CN108754496A - A kind of preparation method of photovoltaic welding belt dyed layer - Google Patents
A kind of preparation method of photovoltaic welding belt dyed layer Download PDFInfo
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- CN108754496A CN108754496A CN201810647428.3A CN201810647428A CN108754496A CN 108754496 A CN108754496 A CN 108754496A CN 201810647428 A CN201810647428 A CN 201810647428A CN 108754496 A CN108754496 A CN 108754496A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
- C25F1/02—Pickling; Descaling
- C25F1/04—Pickling; Descaling in solution
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Physical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
Abstract
The present invention provides a kind of preparation methods of photovoltaic welding belt dyed layer, so that the color coordination of entire solar photovoltaic assembly is consistent, and avoid photovoltaic welding belt that discoloration occurs in the long-term use.Including step：A, copper-based welding matrix is pre-processed, including dust removal process, elimination electrostatic, alkaline electrolysis degreasing and activation process；Activation process refers to that the welding matrix after alkaline electrolysis is immersed in the HCl solution of a concentration of 20~25ml/Ld, and the time is 15~25S；B, pretreated welding matrix is submerged into electroplating bath and forms overlay coating；C, the welding matrix after electroplating processes is formed on its surface dyed layer under magnetron sputtering coater effect, specifically included：First, butt welding ribbon matrix is toasted at a temperature of 150~200 DEG C, then carries out Ion Cleaning and vacuum coloring.
Description
Technical field
The present invention relates to photovoltaic technology field, more particularly to a kind of preparation method of photovoltaic welding belt dyed layer.
Background technology
Welding is used in the welding material on photovoltaic module, main playing connection conduction, traditional photovoltaic module weldering
Band is copper tin plating material, is manufactured using hot dipping zinc technology.After traditional welding is applied to photovoltaic module, the natural color of scolding tin
It is uncoordinated with photovoltaic module cell piece and backboard color, affect the aesthetics of photovoltaic module.In addition, for the crystalline silicon sun
In the use of energy component, it is expected that a kind of color is presented in cell piece or even black box in the high building of certain appearance requirements, and
Silver color welding is there are reflective, such as the place such as special area such as airport expressway has apparent limitation to want component dazzle
It asks.
Invention content
The technical problem to be solved in the present invention is to provide a kind of preparation method of photovoltaic welding belt dyed layer, so that entirely too
The color coordination of positive energy photovoltaic module is consistent, and avoids photovoltaic welding belt that discoloration occurs in the long-term use.
In order to solve the above-mentioned technical problem, the technical solution used in the present invention is：
A kind of preparation method of photovoltaic welding belt dyed layer comprising step：
A, copper-based welding matrix is pre-processed, including at dust removal process, elimination electrostatic, alkaline electrolysis degreasing and activation
Reason.Wherein, alkaline electrolysis degreasing refers to that welding matrix is immersed in NaoH solution, a concentration of 150~250g/L, and electric current is close
Spend 0.1~0.15A/dm2Under, electrolysis time 25S, for removing the grease on its surface；Activation process refers to by alkaline electrolysis
Welding matrix afterwards is immersed in the HCl solution of a concentration of 20~25ml/Ld, and the time is 15~25S, removes the oxidation on its surface
Object.
B, pretreated welding matrix is submerged into electroplating bath and forms overlay coating；Welding matrix as cathode,
Under conditions of plating so that its surface forms coating；The current density of cathode is 0.1~0.15A/dm2, time control 15~
25min；
C, the welding matrix after electroplating processes is formed on its surface dyed layer under magnetron sputtering coater effect,
It specifically includes：
First, butt welding ribbon matrix is toasted at a temperature of 150~200 DEG C, then carries out Ion Cleaning and vacuum coloring.
Preferably, the inert gas used in magnetron sputtering coater is argon gas.
Preferably, the welding matrix after coloring is subjected to high-temperature water cleaning, water temperature is controlled at 50~70 DEG C.
Preferably, high-temperature gas baking will be carried out by the welding matrix of high-temperature water cleaning；The temperature of high-temperature gas controls
At 120~160 DEG C.
Preferably, the temperature control for the NaoH solution of degreasing, for the HCl solution except oxide is at 40~50 DEG C.
Preferably, the target using AgPbSn70-27 as magnetron sputtering.
Preferably, for welding matrix after electroplated metallization, vacuum colours the processing of process advance row hot setting.
Preferably, solidification temperature control is at 150~180 DEG C, and curing time control is in 15~20min.
Preferably, the single side thickness of coating is 10 μm~16 μm.
Preferably, dyed layer single side thickness control is at 5~12 μm.
The present invention uses above-mentioned technical proposal, has the following advantages that compared with prior art：
1, it is increased before alkaline electrolysis degreasing process and eliminates electrostatic process, so as to avoid welding matrix surface charge pair
The influence of electrolytic degreasing process and activation process.In addition, HCl solution concentration used in activation process is relatively low,
Correspondingly increase soak time.On the one hand, activation effect is improved, the binding force for enhancing welding matrix and coating provides
Good condition；On the other hand, copper ion dissolution is extended work by weakly acidic prepreg solution to a certain extent in itself solution
Change the service life of liquid.
2, welding matrix is formed on its surface dyed layer under magnetron sputtering coater effect, and deposition velocity is fast, and forming is equal
Even, the binding force of dyed layer is strong, device parameter condition can be easily changed by control dyed layer particle size and
The thickness of chromatograph, to effectively prepare the coloring photovoltaic welding belt of high quality.
3, discoloration does not occur in the long-term use for dyed layer.
Description of the drawings
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
Obtain other attached drawings according to these attached drawings.
Fig. 1 is flow diagram of the embodiment of the present invention.
Specific implementation mode
The preferred embodiments of the present invention will be described in detail below so that advantages and features of the invention be readily able to by
Those skilled in the art understand that.
A kind of preparation method of photovoltaic welding belt dyed layer of the present invention comprising following steps：A, to copper-based welding matrix
It is pre-processed, including dust removal process, elimination electrostatic, alkaline electrolysis degreasing and activation process.Wherein, alkaline electrolysis degreasing refers to
Welding matrix is immersed in NaoH solution, a concentration of 150~250g/L, 0.1~0.15A/dm of current density2Under, electrolysis
Time 25S, for removing the grease on its surface；It is a concentration of that activation process refers to that the welding matrix after alkaline electrolysis is immersed in
In the HCl solution of 20~25ml/Ld, the time is 15~25S, removes the oxide on its surface.Wherein, the NaoH for being used for degreasing is molten
Liquid, for the HCl solution except oxide temperature control at 40~50 DEG C；B, pretreated welding matrix is submerged into plating
Overlay coating is formed in slot；Welding matrix is as cathode, so that its surface forms coating under conditions of plating；The electric current of cathode
Density is 0.1~0.15A/dm2, time control is in 15~25min；The single side thickness control of coating is at 10 μm~16 μm；C, it welds
Ribbon matrix carries out hot setting processing after electroplated metallization.Solidification temperature is controlled at 150~180 DEG C, and curing time control is 15
~20min；D, the welding matrix after electroplating processes is formed on its surface dyed layer under magnetron sputtering coater effect,
It specifically includes：First, butt welding ribbon matrix is toasted at a temperature of 150~200 DEG C；It then carries out Ion Cleaning and vacuum
Color.Inert gas used in magnetron sputtering coater is argon gas；Target is AgPbSn70-27；Dyed layer single side thickness control is 5
~12 μm；E, the welding matrix after coloring is subjected to high-temperature water cleaning, water temperature is controlled at 50~70 DEG C；F, it is cleaned by high-temperature water
Welding matrix carry out high-temperature gas baking；The temperature of high-temperature gas is controlled at 120~160 DEG C.
The present invention increases before alkaline electrolysis degreasing process compared to traditional stains layer preparation method and eliminates electrostatic work
Sequence, the influence so as to avoid welding matrix surface charge to electrolytic degreasing process and activation process.In addition, activation process
Used HCl solution concentration is relatively low in process, correspondingly increases soak time.On the one hand, activation effect is improved, to increase
Fierce ribbon matrix and the binding force of coating provide good condition；On the other hand, weakly acidic prepreg solution exists copper ion dissolution
The service life of activating solution is extended in itself solution to a certain extent.The deposition velocity of dyed layer is fast, and forming is uniform, dyed layer
Binding force is strong, can be easily changed by device parameter condition to control the size of dyed layer particle and the thickness of dyed layer,
To effectively prepare the coloring photovoltaic welding belt of high quality.Discoloration does not occur in the long-term use for dyed layer.
The foregoing description of the disclosed embodiments enables those skilled in the art to implement or use the present invention.
Various modifications to these embodiments will be apparent to those skilled in the art, as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, of the invention
It is not intended to be limited to the embodiments shown herein, and is to fit to and the principles and novel features disclosed herein phase one
The widest range caused.
Claims (10)
1. a kind of preparation method of photovoltaic welding belt dyed layer, which is characterized in that including step：
A, the copper-based welding matrix is pre-processed, including dust removal process, elimination electrostatic, alkaline electrolysis and activation process；
Wherein, the electrolytic degreasing refers to that the welding matrix is immersed in NaoH solution, a concentration of 150~250g/L, electric current
0.1~0.15A/dm of density2Under, electrolysis time 25S, for removing the grease of the welding matrix surface；The activation process
Refer to that the welding matrix after alkaline electrolysis is immersed in the HCl solution of a concentration of 20~25ml/Ld, the time is 15~
25S removes the oxide of the welding matrix surface；
B, the pretreated welding matrix is submerged into electroplating bath and forms overlay coating；The welding matrix is as cloudy
Pole, so that its surface forms coating under conditions of plating；The current density of cathode is 0.1~0.15A/dm2, time control exists
15~25min；
C, the welding matrix after electroplating processes is formed on its surface dyed layer under magnetron sputtering coater effect,
It specifically includes：
First, the welding matrix is toasted at a temperature of 150~200 DEG C, then carries out Ion Cleaning and vacuum coloring.
2. the preparation method of photovoltaic welding belt dyed layer according to claim 1, which is characterized in that the magnetron sputtering plating
Inert gas used in machine is argon gas.
3. the preparation method of photovoltaic welding belt dyed layer according to claim 1, which is characterized in that by the weldering after coloring
Ribbon matrix carries out high-temperature water cleaning, and water temperature is controlled at 50~70 DEG C.
4. the preparation method of photovoltaic welding belt dyed layer according to claim 3, which is characterized in that high-temperature water will be passed through and cleaned
The welding matrix carry out high-temperature gas baking；The temperature of the high-temperature gas is controlled at 120~160 DEG C.
5. the preparation method of photovoltaic welding belt dyed layer according to claim 1, which is characterized in that the NaoH for degreasing is molten
Liquid, for the HCl solution except oxide temperature control at 40~50 DEG C.
6. the preparation method of photovoltaic welding belt dyed layer according to claim 1, which is characterized in that use AgPbSn70-27
Target as magnetron sputtering.
7. the preparation method of photovoltaic welding belt dyed layer according to claim 1, which is characterized in that the welding matrix is in electricity
After plating, vacuum colours the processing of process advance row hot setting.
8. the preparation method of photovoltaic welding belt dyed layer according to claim 7, which is characterized in that solidification temperature control exists
150~180 DEG C, curing time control is in 15~20min.
9. the preparation method of photovoltaic welding belt dyed layer according to claim 1, which is characterized in that the single side of the coating is thick
Degree is 10 μm~16 μm.
10. the preparation method of photovoltaic welding belt dyed layer according to claim 9, which is characterized in that the dyed layer single side
Thickness control is at 5~12 μm.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810647428.3A CN108754496A (en) | 2018-06-21 | 2018-06-21 | A kind of preparation method of photovoltaic welding belt dyed layer |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810647428.3A CN108754496A (en) | 2018-06-21 | 2018-06-21 | A kind of preparation method of photovoltaic welding belt dyed layer |
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| CN108754496A true CN108754496A (en) | 2018-11-06 |
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| CN201810647428.3A Pending CN108754496A (en) | 2018-06-21 | 2018-06-21 | A kind of preparation method of photovoltaic welding belt dyed layer |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111549364A (en) * | 2020-05-25 | 2020-08-18 | 太仓市华夏电镀有限公司 | Continuous plating production process and production equipment for steel strip |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111549364A (en) * | 2020-05-25 | 2020-08-18 | 太仓市华夏电镀有限公司 | Continuous plating production process and production equipment for steel strip |
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