CN108660439A - A kind of new A LD hot well heaters - Google Patents
A kind of new A LD hot well heaters Download PDFInfo
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- CN108660439A CN108660439A CN201810409221.2A CN201810409221A CN108660439A CN 108660439 A CN108660439 A CN 108660439A CN 201810409221 A CN201810409221 A CN 201810409221A CN 108660439 A CN108660439 A CN 108660439A
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- heat
- hot well
- pipe
- conducting plate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Resistance Heating (AREA)
Abstract
The invention discloses a kind of new A LD hot well heaters, specifically include:Output end；Inner heat-conductive pipe end cap；Outer heat conducting pipe；Inner heat-conductive pipe；Heat-conducting plate；Outer heat conduction pipe end-cap；Input terminal.Inner heat-conductive pipe is placed in outer heat conducting pipe, including cylindrical tube and semi-circular cut-out, and heat-conducting plate includes semicircle shape and trapezoidal round shape.The present invention is intersected by introducing polylith heat-conducting plate and the residual gas not reacted in chamber is formed harmless gas discharge by hot well pyrolytic with inner heat-conductive pipe solder bond.The design method can increase time of the residual exhaust gases by hot well so that exhaust gas is more fully decomposed, it is ensured that the safety of exhaust emissions, meanwhile, which can make hot well internal temperature more uniform and stable, improve decomposition efficiency.
Description
Technical field
The present invention relates to atomic layer deposition (ALD) apparatus fields, and in particular to a kind of heat of atomic layer deposition (ALD) system
Derrick design device structure.
Background technology
Atomic layer deposition (atomic layer deposition, ALD), is a kind of special chemical vapour deposition technique,
It is to form film by the way that vaporous precursors pulse to be alternately passed through to reative cell and Chemisorption occurs on depositing base surface
A kind of method.ALD technique with unique self-limiting growth principle due to making it be led in microelectronics industry and nano material
Domain is paid close attention to, and Interl companies in 2007 are on semi-conductor industry 45nm technology nodes, by the ultra-thin chromium base of ALD deposition
Sull is introduced into metal-oxide semiconductor fieldeffect transistor (MOSFET) device, replaces traditional silica
Gate dielectric membrane, obtains that power consumption is lower, the faster Duo microprocessor of speed, and in recent years, ALD technique is in microelectronics, photoelectricity
The fields such as son, optics, nanotechnology, micro mechanical system, the energy, catalysis, bio-medical, display, corrosion-resistant and seal coating
Research it is in the ascendant, explosive growth is presented, ALD equipment and ALD material market are also just experiencing quickly development and growth.
The design of core component-hot well of ALD vent gas treatments is to determine the significant points of ALD exhaust emissions safeties,
Common ALD hot wells structure can substantially be divided into three kinds：Through type, spiral and filtering type.Wherein through type hot well, and at present
The most common type hot well mode, as the term suggests being to remain precursor source perpendicular through hot well, air-flow trend is once-through type, knot
Structure is simple, and exhaust gas is shorter by the time of hot well, and the energy needed for tail gas extraction is small, more energy saving, but also due to exhaust gas is logical
The time for crossing hot well is shorter, is easy to cause exhaust gas and does not decompose completely and is just discharged, it cannot be guaranteed that the safety of exhaust emissions.Spiral shell
Rotating hot well is that spiral column structure is presented in hot well internal pipeline, and the air-flow trend that exhaust gas passes through hot well is spiral, is increased
Flow channel length so that exhaust gas is greatly increased by the time of hot well, and pyrolytic can preferably occur for exhaust gas, but due to structure
It is more complicated, cause the processing technology difficulty of hot well larger, increases the cost of equipment, while tail gas extracts the energy of consumption more
It is more.Filtering type hot well is that filter device is added on the basis of through type, and basic principle is identical with through type, increases close to the inner portion
Filter device noxious substance is left, so relative to through type and it is spiral for need not be too high temperature, but
Be by the exhaust gas of hot well can be various, it cannot be guaranteed that filter device can effectively adsorb each exhaust gas, so more
Tend to single exhaust-gas treatment, it is almost rarely found in ALD practical applications.
The ALD equipment for producing and developing at present, basic type most of or for scientific experiment, overall cost and use
The structure of situation, hot well is still in the majority with through type, and there are the danger that exhaust gas cannot decompose completely, in ALD equipment developmental research
The structure design of hot well is improved there is an urgent need to a kind of device so that it is not influencing whole efficiency and is not increasing the basis of cost
On, improve the decomposition efficiency in unreacted precursor source in chamber, it is ensured that the safety of exhaust emissions.
Invention content
The technical problem to be solved by the present invention is to provide a kind of new A LD hot wells in view of the above shortcomings of the prior art to add
Hot device, the novel hot well heater can increase time of the residual exhaust gases by hot well so that and exhaust gas is more fully decomposed,
Ensure the safety of exhaust emissions, meanwhile, which can make hot well internal temperature more uniform and stable, improve and decompose
Efficiency.
The technical scheme is that：
A kind of new A LD hot well heaters, including output end, inner heat-conductive pipe end cap, outer heat conducting pipe, inner heat-conductive pipe, heat conduction
Plate, outer heat conduction pipe end-cap, input terminal；The inner heat-conductive pipe end cap is located at the both ends of inner heat-conductive pipe, connects with output end, input terminal
It connects；Its edge is connect with outer heat conduction inside pipe wall；The outer heat conducting pipe is cylindric, connects outer heat conduction pipe end-cap；Described is interior
Heat conducting pipe is placed in outer heat conducting pipe, including cylindrical tube and semi-circular cut-out；The heat-conducting plate is embedded in inner heat-conductive pipe；Described
Outer heat conduction pipe end-cap connects outer heat conducting pipe, and is fixed in ALD equipment, connects equipment and hot well.Input terminal is residual in chamber
Gas enters the feeder connection of hot well, and the gas after decomposition is discharged from output end.
Further, the heat-conducting plate includes outside semicircle shape and trapezoidal round shape, wherein semicircle shape diameter and inner heat-conductive pipe
Diameter is identical, and trapezoidal round shape diameter is identical with inner heat-conductive pipe internal diameter, positioning when being installed convenient for heat-conducting plate and inner heat-conductive pipe.
Further, the ALD hot well heaters are that polylith heat-conducting plate intersects structure, pass through heat to increase gas
The contact area of well and time.
Further, the semi-circular cut-out quantity is at least 9, to ensure that gas can contact leading for a certain amount of area
Hot plate.
Further, the semi-circular cut-out is up and down between the two apart from equal so that by gas and every piece lead
The contact area of hot plate is equal.
Further, the quantity of the heat-conducting plate and the quantity of semi-circular cut-out are identical, it is ensured that each semi-circular cut-out
There is mating heat-conducting plate.
Further, the thickness of the heat-conducting plate and semi-circular cut-out height are equal, when can play heat-conducting plate installation
Positioning action.
Further, the heat conduction plate suqare accounts for inner heat-conductive pipe sectional area up to 85%, allows gas to enough sufficient and leads
Hot plate contacts.
Further, the trapezoidal round shape is inserted into along semi-circular cut-out in inner heat-conductive pipe, contact site spot welding connection, energy
Enough preferably fixed inner heat-conductive pipes and heat-conducting plate.
Advantageous effect：
The invention discloses a kind of new A LD hot well heaters, i.e., introduce polylith in the hot well heater body of ALD system
The cross one another frame mode of heat-conducting plate, so that the gas not reacted in chamber is passed through the formation of hot well pyrolytic can directly arrange
The gas put, the design method can increase time of the residual gas by hot well so that exhaust gas is more fully decomposed, really
The safety of exhaust emissions is protected, meanwhile, which can make hot well internal temperature more uniform and stable, improve and decompose effect
Rate；The design technology of the present invention is simpler, smaller to existing equipment change, does not influence ALD overall appearances and other functions, is conducive to
Popularization and application and large-scale production.
Description of the drawings
Fig. 1 is the hot well structural schematic diagram of the present invention.
Fig. 2 is the inner heat-conductive pipe schematic diagram of the present invention.
Fig. 3 is the heat-conducting plate schematic diagram of the present invention.
Fig. 4 is the heat-conducting plate and inner heat-conductive pipe scheme of installation of the present invention.
Fig. 5 is that methane accounting compares line chart.
Wherein, output end 1；Inner heat-conductive pipe end cap 2；Outer heat conducting pipe 3；Inner heat-conductive pipe 4；Heat-conducting plate 5；Outer heat conduction pipe end-cap 6；
Input terminal 7；Cylindrical tube 8；Semi-circular cut-out 9；Semicircle shape part 10；Trapezoidal round shape part 11.
Specific implementation mode
The present invention is further illustrated with reference to Fig. 1 to Fig. 5.
A kind of 1 new A LD hot well heaters of embodiment
It is structural schematic diagram of the embodiment of the present invention, the novel hot well heater, as shown in Figure 1, specific packet such as Fig. 1
Include output end 1；Inner heat-conductive pipe end cap 2；Outer heat conducting pipe 3；Inner heat-conductive pipe 4；Heat-conducting plate 5；Outer heat conduction pipe end-cap 6 and input terminal 7.It is interior
Heat conduction pipe end-cap 2 is located at the both ends of inner heat-conductive pipe 4, is connect with output end 1, input terminal 7 by welding；Its edge by welding with
3 inner wall of outer heat conducting pipe welds, and outer heat conducting pipe 3 is cylindric, and heat-conducting plate 5 is embedded in inner heat-conductive pipe 4, and outer heat conduction pipe end-cap 6 passes through
Inner ring is welded to connect outer heat conducting pipe 3, and is bolted in ALD equipment, connects equipment and hot well.The ALD heat of the present invention
Well is that internal polylith heat-conducting plate intersects form, and unreacted precursor vapor enters hot well from input terminal 1 and heats in chamber
In device；Due to polylith heat-conducting plate 5 intersect structure make the precursor vapor by hot well move towards present S types, before increasing
The area that body steam is contacted with heat-conducting plate 5 and the time by hot well are driven, gas can be allowed to decompose more thorough；Wherein, it leads outside
Heat pipe 3 wraps up inner heat-conductive pipe 4 and inner heat-conductive pipe end cap 2, and output end 1 and input terminal 7 are connected to the inner heat-conductive pipe at both ends
It is logical through gas to leave behind input terminal 7 and output end 1 by welding so that hot well forms a closed state for end cap
It crosses, it is ensured that gas will not be revealed.
Fig. 2 illustrates 4 structural schematic diagram of inner heat-conductive pipe, including cylindrical tube 8 and semi-circular cut-out 9, semi-circular cut-out
Quantity must not be less than 9.Fig. 3 illustrates 5 structural schematic diagram of heat-conducting plate, including semicircle shape part 10 and trapezoidal round shape part
11, wherein semicircle shape diameter and 4 outer diameter of inner heat-conductive pipe is equal, the thickness of heat-conducting plate 5 and the semi-circular cut-out 9 of inner heat-conductive pipe 4
Highly equal, area accounts for 4 sectional area of inner heat-conductive pipe and is up to 85%.Fig. 4 is heat-conducting plate and inner heat-conductive pipe scheme of installation, heat conduction
Plate 5 is inserted into along semi-circular cut-out 9 in inner heat-conductive pipe 4 from trapezoidal round shape 11, and the trapezoidal round shape part of heat-conducting plate is mutually handed over after installation
Fork overlapping forms S type air-flows trend, and the part for installing contact is fixed by spot welding.
Embodiment 2 is using the new A LD hot wells heater of invention to emission detection data
In the present embodiment, to hot well of the present invention and common through type hot well exhaust sampling test analysis, wherein with trimethyl
Aluminium (TMA) is used as precursor source, to exhaust sampling, wherein 500 DEG C of hot well heating temperature, sample detection time 30min, sampling
Volume 100ML detects methane content per 3min, other obtain specific methane accounting line chart such as Fig. 5 such as embodiment 1
Since trimethyl aluminium (TMA) can slowly decompose generation methane under 500 DEG C of vacuum environments, as shown in figure 5, can send out
It is existing, methane gas is generated under hot well of the present invention and common through type hot well pyrolytic, either just starts to decompose or decompose
It completes the content that hot well of the present invention when tending towards stability generates methane and is above common through type hot well, while hot well high temperature of the present invention
It decomposes when completing that the required time is also fewer than common through type hot well, illustrates hot well mode of the present invention no matter from the completeness of decomposition
Or all it is an advantage over common through type hot well for the efficiency decomposed.
The present invention is the hot well heater body introducing cross one another frame mode of polylith heat-conducting plate in ALD system, is made
The gas not reacted in chamber by hot well pyrolytic formed can direct emission gas, which can increase
The time that residual gas passes through hot well so that exhaust gas is more fully decomposed, it is ensured that the safety of exhaust emissions, meanwhile, it should
Design method can make hot well internal temperature more uniform and stable, improve decomposition efficiency；The design technology of the present invention is simpler,
It is smaller to existing equipment change, ALD overall appearances and other functions are not influenced, are conducive to popularization and application and large-scale production, have
Good application prospect.
Protection scope of the present invention includes but not limited to embodiment of above, and protection scope of the present invention is with claims
Subject to, any replacement being readily apparent that those skilled in the art that this technology is made, deformation, improvement each fall within the present invention's
Protection domain.
Claims (9)
1. a kind of new A LD hot well heaters, which is characterized in that including output end (1), inner heat-conductive pipe end cap (2), outer heat conducting pipe
(3), inner heat-conductive pipe (4), heat-conducting plate (5), outer heat conduction pipe end-cap (6), input terminal (7)；The inner heat-conductive pipe end cap (2) is located at
The both ends of inner heat-conductive pipe (4) are connect with output end (1), input terminal (7)；Its edge is connect with outer heat conducting pipe (3) inner wall；It is described
Outer heat conducting pipe (3) be it is cylindric；The inner heat-conductive pipe (4) is placed in outer heat conducting pipe (3), including cylindrical tube (8) and semicircle
Shape notch (9)；The heat-conducting plate (5) is embedded in inner heat-conductive pipe (4)；The outer heat conduction pipe end-cap (6) is connected by inner ring
Outer heat conducting pipe (3), and be fixed in ALD equipment, connect equipment and hot well.
2. new A LD hot well heaters according to claim 1, which is characterized in that the heat-conducting plate (5) includes semicircle
Shape (10) and trapezoidal round shape (11).
3. new A LD hot well heaters according to claim 1, which is characterized in that the ALD hot well heaters are more
Block heat-conducting plate (5) intersects structure.
4. new A LD hot well heaters according to claim 1, which is characterized in that described semi-circular cut-out (9) quantity
At least 9.
5. new A LD hot well heaters according to claim 1, which is characterized in that the semi-circular cut-out (9) is up and down
Between the two apart from equal.
6. new A LD hot well heaters according to claim 1, which is characterized in that the quantity of the heat-conducting plate (5) and
The quantity of semi-circular cut-out (9) is identical.
7. new A LD hot well heaters according to claim 1, which is characterized in that the thickness of the heat-conducting plate (5) and
Semi-circular cut-out (9) height is equal.
8. new A LD hot well heaters according to claim 1, which is characterized in that in described heat-conducting plate (5) area accounts for
Heat conducting pipe (4) sectional area is up to 85%.
9. new A LD hot well heaters according to claim 2, which is characterized in that the trapezoidal round shape (11) is along half
Circular incision (9) is inserted into inner heat-conductive pipe (4), contact site spot welding connection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810409221.2A CN108660439A (en) | 2018-05-02 | 2018-05-02 | A kind of new A LD hot well heaters |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810409221.2A CN108660439A (en) | 2018-05-02 | 2018-05-02 | A kind of new A LD hot well heaters |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108660439A true CN108660439A (en) | 2018-10-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810409221.2A Pending CN108660439A (en) | 2018-05-02 | 2018-05-02 | A kind of new A LD hot well heaters |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1379732A (en) * | 1999-10-18 | 2002-11-13 | 高级技术材料公司 | Abatement of effluents from chemical vapor deposition processes using organome tallicsource reagents |
| KR20060098042A (en) * | 2005-03-08 | 2006-09-18 | 삼성전자주식회사 | Trap for promoting efficiency and chemical vapor deposition appartus having the same |
| CN201840964U (en) * | 2010-10-19 | 2011-05-25 | 英作纳米科技（北京）有限公司 | Tail gas absorbing device for atomic layer deposition reaction |
| CN201978651U (en) * | 2010-12-24 | 2011-09-21 | 河北汉盛光电科技有限公司 | Heat trap |
| CN102634772A (en) * | 2012-04-26 | 2012-08-15 | 汉能科技有限公司 | Process tail gas treatment system |
-
2018
- 2018-05-02 CN CN201810409221.2A patent/CN108660439A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1379732A (en) * | 1999-10-18 | 2002-11-13 | 高级技术材料公司 | Abatement of effluents from chemical vapor deposition processes using organome tallicsource reagents |
| KR20060098042A (en) * | 2005-03-08 | 2006-09-18 | 삼성전자주식회사 | Trap for promoting efficiency and chemical vapor deposition appartus having the same |
| CN201840964U (en) * | 2010-10-19 | 2011-05-25 | 英作纳米科技（北京）有限公司 | Tail gas absorbing device for atomic layer deposition reaction |
| CN201978651U (en) * | 2010-12-24 | 2011-09-21 | 河北汉盛光电科技有限公司 | Heat trap |
| CN102634772A (en) * | 2012-04-26 | 2012-08-15 | 汉能科技有限公司 | Process tail gas treatment system |
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Application publication date: 20181016 |
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