CN108728008A - A kind of antireflective cold lamination film and preparation method thereof - Google Patents
A kind of antireflective cold lamination film and preparation method thereof Download PDFInfo
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- CN108728008A CN108728008A CN201810399434.1A CN201810399434A CN108728008A CN 108728008 A CN108728008 A CN 108728008A CN 201810399434 A CN201810399434 A CN 201810399434A CN 108728008 A CN108728008 A CN 108728008A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/50—Adhesives in the form of films or foils characterised by a primer layer between the carrier and the adhesive
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J143/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Adhesives based on derivatives of such polymers
- C09J143/02—Homopolymers or copolymers of monomers containing phosphorus
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- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/25—Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/255—Polyesters
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- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
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- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/12—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
- C09J2301/122—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present only on one side of the carrier, e.g. single-sided adhesive tape
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- C09J2400/00—Presence of inorganic and organic materials
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- C09J2400/16—Metal
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- C09J2467/006—Presence of polyester in the substrate
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Abstract
The invention discloses a kind of antireflective cold lamination films and preparation method thereof, include successively from top to bottom：Antireflection layer, transparent PET film layer, substratum transparent and white silicon paper layer；Wherein, antireflection layer is dense oxide hafnium layer and/or porous oxidation hafnium layer, and the thickness of dense oxide hafnium layer is 130-140nm；The thickness of porous oxidation hafnium layer is 88-92nm, and porosity is 76%-80%；Antireflective cold lamination film is prepared by the transparent PET film layer vacuum deposition hafnium oxide layer in cold lamination film, dazzle can be prevented and reduces picture or picture surface brightness, picture or photographic quality and clarity is greatly improved, enhances user experience and the effect of publicity；And above-mentioned preparation process is simple, and it is easy to operate, it is easy to large-scale production.
Description
Technical field
The invention belongs to field of material technology, are related to functional cold lamination film preparation field, and in particular to a kind of antireflective is cold
Mount film and preparation method thereof.
Background technology
Cold mounting is to use cold mounting technology in picture or photo overlying last layer cold lamination film, and cold lamination film is band toughness or magnetism
Plastic packaging film, be processed into through gum with transparent PVC, the protection of light film, mute film and special texture can be divided by the texture of film surface
Film is overlayed on the picture of description printing using the mounting of the equipment such as cold paperhanging machine, picture (printing surface) is avoided to be scratched, pollute or drench,
Play the role of protecting picture, can be used for wedding photo, poster poster, indoor panel advertisement, engineering and gardens design sketch, advertisement
Demonstration graph, commercially with civilian indoor decoration, business documentation cover, digital photograph album, greeting card, chart, the brochure of photographic quality, cross
Width, extension width etc..But through cold lamination film, treated that above-mentioned material is susceptible to dazzle etc. under sunlight, has seriously affected image
Quality and clarity, to influence spectators or user experience and the effect of publicity.
Antireflective film is by being covered on substrate, changing the original reflection process of incident light, and then be effectively reduced light
The reflex caused by refractive index difference between different medium in system, increases the transmissivity of light, and realization prevents dazzle
And the effect of surface brightness is reduced, to improve picture quality and clarity.Traditional antireflective film is in transparent or semitransparent base
One or more layers anti-reflection layer is deposited on bottom, by selection to anti-reflection membrane material and thickness control, keeps light farthest saturating
Substrate is crossed, is minimally reflected.Currently, in the prior art there are no with antireflective function cold lamination film correlative study and
Application report.
Invention content
The present inventor has found after numerous studies and experiment, by depositing anti-reflection in cold lamination film surface vacuum
Layer, may be implemented to prevent dazzle and reduces the good result of surface brightness.The purpose of the present invention is to provide a kind of antireflectives
Functional cold lamination film, while the preparation method of above-mentioned cold lamination film being also provided.
The above-mentioned purpose of the present invention is achieved through the following technical solutions：
A kind of antireflective cold lamination film includes successively from top to bottom：Antireflection layer, transparent PET film layer, substratum transparent and white silicon
Paper layer；Wherein, the antireflection layer is dense oxide hafnium layer and/or porous oxidation hafnium layer, and the thickness of the dense oxide hafnium layer
Degree is 130-140nm, and the thickness of the porous oxidation hafnium layer is 88-92nm, and porosity is 76%-80%.
Further, the thickness of the dense oxide hafnium layer is 133-137nm, and the thickness of the porous oxidation hafnium layer is
89-91nm, and porosity is 77%-79%.
Further, the thickness of the dense oxide hafnium layer is 135nm, and the thickness of the porous oxidation hafnium layer is
90nm, and porosity is 78%.
Further, the substratum transparent is according to mass percent meter, including following components：Acrylic monomers 18%-
22%, butyl acrylate 36%-40%, methyl methacrylate 16%-20%, neopelex 1%-5%, solidification
Agent 4%-6%, ammonium persulfate 2%-4%, surplus are polyvinyl alcohol.
Further, the substratum transparent is according to mass percent meter, including following components：Acrylic monomers 20%；
Butyl acrylate 38%；Methyl methacrylate 18%；Neopelex 3%；Curing agent 5%；Ammonium persulfate 3%,
Surplus is polyvinyl alcohol.
Further, the acrylic monomers is 2- ethyls (methacrylic acid acyloxymethyl) phosphonate ester, 2- ethyl (propylene
Acyloxymethyl) one or more of phosphonate ester and 2- ethyls (methacrylic acid acyloxymethyl) phosphate.
Further, the acrylic monomers is 2- ethyls (methacrylic acid acyloxymethyl) phosphate.
Further, the curing agent is the curing agent containing NCO group, in some preferred embodiments, using first
Phenylene diisocyanate (TDI) or methyl diphenylene diisocyanate (MDI).
The second aspect of the present invention is that the preparation method of above-mentioned antireflective cold lamination film specifically includes the following steps：
(1) antireflection film layer is prepared：Be fixed on electron beam evaporation deposition machine after transparent PET film is unreeled at room temperature can
On mobile sample stage, use hafnium oxide for target, it is 3 × 10 that above-mentioned electron beam evaporation deposition machine cavity room, which is evacuated to vacuum degree,-4-
5×10-4Pa, it is 0 ° first to adjust electron beam incident angle degree, in the transparent PET film surface deposition compact hafnium oxide layer；It adjusts again
Electron beam incident angle degree is 85 °, in dense oxide hafnium layer surface deposited porous hafnium oxide layer, is wound to obtain the final product；Wherein, described
The rotating speed of packaged type sample stage is 2-3rpm, deposition rate 0.40-0.45nm/s；
(2) transparent adhesive tape is prepared：The raw material of the substratum transparent is weighed according to said ratio and composition, is first 100- in temperature
The polyvinyl alcohol is fully melted at 120 DEG C, is then cooled to 75-85 DEG C, is added in addition to curing agent and ammonium persulfate
Each component is sufficiently mixed, then is gradually added into ammonium persulfate reaction 10-12h while stirring, and curing agent stirring is added after the completion of reaction
Uniformly, it cools down to obtain the final product；
(3) antireflective cold lamination film is prepared：Transparent adhesive tape described in step (2) is spread evenly across step after cable roll glues
(1) there is in the transparent PET film layer of the antireflection film layer deposition, be bonded, wound with the white silicon paper layer after drying in obtain the final product；
Specifically process is：It unreels, glue, dry, be bonded and wind；Wherein, spread is the transparent adhesive tape butt 18-25g/m2, apply
Cloth speed is 25-35m/min.
Further, spread described in step (3) is the transparent adhesive tape butt 20g/m2, coating speed 30m/min.
Compared with prior art, the beneficial effects of the present invention are：
One, there are no prevent the cold of glare effect by depositing anti-reflection layer realization in cold lamination film surface vacuum in the prior art
Mount film, antireflective cold lamination film of the invention can prevent dazzle, reduce picture or picture surface brightness, substantially increase picture or
Photographic quality and clarity, enhance user experience and the effect of publicity.
Two, the substratum transparent that the present invention is prepared using flame-retardant monomer, thus obtained antireflective cold lamination film have good
Flame retardant effect.
Three, preparation process of the present invention is simple, easy to operate, is easy to large-scale production, and at low cost, efficient.
Specific implementation mode
Present pre-ferred embodiments are given below with the technical solution that the present invention will be described in detail, but protection scope of the present invention
Be not limited to following embodiments, experimental method is conventional method unless otherwise specified in following embodiment, reagent and material without
Specified otherwise is commercially available.
Embodiment 1
It is fixed at room temperature on the packaged type sample stage of electron beam evaporation deposition machine after first transparent PET film is unreeled,
Use hafnium oxide for target, it is 3 × 10 that above-mentioned electron beam evaporation deposition machine cavity room, which is evacuated to vacuum degree,-4Pa first adjusts electron beam
Incident angle is 0 °, in above-mentioned transparent PET film surface deposition compact hafnium oxide layer；It is 85 ° to adjust electron beam incident angle degree again,
Above-mentioned dense oxide hafnium layer surface deposited porous hafnium oxide layer, winding；Wherein, the rotating speed of packaged type sample stage is 2rpm, is sunk
Product rate is 0.40nm/s.The raw material of substratum transparent is weighed according still further to proportioning and composition, specially：2- ethyl (methacrylic acids
Acyloxymethyl) phosphonate ester 18%, butyl acrylate 36%, methyl methacrylate 16%, neopelex 1%, first
Phenylene diisocyanate 6%, ammonium persulfate 2%, surplus are polyvinyl alcohol；It is at being first 100 DEG C in temperature that polyvinyl alcohol is fully molten
Change, be then cooled to 75 DEG C, each component in addition to toluene di-isocyanate(TDI) and ammonium persulfate is added and is sufficiently mixed, then side stirring
While being gradually added into ammonium persulfate reaction 10h, curing agent, which is added, after the completion of reaction stirs evenly, cooling transparent adhesive tape.It finally will be upper
Stating transparent adhesive tape and being spread evenly across above-mentioned deposition after cable roll glues has in the transparent PET film layer of antireflection film layer, after drying
It is bonded with white silicon paper layer, winds, obtain antireflective cold lamination film；Specifically process is：It unreels, glue, dry, be bonded and wind；Wherein,
Spread is transparent adhesive tape butt 18g/m2, coating speed 25m/min.
Embodiment 2
It is fixed at room temperature on the packaged type sample stage of electron beam evaporation deposition machine after first transparent PET film is unreeled,
Use hafnium oxide for target, it is 3 × 10 that above-mentioned electron beam evaporation deposition machine cavity room, which is evacuated to vacuum degree,-4Pa first adjusts electron beam
Incident angle is 0 °, in above-mentioned transparent PET film surface deposition compact hafnium oxide layer；It is 85 ° to adjust electron beam incident angle degree again,
Above-mentioned dense oxide hafnium layer surface deposited porous hafnium oxide layer, winding；Wherein, the rotating speed of packaged type sample stage is 2rpm, is sunk
Product rate is 0.40nm/s.The raw material of substratum transparent is weighed according still further to proportioning and composition, specially：2- ethyls (acryloyl-oxy first
Base) phosphonate ester 19%, butyl acrylate 37%, methyl methacrylate 17%, neopelex 2%, diphenylmethyl
Alkane diisocyanate 6%, ammonium persulfate 3%, surplus are polyvinyl alcohol；It is at being first 100 DEG C in temperature that polyvinyl alcohol is fully molten
Change, be then cooled to 75 DEG C, each component in addition to methyl diphenylene diisocyanate and ammonium persulfate is added and is sufficiently mixed, then
It is gradually added into ammonium persulfate reaction 10h while stirring, curing agent, which is added, after the completion of reaction stirs evenly, cooling transparent adhesive tape.Most
Above-mentioned transparent adhesive tape is spread evenly across above-mentioned deposition after cable roll glues afterwards has in the transparent PET film layer of antireflection film layer, warp
It is bonded with white silicon paper layer after drying, winds, obtain antireflective cold lamination film；Specifically process is：It unreels, glue, dry, be bonded and receive
Volume；Wherein, spread is transparent adhesive tape butt 19g/m2, coating speed 28m/min.
Embodiment 3
It is fixed at room temperature on the packaged type sample stage of electron beam evaporation deposition machine after first transparent PET film is unreeled,
Use hafnium oxide for target, it is 5 × 10 that above-mentioned electron beam evaporation deposition machine cavity room, which is evacuated to vacuum degree,-4Pa first adjusts electron beam
Incident angle is 0 °, in above-mentioned transparent PET film surface deposition compact hafnium oxide layer；It is 85 ° to adjust electron beam incident angle degree again,
Above-mentioned dense oxide hafnium layer surface deposited porous hafnium oxide layer, winding；Wherein, the rotating speed of packaged type sample stage is 3rpm, is sunk
Product rate is 0.45nm/s.The raw material of substratum transparent is weighed according still further to proportioning and composition, specially：2- ethyls (acryloyl-oxy first
Base) phosphonate ester and 2- ethyls (methacrylic acid acyloxymethyl) phosphate mixture 22%, butyl acrylate 40%, methyl-prop
E pioic acid methyl ester 20%, neopelex 5%, toluene di-isocyanate(TDI) 4%, ammonium persulfate 4%, surplus are polyethylene
Alcohol；Polyvinyl alcohol is fully melted at being first 120 DEG C in temperature, 85 DEG C is then cooled to, is added and removes curing agent and ammonium persulfate
Except each component be sufficiently mixed, then be gradually added into while stirring ammonium persulfate reaction 12h, reaction after the completion of be added curing agent stir
It mixes uniformly, cooling transparent adhesive tape.Above-mentioned transparent adhesive tape is finally spread evenly across above-mentioned deposition after cable roll glues antireflective
It in the transparent PET film layer of film layer, is bonded after drying with white silicon paper layer, winds, obtain antireflective cold lamination film；Specifically process is：It puts
Volume, gluing, drying, fitting and winding；Wherein, spread is transparent adhesive tape butt 25g/m2, coating speed 35m/min.
Embodiment 4
It is fixed at room temperature on the packaged type sample stage of electron beam evaporation deposition machine after first transparent PET film is unreeled,
Use hafnium oxide for target, it is 5 × 10 that above-mentioned electron beam evaporation deposition machine cavity room, which is evacuated to vacuum degree,-4Pa first adjusts electron beam
Incident angle is 0 °, in above-mentioned transparent PET film surface deposition compact hafnium oxide layer；It is 85 ° to adjust electron beam incident angle degree again,
Above-mentioned dense oxide hafnium layer surface deposited porous hafnium oxide layer, winding；Wherein, the rotating speed of packaged type sample stage is 3rpm, is sunk
Product rate is 0.45nm/s.The raw material of substratum transparent is weighed according still further to proportioning and composition, specially：2- ethyl (methacrylic acids
Acyloxymethyl) phosphonate ester, 2- ethyls (acryloyloxymethyl) phosphonate ester and 2- ethyls (methacrylic acid acyloxymethyl) phosphate
Mixture 21%, butyl acrylate 39%, methyl methacrylate 19%, neopelex 4%, diphenyl methane
Diisocyanate 4%, ammonium persulfate 4%, surplus are polyvinyl alcohol；Polyvinyl alcohol is fully melted at being first 120 DEG C in temperature,
Then 85 DEG C are cooled to, each component in addition to curing agent and ammonium persulfate is added and is sufficiently mixed, then is gradually added into while stirring
Ammonium persulfate reacts 12h, and curing agent, which is added, after the completion of reaction stirs evenly, cooling transparent adhesive tape.Finally above-mentioned transparent adhesive tape is passed through
Be spread evenly across above-mentioned deposition after cable roll gluing and have in the transparent PET film layer of antireflection film layer, after drying with white silicon paper layer
Fitting, winds to obtain cold lamination film；Specifically process is：It unreels, glue, dry, be bonded and wind；Wherein, spread is dry for transparent adhesive tape
Base 22g/m2, coating speed 32m/min.
Embodiment 5
It is fixed at room temperature on the packaged type sample stage of electron beam evaporation deposition machine after first transparent PET film is unreeled,
Use hafnium oxide for target, it is 3 × 10 that above-mentioned electron beam evaporation deposition machine cavity room, which is evacuated to vacuum degree,-4-5×10-4Pa is first adjusted
Whole electron beam incident angle degree is 0 °, in above-mentioned transparent PET film surface deposition compact hafnium oxide layer；Electron beam incident angle degree is adjusted again
It it is 85 °, in above-mentioned dense oxide hafnium layer surface deposited porous hafnium oxide layer, winding；Wherein, the rotating speed of packaged type sample stage is
2.5rpm, deposition rate 0.45nm/s.The raw material of substratum transparent is weighed according still further to proportioning and composition, specially：2- ethyl (first
Base acrylic acid acyloxymethyl) phosphate 20%；Butyl acrylate 38%；Methyl methacrylate 18%；Dodecyl benzene sulfonic acid
Sodium 3%；Toluene di-isocyanate(TDI) 5%；Ammonium persulfate 3%, surplus are polyvinyl alcohol；By polyethylene at being first 110 DEG C in temperature
Alcohol fully melts, and is then cooled to 80 DEG C, and each component in addition to curing agent and ammonium persulfate is added and is sufficiently mixed, then side stirring
While being gradually added into ammonium persulfate reaction 11h, curing agent, which is added, after the completion of reaction stirs evenly, cooling transparent adhesive tape.It finally will be upper
Stating transparent adhesive tape and being spread evenly across above-mentioned deposition after cable roll glues has in the transparent PET film layer of antireflection film layer, after drying
It is bonded with white silicon paper layer, winds, obtain antireflective cold lamination film；Specifically process is：It unreels, glue, dry, be bonded and wind；Wherein,
Spread is transparent adhesive tape butt 20g/m2, coating speed 30m/min.
Comparative example 1
It is essentially identical with the proportioning and preparation process of embodiment 5, the difference is that only being deposited in transparent PET film surface
Dense oxide hafnium layer.
Comparative example 2
It is essentially identical with the proportioning and preparation process of embodiment 5, the difference is that not heavy in transparent PET film surface
Product dense oxide hafnium layer.
Antireflective cold lamination film in embodiment 1-5 and comparative example 1 and 2 is subjected to reflectivity under the conditions of wavelength is 550nm
Test, the results are shown in Table 1.As can be seen that compared to the only cold lamination film of deposition compact hafnium oxide layer in comparative example 1, embodiment
The double-deck hafnium oxide layer of antireflective cold lamination film deposition in 1-5, wavelength are that the reflectivity under the conditions of 550nm is reduced to from 10.0%
2.5% or less；Compared to the common cold lamination film in comparative example 2, wavelength is that the reflectivity under the conditions of 550nm is reduced to from 14.5%
2.5% hereinafter, compared to the antireflective cold lamination film prepared under 5 preferable implementation condition of embodiment, and wavelength is anti-under the conditions of 550nm
It penetrates rate and is reduced to 1.6% from 14.5%；It can be seen that the antireflective cold lamination film of the present invention makes light farthest penetrate substrate, it is minimum
It is reflected to degree, anti-reflective effect is good；It can prevent dazzle, reduce picture or picture surface brightness, substantially increase picture
Or photographic quality and clarity, user experience and the effect of publicity are enhanced, and preparation process is simple, it is easy to operate, it is easy to scale
Metaplasia is produced, efficient.
According to UL-94 standards to the cold lamination film in the anti-reflection antireflective cold lamination film and comparative example 1 and 2 in embodiment 1-5 into
Row anti-flammability is tested, and discovery is V-0 grades, it is seen for preparing the thus obtained cold lamination film of substratum transparent with good using flame-retardant monomer
Good flame retardant effect.
Table 1
The above is presently preferred embodiments of the present invention, but the present invention should not be limited to disclosed in the embodiment
Content.So every do not depart from the lower equivalent or modification completed of spirit disclosed in this invention, the model that the present invention protects is both fallen within
It encloses.
Claims (10)
1. a kind of antireflective cold lamination film, which is characterized in that include successively from top to bottom：It is antireflection layer, transparent PET film layer, transparent
Glue-line and white silicon paper layer；Wherein, the antireflection layer is dense oxide hafnium layer and/or porous oxidation hafnium layer, and the fine and close oxygen
The thickness for changing hafnium layer is 130-140nm；The thickness of the porous oxidation hafnium layer is 88-92nm, and porosity is 76%-80%.
2. antireflective cold lamination film as described in claim 1, which is characterized in that the thickness of the dense oxide hafnium layer is 133-
137nm；The thickness of the porous oxidation hafnium layer is 89-91nm, and porosity is 77%-79%.
3. antireflective cold lamination film as claimed in claim 1 or 2, which is characterized in that the thickness of the dense oxide hafnium layer is
135nm；The thickness of the porous oxidation hafnium layer is 90nm, and porosity is 78%.
4. antireflective cold lamination film as described in claim 1, which is characterized in that the substratum transparent is according to mass percent meter, packet
Include following components：Acrylic monomers 18%-22%, butyl acrylate 36%-40%, methyl methacrylate 16%-20%, ten
Dialkyl benzene sulfonic acids sodium 1%-5%, curing agent 4%-6%, ammonium persulfate 2%-4%, surplus is polyvinyl alcohol.
5. the antireflective cold lamination film as described in claim 1 or 4, which is characterized in that the substratum transparent according to mass percent meter,
Including following components：Acrylic monomers 20%；Butyl acrylate 38%；Methyl methacrylate 18%；Dodecyl benzene sulfonic acid
Sodium 3%；Curing agent 5%；Ammonium persulfate 3%, surplus are polyvinyl alcohol.
6. antireflective cold lamination film as described in claim 1, which is characterized in that the acrylic monomers is 2- ethyl (metering systems
Sour acyloxymethyl) phosphonate ester, 2- ethyls (acryloyloxymethyl) phosphonate ester and 2- ethyls (methacrylic acid acyloxymethyl) phosphoric acid
One or more of ester.
7. antireflective cold lamination film as claimed in claim 6, which is characterized in that the acrylic monomers is 2- ethyl (metering systems
Sour acyloxymethyl) phosphate.
8. antireflective cold lamination film as described in claim 1, which is characterized in that the curing agent is the curing agent containing NCO group, packet
Include toluene di-isocyanate(TDI) and/or methyl diphenylene diisocyanate.
9. the preparation method of antireflective cold lamination film as described in claim any one of 1-8, which is characterized in that include the following steps：
(1) antireflection film layer is prepared：The removable of electron beam evaporation deposition machine is fixed on after transparent PET film is unreeled at room temperature
In style sample platform, use hafnium oxide for target, it is 3 × 10 that above-mentioned electron beam evaporation deposition machine cavity room, which is evacuated to vacuum degree,-4-5×
10-4Pa, it is 0 ° first to adjust electron beam incident angle degree, in the transparent PET film surface deposition compact hafnium oxide layer；Electronics is adjusted again
Beam incident angle is 85 °, in dense oxide hafnium layer surface deposited porous hafnium oxide layer, is wound to obtain the final product；Wherein, described removable
The rotating speed of dynamic formula sample stage is 2-3rpm, deposition rate 0.40-0.45nm/s；
(2) transparent adhesive tape is prepared：The raw material of the substratum transparent is weighed according to said ratio and composition, is first 100-120 in temperature
The polyvinyl alcohol is fully melted at DEG C, is then cooled to 75-85 DEG C, each group in addition to curing agent and ammonium persulfate is added
Dividing and be sufficiently mixed, then is gradually added into ammonium persulfate reaction 10-12h while stirring, curing agent, which is added, after the completion of reaction stirs evenly,
Cooling to obtain the final product；
(3) antireflective cold lamination film is prepared：Transparent adhesive tape described in step (2) is spread evenly across step (1) after cable roll glues
Middle deposition has in the transparent PET film layer of the antireflection film layer, is bonded after drying with the white silicon paper layer, and winding obtains anti-reflection
Penetrate cold lamination film；Specifically process is：It unreels, glue, dry, be bonded and wind；Wherein, spread is the transparent adhesive tape butt 18-
25g/m2, coating speed 25-35m/min.
10. the preparation method of antireflective cold lamination film as claimed in claim 9, which is characterized in that in step (3), the spread
For the transparent adhesive tape butt 20g/m2, the coating speed is 30m/min.
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