CN108630828A - A kind of Organnic electroluminescent device and preparation method thereof - Google Patents
A kind of Organnic electroluminescent device and preparation method thereof Download PDFInfo
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- CN108630828A CN108630828A CN201710160511.3A CN201710160511A CN108630828A CN 108630828 A CN108630828 A CN 108630828A CN 201710160511 A CN201710160511 A CN 201710160511A CN 108630828 A CN108630828 A CN 108630828A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
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Abstract
The present invention relates to field of organic electroluminescence, and in particular to a kind of Organnic electroluminescent device and preparation method thereof, the preparation method of the Organnic electroluminescent device includes the following steps：First electrode is formed on substrate；The insulated column for limiting pixel unit is formed on the first electrode, and the cross section of the insulated column is inverted trapezoidal；The first organic function layer is formed in the pixel unit；Heat the insulated column so that the insulated column top, which is collapsed, is deformed into the cross section of nearly trapezoid；Form second electrode.The preparation method of Organnic electroluminescent device provided by the invention, pixel filling is insufficient when on the one hand solving the problems, such as to be formed the first organic function layer, when on the other hand solving vapor deposition and form second electrode, the discontinuous problem of electrode, in addition, the preparation method is relatively simple, and preparation difficulty is relatively low, and cost is relatively low.
Description
Technical field
The present invention relates to field of organic electroluminescence, and in particular to a kind of Organnic electroluminescent device and preparation method thereof.
Background technology
Organnic electroluminescent device (full name in English is Organic Light-Emitting Display, referred to as OLED)
It is active luminescent device, principle is that compound generate shines after being injected with machine semiconductive thin film by positive negative carrier.Compared to existing
There are Thin Film Transistor-LCD (abbreviation LCD) in flat panel display, plasma display panel (abbreviation PDP), uses
The organic light-emitting display device of Organic Light Emitting Diode has many advantages, such as that high contrast, wide viewing angle, low-power consumption, volume are thinner, has
Hoping becomes next-generation mainstream flat panel display, is most one of technology that attracts attention in current flat panel display.
Organic Light Emitting Diode is layer structure so that Organnic electroluminescent device can use inkjet printing technology system
Standby, process costs are low.In existing production technology, it will usually which insulated column is set on the substrate for be coated with conductive anode, to assist spraying
Drop positioning in black printing technology and pixel graphics.The cross section of insulated column is generally trapezoid or inverted trapezoidal, in ink-jet
In printing technology, pixel filling is incomplete when trapezoid insulated column is easy to cause the injection of OLED ink materials, and inverted trapezoidal is isolated
Although column can guarantee that pixel is sufficient filling with, it is easy to cause the discontinuous problem of electrode in cathode evaporation, reduces device
Reliability.
In order to solve problem above, the following two modes of industry generally use solve at present：First, setting insulated column to
Inverted trapezoidal structure fills and leads up inverted trapezoidal insulated column, to ensure the continuity of cathode by the way that thick metallic cathode is deposited；Another kind is to incite somebody to action
Insulated column is set as trapezoid structure, and finely regulating insulated column surface energy controls the contact angle of ink and insulated column, prevents drying
Ink contraction in the process causes pixel filling incomplete.Although first method solves the problems, such as that cathode is discontinuous, but increase
Manufacturing cost is added；Although second of technique solves the problems, such as that pixel filling is incomplete, but more demanding to craft precision,
Increase preparation difficulty.
Invention content
For this purpose, to be solved by this invention is that how simply to solve pixel filling in OLED device preparation process incomplete
With the discontinuous problem of cathode.
In order to solve the above technical problems, the technical solution adopted by the present invention is as follows：
The present invention provides a kind of preparation method of Organnic electroluminescent device, includes the following steps：
First electrode is formed on substrate；
The insulated column for limiting pixel unit is formed on the first electrode, and the cross section of the insulated column is terraced
Shape；
The first organic function layer is formed in the pixel unit；
Heat the insulated column so that the insulated column top, which is collapsed, is deformed into the cross section of nearly trapezoid；
Form second electrode.
Optionally, further include that the second organic function layer is formed in the pixel unit after the heating stepses
Step.
Optionally, in the heating stepses, heating temperature is greater than or equal to the glass transition temperature of the isolation column material
Degree.
Optionally, 120 DEG C~200 DEG C of the glass transition temperature of the isolation column material.
Optionally, the first organic function layer step that formed in the pixel unit specifically includes：
Ink layer is formed by InkJet printing processes；
The dry ink layer.
Optionally, the step of drying ink layer is to be heated to 200 DEG C by room temperature.
Optionally, in the inverted trapezoidal structure, the angle of trapezoidal upper surface and bevel edge is 30 °~89 °.
Optionally, in the trapezoid structure, the angle of trapezoidal upper surface and bevel edge is 91 °~150 °.
Optionally, the insulated column is prepared using the method for negativity photoresist photoetching.
The present invention also provides a kind of Organnic electroluminescent devices prepared by above-mentioned preparation method.
The above technical solution of the present invention has the following advantages over the prior art：
The preparation method of Organnic electroluminescent device provided in an embodiment of the present invention is formed transversal on the first electrode first
Face is the insulated column of inverted trapezoidal, and then filler pixels form the first organic function layer in the pixel unit defined by insulated column,
Since the cross section of preformed insulated column is inverted trapezoidal shape, when forming the first organic function layer, film layer can be abundant
It is filled in pixel unit, film side is along the performance stabilization that ensure that the first organic function layer with the adhesive force between insulated column
Property；It is finished when the first organic function layer is formed, passes through and heat insulated column so that the top of insulated column collapses to form nearly trapezoid
Then cross section is deposited and forms second electrode, since the cross-sectional shape on insulated column top is trapezoid shape, vapor deposition second
When electrode, the continuity of second electrode ensure that, and then ensure that the use for the Organnic electroluminescent device being prepared is reliable
Property.The preparation method of Organnic electroluminescent device provided by the invention, picture when on the one hand solving to form the first organic function layer
Element fills insufficient problem, when on the other hand solving vapor deposition and forming second electrode, the discontinuous problem of electrode, in addition, should
Preparation method is relatively simple, and preparation difficulty is relatively low, and cost is relatively low.
In the preparation method of Organnic electroluminescent device provided in an embodiment of the present invention, the heating temperature of insulated column is more than
Or the glass transition temperature equal to isolation column material, as a result, isolation column material can reach glass transition temperature, object
Reason structure changes so that the top of insulated column, which is collapsed, becomes trapezoid shape.
In the preparation method of Organnic electroluminescent device provided in an embodiment of the present invention, the glass transition of column material is isolated
120 DEG C~200 DEG C of temperature, the temperature value ensure that the stability that rod structure is isolated at room temperature, ensure that and add to insulated column
In thermal process, the performance of the first organic function layer formed is unaffected.
In the preparation method of Organnic electroluminescent device provided in an embodiment of the present invention, the formation packet of the first organic function layer
The step of forming ink layer by InkJet printing processes is included, further includes the steps that dry ink layer.InkJet printing processes are to use
Solvent dissolves OLED organic materials, then by its direct spray printing in pixel unit, compared to traditional fine metal mask
Version (FMM) evaporation process, InkJet printing processes are simpler, and manufacturing cost is lower；Promote ink layer by way of heating again
Drying and forming-film, to form the first organic function layer.
A kind of Organnic electroluminescent device prepared by above-mentioned preparation method provided in an embodiment of the present invention, relative to tradition
Organnic electroluminescent device, pixel filling is more complete, and electrode also more has continuity, and whole performance is more stable more
Reliably.
Description of the drawings
In order to make the content of the present invention more clearly understood, it below according to specific embodiments of the present invention and combines
Attached drawing, the present invention is described in further detail, wherein
Fig. 1 is the partial schematic diagram in the Organnic electroluminescent device preparation process that embodiment provides；
Fig. 2 is the partial schematic diagram in the Organnic electroluminescent device preparation process that embodiment provides；
Reference numeral is expressed as in figure：1- substrates；2- first electrodes；3- pixel units；4- insulated columns；First organic work(of 5-
Ergosphere；6- second electrodes；The second organic function layers of 7-.
Specific implementation mode
To make the objectives, technical solutions, and advantages of the present invention clearer, below in conjunction with attached drawing to the reality of the present invention
The mode of applying is described in further detail.
The present invention can be embodied in many different forms, and should not be construed as limited to embodiment set forth herein.
On the contrary, providing these embodiments so that the disclosure will be thorough and complete, and the design of the present invention will be fully conveyed to
Those skilled in the art, the present invention will only be defined by the appended claims.In the accompanying drawings, for clarity, the areas Ceng He can be exaggerated
The size and relative size in domain.
Embodiment
A kind of preparation method of Organnic electroluminescent device is present embodiments provided, as shown in Fig. 1~2, including following step
Suddenly：
S1, first electrode 2 is formed on substrate 1；
S2, insulated column 4 for limiting pixel unit 3 is formed on the first electrode 2, the cross section of insulated column 4 is to fall ladder
Shape；
As an embodiment of the present invention, in the present embodiment, the material of insulated column 4 is negativity photoresist, glass transition
Temperature is 200 DEG C, and preparation method is photolithography patterning；In inverted trapezoidal structure, the angle of trapezoidal upper surface and bevel edge is 30 °.
As the convertible embodiment of the present invention, glass transition temperature is 120 DEG C, in inverted trapezoidal structure, trapezoidal upper table
The angle of face and bevel edge is 89 °；As the convertible embodiment of the present invention, in inverted trapezoidal structure, trapezoidal upper surface and bevel edge
Angle can be 30 °~89 °, and the purpose of the present invention may be implemented, belong to the scope of protection of the present invention.
S3, the first organic function layer 5 is formed in pixel unit 3；
As an embodiment of the present invention, in the present embodiment, the forming step of the first organic function layer 5 specifically includes：
The step of ink layer being formed by InkJet printing processes.InkJet printing processes are to use solvent by OLED organic materials
Dissolving, then by its direct spray printing in pixel unit 3, compared to traditional fine metal mask version (FMM) evaporation process, spray
Black printing technology is simpler, and manufacturing cost is lower, and pixel precision higher.
The step of dry ink layer.Promote ink layer drying and forming-film by way of heating, to form first organic work(
The edge of ergosphere 5, the first organic function layer 5 is attached on the side wall of insulated column.
S4, heating insulated column 4 so that 4 top of insulated column, which is collapsed, is deformed into the cross section of nearly trapezoid；
As an embodiment of the present invention, in the present embodiment, drying steps are to be heated to 200 DEG C by room temperature；Heating side
Formula is hot plate.
As an embodiment of the present invention, in the present embodiment, heating temperature is greater than or equal to the glass of 4 material of insulated column
Change transition temperature.It is greater than or equal to the glass transition temperature of 4 material of insulated column to the heating temperature of insulated column 4, as a result,
4 material of insulated column can reach glass transition temperature so that the top of insulated column 4, which is collapsed, becomes trapezoid shape.
As an embodiment of the present invention, in the present embodiment, in trapezoid structure, the angle of trapezoidal upper surface and bevel edge
It is 91 °；As the convertible embodiment of the present invention, the angle of trapezoidal upper surface and bevel edge is 150 °；As the variable of the present invention
Change embodiment, the angle of trapezoidal upper surface and bevel edge can also be 91 °~150 °, and the purpose of the present invention may be implemented, belong to
Protection scope of the present invention.
S5, the second organic function layer 7 is formed in pixel unit 3；Second organic function layer 7 can pass through above-mentioned ink-jet
Printing technology or evaporation process are formed；
S6, second electrode 6 is formed.
When practical preparation, substrate 1 can be glass substrate or polymeric substrates, and first electrode 2 is high work function electrode, the
Two electrodes 6 are low work function electrodes.
As an embodiment of the present invention, in the present embodiment, the first organic function layer 5 includes that stacked hole is injected
At least one layer in layer, hole transmission layer and electronic barrier layer, the second organic function layer 7 include organic luminous layer, further include folding
At least one layer in hole blocking layer, electron transfer layer and the electron injecting layer set.
As the convertible embodiment of the present invention, the first organic function layer 5 includes the hole injection layer being stacked, hole transport
At least one layer in layer and electronic barrier layer and organic luminous layer, the second organic function layer 7 include the hole blocking layer being stacked, electricity
At least one layer in sub- transport layer and electron injecting layer.Hole injection layer, hole transmission layer, electronic barrier layer, hole blocking layer,
The setting of any layer can be so that the carrier that first electrode 2 and second electrode 6 provide in electron transfer layer and electron injecting layer
It is easier to be transmitted to organic luminous layer and combines and send out photon, improve the working performance of Organnic electroluminescent device.It can not also
Second organic function layer is set, and the first organic function layer is only organic luminous layer, and the purpose of the present invention may be implemented, and belongs to this
The protection domain of invention.
Have when forming the first organic function layer 5 since the cross section of preformed insulated column 4 is inverted trapezoidal shape
Machine material can be sufficient filling in pixel unit 3, ensure that the membranous layer stability of the first organic function layer 5.When first organic
The formation of functional layer 5 finishes, by heating insulated column 4 so that the top of insulated column 4 collapses the cross section to form nearly trapezoid, so
After form the second organic function layer 7 and second electrode 6, due to 4 top of insulated column cross-sectional shape be trapezoid shape, steam
When plating second electrode 6, the continuity of second electrode 6 ensure that, and then ensure the Organnic electroluminescent device being prepared
Use reliability.
On the one hand the preparation method of Organnic electroluminescent device provided by the invention solves to form the first organic function layer
Pixel filling insufficient problem when 5；When on the other hand solving vapor deposition and form second electrode 6, the discontinuous problem of electrode.Separately
Outside, the preparation method is relatively simple, and technology difficulty is relatively low, and cost is relatively low.
As an embodiment of the present invention, in the present embodiment, in above-mentioned heating stepses S4, the glass of 4 material of insulated column
Glass transition temperature can also be 120 DEG C~200 DEG C, and the purpose of the present invention may be implemented, belong to the scope of protection of the present invention.
The glass transition temperature of 4 material of insulated column is 120 DEG C~200 DEG C, which ensure that 4 structure of insulated column at room temperature
Stability is ensured that in 4 heating process of insulated column, the performance of the first organic function layer 5 formed will not be by shadow
It rings.Meanwhile for polymeric substrates, this temperature does not influence the performance of substrate in the tolerance range of polymeric substrates.
The present embodiment additionally provides a kind of Organnic electroluminescent device prepared by above-mentioned preparation method, relative to traditional
The pixel filling of Organnic electroluminescent device, Organnic electroluminescent device pixel unit of the invention is more complete, and electrode is also more
With continuity, whole performance is more stable more reliable.
Obviously, the above embodiments are merely examples for clarifying the description, and does not limit the embodiments.It is right
For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of variation or
It changes.There is no necessity and possibility to exhaust all the enbodiments.And it is extended from this it is obvious variation or
Variation is still in the protection scope of this invention.
Claims (10)
1. a kind of preparation method of Organnic electroluminescent device, which is characterized in that include the following steps：
First electrode (2) is formed on substrate (1)；
Form insulated column (4) for limiting pixel unit (3) in the first electrode (2), the insulated column (4) it is transversal
Face is inverted trapezoidal；
The first organic function layer (5) is formed in the pixel unit (3)；
Heat the insulated column (4) so that insulated column (4) top, which is collapsed, is deformed into the cross section of nearly trapezoid；
Form second electrode (6).
2. the preparation method of Organnic electroluminescent device according to claim 1, which is characterized in that in the heating stepses
Later, further include the steps that the second organic function layer (7) is formed in the pixel unit (3).
3. the preparation method of Organnic electroluminescent device according to claim 1, which is characterized in that the heating stepses
In, heating temperature is greater than or equal to the glass transition temperature of the insulated column (4) material.
4. according to the preparation method of claim 1-3 any one of them Organnic electroluminescent devices, which is characterized in that it is described every
120 DEG C~200 DEG C of glass transition temperature from column (4) material.
5. according to the preparation method of claim 1-3 any one of them Organnic electroluminescent devices, which is characterized in that it is described
The first organic function layer (5) step is formed in the pixel unit (3) to specifically include：
Ink layer is formed by InkJet printing processes；
The dry ink layer.
6. the preparation method of Organnic electroluminescent device according to claim 5, which is characterized in that the drying ink
The step of water layer is to be heated to 200 DEG C by room temperature.
7. according to the preparation method of claim 1-3 any one of them Organnic electroluminescent devices, which is characterized in that it is described fall
In trapezium structure, the angle of trapezoidal upper surface and bevel edge is 30 °~89 °.
8. according to the preparation method of claim 1-3 any one of them Organnic electroluminescent devices, which is characterized in that it is described just
In trapezium structure, the angle of trapezoidal upper surface and bevel edge is 91 °~150 °.
9. according to the preparation method of claim 1-3 any one of them Organnic electroluminescent devices, which is characterized in that it is described every
It is prepared using the method for negativity photoresist photoetching from column (4).
10. a kind of Organnic electroluminescent device prepared using claim 1-9 any one of them methods.
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| CN113140689A (en) * | 2021-04-16 | 2021-07-20 | 京东方科技集团股份有限公司 | Display substrate, preparation method thereof and display device |
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