CN108823550A - A method of not Sang Shi ornaments and not Sang Shi jewelry surface plate diamond film - Google Patents
A method of not Sang Shi ornaments and not Sang Shi jewelry surface plate diamond film Download PDFInfo
- Publication number
- CN108823550A CN108823550A CN201810578256.9A CN201810578256A CN108823550A CN 108823550 A CN108823550 A CN 108823550A CN 201810578256 A CN201810578256 A CN 201810578256A CN 108823550 A CN108823550 A CN 108823550A
- Authority
- CN
- China
- Prior art keywords
- sang shi
- ornaments
- diamond film
- sang
- shi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
- A44C17/00—Gems or the like
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
- A44C27/00—Making jewellery or other personal adornments
- A44C27/001—Materials for manufacturing jewellery
- A44C27/005—Coating layers for jewellery
- A44C27/007—Non-metallic coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0254—Physical treatment to alter the texture of the surface, e.g. scratching or polishing
Abstract
A kind of not Sang Shi ornaments, Sang Shi jewelry surface is not coated with diamond film.A method of diamond film being plated in not Sang Shi jewelry surface, this method comprises the following steps:Step 1:Ultrasonic grinding pretreatment is carried out to not Sang Shi ornaments in Nano diamond powder suspension;Step 2:It will not take out Sang Shi ornaments, and be cleaned from the Nano diamond powder suspension;Step 3:It incites somebody to action and is kept in the not preset conformal sample stage of Sang Shi ornaments indentation;Step 4:Sang Shi ornaments it will be placed in diamond film deposition furnace together together with the conformal sample stage and carry out corona treatment;Step 5:It is passed through methane, carries out diamond film deposition in situ.Surface of the invention is coated with the not Sang Shi ornaments of diamond film, can greatly improve its surface hardness, this improves the scratch resistant performances of not Sang Shi while keeping not Sang Shi optical property.
Description
Technical field
The present invention relates to Jewelry Accessories fields, more particularly to a kind of not Sang Shi ornaments, and the invention further relates to one kind in not mulberry
The method of stone jewelry surface plating diamond film.
Background technique
The internal structure of Sang Shi, numerical value, appearance be not all shockingly similar to diamond, even if being difficult to point with diamond pen detection
Distinguish, but Mo Sangshi can glitter brighter than diamond, fire coloured silk is more pleasantly surprised, while price also than diamond it is cheap very much,
Therefore, Mo Sangshi is also usually used to be processed into ornaments.
But the hardness of Mo Sangshi is lower than diamond (diamond), therefore adhesion strength is more very different than diamond.
Summary of the invention
The present invention proposes a kind of with high surface hardness for the not poor technical problem of Sang Shi adhesion strength
Not Sang Shi ornaments, in addition, the invention also provides a kind of methods in not Sang Shi jewelry surface plating diamond film.
It is a kind of that Sang Shi ornaments, the not Sang Shi jewelry surface are not coated with diamond film.
Further, the average grain size of the diamond film is 100nm-200nm.
A method of diamond film being plated in not Sang Shi jewelry surface, is included the following steps:Step 1:In Nano diamond
Ultrasonic grinding pretreatment is carried out to not Sang Shi ornaments in powder suspension;Step 2:Will not Sang Shi ornaments from the Nano diamond
It takes out, and is cleaned in powder suspension;Step 3:It incites somebody to action and is kept in the not preset conformal sample stage of Sang Shi ornaments indentation;
Step 4:It will Sang Shi ornaments be placed in diamond film deposition furnace together at progress plasma together with the conformal sample stage
Reason;Step 5:It is passed through methane, carries out diamond film deposition in situ.
Preferably, the granularity of Nano diamond powder is 5nm- in the suspension of Nano diamond powder described in step 1
200nm, the concentration of Nano diamond powder is 5%-20% in the Nano diamond powder suspension.
Preferably, the ultrasonic grinding pretreated time is 2h-6h.
Preferably, the material of conformal sample stage described in step 3 is fine copper or graphite.
Preferably, the recess portion for keeping not Sang Shi ornaments is provided in the conformal sample stage, it will not in step 3
The pressure that Sang Shi ornaments are pressed into the recess portion is 50Kgf-250Kgf.
Preferably, corona treatment described in step 4 uses Dc arc plasma jet CVD or microwave plasma
Injection.
Preferably, the temperature of the corona treatment is 700 DEG C -1000 DEG C, and the time of the corona treatment is
5min-30min。
Preferably, the concentration of methane described in step 5 is 0.5%-10%, and the pressure of the cvd furnace is 3kPa-
20kPa, sedimentation time 5min-120min.
Surface of the invention is coated with the not Sang Shi ornaments of diamond film, can be while keeping not Sang Shi optical property, greatly
The earth promotes its surface hardness, and this improves the scratch resistant performances of not Sang Shi.In addition, by means of the invention it is also possible to real
Sang Shi jewelry surface does not obtain the diamond film coating of even compact, excellent in optical properties now, improves not Sang Shi ornaments
Surface hardness.
Detailed description of the invention
Fig. 1 is surface A FM (atomic force microscope) shape appearance figure that surface is coated with that the not mulberry of diamond film is bored;
Fig. 2 is typical Raman (Raman) spectrogram that surface is coated with that the not mulberry of diamond film is bored;
Fig. 3 is not plate the scratch of not mulberry brill of diamond film aobvious after carrying out anti-diamond pressing delineation capacity experimental
Figure observed by amplifying 100 times under micro mirror;
Fig. 4 is to plate the scratch of not mulberry brill of diamond film in microscope after carrying out anti-diamond pressing delineation capacity experimental
Figure observed by lower 200 times of amplification;
Fig. 5 is the structural schematic diagram of conformal sample stage used in the present invention.
Specific embodiment
Referring to Fig. 1 to Fig. 5, the present invention is described in detail.
A kind of not Sang Shi ornaments, Sang Shi jewelry surface is not coated with diamond film.By taking Mo Sang is bored as an example, referring to Fig.1, the Buddha's warrior attendant
The not mulberry of stone membrane coat bores the pattern observed of the sample surfaces under AFM (atomic force microscope), and coating structure is fine and close, equal
Even, average grain size is 100nm-200nm or so.
Referring to Fig. 2, it is seen that be located at 1331cm-1Diamond Raman (Raman) characteristic peak.Positioned at 1120cm-1Neighbouring dissipates
Unrestrained peak is related with the grain size of diamond film, is a very tiny presentation of crystal grain.It is shown in the appearance at this peak and Fig. 1 micro-
Little crystal grain is consistent.
Referring to Fig. 3, Fig. 4, in the not Sang Shi ornaments for having diamond film to surface and not no not Sang Shi ornaments of diamond film
When carrying out the experiment of anti-diamond pressing delineation ability under the normal pressure of maximum 20N, in scoring process, normal pressure is (real by zero
Pretightning force is 0.02N on border) it is gradually increased to 20N, during this period in (1 minute), the distance streaked is 2mm.
Wherein, the not Sang Shi ornaments of diamond film do not occur about (to amplify from optical microscopy in 8N or more
Multiple 100) photo is clearly visible scratch, and a series of lateral sharp cracks occurs, and under equal conditions, there is diamond film on surface
Not Sang Shi ornaments there is no obvious scratch.For the not Sang Shi ornaments that there is diamond film on surface, close to maximum pressure (20N)
Shi Caicong optical microscopy (amplification factor 200) photo can be seen that diamond film just by pressure break, the mark of brittle fracture occurs
As breach is very smooth, and as being cut knife, and film opens, and rolls.Therefore, can be illustrated by experiment, surface has diamond
The not Sang Shi ornaments of film are substantially at pressure sufficiently large (close to 20N) just by pressure break.Compared to the decorations of no plating diamond film
For product, adhesion strength is greatly improved.
The method in not Sang Shi jewelry surface plating diamond film is illustrated below.
This method comprises the following steps:Step 1:Ultrasound is carried out to not Sang Shi ornaments in Nano diamond powder suspension
Grinding pretreatment.Wherein, in Nano diamond powder suspension the granularity of Nano diamond powder in 5nm-200nm, nanogold
The concentration of Nano diamond powder is 5%-20% in hard rock powder suspension, and the ultrasonic grinding pretreated time is 2h-6h.It should
The purpose of step mainly for improve diamond film deposition Enhancing Nucleation Density so that the Enhancing Nucleation Density of diamond film be greater than 1010cm-2。
After ultrasonic grinding pre-processes, in step 2:It will Sang Shi ornaments not taken from Nano diamond powder suspension
Out, it and is cleaned, wherein cleaning is successively cleaned by ultrasonic using deionized water and dehydrated alcohol, is dried up through cold wind.
Not Sang Shi ornaments after ultrasonic grinding pre-processes and cleans, in step 3:It will the indentation of Sang Shi ornaments not set in advance
It is kept in fixed conformal sample stage.Wherein, by taking Mo Sang is bored as an example, in order to keep not, mulberry brill can be in conformal sample stage referring to Fig. 5
In be provided with recess portion 111 for keeping not Sang Shi ornaments, which is in back taper, and the depth H of recess portion 111 is about
It is the 4/5 of not mulberry drilling depth, substantially 96 ° of the cone angle R of back taper, can permit 0 ° -- 2 ° of error, for the ease of Mo Sang brill
The material of indentation, conformal sample stage is slightly softer using fine copper or graphite etc. and has the material of good thermal conductivity.Mo Sang
Boring can be pressed into the recess portion of conformal sample stage by applying the pressure of 50Kgf-250Kgf.
It is pre-processed by ultrasonic grinding, and after not mulberry bored being pressed into the recess portion of conformal sample stage, it in step 4, will not mulberry
Drill ornaments are placed in diamond film deposition furnace together together with conformal sample stage and carry out corona treatment.In step 4, direct current
Arc-plasma sprays (DC Arc Plasma Jet) CVD, and microwave plasma sprays CVD (MWCVD) and HF CVD
(HFCVD) diamond film coating that diamond film depositions method is used equally for Mo Sang to bore such as.But HF CVD is living due to gas
Change degree is not high, causes atomic hydrogen concn too low, for the diamond film coating layer ratio for figuring for having favorable optical performance
It is more difficult.Therefore, in step 4, corona treatment is sprayed using Dc arc plasma jet CVD or microwave plasma.
The temperature of corona treatment is 700 DEG C -1000 DEG C, and the time of corona treatment is 5min-30min.Appointed with completely removing
What remains in organic root ball (from Nano diamond powder suspension) on Mo Sang brill surface to deposition of diamond thin films
It influences, and activates the surface state that not mulberry bores sample, conducive to the uniform deposition of diamond film and the adhesive force of raising diamond film.
After completing corona treatment, in steps of 5:It is passed through methane, carries out diamond film deposition in situ immediately.In the step
In rapid, the concentration of methane is 0.5%-10%, and the surface temperature that Mo Sang is bored is 700 DEG C -1000 DEG C, and the pressure of cvd furnace is set as
3kPa-20kPa, sedimentation time 5min-120min.
It is 10 minutes cooling after the completion of deposition, that is, it can be taken off the sample that the not mulberry of plated film is bored.
The example for the diamond film plated film for taking the not mulberry that diameter is 6.5mm to bore (1 carat) further below is illustrated.
Sample ultrasonic grinding 3h in 30nm diamond dust suspension will not bored by mulberry first.
Sample taking-up will not bored by mulberry, cleaned up.
In 150kg power indentation height is 30mm, prefabricated back taper is cheated on the conformal sample stage surface of copper that diameter is 50mm
(95 ° of cone angle).
It will mulberry brill sample not be put into dc arc plasma CVD diamond film deposition furnace, in argon/hydrogen plasma
Handle 5 minutes (Ar:3slm;H2:8slm;Chamber pressure:3-6kPa;Plasma torch electric current:190A;Voltage:97V).Then to etc.
It is passed through methane in gas ions, flow 50sccm-240sccm, 700 DEG C -1000 DEG C of sample surface temperature, time 5min-
30min.Electric current is cut off, diamond film deposition is stopped, the cooling not mulberry that can be taken off plated film after ten minutes bores sample.
The not mulberry of the sample and non-coating that are bored by the not mulberry for being coated with diamond film coating layer that this method obtains is bored outer
Sight is compared, and can not see that diamond film coating has an impact to the optical property (heat color) that not mulberry is bored.In addition, the diamond film applies
The not mulberry of layer bores the pattern observed of the sample surfaces under AFM (atomic force microscope), and coating structure is fine and close, uniform, average
Crystallite dimension is 100nm-200nm or so.
The above description is only an embodiment of the present invention, not limits the scope of the invention, all to be said using the present invention
The equivalent structure or equivalent process transformation that bright book content is done, are directly or indirectly used in other correlative technology fields,
It should be included in scope of patent protection of the invention.
Claims (10)
1. a kind of not Sang Shi ornaments, it is characterised in that:The not Sang Shi jewelry surface is coated with diamond film.
2. a kind of not Sang Shi ornaments according to claim 1, it is characterised in that:The average grain size of the diamond film
For 100nm-200nm.
3. a kind of method in not Sang Shi jewelry surface plating diamond film, which is characterized in that include the following steps:
Step 1:Ultrasonic grinding pretreatment is carried out to not Sang Shi ornaments in Nano diamond powder suspension;
Step 2:It will not take out Sang Shi ornaments, and be cleaned from the Nano diamond powder suspension;
Step 3:It incites somebody to action and is kept in the not preset conformal sample stage of Sang Shi ornaments indentation;
Step 4:Sang Shi ornaments it will be placed in diamond film deposition furnace together together with the conformal sample stage and carry out plasma
Body processing;
Step 5:It is passed through methane, carries out diamond film deposition in situ.
4. a kind of method in not Sang Shi jewelry surface plating diamond film according to claim 3, which is characterized in that step
The granularity of Nano diamond powder is 5nm-200nm, the nano-diamond powder in the suspension of Nano diamond powder described in 1
The concentration of Nano diamond powder is 5%-20% in last suspension.
5. a kind of method in not Sang Shi jewelry surface plating diamond film according to claim 3, which is characterized in that described
The ultrasonic grinding pretreated time is 2h-6h.
6. a kind of method in not Sang Shi jewelry surface plating diamond film according to claim 3 or 6, which is characterized in that
The material of conformal sample stage described in step 3 is fine copper or graphite.
7. a kind of method in not Sang Shi jewelry surface plating diamond film according to claim 6, which is characterized in that described
Be provided with the recess portion for keeping not Sang Shi ornaments in conformal sample stage, in step 3 will not the indentation of Sang Shi ornaments it is described recessed
The pressure in portion is 50Kgf-250Kgf.
8. a kind of method in not Sang Shi jewelry surface plating diamond film according to claim 3, which is characterized in that step
Corona treatment described in 4 is sprayed using Dc arc plasma jet CVD or microwave plasma.
9. a kind of method in not Sang Shi jewelry surface plating diamond film according to claim 8, which is characterized in that described
The temperature of corona treatment is 700 DEG C -1000 DEG C, and the time of the corona treatment is 5min-30min.
10. a kind of method in not Sang Shi jewelry surface plating diamond film according to claim 3, which is characterized in that step
The concentration of methane described in rapid 5 is 0.5%-10%, and the pressure of the cvd furnace is 3kPa-20kPa, sedimentation time 5min-
120min。
Priority Applications (2)
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CN201810578256.9A CN108823550A (en) | 2018-06-07 | 2018-06-07 | A method of not Sang Shi ornaments and not Sang Shi jewelry surface plate diamond film |
PCT/IB2019/000641 WO2019234496A2 (en) | 2018-06-07 | 2019-08-07 | Moissanite decorative product, and method of coating surface of same with diamond film |
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CN201810578256.9A CN108823550A (en) | 2018-06-07 | 2018-06-07 | A method of not Sang Shi ornaments and not Sang Shi jewelry surface plate diamond film |
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CN108823550A true CN108823550A (en) | 2018-11-16 |
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ID=64144183
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CN201810578256.9A Pending CN108823550A (en) | 2018-06-07 | 2018-06-07 | A method of not Sang Shi ornaments and not Sang Shi jewelry surface plate diamond film |
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WO (1) | WO2019234496A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019234496A3 (en) * | 2018-06-07 | 2021-10-07 | 深圳市金鑫丰利珠宝首饰有限公司 | Moissanite decorative product, and method of coating surface of same with diamond film |
WO2023035429A1 (en) * | 2021-09-13 | 2023-03-16 | 吕反修 | Method for depositing diamond film coating on surface of moissanite |
Citations (1)
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CN1238813A (en) * | 1996-11-15 | 1999-12-15 | C3公司 | Gemstones formed of silicon carbide with diamond coating |
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DE3708171A1 (en) * | 1987-03-13 | 1988-09-22 | Ruetgerswerke Ag | Gems and method of producing them |
CN1454547A (en) * | 2002-04-30 | 2003-11-12 | 宋世鹏 | Diamond ornament manufacturing method |
KR20170057591A (en) * | 2015-11-17 | 2017-05-25 | 주식회사 한국씨브이디다이아몬드공구 | The diamond-SiC composites by sintering under low pressure |
CN207355634U (en) * | 2017-09-06 | 2018-05-15 | 深圳市海尼斯珠宝首饰有限公司 | A kind of new diamond |
CN108823550A (en) * | 2018-06-07 | 2018-11-16 | 深圳市金鑫丰利珠宝首饰有限公司 | A method of not Sang Shi ornaments and not Sang Shi jewelry surface plate diamond film |
-
2018
- 2018-06-07 CN CN201810578256.9A patent/CN108823550A/en active Pending
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2019
- 2019-08-07 WO PCT/IB2019/000641 patent/WO2019234496A2/en active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1238813A (en) * | 1996-11-15 | 1999-12-15 | C3公司 | Gemstones formed of silicon carbide with diamond coating |
Non-Patent Citations (1)
Title |
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江彩义等: "MPCVD制备金刚石膜的形核与生长过程", 《材料导报A:综述篇》 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019234496A3 (en) * | 2018-06-07 | 2021-10-07 | 深圳市金鑫丰利珠宝首饰有限公司 | Moissanite decorative product, and method of coating surface of same with diamond film |
WO2023035429A1 (en) * | 2021-09-13 | 2023-03-16 | 吕反修 | Method for depositing diamond film coating on surface of moissanite |
WO2023035287A1 (en) * | 2021-09-13 | 2023-03-16 | 吕反修 | Diamond film coated ornament and preparation method for diamond film coating |
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WO2019234496A3 (en) | 2021-10-07 |
WO2019234496A2 (en) | 2019-12-12 |
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Application publication date: 20181116 |