CN108873501A - A kind of array substrate and preparation method thereof, display panel - Google Patents
A kind of array substrate and preparation method thereof, display panel Download PDFInfo
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- CN108873501A CN108873501A CN201810737566.0A CN201810737566A CN108873501A CN 108873501 A CN108873501 A CN 108873501A CN 201810737566 A CN201810737566 A CN 201810737566A CN 108873501 A CN108873501 A CN 108873501A
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- electrode
- grating layer
- metal grating
- array substrate
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
Abstract
The present invention provides a kind of array substrate and preparation method thereof, display panel, belongs to field of display technology, can solve the problems, such as that the electrode resistance of existing ADS type TFT-LCD is larger.Array substrate of the invention includes first electrode and metal grating layer in parallel, wherein first electrode is in parallel with metal grating layer to be equivalent to the resistance for reducing electrode；Meanwhile metal grating layer has transmission axis, in this way when it in application, the transmission axis of metal grating layer can be enabled identical as the direction of the transmission axis of polaroid, so that metal grating layer does not influence the light extraction efficiency of pixel region.The array substrate is suitable for various display panels, is particularly suitable for ADS type display panel.
Description
Technical field
The invention belongs to field of display technology, and in particular to a kind of array substrate and preparation method thereof, display panel.
Background technique
Thin Film Transistor-LCD (Thin Film Transistor-Liquid Crystal Display, referred to as
TFT-LCD liquid crystal display panel) forms the electric field of driving liquid crystal molecule deflection by control public electrode and pixel electrode,
Realize that grayscale is shown.
The common electrical of advanced super dimension field switch (ADS, Advanced Super Dimension Switch) type TFT-LCD
Pole and pixel electrode are usually to be made of tin indium oxide material, and the two is both formed in array substrate, due to ITO resistance compared with
Greatly, so that signal delay time increases, the quality for showing picture is influenced.Therefore, public electrode or pixel electrode ITO how to be reduced
Resistance become the main direction of studying of ADS type TFT-LCD.Wherein, the mode of the existing thickness for improving ITO, although can
It to reduce electrode resistance to a certain extent, but will affect the process time, increase electrode cost.
Summary of the invention
The present invention for the larger problem of electrode resistance of existing ADS type TFT-LCD, provide a kind of array substrate and its
Preparation method, display panel.
Solving technical solution used by present invention problem is：
A kind of array substrate, including substrate, the substrate are equipped with first electrode, metal grating layer, the first electrode
It is made of transparent conductive material, the first electrode and metal grating layer are in parallel, and the metal grating layer has transmission axis.
Optionally, the array substrate further includes polaroid, the polaroid than metal grating layer closer to incidence surface,
And the transmission axis of the polaroid is identical as the direction of the transmission axis of the metal grating layer.
Optionally, the metal grating layer is set to first electrode far from the face of substrate.
Optionally, the first electrode and metal grating layer are set to the first side of substrate, and the polaroid is set to substrate
Second side opposite with the first side.
Optionally, the range of the thickness H of the metal grating layer is 150-200nm；Include in the metal grating layer
More first metal strips, the width of the first metal strip are h1, and the spacing of adjacent first metal strip is h2, and the range of h1+h2 is
The range of 100-200nm, h1/ (h1+h2) are 0.4-0.6.
Optionally, the substrate has pixel region and non-pixel areas, and metal grating layer is set to pixel region, in non-pixel
Area, the side of the first electrode are equipped with the second metal strip with the metal grating layer same layer, second metal strip and the
The connection of one electrode wires.
Optionally, it is additionally provided on the substrate and mutually insulate second electrode with first electrode, the first electrode is public
Electrode, second electrode are pixel electrode.
Optionally, the first electrode is arranged compared to the second electrode further from substrate, and the first electrode is
Strip shaped electric poles, the second electrode are plate electrode.
The present invention also provides a kind of display panels, including above-mentioned array substrate.
The present invention also provides a kind of preparation methods of array substrate, including forming first electrode using transparent conductive material
Step；The step of metal grating layer is formed using metal material；
Wherein, the first electrode and metal grating layer are in parallel, and the metal grating layer has transmission axis.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the array substrate of the embodiment of the present invention 1；
Fig. 2 is a kind of structural schematic diagram of the array substrate of the embodiment of the present invention 2；
Fig. 3 is another structural schematic diagram of the array substrate of the embodiment of the present invention 2；
Fig. 4 is another structural schematic diagram of the array substrate of the embodiment of the present invention 2；
Fig. 5 is another structural schematic diagram of the array substrate of the embodiment of the present invention 2；
Fig. 6 is the display panel structure schematic diagram of the embodiment of the present invention 3；
Wherein, appended drawing reference is：10, substrate；1, first electrode；2, second electrode；3, metal grating layer；31, the first gold medal
Belong to item；32, the second metal strip；4, polaroid；41, down polaroid；42, upper polaroid；5, passivation layer；6, data line；7, color film
Substrate；8, liquid crystal layer.
Specific embodiment
Technical solution in order to enable those skilled in the art to better understand the present invention, with reference to the accompanying drawing and specific embodiment party
Present invention is further described in detail for formula.
Embodiment 1：
The present embodiment provides a kind of array substrates, as shown in Figure 1, including substrate 10, the substrate 10 is equipped with the first electricity
Pole 1, metal grating layer 3, the first electrode 1 are made of transparent conductive material, and the first electrode 1 and metal grating layer 3 are simultaneously
Connection, the metal grating layer 3 have transmission axis.
The first electrode 1 and metal grating layer 3 of the present embodiment are in parallel, are equivalent to the resistance for reducing electrode；Meanwhile metal
Grating layer 3 has transmission axis, in this way when it in application, the transmission axis of metal grating layer 3 and the transmission axis of polaroid can be enabled
Direction is identical, so that metal grating layer does not influence the light extraction efficiency of pixel region.The array substrate is suitable for various display panels, especially
It is suitable for ADS type display panels.
Embodiment 2：
The present embodiment provides a kind of array substrates, as shown in Fig. 2, including substrate 10, the substrate 10 is equipped with the first electricity
Pole 1, metal grating layer 3, the first electrode 1 are made of transparent conductive material, and the first electrode 1 and metal grating layer 3 are simultaneously
Connection, the metal grating layer 3 are set on face of the first electrode 1 far from substrate 10, and the metal grating layer 3 has transmission axis.
Wherein it should be noted that the metal grating layer 3 in the present embodiment has transmission axis, that is to say, that it allows saturating
The light vector direction crossed is the direction of its transmission axis.
In the present embodiment be the equal of first electrode 1 and metal grating layer 3 is stacked and placed on 10 top of substrate, and first electrode 1
Compared to metal grating layer 3 closer to substrate 10, the both ends of the two can be commonly connected to 1 line of first electrode, so that the
One electrode 1 is in parallel with metal grating layer 3, achievees the purpose that reduce its resistance.It should be noted that first electrode 1 and metal light
The embodiment in parallel of grid layer 3 be not limited to it is above-mentioned stacked, can also there are many other parallel ways, for example, first electrode 1 with
Insulating layer can be folded between metal grating layer 3, the two both ends can be connected by via hole, and this parallel way equally may be used
To realize the purpose for reducing its resistance.
Further, a kind of specific set-up mode of metal grating layer 3 that the program is newly-increased is provided in the present embodiment：It is described
Array substrate further includes polaroid 4, and the polaroid 4 is than metal grating layer 3 closer to incidence surface, and the polaroid 4 is saturating
It is identical as the direction of transmission axis of the metal grating layer 3 to cross axis.
That is, array substrate is in use, be usually arranged polaroid 4 in its incident side, the effect of the polaroid 4 is
The light of backlight directive array substrate is polarized, so that the light into liquid crystal is polarised light, to carry out liquid crystal display.This
Metal grating layer 3 is arranged away from the side of incidence surface in polaroid 4 in the principle that liquid crystal display is utilized in embodiment, and described inclined
The transmission axis of mating plate 4 is identical as the direction of transmission axis of the metal grating layer 3, and the transmission axis of such same direction can be true
The light of the outgoing of polaroid 4 will not be blocked completely by protecting metal grating layer 3, and therefore, which does not influence the light extraction efficiency of pixel region.
In a specific embodiment, as shown in figure 3, the range of the thickness H of the metal grating layer 3 is 150-200nm；
It include more first metal strips 31 in the metal grating layer 3, the width of the first metal strip 31 is h1, adjacent first metal strip 31
Spacing be h2, the range of h1+h2 is 100-200nm, and the range of h1/ (h1+h2) is 0.4-0.6.
The specific size range of the metal grating layer 3 increased newly in the program is given in the present embodiment, wherein metal grating
The thickness of layer 3, the width of its metal strip and gap can make metal grating layer 3 and 4 phase of polaroid in above range
Match, the polarised light for enabling polaroid 4 be polarized penetrates metal grating layer 3.Specifically, for example, h1 can be 50nm, h2 50nm, then
H1+h2 is 100nm, and h1/ (h1+h2) is 0.5.
In one embodiment, the first electrode 1 and metal grating layer 3 are set to the first side of substrate 10, the polarisation
Piece 4 is set to the second side opposite with the first side of substrate 10.
That is, the preparation of first electrode 1 and metal grating layer 3 can be first completed in the present embodiment on substrate 10,
Then polaroid 4 is attached on the back side of substrate 10 again.The specific implementation for being convenient for technique is designed in this way, in addition, will in the program
Polaroid 4 is arranged on the back side of substrate 10, if polaroid 4 breaks down in prolonged application, is relatively conducive to replacement polaroid 4.
In one embodiment, as shown in figure 4, being additionally provided on the substrate 10 and 1 phase of first electrode insulation second electrode
2, the first electrode 1 is public electrode, and second electrode 2 is pixel electrode.
In one embodiment, the first electrode 1 is arranged compared to the second electrode 2 further from substrate 10, described
First electrode 1 is strip shaped electric poles, and the second electrode 2 is plate electrode.
It should be noted that as shown in figure 5, in addition to first electrode 1 and metal grating layer 3 may be used also on the first side of substrate 10
To be equipped with other display elements, for example, TFT, data line 6 etc..
The array substrate of the present embodiment can be Senior super dimension field switch technology (Advanced Super Dimension
Switch, ADS) mode, first electrode 1, second electrode 2 are set in array substrate in ADS mode, first electrode 1 and second
2 mutually insulated of electrode is equipped with therebetween passivation layer 5, and the two is all made of transparent conductive material composition, this design side
Formula can be opposite increase aperture opening ratio and transmitance.
In one embodiment, the substrate 10 has pixel region and non-pixel areas, and metal grating layer 3 is set to pixel region,
In non-pixel areas, the side of the first electrode 1 is equipped with the second metal strip 32 with 3 same layer of metal grating layer, and described the
Two metal strips 32 are connect with 1 line of first electrode.
The second metal with 3 same layer of metal grating layer is provided in the present embodiment above the metal wire of corresponding non-pixel areas
Item 32, the effect of the second metal strip 32 are the resistance for further decreasing electrode.Wherein, the second metal strip 32 and metal grating layer 3
It can synchronize to be formed, the second metal strip 32 is also in parallel with first electrode 1, specifically, the resistance of first electrode 1 is R1, metal light
The resistance of grid layer 3 is R2, and the resistance of the second metal strip 32 is R3, then first electrode 1 and the second metal strip 32, metal grating layer 3
Resistance in parallel is：1/(1/R1+1/R2+1/R3).Specifically, the width of the second metal strip 32 can be greater than the first metal strip 31
Width, wherein the second metal strip 32 can be set to the top of data line 6 of the metal of non-pixel areas, it can be hacked in this way
Matrix cover, therefore the second metal strip 32 will not influence aperture opening ratio.
In the corresponding attached drawing of the present embodiment, size, thickness of each structure sheaf of display etc. are only to illustrate.It is realized in technique
In, the projected area of each structure sheaf on substrate may be the same or different, each needed for being realized by etching technics
Structure sheaf projected area；Meanwhile structure shown in attached drawing does not limit the geometry of each structure sheaf yet, such as can be shown in attached drawing
Rectangle, can also be it is trapezoidal or it is other etching be formed by shape, equally can pass through etching realize.
Embodiment 3：
The present embodiment provides a kind of display panel, the array substrate including above-described embodiment.
The present embodiment provides a kind of ADS mode display panel, as shown in fig. 6, the display panel further includes and array substrate
Opposed color membrane substrates 7, are equipped with liquid crystal layer 8 between array substrate and color membrane substrates 7, array substrate deviates from the one of color membrane substrates 7
Side is also provided with polaroid, also referred to as down polaroid 41, and color membrane substrates 7 are also provided with polarisation away from the side of array substrate
Piece 42.
The display panel is liquid crystal display panel, passes through 1 edge of slit-shaped first electrode being set in array substrate
The electric field generated between generated electric field and its second electrode 2 with plate forms multi-dimensional electric field, makes slit electricity in liquid crystal cell
All aligned liquid-crystal molecules can generate rotation right above interpolar, electrode, therefore liquid crystal working efficiency can be improved and increase
Light transmission efficiency.Meanwhile first electrode 1 and metal grating layer 3 are in parallel, are equivalent to the resistance for reducing electrode；And metal grating
Layer 3 has transmission axis identical with the direction of the transmission axis of down polaroid 41, therefore metal grating layer 3 does not influence the light out of pixel region
Efficiency.The picture quality of LCD product can be improved in the Senior super dimension field switch technology of the present embodiment, has high-resolution, height thoroughly
The advantages that crossing rate, low-power consumption, wide viewing angle, high aperture, low aberration, ripple without water of compaction (push Mura).
Embodiment 4：
The present embodiment provides a kind of preparation methods of array substrate, including following preparation step：
It is S01a, optional, the second electrode of plate is formed in the first side of substrate using transparent conductive material；Electrically conducting transparent
Material can be selected from indium gallium zinc (IGZO), indium zinc oxide (IZO), tin indium oxide (ITO) or indium gallium tin (InGaSnO)
At least one of equal transparent conductive materials.
It is S01b, optional, the using plasma enhancing chemical vapor deposition manner, low on the substrate for completing above-mentioned steps
Pressure chemical vapor deposition mode, sub-atmospheric CVD mode or electron cyclotron resonance chemical vapor deposition manner or sputtering
Mode forms insulating layer.
It is S01c, optional, increased on the substrate for completing above-mentioned steps using sputtering mode, thermal evaporation methods, plasma
Extensive chemical vapor deposition mode, low-pressure chemical vapor deposition mode, sub-atmospheric CVD mode or electron cyclotron resonance
The data line of chemical vapor deposition manner formation metal；Metal material can selected from molybdenum, molybdenum niobium alloy, aluminium, aluminium neodymium alloy, titanium or
Copper etc..
It is S01d, optional, passivation layer is formed using insulating materials on the substrate for completing above-mentioned steps；The material of passivation layer
The silica material or silica material, silicon nitride material that can be single layer form the lamination of multiple sublayers.
S01e, the first electrode for forming strip using transparent conductive material on the substrate for completing above-mentioned steps；It is transparent to lead
Electric material can be selected from indium gallium zinc (IGZO), indium zinc oxide (IZO), tin indium oxide (ITO) or indium gallium tin
(InGaSnO) at least one of the transparent conductive materials such as.
S02, metal grating layer is formed on the first electrode using metal material, the metal grating layer has transmission axis；
Specifically, metal grating layer can be formed in first electrode by the way of inkjet printing, wherein the first electrode and gold
Belong to grating layer and is connected to first electrode line.
As a kind of optinal plan of the present embodiment, includes on substrate pixel region and non-pixel areas, formed in pixel region
While metal grating layer, can also non-pixel areas and the metal grating layer synchronize form the second metal strip, described second
Metal strip is connect with first electrode line.
S03, second side formation down polaroid in substrate.Wherein it is possible to directly by polarizer sheet sticking in the second of substrate
On side.
Embodiment 5：
Present embodiments provide a kind of display device comprising any one of the above display panel.The display device can
Think：Liquid crystal display panel, Electronic Paper, mobile phone, tablet computer, television set, display, laptop, Digital Frame, navigation
Any products or components having a display function such as instrument.Display device in the present embodiment has preferable display quality.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, essence of the invention is not being departed from
In the case where mind and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (10)
1. a kind of array substrate, including substrate, which is characterized in that the substrate is equipped with first electrode, metal grating layer, described
First electrode is made of transparent conductive material, and the first electrode and metal grating layer are in parallel, and the metal grating layer has saturating
Cross axis.
2. array substrate according to claim 1, which is characterized in that the array substrate further includes polaroid, described inclined
Mating plate than metal grating layer closer to incidence surface, and the side of the transmission axis of the transmission axis of the polaroid and the metal grating layer
To identical.
3. array substrate according to claim 2, which is characterized in that the first electrode and metal grating layer are set to substrate
The first side, the polaroid is set to substrate second side opposite with the first side.
4. array substrate according to claim 1, which is characterized in that the metal grating layer is set to first electrode far from lining
On the face at bottom.
5. array substrate according to claim 1, which is characterized in that the range of the thickness H of the metal grating layer is
150-200nm；It include more first metal strips in the metal grating layer, the width of the first metal strip is h1, adjacent first gold medal
The spacing for belonging to item is h2, and the range of h1+h2 is 100-200nm, and the range of h1/ (h1+h2) is 0.4-0.6.
6. array substrate according to claim 1, which is characterized in that the substrate has pixel region and non-pixel areas, gold
Belong to grating layer and be set to pixel region, in non-pixel areas, the side of the first electrode is equipped with the with the metal grating layer same layer
Two metal strips, second metal strip are connect with first electrode line.
7. array substrate according to claim 1, which is characterized in that be additionally provided on the substrate and mutually insulate with first electrode
Second electrode, the first electrode are public electrode, and second electrode is pixel electrode.
8. array substrate according to claim 7, which is characterized in that the first electrode is more compared to the second electrode
It is arranged far from substrate, the first electrode is strip shaped electric poles, and the second electrode is plate electrode.
9. a kind of display panel, which is characterized in that including the described in any item array substrates of claim 1-8.
10. a kind of preparation method of array substrate, which is characterized in that the step including forming first electrode using transparent conductive material
Suddenly；The step of metal grating layer is formed using metal material；
Wherein, the first electrode and metal grating layer are in parallel, and the metal grating layer has transmission axis.
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| CN201810737566.0A CN108873501A (en) | 2018-07-06 | 2018-07-06 | A kind of array substrate and preparation method thereof, display panel |
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| CN201810737566.0A CN108873501A (en) | 2018-07-06 | 2018-07-06 | A kind of array substrate and preparation method thereof, display panel |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111367004A (en) * | 2020-04-29 | 2020-07-03 | 刘奡 | Ink-jet printing preparation method of polarizer holographic grating |
| CN114455857A (en) * | 2022-02-23 | 2022-05-10 | 江苏铁锚玻璃股份有限公司 | Transparent conductive glass and method for reducing surface resistance thereof |
| US11392003B2 (en) | 2020-02-06 | 2022-07-19 | Au Optronics Corporation | Active device substrate and method for manufacturing the same |
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Application publication date: 20181123 |