CN108666254A - A kind of substrate fixed system of wet process - Google Patents
A kind of substrate fixed system of wet process Download PDFInfo
- Publication number
- CN108666254A CN108666254A CN201710201298.6A CN201710201298A CN108666254A CN 108666254 A CN108666254 A CN 108666254A CN 201710201298 A CN201710201298 A CN 201710201298A CN 108666254 A CN108666254 A CN 108666254A
- Authority
- CN
- China
- Prior art keywords
- collection vessel
- wet process
- fixed system
- substrate fixed
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The present invention relates to a kind of substrate fixed systems of wet process comprising：There is a groove, bottom there is a cavity, inside there are multiple vacuum sucking holes, the multiple vacuum sucking holes to be connected to the groove with the cavity for one carrying platform, the carrying platform top；One vacuum extractor, the vacuum extractor are connect with the cavity, for being vacuumized to the multiple vacuum sucking holes；Wherein, further comprise that a collection vessel, the collection vessel are connect by one first conduit with the vacuum extractor, and connect with the cavity by one second conduit.By the way that collection vessel is arranged so that the solution leaked from the multiple vacuum sucking holes can be deposited on the collection vessel bottom after entering the collection vessel, without being inhaled into the vacuum extractor.
Description
Technical field
The present invention relates to the substrate fixed systems of wet process technical field more particularly to a kind of wet process.
Background technology
In panel processing procedure, the clamping of substrate is usually fixed by the mode for inhaling vacuum below carrying platform, so as into
The subsequent processing procedure of row.However, in wet type panel processing procedure, when substrate impregnates in the solution, the vacuum sucking holes below substrate are difficult
Accomplish to prevent completely for a long time below liquid leakage to carrying platform, to be inhaled into vacuum extractor, leads to vacuum means
Set reduced lifetime or damage.In particular, when impregnating substrate using organic solvent, prevent liquid leakage more difficult for a long time.
Invention content
In view of this, it is necessory to provide a kind of substrate fixed system for the wet process that can completely cut off leakage solvent.
A kind of substrate fixed system of wet process comprising：One carrying platform, the carrying platform top are recessed with one
There is a cavity, inside there are multiple vacuum sucking holes, the multiple vacuum sucking holes to connect the groove and the cavity for slot, bottom
It is logical；One vacuum extractor, the vacuum extractor are connect with the cavity, true for the multiple vacuum sucking holes take out
It is empty；Wherein, further comprise that a collection vessel, the collection vessel are connect by one first conduit with the vacuum extractor,
And it is connect with the cavity by one second conduit.
Such as the substrate fixed system of above-mentioned wet process, wherein the collection vessel includes an isolating device, the isolation
Device is used to the collection vessel inner space being divided into headspace and bottom space.
Such as the substrate fixed system of above-mentioned wet process, wherein the collection vessel further includes one and the bottom space
The drain pipe of connection and the valve being set on the drain pipe, the drain pipe are used to collect in the bottom space
Leak solution discharge.
Such as the substrate fixed system of above-mentioned wet process, wherein the isolating device is set to the collection vessel for one
Internal isolation board, the isolation board can rotate the collection vessel inner space dividing the headspace and bottom
Portion space.
Such as the substrate fixed system of above-mentioned wet process, wherein the collection vessel includes two containers being connected with each other；
The isolating device is a valve for being set to described two container junctions.
Such as the substrate fixed system of above-mentioned wet process, wherein described two containers can detach.
Such as the substrate fixed system of above-mentioned wet process, wherein the cavity bottom is infundibulate, the cavity bottom
There is minimum point one first trepanning, the collection vessel to be connect with first trepanning by second conduit.
As above-mentioned wet process substrate fixed system, wherein the collection vessel be set to the cavity bottom and
Another cavity defined by the carrying platform.
Such as the substrate fixed system of above-mentioned wet process, wherein be further provided with liquid suction inside the collection vessel
Receive material.
Such as the substrate fixed system of above-mentioned wet process, wherein be provided with a cooling device outside the collection vessel.
Compared to the prior art, the substrate fixed system of wet process provided by the invention is made by the way that collection vessel is arranged
The collection vessel bottom can be deposited on after entering the collection vessel from the solution that the multiple vacuum sucking holes leak by obtaining, without
It can be inhaled into the vacuum extractor.
Description of the drawings
Fig. 1 is the structural schematic diagram of the substrate fixed system for the wet process that first embodiment of the invention provides.
Fig. 2 is that the structure of another collection vessel of the substrate fixed system of the wet process of first embodiment of the invention is shown
It is intended to.
Fig. 3 is the sectional view of III-III along the collection vessel of Fig. 2.
Fig. 4 is that the structure of another collection vessel of the substrate fixed system of the wet process of first embodiment of the invention is shown
It is intended to.
Fig. 5 is the structural schematic diagram of the substrate fixed system for the wet process that second embodiment of the invention provides.
Fig. 6 is the structural schematic diagram of the substrate fixed system for the wet process that third embodiment of the invention provides.
Fig. 7 is the structural schematic diagram of the substrate fixed system for the wet process that fourth embodiment of the invention provides.
Main element symbol description
Specific implementation mode
The present invention is described in further detail below in conjunction with the accompanying drawings and the specific embodiments.
Referring to Fig. 1, first embodiment of the invention provides a kind of substrate fixed system 10 of wet process comprising：One
Carrying platform 11, a vacuum extractor 12 and a collection vessel 13.
11 top of the carrying platform is with a groove 111 and inside is with the multiple vacuum suction being connected to the groove 111
Hole 112.The groove 111 is for carrying solution 14 and substrate to be fixed 15.The vacuum sucking holes 112 wait for admittedly described in being used to fix
Determine substrate 15.11 bottom of the carrying platform has a cavity 113.The multiple vacuum sucking holes 112 are by the groove 111 and institute
State the connection of cavity 113.The collection vessel 13 is connect by the first conduit 16 with the cavity 113.
The vacuum extractor 12 is connect by one second conduit 17 with the collection vessel 13.Therefore, described to vacuumize
Device 12 is connect with the multiple vacuum sucking holes 112, for being vacuumized to the multiple vacuum sucking holes 112.The leakage
Solution 142 can be deposited on 13 bottom of the collection vessel after entering the collection vessel 13, without being inhaled into described vacuumize
In device 12.
The carrying platform 11 is metal structure, can be prepared by pouring technology.The shapes and sizes of the groove 111
It is unlimited, it can design as needed.The apertures of the vacuum sucking holes 112, quantity and distribution situation are unlimited, can be as needed
Selection.The shapes and sizes of the cavity 113 are unlimited, can design as needed.In the present embodiment, the groove 111 is square
Shape, and bottom is plane.The cavity 113 is rectangle, and bottom has one first trepanning 115.
Described first conduit, 16 one end is connect with the first trepanning 115 of 113 bottom of the cavity, and the other end is inserted into the receipts
Collect inside container 13.Described second conduit, 17 one end is connect with the vacuum extractor 12, and the other end is inserted into the collection vessel
Inside 13.Second conduit, 17 and first conduit 16 and the junction of the collection vessel 13 seal, to prevent gas leakage.It is described
Vacuum extractor 12 can be mechanical pump, molecular pump or ionic pump etc..
The shapes and sizes of the collection vessel 13 are unlimited, can design as needed.The material of the collection vessel 13
Can be glass, ceramics, polymer or metal etc..Preferably, the collection vessel 13 uses transparent material, to observe inside
The amount of the leakage solution 142 of collection.In the present embodiment, the collection vessel 13 is a vial.It is appreciated that due to the receipts
Collection container 13 is connect with the vacuum extractor 12, and when the substrate fixed system 10 of the wet process works, the collection is held
Vacuum state is in device 13.
It is appreciated that if the leakage solution 142 of 13 internal gathering of the collection vessel is excessive or fill up the collection vessel
When 13, then needs to stop vacuumizing, leakage solution 142 is discharged.In order to while keeping vacuumizing by the collection vessel
Leakage solution 142 in 13 is discharged, and the present invention makes the collection vessel 13 further comprise an isolating device.The isolating device
For 13 inner space of the collection vessel to be divided into headspace and bottom space.The knot of the isolating device introduced below
Structure.
Fig. 2-3 is referred to, in one embodiment, the isolating device is set to for one inside the collection vessel 13
Isolation board 131, the isolation board 131 can rotate to by 13 inner space of the collection vessel divide the headspace and
Bottom space.The leakage solution 142 is located in bottom space.The size and shape of the isolation board 131 hold with the collection
The sectional dimension of device 13 is identical with shape.The isolation board 131 is fixed on by a rotary shaft 132 in the collection vessel 13
Portion.The rotary shaft 132 is inserted on 13 chamber wall of the collection vessel, and at least one end extends to outside the collection vessel 13
Portion rotates the isolation board 131 will pass through rotary shaft 132.Preferably, rubber seal can be arranged in 131 edge of the isolation board
Circle.The collection vessel 13 further includes a drain pipe 133 being connect with the bottom space and is set to the drain pipe 133
On the first valve 134, the drain pipe 133 is for the leakage solution 142 collected in the bottom space to be discharged.When described
When 13 inner space of collection vessel is divided into headspace and bottom space, first valve 134 is opened, keeps the bottom empty
The leakage solution 142 of interior collection is discharged.At this point, due to being spaced between the headspace and bottom space, do not interfere with
The vacuum extractor 12 vacuumizes the multiple vacuum sucking holes 112.After the leakage solution 142 is drained, close
First valve 134, and isolation board 131 is rotated, so that the headspace is connected to again with bottom space.
Fig. 4 is referred to, in another embodiment, the collection vessel 13 includes 136 He of the first container being connected with each other
The conical flask being connected with each other at second container 137, such as two neckings.The isolating device is set to described first for one and holds
Second valve 135 of 137 junction of device 136 and second container.When second valve 135 is closed, the first container 136
It is divided into the headspace and bottom space with second container 137.The collection vessel 13 can include one and described second
The drain pipe 133 that container 137 connects and the first valve 134 being set on the drain pipe 133.Selectively, the receipts
Drain pipe 133 can also not had by collecting container 13, for example, when second valve 135 is closed, the first container 136 and the
Two containers 137 can detach, and the first container 136 is sealed by second valve 135, will be in the second container 137
Leakage solution 142 outwell after reconnect in the first container 136.
Referring to Fig. 5, second embodiment of the invention provides a kind of substrate fixed system 10A of wet process comprising：One
Carrying platform 11, a vacuum extractor 12 and a collection vessel 13.
The substrate fixed system 10A for the wet process that second embodiment of the invention provides is provided with first embodiment of the invention
Wet process substrate fixed system 10 it is essentially identical, be infundibulate difference lies in, 113 bottom of the cavity, described the
One trepanning 115 is located at the minimum point of 113 bottom of the cavity, and a third valve 138 is provided on first conduit 16.
Specifically, the collection vessel 13 be set to the cavity 113 lower section and with 115 face of the first trepanning,
First conduit 16 is vertical linear conduit.Since 113 bottom of the cavity is infundibulate, the multiple vacuum sucking holes
112 leakage solution 142 flows directly into the collection vessel 13 by first conduit 16 under the effect of gravity.When the receipts
When collecting completely leakage solution 142 in collection container 13, the third valve 138 is closed.The collection vessel 13 is removed, outwells and lets out
Solution 142 is leaked, then is installed on first conduit 16.
Referring to Fig. 6, third embodiment of the invention provides a kind of substrate fixed system 10B of wet process comprising：One
Carrying platform 11, a vacuum extractor 12 and a collection vessel 13.
The substrate fixed system 10B for the wet process that third embodiment of the invention provides is provided with second embodiment of the invention
Wet process substrate fixed system 10A it is essentially identical, difference lies in the collection vessel 13 is further provided with liquid
Absorbing material 139, and a cooling device 18 is provided with outside the collection vessel 13.
It is appreciated that since 13 inside of the collection vessel is vacuum, the leakage solution 142 that the collection vessel 13 is collected
Than being easier to volatilize under normal pressure.The leakage solution can be prevented by the liquid absorption material 139 or cooling device 18
142 volatilizations.The liquid absorption material 139 can be sponge, cotton etc..The cooling device 18 can be refrigerator or liquid nitrogen
Deng.
Referring to Fig. 7, fourth embodiment of the invention provides a kind of substrate fixed system 10C of wet process comprising：One
Carrying platform 11, a vacuum extractor 12 and a collection vessel 13.
The substrate fixed system 10C for the wet process that fourth embodiment of the invention provides is provided with second embodiment of the invention
Wet process substrate fixed system 10A it is essentially identical, be to be set to the cavity difference lies in, the collection vessel 13
113 bottoms and another cavity defined by the carrying platform 11.First trepanning 115 is equivalent to first conduit
16.Second conduit 17 is connected in the trepanning at 13 top of the collection vessel.
The substrate fixed system of wet process provided by the invention has the advantages that：By the way that collection vessel is arranged
13 so that the solution leaked from the multiple vacuum sucking holes 112 can be deposited on the collection appearance after entering the collection vessel 13
13 bottom of device, without being inhaled into the vacuum extractor 12.Not only the collection vessel 13 dismounts simply, but also the receipts
The leakage solution collected in collection container 13 can recycle.Therefore, the substrate fixed system of the wet process is easy to operate, at
This is cheap.
In addition, those skilled in the art can also do other variations in spirit of that invention, these are spiritual according to the present invention
The variation done should be all included in scope of the present invention.
Claims (10)
1. a kind of substrate fixed system of wet process comprising：
There is a groove, bottom there is a cavity, inside to have the suction of multiple vacuum for one carrying platform, the carrying platform top
The groove is connected to by hole, the multiple vacuum sucking holes with the cavity；
One vacuum extractor, the vacuum extractor are connect with the cavity, true for the multiple vacuum sucking holes take out
It is empty；
It is characterized in that, further comprising a collection vessel, the collection vessel passes through one first conduit and the vacuum means
Connection is set, and is connect with the cavity by one second conduit.
2. the substrate fixed system of wet process as described in claim 1, which is characterized in that the collection vessel include one every
From device, the isolating device is used to the collection vessel inner space being divided into headspace and bottom space.
3. the substrate fixed system of wet process as claimed in claim 2, which is characterized in that the collection vessel further includes one
The drain pipe being connect with the bottom space and the valve being set on the drain pipe, the drain pipe are used for the bottom
The leakage solution discharge collected in portion space.
4. the substrate fixed system of wet process as claimed in claim 2, which is characterized in that the isolating device is a setting
Isolation board inside the collection vessel, the isolation board can rotate the collection vessel inner space dividing institute
State headspace and bottom space.
5. the substrate fixed system of wet process as claimed in claim 2, which is characterized in that the collection vessel includes mutual
Two containers of connection；The isolating device is a valve for being set to described two container junctions.
6. the substrate fixed system of wet process as claimed in claim 5, which is characterized in that described two containers can divide
From.
7. the substrate fixed system of wet process as described in claim 1, which is characterized in that the cavity bottom is funnel
There is the minimum point of shape, the cavity bottom one first trepanning, the collection vessel to pass through second conduit and described first
Trepanning connects.
8. the substrate fixed system of wet process as claimed in claim 7, which is characterized in that the collection vessel is to be set to
The cavity bottom and another cavity defined by the carrying platform.
9. the substrate fixed system of wet process as described in claim 1, which is characterized in that into one inside the collection vessel
Step is provided with liquid absorption material.
10. the substrate fixed system of wet process as described in claim 1, which is characterized in that set outside the collection vessel
It is equipped with a cooling device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710201298.6A CN108666254A (en) | 2017-03-30 | 2017-03-30 | A kind of substrate fixed system of wet process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710201298.6A CN108666254A (en) | 2017-03-30 | 2017-03-30 | A kind of substrate fixed system of wet process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108666254A true CN108666254A (en) | 2018-10-16 |
Family
ID=63786478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710201298.6A Pending CN108666254A (en) | 2017-03-30 | 2017-03-30 | A kind of substrate fixed system of wet process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108666254A (en) |
-
2017
- 2017-03-30 CN CN201710201298.6A patent/CN108666254A/en active Pending
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|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20181016 |