CN108983471A - A kind of display equipment of protection electromagnetic information leakage - Google Patents

A kind of display equipment of protection electromagnetic information leakage Download PDF

Info

Publication number
CN108983471A
CN108983471A CN201810867787.XA CN201810867787A CN108983471A CN 108983471 A CN108983471 A CN 108983471A CN 201810867787 A CN201810867787 A CN 201810867787A CN 108983471 A CN108983471 A CN 108983471A
Authority
CN
China
Prior art keywords
film
electromagnetic
display equipment
backing plate
electrically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810867787.XA
Other languages
Chinese (zh)
Inventor
严瑾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Change Intelligent Technology Co Ltd
Original Assignee
Guangdong Change Intelligent Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Change Intelligent Technology Co Ltd filed Critical Guangdong Change Intelligent Technology Co Ltd
Priority to CN201810867787.XA priority Critical patent/CN108983471A/en
Publication of CN108983471A publication Critical patent/CN108983471A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133308Support structures for LCD panels, e.g. frames or bezels
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/35Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being liquid crystals
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0007Casings
    • H05K9/0054Casings specially adapted for display applications
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133308Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133334Electromagnetic shields

Abstract

The present invention provides a kind of display equipment of protection electromagnetic information leakage, mainly by liquid crystal display, outline border, mainboard, rear shell, has electromagnetic shielding film on liquid crystal display, liquid crystal display is embedded in outline border, wire mesh is accompanied between liquid crystal display and electromagnetic shielding film, this display equipment shows that clear, temperature tolerance is good, the leakage of electromagnetic information can be effectively prevented.

Description

A kind of display equipment of protection electromagnetic information leakage
Technical field
The present invention relates to EM Information Protection Technology field, the display for being specifically related to a kind of protection electromagnetic information leakage is set It is standby.
Background technique
Electromagnetic leakage refers to that spuious (parasitism) electromagnetic energy of electronic equipment passes through conducting wire or space to external diffusion.Any place In the electromagnetic information equipment of working condition, such as: all there is different degrees of electricity in computer, printer, facsimile machine, telephone set Magnetic dispersion, this is the electromagnetism phenomenon that can not be got rid of.If information handled by equipment " is carried " in these leakages secretly, just constitute So-called electromagnetic information leakage.In fact, nearly all electromagnetic leakage all " carries " information handled by equipment secretly, only degree It is different.Under the premise of meeting certain condition, it can receive with specific instrument and restore these information.Therefore, Once related information is secrecy, these leakages have just threatened information security.
Data show that: the information electromagnetic wave of common computer display terminal radiation can be even one kilometer in several hundred rice It is received and reappears outside;The leakage information of the information processings such as normal printer, facsimile machine, telephone set and transmission device, can also be with It intercepts and captures and restores by limited means in certain distance.The reception of this leaked information and reduction technique, at present It is used to steal the means of valuable information of other country as many national intelligence mechanisms.
Certainly, it is not unconditional for restoring to the intercepting and capturing of leaked information, and only intensity and signal-to-noise ratio meet certain The signal of condition can be trapped and restore.Therefore, as long as taking certain measure, the intensity of leakage signal is weakened, is reduced The signal-to-noise ratio of leakage signal, so that it may achieve the purpose that electromagnetic protection.
The electromagnetic leakage of equipment is propagated outward by radiating and conducting two kinds of approach.Radiation leakage be stray electromagnetic energy with Electromagnetic wave is radiate through device housings, the various slits on shell, connecting cable etc.;Leakage is spuious electromagnetism Energy is conducted by various routes (including power supply line, signal wire etc.).The two is interrelated, that is, there is mutually " energy friendship Change " phenomenon: on the one hand, the stray electromagnetic energy conducted along the line can be partially converted into electromagnetism amplitude because of the antenna effect of conducting wire It is shot out;On the other hand, the stray electromagnetic energy for being radiated space can be coupled on outer even conducting wire again because of the antenna effect of conducting wire. The electromagnetic information that equipment leakage is gone out can be divided into " red signal " and " black signal " two parts.Red signal is and equipment is handled or transmitted Information-related signal;Black signal is the signal unrelated with equipment processing or the information transmitted.It constitutes a threat to information security Mainly " red signal ".
Common electromagnetic protection measure has: shielding, filtering, isolation, reasonably ground connection and good overlap joint, selects low leakage Equipment is reasonably laid out and using interference unit etc..
Source of leaks, is exactly encapsulated with shielding material by shielding.Shielding can both prevent from shielding intracorporal source of leaks generation Electromagnetic-wave leakage gone to exterior space, and external electromagnetic wave can be made to terminate at shield.Therefore, shielding has both reached and has prevented The purpose of information leakage, while having had both again and prevent external strong electromagnetic radiation, as " ELECTROMAGNETIC BOMB " in electronic warfare is hard to equipment The effect of killing.Shielding is to inhibit the most effective means of radiation leakage, but cost is higher.
Filtering is to inhibit one of the main method of leakage.Installing suitable filter on power supply line or signal wire additional can be with The access of leakage is blocked, to inhibit leakage significantly.
Ground connection and overlap joint are also the effective ways for inhibiting leakage.Good ground connection and overlap joint can give spuious electromagnetism Energy one leads to the low-resistance circuit of the earth, to shunt to fall to transfer out through power supply line and signal wire to a certain extent Stray electromagnetic energy.The technologies such as this method and shielding, filtering are used cooperatively, it can to the electromagnetic leakage for inhibiting electronic equipment It plays a multiplier effect.
Isolation and rational deployment are to reduce the effective means of electromagnetic leakage.Isolation is emphasis will to be needed to prevent in information system The equipment of shield is separated from system, is especially protected, and cuts off itself and equipment room electromagnetic leakage accesses other in system. Rational deployment refers to reduce electromagnetic leakage as the related equipment in principle reasonably placement information system.Rational deployment also includes Secrecy-involved apparatus is widened as far as possible at a distance from insecure area (public place).Selecting low leakage equipment is also to reduce electromagnetic leakage One of effective means, low leakage available at present are divided to complete containing type and red-black two kinds of divergence type.
Interference unit is a kind of electronic instrument that can give off electromagnetic noise.It is let out by increasing electromagnetic noise reduction radiation The overall signal-to-noise ratio of information is leaked, Enhanced Radiation Reduced Blast information cracks the difficulty of reduction after being trapped, to reach " cover " real information Purpose.This is a kind of preventive means of relative inexpensiveness.But the reliability of protection is also relatively poor, because radiation of equipment goes out Information content do not reduce.It is, in principle, that with suitable information processing means, it is possible to restoring useful information, only It is the opposite increase of difficulty of reduction.In addition, also will increase the electromagnetic pollution of ambient enviroment using interference unit, to other electromagnetic compatibilities Property poor electronic information equipment normal work constitute certain threat.Certainly, before no other effective protection means It puts, interference unit must also be used as emergency measure.
Summary of the invention
Technical problem to be solved by the invention is to provide a kind of screen transparency height, temperature tolerance is good, effectively prevent electromagnetism The electromagnetic shielding of information leakage shows equipment.
In order to solve the above technical problems, the present invention provides the display equipment of protection electromagnetic information leakage, which is characterized in that
Mainly by liquid crystal display, outline border, mainboard, rear shell, has electromagnetic shielding film on liquid crystal display.
Wire mesh is accompanied between liquid crystal display and electromagnetic shielding film.
Wire mesh is copper fiber.
The production method of electromagnetic shielding film the following steps are included:
1) then the coating photoresist on electrically-conductive backing plate forms figure knot by photoetching process on the electrically-conductive backing plate Structure;
2) metal layer is grown in the graphic structure by selective electrodeposition technique, forms metal pattern configuration;
3) metal pattern configuration is inlayed to flexible base material by imprint process, forms electromagnetic shielding film.
In the step 3), specifically: stupid amine aqueous solution will be gathered and be coated on the electrically-conductive backing plate, shelled after heat cure forms a film From forming the electromagnetic shielding film.
In the step 3), specifically: uv-curable glue is coated on the electrically-conductive backing plate, and PET film is overlying on Thereon, and with ultraviolet light irradiation, the uv-curable glue solidifies after irradiating, and is adhered in the PET film, described in After PET film and electrically-conductive backing plate removing, the electromagnetic shielding film is obtained.
In the step 3), specifically: COC film is covered on the electrically-conductive backing plate, and temperature and pressure are applied to it Power obtains the electromagnetic shielding film after the COC film and electrically-conductive backing plate separation.
The present invention also has the advantage that compared with prior art
1) electromagnetic wave shield film proposed by the present invention made using inversion membrane technique, PI film thickness is only several to more than ten Micron is, it can be achieved that ultra-thin type electromagnetic shielded film;
2) proposed by the present invention to make electromagnetic shielding film using selective electrodeposition, line width can be made in several hundred nanometers to micro- The metallic mesh structure of rice guarantees the high light transmittance (being greater than 95%) of electromagnetic shielding film since the metallic mesh is that deposition is formed Meanwhile realizing high shield effectiveness (being greater than 60dB);
3) metallic mesh is embedded in using nanometer embossing or hot press printing technology the ditch of solidification glue or base material Among slot, rather than be adhered to surface, it can be achieved that crooked process radius be less than 3mm electromagnetic wave shield film, and surface be not easy by Pollution scratches;
4) compared with the prior art, the high grade of transparency electromagnetic shielding film that the present invention makes, is not related to vacuum evaporation process, can Keep cost of manufacture lower, more efficient.
Specific embodiment
The following detailed description of the preferred embodiment of the present invention.
It is for the overall evaluation of a technical project of the present embodiment: micro- metal grill is embedded in by PI material by micro-nano technology technology Inside, flexible, be not easy to scratch, heatproof is high, transparency is good, electromagnet shield effect is strong.Particular technique design: photoetching technique is utilized (technologies such as laser direct-writing, uv-exposure, electron beam exposure), on electrically-conductive backing plate (metal, metallized flexible conductive film, The conductive substrates such as ITO, FTO glass) form grid structure;With selective electrodeposition technique, metal is grown in grid structure Layer (metals such as nickel, copper, gold);Using nano impression (hot padding, inversion membrane technology) technology metallic mesh damascene to soft Property base material inside, be made electromagnetic wave shield film.
The technical solution of the present embodiment is specifically as follows:
1) grid production is preset on electrically-conductive backing plate: according to performance requirement (light transmittance, shield effectiveness, the height of electromagnetic shielding film Diffraction time delustring etc.), the arrangement mode (periods such as hexagonal honeycomb shape, square, parallelogram row of design grid grid structure Aperiodic arrangement of cloth, arbitrary polygon etc.), the line width (300nm-10 μm) of grid, the parameters such as grid spacing (10 μm -500 μm), Then by graphical (technologies such as laser direct-writing, the uv-exposure, electron beam exposure) technology of micro nano structure in coating photoresist Electrically-conductive backing plate on form graphic structure;
2) selective deposition grows metal mesh grid layer: patterned conductive substrate is placed in galvanic deposition cell cathode, and anode, which is placed, to be needed The metal material to be deposited has metal material in the grid trench portions for appearing conductive substrates using the selection deposition of electro-deposition Material deposition, not will form deposition layer in the region of photoresist overlay.By controlling additional current strength on the electrode (500mA-50A), sedimentation time (20s-6000s), cathode at a distance from anode (20mm-300mm) etc., can control metal The deposition thickness (300nm-10 μm) of material;
3) embedded metal grid is electromagnetically shielded film production: the conductive substrates of deposited metal grid layer are placed in glue In, the photoresist on electrically-conductive backing plate is removed, the metallic mesh being deposited in conductive substrates is only retained.Utilize nanometer embossing (hot padding, inversion membrane technology etc.), the metallic mesh in conductive substrates is embedded in inside non-transparent flexible substrate, forms electromagnetic screen Cover film;
4) thickness of sedimentary is influenced by conduction time, current strength, electrode spacing, and deposit thickness is bigger, electricity Conductance is higher.The thickness (300nm-10 μm) of sedimentary can be controlled by the parameter of regulation electro-deposition.Electromagnetic wave shield film it is saturating Rate is crossed to be determined by the ratio (< 5%) that metallic mesh part accounts for whole point, and the width of wiregrating is restricted (200nm-10 by groove μm), it can be achieved that transmitance > 95%, shield effectiveness are greater than the production of the electromagnetic wave shield film of 60dB;
5) it using the electromagnetic wave shield film of inversion membrane technology production, is coated on polyimide solution PI after depositing and removing photoresist Conductive substrates on, removed after heat cure forms a film, the thickness of PI film is only several microns to more than ten microns (5-15 μm).This is super Thin electromagnetic shielded film can be fitted in the labyrinth surface of any shape, the electromagnetic shielding device that production has complex topography to require Part.There is high-temperature stability simultaneously;
6) electromagnetic wave shield film can be made by nanometer embossing, and uv-curable glue is coated on leading after depositing and removing photoresist In electric substrate, and PET film is overlying on thereon, and with ultraviolet light irradiation.Ultraviolet glue solidifies after irradiating, and is adhered to PET lining On bottom.After PET and conductive substrates removing, the metal mesh grid-type electromagnetic wave shield film being embedded in uv-curable glue is obtained;
7) electromagnetic shielding film can be made by hot press printing technology, and COC film is covered in the conductive substrates after depositing and removing photoresist On, and apply certain temperature (more than the glass transition temperature of COC film) and pressure.After COC film and conductive substrates separation, Obtain the electromagnetic wave shield film inside insertion COC;
8) substrate can be, but not limited to PI, PET, PEN, the fexible films such as COC.Since wire grating damascene is in flexibility In substrate, in the case where crooked process radius is less than 3mm, electromagnet shield effect is decayed less than 5%, and is shown excellent anti-scratch Wipe performance.
It is as follows specific to each embodiment:
Embodiment one: super thin metal grid electromagnetic wave shield film.Production process, first according to shield effectiveness needs, design The arrangement mode of metallic mesh structure can be the periods such as hexagon, square, rectangle, parallelogram, triangle row Cloth, or any shape changeable arrangement etc., the line width (300nm-10 μm) of grid, the parameters such as grid spacing (1-500 μm), then Pass through graphical (technologies such as laser direct-writing, uv-exposure, electron beam exposure) technology shape on the electrically-conductive backing plate of coating photoresist At graphical grid structure.Patterned conductive substrate is placed in galvanic deposition cell cathode, and anode places the metal material for needing to deposit (nickel, copper, gold, aluminium, silver etc.), using the selection deposition of electro-deposition, the metal on anode is gradually deposited by positive-ion mode In conductive mesh gate groove on cathode, deposition layer not will form in the region of photoresist overlay.At this point, in conductive substrates Photoresist trenched side-wall has certain depth (200nm-10 μm), then the deposition process of cation is constrained on 300nm-10 μm In conductive trench, shape and line width and the shape of grid groove are identical as line width.By controlling additional electric current on the electrode Intensity (500mA-20A), sedimentation time (20-4000s), cathode at a distance from anode (20-300mm) etc., can control gold Belong to the deposition thickness (300nm-3 μm) of material.Then the conductive substrates of deposited metal grid layer are placed in glue, it will be conductive Photoresist removal on substrate, only retains the metallic mesh being deposited in conductive substrates.Then PI polyimide solution is coated with It in the conductive substrates, is removed after heat cure forms a film, obtains super thin metal grid electromagnetic wave shield film.
According to the difference (spin coating, curtain coating, blade coating etc.) of coating method, the thickness of controllable PI film, the thickness of PI film Only several microns to more than ten microns (5-15 μm).It is embedded in due to metallic mesh structure 1 among ultra-thin PI film 2, makes the screen Bending of the radius less than 20 μm can be born by covering film.The metal material of the electromagnetic wave shield film, which is that nickel, copper, gold, aluminium, silver etc. are excellent, leads Body, grid arrangement can be square, and be also possible to the periods such as hexagon, rectangle and aperiodic row in other embodiments Cloth.The ultra-thin type electromagnetic shielded film can be fitted in the labyrinth surface of any shape, the electricity that production has complex topography to require Magnetic screen device.
Embodiment two, the metal mesh grid-type electromagnetic wave shield film being embedded in uv-curable glue.A kind of according to embodiment Production process makes metallic mesh structure by selective electrodeposition technique in conductive substrates.According to design requirement, gold is formed Belong to the line width (300nm-10 μm) of grid, grid spacing (10-500 μm), metal deposition layer thickness (300nm-10 μm).Then handle Uv-curable glue, which is coated on, to be deposited and in the conductive substrates after removing photoresist, and PET film is overlying on thereon, and with ultraviolet light irradiation. Uv-curable glue solidifies after light irradiates, and is adhered to 3 on PET substrate.After PET and conductive substrates removing, metallic mesh 4 is inlayed 5 form electromagnetic wave shield film in uv-curable glue.The transmitance of electromagnetic wave shield film accounts for whole point by metallic mesh part Ratio (< 5%) determine, and the width of wiregrating by groove is restricted (300nm-10 μm), it can be achieved that electromagnetic wave shield film it is saturating Cross rate > 95%, shield effectiveness is greater than 60dB.
In this embodiment, the conductive substrates used can be flexible or rigid basement, when use compliant conductive base When bottom (flexible metal sheet, fexible film of metallization etc.), during metallic mesh structure is transferred to PET substrate, it can be used Roll-to-roll nano impression mode is more suitable for the production of large format, high transparency, high shield effectiveness electromagnetic shielding film.
Embodiment three, embedded electromagnetic wave shield film.According to the production process of embodiment one kind, pass through in conductive substrates Selective electrodeposition technique makes metallic mesh structure.According to design requirement, the line width (300nm-10 μm) of metallic mesh is formed, Grid spacing (10-500 μm), metal deposition layer thickness (300nm-10 μm).Then COC film is covered in after depositing and removing photoresist Conductive substrates on, and apply certain temperature (more than the glass transition temperature of COC film) and pressure.By hot press printing technology, Inside metallic mesh insertion COC film.After COC film and conductive substrates separation, the electromagnetic shielding inside insertion COC is obtained Film.
All above-mentioned this intellectual properties of primarily implementation, there is no this new products of implementation of setting limitation other forms And/or new method.Those skilled in the art will utilize this important information, above content modification, to realize similar execution feelings Condition.But all modifications or transformation belong to the right of reservation based on new product of the present invention.
The above described is only a preferred embodiment of the present invention, being not that the invention has other forms of limitations, appoint What those skilled in the art changed or be modified as possibly also with the technology contents of the disclosure above equivalent variations etc. Imitate embodiment.But without departing from the technical solutions of the present invention, according to the technical essence of the invention to above embodiments institute Any simple modification, equivalent variations and the remodeling made, still fall within the protection scope of technical solution of the present invention.

Claims (7)

1. a kind of display equipment of protection electromagnetic information leakage, mainly by liquid crystal display, outline border, mainboard, rear shell, feature exists In: have electromagnetic shielding film on liquid crystal display, liquid crystal display is embedded in outline border.
2. a kind of display equipment of protection electromagnetic information leakage according to claim 1, which is characterized in that liquid crystal display Wire mesh is accompanied between electromagnetic shielding film.
3. a kind of display equipment of protection electromagnetic information leakage according to claims 1 and 2, which is characterized in that wire Net is copper fiber.
4. a kind of display equipment of protection electromagnetic information leakage according to claims 1 and 2, which is characterized in that electromagnetic screen Cover the production method of film the following steps are included:
1) then the coating photoresist on electrically-conductive backing plate forms graphic structure on the electrically-conductive backing plate by photoetching process;
2) metal layer is grown in the graphic structure by selective electrodeposition technique, forms metal pattern configuration;
3) metal pattern configuration is inlayed to flexible base material by imprint process, forms electromagnetic shielding film.
5. according to claim 1 to the display equipment that a kind of protection electromagnetic information described in 4 is revealed, which is characterized in that the step It is rapid 3) in, specifically: polyimide solution is coated on the electrically-conductive backing plate, is removed after heat cure forms a film, described in formation Electromagnetic shielding film.
6. according to claim 1 to the display equipment that a kind of protection electromagnetic information described in 5 is revealed, which is characterized in that the step It is rapid 3) in, specifically: uv-curable glue is coated on the electrically-conductive backing plate, and PET film is overlying on thereon, and uses ultraviolet lamp Irradiation, the uv-curable glue solidifies after irradiating, and is adhered in the PET film, the PET film and the conduction After strippable substrate, the electromagnetic shielding film is obtained.
7. according to claim 1 to the display equipment that a kind of protection electromagnetic information described in 6 is revealed, which is characterized in that the step It is rapid 3) in, specifically: COC film is covered on the electrically-conductive backing plate, and temperature and pressure is applied to it, the COC is thin After film and electrically-conductive backing plate separation, the electromagnetic shielding film is obtained.
CN201810867787.XA 2018-08-01 2018-08-01 A kind of display equipment of protection electromagnetic information leakage Pending CN108983471A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810867787.XA CN108983471A (en) 2018-08-01 2018-08-01 A kind of display equipment of protection electromagnetic information leakage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810867787.XA CN108983471A (en) 2018-08-01 2018-08-01 A kind of display equipment of protection electromagnetic information leakage

Publications (1)

Publication Number Publication Date
CN108983471A true CN108983471A (en) 2018-12-11

Family

ID=64554969

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810867787.XA Pending CN108983471A (en) 2018-08-01 2018-08-01 A kind of display equipment of protection electromagnetic information leakage

Country Status (1)

Country Link
CN (1) CN108983471A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1457630A (en) * 2001-03-02 2003-11-19 日立化成工业株式会社 Electromagnetic shield film, electromagnetic shield unit and display
CN1482853A (en) * 2002-12-23 2004-03-17 北京安方电磁屏蔽技术开发中心 High shielding effect information leakage preventing glass
CN106061218A (en) * 2016-06-14 2016-10-26 苏州大学 Preparation methods of electromagnetic shielding film and electromagnetic shielding window
CN106773197A (en) * 2015-11-20 2017-05-31 北京计算机技术及应用研究所 A kind of display of use EN-EMC glass
CN206920759U (en) * 2017-03-26 2018-01-23 莆田市佳阳电子有限公司 A kind of liquid crystal display of anti electromagnetic wave

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1457630A (en) * 2001-03-02 2003-11-19 日立化成工业株式会社 Electromagnetic shield film, electromagnetic shield unit and display
CN1482853A (en) * 2002-12-23 2004-03-17 北京安方电磁屏蔽技术开发中心 High shielding effect information leakage preventing glass
CN106773197A (en) * 2015-11-20 2017-05-31 北京计算机技术及应用研究所 A kind of display of use EN-EMC glass
CN106061218A (en) * 2016-06-14 2016-10-26 苏州大学 Preparation methods of electromagnetic shielding film and electromagnetic shielding window
CN206920759U (en) * 2017-03-26 2018-01-23 莆田市佳阳电子有限公司 A kind of liquid crystal display of anti electromagnetic wave

Similar Documents

Publication Publication Date Title
CN208029314U (en) A kind of electromagnetic shielding film
US9513730B2 (en) Conductive substrate and touch panel comprising same
US8846182B2 (en) Process for producing transparent conductive transfer plate, transparent conductive transfer plate, process for producing transparent conductive substrate using the transparent conductive transfer plate, transparent conductive substrate, and molded product using the transparent conductive substrate
CN106061218A (en) Preparation methods of electromagnetic shielding film and electromagnetic shielding window
WO2007137486A1 (en) Electromagnetic shielded film and its manufacturing method
US8895429B2 (en) Micro-channel structure with variable depths
CN102006729B (en) Method for manufacturing printed board with long and short connectors
US20130286609A1 (en) Systems and methods for shielding circuitry from interference with conformal coating
CN102356181B (en) Method for providing a conductive material structure on a carrier
CN109554665A (en) A kind of evaporation coating method, vapor deposition exposure mask mould group, display panel and display device
TWI711950B (en) Touch panel sensor
US20150268756A1 (en) Multi-area micro-wire structure
US20150268770A1 (en) Multi-layer micro-wire structure
CN108983471A (en) A kind of display equipment of protection electromagnetic information leakage
CN103582299B (en) Protective device
CN205752508U (en) Housing, antenna assembly and mobile terminal
CN111052267A (en) Electrode film and method for producing same
CN109032408A (en) A kind of preparation method of touch screen, display device and touch screen
CN209861471U (en) Transparent electromagnetic shielding film structure
CN109922645B (en) Transparent electromagnetic shielding film structure and preparation method thereof
JP2002317280A (en) Metallized plastic film
CN106550536A (en) A kind of circuit board and preparation method thereof
US9167700B2 (en) Micro-channel connection method
CN205812492U (en) A kind of printed circuit board and phone housing
CN209410709U (en) A kind of electromagnetic shielding bag

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20181211

RJ01 Rejection of invention patent application after publication