CN108885285A - Optical reflection film and back light for liquid crystal display device unit - Google Patents
Optical reflection film and back light for liquid crystal display device unit Download PDFInfo
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- CN108885285A CN108885285A CN201780019279.XA CN201780019279A CN108885285A CN 108885285 A CN108885285 A CN 108885285A CN 201780019279 A CN201780019279 A CN 201780019279A CN 108885285 A CN108885285 A CN 108885285A
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- layer
- refractive index
- index layer
- optical reflection
- reflection film
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133605—Direct backlight including specially adapted reflectors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
Abstract
The purpose of the present invention is to provide the optical reflection films for the generation that can inhibit spot when being exposed under high temperature and humidity in the case where not reducing brightness and coloration.Optical reflection film of the invention is that successively have supporting mass A, anchor layer B, silver or using silver as principal component metallic reflector C, low-index layer D, the optical reflection film of high refractive index layer E and barrier layer F, the refractive index that the low-index layer D contains resin and sulfur-containing compound and has the refractive index of the light than the wavelength 570nm of the supporting mass A low, the refractive index that the high refractive index layer E has the refractive index of the light than the wavelength 570nm of the supporting mass A high, the barrier layer F is the layer of the solidfied material comprising (poly-) silicone compounds or the layer that is made of the inorganic matter with siloxane backbone, and the barrier layer F with a thickness of 5~30nm.
Description
Technical field
The present invention relates to optical reflection film and back light for liquid crystal display device units.
Background technique
Reflection component is anti-for the optical reflection film of back light for liquid crystal display device unit, projection TV and optical system device
Penetrate the reflection component etc. of mirror and LED illumination.
Although the commonly used silver layer of metallic reflector as reflection component visible light region (wavelength 560~
600nm) there is high reflectivity, but the reflection of region of blue light (430~470nm of wavelength) is slightly lower, color balance is biased to yellow
The case where become problem.Therefore, it in order to keep the reflectivity of the luminance factor visible light region of region of blue light high, has inquired into silver
Stacking is reflector made of the low-index layer of principal component and high refractive index layer (referring for example to patent text using silica on layer
It offers 1).In addition, it is also known that hard conating is further laminated on high refractive index layer (referring for example to patent document 1).
But the optical reflection film of back light for liquid crystal display device unit is exposed to hot and humid environment when in use sometimes
Under.Therefore, seek a kind of even when exposed under high temperature and humidity, being also able to maintain that the optical reflection film of good reflectivity has
The optical reflection film of high wet heat durability.
Existing technical literature
Patent document
Patent document 1：No. 4498273 bulletins of Japanese Patent No.
Summary of the invention
However, being reflected when there is the exposure certain time under high temperature and humidity in optical reflection film shown in patent document 1
The surface of layer leads to the problem of the spot of brown.
In this regard, inhibiting brown with being also unable to fully even if existing hard conating is arranged on the high refractive index layer of optical reflection film
The spot of color.In addition, by the thickness for thickening hard conating the spot of brown can be inhibited to a certain extent, but there are brightness
The problem of being reduced with coloration.
The present invention has been made in view of the above-described circumstances, and an object thereof is to provide can be in the feelings for not reducing brightness and coloration
Inhibit the optical reflection film of the generation of the spot of brown when being exposed under high temperature and humidity under condition.
[1] a kind of optical reflection film, be successively have supporting mass A, anchor layer (Anchor layer) B, silver or using it is silver-colored as
The optical reflection film of the metallic reflector C of principal component, low-index layer D, high refractive index layer E and barrier layer F, the low-refraction
The refractive index that layer D contains resin and sulfur-containing compound and have the refractive index of the light than the wavelength 570nm of the supporting mass A low,
The refractive index that the high refractive index layer E has the refractive index of the light than the wavelength 570nm of the supporting mass A high, the barrier layer F
Layer for the solidfied material comprising (poly-) silicone compounds or the layer that is made of the inorganic matter with siloxane backbone, and it is described
Barrier layer F with a thickness of 5~30nm.
[2] optical reflection film according to [1], wherein the low-index layer D with a thickness of 20~50nm and the height
Index layer E with a thickness of 20~50nm.
[3] a kind of back light for liquid crystal display device unit includes optical reflection film described in light source and [1] or [2].
In accordance with the invention it is possible to which providing can inhibit to be exposed under high temperature and humidity in the case where not reducing brightness and coloration
When spot generation optical reflection film.
Detailed description of the invention
Fig. 1 is the schematic diagram for indicating an example of optical reflection film of the invention.
Fig. 2 is the sectional view for indicating an example of liquid crystal display device of the invention.
Specific embodiment
As described above, having silver or using silver as the metallic reflector of principal component, the low folding using silica as principal component
Penetrate in the optical reflection film of rate layer, high refractive index layer and existing hard conating exist under high temperature and humidity exposure certain time when
The surface of metallic reflector leads to the problem of the spot of brown.The reason is not yet clear, however, it is thought that because of the silver of metallic reflector
Atom due to the moisture that is penetrated from outside air etc. influence and migrate.
In contrast, " including the solidification of (poly-) silicone compounds by having on high refractive index layer in the present invention
Object or the barrier layer F " being made of the inorganic matter with siloxane backbone, can highly inhibit the spot of brown.The reason
It is not yet clear, but speculate it is the transmission that can highly inhibit moisture because of barrier layer F, it is able to suppress depositing in moisture
The migration for the silver atoms being easy to produce under.
In addition, being able to suppress by the way that the thickness of barrier layer F is adjusted to 5~30nm through low-index layer D and high refraction
The stacking of rate layer E and the brightness adjusted and coloration are impaired.As a result, it is possible in the case where not reducing brightness, coloration highly
Inhibit the spot of brown when exposing certain time under high temperature and humidity.
In addition, can more highly inhibit the spot of brown by " low-index layer D contains sulfur-containing compound ".Think
This is because inhibiting the transmission of moisture by barrier layer F, thus the migration of silver atoms is inhibited, in addition, institute in low-index layer D
The sulphur compound contained is bonded with silver atoms contained in metallic reflector, is less susceptible to that the migration of silver atoms occurs as a result,.The present invention
It is to be completed based on such opinion.
[1. optical reflection films
Optical reflection film of the invention successively has supporting mass A, anchor layer B, metallic reflector C, low-index layer D, high folding
Penetrate rate layer E and barrier layer F.
1-1. supporting mass A
Supporting mass A for example can be resin film.The example of resin film includes polyethylene terephthalate film, poly- naphthalene two
Polyester films, polypropylene screen, acrylic films, polycarbonate membrane, polyimide film, PS membrane, the polyethers such as formic acid glycol ester film
Ether ketone film, fluororesin film, cellulose esters mesentery, polycyclic alkene mesentery etc..Wherein, from heat resistance, intensity it is good from the aspect of,
It is preferred that polyethylene terephthalate film, polypropylene screen.
Resin film can be transparent, be also possible to opaque.From the viewpoint of obtaining high weatherability, preferably thoroughly
Ming tree adipose membrane, from the viewpoint of obtaining high reflectivity, preferred white resin film.
Mean transmissivity at 360~400nm of wavelength of transparent resin film is preferably 80% or more, more preferably 85% with
On.The mean transmissivity of transparent resin film can use the spectrophotometer of Hitachi High Technologies corporation
U-4100 is measured.
The full light reflectance of white resin film is preferably 50% or more, and more preferably 80% or more.White resin film
Full light reflectance can be according to JIS K 7375：2008 " plastics-total light transmittances and full light reflectance seek method " into
Row measurement.
The thickness of supporting mass A is preferably 10~300 μm.If supporting mass A with a thickness of 10 μm or more, supporting mass A tool
There is sufficient intensity, it is therefore, easy to operate.If supporting mass A with a thickness of 300 μm hereinafter, if supporting mass A surface smoothness
It is not easily damaged.The thickness of supporting mass A is more preferably 20~250 μm.
1-2. anchor layer B
Anchor layer B is configured between supporting mass A and metallic reflector C, is had and is easy to be formed uniformly metallic reflector C
And improve the function of the adaptation of supporting mass A and metallic reflector C.
Anchor layer B contains resin as principal component.The example of resin contained in anchor layer includes polyester based resin, propylene
The thermoplastic resins such as acid system resin, polyamide resin, vinyl chloride-based resin, chloride vinylacetate copolymer have official
Heat-curing resins or its solidfied material such as solidfied material, melamine series resin, the epoxy system resin of the thermoplastic resin that can be rolled into a ball.
Wherein, from weatherability etc. it is excellent from the aspect of, preferably acrylic resin, melamine resin, more preferable melamine tree
Rouge.
The example of melamine resin includes butylated melamine resins.Butylated melamine resins are by melamine
Amine and the methylol in the addition reaction product, that is, methylolated melamine resin of aldehyde ingredient (formaldehyde, paraformaldehyde etc.)
Obtained from part or all is etherified with n-butanol or isobutanol.
The thickness of anchor layer B is preferably 0.01~3 μm.If anchor layer B with a thickness of 0.01 μm or more, be easy uniform
Ground forms metallic reflector C and is easy to fully improve the adaptation of supporting mass A Yu metallic reflector C.If the thickness of anchor layer B
Degree is for 3 μm hereinafter, then the film thickness uniformity, coloration of anchor layer B and brightness is not easily damaged.The thickness of anchor layer B is more preferably 0.1
~1 μm.
1-3. metallic reflector C
Metallic reflector C contains Ag or its alloy as principal component." containing Ag or its alloy as principal component " refers to Ag
Or its alloy is relative to metallic reflector C generally 90 atom % or more.The content of Ag or its alloy is anti-preferably with respect to metal
Penetrate layer C generally 90 atom % or more, more preferably 99.9 atom % or more.
Metallic reflector C can according to need further containing other metals other than Ag or its alloy.Other metals
Example include selected from least one of Al, Cu, Pd, Cr, Cu, Ni, Ti, Mg, Rh, Pt and Au and its alloy, preferably Al and
Its alloy or Au and its alloy.
From the aspect of reflectivity, the thickness of metallic reflector C is preferably 30~200nm.If metallic reflector C's
With a thickness of 30nm or more, then the reduction of the reflectivity caused by increasing because of the ratio through light is able to suppress.If metallic reflector C
With a thickness of 200nm hereinafter, being then able to suppress the increase of manufacturing cost.The thickness of metallic reflector C is more preferably 30~
150nm, further preferably 80~150nm.
The surface reflectivity of metallic reflector C is preferably 80% or more, and more preferably 90% or more.Metallic reflector C's
The spectrophotometer U-4100 that surface reflectivity can use Hitachi High Technologies corporation is measured.
1-4. low-index layer D/ high refractive index layer E
The function that low-index layer D and high refractive index layer E has the reflectivity for improving metallic reflector C and adjusts coloration
Energy.The refractive index that low-index layer D has the refractive index of the light of the wavelength 570nm than supporting mass A low, high refractive index layer E have
The high refractive index of the refractive index of the light of wavelength 570nm than supporting mass A.
That is, the folding of the light of wavelength 570nm of the refractive index of the light of the wavelength 570nm of high refractive index layer E than low-index layer D
Penetrate rate height.From the aspect of it fully can adjust coloration, the light of the wavelength 570nm of high refractive index layer E and low-index layer D
The difference of refractive index be preferably 0.35 or more, more preferably 0.4 or more, further preferably 0.5~1.10.
In order to make low-index layer D and high refractive index layer E play a role as reflecting layer is increased, by low-index layer D's
Refractive index at wavelength 570nm is set as nL, thickness is set as dL, the refractive index at the wavelength 570nm of high refractive index layer E is set as
nH, thickness is set as dHWhen, preferably meet following formula (1) and (2) simultaneously.
Formula (1)：190 < 8dL·nL(the preferably 350 < 8d of < 730L·nL< 600)
Formula (2)：190 < 4dH·nH(the preferably 400 < 4d of < 730L·nL< 600)
1-4-1. low-index layer D
Consider with the refringence of supporting mass A and high refractive index layer E and set the light of the wavelength 570nm of low-index layer D
Refractive index nL, such as preferably 1.80 hereinafter, more preferably 1.30~1.70.The refractive index n of low-index layer DFLIt is main to use
The refractive index of material contained in low-index layer D, the density of low-index layer D are adjusted.
The refractive index n of low-index layer DLIt can be measured by the following method.That is, in poly terephthalic acid second two
The low-index layer of vacuum evaporation thickness 100nm, obtains detecting refractive index sample on alcohol ester substrate.It is ellipse using hole field spectrum
The refractive index of the light of the wavelength 570nm for the sample that inclined instrument UVSEL is measured.
Low-index layer D contains resin and sulfur-containing compound.
As long as resin contained in low-index layer D is the resin with the refractive index suitable for low-index layer D.This
The example of the resin of sample includes acrylic resin, melamine series resin, polyvinyl alcohol resin and cellulose family (cellulose
Ester, cellulose ether etc.).Wherein, from the viewpoint of being easily adjusted refractive index, preferably acrylic resin, melamine series tree
The mixture of rouge and they, more preferable acrylic resin.Acrylic resin may be further solid with isocyanates etc.
The cross-linking agent (solidfied material) that agent is crosslinked.
Acrylic resin can be single for the homopolymer or (methyl) acrylate of (methyl) acrylate and other copolymerization
The copolymer of body.(methyl) acrylate preferably can be methyl methacrylate.
Can with the example of the polymer monomers of methyl methacrylate copolymer include moieties carbon atom number be 2~
18 alkyl methacrylate；The alkyl alkylate ester that the carbon atom number of moieties is 1~18；Acrylic acid, metering system
The alpha, beta-unsaturated acids such as acid；The dicarboxylic acids containing unsaturated group such as maleic acid, fumaric acid, itaconic acid；(methyl) acrylic acid
2- hydroxy methyl, (methyl) acrylic acid 2- hydroxy propyl ester, (methyl) acrylic acid 3- hydroxy propyl ester, (methyl) acrylic acid 6- hydroxyl
(methyl) propylene of the hydroxyls such as the own ester of base, diethylene glycol list (methyl) acrylate, dipropylene glycol list (methyl) acrylate
Acid esters；The aromatic ethenyl compounds such as styrene, α-methylstyrene；The acrylamides such as acryloyl morpholine (ACMO) are derivative
Object etc..They can also be applied in combination two or more with a kind of use.Wherein, from can with curing agent be crosslinked and formed
From the viewpoint of cross-linking agent (solidfied material), preferred (methyl) acrylate of hydroxyl.Methyl methacrylate and other copolymerization
The ratio of the Component units from comonomer in the copolymer of monomer is preferably 50 mass % hereinafter, more preferably 30 matter
Measure % or less.
The concrete example of acrylic resin includes poly- (methyl methacrylate) (PMMA), poly- (methyl methacrylate)
Copolymer (coPMMA) etc..
As long as the weight average molecular weight of resin is the degree that can be coated with, such as can be 1000~500,000.Weight-average molecular
Amount can use high performance liquid chromatography and be measured.
The content of resin is 60 mass % or more preferably with respect to the gross mass of low-index layer D.If the content of resin
For 60 mass % or more, then the durability of metallic reflector C can be fully improved.The content of resin is preferably with respect to low refraction
The gross mass of rate layer D is 70 mass % or more, more preferably 80 mass % or more.
Sulfur-containing compound contained in low-index layer D is in the molecule with 1 or more thioether group (- S-) or sulphur
The compound of alcohol radical (- SH).
The example of sulfur-containing compound includes the carboxylic acids containing mercapto such as thioacetic acid, mercaptopropionic acid, mercaptobutyric acid；Benzene sulphur
Phenol, 2- mercapto benzyl alcohol, 2- phenoxy group benzenethiol, 3- sulfydryl phenanthrene, 2- sulfydryl -4 (3H)-quinazoline and β-mercaptonaphthalene etc.
Aromatic hydrocarbon mercaptan compound；Ethyl mercaptan, propanethiol, 1,2- dithioglycol, 1,3- dimercaptopropane, 1,4- succinimide mercaptans, 2,
3- succinimide mercaptans, 1,5- pentane disulfide thioalcohol, 1,6- ethanthiol etc. alkane (poly-) mercaptan compound；3- sulfydryl -1,2,4-
Triazole, 1- methyl -3- sulfydryl -1,2,4- triazole, 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, 2- sulfydryl benzene
AndThe heteroaromatics mercaptan compound such as azoles；Thiazole, thiazoline, thiazolone, thiazolidine, thiazolidone, isothiazole, benzo
Thiazole, 2-N, N- diethyl sulfide is for the thiazolium compounds such as benzothiazole and P- dimethylamino benzene rhodanine；Mercaptoacetyl
Naphthylamines；The alkoxysilane compound containing trialkylsilyl group in molecular structure containing mercapto such as 3-mercaptopropyi trimethoxy silane；Make the carboxylic acid (mercapto containing mercapto
Guanidine-acetic acid, mercaptopropionic acid etc.) and alcohol (methanol, ethyl alcohol, butanediol, hexylene glycol, trimethylolpropane and pentaerythrite etc. (poly-)
Alcohol) carry out carboxylic acid derivates (methyl thioglycolate, mercapto-propionate, mercaptopropionic acid containing mercapto obtained from ester reaction
Monooctyl ester, mercaptopropionic acid methoxybutyl, ethylene glycol dimercapto acetate, butanediol double mercaptoacetates (BDTG), trihydroxy methyl
Propane tri-thiol acetic acid esters (TMTG), trimethylolpropane tris thiopropionate (TMTP) and pentaerythrite tetrathio propionic ester
(PETG) etc.)；The carboxylic acid (thio-2 acid etc.) of sulfur-bearing ether and (poly-) alcohol (laruyl alcohol, myristyl alcohol etc.) is set be esterified instead
Carboxylic acid derivates (the dilauryl 3,3- thiodipropionate, myristyl 3,3 '-thio two of Sulfide-containing Hindered obtained from answering
Propionic ester, distearyl 3,3- thiodipropionate, lauryl stearyl 3,3- thiodipropionate etc.)；Sulfane crosses sulfane
Equal sulfur-bearings chelate compound etc..
Wherein, from the aspect of being easy the metallic atom interaction with composition metallic reflector C, preferably in the molecule
Compound (mercaptan compound) with mercapto.From unwanted light absorption and thus caused deterioration is inhibited, improve resistance to
From the viewpoint of photosensitiveness, mercaptan compound is preferably the mercaptan without aromatic series hydrocarbon ring, heteroaromatic or unsaturated double-bond
Compound, more preferably containing the carboxylic acid derivates of mercapto.
Mercaptan compound can be the mercaptan compound of the simple function in the molecule with 1 mercapto, or
Polyfunctional mercaptan compound of the intramolecular with 2 or more mercaptos.Wherein, from easy with composition metallic reflector C's
From the aspect of metallic atom interaction, more preferably polyfunctional mercaptan compound, further preferably 3 functions or 4 officials
The mercaptan compound of energy.
The mercapto equivalent (g/eq) of compound with mercapto is preferably 300 hereinafter, more preferably 200 in the molecule
Below.If mercapto equivalent be it is certain hereinafter, if due to largely containing mercapto in the molecule, be easy and constitute gold
Belong to the silver atoms interaction of reflecting layer C.It is not only easy to be formed uniformly metallic reflector C as a result, but also is easy to inhibit silver former
The migration of son.Mercapto equivalent is defined by following formula.
The quantity of mercapto in mercapto equivalent (g/eq)=sulfur-containing compound weight average molecular weight/every 1 molecule
As long as the weight average molecular weight of sulfur-containing compound can be well dispersed into resin, it is not particularly limited, example
It is such as preferably 100~1000, more preferably 150~500.
Relative to the total of resin contained in low-index layer D, the content of sulfur-containing compound is preferably 0.5~20 matter
Measure %.If the content of sulfur-containing compound is 0.5 mass % or more, metallic reflector C and low refraction can be fully improved
Therefore the interaction of rate layer D can fully improve the wet heat durability of metallic reflector C.If sulfur-containing compound contains
Amount is 20 mass % hereinafter, can not only then react with the silver atoms of metallic reflector C and further suppress the spot for generating brown
Point, but also it is not likely to produce the reduction of the coloring of the light absorption of adjoint sulfur-containing compound, reflectivity.Relative to low-index layer D
Contained in resin it is total, the content of sulfur-containing compound is more preferably 1~10 mass %.
The thickness d of low-index layer DLDepending on carry out increase reflection light wavelength region, from improve for example wavelength 430~
From the aspect of the increasing reflecting effect of the light of 470nm, preferably 10~70nm, more preferably 20~50nm, further preferably
30~50nm.If thickness dLFor 10nm or more, then it is easy to improve brightness, if it is 70nm hereinafter, being then easy to make blue light area
The reflectivity of the luminance factor visible light region in domain is high, therefore, can improve coloration.
1-4-2. high refractive index layer E
Consider and the light of the wavelength 570nm of the refringence of supporting mass A and low-index layer D setting high refractive index layer E
Refractive index nH, such as preferably 1.85 or more, more preferably 2.00~2.70.The refractive index of high refractive index layer E mainly utilizes height
The refractive index of material contained in index layer E and the density of high refractive index layer E are adjusted.
For the refractive index n of high refractive index layer EH, except the vacuum evaporation thickness on polyethylene terephthalate substrate
The high refractive index layer of 100nm and obtain other than detecting refractive index sample, be measured in the same manner as described above measurement.
High refractive index layer E can be the inorganic layer (preferably film) using inorganic material as principal component, or
Using resin as the resin layer of principal component.Wherein, from the aspect of being easy to get high refractive index, high refractive index layer E is preferred
For the inorganic layer using inorganic material as principal component.Referred to using inorganic material as principal component relative to high refractive index layer E's
Gross mass, the inorganic material containing 50 mass % or more.
The example for constituting the inorganic material of high refractive index layer E includes metal oxide or metal sulfide.Constitute metal oxygen
The example of the metal of compound or metal sulfide includes Zn, Ti, Zr, Nb, Ta and In etc..The example of metal oxide includes
TiO2, ITO (tin indium oxide), ZnO, Nb2O5、ZrO2、Ta2O5、Ti3O5、Ti4O7、Ti2O3With TiO etc..The example of metal sulfide
Include ZnS, MnS etc..
Wherein, from the aspect of it can effectively improve the light characteristic using the back light unit of optical reflection film, preferably
Metal sulfide；From the aspect of with high refractive index and the transparency, more preferable zinc sulphide (ZnS).
The content of metal oxide or metal sulfide preferably with respect to high refractive index layer E gross mass be 90 atom % with
On, more preferably 95 atom % or more.
The thickness d of high refractive index layer EHDepending on carry out increase reflection light wavelength region, from improve for example wavelength 430~
From the aspect of the increasing reflecting effect of the light of 470nm, preferably 10~70nm, more preferably 20~50nm, further preferably
30~50nm.If thickness dHFor 10nm or more, then it is easy to improve brightness, if it is 70nm hereinafter, being then easy to make blue light area
The reflectivity of the luminance factor visible light region in domain is high, therefore, can improve coloration.
When determining the thickness of low-index layer D, high refractive index layer E, there are low-index layer D, high refractive index layer E sometimes
Composition continuously changes, the unclear situation in bed boundary.In this case, " low-index layer D and high refractive index layer E's
It, can when maximum refractive index in entirety "-" minimum refractive index in the entirety of low-index layer D and high refractive index layer E "=Δ n
To regard the place the minimum refractive index of 2 interlayers+Δ n/2 as " bed boundary of low-index layer D and high refractive index layer E ".
Largest refractive index and minimum refractive index in the entirety of low-index layer D and high refractive index layer E can be found out as follows,
That is, forming using the atom of the respective depth direction of XPS measurement low-index layer D and high refractive index layer E, it is based on the atom group
It is found out at being calculated.The atom composition of the depth direction of low-index layer D and high refractive index layer E can be by obtaining as follows
It arrives：XPS surface analysis apparatus is utilized to survey while being etched using sputtering method from the surface of optical reflection film to depth direction
The atomic composition ratio of fixed each depth；Alternatively, the stacked film of low-index layer D, high refractive index layer E are cut off, the surface XPS point is utilized
The atomic composition ratio of analysis apparatus measurement section.
1-5. barrier layer F
Barrier layer F is for the layer of the solidfied material comprising (poly-) silicone compounds or by the inorganic matter structure with siloxane backbone
At layer.
Layer of the 1-5-1. about the solidfied material comprising (poly-) silicone compounds
" solidfied materials of (poly-) silicone compounds " in the layer of solidfied material comprising (poly-) silicone compounds can be
In 2 functional alkoxysilanes compounds, 3 functional alkoxysilanes compounds and 4 functional alkoxysilanes compounds extremely
The solidfied material of a kind of few alkoxysilane compound containing trialkylsilyl group in molecular structure or its oligomer ((poly-) silicone compounds).
That is, the solidfied material of (poly-) silicone compounds at least contains the structure list from 2 functional alkoxysilanes compounds
First (structural unit shown in following formula (1)：D unit), the structural unit (following formula from 3 functional alkoxysilanes compounds
(2) structural unit shown in：T unit) and structural unit from 4 functional alkoxysilanes compounds (shown in following formula (3)
Structural unit：One of Q unit).
The n of the l of formula (1), the m of formula (2) and formula (3) are the repeat number of each structural unit, usually 0 or more integer and l+
M+n is 2 or more.
The 2 functional alkoxysilanes compounds for obtaining structural unit shown in formula (1) can be by the following general formula (I) table
Show.
R1 2Si(OR2)2…(I)
The R of logical formula (I)1Indicate hydrogen atom or alkyl.R2Each independently represent the alkyl or phenyl of carbon atom number 1~5.
The example of the alkoxysilane compound containing trialkylsilyl group in molecular structure of 2 functions includes dimethoxysilane, diethoxy silane, dipropoxy silicon
Alkane, diamyl oxysilane, hexichol oxysilane, methoxy-ethoxy-silane, methoxy propoxy silane, methoxypentyloxy silicon
Alkane, methoxyphenoxy silane, ethoxy-c oxysilane, ethoxy-pentoxy silane, phenoxy ethoxy base silane, methyl two
Methoxy silane, methyl methoxy base oxethyl silane, methyldiethoxysilane, methyl methoxy base npropoxysilane etc..Wherein,
It is preferred that dimethoxysilane, diethoxy silane, methyl dimethoxysilane, methyldiethoxysilane.
The 3 functional alkoxysilanes compounds for obtaining structural unit shown in formula (2) can be by the following general formula (II)
It indicates.
R3Si(OR4)3…(II)
The R of logical formula (II)3Indicate hydrogen atom or alkyl.R4Each independently represent the alkyl or phenyl of carbon atom number 1~5.
The example of 3 functional alkoxysilanes compounds includes trimethoxy silane, triethoxysilane, tripropoxy silicon
Alkane, three amoxy silane, triple phenoxyl silane, dimethoxy monosubstituted ethoxy silane, diethoxy mono methoxy silane, dipropyl oxygen
Base mono methoxy silane, dipropoxy monosubstituted ethoxy silane, two amoxy mono methoxy silane, two amoxy monosubstituted ethoxy silicon
Alkane, two amoxy list npropoxysilanes, two phenoxy group mono methoxy silane, two phenoxy group monosubstituted ethoxy silane, two phenoxy group lists
Npropoxysilane, methoxy ethoxy npropoxysilane, single propoxyl group dimethoxysilane, single propoxyl group diethoxy silane,
The one hydrogen silane chemical combination such as only son's oxygroup dimethoxysilane, single amoxy diethoxy silane, single phenoxy group diethoxy silane
Object；Methyltrimethoxysilane, methyltriethoxysilane, methyl tripropoxy silane, three amoxy silane of methyl, methyl list
Methoxyl group diethoxy silane, methyl mono methoxy dipropoxy silane, methyl mono methoxy diamyl oxysilane, methyl list first
Oxygroup hexichol oxysilane, methyl methoxy base oxethyl npropoxysilane, methyl mono methoxy monosubstituted ethoxy only son's oxysilane
Deng monomethylsilane compound；Ethyl trimethoxy silane, ethyl tripropoxy silane, three amoxy silane of ethyl, ethyl
Triple phenoxyl silane, ethyl mono methoxy diethoxy silane, ethyl mono methoxy dipropoxy silane, ethyl mono methoxy two
The list ethyl such as amoxy silane, ethyl mono methoxy hexichol oxysilane, ethyl mono methoxy monosubstituted ethoxy only son's oxysilane
Silane compound etc..Wherein, including methyltrimethoxysilane and methyltriethoxysilane, preferred methyl trimethoxy oxygroup silicon
Alkane.
The 4 functional alkoxysilanes compounds for obtaining structural unit shown in formula (3) can be by the following general formula (III)
It indicates.
Si(OR5)4…(III)
The R of logical formula (III)5Each independently represent the alkyl or phenyl of carbon atom number 1~5.
The example of 4 functional alkoxysilanes compounds includes tetramethoxy-silicane, tetraethoxysilane, tetrapropoxysilane
Four butoxy silanes, four amoxy silane, tetraphenoxy-silicane alkane, trimethoxy monosubstituted ethoxy silane, dimethoxy diethoxy
Silane, triethoxy mono methoxy silane etc..Among these, preferably tetramethoxy-silicane, tetraethoxysilane.
The solidfied material of (poly-) silicone compounds preferably at least contains the structure list from 3 functional alkoxysilanes compounds
First at least one of (T unit) and the structural unit (Q unit) from 4 functional alkoxysilanes compounds.This is because tool
Having the polymer of the siloxane backbone containing these structural units has high crosslink density, is easy to get good barrier property.
(T is mono- for the structural unit from 3 functional alkoxysilanes compounds in the solidfied material of (poly-) silicone compounds
Member) and the total amount of the structural unit (Q unit) from 4 functional alkoxysilanes compounds can be by (poly-) silicone compounds
Solidfied material solid Si-NMR spectrum find out.
The content of the solidfied material of (poly-) silicone compounds preferably with respect to barrier layer F gross mass be 85 mass % with
On, more preferably 90 mass % or more, further preferably 95 mass % or more, or 100 mass %.
It can be coated with as described later and use group containing the formation of the barrier layer of (poly-) silicone compounds and solvent as needed
After closing object, it is dried and cured the barrier layer F of (polycondensation) and solidfied material of the formation comprising (poly-) silicone compounds.
1-5-2. is about the layer being made of the inorganic matter with siloxane backbone
The layer being made of the inorganic matter with siloxane backbone is inorganic matter (such as the SiO with siloxane backbone2Deng)
Film.The film can be formed by sputtering method, vacuum vapour deposition as described later.
The content of inorganic matter with siloxane backbone is 90 atom % or more preferably with respect to barrier layer F, more preferably
95 atom % or more, or 100 atom %.
The physical property of 1-5-3. barrier layer F
The thickness of barrier layer F is preferably 5~30nm.If barrier layer F with a thickness of 5nm or more, if exposed to wet
Under thermal environment, vapor and oxygen are also not easy to penetrate, and therefore, are able to suppress and generate the spot of brown in metallic reflector C.If resistance
Interlayer F with a thickness of 30nm hereinafter, the brightness and color then carried out by the stacking of low-index layer D and high refractive index layer E is (special
Not coloration) adjustment effect it is not easily damaged.The thickness of barrier layer F is more preferably 5~20nm.
40 DEG C of barrier layer F, the moisture-vapor transmission under 90%RH be preferably 5g/m2Day is hereinafter, more preferably 1g/
m2Day or less.23 DEG C of barrier layer F, the oxygen permeability under conditions of 90%RH be preferably 0.1ml/m2/ day/atm or less.
40 DEG C of barrier layer F, the moisture-vapor transmission under 90%RH can be measured by the following method.That is,
The barrier layer F of defined thickness is formed on polyethylene terephthalate (PET) substrate that 100 μm of thickness and obtains sample.
MOCON corporation is used respectively：PERMATRAN-W 3/32, which is measured in the environment of 40 DEG C of temperature, humidity 90%RH, to be obtained
The moisture-vapor transmission of sample and substrate.Then, the moisture-vapor transmission that substrate is subtracted from the moisture-vapor transmission of sample, obtains
The moisture-vapor transmission of barrier layer F.
1-6. stepped construction
Low-index layer D contained in optical reflection film of the invention and high refractive index layer E can be 1 respectively, can also be with
It is multiple.Multiple low-index layer D can be mutually the same, can also be different.Multiple high refractive index layer E can be mutually the same,
It can be different.As long as stacking gradually the low-index layer D and height of 2m layers total (integer that m is 1 or more) from the side metallic reflector C
Index layer E.
The example of the stepped construction of optical reflection film of the invention includes mode below.In mode below, A is bearing
Body A, B are anchor layer, and C is metallic reflector, and D is low-index layer, and E is high refractive index layer, and F is barrier layer.In side below
In formula, right side is equivalent to light incident side.
A/B/C/D/E/F
A/B/C/D/E/D/E/F
The repeat number m of " D/E " also depends on the reflectivity of requirement, for example, 1~10, preferably 1~5, more preferably 1 or
2.From the aspect of fully playing a role as reflection enhancing coating, low-index layer D and high refractive index layer E preferably phase each other
It connects.
Fig. 1 is the schematic diagram for indicating an example of optical reflection film of the invention.Optical reflection film 10 successively contains supporting mass
A11, anchor layer B13, metallic reflector C15, low-index layer D17, high refractive index layer E19 and barrier layer F21.Optical reflection film
10 light incident surface is the surface of barrier layer F21.
1-7. physical property
(average reflectance)
Average reflectance at wavelength 430nm~470nm of optical reflection film of the invention for example can be 94% or more.Separately
Outside, the average reflectance R1 of wavelength 430nm~470nm of optical reflection film of the invention is preferably more flat than wavelength 560nm~600nm
Equal reflectivity R2 high.Optical reflection film with such average reflectance is for example suitable as back light for liquid crystal display device unit
Optical reflection film.
The spectral luminosity of Hitachi High Technologies corporation can be used in the average reflectance of optical reflection film
It counts U-4100 (solid sample measurement system), is measured with 5 ° of condition of incidence angle.
The thickness of optical reflection film of the invention for example can be 10~500 μm, preferably 10~300 μm, more preferably 20
~150 μm.
2. the manufacturing method of optical reflection film
Optical reflection film of the invention can be manufactured by arbitrary method, for example, can on supporting mass A successively layer
It folds anchor layer B, metallic reflector C, low-index layer D, high refractive index layer E and barrier layer F and manufactures.
After anchor layer B can be coated with anchor layer composition on supporting mass A, it is dried and is consolidated as needed
Change and is formed.
Anchor layer composition contains above-mentioned thermoplastic resin or heat-curing resin, also can according to need further
Contain solvent.As long as solvent is the solvent for dispersing above-mentioned resin well, such as can be non-protonic solvent.It is non-
The example of protonic solvent includes the hydrocarbon solvents such as pentane, hexane, hexamethylene, toluene；The halogenated hydrocarbons such as methylene chloride, trichloroethanes are molten
Agent；The esters such as ethyl acetate, butyl acetate；The ketones such as acetone, methyl ethyl ketone；Dibutyl ethers, twoAlkane, tetrahydrofuran etc.
Ethers etc..
It, can also be further when anchor layer composition contains thermoplastic resin with functional group, heat-curing resin
Contain curing agent.The example of curing agent includes polyisocyanate, melamine based compound and epoxy compound etc..Curing agent
Content can be for 0.1~15 mass % or so relative to heat-curing resin.
The coating of anchor layer composition can for example be carried out by gravure coating process, spin-coating method and stick coating method etc..Anchoring
The solidification of the film of layer composition can be photocuring or heat cure, preferably heat cure.
Metallic reflector C can be film-made method by vacuum and be formed.The example that vacuum is film-made method includes electric resistor heating type vacuum
Vapour deposition method, electron beam heated type vacuum vapour deposition, ion plating method, Assisted by Ion Beam vacuum vapour deposition and sputtering method.Wherein, from energy
It is enough in a manner of being continuously film-made i.e. it is roll-to-roll be filmed from the aspect of, more preferable vacuum vapour deposition.
After low-index layer D can be coated with composition for low refractive index layer on metallic reflector C, it is dried or solidifies
And it is formed.The coating method of composition for low refractive index layer is same as the coating method of anchor layer resin combination.
Composition for low refractive index layer can further contain above-mentioned resin, sulfur-containing compound and as needed molten
Agent, curing agent.Solvent and curing agent can be used solvent identical with the solvent cures agent of anchor layer composition respectively and consolidate
Agent.
High refractive index layer E can be film-made method by vacuum and be formed.The example that vacuum is film-made method includes system similar to the above
Embrane method, from the aspect of being able to carry out continuous film, more preferably vacuum vapour deposition.
By inorganic matter (such as the SiO with siloxane backbone2) constitute barrier layer F can pass through vacuum be film-made method shape
At.The example that vacuum is film-made method includes that vacuum similar to the above is film-made method, from the aspect of being able to carry out continuous film,
Preferably vacuum vapour deposition.It can be dried and cured and be formed containing having after being coated with barrier layer formation composition
The barrier layer F of the polymer of siloxane backbone.
Barrier layer formation uses composition to contain above-mentioned (poly-) silicone compounds as principal component, can according to need into
One step contains solvent.As described above, it is alkoxy silane that barrier layer, which forms (poly-) silicone compounds contained in composition,
The monomer of compound or its oligomer consider that preferably alkoxysilane compound containing trialkylsilyl group in molecular structure is low from viewpoint for reducing cure shrinkage etc.
Polymers.
The oligomer of alkoxysilane compound containing trialkylsilyl group in molecular structure is 2 functional alkoxysilanes compounds, 3 functional alkoxysilanes compounds
With the oligomer of at least one of 4 functional alkoxysilanes compounds.From the sight for being easy to get the high solidfied material of crosslink density
Point considers, the oligomer that is preferably made of 3 functional alkoxysilanes compounds is made of 4 functional alkoxysilanes compounds
Oligomer or oligomer comprising 3 functional alkoxysilanes compounds and 4 functional alkoxysilanes compounds.
2 functional alkoxysilanes compounds, 3 functional alkoxysilanes compounds and 4 officials can be mixed with desired ratio
Energy alkoxysilane compound containing trialkylsilyl group in molecular structure, is hydrolyzed condensation reaction in the presence of acid catalyst, water, solvent and obtains alkoxy silane
The oligomer of compound.
Barrier layer formation solvent contained in composition can be used with contained in above-mentioned anchor layer composition
The same solvent of solvent.
3. the purposes of optical reflection film
Optical reflection film of the invention can be used as reflection component, such as back light for liquid crystal display device unit for various purposes
Optical reflection film, projection TV reflecting mirror and reflector of lamp etc. use.Wherein, from good reflectivity and damp and hot durable
From the aspect of property, optical reflection film of the invention is used preferably as the optical reflection film of back light for liquid crystal display device unit.
(back light for liquid crystal display device unit)
Back light for liquid crystal display device unit includes light source and optical reflection film of the invention.Optical reflection film of the invention is with it
Mode supporting mass A opposed with the back side (the not face opposed with liquid crystal display panel) of light source or light guide plate is configured.
The example of light source includes cold-cathode tube (CCFL), thermionic-cathode tube (HCFL), external electrode fluorescent (EEFL), plane
Fluorescent tube (FFL), light-emitting diode (LED), organic electroluminescent device (OLED) etc..Wherein, preferred cold-cathode tube
(CCFL), light-emitting diode (LED).
Back light for liquid crystal display device unit can further contain other optical films.The example of other optical films includes light
Diffusion barrier, prism film.The example of optical diffusion film includes the diffusion barrier for being coated with the adhesive containing filler or pearl.
Back light for liquid crystal display device unit can be the back light unit of underface type, or the backlight list of side edge type
Member.From the aspect of being suitable for middle-size and small-size liquid crystal display device, the preferred back light unit of side edge type.
The back light unit of side edge type includes light source, is adjacent and the light guide plate configured and the back side for being configured at light guide plate
The optical reflection film of side also can according to need containing other optical films.One example packet of the mode of the back light unit of side edge type
Containing aftermentioned back light unit 40 shown in Fig. 2.
(liquid crystal display device)
Liquid crystal display device of the invention includes liquid crystal display panel and back light unit.Fig. 2 is to indicate liquid crystal of the invention
The sectional view of one example of display device.The example when figure is the back light unit using side edge type.As shown in Fig. 2,
Liquid crystal display device 20 includes the back light unit 40 of liquid crystal display panel 30 and side edge type.
Liquid crystal display panel 30 includes liquid crystal cells 31 and a pair of of the polarizing film 33 and 35 for clamping it.Liquid crystal cells 31
Display mode is not particularly limited, and can be the various display patterns such as VA (MVA, PVA), IPS.Polarizing film 33 and 35B are wrapped respectively
Containing polarizer and the protective film for being configured at its at least one side.
What the back light unit 40 of side edge type was configured comprising rodlike light source 41, in such a way that side end and light source 41 are adjacent leads
Tabula rasa 43, be configured at light guide plate 43 back side optical reflection film 10 and be configured at light guide plate 43 surface side multiple optics
Film 45.Optical reflection film 10 is configured in its barrier layer 21 mode opposed with light guide plate 43.
Light source 41 is covered by reflector of lamp 42.Multiple optical films 45 are not limited to the mode of Fig. 2, can not have optical film
45, combination, the piece number of optical film can also be changed.
In the back light unit 40 of side edge type, the light issued from light source 41 is in 43 internal communication of light guide plate.From light guide plate 43
A part of light out is reflected in optical reflection film 10, is mapped to the surface side (30 side of liquid crystal display panel) of light guide plate 43.It is mapped to
The light of the surface side of light guide plate 43 is spread in optical diffusion film 47, is reflected in prism film 49, is incident on the whole of liquid crystal display panel 30
A face.
Even if the exposure certain time under high temperature and humidity of optical reflection film 10, being also able to maintain that high reflectivity.Therefore, it wraps
Liquid crystal display device 20 containing such optical reflection film 10 can maintain high light utilization ratio for a long time.
Embodiment
Hereinafter, the present invention is concretely demonstrated using embodiment, however, the present invention is not limited to these examples.
1 > of < embodiment
(preparation of anchor layer composition)
Super Beckamine J-820 (Dainippon Ink Chemicals's system, butylated melamine resins) are (molten with butanol
Agent) dilution, obtain the anchor layer composition of 5 mass % of solid component concentration.
(preparation of composition for low refractive index layer)
By as the Dianal BR-608 of resin (Mitsubishi Rayon Co., Ltd's system, acrylic resin) with become 3 matter
The mode of amount % is added in methyl ethyl ketone (MEK), into one in a manner of becoming 1 mass % relative to Dianal solid component
Trimethylolpropane tris thiopropionate (TMTP, shallow lake chemical company system, weight average molecular weight of the step addition as sulfur-containing compound
398.6, mercapto equivalent 132.8g/eq), obtain composition for low refractive index layer.
(preparation of barrier layer composition)
Organic silicon-type coating fluid (Co., Ltd. is dynamic to develop, Sarcoat SCH72, organic siliconresin) is dilute with 1- propyl alcohol
It releases, obtains the barrier layer composition of 0.2 mass % of solid component concentration.
(making for optical reflection film)
As supporting mass A, prepare 25 μm of thickness of polyester film (Supreme Being people's Du Pont membrane Co. Ltd. system, HB3).Utilize bar coater
In the anchor layer composition of the above-mentioned preparation of the coated on one side of the film, 0.1 μm of thickness of anchor layer B is formed.Then, in anchor layer
The upper vacuum evaporation silver of B, forms the metallic reflector C of thickness 120nm.Then, the low of above-mentioned preparation is coated on metallic reflector C
After index layer composition, in 90 DEG C of progress drying in 1 minute, the low-index layer D of thickness 60nm is formed.Then, in low folding
Vacuum evaporation zinc sulphide on rate layer D is penetrated, the high refractive index layer E of thickness 60nm is formed.Then, using bar coater in high refractive index layer
After being coated with barrier layer composition on E, be heating and curing within 1 minute at 100 DEG C, form consolidating comprising (poly-) silicone compounds
The barrier layer F of the thickness 5nm of compound, obtains optical reflection film.
2 > of < embodiment
The thickness of low-index layer D and high refractive index layer E are changed like that as shown in table 1 respectively, in addition to this, with
Embodiment 1 gets similarly optical reflection film.
< embodiment 3 and 4, the > of comparative example 2 and 3
The thickness of barrier layer F is changed as shown in table 1, in addition to this, it is anti-to obtain light similarly to Example 2
Penetrate film.
5 > of < embodiment
The composition of high refractive index layer E is changed as shown in table 1, in addition to this, is obtained similarly to Example 4
Optical reflection film.
The > of < embodiment 6 and 7
The thickness of low-index layer D is changed as shown in table 1, in addition to this, is obtained similarly to Example 2
Optical reflection film.
The > of < embodiment 8 and 9
The thickness of high refractive index layer E is changed as shown in table 1, in addition to this, is obtained similarly to Example 2
Optical reflection film.
10 > of < embodiment
Using the L-430S-FHS of Anelva company, in Ar 20sccm, O25sccm, sputtering pressure 0.3Pa, room temperature
Under, target side power 300W, rate of film buildRF sputters SiO under conditions of target-base distance between plates 86mm2, form thickness
The barrier layer F of 5nm obtains optical reflection film in addition to this similarly to Example 1.
1 > of < comparative example
It is not provided with barrier layer F, in addition to this, obtains optical reflection film similarly to Example 2.
4 > of < comparative example
The thickness of barrier layer F is changed as shown in table 1, in addition to this, it is anti-to obtain light similarly to Example 5
Penetrate film.
5 > of < comparative example
Lioduras TYT90 (Toyo Ink corporation, UV curing type acrylic acid used as barrier layer composition
Resin), it after being coated on high refractive index layer E, makes it dry, further irradiates cumulative exposure 400mJ/cm2Ultraviolet light make
It solidifies, and the barrier layer for forming thickness 5nm obtains optical reflection film in addition to this similarly to Example 5.
6 > of < comparative example
The composition of low-index layer D is changed as shown in table 1, is not provided with barrier layer F, in addition to this, with reality
It applies example 2 and gets similarly optical reflection film.
7 > of < comparative example
The trimethylolpropane tris thiopropionate (TMTP, shallow lake chemical company system) as sulfur-containing compound is not added, is removed
Other than this, composition for low refractive index layer is got similarly with above-mentioned composition for low refractive index layer.Use obtained low folding
It penetrates rate layer composition formation low-index layer and obtains optical reflection film similarly to Example 2 in addition to this.
8 > of < comparative example
RF sputters SiO2And low-index layer is formed, in addition to this, optical reflection film is got similarly with comparative example 7.Sputtering
Condition is same as the sputtering condition of embodiment 10.
Respectively by the following method measure supporting mass A used in each embodiment/comparative example mean transmissivity and
The refractive index of supporting mass A, low-index layer D and high refractive index layer E.
[mean transmissivity]
Measure supporting mass A's using the spectrophotometer U-4100 of Hitachi High Technologies corporation
Mean transmissivity at 360~400nm, result 90%.
[refractive index]
(refractive index of supporting mass A)
25 μm of thickness of transparent polyester film (Dongyang spinning company system is measured using the spectroscopic ellipsometers UVSEL of hole field
A4100 the refractive index of the light of wavelength 570nm), result 1.58.
(refractive index of low-index layer D and high refractive index layer E)
The low refraction of vacuum evaporation thickness 100nm on 100 μm of thickness polyethylene terephthalate (PET) substrate
Rate layer E, obtains test sample 1.The high refractive index for forming thickness 100nm is similarly coated in 100 μm of thickness of PET base material
Layer E, obtains test sample 2.Measure the wave of these test samples 1 and 2 respectively using the spectroscopic ellipsometers UVSEL of hole field
The refractive index of the light of long 570nm.
In addition, the backlight using optical reflection film obtained in each embodiment/comparative example is evaluated by the following method respectively
The relative luminance coloration of unit and the damp and hot resistance to appearance long afterwards of optical reflection film.
[relative luminance coloration]
From liquid crystal display device (trade name：LC-37GX1W, Sharp's system) back light unit is taken out, by the light of the back light unit
Reflectance coating is substituted for the optical reflection film of above-mentioned production.Optical reflection film is configured in such a way that barrier layer becomes light incident surface.
In the side opposite with the obtained face for being provided with optical reflection film of back light unit and apart from the height of optical reflection film
For the position of 200mm, luminance meter (Konica Minolta corporation, product name " CS-2000 ") is set.Then, parallel
The form that the vertical direction of the light source of ground arrangement crosses the central portion of planar light source device is pierced from end-to-end with 0.6mm measuring space three
Swash value Y (brightness) [cd/m2] and coloration.
Use ESR65 (3M Company system) as the reference of brightness and color, calculates be set as the brightness of reference respectively
Relative luminance when 100% and the poor Δ x and Δ y with the coloration of reference when the coloration of reference is set as 0.
These measurements are carried out at 25 DEG C.The the value of brightness the big the more preferred, preferably 97% or more, more preferably 98% with
On.For colour difference, it is preferably 0.01 in terms of absolute value hereinafter, more preferably 0.006 that Δ x, Δ y are the more preferred closer to 0
Below.
[spot of damp and hot resistance to brown long afterwards]
The size that obtained optical reflection film is cut out to 10cm × 15cm saves (temperature 60 C, humidity under hygrothermal environment
90%, 240 hours).Then, the appearance of the optical reflection film after visually observation saves, is evaluated based on the following benchmarks.
5：Brown spot is not generated, it is very beautiful
4：Several brown spots are confirmed, are the levels of energy resistance to practicality
3：More than ten of brown spot is confirmed, there are misgivings in practical
2：Tens brown spots are confirmed, are levels that can not be practical
1：Countless brown spot is generated in entire surface, is level that can not be practical
In addition, measuring the moisture-vapor transmission of the barrier layer F (thickness 15nm) of embodiment 3 by the following method, as a result
For 4g/m2·day。
[moisture-vapor transmission]
Barrier layer group is coated on 100 μm of thickness polyethylene terephthalate (PET) substrate using bar coater
After closing object, be heating and curing within 1 minute at 100 DEG C, form the thickness 15nm's of the solidfied material comprising (poly-) silicone compounds
Barrier layer F, obtains sample.Use MOCON corporation：PERMATRAN-W 3/32, in 40 DEG C of temperature, the ring of humidity 90%RH
The moisture-vapor transmission of the sample and simple substrate that are measured respectively under border.Then, subtract from the moisture-vapor transmission of sample
The moisture-vapor transmission for removing simple substrate obtains the moisture-vapor transmission of barrier layer F.
By the optical reflection film of Examples 1 to 10 and comparative example 1~8 evaluation result is shown in table 1.
As shown in table 1, it is known that the relative luminance at the initial stage of the optical reflection film of Examples 1 to 10 is high, and Δ x and Δ y are small, display
Good optical characteristics.Moreover, knowing that the spot of damp and hot resistance to brown long afterwards is also few, damp and hot wear properties are also high.
In contrast, it is known that the excessively thin comparison of thickness of the optical reflection film of the comparative example 1 without barrier layer F, barrier layer F
For the optical reflection film of example 2 in the spot of damp and hot resistance to generation brown a large amount of long afterwards, damp and hot wear properties are low.On the other hand, it is known that resistance
The Δ x and Δ y at the initial stage of the optical reflection film of the blocked up comparative example 3 and 4 of the thickness of interlayer F are big, and coloration is low.
In addition, knowing the light of the comparative example 5 with the barrier layer F being made of the solidfied material of UV curing type acrylic resin
Reflectance coating and by low-index layer D as barrier layer F comparative example 6 optical reflection film it is damp and hot it is resistance to largely generate long afterwards it is brown
The spot of color, damp and hot wear properties are low.
This application claims the priority based on Japanese Patent Application 2016-62514 filed on March 25th, 2016.This application is said
It speaks frankly and is applied in present specification with content documented in attached drawing.
Symbol description
10 optical reflection films
11 supporting mass A
13 anchor layer B
15 metallic reflector C
17 low-index layer D
19 high refractive index layer E
21 barrier layer F
20 liquid crystal display devices
30 liquid crystal display panels
31 liquid crystal cells
33,35 polarizing film
The back light unit of 40 side edge types
41 light sources
42 reflector of lamps
43 light guide plates
45 optical films
47 optical diffusion films
49 prism films
Claims (3)
1. a kind of optical reflection film, be successively with supporting mass A, anchor layer B, silver or using silver as the metallic reflector C of principal component,
The optical reflection film of low-index layer D, high refractive index layer E and barrier layer F, the low-index layer D contain resin and Containing Sulfur
The refractive index closed object and have the refractive index of the light than the wavelength 570nm of the supporting mass A low, the high refractive index layer E have
The high refractive index of the refractive index of light than the wavelength 570nm of the supporting mass A,
The barrier layer F is for the layer of the solidfied material comprising (poly-) silicone compounds or by the inorganic matter structure with siloxane backbone
At layer, and
The barrier layer F with a thickness of 5~30nm.
2. optical reflection film according to claim 1, wherein the low-index layer D with a thickness of 20~50nm and described
High refractive index layer E with a thickness of 20~50nm.
3. a kind of back light for liquid crystal display device unit includes light source and optical reflection film of any of claims 1 or 2.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016062514 | 2016-03-25 | ||
| JP2016-062514 | 2016-03-25 | ||
| PCT/JP2017/011399 WO2017164226A1 (en) | 2016-03-25 | 2017-03-22 | Light-reflecting film and backlight unit for liquid crystal display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108885285A true CN108885285A (en) | 2018-11-23 |
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ID=59899413
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780019279.XA Pending CN108885285A (en) | 2016-03-25 | 2017-03-22 | Optical reflection film and back light for liquid crystal display device unit |
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| Country | Link |
|---|---|
| JP (1) | JPWO2017164226A1 (en) |
| CN (1) | CN108885285A (en) |
| WO (1) | WO2017164226A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109651973A (en) * | 2018-12-19 | 2019-04-19 | 宁波瑞凌新能源科技有限公司 | A kind of high reflectance radiation refrigeration film |
| TWI723840B (en) * | 2020-04-09 | 2021-04-01 | 郡宏光電股份有限公司 | One-way perspective anti-glare heat insulation film and one-way perspective anti-glare heat insulation glass |
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| CN108365045A (en) * | 2018-04-12 | 2018-08-03 | 善仁（浙江）新材料科技有限公司 | Multistage enhancing gain film for photovoltaic module string spacing, piece spacing and welding |
| CN108538950A (en) * | 2018-04-12 | 2018-09-14 | 善仁（浙江）新材料科技有限公司 | Multistage enhancing gain film for photovoltaic module string spacing, piece spacing and welding |
| WO2020217886A1 (en) | 2019-04-26 | 2020-10-29 | 尾池工業株式会社 | Reflection film, liquid crystal display device, and reflection film manufacturing method |
| JP7064778B2 (en) * | 2019-04-26 | 2022-05-11 | 尾池工業株式会社 | Liquid crystal display device |
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| WO2013141304A1 (en) * | 2012-03-22 | 2013-09-26 | コニカミノルタ株式会社 | Film mirror, and reflection device for solar power generation |
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- 2017-03-22 WO PCT/JP2017/011399 patent/WO2017164226A1/en active Application Filing
- 2017-03-22 CN CN201780019279.XA patent/CN108885285A/en active Pending
- 2017-03-22 JP JP2018507363A patent/JPWO2017164226A1/en active Pending
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| JP2007133003A (en) * | 2005-11-08 | 2007-05-31 | Oike Ind Co Ltd | Reflection sheet |
| WO2013141304A1 (en) * | 2012-03-22 | 2013-09-26 | コニカミノルタ株式会社 | Film mirror, and reflection device for solar power generation |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109651973A (en) * | 2018-12-19 | 2019-04-19 | 宁波瑞凌新能源科技有限公司 | A kind of high reflectance radiation refrigeration film |
| TWI723840B (en) * | 2020-04-09 | 2021-04-01 | 郡宏光電股份有限公司 | One-way perspective anti-glare heat insulation film and one-way perspective anti-glare heat insulation glass |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017164226A1 (en) | 2017-09-28 |
| JPWO2017164226A1 (en) | 2019-02-07 |
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