CN108762005A - Mask plate exposes offset checking method, device, computer and storage medium - Google Patents
Mask plate exposes offset checking method, device, computer and storage medium Download PDFInfo
- Publication number
- CN108762005A CN108762005A CN201810344684.5A CN201810344684A CN108762005A CN 108762005 A CN108762005 A CN 108762005A CN 201810344684 A CN201810344684 A CN 201810344684A CN 108762005 A CN108762005 A CN 108762005A
- Authority
- CN
- China
- Prior art keywords
- parameter
- offset
- register
- midpoint
- register guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
This application involves a kind of mask plate exposure offset checking method, device, computer and storage mediums.The method includes：The first position parameter on two sides of the first register guide is obtained, the second position parameter of two the second register guides corresponding with first register guide is obtained, wherein first register guide is located between two second register guides；According to two first position parameters and two second position parameters, calculates and obtain offset.By obtaining two first position parameters and two second position parameters, to calculate acquisition offset, to effectively increase the accuracy of detection and detection efficiency that mask plate exposes offset.
Description
Technical field
The present invention relates to liquid crystal manufacturing technology fields, more particularly to mask plate exposure offset checking method, device, meter
Calculation machine and storage medium.
Background technology
In recent years, flourishing with liquid crystal device, production scale is increasing；Consider further that production capacity and cutting are imitated
The influence of rate, 8.5 generation production lines cannot meet the needs in market, so 10.5 generation lines or 11 generation production lines come into being,
Again along with the proposition of 5G cybertimes, domestic liquid crystal display panel manufacturer starts " 8425 " for proposing strategy, wherein liquid crystal display panel also
It is mainstream.
8.5 traditional generation production line substrate sizes have reached 2200mm*2500mm, and with the replacement liter of production line
Grade, the size of substrate increase, and rise to 3000mm or so therewith, and large-sized substrate needs set of accessory processing, such as former
Material, equipment and auxiliary material, wherein especially in the core photo-mask process of processing, i.e. the processing of yellow light process is more complicated, first
First, large-sized substrate photoetching needs corresponding mask plate, but mask plate, which is usually intermediate hanging, surrounding, has adopted support, examines
Integrality and consistency that mask plate must keep horizontality just to can guarantee exposure figure are considered, if mask plate size is too
Greatly, once intermediate hanging, meeting is sagging or even deforms, and then leads to the inconsistency of the figure deformation and entire substrate of exposure,
Production requirement cannot be met, thus will ensure mask plate in the case where keeping more smooth levelness to base plate exposure,
The smaller better guarantee of its horizon effect of size of mask plate, but the processing of large size panel can not possibly use too small mask plate
Occur；So just need to use compared to substrate size is small, also preferable mask plate is exposed processing to horizontality to substrate, this
It could be completed it is required that photo-mask process must carry out multiple exposure.
Based on this, the now crystal liquid substrate processing in industry more than big 4.5 generation of generation line line generally at least needs 2 times or more
Exposure even more times could complete photo-mask process.Substrate multiple exposure will consider it is that mask plate and light source movement are gone back
It is substrate movement, since the accuracy of the optical system of light source and the accuracy of mask plate are relatively high, so, it is used in industry
It is substrate movement, passes through the multiple mobile completion for realizing multiple photoetching of substrate.Constitute two substrates of liquid crystal display：Color
Filter (colored filter) substrates and Array (array) are essentially all to need multiple tracks photo-mask process, due to substrate size compared with
Greatly, one of photo-mask process needs multiple exposure, so first of photo-mask process is important, it must first give elementary contour
Get off, subsequent photoetching is carrying out contraposition photo-mask process according to this basic framework, and first of photo-mask process needs fixs needs
The profile of graphics processing generally requires to measure the map migration amount not exposed herewith, is known as figure Shot offsets, root in industry
Judge the good and bad of multiple exposure result according to this offset, so special detection device is needed to detect this offset, passes
The detection method of system is measured to the form accuracy and relative positional accuracy of each exposure Shot, but traditional detection method
Detection speed it is slower, influence detection efficiency, and then also directly affect production efficiency.
Invention content
Based on this, it is necessary in view of the above technical problems, provide a kind of mask plate exposure offset checking method, device,
Computer and storage medium.
A kind of mask plate exposure offset checking method, the method includes：
It obtains the first position parameter on two sides of the first register guide, obtains two corresponding with first register guide the
The second position parameter of two register guides, wherein first register guide is located between two second register guides；
According to two first position parameters and two second position parameters, calculates and obtain offset.
It is described in one of the embodiments, to be joined according to two first position parameters and two second positions
Number, calculating the step of obtaining offset includes：
It is calculated with a second position parameter according to a first position parameter and obtains the first midpoint parameter, according to another
The one first position parameter calculates with another second position parameter and obtains the second midpoint parameter；
According to first midpoint parameter and second midpoint parameter, calculates and obtain the offset.
Described according to first midpoint parameter and second midpoint parameter in one of the embodiments, calculating obtains
The offset the step of include：
First midpoint parameter and second midpoint parameter are made the difference, calculates and obtains the offset.
It is described in one of the embodiments, to be joined according to two first position parameters and two second positions
Number, calculating the step of obtaining offset further includes later：
According to the comparing result of the offset and preset offset value, testing result is exported.
The first position parameter on two sides for obtaining the first register guide in one of the embodiments, acquisition and institute
The step of second position parameter for stating corresponding two the second register guides of the first register guide includes：
Obtain the first position parameter on two sides of first register guide；
Obtain second position parameter of two the second register guides close to the side of first register guide.
A kind of mask plate exposure offset detector, described device include：
Location parameter acquisition module, for obtains the first register guide two sides first position parameter, acquisition with it is described
The second position parameter of corresponding two the second register guides of first register guide, wherein first register guide is located at described in two
Between second register guide；
Offset computing module, for according to two first position parameters and two second position parameters, meter
It calculates and obtains offset.
Offset computing module includes in one of the embodiments,：
Midpoint parameter acquiring unit, for being obtained according to a first position parameter and the second position parameter calculating
The first midpoint parameter is obtained, is calculated with another second position parameter according to another first position parameter and obtains the second midpoint
Parameter；
Offset computation unit, for according to first midpoint parameter and second midpoint parameter, calculating and obtaining institute
State offset.
The offset computation unit is additionally operable to first midpoint parameter and described in one of the embodiments,
Two midpoint parameters make the difference, and calculate and obtain the offset.
A kind of computer equipment, including memory, processor and storage can be run on a memory and on a processor
Computer program, the processor realize following steps when executing the computer program：
A kind of computer readable storage medium, is stored thereon with computer program, and the computer program is held by processor
Following steps are realized when row：
Above-mentioned mask plate exposure offset checking method, device, computer and storage medium, by obtaining two first
Parameter and two second position parameters are set, to calculate acquisition offset, exposes offset to effectively increase mask plate
Accuracy of detection and detection efficiency.
Description of the drawings
Fig. 1 is the applied environment figure that mask plate exposes offset checking method in one embodiment；
Fig. 2 is the flow diagram that mask plate exposes offset checking method in one embodiment；
Fig. 3 is the structure diagram that mask plate exposes offset detector in one embodiment；
Fig. 4 is the internal structure chart of one embodiment Computer equipment；
Fig. 5 is the internal structure chart of another embodiment Computer equipment；
Fig. 6 A-6B are the pictorial diagram of the exposure figure and register guide in one embodiment；
Fig. 7 is the pictorial diagram of the first register guide and the second register guide in one embodiment.
Specific implementation mode
It is with reference to the accompanying drawings and embodiments, right in order to make the object, technical solution and advantage of the application be more clearly understood
The application is further elaborated.It should be appreciated that specific embodiment described herein is only used to explain the application, not
For limiting the application.
Mask plate provided by the present application exposes offset checking method, can be applied in application environment as shown in Figure 1.
Wherein, imaging sensor 102 is communicated by data-interface with computer 104.Wherein, computer 104 can be with independent
The server cluster of server either multiple servers composition is realized.Imaging sensor 102 obtains figure, the first register guide
With the image of the second register guide, computer 104 parses image, obtains the first position parameter on two sides of the first register guide, obtains
The second position parameter for taking two the second register guides corresponding with first register guide, according to two first position parameters
With two second position parameters, calculates and obtain offset.
In one embodiment, as shown in Fig. 2, providing a kind of mask plate exposure offset checking method, in this way
Applied to being illustrated for the terminal in Fig. 1, include the following steps：
Step 220, the first position parameter for obtaining two sides of the first register guide, obtains corresponding with first register guide
Two the second register guides second position parameter, wherein first register guide is located between two second register guides.
Further, the first position parameter on two sides of the first register guide is obtained automatically, and automatic obtain aligns with described first
Mark the second position parameter of corresponding two the second register guides；For example, obtaining the two of the first register guide automatically using photographic device
The first position parameter on a side, and the automatic second position for obtaining two the second register guides corresponding with first register guide
Parameter；Further, it obtains the first position parameter on two sides of the first register guide automatically using photographic device, and obtains automatically
The second position parameter for taking two the second register guides corresponding with first register guide, is automatically transferred to computing device.
In the present embodiment, the position of first register guide and the second register guide for the figure after marking mask plate to expose,
First register guide and the second register guide correspond to the figure of different exposures, the corresponding figure of the first register guide and the second register guide pair
The figure answered is disposed adjacent.
For example, first contraposition is designated as strip, for example, the second contraposition is designated as strip, the first register guide and two second pair
Position mark is parallel, and the first register guide is located between two the second register guides.Since first contraposition is designated as strip, this
One register guide has one fixed width, and therefore, the position on two sides being mutually parallel of first register guide is different, the present embodiment
In, obtain the first position parameter on two sides being mutually parallel of the first register guide.
Specifically, in the exposure process of mask plate, light exposes the photoresist on substrate by the hole on mask plate
Light, to form the figure of exposure on substrate.Registration holes are also set up on the mask plate, in this way, light is aligned by mask plate
Hole is to base plate exposure so that register guide is formed on substrate.After carrying out first time exposure by mask plate, the first figure is formed on substrate
Mask plate is then moved to the position of next exposure by shape and the first register guide, is carried out second and is exposed, the shape on substrate
At second graph and the second register guide, in this way, then foring the first register guide and the second register guide on substrate, pass through the first contraposition
Mark and the second register guide, you can to realize the detection of the offset of the position to the figure of double exposure.
It is noted that in one embodiment, forming the mask of the mask plate and the second register guide of the first register guide
Version is same mask plate, for example, offering the first registration holes and two the second registration holes on the mask plate, the first registration holes are located at
Between two the second registration holes, when expose for the first time, maskaperture mask is aligned by two second so that light passes through first pair
Position hole is exposed substrate, and can not be by the second registration holes, in this way so that and exposure forms the first register guide on substrate,
When exposing next time, maskaperture mask is aligned by first so that light is exposed substrate by two the second registration holes, and can not
By the first registration holes, in this way so that exposure forms the second register guide on substrate.
Specifically, which is used to indicate the position on two sides of first register guide, second position parameter
Position for indicating two the second register guides.In the present embodiment, two sides first position parameter of the first register guide is obtained, i.e.,
Two first position parameters are obtained, each side of the first register guide corresponds to a first position parameter, each first position ginseng
The position on the one side of number for indicating the first register guide, for example, obtaining the first position parameter on each side of the first register guide.
For example, obtaining the second position parameter of two the second register guides corresponding with first register guide, that is, obtain two second pair
Position mark, every 1 second register guide correspond to a second position parameter, for example, obtaining the parameter of every one second register guide.
Step 240, according to two first position parameters and two second position parameters, calculating is deviated
Amount.Further, according to two first position parameters and two second position parameters, automatic calculate is deviated
Amount；Further, using computing device, such as computer, according to two first position parameters and two seconds
Parameter is set, automatic calculate obtains offset.
In this step, according to the two first position parameters and two second position parameters got, calculating is deviated
Amount, the offset are the offset between the figure on substrate by double exposure formation, i.e. the offset of mask plate double exposure
Amount.It according to two first position parameters and two second position parameters, calculates and obtains offset, can detect and obtain the figure and be
No offset, to detect whether mask plate deviates.
In above-described embodiment, by obtaining two first position parameters and two second position parameters, obtained to calculate
Offset, to effectively increase the accuracy of detection and detection efficiency that mask plate exposes offset.
In order to improve the detection efficiency of offset, the accuracy of detection of offset is improved, for example, obtaining two the first register guides
Two sides first position parameter, obtain the second position of two the second register guides corresponding with each first register guide
Parameter, wherein each first register guide is located between two second register guides, for example, two the first register guide phases
It is mutually vertical, for example, two the second register guides are mutually perpendicular to other two register guide.For example, according to four first positions
Parameter and four second position parameters calculate and obtain offset.
For example, the first position parameter on two sides of two the first register guides is obtained, for example, obtaining each first register guide
The first position parameter on two sides in the present embodiment, obtains four first position parameters.For example, obtaining and each described first
The second position parameter on one side of corresponding two the second register guides of register guide, that is, obtain the second of one side of each second register guide
Location parameter.
In the present embodiment, there are two the first register guide and four the second register guides for the figure tool that an exposure is formed, often
One first register guide is corresponding with two the second register guides, and in the present embodiment, the figure of the formation of exposure has similar to rectangle
Shape, two the first register guides are located at the both sides of the figure either diagonal or the same side, four the second register guides difference
Positioned at the both sides of the figure are either diagonal or the same side.In this way, once obtaining four first position parameters and four seconds
Parameter is set, by four first position parameters and four second position parameters, the inspection to the offset of figure can be effectively improved
Efficiency is surveyed, the accuracy of detection of offset is improved.
It is in one embodiment, described according to two first position parameters and two in order to accurately calculate offset
The second position parameter, calculating the step of obtaining offset includes：According to a first position parameter and one described second
Location parameter, which calculates, obtains the first midpoint parameter, according to another first position parameter and another second position parameter meter
It calculates and obtains the second midpoint parameter；According to first midpoint parameter and second midpoint parameter, calculates and obtain the offset.
Specifically, the position on corresponding two sides for being the first register guide of two first position parameters, in ideal shape
Under state, in the case that figure does not deviate, the first register guide is positioned at the middle of two the second register guides, therefore, first pair
Position target two sides to the second register guides closed on distance it is equal, that is to say, that one side of the first register guide with one second pair
Position target distance is equal to the another side of the first register guide at a distance from another second register guide, in the ideal situation, the first midpoint
Parameter is equal to the second midpoint parameter, when the first midpoint parameter is equal to the second midpoint parameter, offset zero.When the first midpoint is joined
Whens number is not waited with the second midpoint parameter, i.e., figure produces offset.Therefore, by calculating midpoint parameter, you can calculate and obtain partially
Shifting amount, and then detect and obtain whether the figure deviates, to detect whether mask plate deviates.
For example, calculating the difference of a first position parameter and a second position parameter, the first midpoint parameter is obtained,
The difference of another first position parameter and another second position parameter is calculated, the second midpoint parameter is obtained；According to described
First midpoint parameter and second midpoint parameter calculate and obtain the offset.
For example, the difference of a first position parameter and a second position parameter is calculated, by a first position
The difference divided by two of parameter and a second position parameter obtains the first midpoint parameter, calculates another first position parameter
And the difference of another second position parameter removes the difference of another first position parameter and another second position parameter
With two, the second midpoint parameter is obtained；According to first midpoint parameter and second midpoint parameter, calculates and obtain the offset
Amount.
It is in one embodiment, described according to first midpoint parameter and described second in order to accurately calculate offset
Midpoint parameter, calculating the step of obtaining the offset includes：First midpoint parameter and second midpoint parameter are done
Difference calculates and obtains the offset.
As mentioned previously, in the ideal situation, the first midpoint parameter is equal to the second midpoint parameter, when the first midpoint parameter
When equal to the second midpoint parameter, offset zero.When the first midpoint parameter and the second midpoint parameter do not wait, i.e., figure produces
Offset.Therefore, at this time by carrying out making the difference calculating to the first midpoint parameter and the second midpoint parameter, you can obtain between the two
Difference, the difference are offset, and in the present embodiment, first midpoint parameter and second midpoint parameter are made the difference, can
The offset is obtained to accurately calculate, mask plate is obtained to detect and whether deviates and the offset of mask plate.
It is whether qualified in order to detect exposure base figure, it is in one embodiment, described according to two first positions
Parameter and two second position parameters, calculating the step of obtaining offset further includes later：According to the offset and in advance
If the comparing result of deviant, testing result is exported.
In the present embodiment, preset offset value is the deviant of preset figure, when offset is less than preset offset value, table
Bright offset is smaller, and when offset is more than preset offset value, show that offset is larger.It is noted that twice or more
The error that there is offset between the figure that secondary exposure is formed, if error is within a preset range, it is believed that error is smaller, it is believed that
Offset is normal, then the offset of mask plate is qualified, and in other words, base plate exposure figure is qualified, conversely, if error is in preset range
Outside, then error is larger, and the offset of the abnormal then mask plate of offset is unqualified, and base plate exposure figure is unqualified.In the present embodiment,
Preset range, that is, preset offset value.
In the present embodiment, offset and preset offset value are compared, according to comparing result, obtain testing result, into
And export the testing result.The testing result is used to reflect whether graph exposure is qualified, or the offset for reflecting mask plate
It is whether qualified.
For example, according to the comparing result of the offset and preset offset value, the step of exporting testing result, is：Detection institute
State whether offset is less than or equal to preset offset value；When the offset be less than or equal to the preset offset value, then export
Pass result is detected, when the offset is more than the preset offset value, then exports the unqualified result of detection.
In order to accurately obtain second position parameter, in one embodiment, two sides for obtaining the first register guide
The step of first position parameter, the second position parameter for obtaining two the second register guides corresponding with first register guide, wraps
It includes：Obtain the first position parameter on two sides of first register guide；Two the second register guides are obtained close to described first pair
The second position parameter on position target side.
Specifically, in the present embodiment, the second contraposition is designated as strip, and every 1 second register guide includes two opposite and mutually flat
Capable side, every 1 second register guide have one close to a side of the first register guide, since the position on the side of the second register guide is
It is parsed and is obtained by Image Acquisition, therefore, if the position by obtaining a side of second register guide far from the first register guide
It when parameter, can be influenced by the width of the second register guide, cause location parameter to obtain inaccurate, specifically, since image is adopted
The error or the error in resolving of collection, it will cause the location parameter on a side far from the first register guide to obtain inaccurate
Really, therefore, in the present embodiment, the second position parameter on a side in the second register guide close to the first register guide is obtained, it can
The acquisition error for eliminating second position parameter caused by the width of the second register guide, effectively improves the acquisition of second position parameter
Precision.
In order to accurately obtain first position parameter and second position parameter, in one embodiment, first is obtained described
The first position parameter on two sides of register guide obtains the second of two the second register guides corresponding with first register guide
Further include step before the step of setting parameter：Obtain comprising the first register guide and the second register guide to bit image；Described in parsing
To bit image, the first position parameter on two sides of the first register guide is obtained, obtains two corresponding with first register guide
The second position parameter of second register guide.For example, parsing is described to bit image, the preset of the figure based on exposure is that coordinate is former
Point establishes coordinate system, is based on the coordinate system, obtains the first position parameter on two sides of the first register guide, obtains and described the
The second position parameter of corresponding two the second register guides of one register guide.
For example, acquisition comprising exposure figure, two the first register guides and four the second register guides to bit image, wherein
Every 1 first register guide is corresponding with two the second register guides, and every one first register guide be located at corresponding two the second register guides it
Between；It parses described to bit image, the first position parameter on two sides of each first register guide of acquisition, acquisition and each described first
The second position parameter on one side of corresponding two the second register guides of register guide；According to four first position parameters and four
The second position parameter calculates and obtains offset.
For example, acquisition comprising exposure figure and two group of first register guide and the second register guide to bit image, wherein it is every
One group of first register guide and the second register guide include one first register guide and two the second register guides, same group of the first register guide
Between corresponding two the second register guides, same group of the first register guide and the second register guide are mutually parallel, and the of two groups
One register guide is mutually perpendicular to, and two groups of the second register guide is mutually perpendicular to；It parses described to bit image, obtains the first contraposition in each group
The first position parameter on two sides of target obtains one side of two the second register guides corresponding with the first register guide described in each group
Second position parameter；
According to the second position parameter of the two first position parameters and two the second register guides of one group of the first register guide,
It calculates and obtains the first offset, according to two first position parameters of another group of the first register guide and two the second register guides
Second position parameter calculates and obtains the second offset, and in the present embodiment, the first offset is transversal displacement, the second offset
It for vertical misalignment amount, is calculated separately from two vertical direction and obtains offset, to accurately obtain the offset of figure, Jin Erjing
Really judge whether exposure deviates, if qualified.
Here is a specific embodiment：
In the present embodiment, image is acquired using MCR (both macro and micro inspection) equipment, which is also referred to as line
Wide check machine (Line width check), for example, using the corresponding register guide of figure exposed on MCR equipment acquisition substrate,
Specifically, the sensor for acquiring image is provided in the MCR equipment, which is microscope or checks apparent
Mac (macromodel)/Mic (microscopic mode) equipment.
After single exposure, as shown in Figure 6A, the first figure 710 for being formed on substrate and right with first figure 710
The first register guide 610 answered, wherein the first figure 710 is rectangle, and there are four the first register guides, four the first register guide difference
Four positioned at the first figure 710 are diagonal.
Then, second is carried out to expose, formed as shown in Figure 6B, on substrate second graph 720 and with the second graph 720
Corresponding second register guide 620, the first register guide 610 and second contraposition between the first figure 710 and second graph 720
Mark 620 corresponding, and every one first register guide 610 is corresponding with two the second register guides 620.Positioned at the first figure 710 and second
The first register guide and the second contraposition between figure 720 indicate two groups, and each group includes one first register guide 610 and two second
Register guide 620.Two groups of the first register guide 610 is mutually perpendicular to, and two groups of the second register guide is mutually perpendicular to.With the first contraposition of group
Mark and the second register guide are mutually parallel.
Imaging sensor acquires the image of two group of first register guide and the second register guide simultaneously, after acquiring image, to image
Parsed, by taking one of which as an example, as shown in fig. 7, the first register guide 610 be located at two the second register guides (620,620 ') it
Between, to obtained after image analysis the first register guide 610 close to the first side 611 of the second register guide 620 first position parameter with
And the first position parameter close to the second side 612 of the second register guide 620 ', and the second register guide 620 is obtained close to the first contraposition
The second position parameter on one side 621 of mark 610 and the second register guide 620 ' are close to one side 621 ' of the first register guide 610
Second position parameter.
The second position parameter on the first position parameter on the first side 611 and one side 621 of the second register guide 620 is made the difference simultaneously
Divided by two, the first midpoint parameter L1 is obtained, by one side 621 ' of the first position parameter and the second register guide 620 ' on the second side 612
Second position parameter make the difference and divided by two, obtain the second midpoint parameter L2 lateral shift is calculated by (L2-L1)/2
Amount.
The location parameter of the first register guide and the second register guide to another group is detected, and is calculated vertically with this
The offset in direction, i.e. vertical misalignment amount.
In the present embodiment, the location parameter of the register guide by obtaining two groups simultaneously, and then calculate and obtain transversal displacement
With vertical misalignment amount, the accurate measurement that offset is exposed to mask plate is realized, it is pair inclined to effectively increase mask plate exposure
The accuracy of detection and detection efficiency of shifting amount.
It should be understood that although each step in the flow chart of Fig. 2 is shown successively according to the instruction of arrow, this
A little steps are not that the inevitable sequence indicated according to arrow executes successively.Unless expressly state otherwise herein, these steps
It executes there is no the limitation of stringent sequence, these steps can execute in other order.Moreover, at least part in Fig. 2
Step may include that either these sub-steps of multiple stages or stage are executed in synchronization to multiple sub-steps
It completes, but can execute at different times, the execution sequence in these sub-steps or stage is also not necessarily to be carried out successively,
But it can either the sub-step of other steps or at least part in stage execute in turn or alternately with other steps.
In one embodiment, as shown in figure 3, providing a kind of mask plate exposure offset detector, including：Position
Parameter acquisition module 320 and offset computing module 340, wherein：
Location parameter acquisition module 320 is used to obtain the first position parameter on two sides of the first register guide, acquisition and institute
State the second position parameter of corresponding two the second register guides of the first register guide, wherein first register guide is located at two institutes
It states between the second register guide；
Offset computing module 340 is used for according to two first position parameters and two second position parameters,
It calculates and obtains offset.
In one embodiment, offset computing module includes：Midpoint parameter acquiring unit and offset computation unit,
In：
Midpoint parameter acquiring unit is used to be obtained according to a first position parameter and the second position parameter calculating
The first midpoint parameter is obtained, is calculated with another second position parameter according to another first position parameter and obtains the second midpoint
Parameter；
Offset computation unit is used to, according to first midpoint parameter and second midpoint parameter, calculate described in obtaining
Offset.
In one embodiment, be additionally operable to will be in first midpoint parameter and described second for the offset computation unit
Point parameter makes the difference, and calculates and obtains the offset.
In one embodiment, mask plate exposure offset detector further includes：Testing result output module, detection knot
Fruit output module is used for the comparing result according to the offset and preset offset value, exports testing result.
In one embodiment, the location parameter acquisition module includes first position parameter acquiring unit and the second position
Parameter acquiring unit, wherein：
First position parameter acquiring unit is used to obtain the first position parameter on two sides of first register guide.
Second position parameter acquiring unit is used to obtain two the second register guides close to the of the side of first register guide
Two location parameters.
The specific restriction that offset detector is exposed about mask plate may refer to above for mask plate exposure partially
The restriction of quantity measuring method is moved, details are not described herein.Modules in above-mentioned mask plate exposure offset detector can be complete
Portion or part are realized by software, hardware and combinations thereof.Above-mentioned each module can be in the form of hardware embedded in or independently of calculating
In processor in machine equipment, can also in a software form it be stored in the memory in computer equipment, in order to processor
It calls and executes the corresponding operation of the above modules.
In one embodiment, a kind of computer equipment is provided, which can be server, internal junction
Composition can be as shown in Figure 4.The computer equipment include the processor connected by system bus, memory, network interface and
Database.Wherein, the processor of the computer equipment is for providing calculating and control ability.The memory packet of the computer equipment
Include non-volatile memory medium, built-in storage.The non-volatile memory medium is stored with operating system, computer program and data
Library.The built-in storage provides environment for the operation of operating system and computer program in non-volatile memory medium.The calculating
The database of machine equipment is for storing mask plate exposure offset detection data.The network interface of the computer equipment is used for and sets
It is standby to be communicated by network connection.To realize a kind of mask plate exposure offset detection side when the computer program is executed by processor
Method.
In one embodiment, a kind of computer equipment is provided, which can be terminal, internal structure
Figure can be as shown in Figure 5.The computer equipment includes the processor connected by system bus, memory, network interface, display
Screen and input unit.Wherein, the processor of the computer equipment is for providing calculating and control ability.The computer equipment is deposited
Reservoir includes non-volatile memory medium, built-in storage.The non-volatile memory medium is stored with operating system and computer journey
Sequence.The built-in storage provides environment for the operation of operating system and computer program in non-volatile memory medium.The calculating
The network interface of machine equipment is used to communicate by network connection with external terminal.When the computer program is executed by processor with
Realize a kind of mask plate exposure offset checking method.The display screen of the computer equipment can be liquid crystal display or electronics
Ink display screen, the imaging sensor of the computer equipment are used to acquire the image of the figure exposed on substrate, which includes
First register guide and the second register guide.
It will be understood by those skilled in the art that structure shown in Fig. 5, is only tied with the relevant part of application scheme
The block diagram of structure does not constitute the restriction for the computer equipment being applied thereon to application scheme, specific computer equipment
May include either combining certain components than more or fewer components as shown in the figure or being arranged with different components.
In one embodiment, a kind of computer equipment is provided, including memory, processor and storage are on a memory
And the computer program that can be run on a processor, processor realize following steps when executing computer program：
It obtains the first position parameter on two sides of the first register guide, obtains two corresponding with first register guide the
The second position parameter of two register guides, wherein first register guide is located between two second register guides；
According to two first position parameters and two second position parameters, calculates and obtain offset.
In one embodiment, following steps are also realized when processor executes computer program：
It is calculated with a second position parameter according to a first position parameter and obtains the first midpoint parameter, according to another
The one first position parameter calculates with another second position parameter and obtains the second midpoint parameter；
According to first midpoint parameter and second midpoint parameter, calculates and obtain the offset.
In one embodiment, following steps are also realized when processor executes computer program：
First midpoint parameter and second midpoint parameter are made the difference, calculates and obtains the offset.
In one embodiment, following steps are also realized when processor executes computer program：
According to the comparing result of the offset and preset offset value, testing result is exported.
In one embodiment, following steps are also realized when processor executes computer program：
Obtain the first position parameter on two sides of first register guide；
Obtain second position parameter of two the second register guides close to the side of first register guide.
In one embodiment, a kind of computer readable storage medium is provided, computer program is stored thereon with, is calculated
Machine program realizes following steps when being executed by processor：
It obtains the first position parameter on two sides of the first register guide, obtains two corresponding with first register guide the
The second position parameter of two register guides, wherein first register guide is located between two second register guides；
According to two first position parameters and two second position parameters, calculates and obtain offset.
In one embodiment, following steps are also realized when computer program is executed by processor：
It is calculated with a second position parameter according to a first position parameter and obtains the first midpoint parameter, according to another
The one first position parameter calculates with another second position parameter and obtains the second midpoint parameter；
According to first midpoint parameter and second midpoint parameter, calculates and obtain the offset.
In one embodiment, following steps are also realized when computer program is executed by processor：
First midpoint parameter and second midpoint parameter are made the difference, calculates and obtains the offset.
In one embodiment, following steps are also realized when computer program is executed by processor：
According to the comparing result of the offset and preset offset value, testing result is exported.
In one embodiment, following steps are also realized when computer program is executed by processor：
Obtain the first position parameter on two sides of first register guide；
Obtain second position parameter of two the second register guides close to the side of first register guide.
In one embodiment, following steps are also realized when computer program is executed by processor：
One of ordinary skill in the art will appreciate that realizing all or part of flow in above-described embodiment method, being can be with
Relevant hardware is instructed to complete by computer program, the computer program can be stored in a non-volatile computer
In read/write memory medium, the computer program is when being executed, it may include such as the flow of the embodiment of above-mentioned each method.Wherein,
Any reference to memory, storage, database or other media used in each embodiment provided herein,
Including non-volatile and/or volatile memory.Nonvolatile memory may include read-only memory (ROM), programming ROM
(PROM), electrically programmable ROM (EPROM), electrically erasable ROM (EEPROM) or flash memory.Volatile memory may include
Random access memory (RAM) or external cache.By way of illustration and not limitation, RAM is available in many forms,
Such as static state RAM (SRAM), dynamic ram (DRAM), synchronous dram (SDRAM), double data rate sdram (DDRSDRAM), enhancing
Type SDRAM (ESDRAM), synchronization link (Synchlink) DRAM (SLDRAM), memory bus (Rambus) direct RAM
(RDRAM), direct memory bus dynamic ram (DRDRAM) and memory bus dynamic ram (RDRAM) etc..
Each technical characteristic of above example can be combined arbitrarily, to keep description succinct, not to above-described embodiment
In each technical characteristic it is all possible combination be all described, as long as however, the combination of these technical characteristics be not present lance
Shield is all considered to be the range of this specification record.
The several embodiments of the application above described embodiment only expresses, the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, under the premise of not departing from the application design, various modifications and improvements can be made, these belong to the protection of the application
Range.Therefore, the protection domain of the application patent should be determined by the appended claims.
Claims (10)
1. a kind of mask plate exposes offset checking method, which is characterized in that including：
The first position parameter on two sides of the first register guide is obtained, obtains two second pair corresponding with first register guide
Position target second position parameter, wherein first register guide is located between two second register guides；
According to two first position parameters and two second position parameters, calculates and obtain offset.
2. mask plate according to claim 1 exposes offset checking method, which is characterized in that described according to described in two
First position parameter and two second position parameters, calculating the step of obtaining offset includes：
It is calculated with a second position parameter according to a first position parameter and obtains the first midpoint parameter, according to another institute
It states first position parameter and calculates the second midpoint parameter of acquisition with another second position parameter；
According to first midpoint parameter and second midpoint parameter, calculates and obtain the offset.
3. according to the method described in claim 2, it is characterized in that, described according in first midpoint parameter and described second
Point parameter, calculating the step of obtaining the offset includes：
First midpoint parameter and second midpoint parameter are made the difference, calculates and obtains the offset.
4. mask plate according to claim 1 exposes offset checking method, which is characterized in that described according to described in two
First position parameter and two second position parameters, calculating the step of obtaining offset further includes later：
According to the comparing result of the offset and preset offset value, testing result is exported.
5. mask plate according to claim 1 exposes offset checking method, which is characterized in that described to obtain the first contraposition
The first position parameter on two sides of target obtains the second position ginseng of two the second register guides corresponding with first register guide
Several steps include：
Obtain the first position parameter on two sides of first register guide；
Obtain second position parameter of two the second register guides close to the side of first register guide.
6. a kind of mask plate exposes offset detector, which is characterized in that described device includes：
Location parameter acquisition module, the first position parameter on two sides for obtaining the first register guide, obtains and described first
The second position parameter of corresponding two the second register guides of register guide, wherein first register guide is located at two described second
Between register guide；
Offset computing module, for according to two first position parameters and two second position parameters, calculating to obtain
Obtain offset.
7. mask plate according to claim 1 exposes offset detector, which is characterized in that offset computing module packet
It includes：
Midpoint parameter acquiring unit obtains for being calculated with the second position parameter according to a first position parameter
One midpoint parameter calculates with another second position parameter according to another first position parameter and obtains the second midpoint ginseng
Number；
Offset computation unit, for according to first midpoint parameter and second midpoint parameter, it is described partially to calculate acquisition
Shifting amount.
8. mask plate according to claim 7 exposes offset detector, which is characterized in that the offset calculates single
Member is additionally operable to make the difference first midpoint parameter and second midpoint parameter, calculates and obtains the offset.
9. a kind of computer equipment, including memory, processor and storage are on a memory and the meter that can run on a processor
Calculation machine program, which is characterized in that the processor realizes any one of claim 1 to 5 institute when executing the computer program
The step of stating method.
10. a kind of computer readable storage medium, is stored thereon with computer program, which is characterized in that the computer program
The step of method described in any one of claim 1 to 5 is realized when being executed by processor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810344684.5A CN108762005B (en) | 2018-04-17 | 2018-04-17 | Mask exposure offset detection method and device, computer and storage medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810344684.5A CN108762005B (en) | 2018-04-17 | 2018-04-17 | Mask exposure offset detection method and device, computer and storage medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108762005A true CN108762005A (en) | 2018-11-06 |
| CN108762005B CN108762005B (en) | 2020-10-20 |
Family
ID=64010681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810344684.5A Active CN108762005B (en) | 2018-04-17 | 2018-04-17 | Mask exposure offset detection method and device, computer and storage medium |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108762005B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109633938A (en) * | 2018-12-17 | 2019-04-16 | 深圳市华星光电技术有限公司 | Exposure alignment method |
| CN109932871A (en) * | 2019-01-07 | 2019-06-25 | 成都中电熊猫显示科技有限公司 | Proximity exposure method and apparatus |
| CN113410151A (en) * | 2021-06-01 | 2021-09-17 | 云谷（固安）科技有限公司 | Method, device and equipment for determining position offset of mask |
| WO2022142364A1 (en) * | 2021-01-04 | 2022-07-07 | 长鑫存储技术有限公司 | Method and apparatus for correcting placement error of mask |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10355681A1 (en) * | 2003-11-28 | 2005-07-07 | Süss Microtec Lithography Gmbh | Direct adjustment in Maskalignern |
| KR20110001289A (en) * | 2009-06-30 | 2011-01-06 | 주식회사 하이닉스반도체 | Mask for photolithography |
| CN102692830A (en) * | 2011-03-24 | 2012-09-26 | 南亚科技股份有限公司 | Method for evaluating overlay error and mask for the same |
| CN102944970A (en) * | 2012-11-16 | 2013-02-27 | 京东方科技集团股份有限公司 | Mask alignment method for basal plate |
| CN203365917U (en) * | 2013-07-31 | 2013-12-25 | 北京京东方光电科技有限公司 | Exposure device |
| CN103713467A (en) * | 2013-12-16 | 2014-04-09 | 合肥京东方光电科技有限公司 | Mask set and method for detecting alignment precision by utilizing mask set |
| CN106154739A (en) * | 2015-04-15 | 2016-11-23 | 中芯国际集成电路制造(上海)有限公司 | Mask plate and the determination methods of focal shift |
| CN106647162A (en) * | 2017-03-22 | 2017-05-10 | 京东方科技集团股份有限公司 | Mask and exposure method and device |
-
2018
- 2018-04-17 CN CN201810344684.5A patent/CN108762005B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10355681A1 (en) * | 2003-11-28 | 2005-07-07 | Süss Microtec Lithography Gmbh | Direct adjustment in Maskalignern |
| KR20110001289A (en) * | 2009-06-30 | 2011-01-06 | 주식회사 하이닉스반도체 | Mask for photolithography |
| CN102692830A (en) * | 2011-03-24 | 2012-09-26 | 南亚科技股份有限公司 | Method for evaluating overlay error and mask for the same |
| CN102944970A (en) * | 2012-11-16 | 2013-02-27 | 京东方科技集团股份有限公司 | Mask alignment method for basal plate |
| CN203365917U (en) * | 2013-07-31 | 2013-12-25 | 北京京东方光电科技有限公司 | Exposure device |
| CN103713467A (en) * | 2013-12-16 | 2014-04-09 | 合肥京东方光电科技有限公司 | Mask set and method for detecting alignment precision by utilizing mask set |
| CN106154739A (en) * | 2015-04-15 | 2016-11-23 | 中芯国际集成电路制造(上海)有限公司 | Mask plate and the determination methods of focal shift |
| CN106647162A (en) * | 2017-03-22 | 2017-05-10 | 京东方科技集团股份有限公司 | Mask and exposure method and device |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109633938A (en) * | 2018-12-17 | 2019-04-16 | 深圳市华星光电技术有限公司 | Exposure alignment method |
| CN109633938B (en) * | 2018-12-17 | 2021-11-23 | Tcl华星光电技术有限公司 | Exposure alignment method |
| CN109932871A (en) * | 2019-01-07 | 2019-06-25 | 成都中电熊猫显示科技有限公司 | Proximity exposure method and apparatus |
| CN109932871B (en) * | 2019-01-07 | 2021-06-01 | 成都中电熊猫显示科技有限公司 | Proximity exposure method and apparatus |
| WO2022142364A1 (en) * | 2021-01-04 | 2022-07-07 | 长鑫存储技术有限公司 | Method and apparatus for correcting placement error of mask |
| CN114721226A (en) * | 2021-01-04 | 2022-07-08 | 长鑫存储技术有限公司 | Method and device for correcting photomask placement error |
| CN114721226B (en) * | 2021-01-04 | 2023-08-25 | 长鑫存储技术有限公司 | Photomask placement error correction method and device |
| CN113410151A (en) * | 2021-06-01 | 2021-09-17 | 云谷（固安）科技有限公司 | Method, device and equipment for determining position offset of mask |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108762005B (en) | 2020-10-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108762005A (en) | Mask plate exposes offset checking method, device, computer and storage medium | |
| CN104736962B (en) | For estimation and the method for correcting offset target inaccuracy | |
| KR101138449B1 (en) | Pattern recognition and metrology structure for an x-initiative layout design | |
| CN100451839C (en) | Alignment method of exposure mask and manufacturing method of thin film element substrate | |
| CN109884862B (en) | Overlay deviation compensation device and method in three-dimensional memory exposure system | |
| JP4959881B2 (en) | Exposure method for manufacturing a semiconductor device | |
| JP2009270988A (en) | Calculating method for overlap misalignment and manufacturing method for semiconductor device | |
| US4566192A (en) | Critical dimension measurement structure | |
| US6423555B1 (en) | System for determining overlay error | |
| CN105629668A (en) | Test apparatus, test system and test method | |
| CN105242504B (en) | The method for improving alignment precision | |
| CN108846863A (en) | Position cursor position detection method, device, computer and storage medium | |
| KR20220154198A (en) | Construction techniques of the impute model | |
| CN208334913U (en) | Patterning process lithography registration calibration equipment | |
| Bouchoms et al. | Advanced imaging with 1.35 NA immersion systems for volume production | |
| KR100263324B1 (en) | Check method for an overlay stitching | |
| CN117111398B (en) | Method and system for monitoring deviation of photomask manufacturing process | |
| US20240004309A1 (en) | A method of monitoring a lithographic process | |
| EP4191338A1 (en) | Metrology calibration method | |
| TWI614587B (en) | Alignment method, alignment system, and yellow light lithography process | |
| EP4030236A1 (en) | A method of monitoring a lithographic process and associated apparatuses | |
| CN109188855B (en) | Focal length monitoring photomask and method of photoetching machine | |
| KR100966998B1 (en) | Method for processing optical proximity correction | |
| JP4435002B2 (en) | Accuracy measurement pattern, display panel manufacturing method, and display device manufacturing method | |
| Reynolds | Preliminary evaluation of the KLA/Micrion 808 one step clear and opaque defect repair system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |