CN108949033A - Polishing fluid and preparation method thereof - Google Patents
Polishing fluid and preparation method thereof Download PDFInfo
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- CN108949033A CN108949033A CN201810917092.8A CN201810917092A CN108949033A CN 108949033 A CN108949033 A CN 108949033A CN 201810917092 A CN201810917092 A CN 201810917092A CN 108949033 A CN108949033 A CN 108949033A
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- polishing fluid
- zinc
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Abstract
This application involves a kind of preparation methods of polishing fluid, comprising the following steps: the zinc salt of 4.5~5 parts by weight is added in the water of 100 parts by weight, dissolves by heating in 131 DEG C~141 DEG C, obtain zinc-containing solution；Zinc-containing solution is stood 4 hours or more, 25 DEG C~30 DEG C are heated to, repeats to filter, obtains filtrate；Filtrate is added in the cerium oxide of 20~35 parts by weight, intermittent stirring is multiple, obtains polishing fluid.The preparation method of above-mentioned polishing fluid, the polishing fluid that pH value is 5.5~6 can be made, again by repeating the preparation process such as heat filtering and multiple intermittent stirring after standing, so that the cerium oxide in polishing fluid is uniformly distributed, the polishing fluid prepared reaches a kind of peering state to the chemical attack effect of quartz glass and mechanism, that is chemical polishing and mechanical polishing effect balances each other, and polishing effect is best, the processing request suitable for Ultraprecise polished quartz glass.
Description
Technical field
The present invention relates to polishing technology fields, more particularly to a kind of polishing fluid and preparation method thereof.
Background technique
Quartz glass has extremely low thermal expansion coefficient, high temperature tolerance, fabulous chemical stability, excellent electrical isolation
Property, low and stable ultrasonic delay performance, optimal ultraviolet spectra performance and saturating visible light and near infrared spectrum performance, and
There is the mechanical performance higher than simple glass.Therefore, quartz glass be space technology in modern age sophisticated technology, atomic energy industry,
It is indispensable in the industry such as defence equipment, automated system and semiconductor, metallurgy, chemical industry, electric light source, communication, light industry, building materials
One of few excellent material.
Polishing is to obtain the important processing method of ultra-smooth Quartz glass surfaces, and the progress polished is mainly by means of polishing
Liquid is completed.It is also higher and higher to the quality requirement of Quartz glass surfaces with the development of Ultraprecision Machining.Traditional throwing
Light liquid is directly to be equipped with cerium oxide and distilled water in the ratio of 1:2 to use, and pH value can only be applicable in usually between 6.8~9
In the quartz glass processing request that surface face shape is general and beauty defects grade is medium, it is not able to satisfy Ultraprecise polished (face shape essence
Degree be better than 0.1nm, face shape defect grades be zero level) quartz glass processing request.
Therefore, a kind of polishing fluid suitable for the Ultraprecise polished requirement of quartz glass is researched and developed to be of great significance.
Summary of the invention
Based on this, it is necessary to provide a kind of polishing fluid suitable for the Ultraprecise polished requirement of quartz glass.
In addition, the application also provides a kind of preparation method of above-mentioned polishing fluid.
A kind of preparation method of polishing fluid, comprising the following steps:
In parts by weight, the following raw material: 4.5~5 parts of zinc salts, 100 parts of water and 20~35 parts of cerium oxide is provided；
The zinc salt is added in the water, is dissolved by heating in 131 DEG C~141 DEG C, obtains zinc-containing solution；
The zinc-containing solution is stood 4 hours or more, 25 DEG C~30 DEG C are heated to, repeats to filter, obtains filtrate；
The filtrate is added in the cerium oxide, intermittent stirring is multiple, obtains polishing fluid.
The zinc salt is selected from least one of zinc nitrate, zinc sulfate and zinc chloride in one of the embodiments,.
The partial size of the cerium oxide is 200 mesh~500 mesh in one of the embodiments,.
The number for repeating filtering is 3~5 times in one of the embodiments,.
The interval time of the intermittent stirring is 1~3 hour in one of the embodiments,.
The number of the intermittent stirring is 3~4 times in one of the embodiments,.
Polishing fluid made from a kind of preparation method of polishing fluid described in any of the above embodiments.
The preparation method of above-mentioned polishing fluid can using 4.5~5 parts of zinc salts, 100 parts of water and 20~35 parts of cerium oxide as raw material
The polishing fluid that pH value is 5.5~6 is made, then by repeating the preparation process such as heat filtering and multiple intermittent stirring after standing, avoids
The reunion of zinc salt and cerium oxide, so that the cerium oxide in polishing fluid is uniformly distributed, the polishing fluid prepared is to quartz glass
Chemical attack effect and mechanism reach a kind of peering state, i.e. chemical polishing and mechanical polishing effect balances each other, polishing effect
Fruit is best, the processing request suitable for Ultraprecise polished quartz glass.
Specific embodiment
To facilitate the understanding of the present invention, below will to invention is more fully described, and give it is of the invention compared with
Good embodiment.But the invention can be realized in many different forms, however it is not limited to embodiment described herein.Phase
Instead, purpose of providing these embodiments is makes the disclosure of the present invention more thorough and comprehensive.
Unless otherwise defined, all technical and scientific terms used herein and belong to technical field of the invention
The normally understood meaning of technical staff is identical.Term as used herein in the specification of the present invention is intended merely to description tool
The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term as used herein "and/or" includes one or more phases
Any and all combinations of the listed item of pass.
The preparation method of the polishing fluid of one embodiment, includes the following steps S110~S140:
S110, the following raw material: the oxygen of the zinc salt of 4.5~5 parts by weight, the water of 100 parts by weight and 20~35 parts by weight is provided
Change cerium.
Wherein, zinc salt is selected from least one of zinc nitrate, zinc sulfate and zinc chloride.
In the present embodiment, zinc salt is zinc nitrate.
Further, the partial size of cerium oxide is 200 mesh~500 mesh.
In the present embodiment, the partial size of cerium oxide is 200 mesh, 300 mesh, 400 mesh or 500 mesh.
By the way that zinc salt, water and the proportion of cerium oxide is rationally arranged, the polishing fluid that pH value is 5.5~6 can be obtained, by polishing fluid
PH value is controlled 5.5~6, and polishing fluid reaches a kind of peering state to the mechanism and chemical action of quartz glass, changes at this time
Even action is good, surface tension is small, and quality treatment consistency is good, so as to obtain good surface finish.If
The pH value of polishing fluid is excessive, and the mechanism of polishing fluid is much larger than chemical action, and Quartz glass surfaces generate after will lead to polishing
High damaging layer, roughness ratio is larger, if the pH value of polishing fluid is too small, the chemical action of polishing fluid is much larger than mechanism, surface
Etch pit increases, and also results in roughness and becomes larger.
S120, above-mentioned zinc salt is added in above-mentioned water, is dissolved by heating in 131 DEG C~141 DEG C, obtains zinc-containing solution.
S130, the zinc-containing solution is stood 4 hours or more, is heated to 25 DEG C~30 DEG C, repeated to filter, obtain filtrate.
Wherein, the number for repeating filtering is 3~5 times.
Heat filtering was repeated by zinc-containing solution standing 4 hours or more, the zinc salt for standing the reunion in liquid can be made to effectively remove,
Avoid the influence to subsequent oxidation cerium.
S140, above-mentioned filtrate is added in above-mentioned cerium oxide, intermittent stirring is multiple, obtains polishing fluid.
Wherein intermittent stirring interval time is 1~3 hour.The number of intermittent stirring is four times.
By intermittent stirring, cerium oxide can be made to be homogeneously dispersed in filtrate, improve the stability of polishing fluid, to make to throw
Light liquid has the mechanism to balance each other with its chemical action, reaches polishing effect most preferably, meets the throwing of quartz glass ultraprecise
The requirement of light.
The following are specific embodiments.
Embodiment 1
5 parts of zinc nitrates are added in 100 parts of water, are heated to 141 DEG C while stirring, until zinc nitrate is completely dissolved, are obtained
Zinc nitrate solution.The zinc nitrate solution is stood 4 hours or more, 30 DEG C are heated to, filtering five times is repeated, filtrate is taken to test its pH
Value is 5.1 or so.
Filtrate is added in 35 parts of cerium oxide, stirring in every 3 hours is primary, is repeated four times, and it is 6 left that its pH value is tested after standing
It is right.
Embodiment 2
4.5 parts of zinc sulfate are added in 100 parts of water, are heated to 131 DEG C while stirring, until zinc sulfate is completely dissolved, are obtained
To solution of zinc sulfate.The solution of zinc sulfate is stood 4 hours or more, 25 DEG C are heated to, filtering is repeated three times, filtrate is taken to test it
PH value is 5.1 or so.
Filtrate is added in 20 parts of cerium oxide, stirring in every 1 hour is primary, and testing its pH value in triplicate, after standing is 5.6
Left and right.
Comparative example 1
By 5 parts of zinc nitrates, 100 parts of water and 35 parts of direct mixs of cerium oxide, polishing fluid is obtained.
Comparative example 2
Comparative example 2 is substantially the same manner as Example 1, unlike, the dosage of zinc nitrate is 8 parts in comparative example 2.
Comparative example 3
Comparative example 3 is substantially the same manner as Example 1, unlike, the step of repetition is filtered is omitted in comparative example 3.
Comparative example 4
Comparative example 4 is substantially the same manner as Example 1, unlike, intermittent stirring has been substituted in comparative example 4 and has continuously been stirred
It mixes.
It is used for polishing fluid prepared by Examples 1 to 2 and comparative example 1~4 to polish quartz glass, the results are shown in Table 1.
Table 1
As can be seen from Table 1, the polishing fluid of the application preparation can make the face shape essence of quartz glass for polishing quartz glass
Degree is better than 0.1nm, and face type defect grades are 0 grade.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention
Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.
Claims (7)
1. a kind of preparation method of polishing fluid, which comprises the following steps:
In parts by weight, the following raw material: 4.5~5 parts of zinc salts, 100 parts of water and 20~35 parts of cerium oxide is provided；
The zinc salt is added in the water, is dissolved by heating in 131 DEG C~141 DEG C, obtains zinc-containing solution；
The zinc-containing solution is stood 4 hours or more, 25 DEG C~30 DEG C are heated to, repeats to filter, obtains filtrate；
The filtrate is added in the cerium oxide, intermittent stirring is multiple, obtains polishing fluid.
2. the preparation method of polishing fluid according to claim 1, which is characterized in that the zinc salt is selected from zinc nitrate, sulfuric acid
At least one of zinc and zinc chloride.
3. the preparation method of polishing fluid according to claim 1, which is characterized in that the partial size of the cerium oxide is 200 mesh
~500 mesh.
4. the preparation method of described in any item polishing fluids according to claim 1~3, which is characterized in that the repetition filtering
Number is 3~5 times.
5. the preparation method of described in any item polishing fluids according to claim 1~3, which is characterized in that the intermittent stirring
Interval time is 1~3 hour.
6. the preparation method of described in any item polishing fluids according to claim 1~3, which is characterized in that the intermittent stirring
Number is 3~4 times.
7. polishing fluid made from a kind of preparation method of the described in any item polishing fluids of claim 1~6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810917092.8A CN108949033B (en) | 2018-08-13 | 2018-08-13 | Polishing fluid and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810917092.8A CN108949033B (en) | 2018-08-13 | 2018-08-13 | Polishing fluid and preparation method thereof |
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| Publication Number | Publication Date |
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| CN108949033A true CN108949033A (en) | 2018-12-07 |
| CN108949033B CN108949033B (en) | 2019-09-17 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008023858A1 (en) * | 2006-08-25 | 2008-02-28 | Hanwha Chemical Corporation | Manufacturing methods of fine cerium oxide particles and its slurry for shallow trench isolation process of semiconductor |
| CN102796459A (en) * | 2012-08-23 | 2012-11-28 | 安徽环巢光电科技有限公司 | Optical lens polishing solution |
| CN103693856A (en) * | 2013-12-18 | 2014-04-02 | 福建福晶科技股份有限公司 | Polishing solution for improving fog phenomenon of ZF dense flint |
| CN104178033A (en) * | 2013-05-27 | 2014-12-03 | 天津西美半导体材料有限公司 | Nano cerium oxide polishing liquid composition |
| CN105315893A (en) * | 2014-07-29 | 2016-02-10 | 李尧 | High-precision polishing fluid and preparation method therefor |
-
2018
- 2018-08-13 CN CN201810917092.8A patent/CN108949033B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008023858A1 (en) * | 2006-08-25 | 2008-02-28 | Hanwha Chemical Corporation | Manufacturing methods of fine cerium oxide particles and its slurry for shallow trench isolation process of semiconductor |
| CN102796459A (en) * | 2012-08-23 | 2012-11-28 | 安徽环巢光电科技有限公司 | Optical lens polishing solution |
| CN104178033A (en) * | 2013-05-27 | 2014-12-03 | 天津西美半导体材料有限公司 | Nano cerium oxide polishing liquid composition |
| CN103693856A (en) * | 2013-12-18 | 2014-04-02 | 福建福晶科技股份有限公司 | Polishing solution for improving fog phenomenon of ZF dense flint |
| CN105315893A (en) * | 2014-07-29 | 2016-02-10 | 李尧 | High-precision polishing fluid and preparation method therefor |
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| CN108949033B (en) | 2019-09-17 |
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