CN108983551A - Coating machine photo resistance recovery system - Google Patents
Coating machine photo resistance recovery system Download PDFInfo
- Publication number
- CN108983551A CN108983551A CN201810962122.7A CN201810962122A CN108983551A CN 108983551 A CN108983551 A CN 108983551A CN 201810962122 A CN201810962122 A CN 201810962122A CN 108983551 A CN108983551 A CN 108983551A
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- CN
- China
- Prior art keywords
- photoresist
- coating
- recycling
- pump
- mould group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
Abstract
The present invention relates to a kind of recyclable coating machine photoresist systems, including photoresist bucket, degassing mould group, filter, coating pump, coating head, photoresist recycling can and photoresist recycling bin, the recyclable coating machine photoresist system includes new photoresist feed system and photo resistance recovery system, in the new photoresist feed system, photoresist recycling bin connection degassing mould group, the mould group that deaerates connects filter, filter connection coating pump, coating pump connection coating head；In the photo resistance recovery system, degassing mould group, filter, coating pump and coating head are connect with photoresist recycling can respectively, and photoresist recycling can connects photoresist recycling bin, photoresist recycling bin connection degassing mould group.Beneficial effects of the present invention: 1) photoresist of recycling waste is used for production to the greatest extent, and photoresist is avoided to waste.2) integrate photoresist recycling and waste collection, and recycling and automatic supply automatically.
Description
Technical field
The present invention is a kind of coating machine photo resistance recovery system, belongs to display preparation technical field.
Background technique
In into several years with domestic LCD factory be continuously increased and the impact of novel display technology, under LCD product price is continuous
Fall, for the continuous implementation cost abatement of the manufacturing firm for the LCD that gets a profit, it is desirable to reduce manufacturing cost.Manufacturing cost is mainly material
Cost mainly includes glass substrate, photoresist and chemicals medicament in LCD material cost.Wherein glass substrate and chemicals state
Interior producer can manufacture, and expense is substantially reduced after realizing production domesticization.But Other substrate materials rest in always Japan factory hand
In, price is calculated in gram, very expensive.So the dosage for reducing photoresist as far as possible is significant for manufacturing cost.
Coating is most important processing procedure in photoetching technique, and coating machine is all made of in the plate manufacture 5 more than generation at present
The technology of Slit coating, its advantage is that the homogeneity of coating photoresist is more preferable, the utilization rate of photoresist is also substantially improved.Slit is applied at present
The key step of cloth are as follows: the cleaning of spraying nozzle → photoresist precoating → coated product, wherein the photoresist of photoresist precoating part can not be used
Be wasted in production, in addition coating machine when product is remodeled in coating machine pipeline, in photoresist pump, the photoresist in the photoresist filtering phase
It is discharged, causes largely to waste, both cost of idleness, also not meet environmentally protective.
Summary of the invention
Proposed by the present invention is a kind of coating machine photo resistance recovery system, and its object is to real for photoresist in the prior art
Single supply is applied, the use of remaining photoresist is discharged with waste liquid other than the photoresist for product, causes vast resources
The defect of waste proposes a kind of coating machine photo resistance recovery system, and the photoresist of recycling waste is used for production to the greatest extent,
To avoid photoresist waste.
Technical solution of the invention:
Recyclable coating machine photoresist system, including photoresist bucket, degassing mould group, filter, coating pump, coating head, photoresist recycling can
With photoresist recycling bin, the recyclable coating machine photoresist system includes new photoresist feed system and photo resistance recovery system, described new
In photoresist feed system, photoresist recycling bin connection degassing mould group, degassing mould group connects filter, and filter connection coating pump applies
Cloth pump connection coating head；In the photo resistance recovery system, degassing mould group, filter, coating pump and coating head are returned with photoresist respectively
Closed cans connection, photoresist recycling can connect photoresist recycling bin, photoresist recycling bin connection degassing mould group.
Beneficial effects of the present invention:
1) photoresist of recycling waste is used for production to the greatest extent, and photoresist is avoided to waste.
2) integrate photoresist recycling and waste collection, and recycling and automatic supply automatically.
Detailed description of the invention
Attached drawing 1 is recyclable coating machine photoresist system schematic.
Attached drawing 2 is the structural schematic diagram of recyclable coating machine photoresist system.
Attached drawing 3 is the structural schematic diagram of recyclable coating machine photoresist system.
In figure 1 be photoresist feed system, 2 be liquid waste system, 3 be AIR VENT TANK DRIN, 4 be degassing mould group, 5 be filtering
Device, 6 be coating machine row bubble, 7 be photoresist pump, 6 be waste liquid barrel, 6 be recycling bin, 6 be waste drains pump.
In attached drawing, heavy solid line arrows indicate that photoresist supply route, solid arrows indicate that photoresist recycles route, dotted line route
Indicate waste collection route.
Specific embodiment
Recyclable coating machine photoresist system, including photoresist bucket, degassing mould group, filter, coating pump, coating head, photoresist return
Closed cans and photoresist recycling bin, the recyclable coating machine photoresist system include new photoresist feed system and photo resistance recovery system, institute
It states in new photoresist feed system, photoresist recycling bin connection degassing mould group, degassing mould group connects filter, filter connection coating
Pump, coating pump connection coating head；In the photo resistance recovery system, degassing mould group, filter, coating pump and coating head respectively with light
Recycling can connection is hindered, photoresist recycling can connects photoresist recycling bin, photoresist recycling bin connection degassing mould group.
Extra photoresist drippage has PUMP to coating head to PUMP OUT in order to prevent after one piece of product is completed in every coating
Resorption movement prevent from making because of resorption so coating head can spue (pump out) part photoresist before applying next piece of product
Enter coating head at air, the application implements recycling and reusing to the part photoresist
Filter drain (FILTER VENT), the degassing drain of mould group (AIR VENT TANK Drain), coating head drain
(Nozzler vent) is all that photoresist feeding pipe is mixed into bubble caused by production process is because of photoresist replacement or unit exception
Words need to arrange bubble, i.e., bubble is squeezed out pipeline using a large amount of photoresists, or replace in photoresist: i.e. different product uses different model
Photoresists all in pipeline are discharged using CDA when photoresist, which is implemented recycling and reusing by the application
It further include waste collection system, the waste liquid is the waste liquid arranged when pipeline is cleaned using lotion liquid, the recyclable coating
Machine photoresist system further includes waste collection bucket, photoresist pump and waste drains pump, the degassing mould group, filter, coating pump and coating head
It is connect respectively with photoresist recycling can by photoresist pump, degassing mould group, filter, coating pump, coating head and photoresist recycling can pass through
Waste drains pump is connect with waste collection bucket respectively.
The photo resistance recovery system uses Dual System Design, and each recovery system is equipped with a 20L photoresist recycling bin and 2
The photoresist recycling can of 10L.
The photo resistance recovery system uses Dual System Design, and each recovery system is equipped with 3 20L photoresist recycling bins and 5
The photoresist recycling can of 10L, the tapping valve of recovery unit need be equipped with two company's valves in circuit design: drain connection photoresist returns all the way
Closed tube road, another way drain connect waste liquid drain line, the waste liquid arranged when being cleaned for pipeline using lotion liquid.
Programming
1. circuit design part need add solenoid valve, realization automatically supplies,
2.PLC programming: photoresist recovery section PLC program need control the solenoid valve of additional each recovery unit to realize,
The solenoid valve of photoresist recovery pipe is opened, the solenoid valve of lotion discharging of waste liquid is closed.
Photoresist supply portion: PLC program need add the control of photoresist recycling.Its control principle and normal photoresist supply
The program given is essentially identical, must be in the condition and priority of software setting enabling photoresist recovery system.
Further explanation of the technical solution of the present invention with reference to the accompanying drawing
As shown in Fig. 1, coating machine photoresist system, including photoresist bucket, degassing mould group, filter, coating pump, coating can be recycled
Head, photoresist recycling can and photoresist recycling bin, the recyclable coating machine photoresist system include that new photoresist feed system and photoresist return
Receipts system, in the new photoresist feed system, photoresist recycling bin connection degassing mould group, degassing mould group connects filter, filter
Connection coating pump, coating pump connection coating head；In the photo resistance recovery system, degassing mould group, filter, coating pump and coating head
It is connect respectively with photoresist recycling can, photoresist recycling can connects photoresist recycling bin, photoresist recycling bin connection degassing mould group.
It as shown in Fig. 2, further include waste collection system, the waste liquid is arranged useless when being cleaned for pipeline using lotion liquid
Liquid, the recyclable coating machine photoresist system further include waste collection bucket, photoresist pump and waste drains pump, the degassing mould group, filtering
Device, coating pump and coating head are connect with photoresist recycling can respectively by photoresist pump, degassing mould group, filter, coating pump, coating head
It is connect respectively with waste collection bucket with photoresist recycling can by waste drains pump.
The tapping valve of recovery unit need be equipped with 2 company's valves in circuit design: drain is connected as photoresist recovery pipe all the way
, another way drain is waste liquid drain, the waste liquid arranged when predominantly pipeline is cleaned using lotion liquid.
As shown in Fig. 3, recovery system uses dual system, and each recovery system is equipped with a 20L photoresist bucket and 2 small
Recycle TANK.
Claims (4)
1. recyclable coating machine photoresist system, it is characterized in that include photoresist bucket, degassing mould group, filter, coating pump, coating head,
Photoresist recycling can and photoresist recycling bin, the recyclable coating machine photoresist system include new photoresist feed system and photoresist recycling system
It unites, in the new photoresist feed system, photoresist recycling bin connection degassing mould group, degassing mould group connects filter, and filter connects
Coating pump, coating pump connection coating head；In the photo resistance recovery system, degassing mould group, filter, coating pump and coating head difference
It is connect with photoresist recycling can, photoresist recycling can connects photoresist recycling bin, photoresist recycling bin connection degassing mould group.
2. recyclable coating machine photoresist system according to claim 1, it is characterized in that further include waste collection system, it is described
Waste liquid is the waste liquid arranged when pipeline is cleaned using lotion liquid, the recyclable coating machine photoresist system further include waste collection bucket,
Photoresist pump and waste drains pump, the degassing mould group, filter, coating pump and coating head are pumped by photoresist and are connected respectively with photoresist recycling can
It connects, degassing mould group, filter, coating pump, coating head and photoresist recycling can are connect with waste collection bucket respectively by waste drains pump.
3. recyclable coating machine photoresist system according to claim 1, it is characterized in that the photo resistance recovery system is using double
System design, each recovery system are equipped with a 20L photoresist recycling bin and the photoresist recycling can of 2 10L.
4. recyclable coating machine photoresist system according to claim 2, it is characterized in that the photo resistance recovery system is using double
System design, each recovery system are equipped with 3 20L photoresist recycling bins and the photoresist recycling can of 5 10L, recycle in circuit design
The tapping valve of unit need be equipped with two company's valves: drain connects photoresist recovery pipe all the way, and another way drain connects waste liquid drain
Pipeline, the waste liquid arranged when being cleaned for pipeline using lotion liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810962122.7A CN108983551A (en) | 2018-08-22 | 2018-08-22 | Coating machine photo resistance recovery system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810962122.7A CN108983551A (en) | 2018-08-22 | 2018-08-22 | Coating machine photo resistance recovery system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108983551A true CN108983551A (en) | 2018-12-11 |
Family
ID=64547383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810962122.7A Pending CN108983551A (en) | 2018-08-22 | 2018-08-22 | Coating machine photo resistance recovery system |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1310359A (en) * | 2000-02-24 | 2001-08-29 | 富士胶片株式会社 | Producing method for lithographic printing plate originals |
| CN1327888A (en) * | 2000-06-09 | 2001-12-26 | 株式会社平间理化研究所 | Treater for substrate surface |
| CN101329512A (en) * | 2007-06-22 | 2008-12-24 | 中芯国际集成电路制造(上海)有限公司 | Photo resistance recovery system |
| JP2009178611A (en) * | 2008-01-29 | 2009-08-13 | Tokyo Ohka Kogyo Co Ltd | System for reusing liquid chemical |
| CN106140567A (en) * | 2015-05-13 | 2016-11-23 | 东京应化工业株式会社 | Apparatus for coating, coating system and coating process |
| CN106423755A (en) * | 2016-11-22 | 2017-02-22 | 京东方科技集团股份有限公司 | Coating equipment, method utilizing coating equipment for recycling coating liquid and cleaning method of coating equipment |
| US20180025921A1 (en) * | 2016-07-25 | 2018-01-25 | SCREEN Holdings Co., Ltd. | Substrate treating apparatus |
-
2018
- 2018-08-22 CN CN201810962122.7A patent/CN108983551A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1310359A (en) * | 2000-02-24 | 2001-08-29 | 富士胶片株式会社 | Producing method for lithographic printing plate originals |
| CN1327888A (en) * | 2000-06-09 | 2001-12-26 | 株式会社平间理化研究所 | Treater for substrate surface |
| CN101329512A (en) * | 2007-06-22 | 2008-12-24 | 中芯国际集成电路制造(上海)有限公司 | Photo resistance recovery system |
| JP2009178611A (en) * | 2008-01-29 | 2009-08-13 | Tokyo Ohka Kogyo Co Ltd | System for reusing liquid chemical |
| CN106140567A (en) * | 2015-05-13 | 2016-11-23 | 东京应化工业株式会社 | Apparatus for coating, coating system and coating process |
| US20180025921A1 (en) * | 2016-07-25 | 2018-01-25 | SCREEN Holdings Co., Ltd. | Substrate treating apparatus |
| CN106423755A (en) * | 2016-11-22 | 2017-02-22 | 京东方科技集团股份有限公司 | Coating equipment, method utilizing coating equipment for recycling coating liquid and cleaning method of coating equipment |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181211 |
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| RJ01 | Rejection of invention patent application after publication |