CN108698188A - Polishing tool and the method that base material is polished - Google Patents
Polishing tool and the method that base material is polished Download PDFInfo
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- CN108698188A CN108698188A CN201580085431.5A CN201580085431A CN108698188A CN 108698188 A CN108698188 A CN 108698188A CN 201580085431 A CN201580085431 A CN 201580085431A CN 108698188 A CN108698188 A CN 108698188A
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- China
- Prior art keywords
- polishing
- polishing tool
- volumetric concentration
- polishing material
- glass baseplate
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0015—Hanging grinding machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
- B24B9/10—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
- B24D3/342—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D5/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor
- B24D5/06—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/001—Manufacture of flexible abrasive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The method for disclosing polishing tool and glass baseplate being polished.Polishing tool (200) includes bar (220) and the polishing material (210) that is combined with the bar (220).In terms of volumetric concentration, polishing material (210) include the phenolic resin of about 18% to about 42%, the zinc oxide of about 18% to about 30%, about 1% to about 10% magnesia, coolant and abrasive material.
Description
Background
Technical field
This disclosure relates to polishing tool and production and preparation method thereof.Specifically, this disclosure relates to computer digit control
Make hard and efficient polishing tool associated with (CNC) lathe.
Background technology
Recent years, including the innovation of the user interface of touching technique has increased sharply.Recently the Chuan Xin [ in the field;For example,
Monolithic glass scheme (One Glass Solution, OGS) Chu Mojishu ]Allow in an electronic use it is thinner, cost is more
Low touch panel, while brighter user interface being provided.OGS touching techniques are worked by reducing the number of glassy layer.
Therefore, the glass for being nowadays used for these touch interfaces is very thin.In general, in order to form the glass interface of required shape, to glass
Edge polished.During process of lapping, it is likely to form about 20 μm to about 30 μm of clast around glass edge and makes
At the damage under surface.This damage should be removed to increase the edge strength of glass.The biography damaged under removal chips of glass and surface
System method includes that acid etching and brush polish.Depending on the intensity of glass, acid etching can carry out about 20 minutes to about 40 minutes, with
The edge of glass baseplate is polished.In addition, acid etching carving technology may need expensive surface protection film and additional safety
Measure.
Brush polishing equally exists challenge.For example, the variability of polishing tool, which makes it difficult to batch, generates consistent glass edge
Edge.Furthermore brush polishing may take up to the edge for 3.5 hours carrying out polished glass base material.Brush polishing process itself there is also
Limitation.Although brush polishing can be carried out using CNC machine, when polishing tool is polished the edge of glass baseplate,
They subject quick and undue wear.Conventional method is needed by making the center of polishing tool towards closer to glass edge
Edge moves to compensate this abrasion.In general, it is mended after the glass edge that polishing tool has already been through about 200mm
It repays.Typical offset is any value in about 30 μm to about 100 μm.Therefore, the processing of glass edge may be uneven, and
Force tool return again with glass edge contact position, glass may undergo edge burning.As a result, it may be necessary to first to glass edge
Edge carries out at least 3 times polishings, then removes and is damaged under chips of glass and surface again.
Therefore, it is necessary to new polishing tool and methods, compared with conventional tool, improve the side of glass within the shorter time
Marginal plasma amount, while avoiding edge burning and non-uniform processing.
Invention content
In one embodiment, polishing tool includes bar and the polishing material that is combined with the bar.In terms of volumetric concentration,
The polishing material includes the phenolic resin of about 18% to about 42%, the zinc oxide of about 18% to about 30%, about 1% to about 10%
Magnesia, coolant and abrasive material.
In another embodiment, it manufactures efficient polishing tool-and the efficient polishing tool is configured to by CNC machines
The method of bed receiving-includes being mixed to polishing material, and in terms of volumetric concentration, the polishing material includes about 18% to about
42% phenolic resin, the zinc oxide of about 18% to about 30%, about 1% to about 10% magnesia, coolant and abrasive material.It is described
Method further includes that polishing material is fed in mold, in a mold pre-stamped polishing material, cures polishing material, to polishing material
Material is punched, and bar is assembled into polishing material by the hole that bar is transmitted to polishing material, and make polishing material
It is combined with bar.
In another embodiment, include using the method that CNC machine is polished the edge of glass baseplate:
Prepare glass baseplate in CNC machine, ready glass baseplate has the edge limited circumference by glass baseplate, and will tool
There is the polishing tool of polishing material to attach to CNC machine.In terms of volumetric concentration, the polishing material includes about 18% to about 42%
Phenolic resin, about 18% to about 30% zinc oxide, about 1% to about 10% magnesia, coolant and abrasive material.The method
Further include being aligned polishing tool with the edge of glass baseplate;And the edge of glass baseplate is polished, wherein with throwing
Optical tool passes through the circumference of glass baseplate, and the continuous edge of bar towards the glass baseplate of polishing tool shifts near.
Give other feature and advantage in the following detailed description, Partial Feature and advantage therein for
For those skilled in the art by be described be it will be apparent that by implementing embodiment as described herein,
Embodiments described herein including specific implementation mode below, claims and attached drawing and be realized.
It should be understood that general description above-mentioned and detailed description below all describe each embodiment and are intended to and carry
For the overview or frame of property and characteristic for understanding theme claimed.Including attached drawing provide to each
Embodiment is further understood, and attached drawing is incorporated in this specification and a part for constitution instruction.Attached drawing instantiates this paper institutes
Each embodiment of description, and principle and operation together with specification for explaining theme claimed.
Description of the drawings
Embodiment shown in the drawings is actually schematically and exemplarily, it is no intended to which limitation passes through claims
Defined by theme.The detailed description that can be understood as follows exemplary embodiment is read in conjunction with the following drawings, wherein identical
Structure is presented with like reference characters, wherein:
Fig. 1 instantiates an exemplary implementation of the polishing tool of described herein or disclosed one or more embodiments
The front view of mode;
Fig. 2 instantiates the sectional view of the polishing tool of disclosed herein or one or more embodiments Fig. 1;
Fig. 3, which is instantiated, is described in detail manufacture polishing tool disclosed herein or one or more embodiments
A kind of flow chart of illustrative methods;
Fig. 4 instantiates disclosed herein or one or more embodiments the polishing tools for being wherein mounted with Fig. 1
An exemplary CNC machine;And
Fig. 5 is instantiated using polishing tool disclosed herein or one or more embodiments to glass baseplate
The exemplary polishing path that edge is polished.
Specific implementation mode
The method that embodiment of the present disclosure is related to polishing tool and is polished to glass baseplate.Referring generally to attached drawing,
The embodiment for the method being polished there is provided herein polishing tool and to glass baseplate makes on glass baseplate edge
It damages and reduces under clast and surface.Damage reduces the edge for increasing glass baseplate under clast and surface on glass baseplate edge
Intensity, and thus provide for the better glass baseplate of the overall quality of various practical applications.In addition, method used herein
The case where glass baseplate undergoes edge burning during edge polishing process can be reduced.It specific reference will be made to respective drawings herein more
The method for describing various polishing tools in detail and glass baseplate being polished.
Some embodiments disclosed herein are related to polishing tool, and the polishing tool has bar and polishing material.At this
In a little embodiments, polishing tool is configured to be accommodated by CNC machine, wherein CNC machine is polished technique so that buffer
The polishing material of tool and the edge join of glass baseplate are damaged to polish off under clast and/or surface.In some embodiments
In, in terms of volumetric concentration, the polishing material may include the phenolic resin of about 18% to about 42%;About 18% to about 30%
Zinc oxide;The magnesia of about 1% to about 10%;Coolant and abrasive material.The manufacture throwing is also disclosed in some embodiments
Optical tool and the method that glass baseplate is polished using the polishing tool.
Fig. 1 describes an embodiment of polishing tool 200, and the polishing tool 200 can be used for polished glass base
The edge of material is damaged with removing under clast and surface.Fig. 2 is the sectional view of polishing tool shown in FIG. 1.With reference to Fig. 1 and 2, polishing
Tool 200 has the bar 220 of usually lineament.Bar 220 can be made of a variety of materials.It can be used for polishing tool 200
The non-limiting examples of material of bar 220 be steel or steel alloy, such as stainless steel.
Protrusion 225 extends out from bar 220.In some embodiments, the protrusion 225 of polishing tool 200 can
With integrally formed with bar 220.Protrusion 225 and bar 220 can be formed by tradition machinery processing technology, such as, but not limited to milling
It cuts (milling).In other embodiments, protrusion 225 can build independently of bar 220 and individually be tied with bar 220
It closes.Protrusion 225 and bar 220 are configured to be accommodated by the main shaft 105 of CNC machine 100 (being shown in FIG. 4).
Adjoin protrusion 225 is the polishing material 210 that can be combined with bar 220.With specific reference to Fig. 2, bar 220 passes through throwing
The channel 215 of luminescent material 210 so that polishing material 210 is around around bar 220.Polishing material 210 may include be merged and
The mixture of the various powders of hardening.
Come the edge of polished glass base material, especially glass baseplate using polishing material 210.Polishing material 210 is constructed
It is damaged under clast and surface at for removing, while leaving smooth edge, being damaged under the clast and surface can make edge strong
Spend the matt appearance for dying down or making glass baseplate.Therefore, the characteristic of polishing tool includes sufficiently firmly to cut glass baseplate
Edge, but sufficiently bent again to engage glass baseplate, to generate the edge of smooth finishing in this way.The following table 1
Various composition of the exemplary group of polishing material in is listed, they will be described in more detail below.
Table 1
| Polishing material ingredient | Volumetric concentration |
| Adhesive | About 18% to about 42% |
| Fluxing agent and glazing agent | About 18% to about 30% |
| First polishing agent | About 16% to about 28% |
| Second polishing agent | About 13% to about 29% |
| Antiscorching agent | About 1% to about 10% |
| Increase flexible ingredient | About 10% to about 14% |
| Abrasive material | About 100% to about 200%, as additional object addition |
In some embodiments, polishing material 210 is including base composition and in addition to the base composition
Additional object.In some embodiments, the base composition includes adhesive.Adhesive can be in base composition most
Big ingredient, and for the arbitrary other compositions of adhesive polished tool.In terms of volumetric concentration, adhesive can be with base composition
About 18% to about 42% exists.In other embodiments, in terms of volumetric concentration, adhesive can be with about the 20% of base composition
Exist to about 40%.It should be noted that if using the too high adhesive of concentration, polishing tool 200 will not be able to polish, this
It is because polishing material 200 will not be able to be ground the edge of glass baseplate.If using the too small adhesive of percentage,
Then adhesive will not be able to the edge of polished glass base material, this is because polishing tool 200 will not be able to keep its shape with
The edge of glass baseplate is fully adjacent.As non-limiting examples, adhesive can be phenolic resin.Phenolic resin is to polishing material
Material 210 provides binding property and flexibility.
Polishing material 210 includes fluxing agent and glazing agent.In terms of volumetric concentration, fluxing agent and glazing agent basic can combine
About the 18% to about 30% of object exists.In some embodiments, in terms of volumetric concentration, fluxing agent and glazing agent can be with base sets
Close object about 20% to about 28% exists.Fluxing agent and glazing agent can be supplied to polishing material 210 as powder.As non-limit
Property example processed, fluxing agent and glazing agent can be zinc oxide (ZnO).
Polishing material 210 further includes antiscorching agent.In terms of volumetric concentration, antiscorching agent can be with about the 1% of base composition to about
10% exists.Antiscorching agent can be supplied to polishing material 210 as powder.Antiscorching agent can be but be not limited to magnesia (MgO).
Polishing material 210 further includes at least one polishing agent.In terms of volumetric concentration, at least one polishing agent can be with base
About the 16% to about 28% of plinth composition exists.Unrestricted polishing agent can be iron oxide (Fe2O3), and it is dense with volume
Degree meter can exist with about the 16% to about 28% of base composition.Iron oxide can be supplied to polishing material as powder
210.In some embodiments, the second polishing agent is provided.In there are the embodiment of the second polishing agent, with volumetric concentration
Meter, second polishing agent can exist with about the 13% to about 29% of base composition.In one non-limiting example, second
Polishing agent can be silicon carbide (SiC).It should be noted that excessive polishing agent may lead to the boundary between glass baseplate and polishing tool
Face is really up to the mark so that can not provide smooth finishing.Similarly, very few polishing agent will prevent polishing tool 200 from effectively polishing
The edge of glass baseplate, because the polishing quality of the first and second polishing agents may be polished in the base composition of material 210
Other compositions compacting and cover.
Polishing material 210 further includes coolant, and the coolant promotes polishing material 210 after forming polishing material 210
Cooling, what following article was discussed in greater detail.In addition, coolant can be at the edge of 200 polished glass base material 130 of polishing tool
While 132, inhibits the temperature of polishing tool 200 to increase or keep the temperature raising of polishing tool 200 slack-off.With volumetric concentration
The coolant of meter, polishing material 210 can exist with about the 6% to about 32% of base composition.As non-limiting examples, cooling
Agent is copper (Cu) powder.
Polishing material 210 further includes that polishing material 210 is made to increase flexible ingredient.Flexibility increases so that polishing tool 200
More fully engage the edge 132 of glass baseplate 130.In terms of volumetric concentration, so that polishing material 210 is increased flexible ingredient can be with
About the 10% to about 14% of base composition exists.In some embodiments, make polishing material 200 increase flexible ingredient to be
Rubber material, and it is added to as powder in base composition.Some unrestricted rubber material examples are vulcanization bullet
Property material, ethylene propylene diene rubber (EPDM), butyl rubber compound and other natural rubber compounds.It should be noted that base
Plinth composition, which adds very few rubber, may result in the rigid polishing material 210 of rapid wear.Similarly, it adds excessive
Rubber may cause polishing material 210 flexible excessive and prevent polishing tool 200 in polishing from fully engaging glass baseplate
Edge.
Polishing material 210 further includes the abrasive material added as the addition object of basic composition.As used herein, it chases after
Add object to be above base composition and is added to the material in composition.For example, if base composition includes 100 grams,
10% addition object is by 10 grams of additional object materials to be added in 100 grams of base compositions.Abrasive material can provide cutting and throwing
Optical property.Some non-limiting examples of abrasive material include diamond dust, diamond, nickel plating diamond dust or nickel plating diamond.Diamond dust
Also referred to as silicon carbide (SiC) can be natural or synthetic.Diamond dust or diamond can be by various methods
Nickel plating, such as, but not limited to electroless nickel plating.Electroless nickel plating is for depositing nickel-phosphorus alloy or ni-b alloy layer in solid work
Autocatalysis chemical technology.Nickel plating can increase the caking property of adhesive, so that the combination between adhesive and abrasive material is stronger.
The granularity of abrasive material can be about 1 μm to about 5 μm.Granularity refers to the size of the individual particle of abrasive material.Larger granularity is from glass base
The edge of material removes more materials.When glass edge polishes, about 20 μm to about 30 μm of glass is only removed, it is thus possible to need
Thinner granularity is wanted, excessive glass will not be removed, and leaves smooth finishing.Abrasive material can be used as additional object to be added to
It is about the 100% to about 200% of basic composition in terms of volumetric concentration in polishing material 210.In some embodiments,
Abrasive material is added to as additional object in polishing material 210, is basic composition about 148% to about in terms of volumetric concentration
152%.
The method for providing the manufacture polishing tool of one or more embodiments as described herein.Fig. 3 instantiates manufacture
A kind of illustrative methods of polishing tool 200, this method generally comprise:Polishing material 210 is formed, forms bar 220, and will throw
Luminescent material 210 is assembled into bar 220, wherein polishing material 210 is combined (as illustrated in fig. 1 and 2) with bar 220.
As shown in block 310, the material for forming base composition and arbitrary superadded material are mixed.Then exist
At box 320, the polishing material 210 of at least part mixing can be fed in mold.Mold can be configured to give
Shape and size needed for polishing material 210.Then at frame 330, the partially polished material of this in mold 210 can be carried out pre-
Compacting.Unrestricted as example, pre-stamped step 330 can occur at a temperature of about 130 DEG C to about 140 DEG C, last about 1
Minute was to about 6 minutes.In some embodiments, pre-stamped step 330 can be completed in one step.In other embodiment party
In formula, feeding step 320 and pre-stamped step 330 can be completed in several cycles, wherein by the polishing material of a part
210 are fed in mold, then carry out pre-stamped, and then more polishing materials 210 are fed in mold and are equally carried out
It is pre-stamped.Cycle can continue, until mold has suppressed the amount of the polishing material 210 needed for complete polishing tool 200.
In some embodiments, feed and pre-stamped step 320,330 include 8 to 10 cycles.
It is being fed with behind pre-stamped step 320,330, at box 340, polishing material 210 can undergo curing process.
Unrestricted as example, polishing material 210 can cure about 85 minutes to about 95 at a temperature of about 170 DEG C to about 190 DEG C
Minute.Once polishing material 210 has cured required amount, then polishing material 210 is removed from mold.
Once eliminating polishing material 210 from mold, then polishing material 210 can be made to undergo at box 350
Punch out step.Punch out step 350 forms the channel 215 approximately through 210 center of polishing material so that can be by polishing material
210 are assembled into bar 220 (as shown in Figure 2).In one non-limiting example, channel 215 can be formed by drilling.
At box 360, bar material is provided.As described above, bar 220 can be made by steel or steel alloy (such as stainless steel)
At.Therefore, the steel billet of selected material can be provided at box 370, be then shaped into required rod-shape.Bar 220 can
With with variously-shaped.In some embodiments, bar 220 can have cylinder.Substantially extend from the central part of bar 220
Out can be protrusion 225.The shape and its protrusion of the mechanically formed bar of various machine tools 220 can be used
225.A kind of unrestricted machine tools can be milling machine.
At box 380, bar 220 can be assembled and be attached to polishing material 210.As shown in Fig. 2, can be by bar 220
It is installed in the channel 215 of polishing material 210.In conjunction with being that bar 220 is instigated to be connect with polishing material 210 so that polishing material 210
Attach to bar 220.For example, but it is unrestricted, in conjunction with may include that polishing material is adhered to bar.When assembling polishing tool 200
Afterwards, polishing tool 200 can be machined into required construction using additional mechanical shaping steps 390, and in box
Quality control test can be carried out at 395.
As described above, the improved method that polishing tool as described herein can be used for carrying out edge polishing to glass baseplate
In.With reference to figure 4, disclose using CNC machine 100 and an embodiment of above-mentioned polishing tool 200 to glass baseplate 130
A kind of illustrative methods that edge 132 is polished.It is believed that an embodiment of polishing tool 200 as described herein can
To be used in any CNC machine that can accommodate milling tool, engraving tool or polishing tool.One non-limit of CNC machine
Property example processed is LNC M600[It is made by LNC Technology Co., Ltd. (LNC Technology Co.Ltd.) of Taichung City, Taiwan Province
Zao ].Illustrated by CNC machine 100 have head 110, accommodate make main shaft 105 rotate motor (not shown).Work as throwing
Light time, main shaft can be rotated with about 45,000rpm to about 55,000rpm.Head 110 can be configured in longitudinal direction x, cross
It is translated on direction y and vertical direction z.For example, head can be made by translating head 110 along longitudinal supporting structure 112
110 move in the longitudinal directionx.It can make head by making longitudinal supporting structure 112 be translated along lateral support structure 113
110 move in transverse direction y.Main shaft 105 can extend from head 110, and be configured to receive polishing tool 200
Bar.CNC machine 100 can also include bed 108, be configured to accommodate glass baseplate 130 wherein.CNC machine 100 can be with
(not shown) is controlled with programmable computer so that can calculate the road that polishing tool 200 surrounds 130 circumference of glass baseplate
Diameter, and the edge 132 of 200 automatic polishing glass baseplate 130 of polishing tool.
Glass baseplate 130 extends simultaneously on longitudinal direction x and transverse direction y.Glass baseplate 130 may include by glass
The circumference that the edge 132 of base material 130 limits.Glass baseplate 130 can be by strengthening or without reinforcing.Strengthened glass
Non-limiting examples include ion exchange chemically reinforced glass or hot tempered glass.With reference to figure 5, glass baseplate 130 can have
Width W and length L.Although glass baseplate 130 be shown as having it is generally rectangular-shaped, can use glass arbitrary shape
Shape.
As described herein, compensation refers to making the bar of polishing tool 200 when the polishing material 210 of polishing tool 200 is worn
220 shift near towards the edge 132 of glass baseplate 130.As polishing tool 200 is by the edge 132 of glass baseplate 130, polishing
The abrasion of material 210 can be substantially uniform.Therefore, Continuous Compensation value can be set, so that the bar of polishing tool 200
220 can be continuous and gradually shift near towards the edge 132 of glass baseplate 130, rather than keep the bar 220 of polishing tool 200 prominent
So moved towards the edge 132 of glass baseplate 130.Offset can be changed based on strength of glass.For chemically reinforced glass,
Offset can be between about 0.15 μm/mm to about 0.28 μm/mm.
Referring still to Fig. 5, polishing path 250 can be calculated and be programmed into the computer control of CNC machine 100
In.Total compensation that polishing tool 200 is undergone when can reach precalculated position by calculating polishing tool 200, to calculate polishing
Path 250.For example, polishing path 250 can start at position 1, which is expressed as an angle of glass baseplate 130.The
One precalculated position can be position 2, which indicates at the angle opposite with position 1.When polishing tool 200 is by position 1 and position
When setting the distance between 2, the compensation rate that polishing tool 200 is undergone can be multiplied by the traveling of polishing tool 200 equal to predetermined backoff value
Distance, in this example, distance be equal to L.Similarly, at position 3, total compensation of polishing tool experience will be the total of traveling
Distance (L+W) is multiplied by offset.At position 4, total compensation that polishing tool 200 is undergone will be the total distance (L+W+L) advanced
It is multiplied by offset, and so on.Similarly, when polishing tool 200 arrives again at initial position (i.e. position 1), polishing tool
Total compensation of 200 experience will be multiplied by offset equal to the total distance of traveling (L+W+L+W) (i.e. the perimeter of glass baseplate).Each pre-
It positions at a position in setting, the compensation rate that polishing tool 200 is undergone can map according to round radius.Radius can be drawn
Equal to the circle always compensated that polishing tool 200 is undergone, and using each angle as dot.As shown in figure 5, can be in each continuous position
Tangential slope is drawn between the circle at the place of setting.The tangential slope intersected indicates the path 250 of polishing tool 200, can be by the path
250 are programmed into the computer control of CNC machine 100.In some embodiments, these calculating can pass through CNC machine 100
Computer control carry out, to calculate path automatically.
Polishing tool 200 can be aligned with the edge 132 of glass baseplate 130 as a result,.Polishing tool 200 can be in its warp
The edge 132 of glass baseplate 130 is polished while crossing scheduled polishing path 250, wherein the bar of polishing tool 200
220 continuously shift near towards the edge 132 of glass baseplate 130.Polishing tool 200 can with about 1,400mm/ minutes to about 1,
600mm/ minutes feeding rates pass through polishing path 250.As described herein, polishing tool 200 can be in polishing tool 200
Around glass baseplate 130 circumference by being less than three times in the case of remove chips of glass.In some embodiments, polishing tool
200 can polishing tool 200 around glass baseplate 130 circumference by it is primary in the case of remove chips of glass.
It will now be appreciated that the side that embodiment as described herein provides polishing tool and is polished to glass baseplate
Method, to reduce the clast occurred on the glass substrate and be damaged under surface, damage script may be decreased under the clast and surface
The edge strength of glass baseplate.Therefore, polishing tool as described herein and to the method that glass baseplate is polished pass through to
The continuous edge compensation polishing tool for glass baseplate, can be with the edge strength of reinforcing glass base material, while avoiding inaesthetic
It burns at edge.
It should be apparent to those skilled in the art that embodiment as described herein can be carry out various modifications and
The spirit and scope changed without departing from claimed theme.Therefore, this specification is intended to cover each reality as described herein
The modifications and variations form of mode is applied, condition is that these modifications and variations forms fall into appended claims and its equivalents
Within the scope of.
Claims (22)
1. a kind of polishing tool comprising:
Bar;With
The polishing material combined with the bar, wherein in terms of volumetric concentration, the polishing material includes:
The phenolic resin of about 18% to about 42%;
The zinc oxide of about 18% to about 30%;
The magnesia of about 1% to about 10%;
Coolant;With
Abrasive material.
2. polishing tool as described in claim 1, wherein in terms of volumetric concentration, the polishing material further include about 16% to
About 28% iron oxide.
3. polishing tool as claimed in claim 1 or 2, wherein in terms of volumetric concentration, the polishing material further includes about 13%
To about 29% silicon carbide.
4. polishing tool as claimed in any one of claims 1-3, wherein in terms of volumetric concentration, the polishing material also wraps
Include the rubber of about 10% to about 14%.
5. the polishing tool as described in any one of claim 1-4, wherein the abrasive material is to be added to polishing as additional object
Nickel plating diamond dust in material is about 100% to about 200% in terms of volumetric concentration, and the granularity of the nickel plating diamond dust
It is about 1 μm to about 5 μm.
6. polishing tool as claimed in claim 5, wherein be added to polishing material using the nickel plating diamond dust as additional object
In, it is about 148% to about 152% in terms of volumetric concentration.
7. the polishing tool as described in any one of claim 1-6, wherein the coolant is copper powder, with about 6% to about
32% volumetric concentration is present in polishing material.
8. the polishing tool as described in any one of claim 1-7, wherein the polishing tool is configured to by CNC machine
To accommodate, and the edge of glass baseplate is polished.
9. a kind of method of the efficient polishing tool of manufacture, the efficient polishing tool are configured to be accommodated by CNC machine, the side
Method includes:
Polishing material is mixed, in terms of volumetric concentration, the polishing material includes:
The phenolic resin of about 18% to about 42%;
The zinc oxide of about 18% to about 30%;
The magnesia of about 1% to about 10%;
Coolant;With
Abrasive material;
Polishing material is fed in mold;
Polishing material is carried out in a mold pre-stamped;
Cure polishing material;
Polishing material is punched;
Bar is assembled into polishing material by making bar by the hole of polishing material;And
Polishing material is set to be combined with bar.
10. method as claimed in claim 9, wherein carry out precompressed at about 130 DEG C to about 140 DEG C and restrict 1 minute to about 6
Minute.
11. method as claimed in claim 10, wherein feeding step and pre-stamped step include 8-10 feed and pre-stamped
Cycle.
12. the method as described in any one of claim 9-11, further include polishing material is mechanically formed into it is predetermined
Construction.
13. the method as described in any one of claim 9-12, wherein in terms of volumetric concentration, the polishing material further includes
The iron oxide of about 16% to about 28%.
14. the method as described in any one of claim 9-13, wherein in terms of volumetric concentration, the polishing material further includes
The silicon carbide of about 13% to about 29%.
15. the method as described in any one of claim 9-14, wherein in terms of volumetric concentration, the polishing material further includes
The rubber of about 10% to about 14%.
16. the method as described in any one of claim 9-15, wherein the abrasive material is to be added to polishing material as additional object
Nickel plating diamond dust in material is about 100% to about 200% in terms of volumetric concentration, and the granularity of the nickel plating diamond dust is
About 1 μm to about 5 μm.
17. the method described in claim 16, wherein in terms of volumetric concentration, by about 148% to about 152% nickel plating
Diamond dust is added as additional object.
18. the method as described in any one of claim 9-17, wherein the coolant is copper powder, with about 6% to about
32% volumetric concentration is present in polishing material.
19. the method as described in any one of claim 9-18, wherein cured about 85 at about 170 DEG C to about 190 DEG C
Minute was to about 95 minutes.
20. a kind of method that the edge of glass baseplate is polished using CNC machine, the method includes:
Prepare glass baseplate in CNC machine, ready glass baseplate includes the edge limited circumference by glass baseplate;
Polishing tool comprising polishing material is attached into CNC machine, in terms of volumetric concentration, the polishing material includes:
The phenolic resin of about 18% to about 42%;
The zinc oxide of about 18% to about 30%;
The magnesia of about 1% to about 10%;
Coolant;With
Abrasive material;
Polishing tool is aligned with the edge of glass baseplate;And
The edge of glass baseplate is polished, wherein as polishing tool passes through the circumference of glass baseplate, the bar of polishing tool
Continuous edge towards glass baseplate shifts near.
21. method as claimed in claim 20, wherein the bar of polishing tool is with about 0.15 μm/mm to about 0.028 μm/mm's
The continuous edge of ratio towards glass baseplate shifts near.
22. the method as described in claim 20 or 21, wherein the glass baseplate is by chemical strengthening.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2015/097672 WO2017101059A1 (en) | 2015-12-17 | 2015-12-17 | Polishing tools and methods of polishing substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108698188A true CN108698188A (en) | 2018-10-23 |
Family
ID=59055406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201580085431.5A Pending CN108698188A (en) | 2015-12-17 | 2015-12-17 | Polishing tool and the method that base material is polished |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20180369988A1 (en) |
| CN (1) | CN108698188A (en) |
| WO (1) | WO2017101059A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114473893A (en) * | 2022-01-10 | 2022-05-13 | 深圳沃特佳科技有限公司 | Grinding rod for polishing glass edge |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59201755A (en) * | 1983-04-28 | 1984-11-15 | Ntn Toyo Bearing Co Ltd | Material for lapping tool |
| CN101570006A (en) * | 2009-06-02 | 2009-11-04 | 深圳市常兴金刚石磨具有限公司 | Process for producing ultrahard material ceramic abrasive tool by dry method |
| CN102153718A (en) * | 2011-01-10 | 2011-08-17 | 河南工业大学 | Heat-resistant phenolic resin and application thereof in production of super-hard material resin mold |
| CN102501186A (en) * | 2011-11-02 | 2012-06-20 | 广东奔朗新材料股份有限公司 | Wear-resistant diamond polishing grinder and production method thereof |
| CN104759962A (en) * | 2015-03-17 | 2015-07-08 | 刘忠文 | Novel numerically controlled special-shaped glass edge grinding machine |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6033449A (en) * | 1997-11-17 | 2000-03-07 | Cooper; Alex | Polishing tool |
| US6604990B2 (en) * | 2001-08-31 | 2003-08-12 | Universal Photonics Inc. | Polishing pad and method of producing the same |
| US6866565B2 (en) * | 2002-01-29 | 2005-03-15 | Ebara Corporation | Polishing tool and polishing apparatus |
| CN1282523C (en) * | 2003-12-23 | 2006-11-01 | 戴湘云 | Method for producing glass polishing emery wheel |
| JP5305214B2 (en) * | 2006-10-06 | 2013-10-02 | 日本電気硝子株式会社 | End face processing method of plate glass |
| CN101829960B (en) * | 2010-04-30 | 2011-12-07 | 邬伟光 | Diamond resin grinding tool for stones and ceramics |
| CN102441828A (en) * | 2010-09-30 | 2012-05-09 | 旭硝子株式会社 | End edge grinding method for glass substrates |
| CN102248495B (en) * | 2011-08-12 | 2012-09-26 | 河南工业大学 | Glass polishing disk and manufacturing method thereof |
-
2015
- 2015-12-17 CN CN201580085431.5A patent/CN108698188A/en active Pending
- 2015-12-17 WO PCT/CN2015/097672 patent/WO2017101059A1/en active Application Filing
- 2015-12-17 US US16/062,430 patent/US20180369988A1/en not_active Abandoned
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59201755A (en) * | 1983-04-28 | 1984-11-15 | Ntn Toyo Bearing Co Ltd | Material for lapping tool |
| CN101570006A (en) * | 2009-06-02 | 2009-11-04 | 深圳市常兴金刚石磨具有限公司 | Process for producing ultrahard material ceramic abrasive tool by dry method |
| CN102153718A (en) * | 2011-01-10 | 2011-08-17 | 河南工业大学 | Heat-resistant phenolic resin and application thereof in production of super-hard material resin mold |
| CN102501186A (en) * | 2011-11-02 | 2012-06-20 | 广东奔朗新材料股份有限公司 | Wear-resistant diamond polishing grinder and production method thereof |
| CN104759962A (en) * | 2015-03-17 | 2015-07-08 | 刘忠文 | Novel numerically controlled special-shaped glass edge grinding machine |
Non-Patent Citations (3)
| Title |
|---|
| 中华书局辞海: "《辞海试行本 第12分册 自然科学 数学•物理•化学•天文 地球物理•地质》", 31 October 1961 * |
| 天津橡胶工业研究所: "《氯丁橡胶应用技术》", 31 October 1971 * |
| 手册编委会: "《日用搪瓷手册》", 31 March 1982 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20180369988A1 (en) | 2018-12-27 |
| WO2017101059A1 (en) | 2017-06-22 |
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