected with 22 output shaft of motor.When work, motor 22 is with 31 turns of moving cam
When dynamic, arc air bag 312 is expressed to guide rod 36, and is popped up the first sliding block 35 by guide rod 36, enables the first sliding block 35
321 sliding along the chute is returned by the rebound of support air bag 34 and after sliding into 321 end of sliding slot, realize the first sliding block 35 with
Magnet 37 moves back and forth；Simultaneously because oblique thrust of the arc air bag 312 to guide rod 36, so that turntable 32 is revolved in 33 bottom of fixed ring
Turn, by enabling magnet 37 to rotate while moving radially around 22 output shaft of motor, so that magnet load is on target
Magnetic field become uniformly, to consume target in sputtering process uniformly, and then improve target utilization rate.
As one embodiment of the present invention, described 321 one end of sliding slot is fixedly connected with elastic membrane 4；In the elastic membrane 4
Equipped with perforation, boss 361 is equipped in the middle part of the guide rod 36, the boss 361 squeezes elastic membrane 4 and can pass through in elastic membrane 4
Perforation.By the constraint of elastic membrane 4, guide rod 36 is squeezed under the extruding of arc air bag 312, by elastic membrane 4 toward side, in elasticity
After film 4 sufficiently extends, 36 moment of guide rod is detached from elastic membrane 4, so that the second sliding block 35 obtains biggish kinetic energy, the second sliding block
35 pairs of support air bags 34 squeeze, and generate air-flow by squeezing support air bag 34, can be by the hot-air in accommodating space 13
Outer housing 1 is exported, device cooling efficiency is improved；Subsequent second sliding block 35 is supported the rebound of air bag 34 when returning, and elastic membrane 4 is to leading
Bar 36 is buffered and is held tightly, to prepare for next periodic motion.
As one embodiment of the present invention, 361 side of the boss setting is tapered.Convenient for being returned in guide rod 36
When, boss 361 passes through elastic membrane 4 and is equipped with perforation, improves docking efficiency.
As one embodiment of the present invention, 5 side wall of circular trough for installing cam 31 is equipped with one group of groove, the arc
Corresponding protrusion is equipped on the outside of air bag 312.When cam 31 rotates, pass through friction 5 side wall of circular trough of arc air bag 312, driving
Turntable 32 rotates, so that magnetic field of the magnet load on target becomes uniformly, to consume target in sputtering process uniformly, in turn
Improve the utilization rate of target.
As one embodiment of the present invention, one end of the sliding slot 321 is symmetrically installed two arc spring laminations 6, described
Boss 361 is equipped in the middle part of guide rod 36, arc spring lamination 6 can block guide rod 36 by boss 361.So that the second sliding block 35 is by arc
When shape air bag 312 pops up, so that the second sliding block 35 obtains biggish kinetic energy, the second sliding block 35 squeezes support air bag 34,
Air-flow is generated by squeezing support air bag 34, the hot-air in accommodating space 13 outer housing 1 can be exported into, improve cooling effect
Rate.
As one embodiment of the present invention, it is rotatably installed on turntable 32 in the middle part of the arc spring lamination 6, the arc
One end of the articulated connecting rod 7 in 6 end of elastic slice, articulated second sliding block 8 of 7 other end of connecting rod, the second sliding block 8 are slidably mounted on
On turntable 32；First sliding block, 35 side is fixedly connected with block 9；Pass through drawstring phase between the block 9 and the second sliding block 8
Even.When work, after boss 361 compresses arc spring lamination 6 to a certain extent, guide rod 36 is detached from the support of arc spring lamination 6, with first
The movement of sliding block 35, block 9 push the second sliding block 8 simultaneously by connecting rod 7 pull arc spring lamination 6 rotate, the first sliding block 35 back
When sliding, after boss 361 first crosses arc spring lamination 6, the second sliding block 8 is retracted original position by block 9, so that arc spring lamination 6 is again right
361 detent of boss realizes that guide rod 36 does not hit arc spring lamination 6 when returning, to improve the use longevity of arc spring lamination 6
Life.
When work, when motor 22 is rotated with moving cam 31, arc air bag 312 is expressed to guide rod 36, and will by guide rod 36
The pop-up of first sliding block 35 enables the first sliding block 35 321 to slide along the chute, and after sliding into 321 end of sliding slot, is supported
The rebound of air bag 34 is returned, and realizes that the first sliding block 35 is moved back and forth with magnet 37；Simultaneously because arc air bag 312 is to guide rod 36
Oblique thrust, so that turntable 32 is rotated in 33 bottom of fixed ring, by enabling magnet 37 while moving radially around motor
The rotation of 22 output shafts so that magnetic field of the magnet load on target become uniformly, make target consumed in sputtering process uniformly, into
And improve the utilization rate of target；
In order to make the second sliding block 35 obtain biggish kinetic energy, first way fetters guide rod 36 by elastic membrane 4；Second
Kind of mode blocks guide rod 36 by arc spring lamination 6, so that the second sliding block 35 is by arc air bag 312 when being popped up, the second sliding block 35
Biggish kinetic energy is obtained, the second sliding block 35 squeezes support air bag 34, generates air-flow by squeezing support air bag 34, can be with
Hot-air in accommodating space 13 is exported into outer housing 1, improves device cooling efficiency.
Although the present invention be illustrated by specific embodiment, it will be appreciated by those skilled in the art that, do not departing from
In the case where the scope of the invention, various transformation and equivalent substitute can also be carried out to the present invention.In addition, being directed to particular condition or material
Material, can do various modifications to the present invention, without departing from the scope of the present invention.Therefore, the present invention is not limited to disclosed tool
Body embodiment, and should include the whole embodiments fallen within the scope of the appended claims.
Claims (6)
1. a kind of magnetic control sputtering plating equipment, including outer housing (1), inner housing (11), target (2), workbench (21), motor (22) and
Magnet assembly (3)；The inner housing (11) will be divided into sputter space (12) and accommodating space (13) in outer housing (1)；It is described
Target (2) is fixedly connected on the top of sputter space (12), and the lower section of target (2) is equipped with workbench (21)；The workbench
(21) it is fixedly connected on the bottom plate of outer housing (1)；The motor (22) is located in accommodating space (13), and is fixedly connected outside
On the bottom plate of shell (1), motor (22) output shaft is connected to magnet assembly (3), and it is empty that the magnet assembly (3) is located at accommodating
Between in (13)；It is characterized by: the magnet assembly (3) includes cam (31), turntable (32), fixed ring (33), support air bag
(34), the first sliding block (35), guide rod (36) and magnet (37)；The cam (31) is fixedly connected on motor (22) output shaft end
Head, the cam (31) are slidably mounted in the middle part of turntable (32)；The turntable (32) is slidably mounted on fixed ring (33) bottom, institute
It states fixed ring (33) and is fixedly mounted on outer housing (1) top plate bottom；Turntable (32) bottom is uniformly arranged one group of sliding slot
(321), sliding slot (321) end is equipped with support air bag (34), and be slidably installed the first sliding block in the sliding slot (321)
(35), first sliding block (35) can radially slide along turntable (32), and described first sliding block (35) one end is fixedly connected with guide rod
(36)；First sliding block (35) bottom is fixedly connected with one group of magnet (37), and the polarity of two neighboring magnet (37) is opposite；
Wherein, the cam (31) is made of an arc air bag (312) of disk (311) and disk (311) outer ring, arc gas
Capsule (312) is fixedly connected with disk (311), and disk (311) is fixedly connected with motor (22) output shaft.
2. a kind of magnetic control sputtering plating equipment according to claim 1, it is characterised in that: described sliding slot (321) one end is fixed to be connected
Connect elastic membrane (4)；The elastic membrane (4) is equipped with perforation, is equipped with boss (361) in the middle part of the guide rod (36), the boss
(361) elastic membrane (4) are squeezed and the perforation on elastic membrane (4) can be passed through.
3. a kind of magnetic control sputtering plating equipment according to claim 2, it is characterised in that: boss (361) side is arranged to
Taper.
4. a kind of magnetic control sputtering plating equipment according to claim 1, it is characterised in that: the circular trough (5) of installation cam (31)
Side wall is equipped with one group of groove, and corresponding protrusion is equipped on the outside of the arc air bag (312).
5. a kind of magnetic control sputtering plating equipment according to claim 1, it is characterised in that: one end of the sliding slot (321) is symmetrical
Two arc spring laminations (6) are installed, are equipped with boss (361) in the middle part of the guide rod (36), arc spring lamination (6) passes through boss (361) energy
Enough block guide rod (36).
6. a kind of magnetic control sputtering plating equipment according to claim 5, it is characterised in that: rotation in the middle part of the arc spring lamination (6)
It is mounted on turntable (32), one end of the articulated connecting rod in arc spring lamination (6) end (7), connecting rod (7) other end is hinged
The second sliding block (8), the second sliding block (8) be slidably mounted on turntable (32)；First sliding block (35) side is fixedly connected with gear
Block (9)；It is connected between the block (9) and the second sliding block (8) by drawstring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810988891.4A CN109055907B (en) | 2018-08-28 | 2018-08-28 | Magnetron sputtering equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810988891.4A CN109055907B (en) | 2018-08-28 | 2018-08-28 | Magnetron sputtering equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109055907A true CN109055907A (en) | 2018-12-21 |
| CN109055907B CN109055907B (en) | 2020-11-06 |
Family
ID=64756326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810988891.4A Active CN109055907B (en) | 2018-08-28 | 2018-08-28 | Magnetron sputtering equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109055907B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101988188A (en) * | 2009-07-30 | 2011-03-23 | 鸿富锦精密工业（深圳）有限公司 | Magnetic control device for sputtering |
| CN101994093A (en) * | 2009-08-14 | 2011-03-30 | 鸿富锦精密工业（深圳）有限公司 | Magnetron sputtering device |
| CN102234777A (en) * | 2010-04-30 | 2011-11-09 | 亚洲太阳科技有限公司 | Magnetic control sputtering machine and sputtering method for manufacturing film solar battery |
| CN102234776A (en) * | 2010-04-22 | 2011-11-09 | 鸿富锦精密工业（深圳）有限公司 | Magnetron sputtering apparatus |
-
2018
- 2018-08-28 CN CN201810988891.4A patent/CN109055907B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101988188A (en) * | 2009-07-30 | 2011-03-23 | 鸿富锦精密工业（深圳）有限公司 | Magnetic control device for sputtering |
| CN101994093A (en) * | 2009-08-14 | 2011-03-30 | 鸿富锦精密工业（深圳）有限公司 | Magnetron sputtering device |
| CN102234776A (en) * | 2010-04-22 | 2011-11-09 | 鸿富锦精密工业（深圳）有限公司 | Magnetron sputtering apparatus |
| CN102234777A (en) * | 2010-04-30 | 2011-11-09 | 亚洲太阳科技有限公司 | Magnetic control sputtering machine and sputtering method for manufacturing film solar battery |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109055907B (en) | 2020-11-06 |
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