CN108603789B - 用于超光谱成像计量的系统及方法 - Google Patents
用于超光谱成像计量的系统及方法 Download PDFInfo
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- CN108603789B CN108603789B CN201780009256.0A CN201780009256A CN108603789B CN 108603789 B CN108603789 B CN 108603789B CN 201780009256 A CN201780009256 A CN 201780009256A CN 108603789 B CN108603789 B CN 108603789B
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US201662290157P | 2016-02-02 | 2016-02-02 | |
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US15/233,648 US10018560B2 (en) | 2016-02-02 | 2016-08-10 | System and method for hyperspectral imaging metrology |
US15/233,648 | 2016-08-10 | ||
PCT/US2017/015248 WO2017136229A1 (en) | 2016-02-02 | 2017-01-27 | System and method for hyperspectral imaging metrology |
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CN108603789A CN108603789A (zh) | 2018-09-28 |
CN108603789B true CN108603789B (zh) | 2021-10-08 |
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CN201780009256.0A Active CN108603789B (zh) | 2016-02-02 | 2017-01-27 | 用于超光谱成像计量的系统及方法 |
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US (1) | US10018560B2 (de) |
EP (1) | EP3411681A4 (de) |
JP (1) | JP6934879B2 (de) |
KR (1) | KR102424799B1 (de) |
CN (1) | CN108603789B (de) |
IL (1) | IL260415B (de) |
TW (1) | TWI714716B (de) |
WO (1) | WO2017136229A1 (de) |
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CN109643068B (zh) * | 2016-08-23 | 2021-10-01 | Asml荷兰有限公司 | 量测设备和用于测量结构的方法和光刻系统 |
EP3336495B1 (de) * | 2016-12-16 | 2024-02-14 | F. Hoffmann-La Roche AG | Charakterisierung der emissionseigenschaften von proben |
TWI622810B (zh) * | 2017-04-26 | 2018-05-01 | 和碩聯合科技股份有限公司 | 成像裝置及成像方法 |
US11474288B2 (en) * | 2017-05-04 | 2022-10-18 | Nkt Photonics A/S | Light system for supplying light |
US10401738B2 (en) * | 2017-08-02 | 2019-09-03 | Kla-Tencor Corporation | Overlay metrology using multiple parameter configurations |
CN107666351B (zh) * | 2017-09-30 | 2019-10-15 | 长春理工大学 | 采用超连续谱载波源大气通信系统 |
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US11802841B2 (en) | 2018-02-27 | 2023-10-31 | Hitachi High-Tech Corporation | Defect detection device, defect detection method, and defect observation device |
US10536686B1 (en) * | 2018-08-02 | 2020-01-14 | Synaptive Medical (Barbados) Inc. | Exoscope with enhanced depth of field imaging |
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US10816464B2 (en) * | 2019-01-23 | 2020-10-27 | Applied Materials, Inc. | Imaging reflectometer |
EP3977091A1 (de) | 2019-05-31 | 2022-04-06 | Cytognos, S.L. | Zytometriesystem zur hyperspektralen quantitativen bildgebung |
EP3783438A1 (de) * | 2019-08-21 | 2021-02-24 | ASML Netherlands B.V. | Wellenlängenauswahlmodul, beleuchtungssystem und metrologiesystem |
US11933717B2 (en) * | 2019-09-27 | 2024-03-19 | Kla Corporation | Sensitive optical metrology in scanning and static modes |
US11417010B2 (en) * | 2020-05-19 | 2022-08-16 | Applied Materials, Inc. | Image based metrology of surface deformations |
CN112108775A (zh) * | 2020-09-09 | 2020-12-22 | 湖南鼎一致远科技发展有限公司 | 一种并行控制激光的装置、方法及激光打标机 |
CN114112043B (zh) * | 2021-11-12 | 2023-11-07 | 杭州电子科技大学 | 一种光谱成像装置 |
KR102684804B1 (ko) | 2024-02-06 | 2024-07-12 | 주식회사 스키놀 | 경사형 프로브를 이용한 라만 초분광 깊이 프로파일 측정 시스템 |
KR102684802B1 (ko) | 2024-02-06 | 2024-07-12 | 주식회사 스키놀 | 라만 초분광의 분광 감도를 개선한 분광부 및 이를 구비한 라만 초분광 시스템 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101512309A (zh) * | 2006-08-31 | 2009-08-19 | 卡尔蔡司Sms有限责任公司 | 用于位置分辨地确定在物体成像的图像平面中电磁场的相位和幅度的方法和装置 |
CN103913807A (zh) * | 2013-01-07 | 2014-07-09 | 株式会社理光 | 光场成像系统、及调节全光成像系统的方法 |
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KR102424799B1 (ko) | 2022-07-22 |
US20170219487A1 (en) | 2017-08-03 |
TW201732271A (zh) | 2017-09-16 |
WO2017136229A1 (en) | 2017-08-10 |
EP3411681A4 (de) | 2019-09-25 |
IL260415B (en) | 2021-05-31 |
JP6934879B2 (ja) | 2021-09-15 |
US10018560B2 (en) | 2018-07-10 |
KR20180101604A (ko) | 2018-09-12 |
CN108603789A (zh) | 2018-09-28 |
JP2019504325A (ja) | 2019-02-14 |
TWI714716B (zh) | 2021-01-01 |
EP3411681A1 (de) | 2018-12-12 |
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