CN108933074B - Air inlet device and chamber comprising same - Google Patents

Air inlet device and chamber comprising same Download PDF

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Publication number
CN108933074B
CN108933074B CN201710373466.XA CN201710373466A CN108933074B CN 108933074 B CN108933074 B CN 108933074B CN 201710373466 A CN201710373466 A CN 201710373466A CN 108933074 B CN108933074 B CN 108933074B
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nozzle
air inlet
fixing piece
fixing
shaft shoulder
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CN108933074A (en
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茅兴飞
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Beijing Naura Microelectronics Equipment Co Ltd
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Beijing Naura Microelectronics Equipment Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • H01J37/32513Sealing means, e.g. sealing between different parts of the vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67069Apparatus for fluid treatment for etching for drying etching

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

An air intake device and a chamber including the same, the air intake device comprising: the nozzle is hollow and columnar, a first protruding shaft shoulder is arranged on the outer peripheral wall of the first end of the nozzle, and a second protruding shaft shoulder is arranged on the outer peripheral wall of the second end of the nozzle; the fixing piece is of a hollow structure, the inner wall of the fixing piece is provided with a step, when the nozzle is sleeved in the fixing piece, the step surface of the step is jointed with the end surface of the first shaft shoulder, and the fixing piece is used for fixing the air inlet device to the piece to be installed; the first sealing ring is arranged between the end face of the second shaft shoulder and the piece to be mounted; the observation window is arranged on the end face of the first end of the nozzle; and the second sealing ring is arranged in the sealing groove on the end face of the first end of the nozzle. The air inlet device has strong sealing performance and is convenient to install.

Description

Air inlet device and chamber comprising same
Technical Field
The invention relates to the field of semiconductor manufacturing equipment, in particular to an air inlet device and a chamber comprising the same.
Background
The plasma etching equipment can be used for removing redundant materials of the semiconductor according to the pre-design to generate a groove with corresponding process requirements, and a foundation is provided for the subsequent process. In the semiconductor processing process, process gas is injected into a reaction chamber from a nozzle of plasma etching equipment, and plasma is generated under the action of a high-frequency electric field, so that the surface of a wafer in the reaction chamber is etched.
Plasma etching equipment generally requires process gases to be injected from the center of the upper lid of the reaction chamber, i.e., top-blown. Because the upper cover of the reaction chamber is generally made of dielectric materials such as ceramics or quartz and the like, and the center of the upper cover is positioned at the center of the plasma radio frequency coil, in order to avoid radio frequency interference and ignition, the connecting and fixing piece of the nozzle needs to be made of non-metallic materials and needs to be subjected to electromagnetic shielding treatment. With the development of the etching process, the upper cover of the reaction chamber is generally subjected to preheating and heat preservation treatment to reduce the processing auxiliary action and save the standby preparation time of the process, but under the condition of high temperature, because a non-metal part is adopted to connect the nozzle, the compression of the sealing ring is easily uneven, and because the structure is complex, the faults such as unqualified leakage rate are easily caused.
Fig. 1 shows a conventional nozzle and a fixing structure thereof, in which a nozzle 104 is fixed to an upper cover 106 of a reaction chamber by a nozzle fixing structure. The nozzle fixing structure includes a nozzle pressing ring 101, a connection protection sleeve 102, a nozzle hook 103 and a sealing ring 105, the sealing ring 105 is installed in a sealing groove between the nozzle 104 and the upper cover 106, the nozzle 104 is installed into the installation hole from above the upper cover 106, and the nozzle 104 is fixed on the upper cover 106 of the reaction chamber by four nozzle hooks 103, the nozzle pressing ring 101, the connection protection sleeve 102 and screws (not shown). The disadvantages of this nozzle and its fixed structure are: (1) the process gas is injected from the top of the nozzle, and the plasma glow cannot be detected because the top of the nozzle cannot transmit light; (2) the process gas enters the reaction chamber from a single hole, and the generated plasma is not uniform.
Figure 2 shows another prior art nozzle which overcomes the above disadvantages to some extent. As shown in fig. 2, the nozzle includes at least first and second air inlets 201 and 202, first and second air inlet passages 203 and 204, and first and second air outlets 205 and 206. Wherein the first air outlet 205 is located on the central axis of the nozzle, and the second air outlet 206 is located outside the axis of the nozzle. The process gas is divided into at least two paths, and the gas path is provided with a flow control element which can control the flow of each gas branch. The gas enters the corresponding first gas inlet 201, second gas inlet 202 and first gas inlet channel 203, second gas inlet channel 204 from each branch, and then enters the reaction chamber through the first gas outlet 205, second gas outlet 206 corresponding to each gas inlet channel. The flow control elements can respectively regulate and control the gas flow of the first gas outlet 205 and the second gas outlet 206, so that the gas flow flowing to the central area and the peripheral area of the reaction chamber is respectively controlled, the area control of gas distribution is realized, and the uniformity of gas distribution is better promoted. In addition, the cross-sectional area of the first outlet port 205 located on the axis is at least a section smaller than that of the first inlet passage 203; the second outlet port 206 located outside the axis is an annular outlet port, and the sectional area of the second outlet port 206 is smaller than that of the second inlet passage 204. Therefore, when the gas enters the reaction chamber, the speed is higher, the spraying distance is longer, and the uniformity of the gas flow inside the reaction chamber (especially when the volume of the reaction chamber is larger) can be promoted to be realized faster and better; in addition, the gas enters the reaction chamber from the gas outlet at a higher speed, so that the possibility of sparking at the position can be reduced, and the pollution to the cavity and the wafer is reduced.
The disadvantages of the nozzle shown in fig. 2 are: (1) the two sealing rings at the top and the lower part of the nozzle are compressed unevenly, so that the sealing effect is poor; (2) the nozzle is externally of a cylindrical structure, the nozzle is not positioned with the fixing piece, the fixing piece and the nozzle can slide, the installation of the air inlet part is influenced, and the sealing effect is poor.
Therefore, development of an intake device having better sealing performance is desired.
Disclosure of Invention
The invention aims to provide an air inlet device and a chamber comprising the same, and aims to solve the problem that the air inlet device in the prior art is not tight in sealing.
To solve the above problems, an aspect of the present invention provides an intake apparatus including:
the nozzle is hollow and columnar, a first protruding shaft shoulder is arranged on the outer peripheral wall of the first end of the nozzle, and a second protruding shaft shoulder is arranged on the outer peripheral wall of the second end of the nozzle;
the fixing piece is of a hollow structure, a step is arranged on the inner wall of the fixing piece, when the nozzle sleeve is arranged in the fixing piece, the step surface of the step is jointed with the end surface of the first shaft shoulder, and the fixing piece is used for fixing the air inlet device to a piece to be installed;
the first sealing ring is arranged between the end face of the second shaft shoulder and the piece to be mounted;
the observation window is arranged on the end face of the first end of the nozzle;
and the second sealing ring is arranged in the sealing groove on the end face of the first end of the nozzle.
Preferably, the fixing member includes a first fixing member and a second fixing member, wherein,
the first fixing piece is sleeved at the first end of the nozzle;
the second fixing piece is sleeved at the second end of the nozzle and is jointed with the first fixing piece, and the second fixing piece is used for fixing the air inlet device to the piece to be installed.
Preferably, a convex limiting part is arranged on the first shaft shoulder, and a concave part matched with the limiting part is arranged on the inner wall of the fixing part;
when the nozzle is sleeved in the fixing piece, the limiting part is clamped in the concave part.
Preferably, the limiting part is a cuboid, and the concave part is a groove matched with the cuboid.
Preferably, the length of the cuboid is 8mm-25mm, and the width of the cuboid is 2mm-8 mm.
Preferably, the end surface of the nozzle close to the air inlet end is horizontally arranged.
Preferably, the air intake device further includes:
the air inlet portion is arranged on the peripheral wall of the nozzle, and a third sealing ring is arranged on a mounting surface between the air inlet portion and the peripheral wall of the nozzle.
Another aspect of the invention provides a chamber comprising said air inlet means.
The invention has the beneficial effects that:
according to the air inlet device, the first shaft shoulder is arranged at the first end of the nozzle, the step is arranged on the inner wall of the fixing piece, and the first shaft shoulder and the step are matched with each other, so that the first sealing ring and the second sealing ring are stressed uniformly, and the sealing performance of the air inlet device is improved.
The chamber provided by the invention adopts the air inlet device provided by the invention, and the sealing property of the chamber is also improved.
Drawings
The above and other objects, features and advantages of the present invention will become more apparent by describing in more detail exemplary embodiments thereof with reference to the attached drawings, in which like reference numerals generally represent like parts throughout.
FIG. 1 is a schematic view of a conventional nozzle and its fixing structure;
FIG. 2 is a schematic view of a conventional nozzle;
FIG. 3 shows a front view of an air induction device according to an embodiment of the invention;
FIG. 4 shows a cross-sectional view taken along line A-A of FIG. 3;
FIG. 5 shows a cross-sectional view taken along section B-B of FIG. 3;
fig. 6 shows a bottom view of a first fixing member of an air induction device according to an embodiment of the present invention;
fig. 7 shows a cross-sectional view of a first mount of an air intake apparatus according to an embodiment of the invention;
FIG. 8 shows a cross-sectional view of a nozzle of an air induction device according to an embodiment of the present invention;
fig. 9 shows a top view of a nozzle of an air inlet arrangement according to an embodiment of the invention.
Description of the main reference numerals:
101-nozzle press ring, 102-connecting protective sleeve, 103-nozzle hook, 104-nozzle, 105-sealing ring, 106-upper cover, 201-first air inlet, 202-second air inlet, 203-first air inlet channel, 204-second air inlet channel, 205-first air outlet and 206-second air outlet;
10-an upper cover, 20-a nozzle, 21-a limiting part, 22-a first shaft shoulder, 23-a sealing groove, 24-a second shaft shoulder, 30-a second fixing piece, 40-an air inlet part, 50-a first fixing piece, 51-a sunken part, 52-a step, 53-a horizontal plane, 60-an observation window, 71-a first sealing ring, 72-a second sealing ring, 73-a third sealing ring, 81-a screw and 82-a screw.
Detailed Description
Preferred embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. While the preferred embodiments of the present invention are shown in the drawings, it should be understood that the present invention may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
In the present invention, unless otherwise stated, terms of orientation such as "upper, lower, bottom, top, front, rear, left, right, inner, and outer" are generally defined in the case of normal use of the intake device provided by the present invention, and specifically refer to the direction of the drawing shown in fig. 4.
An embodiment of the present invention provides an air intake apparatus, including:
the nozzle is hollow and columnar, a first protruding shaft shoulder is arranged on the outer peripheral wall of the first end of the nozzle, and a second protruding shaft shoulder is arranged on the outer peripheral wall of the second end of the nozzle;
the fixing piece is of a hollow structure, the inner wall of the fixing piece is provided with a step, when the nozzle is sleeved in the fixing piece, the step surface of the step is jointed with the end surface of the first shaft shoulder, and the fixing piece is used for fixing the air inlet device to the piece to be installed;
the first sealing ring is arranged between the end face of the second shaft shoulder and the piece to be mounted;
the observation window is arranged on the end face of the first end of the nozzle;
and the second sealing ring is arranged in the sealing groove on the end face of the first end of the nozzle.
In a plasma etching apparatus, a gas inlet device is generally installed on an upper cover of a reaction chamber, and a process gas enters the reaction chamber through the gas inlet device. The fixing member is used for fixing the air inlet device to the upper cover. The sealing ring can realize the sealing between the nozzle and the upper cover.
According to the air inlet device provided by the embodiment of the invention, the first shaft shoulder is arranged at the first end of the nozzle, the step is arranged on the inner wall of the fixing piece, and the first shaft shoulder and the step are matched with each other, so that the first sealing ring and the second sealing ring are stressed respectively, the stress of the first sealing ring and the second sealing ring is uniform, and the sealing performance of the air inlet device is improved.
The air intake device of the present invention further includes an observation window provided on an end surface of the first end of the nozzle. The fixed part is jointed with the observation window, and the center of the fixed part is provided with a through hole.
The observation window can be connected with the optical fiber, and the plasma state in the reaction cavity can be monitored in real time through the through hole of the fixing piece and the observation window. In addition, the mounting passes through the observation window and engages with the seal groove to act on the second sealing washer in the seal groove, reach sealed effect. Because first sealing washer and second sealing washer seal respectively through the different positions of mounting, consequently when the temperature changes, the size change of two sealing washers is more even, and air inlet unit's leakproofness improves.
In one example, the fixture includes a first fixture and a second fixture, wherein,
the first fixing piece is sleeved at the first end of the nozzle;
the second fixing piece is sleeved at the second end of the nozzle and is jointed with the first fixing piece, and the second fixing piece is used for fixing the air inlet device to the piece to be installed.
In this case, the step may be provided on an inner wall of the first fixing member or the second fixing member. Through adopting two independent mountings, shortened the sealing chain, improved the leakproofness, can reduce the processing degree of difficulty simultaneously, improve the installation convenience.
In one example, the end face of the first end of the nozzle is horizontally disposed, which is different from the inclined end face generally employed in the prior art, which is advantageous in improving the machining accuracy, thereby improving the sealing reliability.
In one example, the nozzle includes at least two air inlets disposed horizontally, at least two air inlet passages in communication with each air inlet, respectively, and perpendicular to the air inlets, and at least two air outlets in communication with each air inlet passage, respectively. The double-channel gas inlet mode is beneficial to generating uniform plasma in the reaction chamber.
In one example, the air intake device further comprises an air intake portion, and at least two air intake ducts respectively communicated with each air intake are arranged in the air intake portion. The air inlet part is arranged on the peripheral wall of the nozzle, and a third sealing ring is arranged on a mounting surface between the air inlet part and the peripheral wall of the nozzle. The gas inlet portion is for introducing a process gas into a gas inlet of the nozzle.
In one example, the first shaft shoulder is provided with a convex limiting part, and the inner wall of the fixing part is provided with a concave part matched with the limiting part. When the nozzle sleeve is arranged in the fixing piece, the limiting part is clamped in the concave part. Particularly, the limiting part is a cuboid, and the concave part is a groove matched with the cuboid. Preferably, the length of the cuboid is 8mm-25mm, and the width is 2mm-8 mm.
The key structure is positioned by matching the limiting part with the concave part. The nozzle and the fixing piece can be effectively prevented from rotating relatively and moving horizontally through key structure positioning. In addition, when the process gas is introduced through the gas inlet part, the key structure positioning can also ensure that the sealing installation surface of the nozzle and the gas inlet part and the fixing installation surface of the first fixing piece and the gas inlet part are parallel, prevent the horizontal compression force of the gas inlet part from inclining the nozzle, and effectively improve the connection sealing performance of the nozzle.
The embodiment of the invention also provides a chamber comprising the air inlet device.
Fig. 3 illustrates a front view of an air induction device according to an embodiment of the present invention, fig. 4 illustrates a sectional view taken along a line a-a of fig. 3, and fig. 5 illustrates a sectional view taken along a line B-B of fig. 3; fig. 6 and 7 show a bottom view and a sectional view of a first fixing member of an air induction device according to an embodiment of the present invention, respectively; fig. 8 and 9 show a cross-sectional view and a top view, respectively, of a nozzle of an air inlet device according to an embodiment of the present invention.
As shown in fig. 3 to 9, the gas inlet device according to the embodiment of the invention is used to be disposed on the upper cover of the reaction chamber to inject the process gas into the reaction chamber. The air inlet device comprises a nozzle 20, an observation window 60, a first fixing member 50, a second fixing member 30, a first sealing ring 71 and a second sealing ring 72.
The nozzle 20 is a hollow column, and the end surface of the first end of the nozzle is horizontally arranged, a sealing groove 23 is arranged on the end surface, and a second sealing ring 72 is arranged in the sealing groove 23. The outer peripheral wall of the first end of the nozzle 20 is provided with a convex annular first shaft shoulder 22, the first shaft shoulder 22 is provided with a convex limiting part 21, and the limiting part 21 is a cuboid and is 8mm-25mm long and 2mm-8mm wide. An annular second shoulder 24 is provided at the second end of the nozzle 20, and a first sealing ring 71 is provided between the lower end surface of the second shoulder 24 and the upper cover 10 of the reaction chamber, so that the nozzle 20 can be sealed at the upper cover 10.
As shown in fig. 4 and 8, the nozzle 20 includes two air inlets horizontally arranged, two air inlet passages respectively communicating with each air inlet and perpendicular to the air inlets, and two air outlets respectively communicating with each air inlet passage, similar to the related art nozzle described with reference to fig. 2. In the present embodiment, the process gas enters the two gas inlets of the nozzle 20 through two gas inlet pipes provided in the gas inlet portion 40, respectively. The air inlet part 40 is arranged on the peripheral wall of the nozzle 20, and a third sealing ring 73 is arranged on a mounting surface between the air inlet part 40 and the peripheral wall of the nozzle 20, so that the air inlet part and the nozzle are sealed. The air intake portion 40 is also fixed to the first fixing member 50, and forms a fixing attachment surface with the first fixing member 50.
The observation window 60 is disposed between the end surface of the first end of the nozzle 20 and the first fixing member 50, and the observation window 60 may be connected to an optical fiber, thereby monitoring the plasma state in real time.
The first fixing member 50 is a hollow structure, and is sleeved at the first end of the nozzle 20, an annular step 52 is provided on an inner wall thereof, and a horizontal step surface of the annular step 52 (i.e., a position indicated by an end point of a lead indicated by a reference numeral 52 in fig. 7) is engaged with an end surface of the first shoulder 22, so that a first sealing ring 71 between the end surface of the second shoulder and the upper cover can be directly pressed, and the nozzle 20 is sealed at the upper cover. The bottom surface of the first fixing member 50 is further provided with a horizontal surface 53 which is engaged with the upper surface of the observation window 60, so that the first end of the nozzle 20 can be sealed by the horizontal surface 53, the observation window 60, the sealing groove 23 and the second sealing ring 72, thereby effectively improving the sealing performance of the air inlet device.
The inner wall of the first fixing member 50 is provided with a recessed portion 51, which is a groove, and the limiting portion 21 of the nozzle 20 can be engaged with the recessed portion 51 to form a key structure for positioning. The nozzle 20 and the first fixing piece 50 can be effectively prevented from rotating relatively and the nozzle 20 can be prevented from moving horizontally through key structure positioning, the sealing installation surface of the nozzle 20 and the air inlet part 40 and the fixing installation surface of the first fixing piece 50 and the air inlet part 40 are ensured to be parallel, the nozzle 20 is prevented from being inclined by the horizontal compression force of the air inlet part 40, and the connection sealing performance of the nozzle is effectively improved.
The second fixing member 30 is a hollow structure, and is sleeved outside the nozzle 20, and an upper end surface of the second fixing member 30 is engaged with the first fixing member 50. An annular groove is generally formed at the central hole of the upper cover 10 of the reaction chamber, and the second fixing member 30 is connected to the annular groove by a bayonet structure (e.g., a three-jaw bayonet structure) and thus connected to the upper cover 10.
The nozzle 20, the second fixing member 30, the first fixing member 50, the observation window 60, the first packing 71 and the second packing 72 are fixed to the upper cover 10 by screws 81.
The air inlet 40, the first fixing member 50, the nozzle 20, and the third seal ring 73 are fixed to each other by screws 82.
While embodiments of the present invention have been described above, the above description is intended to be illustrative, not exhaustive, and not limited to the disclosed embodiments. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the illustrated embodiments. The terms used herein were chosen in order to best explain the principles of the embodiments and the practical application, or to enable others of ordinary skill in the art to understand the embodiments disclosed herein.

Claims (8)

1. An air intake apparatus, characterized by comprising:
the nozzle is hollow and columnar, a first protruding shaft shoulder is arranged on the outer peripheral wall of the first end of the nozzle, and a second protruding shaft shoulder is arranged on the outer peripheral wall of the second end of the nozzle;
the fixing piece is of a hollow structure, a step is arranged on the inner wall of the fixing piece, when the nozzle sleeve is arranged in the fixing piece, the step surface of the step is jointed with the end surface of the first shaft shoulder, and the fixing piece is used for fixing the air inlet device to a piece to be installed;
the first sealing ring is arranged between the end face of the second shaft shoulder and the piece to be mounted;
the observation window is arranged on the end face of the first end of the nozzle;
the second sealing ring is arranged in the sealing groove on the end face of the first end of the nozzle;
the inner wall of the fixing piece is also provided with a horizontal plane which is jointed with the upper surface of the observation window, so that the first end of the nozzle can be sealed through the horizontal plane, the observation window, the sealing groove and the second sealing ring.
2. The air intake apparatus of claim 1, wherein the fixture includes a first fixture and a second fixture, wherein,
the first fixing piece is sleeved at the first end of the nozzle;
the second fixing piece is sleeved at the second end of the nozzle and is jointed with the first fixing piece, and the second fixing piece is used for fixing the air inlet device to the piece to be installed.
3. The air inlet device according to claim 1, wherein the first shaft shoulder is provided with a convex limiting part, and the inner wall of the fixing part is provided with a concave part matched with the limiting part;
when the nozzle is sleeved in the fixing piece, the limiting part is clamped in the concave part.
4. The air intake device of claim 3, wherein the limiting portion is a cuboid, and the recess is a groove matched with the cuboid.
5. The air intake apparatus of claim 4, wherein the cuboid has a length of 8mm to 25mm and a width of 2mm to 8 mm.
6. The air intake apparatus of claim 1, wherein an end surface of the first end of the nozzle is horizontally disposed.
7. The air intake apparatus according to claim 1, further comprising:
the air inlet portion is arranged on the peripheral wall of the nozzle, and a third sealing ring is arranged on a mounting surface between the air inlet portion and the peripheral wall of the nozzle.
8. A chamber, characterized in that it comprises an air inlet device according to any one of claims 1-7.
CN201710373466.XA 2017-05-24 2017-05-24 Air inlet device and chamber comprising same Active CN108933074B (en)

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CN108933074B true CN108933074B (en) 2020-06-19

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112331544B (en) * 2020-10-30 2024-05-17 北京北方华创微电子装备有限公司 Dielectric window assembly for semiconductor equipment

Citations (6)

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Publication number Priority date Publication date Assignee Title
US4434742A (en) * 1981-10-02 1984-03-06 Louis Henaff Installation for depositing thin layers in the reactive vapor phase
KR20050000753A (en) * 2003-06-24 2005-01-06 삼성전자주식회사 Semiconductor device dry etching apparatus having improved showerhead
CN2775832Y (en) * 2005-01-27 2006-04-26 北京北方微电子基地设备工艺研究中心有限责任公司 Air inlet nozzle and its inductive coupling plasma device
CN203134753U (en) * 2013-02-22 2013-08-14 北京七星华创电子股份有限公司 Air inlet apparatus used for semiconductor reaction chamber
TW201631273A (en) * 2015-01-28 2016-09-01 Nissin Electric Co Ltd Pipe holding and connecting structure and high-frequency antenna device with same
CN106601580A (en) * 2015-10-19 2017-04-26 北京北方微电子基地设备工艺研究中心有限责任公司 Air inlet mechanism and reaction cavity

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4434742A (en) * 1981-10-02 1984-03-06 Louis Henaff Installation for depositing thin layers in the reactive vapor phase
KR20050000753A (en) * 2003-06-24 2005-01-06 삼성전자주식회사 Semiconductor device dry etching apparatus having improved showerhead
CN2775832Y (en) * 2005-01-27 2006-04-26 北京北方微电子基地设备工艺研究中心有限责任公司 Air inlet nozzle and its inductive coupling plasma device
CN203134753U (en) * 2013-02-22 2013-08-14 北京七星华创电子股份有限公司 Air inlet apparatus used for semiconductor reaction chamber
TW201631273A (en) * 2015-01-28 2016-09-01 Nissin Electric Co Ltd Pipe holding and connecting structure and high-frequency antenna device with same
CN106601580A (en) * 2015-10-19 2017-04-26 北京北方微电子基地设备工艺研究中心有限责任公司 Air inlet mechanism and reaction cavity

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