CN108957940A - Mask plate component, its exposure mask plate body straightening method and exposure mask plate body exposure method - Google Patents
Mask plate component, its exposure mask plate body straightening method and exposure mask plate body exposure method Download PDFInfo
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- CN108957940A CN108957940A CN201710366560.2A CN201710366560A CN108957940A CN 108957940 A CN108957940 A CN 108957940A CN 201710366560 A CN201710366560 A CN 201710366560A CN 108957940 A CN108957940 A CN 108957940A
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- China
- Prior art keywords
- mask plate
- plate body
- exposure mask
- deformation
- component
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Abstract
The embodiment of the invention provides a kind of mask plate component, its exposure mask plate body straightening method and exposure mask plate body exposure methods, it solves after being exposed process based on existing mask plate, the problem for being located at different location in surface of semi-finished but having the size of the mask pattern of same design inconsistent.A kind of mask plate component that one embodiment of the invention provides includes: exposure mask plate body；Shape changing detection component is configured to detect the deformation size of the exposure mask plate body；And deformation corrective component, it is configured to correct the deformation of the exposure mask plate body.
Description
Technical field
The present invention relates to field of display technology, and in particular to a kind of mask plate component, mask plate component exposure mask plate body rectify
Shape method and exposure mask plate body exposure method.
Background technique
Mask plate is widely used in the manufacturing process of display equipment as the crucial apparatus in photoetching process.?
When needing to carry out photoetching process, need the mask plate including pierced pattern being placed on surface of semi-finished, then by exposed
Journey will stay in surface of semi-finished by the mask pattern that photoresist forms by mask plate shielding.In an ideal case, such as Fig. 1 a institute
Show, the size of the mask pattern of same design should be consistent everywhere in the surface of semi-finished after exposure, and should with it is right on mask plate
The design size answered is identical.But in actual production process, as shown in Figure 1 b, according to dress of the mask plate on exposure machine
Load mode is different, and mask plate can be because self gravity reason will appear the Bending Deformation that different degrees of central area is recessed, this
Kind of deformation will lead to the focus of exposure process not in one plane.In this way in the identical situation of light exposure, central area away from
From the light of surface of semi-finished away from close, light of the surrounding apart from surface of semi-finished is away from big (a1 < a2 < a3), so as to cause semi-finished product table
The exposure intensity that face different location is subject to is different, this, which will lead to, is located at different location but has same design in surface of semi-finished
Mask pattern size it is inconsistent.
Summary of the invention
In view of this, the embodiment of the invention provides a kind of mask plate component, its exposure mask plate body straightening method and mask plates
Body exposure method solves after being exposed process based on existing mask plate, and different location is located in surface of semi-finished but is had
The inconsistent problem of the size of the mask pattern of same design.
One embodiment of the invention provide a kind of mask plate component include:
Exposure mask plate body；
Shape changing detection component is configured to detect the deformation size of the exposure mask plate body；And
Deformation corrective component is configured to correct the deformation of the exposure mask plate body.
Wherein, the shape changing detection component includes: the multiple shape changing detection modules being distributed on the exposure mask plate body, respectively
It is configured to detect the deformation size on the exposure mask plate body different location.
Wherein, the multiple shape changing detection module is distributed in an array manner on the exposure mask plate body.
Wherein, the shape changing detection module includes:
The resistance value of voltage dependent resistor, the voltage dependent resistor changes with the variation of deformation size；
Resistance variations detection unit is electrically connected with the voltage dependent resistor, is configured to detect the resistance value of the voltage dependent resistor
Variation；And
Signal processor is electrically connected with the resistance variations detection unit, is configured to be detected according to the resistance variations single
The resistance change of member detection judges the deformation size of the voltage dependent resistor.
Wherein, the shape changing detection component only includes the signal processor, the signal processor and each institute
The resistance variations detection unit electrical connection in shape changing detection module is stated, is configured to according in each shape changing detection module
The resistance variations detection unit detection the resistance change judge the pressure in each shape changing detection module
The deformation size of power transformation resistance.
Wherein, the voltage dependent resistor and the resistance variations detection unit constitute wheatstone bridge structure.
Wherein, the deformation corrective component includes: the multiple pressure-driven mechanisms being set in the exposure mask plate body circumferential direction,
Each pressure-driven mechanism therein is configured to provide from the side of the exposure mask plate body to exposure mask plate body center side
To pressure, wherein the position of having an effect of the pressure is located at bottom of the side of the exposure mask plate body on gravity direction.
Wherein, the profile of the exposure mask plate body is projected as rectangle on gravity direction, wherein the deformation corrective component
It include: two pressure-driven mechanisms, described two pressure-driven mechanisms are set to symmetrical the two of the exposure mask plate body
Side.
The exposure mask plate body straightening method for the mask plate component that one embodiment of the invention provides,
The mask plate component further include: shape changing detection component is configured to detect the deformation size of the exposure mask plate body；With
And deformation corrective component, it is configured to correct the deformation of the exposure mask plate body；The straightening method includes:
Pass through the deformation size of exposure mask plate body described in the shape changing detection component detection；
Judge whether the deformation size of the exposure mask plate body is lower than preset threshold；And
If the result judged be it is no, the deformation of the exposure mask plate body is rectified by the deformation corrective component
Just, the step of described in returning by the deformation size of exposure mask plate body described in the shape changing detection component detection；If the judgement
It as a result is yes, end process.
The exposure mask plate body exposure method for the mask plate component that one embodiment of the invention provides, the mask plate component also wrap
Include: shape changing detection component is configured to detect the deformation size of the exposure mask plate body；And deformation corrective component, it is configured to institute
The deformation for stating exposure mask plate body is corrected；The exposure method includes:
The exposure mask plate body is placed in surface of semi-finished to be exposed；
Pass through the deformation size of exposure mask plate body described in the shape changing detection component detection；
Judge whether the deformation size of the exposure mask plate body is lower than preset threshold；And
If the result judged be it is no, the deformation of the exposure mask plate body is rectified by the deformation corrective component
Just, the step of described in returning by the deformation size of exposure mask plate body described in the shape changing detection component detection；If the judgement
As a result be it is yes, process is exposed to the surface of semi-finished for being covered with the exposure mask plate body.
A kind of mask plate component, its exposure mask plate body straightening method and exposure mask plate body exposure side provided in an embodiment of the present invention
Method, the deformation size after being placed in surface of semi-finished by shape changing detection component detection exposure mask plate body, and pass through deformation
Corrective component corrects the deformation of exposure mask plate body, central area occurs to eliminate exposure mask plate body because of self gravity reason
The Bending Deformation of recess.The focus of exposure process is in approximately the same plane in this way, the mask plate in the identical situation of light exposure
The light of body central area and peripheral regions apart from surface of semi-finished away from be also it is identical, therefore surface of semi-finished different location by
Exposure intensity be also identical.It is located at different location in surface of semi-finished but with the exposure mask figure of same design to ensure that
The size of case is able to maintain unanimously.
Detailed description of the invention
Fig. 1 a show a kind of use state diagram of mask plate of prior art offer in an ideal case.
Fig. 1 b show a kind of use state diagram of the mask plate of prior art offer in actual production process.
Fig. 2 show the exposure mask plate body of the mask plate component of one embodiment of the invention offer and the knot of shape changing detection component
Structure schematic diagram.
Fig. 3 show the structural schematic diagram of the shape changing detection module of mask plate component provided by one embodiment of the invention.
Fig. 4 show the voltage dependent resistor of mask plate component and resistance variations detection unit provided by one embodiment of the invention
The wheatstone bridge structural schematic diagram constituted.
Fig. 5 show the exposure mask plate body and deformation corrective component of mask plate component provided by one embodiment of the invention
Structural schematic diagram.
Fig. 6 a-6b show the orthopedic principle signal of exposure mask plate body of mask plate component provided by one embodiment of the invention
Figure.
Fig. 7 show the flow diagram of exposure mask plate body straightening method provided by one embodiment of the invention.
Fig. 8 show the flow diagram of exposure mask plate body exposure method provided by one embodiment of the invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that the described embodiment is only a part of the embodiment of the present invention, instead of all the embodiments.Based on this
Embodiment in invention, every other reality obtained by those of ordinary skill in the art without making creative efforts
Example is applied, shall fall within the protection scope of the present invention.
One embodiment of the invention provides a kind of mask plate component, comprising: exposure mask plate body, shape changing detection component and deformation are rectified
Positive component.Exposure mask plate body includes pierced pattern, and when needing to carry out photoetching process, which is placed on surface of semi-finished
On.Here surface of semi-finished is understood to be the display device surface that surface is coated with photoresist, passes through exposure process
The display device surface is stayed in by the mask pattern that photoresist forms by what is covered by exposure mask plate body.Shape changing detection component is configured to
The deformation size of exposure mask plate body is detected, deformation corrective component is configured to correct the deformation of exposure mask plate body.
It can be seen that shape changing detection component can be passed through by using mask plate component provided by the embodiment of the present invention
The deformation size after exposure mask plate body is placed in surface of semi-finished is detected, and passes through deformation of the deformation corrective component to exposure mask plate body
It is corrected, occurs the Bending Deformation of central area recess to eliminate exposure mask plate body because of self gravity reason.It exposes in this way
The focus of process is in approximately the same plane, exposure mask plate body central area and peripheral regions distance in the identical situation of light exposure
The light of surface of semi-finished is away from being also identical, therefore the exposure intensity that surface of semi-finished different location is subject to is also identical.From
And it ensure that the size for being located at different location but the mask pattern with same design in surface of semi-finished and be able to maintain unanimously.
It should be appreciated that the chamfered shape of exposure mask plate body itself and the shape of included pierced pattern can be according to reality
It needs and adjusts, the present invention does not limit the chamfered shape of exposure mask plate body itself and the shape of included pierced pattern
It is fixed.
Fig. 2 show the exposure mask plate body of the mask plate component of one embodiment of the invention offer and the knot of shape changing detection component
Structure schematic diagram.As shown in Fig. 2, shape changing detection component in the mask plate component is by multiple deformation for being distributed on exposure mask plate body 1
Detection module 21 is constituted, and the deformation that multiple shape changing detection module 21 is respectively configured on detection 1 different location of exposure mask plate body is big
It is small.
Although should be appreciated that in the embodiment shown in Figure 2, in order to guarantee to detect 1 all areas of exposure mask plate body
Deformation size, multiple shape changing detection module 21 can be with the formal distribution of array on exposure mask plate body 1, but in of the invention its
In his embodiment, multiple shape changing detection module 21 can also be distributed on exposure mask plate body 1 with other arrangement modes, and the present invention is to this
Distribution mode of multiple shape changing detection modules 21 on exposure mask plate body 1 is without limitation.
Fig. 3 show the structural schematic diagram of the shape changing detection module of mask plate component provided by one embodiment of the invention.
As shown in figure 3, the shape changing detection module 21 includes: voltage dependent resistor 211, resistance variations detection unit 212 and signal processor
213, wherein voltage dependent resistor can be resistance strain gage.Since voltage dependent resistor 211 has buckling characteristic, the electricity of voltage dependent resistor 211
Resistance value can change with the variation of deformation size.Resistance variations detection unit 212 is electrically connected with voltage dependent resistor 211, is configured to
The resistance change of voltage dependent resistor 211 is detected, and the resistance change is passed into signal processor 213.Signal processor 213
It is electrically connected with resistance variations detection unit 212, is configured to the resistance change judgement detected according to resistance variations detection unit 212
The deformation size of voltage dependent resistor 211.
In an embodiment of the present invention, in order to be further simplified the structure of shape changing detection component, shape changing detection component can be only
Resistance variations detection unit including a signal processor 213, in the signal processor 213 and each shape changing detection module 21
212 electrical connections, are configured to the resistance change detected according to the resistance variations detection unit 212 in each shape changing detection module 21
Judge the deformation size of the voltage dependent resistor 211 in each shape changing detection module 21.
In a further embodiment of the invention, voltage dependent resistor 211 and resistance variations detection unit 212 may make up a list
Arm bridge structure, in this way the resistance variations detection unit 212 are that the electricity of voltage dependent resistor 211 is detected by single armed connection in fact
Resistive.The structure of the wheatstone bridge can be as shown in figure 4, R therein1For voltage dependent resistor 211, and R1=R5=R6=R7, in this way
By measuring the voltage U in the wheatstone bridge structure between location A and B location0R can be characterized1Resistance change Δ R1.Tool
Body is as follows:
By U0=UA- UB=((R1+ΔR1)/(R1+ΔR1+R5)-R7/(R7+R6)) E obtains:
U0=(((R7+R6)(R1+△R1)-R7(R5+R1+ΔR1))/((R5+R1+ΔR1)(R7+R6)))E；
Due to R1=R5=R6=R7, and Δ R1/R1< < 1, therefore:
U0≈(1/4)(ΔR1/R1)E
Again due to R1Itself have piezoresistive characteristic, Δ R1/R1=K ε；Wherein K is sensitivity coefficient, and K=(1+2 μ), μ are pressure
Power transformation hinders R1The Poisson's ratio of material；ε is deformation size, therefore:
U0≈(1/4)(ΔR1/R1) E=(1/4) K ε E
It can be seen that the wheatstone bridge structure is by measured voltage value U0After passing to signal processor 213, at signal
Device 213 is managed according to voltage value U0It can obtain voltage dependent resistor R1Deformation size ε under current state.
Fig. 5 show the exposure mask plate body and deformation corrective component of mask plate component provided by one embodiment of the invention
Structural schematic diagram.As shown in figure 5, the deformation corrective component includes the multiple pressure-driven machines being set in 1 circumferential direction of exposure mask plate body
Structure 31, each pressure-driven mechanism 31 therein are configured to be provided from the side of exposure mask plate body 1 to 1 center position of exposure mask plate body
Pressure, wherein as shown in Figure 6 a, the position of having an effect of pressure is located at bottom of the side of exposure mask plate body 1 on gravity direction.In this way
As shown in Figure 6 b, exposure mask plate body 1 will because of side eccentric compression and generate the deformation of central area protrusion, to offset exposure mask
The Bending Deformation for the central area recess that plate body 1 occurs because of self gravity reason, to realize rectifying for exposure mask plate body 1
Shape effect.
Although should be appreciated that projection of the profile of exposure mask plate body 1 on gravity direction can in the embodiment shown in fig. 5
For rectangle, deformation corrective component may include the Liang Ge pressure-driven mechanism 31 for being set to the symmetrical two sides of exposure mask plate body 1.But according to
The chamfered shape of exposure mask plate body 1 is different, which may also include more pressure-driven mechanisms 31, and these pressure
Driving mechanism 31 can also be set in the circumferential direction of exposure mask plate body 1 with other distribution modes.The present invention is to pressure-driven mechanism 31
Quantity and distribution mode are without limitation.
In an embodiment of the present invention, which can be real in such a way that one is connected with the pressing plate of cylinder
Existing, cylinder provides power for pressing plate, and pressing plate is set to bottom of the side of exposure mask plate body 1 on gravity direction, so that exposure mask
It the side of plate body 1 being capable of eccentric compression.It should be appreciated, however, that the pressure-driven mechanism 31 can also pass through other driving methods reality
It is existing, the present invention to the specific structure and driving method of pressure-driven mechanism 31 without limitation.
Based on mask plate component described in any of the above embodiment, it is orthopedic that one embodiment of the invention provides a kind of mask plate
Method can complete the orthopaedic procedures for exposure mask plate body well.Specifically, as shown in fig. 7, the mask plate straightening method packet
Include following steps:
Step 701: passing through the deformation size of shape changing detection component detection exposure mask plate body 1.
Step 702: judging whether the deformation size of exposure mask plate body 1 is lower than preset threshold.
It should be appreciated that the size of the preset threshold can be by technical staff depending on actual demand, as long as exposure mask plate body 1
Deformation size be lower than the preset threshold, that is, think that the orthopaedic procedures of exposure mask plate body 1 finish, so that it may carry out subsequent exposed
Journey.
Step 703: if the result judged be it is no, the deformation of exposure mask plate body 1 is corrected by deformation corrective component, so
Return step 701 detects the deformation size of exposure mask plate body 1 again afterwards.Again detect exposure mask plate body 1 deformation size after again into
The deterministic process for entering step 702 loops back and forth like this until the deformation size for judging exposure mask plate body 1 enters lower than preset threshold
Step 704.
Step 704: if the result judged be it is yes, terminate the orthopaedic procedures for exposure mask plate body 1.
Based on the mask plate component as described in preceding any embodiment, one embodiment of the invention also provides a kind of mask plate exposure
Method, as shown in figure 8, the mask plate exposure method includes the following steps:
Step 801: exposure mask plate body 1 is placed in surface of semi-finished 4 to be exposed.Here surface of semi-finished 4 can be managed
Solution is the display device surface that surface is coated with photoresist, and exposure mask plate body 1 includes pierced pattern, after subsequent orthopedic,
The display device surface can be stayed in by the mask pattern that photoresist forms by what is covered by exposure mask plate body 1 by exposure process.
Step 802: passing through the deformation size of shape changing detection component detection exposure mask plate body 1.
Step 803: judging whether the deformation size of exposure mask plate body 1 is lower than preset threshold.
Step 804: if the result judged be it is no, the deformation of exposure mask plate body 1 is corrected by deformation corrective component, is returned
Return the deformation size that step 801 detects exposure mask plate body 1 again.
Step 805: if the result judged be it is yes, process is exposed to the surface of semi-finished 4 for being covered with exposure mask plate body 1.
When the judgment result is yes, illustrate to have been completed the orthopaedic procedures for exposure mask plate body 1.When the preset threshold is sufficiently small,
The focus of exposure process can be considered in approximately the same plane at this time, in the identical situation of light exposure, 1 center of exposure mask plate body
The light of domain and peripheral regions apart from surface of semi-finished 4 is identical away from being also considered as, thus 4 different location of surface of semi-finished by
Exposure intensity be also considered as it is identical, thus ensure that in surface of semi-finished 4 be located at different location but have same design
The size of mask pattern be able to maintain unanimously.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention
Within mind and principle, made any modification, equivalent replacement etc. be should all be included in the protection scope of the present invention.
Claims (10)
1. a kind of mask plate component characterized by comprising
Exposure mask plate body；
Shape changing detection component is configured to detect the deformation size of the exposure mask plate body；And
Deformation corrective component is configured to correct the deformation of the exposure mask plate body.
2. mask plate component according to claim 1, which is characterized in that the shape changing detection component includes: to be distributed in institute
State multiple shape changing detection modules on exposure mask plate body.
3. mask plate component according to claim 2, which is characterized in that the multiple shape changing detection module is with the shape of array
Formula is distributed on the exposure mask plate body.
4. mask plate component according to claim 2, which is characterized in that the shape changing detection module includes:
The resistance value of voltage dependent resistor, the voltage dependent resistor changes with the variation of deformation size；
Resistance variations detection unit is electrically connected with the voltage dependent resistor, is configured to detect the resistance change of the voltage dependent resistor；
And
Signal processor is electrically connected with the resistance variations detection unit, is configured to be examined according to the resistance variations detection unit
The resistance change surveyed judges the deformation size of the voltage dependent resistor.
5. mask plate component according to claim 4, which is characterized in that the shape changing detection component only includes described in one
Signal processor.
6. mask plate component according to claim 4, which is characterized in that the voltage dependent resistor and resistance variations detection
Unit constitutes wheatstone bridge structure.
7. mask plate component according to claim 1, which is characterized in that the deformation corrective component includes: to be set to institute
Multiple pressure-driven mechanisms in exposure mask plate body circumferential direction are stated, each pressure-driven mechanism therein is configured to from the exposure mask
The side of plate body provides the pressure to the exposure mask plate body center position, wherein the position of having an effect of the pressure is located at the exposure mask
Bottom of the side of plate body on gravity direction.
8. mask plate component according to claim 7, which is characterized in that the profile of the exposure mask plate body is on gravity direction
Be projected as rectangle, wherein the deformation corrective component includes: two pressure-driven mechanisms, and is set to the exposure mask
The symmetrical two sides of plate body.
9. a kind of exposure mask plate body straightening method of mask plate component, which is characterized in that the mask plate component further include: deformation inspection
Component is surveyed, is configured to detect the deformation size of the exposure mask plate body；And deformation corrective component, it is configured to the exposure mask plate body
Deformation corrected；The straightening method includes:
Pass through the deformation size of exposure mask plate body described in the shape changing detection component detection；
Judge whether the deformation size of the exposure mask plate body is lower than preset threshold；And
If the result judged be it is no, the deformation of the exposure mask plate body is corrected by the deformation corrective component, is returned
The step of described in returning by the deformation size of exposure mask plate body described in the shape changing detection component detection；If the result of the judgement is
It is to terminate process.
10. a kind of exposure mask plate body exposure method of mask plate component, which is characterized in that the mask plate component further include: deformation
Detection components are configured to detect the deformation size of the exposure mask plate body；And deformation corrective component, it is configured to the mask plate
The deformation of body is corrected；The exposure method includes:
The exposure mask plate body is placed in surface of semi-finished to be exposed；
Pass through the deformation size of exposure mask plate body described in the shape changing detection component detection；
Judge whether the deformation size of the exposure mask plate body is lower than preset threshold；And
If the result judged be it is no, the deformation of the exposure mask plate body is corrected by the deformation corrective component, is returned
The step of described in returning by the deformation size of exposure mask plate body described in the shape changing detection component detection；If the result of the judgement is
It is that process is exposed to the surface of semi-finished for being covered with the exposure mask plate body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710366560.2A CN108957940A (en) | 2017-05-23 | 2017-05-23 | Mask plate component, its exposure mask plate body straightening method and exposure mask plate body exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710366560.2A CN108957940A (en) | 2017-05-23 | 2017-05-23 | Mask plate component, its exposure mask plate body straightening method and exposure mask plate body exposure method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108957940A true CN108957940A (en) | 2018-12-07 |
Family
ID=64462434
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710366560.2A Pending CN108957940A (en) | 2017-05-23 | 2017-05-23 | Mask plate component, its exposure mask plate body straightening method and exposure mask plate body exposure method |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001109160A (en) * | 1999-10-08 | 2001-04-20 | Hitachi Electronics Eng Co Ltd | Mask deflection correction mechanism for base plate exposure device |
| JP2013097236A (en) * | 2011-11-02 | 2013-05-20 | Toppan Printing Co Ltd | Exposure device and color filter manufacturing method using the same |
| CN203465150U (en) * | 2013-09-18 | 2014-03-05 | 华侨大学 | Novel testing device for safety performance of concrete cylindrical shells |
| CN103839864A (en) * | 2014-02-24 | 2014-06-04 | 合肥鑫晟光电科技有限公司 | Coating alignment device and coating system |
| CN203858473U (en) * | 2014-03-12 | 2014-10-01 | 重庆交通大学 | Rapid rescue auxiliary system based on vehicle deformation detection |
| CN104269822A (en) * | 2014-09-11 | 2015-01-07 | 深圳天珑无线科技有限公司 | Electronic device and control method of electronic device |
| CN105511679A (en) * | 2015-12-25 | 2016-04-20 | 上海天马微电子有限公司 | Glass substrate, touch control display screen and touch control pressure calculation method |
| CN105677111A (en) * | 2016-01-29 | 2016-06-15 | 上海天马微电子有限公司 | Array substrate and display panel |
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2017
- 2017-05-23 CN CN201710366560.2A patent/CN108957940A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001109160A (en) * | 1999-10-08 | 2001-04-20 | Hitachi Electronics Eng Co Ltd | Mask deflection correction mechanism for base plate exposure device |
| JP2013097236A (en) * | 2011-11-02 | 2013-05-20 | Toppan Printing Co Ltd | Exposure device and color filter manufacturing method using the same |
| CN203465150U (en) * | 2013-09-18 | 2014-03-05 | 华侨大学 | Novel testing device for safety performance of concrete cylindrical shells |
| CN103839864A (en) * | 2014-02-24 | 2014-06-04 | 合肥鑫晟光电科技有限公司 | Coating alignment device and coating system |
| CN203858473U (en) * | 2014-03-12 | 2014-10-01 | 重庆交通大学 | Rapid rescue auxiliary system based on vehicle deformation detection |
| CN104269822A (en) * | 2014-09-11 | 2015-01-07 | 深圳天珑无线科技有限公司 | Electronic device and control method of electronic device |
| CN105511679A (en) * | 2015-12-25 | 2016-04-20 | 上海天马微电子有限公司 | Glass substrate, touch control display screen and touch control pressure calculation method |
| CN105677111A (en) * | 2016-01-29 | 2016-06-15 | 上海天马微电子有限公司 | Array substrate and display panel |
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Application publication date: 20181207 |
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| RJ01 | Rejection of invention patent application after publication |