CN108983471A - A kind of display equipment of protection electromagnetic information leakage - Google Patents
A kind of display equipment of protection electromagnetic information leakage Download PDFInfo
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- CN108983471A CN108983471A CN201810867787.XA CN201810867787A CN108983471A CN 108983471 A CN108983471 A CN 108983471A CN 201810867787 A CN201810867787 A CN 201810867787A CN 108983471 A CN108983471 A CN 108983471A
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- film
- electromagnetic
- display equipment
- backing plate
- electrically
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/35—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being liquid crystals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0007—Casings
- H05K9/0054—Casings specially adapted for display applications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
- G02F1/133334—Electromagnetic shields
Abstract
The present invention provides a kind of display equipment of protection electromagnetic information leakage, mainly by liquid crystal display, outline border, mainboard, rear shell, has electromagnetic shielding film on liquid crystal display, liquid crystal display is embedded in outline border, wire mesh is accompanied between liquid crystal display and electromagnetic shielding film, this display equipment shows that clear, temperature tolerance is good, the leakage of electromagnetic information can be effectively prevented.
Description
Technical field
The present invention relates to EM Information Protection Technology field, the display for being specifically related to a kind of protection electromagnetic information leakage is set
It is standby.
Background technique
Electromagnetic leakage refers to that spuious (parasitism) electromagnetic energy of electronic equipment passes through conducting wire or space to external diffusion.Any place
In the electromagnetic information equipment of working condition, such as: all there is different degrees of electricity in computer, printer, facsimile machine, telephone set
Magnetic dispersion, this is the electromagnetism phenomenon that can not be got rid of.If information handled by equipment " is carried " in these leakages secretly, just constitute
So-called electromagnetic information leakage.In fact, nearly all electromagnetic leakage all " carries " information handled by equipment secretly, only degree
It is different.Under the premise of meeting certain condition, it can receive with specific instrument and restore these information.Therefore,
Once related information is secrecy, these leakages have just threatened information security.
Data show that: the information electromagnetic wave of common computer display terminal radiation can be even one kilometer in several hundred rice
It is received and reappears outside;The leakage information of the information processings such as normal printer, facsimile machine, telephone set and transmission device, can also be with
It intercepts and captures and restores by limited means in certain distance.The reception of this leaked information and reduction technique, at present
It is used to steal the means of valuable information of other country as many national intelligence mechanisms.
Certainly, it is not unconditional for restoring to the intercepting and capturing of leaked information, and only intensity and signal-to-noise ratio meet certain
The signal of condition can be trapped and restore.Therefore, as long as taking certain measure, the intensity of leakage signal is weakened, is reduced
The signal-to-noise ratio of leakage signal, so that it may achieve the purpose that electromagnetic protection.
The electromagnetic leakage of equipment is propagated outward by radiating and conducting two kinds of approach.Radiation leakage be stray electromagnetic energy with
Electromagnetic wave is radiate through device housings, the various slits on shell, connecting cable etc.;Leakage is spuious electromagnetism
Energy is conducted by various routes (including power supply line, signal wire etc.).The two is interrelated, that is, there is mutually " energy friendship
Change " phenomenon: on the one hand, the stray electromagnetic energy conducted along the line can be partially converted into electromagnetism amplitude because of the antenna effect of conducting wire
It is shot out;On the other hand, the stray electromagnetic energy for being radiated space can be coupled on outer even conducting wire again because of the antenna effect of conducting wire.
The electromagnetic information that equipment leakage is gone out can be divided into " red signal " and " black signal " two parts.Red signal is and equipment is handled or transmitted
Information-related signal;Black signal is the signal unrelated with equipment processing or the information transmitted.It constitutes a threat to information security
Mainly " red signal ".
Common electromagnetic protection measure has: shielding, filtering, isolation, reasonably ground connection and good overlap joint, selects low leakage
Equipment is reasonably laid out and using interference unit etc..
Source of leaks, is exactly encapsulated with shielding material by shielding.Shielding can both prevent from shielding intracorporal source of leaks generation
Electromagnetic-wave leakage gone to exterior space, and external electromagnetic wave can be made to terminate at shield.Therefore, shielding has both reached and has prevented
The purpose of information leakage, while having had both again and prevent external strong electromagnetic radiation, as " ELECTROMAGNETIC BOMB " in electronic warfare is hard to equipment
The effect of killing.Shielding is to inhibit the most effective means of radiation leakage, but cost is higher.
Filtering is to inhibit one of the main method of leakage.Installing suitable filter on power supply line or signal wire additional can be with
The access of leakage is blocked, to inhibit leakage significantly.
Ground connection and overlap joint are also the effective ways for inhibiting leakage.Good ground connection and overlap joint can give spuious electromagnetism
Energy one leads to the low-resistance circuit of the earth, to shunt to fall to transfer out through power supply line and signal wire to a certain extent
Stray electromagnetic energy.The technologies such as this method and shielding, filtering are used cooperatively, it can to the electromagnetic leakage for inhibiting electronic equipment
It plays a multiplier effect.
Isolation and rational deployment are to reduce the effective means of electromagnetic leakage.Isolation is emphasis will to be needed to prevent in information system
The equipment of shield is separated from system, is especially protected, and cuts off itself and equipment room electromagnetic leakage accesses other in system.
Rational deployment refers to reduce electromagnetic leakage as the related equipment in principle reasonably placement information system.Rational deployment also includes
Secrecy-involved apparatus is widened as far as possible at a distance from insecure area (public place).Selecting low leakage equipment is also to reduce electromagnetic leakage
One of effective means, low leakage available at present are divided to complete containing type and red-black two kinds of divergence type.
Interference unit is a kind of electronic instrument that can give off electromagnetic noise.It is let out by increasing electromagnetic noise reduction radiation
The overall signal-to-noise ratio of information is leaked, Enhanced Radiation Reduced Blast information cracks the difficulty of reduction after being trapped, to reach " cover " real information
Purpose.This is a kind of preventive means of relative inexpensiveness.But the reliability of protection is also relatively poor, because radiation of equipment goes out
Information content do not reduce.It is, in principle, that with suitable information processing means, it is possible to restoring useful information, only
It is the opposite increase of difficulty of reduction.In addition, also will increase the electromagnetic pollution of ambient enviroment using interference unit, to other electromagnetic compatibilities
Property poor electronic information equipment normal work constitute certain threat.Certainly, before no other effective protection means
It puts, interference unit must also be used as emergency measure.
Summary of the invention
Technical problem to be solved by the invention is to provide a kind of screen transparency height, temperature tolerance is good, effectively prevent electromagnetism
The electromagnetic shielding of information leakage shows equipment.
In order to solve the above technical problems, the present invention provides the display equipment of protection electromagnetic information leakage, which is characterized in that
Mainly by liquid crystal display, outline border, mainboard, rear shell, has electromagnetic shielding film on liquid crystal display.
Wire mesh is accompanied between liquid crystal display and electromagnetic shielding film.
Wire mesh is copper fiber.
The production method of electromagnetic shielding film the following steps are included:
1) then the coating photoresist on electrically-conductive backing plate forms figure knot by photoetching process on the electrically-conductive backing plate
Structure;
2) metal layer is grown in the graphic structure by selective electrodeposition technique, forms metal pattern configuration;
3) metal pattern configuration is inlayed to flexible base material by imprint process, forms electromagnetic shielding film.
In the step 3), specifically: stupid amine aqueous solution will be gathered and be coated on the electrically-conductive backing plate, shelled after heat cure forms a film
From forming the electromagnetic shielding film.
In the step 3), specifically: uv-curable glue is coated on the electrically-conductive backing plate, and PET film is overlying on
Thereon, and with ultraviolet light irradiation, the uv-curable glue solidifies after irradiating, and is adhered in the PET film, described in
After PET film and electrically-conductive backing plate removing, the electromagnetic shielding film is obtained.
In the step 3), specifically: COC film is covered on the electrically-conductive backing plate, and temperature and pressure are applied to it
Power obtains the electromagnetic shielding film after the COC film and electrically-conductive backing plate separation.
The present invention also has the advantage that compared with prior art
1) electromagnetic wave shield film proposed by the present invention made using inversion membrane technique, PI film thickness is only several to more than ten
Micron is, it can be achieved that ultra-thin type electromagnetic shielded film;
2) proposed by the present invention to make electromagnetic shielding film using selective electrodeposition, line width can be made in several hundred nanometers to micro-
The metallic mesh structure of rice guarantees the high light transmittance (being greater than 95%) of electromagnetic shielding film since the metallic mesh is that deposition is formed
Meanwhile realizing high shield effectiveness (being greater than 60dB);
3) metallic mesh is embedded in using nanometer embossing or hot press printing technology the ditch of solidification glue or base material
Among slot, rather than be adhered to surface, it can be achieved that crooked process radius be less than 3mm electromagnetic wave shield film, and surface be not easy by
Pollution scratches;
4) compared with the prior art, the high grade of transparency electromagnetic shielding film that the present invention makes, is not related to vacuum evaporation process, can
Keep cost of manufacture lower, more efficient.
Specific embodiment
The following detailed description of the preferred embodiment of the present invention.
It is for the overall evaluation of a technical project of the present embodiment: micro- metal grill is embedded in by PI material by micro-nano technology technology
Inside, flexible, be not easy to scratch, heatproof is high, transparency is good, electromagnet shield effect is strong.Particular technique design: photoetching technique is utilized
(technologies such as laser direct-writing, uv-exposure, electron beam exposure), on electrically-conductive backing plate (metal, metallized flexible conductive film,
The conductive substrates such as ITO, FTO glass) form grid structure;With selective electrodeposition technique, metal is grown in grid structure
Layer (metals such as nickel, copper, gold);Using nano impression (hot padding, inversion membrane technology) technology metallic mesh damascene to soft
Property base material inside, be made electromagnetic wave shield film.
The technical solution of the present embodiment is specifically as follows:
1) grid production is preset on electrically-conductive backing plate: according to performance requirement (light transmittance, shield effectiveness, the height of electromagnetic shielding film
Diffraction time delustring etc.), the arrangement mode (periods such as hexagonal honeycomb shape, square, parallelogram row of design grid grid structure
Aperiodic arrangement of cloth, arbitrary polygon etc.), the line width (300nm-10 μm) of grid, the parameters such as grid spacing (10 μm -500 μm),
Then by graphical (technologies such as laser direct-writing, the uv-exposure, electron beam exposure) technology of micro nano structure in coating photoresist
Electrically-conductive backing plate on form graphic structure;
2) selective deposition grows metal mesh grid layer: patterned conductive substrate is placed in galvanic deposition cell cathode, and anode, which is placed, to be needed
The metal material to be deposited has metal material in the grid trench portions for appearing conductive substrates using the selection deposition of electro-deposition
Material deposition, not will form deposition layer in the region of photoresist overlay.By controlling additional current strength on the electrode
(500mA-50A), sedimentation time (20s-6000s), cathode at a distance from anode (20mm-300mm) etc., can control metal
The deposition thickness (300nm-10 μm) of material;
3) embedded metal grid is electromagnetically shielded film production: the conductive substrates of deposited metal grid layer are placed in glue
In, the photoresist on electrically-conductive backing plate is removed, the metallic mesh being deposited in conductive substrates is only retained.Utilize nanometer embossing
(hot padding, inversion membrane technology etc.), the metallic mesh in conductive substrates is embedded in inside non-transparent flexible substrate, forms electromagnetic screen
Cover film;
4) thickness of sedimentary is influenced by conduction time, current strength, electrode spacing, and deposit thickness is bigger, electricity
Conductance is higher.The thickness (300nm-10 μm) of sedimentary can be controlled by the parameter of regulation electro-deposition.Electromagnetic wave shield film it is saturating
Rate is crossed to be determined by the ratio (< 5%) that metallic mesh part accounts for whole point, and the width of wiregrating is restricted (200nm-10 by groove
μm), it can be achieved that transmitance > 95%, shield effectiveness are greater than the production of the electromagnetic wave shield film of 60dB;
5) it using the electromagnetic wave shield film of inversion membrane technology production, is coated on polyimide solution PI after depositing and removing photoresist
Conductive substrates on, removed after heat cure forms a film, the thickness of PI film is only several microns to more than ten microns (5-15 μm).This is super
Thin electromagnetic shielded film can be fitted in the labyrinth surface of any shape, the electromagnetic shielding device that production has complex topography to require
Part.There is high-temperature stability simultaneously;
6) electromagnetic wave shield film can be made by nanometer embossing, and uv-curable glue is coated on leading after depositing and removing photoresist
In electric substrate, and PET film is overlying on thereon, and with ultraviolet light irradiation.Ultraviolet glue solidifies after irradiating, and is adhered to PET lining
On bottom.After PET and conductive substrates removing, the metal mesh grid-type electromagnetic wave shield film being embedded in uv-curable glue is obtained;
7) electromagnetic shielding film can be made by hot press printing technology, and COC film is covered in the conductive substrates after depositing and removing photoresist
On, and apply certain temperature (more than the glass transition temperature of COC film) and pressure.After COC film and conductive substrates separation,
Obtain the electromagnetic wave shield film inside insertion COC;
8) substrate can be, but not limited to PI, PET, PEN, the fexible films such as COC.Since wire grating damascene is in flexibility
In substrate, in the case where crooked process radius is less than 3mm, electromagnet shield effect is decayed less than 5%, and is shown excellent anti-scratch
Wipe performance.
It is as follows specific to each embodiment:
Embodiment one: super thin metal grid electromagnetic wave shield film.Production process, first according to shield effectiveness needs, design
The arrangement mode of metallic mesh structure can be the periods such as hexagon, square, rectangle, parallelogram, triangle row
Cloth, or any shape changeable arrangement etc., the line width (300nm-10 μm) of grid, the parameters such as grid spacing (1-500 μm), then
Pass through graphical (technologies such as laser direct-writing, uv-exposure, electron beam exposure) technology shape on the electrically-conductive backing plate of coating photoresist
At graphical grid structure.Patterned conductive substrate is placed in galvanic deposition cell cathode, and anode places the metal material for needing to deposit
(nickel, copper, gold, aluminium, silver etc.), using the selection deposition of electro-deposition, the metal on anode is gradually deposited by positive-ion mode
In conductive mesh gate groove on cathode, deposition layer not will form in the region of photoresist overlay.At this point, in conductive substrates
Photoresist trenched side-wall has certain depth (200nm-10 μm), then the deposition process of cation is constrained on 300nm-10 μm
In conductive trench, shape and line width and the shape of grid groove are identical as line width.By controlling additional electric current on the electrode
Intensity (500mA-20A), sedimentation time (20-4000s), cathode at a distance from anode (20-300mm) etc., can control gold
Belong to the deposition thickness (300nm-3 μm) of material.Then the conductive substrates of deposited metal grid layer are placed in glue, it will be conductive
Photoresist removal on substrate, only retains the metallic mesh being deposited in conductive substrates.Then PI polyimide solution is coated with
It in the conductive substrates, is removed after heat cure forms a film, obtains super thin metal grid electromagnetic wave shield film.
According to the difference (spin coating, curtain coating, blade coating etc.) of coating method, the thickness of controllable PI film, the thickness of PI film
Only several microns to more than ten microns (5-15 μm).It is embedded in due to metallic mesh structure 1 among ultra-thin PI film 2, makes the screen
Bending of the radius less than 20 μm can be born by covering film.The metal material of the electromagnetic wave shield film, which is that nickel, copper, gold, aluminium, silver etc. are excellent, leads
Body, grid arrangement can be square, and be also possible to the periods such as hexagon, rectangle and aperiodic row in other embodiments
Cloth.The ultra-thin type electromagnetic shielded film can be fitted in the labyrinth surface of any shape, the electricity that production has complex topography to require
Magnetic screen device.
Embodiment two, the metal mesh grid-type electromagnetic wave shield film being embedded in uv-curable glue.A kind of according to embodiment
Production process makes metallic mesh structure by selective electrodeposition technique in conductive substrates.According to design requirement, gold is formed
Belong to the line width (300nm-10 μm) of grid, grid spacing (10-500 μm), metal deposition layer thickness (300nm-10 μm).Then handle
Uv-curable glue, which is coated on, to be deposited and in the conductive substrates after removing photoresist, and PET film is overlying on thereon, and with ultraviolet light irradiation.
Uv-curable glue solidifies after light irradiates, and is adhered to 3 on PET substrate.After PET and conductive substrates removing, metallic mesh 4 is inlayed
5 form electromagnetic wave shield film in uv-curable glue.The transmitance of electromagnetic wave shield film accounts for whole point by metallic mesh part
Ratio (< 5%) determine, and the width of wiregrating by groove is restricted (300nm-10 μm), it can be achieved that electromagnetic wave shield film it is saturating
Cross rate > 95%, shield effectiveness is greater than 60dB.
In this embodiment, the conductive substrates used can be flexible or rigid basement, when use compliant conductive base
When bottom (flexible metal sheet, fexible film of metallization etc.), during metallic mesh structure is transferred to PET substrate, it can be used
Roll-to-roll nano impression mode is more suitable for the production of large format, high transparency, high shield effectiveness electromagnetic shielding film.
Embodiment three, embedded electromagnetic wave shield film.According to the production process of embodiment one kind, pass through in conductive substrates
Selective electrodeposition technique makes metallic mesh structure.According to design requirement, the line width (300nm-10 μm) of metallic mesh is formed,
Grid spacing (10-500 μm), metal deposition layer thickness (300nm-10 μm).Then COC film is covered in after depositing and removing photoresist
Conductive substrates on, and apply certain temperature (more than the glass transition temperature of COC film) and pressure.By hot press printing technology,
Inside metallic mesh insertion COC film.After COC film and conductive substrates separation, the electromagnetic shielding inside insertion COC is obtained
Film.
All above-mentioned this intellectual properties of primarily implementation, there is no this new products of implementation of setting limitation other forms
And/or new method.Those skilled in the art will utilize this important information, above content modification, to realize similar execution feelings
Condition.But all modifications or transformation belong to the right of reservation based on new product of the present invention.
The above described is only a preferred embodiment of the present invention, being not that the invention has other forms of limitations, appoint
What those skilled in the art changed or be modified as possibly also with the technology contents of the disclosure above equivalent variations etc.
Imitate embodiment.But without departing from the technical solutions of the present invention, according to the technical essence of the invention to above embodiments institute
Any simple modification, equivalent variations and the remodeling made, still fall within the protection scope of technical solution of the present invention.
Claims (7)
1. a kind of display equipment of protection electromagnetic information leakage, mainly by liquid crystal display, outline border, mainboard, rear shell, feature exists
In: have electromagnetic shielding film on liquid crystal display, liquid crystal display is embedded in outline border.
2. a kind of display equipment of protection electromagnetic information leakage according to claim 1, which is characterized in that liquid crystal display
Wire mesh is accompanied between electromagnetic shielding film.
3. a kind of display equipment of protection electromagnetic information leakage according to claims 1 and 2, which is characterized in that wire
Net is copper fiber.
4. a kind of display equipment of protection electromagnetic information leakage according to claims 1 and 2, which is characterized in that electromagnetic screen
Cover the production method of film the following steps are included:
1) then the coating photoresist on electrically-conductive backing plate forms graphic structure on the electrically-conductive backing plate by photoetching process;
2) metal layer is grown in the graphic structure by selective electrodeposition technique, forms metal pattern configuration;
3) metal pattern configuration is inlayed to flexible base material by imprint process, forms electromagnetic shielding film.
5. according to claim 1 to the display equipment that a kind of protection electromagnetic information described in 4 is revealed, which is characterized in that the step
It is rapid 3) in, specifically: polyimide solution is coated on the electrically-conductive backing plate, is removed after heat cure forms a film, described in formation
Electromagnetic shielding film.
6. according to claim 1 to the display equipment that a kind of protection electromagnetic information described in 5 is revealed, which is characterized in that the step
It is rapid 3) in, specifically: uv-curable glue is coated on the electrically-conductive backing plate, and PET film is overlying on thereon, and uses ultraviolet lamp
Irradiation, the uv-curable glue solidifies after irradiating, and is adhered in the PET film, the PET film and the conduction
After strippable substrate, the electromagnetic shielding film is obtained.
7. according to claim 1 to the display equipment that a kind of protection electromagnetic information described in 6 is revealed, which is characterized in that the step
It is rapid 3) in, specifically: COC film is covered on the electrically-conductive backing plate, and temperature and pressure is applied to it, the COC is thin
After film and electrically-conductive backing plate separation, the electromagnetic shielding film is obtained.
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CN201810867787.XA CN108983471A (en) | 2018-08-01 | 2018-08-01 | A kind of display equipment of protection electromagnetic information leakage |
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CN201810867787.XA CN108983471A (en) | 2018-08-01 | 2018-08-01 | A kind of display equipment of protection electromagnetic information leakage |
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CN1457630A (en) * | 2001-03-02 | 2003-11-19 | 日立化成工业株式会社 | Electromagnetic shield film, electromagnetic shield unit and display |
CN1482853A (en) * | 2002-12-23 | 2004-03-17 | 北京安方电磁屏蔽技术开发中心 | High shielding effect information leakage preventing glass |
CN106061218A (en) * | 2016-06-14 | 2016-10-26 | 苏州大学 | Preparation methods of electromagnetic shielding film and electromagnetic shielding window |
CN106773197A (en) * | 2015-11-20 | 2017-05-31 | 北京计算机技术及应用研究所 | A kind of display of use EN-EMC glass |
CN206920759U (en) * | 2017-03-26 | 2018-01-23 | 莆田市佳阳电子有限公司 | A kind of liquid crystal display of anti electromagnetic wave |
-
2018
- 2018-08-01 CN CN201810867787.XA patent/CN108983471A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1457630A (en) * | 2001-03-02 | 2003-11-19 | 日立化成工业株式会社 | Electromagnetic shield film, electromagnetic shield unit and display |
CN1482853A (en) * | 2002-12-23 | 2004-03-17 | 北京安方电磁屏蔽技术开发中心 | High shielding effect information leakage preventing glass |
CN106773197A (en) * | 2015-11-20 | 2017-05-31 | 北京计算机技术及应用研究所 | A kind of display of use EN-EMC glass |
CN106061218A (en) * | 2016-06-14 | 2016-10-26 | 苏州大学 | Preparation methods of electromagnetic shielding film and electromagnetic shielding window |
CN206920759U (en) * | 2017-03-26 | 2018-01-23 | 莆田市佳阳电子有限公司 | A kind of liquid crystal display of anti electromagnetic wave |
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