Specific implementation mode
The touch-control structure and display device of the present invention are described in more detail below in conjunction with schematic diagram, wherein indicating
The preferred embodiment of the present invention, it should be appreciated that those skilled in the art can change invention described herein, and still real
The advantageous effects of the existing present invention.Therefore, following description should be understood as the widely known of those skilled in the art, and simultaneously
Not as limitation of the present invention.
The present invention is more specifically described by way of example with reference to attached drawing in the following passage.It is wanted according to following explanation and right
Ask book, advantages and features of the invention that will become apparent from.It should be noted that attached drawing is all made of very simplified form and uses non-
Accurately ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
In the following description, it should be appreciated that when layer (or film), region, pattern or structure be referred to as substrate, layer (or
Film), region and/or when pattern "upper", it can be on another layer or substrate, and/or there may also be insert layers.
In addition, it is to be appreciated that when layer is referred to as another layer of "lower", it can be under another layer, and/or can be with
There are one or more insert layers.Furthermore it is possible to be carried out about the reference in each layer "up" and "down" based on attached drawing.
As shown in Figures 1 to 7, the embodiment of the present invention proposes a kind of touch-control structure, including:
The dielectric layer 2 being formed in a substrate 1 is formed with multiple first openings 3 and multiple second in the dielectric layer 2 and opens
Mouth 4, described second is open 4 between adjacent first opening 3, and the depth of first opening 3 is more than second opening 4
Depth;And
The nano metal line layer 6 being formed in first opening, 3 and second opening 4, second opening 4 is preventing
Nano metal line layer 6 in adjacent first opening 3 is connected.
As a result, by laying the first opening in the dielectric layer, touch control layer is directly formed in the medium with the first opening
In layer, the preparation of touch control layer patterned structures is realized, avoids to be initially formed when an entire touch control layer is patterned again and lead
The situation of the touch control layer stripping of cause occurs.
It is exemplified below the touch-control structure and the preferred embodiment of display device, clearly to illustrate present disclosure,
It will be clear that present disclosure is not restricted to following embodiment, other pass through the normal of those of ordinary skill in the art
The improvement of rule technological means is also within the thought range of the present invention.
As shown in Fig. 2, the embodiment of the present invention proposes a kind of preparation method of touch-control structure, include the following steps:
Step S11 provides a substrate;
Step S12, forms dielectric layer on the substrate;
Step S13 patterns the dielectric layer, forms multiple first openings;And
Step S14 forms touch control layer in the multiple first opening.
Referring to FIG. 3, for step S11, a substrate 1 is provided.In one embodiment, the substrate 1 can be rigidity
Material, such as substrate of glass, silicon base, metallic substrates etc..In one embodiment, the substrate 1 can also be flexible material,
The material of the substrate 1 can be, but not limited to as acryl, polymethyl methacrylate (PMMA), polyacrylonitrile-butadiene-benzene
Ethylene (ABS), polyamide (PA), polyimides (PI), polybenzimidazoles polybutene (PB), polybutylene terephthalate (PBT)
(PBT), makrolon (PC), polyether-ether-ketone (PEEK), polyetherimide (PEI), polyether sulfone (PES), polyethylene (PE), poly- pair
Ethylene terephthalate (PET), polyethylene tetrafluoroethene (ETFE), polyethylene oxide, polyglycolic acid (PGA), poly- methylpent
Alkene (PMP), polyformaldehyde (POM), polyphenylene oxide (PPE), polypropylene (PP), polystyrene (PS), polytetrafluoroethylene (PTFE) (PTFE), poly- ammonia
Ester (PU), polyvinyl chloride (PVC), polyvinyl fluoride (PVF), polyvinylidene chloride (PVDC), polyvinylidene fluoride (PVDF) or benzene
Ethylene-propylene nitrile (SAN) etc..In the present embodiment, the substrate 1 is, for example, polyimide substrate etc..Of the present invention first
Substrate is not limited to the example above, can be also made of other materials.
It is understood that in preferred embodiment, the substrate 1 is by pretreatment, to remove particle, organic matter and gold thereon
Belong to the impurity such as ion.
In step s 12, shown in please referring to Fig.4, dielectric layer 2 is formed in the substrate 1.
The dielectric layer 2 can be organic material layer, such as photoresist layer etc..
The dielectric layer 2 can also be inorganic material layer, such as silica, silicon nitride, silicon oxynitride etc..
According to different materials, it can select the organic material layers such as different forming methods, such as photoresist layer that can apply
Cloth is formed;The inorganic material layers such as silicon oxide layer may be used chemical vapor deposition method and be formed.
In one embodiment, the thickness H1 of the dielectric layer 2 is
Later, referring to FIG. 5, for step S13, the dielectric layer 2 is patterned, forms multiple first openings 3.
Lithographic etch process completion may be used in first opening 3.
In one embodiment, first opening 3 can be through the dielectric layer 2.Certainly, first opening 3
Can be located in the dielectric layer 2, i.e., not run through the dielectric layer 2.For example, the case where for not running through, described first
Opening 3 depth can be
Vertical view of first opening 3 from 2 top surface of the dielectric layer can be strip, can also be hole, i.e., rectangular,
It is round or with this similar non-strip.
As shown in Figure 5, first opening 3 is tapered from top to bottom, that is, inverted trapezoidal structure is presented.It can be in order to follow-up touch-control
The formation of layer, it helps promote adhesive force.
In one embodiment, the side wall and 1 upper surface angle α of the substrate of first opening 3 are between 45 °~89 °
Between, such as 60 °, 75 °, 87 ° etc..
Later, for step S14, Fig. 6 is please referred to, touch control layer is formed in the multiple first opening 3;Described in acquisition
The touch control layer structure of shape.
Specifically, this step includes:
Nano metal line solution is coated on the dielectric layer 2 for being formed with the first opening 3 so that the nano metal line solution
Inflow is stated in the first opening.Prior art completion may be used in the coating of the nano metal line solution.For example, the coating
Method includes but not limited to:Ink-jet, broadcast sowing, intaglio printing, letterpress, flexo, nano impression, silk-screen printing, blade coating,
Rotary coating, needle paint (stylus plotting), slit type coating or flow coat.
There are several nano metal lines, these nano metal lines are distributed in the nano metal line solution in solvent.
In coating, the nano metal line solution on dielectric layer 2 will flow into the first opening 3, but on dielectric layer 2
It is possible that it can be also formed with nano metal line solution, therefore dosage, the thickness when coating are needed according to physical condition, such as first
The size shape etc. of opening is adjusted, to retain or not retain nano metal line less on 2 top surface of dielectric layer as far as possible
Solution.
Then, the dry nano metal line solution, to form the nano metal line layer, as touch control layer of the invention
6。
In one embodiment, the forms such as vacuum decompression or infrared heating or Hot-blast Heating may be used to be dried, when
Between about 50s~100s, such as 55s, 60s, 70s etc..
As it can be seen that after the drying, foring touch control layer 6 in the first opening 3, by means of the presence of dielectric layer 2, may be implemented to touch
Control the graphical of layer 6.It is formed by curing it can be seen that touch control layer need to be only coated with, without carrying out the operations such as patterned etching to touch control layer,
Thus help avoid peeling.Relatively thin touch control layer, thickness may also can be formed on the top surface of dielectric layer 2
It is about even more thin in several nm, it is contemplated that the material of touch control layer is nano metal line, and under ultrathin, electric conductivity is insufficient, can
To think non-conductive, therefore the touch control layer patterned structures obtained, interference is not will produce substantially, to improve touch-control layer pattern
Change reliability of structure.
In one embodiment, 6 thickness of the touch control layer is
Nano metal line in the touch control layer can be golden (Au), silver-colored (Ag), platinum (Pt), copper (Cu), cobalt (Co), palladium
(Pd) the nano wire such as.Due to the features such as silver is conductive and translucency is good, the nano metal line is preferably nano silver wire
(i.e. nano-silver thread), then the touch control layer is preferably nano-silver thread layer.
In addition, after forming touch control layer 6 in the multiple first opening 3, further include:In Jie for being formed with touch control layer 6
Optical adhesive layer (not shown) is formed on matter layer 2.
Further, it is likely present in 2 top surface of dielectric layer the case where to improve touch control layer, the present invention is to above-mentioned mistake
Journey is optimized, specifically:
Referring to FIG. 7, for step S13, the dielectric layer 2 is patterned, forms multiple first openings 3 and multiple
Second opening 4, second opening 4 (only schematically indicate one first between being located at adjacent first opening 3 in Fig. 5
It is open 3), and the depth of first opening 3 is more than the depth of second opening 4.
In one embodiment, first opening 3 and second opening 4 can be formed in same step, such as
It is completed by exposure imaging or lithographic etch process.
At this point, the opening width of first opening 3 be more than described second be open 4 opening width, then smaller opening
The depth formed after exposure imaging or etching is smaller.
In one embodiment, first opening 3 and second opening 4 can also be formed in different steps,
Such as it by different mask plates, is completed after different photoetching and/or etching technics.
At this point, the opening width of first opening 3 can be more than the opening width of second opening 4, can also wait
In or be less than.
In the present invention, the numberical range of the opening width of first opening 3 and second opening 4 is not done especially
It limits, those skilled in the art, in conjunction with specific production requirement, can rationally be arranged described first on the basis of disclosed by the invention
The size of the opening width of opening 3 and second opening 4.
First opening 3 can be through the dielectric layer 2, expose the substrate 1, i.e., described first opening 3
Depth is H1, the consistency of thickness with the dielectric layer 2.It is shallower such as described for second opening, 4 opposite first opens 3
2≤the H1/4 of depth H, e.g. H1/5, H1/6 etc. of second opening 4.
First opening 3 can not also run through the dielectric layer 2.
The quantity of second opening 4 can be more than the quantity of first opening 3.For example, first opening 3
Multiple second openings 4 can be corresponding with.
Vertical view of first opening 3 from 2 top surface of the dielectric layer can be strip, can also be hole, i.e., rectangular,
It is round or with this similar non-strip.
As shown in Figure 8 a, the case where being strip for first opening 3, second opening 4 can be small length
Strip (such as smaller compared to width for the first opening 3), is arranged in the both sides of the first opening 3, there are one every adjoining of sides
Second opening 4;As shown in Figure 8 b, second opening 4 can also be poroid, then be multiple second openings 4 in a row along
The length direction of first opening 3 is arranged in the side of first opening 3.
The case where being hole for first opening 3, second opening 4 is then set as small recess, such as institute
It states 4 opening occupied area of the second opening and is less than first opening, 3 opening occupied areas.
According to actual demand, there can be multiple (or multiple rows of) second opening 4 between two neighboring first opening 3, each
Second opening 4 can be that shape and structure is consistent or almost the same.Spacing between adjacent second opening 4 can be less than described the
The opening full-size of two openings 4.
In one embodiment, second opening 4 is close to first opening 3, as shown in fig. 7, a protrusion 5 is formed,
Such design contributes to follow-up nano metal line solution to flow into the first opening 3 and/or the second opening 4, avoids being deposited in Jie
It is connected on matter layer 2 and with the nano metal line layer formed in the first opening 3.
As shown in Figure 7, first opening 3 is tapered from top to bottom, that is, inverted trapezoidal structure is presented.It can be in order to follow-up touch-control
The formation of layer, it helps promote adhesive force.
In one embodiment, the side wall and 1 upper surface angle α of the substrate of first opening 3 are between 45 °~89 °
Between, such as 60 °, 75 °, 87 ° etc..
In one embodiment, the side wall and 1 upper surface angle β of the substrate of second opening 4 are between 45 °~89 °
Between, such as 60 °, 75 °, 87 ° etc.
Later, for step S14, Fig. 9 is please referred to, touch control layer 6 is formed in the multiple first opening 3, to obtain shape
The touch control layer structure of change, second opening 4 prevent the touch control layer 6 in adjacent first opening 3 from leading when forming the touch control layer 6
It is logical.
Specifically, this step includes:
Nano metal line solution is coated on patterned dielectric layer 2 so that nano metal line solution inflow states the
In one opening and second opening.Prior art completion may be used in the coating of the nano metal line solution.For example, described
The method of coating includes but not limited to:Ink-jet is broadcasted sowing, intaglio printing, letterpress, flexo, nano impression, silk-screen printing, is scraped
Cutter painting cloth, rotary coating, needle paint (stylus plotting), slit type coating or flow coat.
There are several nano metal lines, these nano metal lines are distributed in the nano metal line solution in solvent.
In coating, due to the presence of the second opening 4, the nano metal line solution on the first 3 edge dielectric layers 2 of opening
Will flow into the first opening 3 and second opening 4, further, since the first opening 3 and the second opening 4 are closed on, and the two it
Between there is raised (as shown in the virtual coil in Fig. 6), then be substantially guaranteed that nano metal line solution will not remain in medium
On layer 2, it will not especially remain in the edge of the first opening 3.Second opening 4 possible extra nanogold when may be implemented to be coated with
Belong to line solution reasonably to collect, avoid in the first opening 3 by the interference of the nano metal line layer of formation.
Then, the dry nano metal line solution, to form the nano metal line layer, as touch control layer of the invention
6。
In one embodiment, the forms such as vacuum decompression or infrared heating or Hot-blast Heating may be used to be dried, when
Between about 50s~100s, such as 55s, 60s, 70s etc..
As it can be seen that after the drying, foring touch control layer 6 in the first opening 3, by means of the presence of dielectric layer 2, may be implemented to touch
Control the graphical of layer 6.It is formed by curing it can be seen that touch control layer need to be only coated with, without carrying out the operations such as patterned etching to touch control layer,
Thus help avoid peeling.Remaining touch control layer 6' is also formed in the second opening 4, this portion of residual touch control layer
Due to being isolated in the second opening 4, i.e., described first opening, the 3 interior touch control layer 6 filled is open with described second in 4 fills 6'
Touch control layer 6' separated by the dielectric layer 2, therefore avoid may cause different touch control layers 6 interference even be connected the case where
Occur.Since the specification of the second opening 4 is smaller (such as shallower, take up space small etc.), therefore the touch control layer obtained is graphically tied
Structure not will produce interference substantially, to improve the reliability of touch control layer patterned structures.
In one embodiment, 6 thickness of the touch control layer is
Nano metal line in the touch control layer can be golden (Au), silver-colored (Ag), platinum (Pt), copper (Cu), cobalt (Co), palladium
(Pd) the nano wire such as.Due to the features such as silver is conductive and translucency is good, the nano metal line is preferably nano silver wire
(i.e. nano-silver thread), then the touch control layer is preferably nano-silver thread layer.
In addition, after forming touch control layer 6 in the multiple first opening 3, further include:In Jie for being formed with touch control layer 6
Optical adhesive layer (not shown) is formed on matter layer 2.
In addition, the embodiment of the present invention additionally provides a kind of display device, including touch-control structure as described above.
The display device can be applied in mobile phone, tablet computer, television set, display, laptop, digital phase
In any product or component with display function such as frame, navigator.
In conclusion
In touch-control structure provided by the invention and display device, touch-control structure includes substrate;It is set in the substrate
Dielectric layer, several first openings are laid at interval in the dielectric layer, and first opening has the big end end far from the substrate
The small end end face in face and the close substrate;And it is in direct contact the touch control layer being arranged in first opening.Pass through as a result,
The first opening is laid in the dielectric layer, and directly touch control layer is formed in the dielectric layer with the first opening, realizes touch control layer
The preparation of patterned structures avoids the shape for being initially formed caused touch control layer stripping when an entire touch control layer is patterned again
Condition occurs.
Further, it is also laid with the second opening in the dielectric layer, close to the first opening setting, it is ensured that touch control layer
It is entirely formed in the first opening and the second opening without being formed on dielectric layer top surface, then touch control layer not will produce and be not required to
The conducting wanted, to which reliability is protected.
Further, the first opening is tapered from top to bottom, to preferably increase the adhesive force of nano metal line layer, prevents
Stripping.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
God and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to include these modifications and variations.