CN108716952B - Three-dimensional integrated flow path system for atomic fluorescence - Google Patents
Three-dimensional integrated flow path system for atomic fluorescence Download PDFInfo
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- CN108716952B CN108716952B CN201810512611.2A CN201810512611A CN108716952B CN 108716952 B CN108716952 B CN 108716952B CN 201810512611 A CN201810512611 A CN 201810512611A CN 108716952 B CN108716952 B CN 108716952B
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- 238000002955 isolation Methods 0.000 claims abstract description 110
- 238000010146 3D printing Methods 0.000 claims abstract description 12
- 230000007704 transition Effects 0.000 claims abstract description 12
- 239000007787 solid Substances 0.000 claims abstract description 4
- 238000004140 cleaning Methods 0.000 claims description 93
- 239000003638 chemical reducing agent Substances 0.000 claims description 77
- 238000003860 storage Methods 0.000 claims description 49
- 239000007788 liquid Substances 0.000 claims description 46
- 239000012530 fluid Substances 0.000 claims description 39
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 6
- 238000007639 printing Methods 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 11
- 238000005516 engineering process Methods 0.000 abstract description 9
- 238000002347 injection Methods 0.000 abstract description 5
- 239000007924 injection Substances 0.000 abstract description 5
- 239000000654 additive Substances 0.000 abstract description 2
- 230000000996 additive effect Effects 0.000 abstract description 2
- 230000010354 integration Effects 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 15
- 238000013461 design Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 150000004678 hydrides Chemical class 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000001675 atomic spectrum Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
- G01J3/4406—Fluorescence spectrometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0202—Mechanical elements; Supports for optical elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Abstract
The invention relates to a three-dimensional integrated flow path system for atomic fluorescence, which is manufactured into an integrated flow path module by 3D printing, wherein the integrated flow path module sequentially comprises a cover layer, a pipeline layer, an upper interface layer, a lower interface layer, a transition layer and a medium isolation valve interface layer from top to bottom, the cover layer is of a solid structure, and pipeline connection perpendicular to a layer surface is adopted among the pipeline layer, the upper interface layer, the lower interface layer, the transition layer and the medium isolation valve interface layer. The invention adopts 3D printing additive manufacturing technology to realize the flow path, interface and functional layout from the fifth layer to the first layer from bottom to top, realizes the high integration and conciseness of the flow path of the steam generation sample injection system, and has the advantages of simple manufacture, low cost, easy popularization and application, and the like.
Description
Technical Field
The invention belongs to the technical field of analysis of atomic spectrum analysis instruments, and particularly relates to a three-dimensional integrated flow path system for atomic fluorescence.
Background
The vapor generation sample injection technology has the advantages of high sample injection efficiency, strong sample matrix removing capability and the like, and is widely applied to atomic spectrum analysis instruments such as atomic fluorescence, atomic absorption, inductively coupled plasma emission spectrum and the like.
The essence of the vapor generation sampling technology is that in the chemical reaction process of reducing ions of elements to be detected into gaseous substances on line, the intervention of various reagents and complicated flow path switching are needed, so that the problems of messy pipelines, multiple interfaces, complex flow path structures, solution leakage and the like exist in the aspects of pipeline connection and flow path design, and the problems are always solved in the actual maintenance and use.
Patent application 200610047093.9 and 200620091830.0 propose a plate hydride generator in an attempt to solve the above-mentioned problems. The device in the hydride generator is carved and installed on a high polymer substrate, pipelines are carved on the substrate to connect the devices, so that the devices form the hydride generator, and finally, the devices are adhered and sealed on the substrate by a sealing cover plate made of the same material.
Due to the limitation of the traditional machining means, the plate-type hydride generator can only realize sealing in a layer-by-layer bonding mode, and has the advantages of high machining difficulty and complex operation. The design of the pipeline flow channel can not realize the circular channel required by ideal fluid, and the design and mass production of the multi-layer three-dimensional complex flow channel are also limited.
Disclosure of Invention
The invention aims to solve the problems that the traditional technology is high in processing difficulty and complex in operation, a circular channel required by ideal fluid cannot be realized on the pipeline runner design, and limitation on multi-layer three-dimensional complex flow path design and mass production use is realized, and the like, and provides a three-dimensional integrated flow path system which is simple to manufacture, high in processing precision, low in cost and easy to manufacture.
The invention provides a three-dimensional integrated flow path system for atomic fluorescence, which is manufactured into an integrated flow path module by 3D printing, wherein the integrated flow path module sequentially comprises a cover layer, a pipeline layer, an upper interface layer, a lower interface layer, a transition layer and a medium isolation valve interface layer from top to bottom, the cover layer is of a solid structure, and pipeline connection perpendicular to the layers is adopted among the pipeline layer, the upper interface layer, the lower interface layer, the transition layer and the medium isolation valve interface layer.
Further, the pipeline layer comprises a first cleaning liquid interface, a cleaning liquid pipeline, a second cleaning liquid interface, a first sample storage ring interface, a sample storage ring and a second sample storage ring interface;
the upper and lower interface layers comprise a third cleaning liquid interface, a first reducing agent interface, a first sample interface, a first current carrying interface, a reducing agent pump interface, a cleaning pump interface, a sample pump interface, a gas-liquid separator interface, a fourth cleaning liquid interface, a third sample storage ring interface, a second sample interface, a second current carrying interface, a second reducing agent interface, a third reducing agent interface, a fourth reducing agent interface, a fifth cleaning liquid interface, a sixth cleaning liquid interface, a mixing port, a third sample storage ring interface, a fourth sample storage ring interface, a fifth sample storage ring interface, a sixth sample storage ring interface, a seventh sample storage ring interface, an eighth sample storage ring interface and a ninth sample storage ring interface;
the transition layer comprises a tenth sample storage ring interface, a third sample interface, a third carrier flow interface, a fifth reducing agent interface, a sixth reducing agent interface, a seventh cleaning liquid interface, an eighth cleaning liquid interface, a first gas inlet, an eleventh sample storage ring interface, a twelfth sample storage ring interface, a thirteenth sample storage ring interface, a fourteenth sample storage ring interface, a fifteenth sample storage ring interface and a sixteenth sample storage ring interface;
the medium isolation valve interface layer comprises a first medium isolation valve first port, a first medium isolation valve second port, a first medium isolation valve third port, a second medium isolation valve first port, a second medium isolation valve second port, a second medium isolation valve third port, a third medium isolation valve first port, a third medium isolation valve second port, a second gas inlet, a fourth medium isolation valve first port, a fourth medium isolation valve second port, a fourth medium isolation valve third port, a fifth medium isolation valve first port, a fifth medium isolation valve second port and a fifth medium isolation valve third port;
the third cleaning fluid interface, the fourth cleaning fluid interface, the first cleaning fluid interface, the cleaning fluid pipeline, the second cleaning fluid interface, the fifth cleaning fluid interface, the sixth cleaning fluid interface and the cleaning pump interface are sequentially connected, the sixth cleaning fluid interface is connected with the mixing port, the first port of the third medium isolation valve is sequentially connected with the seventh cleaning fluid interface and the sixth cleaning fluid interface from bottom to top, and the second port of the third medium isolation valve is sequentially connected with the eighth cleaning fluid interface and the fifth cleaning fluid interface from bottom to top to form a flow path system of cleaning fluid;
the first reducing agent interface, the second reducing agent interface, the third reducing agent interface, the fourth reducing agent interface, the fifth reducing agent interface, the sixth reducing agent interface, the seventh reducing agent interface and the reducing agent pump interface are sequentially connected, the fourth reducing agent interface is connected with the mixing port, the first port of the second medium isolation valve is connected with the fifth reducing agent interface from bottom to top, the second port of the second medium isolation valve is connected with the sixth reducing agent interface from bottom to top, and the third port of the second medium isolation valve is connected with the seventh reducing agent interface from bottom to top to form a flow path system of the reducing agent;
the second gas inlet is sequentially connected with the first gas inlet and the mixing port from bottom to top to form a gas flow path system;
the first sample interface is connected with the second sample interface, the first current carrying interface is connected with the second current carrying interface, the third sample ring interface, the first sample ring interface, the sample ring, the second sample ring interface, the ninth sample ring interface and the sixth sample ring interface are sequentially connected, the seventh sample ring interface is connected with the sample pump interface, the third sample ring interface is connected with the mixing port, the first medium isolation valve first port is connected with the tenth sample ring interface from bottom to top, the first medium isolation valve second port is connected with the third sample interface from bottom to top, the fourth medium isolation valve first port is connected with the eleventh sample ring interface, the fourth medium isolation valve second port is connected with the twelfth sample ring interface, the fourth medium isolation valve third port is connected with the thirteenth sample ring interface, the fourth medium isolation valve second port is connected with the thirteenth sample ring interface, the fifth medium isolation valve second port is connected with the thirteenth sample ring interface, the fourth medium isolation valve second port is connected with the thirteenth sample ring interface, and the sample isolation valve is connected with the fifteenth sample ring interface;
the fourth reducing agent interface, the third sample storage ring interface, the first gas inlet and the sixth cleaning liquid interface are converged at the mixing port, and two ends of the reaction ring are respectively connected with the mixing port and the gas-liquid separator interface to form a steam generation and cleaning flow path system.
Further, the material used for the 3D printing is a photosensitive cured resin.
Further, the 3D printing method includes:
the photosensitive cured resin is used as a printing material to be piled layer by layer from bottom to top, and the minimum printing precision is 0.01mm.
Further, the inner diameter of the sample storage ring is 0.1-3 mm, and the length is 0.5-5 m.
Further, the inner diameter of the interface is 0.1-3 mm.
Further, the maximum dimension of the integrated flow path module is 200mm long, 200mm wide and 100mm high.
By means of the scheme, the three-dimensional integrated flow path system for atomic fluorescence uses the photosensitive cured resin with transparent apparent state after curing as a material, and the 3D printing technology is used for processing the three-dimensional integrated flow path module for the vapor generation sample injection technology, so that the problems of the traditional processing means are effectively solved, and the three-dimensional integrated flow path system for atomic fluorescence has the advantages of being simple in manufacturing, capable of realizing large-scale automatic mass production and the like, and has better application value.
The foregoing description is only an overview of the present invention, and is intended to provide a better understanding of the present invention, as it is embodied in the following description, with reference to the preferred embodiments of the present invention and the accompanying drawings.
Drawings
FIG. 1 is a schematic view of a three-dimensional integrated flow system coating for atomic fluorescence according to the present invention;
FIG. 2 is a schematic diagram of a three-dimensional integrated flow path system for atomic fluorescence according to the present invention;
FIG. 3 is a schematic diagram of the structure of the upper and lower interface layers of a three-dimensional integrated flow path system for atomic fluorescence according to the present invention;
FIG. 4 is a schematic structural diagram of a three-dimensional integrated flow path system transition layer for atomic fluorescence according to the present invention;
FIG. 5 is a schematic structural diagram of a three-dimensional integrated flow path system medium isolation valve interface layer for atomic fluorescence according to the present invention.
Reference numerals in the drawings:
1-a cover layer;
2-a pipeline layer;
211-a first cleaning fluid interface; 212-a cleaning liquid pipeline; 213-a second cleaning fluid interface;
221-a first sample loop interface; 222-a sample storage ring; 223-a second sample loop interface;
3-upper and lower interface layers;
311-a third cleaning fluid interface; 312-a first reductant interface; 313-first sample interface; 314—a first current carrying interface; 315-reductant pump interface; 316-a wash pump interface; 317—sample pump interface; 318-gas-liquid separator interface;
321-fourth cleaning liquid interface;
331-a third sample ring interface; 332-a second sample interface; 333-second current carrying interface;
341-a second reductant interface; 342-a third reductant interface; 343-fourth reductant interface;
351-a fifth cleaning fluid interface; 352-sixth cleaning solution interface;
361-mixing port;
371-third sample ring interface; 372-fourth sample ring interface; 373-fifth sample ring interface;
381-a sixth sample ring interface; 382-seventh sample ring interface; 383-eighth sample ring interface; 384-ninth sample ring interface;
391-a reaction ring;
4-a transition layer;
411-tenth sample ring interface; 412-a third sample interface; 413-a third carrier flow interface;
421-fifth reductant interface; 422-sixth reductant interface; 423-seventh reductant interface;
431-seventh cleaning fluid interface; 432-eighth cleaning solution interface;
441-a first gas inlet;
451-eleventh sample ring interface; 452-twelfth sample ring interface; 453-thirteenth sample ring interface;
461-fourteenth sample ring interface; 462-fifteenth sample ring interface; 463-sixteenth sample ring interface 16;
5-a media isolation valve interface layer;
511-a first media isolation valve first port; 512-first media isolation valve second port; 513-a first media isolation valve third port;
521-second media isolation valve first port; 522-a second media isolation valve second port; 523-a second media isolation valve third port;
531-third media isolation valve first port; 532—a third media isolation valve second port;
541-a second gas inlet;
551-fourth media isolation valve first port; 552-a fourth media isolation valve second port; 553-media isolation valve 4 port 3;
561-fifth media isolation valve first port; 562-fifth media isolation valve second port 2; 563-fifth media isolation valve third port.
Detailed Description
The following describes in further detail the embodiments of the present invention with reference to the drawings and examples. The following examples are illustrative of the invention and are not intended to limit the scope of the invention.
As shown in fig. 1 to 5, the present embodiment provides a three-dimensional integrated flow path system for atomic fluorescence, which is manufactured into an integrated flow path module by 3D printing, and is divided into five layers from top to bottom in principle from the flow path, namely, a cover layer 1, a pipeline layer 2, an upper interface layer 3, a lower interface layer 3, a transition layer 4 and a medium isolation valve interface layer 5, wherein the layers are connected by adopting pipelines perpendicular to the layers.
The first layer is a cover layer 1, is a solid part and mainly plays a supporting role.
The second layer is a pipeline layer 2 and comprises a first cleaning solution interface 211, a cleaning solution pipeline 212, a cleaning solution port 213, a first sample storage ring interface 221, a sample storage ring 222 and a second sample storage ring interface 223.
The third layer is an upper and lower interface layer 3, and includes a third cleaning solution interface 311, a first reducing agent interface 312, a first sample interface 313, a first current carrying interface 314, a reducing agent pump interface 315, a cleaning pump interface 316, a sample pump interface 317, a gas-liquid separator interface 318, a fourth cleaning solution interface 321, a third sample ring interface 331, a second sample interface 332, a second current carrying interface 333, a second reducing agent interface 341, a third reducing agent interface 342, a fourth reducing agent interface 343, a fifth cleaning solution interface 351, a sixth cleaning solution interface 352, a mixing port 361, a third sample ring interface 371, a fourth sample ring interface 372, a fifth sample ring interface 373, a sixth sample ring interface 381, a seventh sample ring interface 382, an eighth sample ring interface 383, and a ninth sample ring interface 384.
The fourth layer is a transition layer 4, including tenth sample ring interface 411, third sample interface 412, third carrier flow interface 413, fifth reductant interface 421, sixth reductant interface 422, seventh reductant interface 423, seventh cleaning fluid interface 431, eighth cleaning fluid interface 432, first gas inlet 441, eleventh sample ring interface 451, twelfth sample ring interface 452, thirteenth sample ring interface 453, fourteenth sample ring interface 461, fifteenth sample ring interface 462, sixteenth sample ring interface 463.
The fifth layer is the bottom media isolation valve interface layer 5, comprising a first media isolation valve first port 511, a first media isolation valve second port 512, a first media isolation valve third port 513, a second media isolation valve first port 521, a second media isolation valve second port 522, a second media isolation valve third port 523, a third media isolation valve first port 531, a third media isolation valve second port 532, a second gas inlet 541, a fourth media isolation valve first port 551, a fourth media isolation valve second port 552, a fourth media isolation valve third port 553, a fifth media isolation valve first port 561, a fifth media isolation valve second port 562, a fifth media isolation valve third port 563.
The three-dimensional integrated flow path module includes a sample flow path, a current carrying flow path, a reducing agent flow path, and a cleaning fluid flow path.
The third cleaning liquid interface 311, the fourth cleaning liquid interface 321, the first cleaning liquid interface 211, the cleaning liquid pipeline 212, the second cleaning liquid interface 213, the fifth cleaning liquid interface 351, the sixth cleaning liquid interface 352, and the cleaning pump interface 316 are connected in order. The sixth cleaning fluid interface 352 is connected to the mixing port 361. The third medium isolation valve first port 531 at the bottom of the three-dimensional integrated flow path module is sequentially connected with the seventh cleaning solution port 431 and the sixth cleaning solution port 352 from bottom to top, and the third medium isolation valve second port 532 is sequentially connected with the eighth cleaning solution port 432 and the fifth cleaning solution port 351 from bottom to top, so that a flow path system of the cleaning solution is constructed.
The first reducing agent interface 312, the second reducing agent interface 341, the third reducing agent interface 342, the fourth reducing agent interface 343, the fifth reducing agent interface 421, the sixth reducing agent interface 422, the seventh reducing agent interface 423, and the reducing agent pump interface 315 are connected in this order. The fourth reductant interface 343 is coupled to the mixing port 361. The first port 521 of the second medium isolation valve at the bottom of the three-dimensional integrated flow path module is connected with the fifth reducing agent interface 421 from bottom to top, the second port 522 of the second medium isolation valve is connected with the sixth reducing agent interface 422 from bottom to top, the third port 523 of the second medium isolation valve is connected with the seventh reducing agent interface 423 from bottom to top, and a flow path system of the reducing agent is constructed.
The second gas inlet 541 is connected to the first gas inlet 441 and the mixing port 361 in this order from bottom to top, and a gas flow path system is constructed.
The first sample interface 313 is connected to the second sample interface 332. The first current carrying interface 314 is connected to the second current carrying interface 333. The third sample ring interface 331, the first sample ring interface 221, the sample ring 222, the second sample ring interface 223, the ninth sample ring interface 384, and the sixth sample ring interface 381 are connected in this order. The seventh sample ring interface 382 is connected to the sample pump interface 317. The third sample ring interface 371 is connected to the mixing port 361. The first medium isolation valve first port 511 at the bottom of the three-dimensional integrated flow path module is connected with the tenth sample storage ring interface 411 from bottom to top, the first medium isolation valve second port 512 is connected with the third sample interface 412 from bottom to top, and the first medium isolation valve third port 513 is connected with the third carrier flow interface 413 from bottom to top. The fourth media isolation valve first port 551 is coupled to the eleventh stock ring interface 451, the fourth media isolation valve second port 552 is coupled to the twelfth stock ring interface 452, and the fourth media isolation valve third port 553 is coupled to the thirteenth stock ring interface 453. The fifth media isolation valve first port 561 is coupled to the fourteenth sample ring interface 461, the fifth media isolation valve second port 562 is coupled to the fifteenth sample ring interface 462, the fifth media isolation valve third port 563 is coupled to the sixteenth sample ring interface 463. The above connection builds up the sample and current carrying flow path system.
The fourth reductant interface 343, the third sample storage ring interface 371, the first gas inlet 441, and the sixth cleaning liquid interface 352 converge at the mixing port 361, and two ends of the reaction ring 391 are respectively connected with the mixing port 361 and the gas-liquid separator interface 318 to form a vapor generation and cleaning flow path system.
The three-dimensional integrated flow path module is manufactured by 3D printing of light-sensitive cured resin with transparent apparent state after curing, the printing mode is stacked layer by layer from bottom to top, and the minimum printing precision is 0.01mm.
In this example, the inner diameter of the sample storage ring is 0.1 to 3mm and the length is 0.5 to 5m.
In this embodiment, the inner diameter of the interface is 0.1-3 mm.
In this embodiment, the maximum size of the integrated flow path module is 200 (L) ×200 (W) ×100 (H) mm.
The working process of the three-dimensional integrated flow path module for the vapor generation sampling technology is exemplified as follows:
(1) During the vapor generation reaction, the reducing agent flows from the fourth reducing agent interface 343, the sample and current carrying agent flows from the third sample storage ring interface 371, and the gas flows from the first gas inlet 441, is converged at the mixing port 361, enters the reaction ring 391, and finally enters the gas-liquid separator through the gas-liquid separator interface 318.
(2) During cleaning, the cleaning fluid is collected in the mixing port 361 from the sixth cleaning fluid port 352 and the gas from the first gas inlet 441, enters the reaction ring 391, and finally enters the gas-liquid separator through the gas-liquid separator port 318.
The invention uses the additive manufacturing technology of 3D printing, realizes the high integration of the flow path module for the vapor generation sample injection technology, has simpler manufacturing mode, low cost and large degree of freedom of design compared with the traditional manufacturing mode, and has better popularization and use values. The method is applicable to the field of vapor generation sampling systems of atomic fluorescence and atomic absorption, and is applicable to detection of trace heavy metal elements such as arsenic, mercury and the like.
The above description is only of the preferred embodiments of the present invention and is not intended to limit the present invention, and it should be noted that it is possible for those skilled in the art to make several improvements and modifications without departing from the technical principle of the present invention, and these improvements and modifications should also be regarded as the protection scope of the present invention.
Claims (6)
1. The three-dimensional integrated flow path system for atomic fluorescence is characterized in that an integrated flow path module is manufactured by 3D printing, the integrated flow path module sequentially comprises a cover layer, a pipeline layer, an upper interface layer, a lower interface layer, a transition layer and a medium isolation valve interface layer from top to bottom, the cover layer is of a solid structure, and pipeline connection perpendicular to the layers is adopted among the pipeline layer, the upper interface layer, the lower interface layer, the transition layer and the medium isolation valve interface layer;
the pipeline layer comprises a first cleaning liquid interface, a cleaning liquid pipeline, a second cleaning liquid interface, a first sample storage ring interface, a sample storage ring and a second sample storage ring interface;
the upper and lower interface layers comprise a third cleaning liquid interface, a first reducing agent interface, a first sample interface, a first current carrying interface, a reducing agent pump interface, a cleaning pump interface, a sample pump interface, a gas-liquid separator interface, a fourth cleaning liquid interface, a third sample storage ring interface, a second sample interface, a second current carrying interface, a second reducing agent interface, a third reducing agent interface, a fourth reducing agent interface, a fifth cleaning liquid interface, a sixth cleaning liquid interface, a mixing port, a third sample storage ring interface, a fourth sample storage ring interface, a fifth sample storage ring interface, a sixth sample storage ring interface, a seventh sample storage ring interface, an eighth sample storage ring interface and a ninth sample storage ring interface;
the transition layer comprises a tenth sample storage ring interface, a third sample interface, a third carrier flow interface, a fifth reducing agent interface, a sixth reducing agent interface, a seventh cleaning liquid interface, an eighth cleaning liquid interface, a first gas inlet, an eleventh sample storage ring interface, a twelfth sample storage ring interface, a thirteenth sample storage ring interface, a fourteenth sample storage ring interface, a fifteenth sample storage ring interface and a sixteenth sample storage ring interface;
the medium isolation valve interface layer comprises a first medium isolation valve first port, a first medium isolation valve second port, a first medium isolation valve third port, a second medium isolation valve first port, a second medium isolation valve second port, a second medium isolation valve third port, a third medium isolation valve first port, a third medium isolation valve second port, a second gas inlet, a fourth medium isolation valve first port, a fourth medium isolation valve second port, a fourth medium isolation valve third port, a fifth medium isolation valve first port, a fifth medium isolation valve second port and a fifth medium isolation valve third port;
the third cleaning fluid interface, the fourth cleaning fluid interface, the first cleaning fluid interface, the cleaning fluid pipeline, the second cleaning fluid interface, the fifth cleaning fluid interface, the sixth cleaning fluid interface and the cleaning pump interface are sequentially connected, the sixth cleaning fluid interface is connected with the mixing port, the first port of the third medium isolation valve is sequentially connected with the seventh cleaning fluid interface and the sixth cleaning fluid interface from bottom to top, and the second port of the third medium isolation valve is sequentially connected with the eighth cleaning fluid interface and the fifth cleaning fluid interface from bottom to top to form a flow path system of cleaning fluid;
the first reducing agent interface, the second reducing agent interface, the third reducing agent interface, the fourth reducing agent interface, the fifth reducing agent interface, the sixth reducing agent interface, the seventh reducing agent interface and the reducing agent pump interface are sequentially connected, the fourth reducing agent interface is connected with the mixing port, the first port of the second medium isolation valve is connected with the fifth reducing agent interface from bottom to top, the second port of the second medium isolation valve is connected with the sixth reducing agent interface from bottom to top, and the third port of the second medium isolation valve is connected with the seventh reducing agent interface from bottom to top to form a flow path system of the reducing agent;
the second gas inlet is sequentially connected with the first gas inlet and the mixing port from bottom to top to form a gas flow path system;
the first sample interface is connected with the second sample interface, the first current carrying interface is connected with the second current carrying interface, the third sample ring interface, the first sample ring interface, the sample ring, the second sample ring interface, the ninth sample ring interface and the sixth sample ring interface are sequentially connected, the seventh sample ring interface is connected with the sample pump interface, the third sample ring interface is connected with the mixing port, the first medium isolation valve first port is connected with the tenth sample ring interface from bottom to top, the first medium isolation valve second port is connected with the third sample interface from bottom to top, the fourth medium isolation valve first port is connected with the eleventh sample ring interface, the fourth medium isolation valve second port is connected with the twelfth sample ring interface, the fourth medium isolation valve third port is connected with the thirteenth sample ring interface, the fourth medium isolation valve second port is connected with the thirteenth sample ring interface, the fifth medium isolation valve second port is connected with the thirteenth sample ring interface, the fourth medium isolation valve second port is connected with the thirteenth sample ring interface, and the sample isolation valve is connected with the fifteenth sample ring interface;
the fourth reducing agent interface, the third sample storage ring interface and the first gas inlet are converged at the mixing port, and two ends of the reaction ring are respectively connected with the mixing port and the gas-liquid separator interface to form a steam generation and cleaning flow path system;
when vapor reacts, the reducing agent is converged at the mixing port from the fourth reducing agent port, the sample and current carrying port from the third sample storage ring port and the gas from the first gas inlet, enters the reaction ring, and finally enters the gas-liquid separator through the gas-liquid separator port;
during cleaning, the cleaning liquid is converged at the mixing port from the sixth cleaning liquid port and the gas from the first gas inlet, enters the reaction ring, and finally enters the gas-liquid separator through the gas-liquid separator port.
2. A three-dimensional integrated flow path system for atomic fluorescence according to claim 1, wherein the material used for the 3D printing is a photosensitive cured resin.
3. A three-dimensional integrated flow path system for atomic fluorescence according to claim 2, wherein the 3D printing method is:
the photosensitive cured resin is used as a printing material to be piled layer by layer from bottom to top, and the minimum printing precision is 0.01mm.
4. The three-dimensional integrated flow path system for atomic fluorescence according to claim 1, wherein the inner diameter of the sample storage ring is 0.1-3 mm, and the length thereof is 0.5-5 m.
5. The three-dimensional integrated flow path system for atomic fluorescence according to claim 4, wherein the first, second, third, fourth, fifth, sixth, seventh, eighth, ninth, tenth, eleventh, twelfth, thirteenth, fourteenth, fifteenth, and sixteenth sample ring interfaces have an inner diameter of 0.1-3 mm.
6. The three-dimensional integrated flow path system for atomic fluorescence according to claim 5, wherein the maximum dimension of the integrated flow path module is 200mm long mm, 200mm wide mm and 100mm high.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810512611.2A CN108716952B (en) | 2018-05-25 | 2018-05-25 | Three-dimensional integrated flow path system for atomic fluorescence |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810512611.2A CN108716952B (en) | 2018-05-25 | 2018-05-25 | Three-dimensional integrated flow path system for atomic fluorescence |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002098678A (en) * | 2000-09-22 | 2002-04-05 | Hitachi Ltd | Sample introduction device as well as liquid chromatographic apparatus and sample introduction method using it |
| CN202562846U (en) * | 2012-02-13 | 2012-11-28 | 中国广州分析测试中心 | Pneumatic flow sampling device for atomic fluorescence spectrometer |
| CN104730047A (en) * | 2013-12-23 | 2015-06-24 | 北京瑞利分析仪器有限公司 | Miniature vapor generation sampling system and sampling method for portable atomic fluorescence |
| GB201522436D0 (en) * | 2015-12-18 | 2016-02-03 | Thermo Fisher Scient Bremen | Liquid sample introduction system and method, for analytical plasma spectrometer |
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| US9581491B2 (en) * | 2014-09-30 | 2017-02-28 | Perkinelmer Health Sciences, Inc. | Flow cell modules and liquid sample analyzers and methods including same |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002098678A (en) * | 2000-09-22 | 2002-04-05 | Hitachi Ltd | Sample introduction device as well as liquid chromatographic apparatus and sample introduction method using it |
| CN202562846U (en) * | 2012-02-13 | 2012-11-28 | 中国广州分析测试中心 | Pneumatic flow sampling device for atomic fluorescence spectrometer |
| CN104730047A (en) * | 2013-12-23 | 2015-06-24 | 北京瑞利分析仪器有限公司 | Miniature vapor generation sampling system and sampling method for portable atomic fluorescence |
| GB201522436D0 (en) * | 2015-12-18 | 2016-02-03 | Thermo Fisher Scient Bremen | Liquid sample introduction system and method, for analytical plasma spectrometer |
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