CN108588685B - 一种半导体生产用等离子辅助化学气相沉积装置 - Google Patents
一种半导体生产用等离子辅助化学气相沉积装置 Download PDFInfo
- Publication number
- CN108588685B CN108588685B CN201810568972.9A CN201810568972A CN108588685B CN 108588685 B CN108588685 B CN 108588685B CN 201810568972 A CN201810568972 A CN 201810568972A CN 108588685 B CN108588685 B CN 108588685B
- Authority
- CN
- China
- Prior art keywords
- wall cover
- air
- crystal bracket
- pipe
- pole piece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810568972.9A CN108588685B (zh) | 2018-06-05 | 2018-06-05 | 一种半导体生产用等离子辅助化学气相沉积装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810568972.9A CN108588685B (zh) | 2018-06-05 | 2018-06-05 | 一种半导体生产用等离子辅助化学气相沉积装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108588685A CN108588685A (zh) | 2018-09-28 |
CN108588685B true CN108588685B (zh) | 2020-10-30 |
Family
ID=63630849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810568972.9A Active CN108588685B (zh) | 2018-06-05 | 2018-06-05 | 一种半导体生产用等离子辅助化学气相沉积装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108588685B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111334774A (zh) * | 2018-12-18 | 2020-06-26 | 夏泰鑫半导体(青岛)有限公司 | 气体反应装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102747340B (zh) * | 2011-04-22 | 2015-06-17 | 英属开曼群岛商精曜有限公司 | 等离子体辅助式化学气相沉积装置 |
CN102938389B (zh) * | 2012-11-20 | 2016-09-07 | 上海华虹宏力半导体制造有限公司 | 沉积装置 |
-
2018
- 2018-06-05 CN CN201810568972.9A patent/CN108588685B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN108588685A (zh) | 2018-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108588685B (zh) | 一种半导体生产用等离子辅助化学气相沉积装置 | |
CN212013149U (zh) | 一种太阳能板生产线用防静电结构 | |
CN201949948U (zh) | 一种喷管总成及具有所述喷管总成的湿制程设备 | |
CN219585406U (zh) | 一种胶带输送机转载点防尘装置 | |
CN208213832U (zh) | 一种屏幕除静电除尘装置 | |
CN208537534U (zh) | 一种地下水污染检测装置 | |
CN206464079U (zh) | 一种湿式静电除尘设备 | |
CN211133409U (zh) | 一种高效型市政喷雾降尘设备 | |
CN219287787U (zh) | 一种晶圆的检测装置 | |
CN221581463U (zh) | 一种土壤修复剂喷洒设备 | |
CN219376545U (zh) | 一种破碎段双流体喷雾抑尘装置 | |
CN213700426U (zh) | 一种塑料开关面板油漆喷涂装置 | |
CN110624745A (zh) | 一种电工机械专用自动化的喷漆装置 | |
CN220464320U (zh) | 一种防扬尘混凝土搅拌系统 | |
CN221169641U (zh) | 一种金矿开采用降尘装置 | |
CN218423511U (zh) | 一种铝板材料生产加工用新型喷枪 | |
CN211659572U (zh) | 一种建筑工地用除尘雾炮机 | |
CN215357964U (zh) | 一种半导体晶圆抛光设备用除尘装置 | |
CN215940430U (zh) | 一种用于工厂喷漆房喷漆加工的室内空气检测装置 | |
CN108684279A (zh) | 一种具有散热功能的农业喷雾器 | |
CN219400622U (zh) | 一种管道修复用便于调节喷涂厚度的旋杯喷涂装置 | |
CN215314530U (zh) | 一种高效的氧化锌输送收集装置 | |
CN218880550U (zh) | 一种市政道路喷涂划线装置 | |
CN221492908U (zh) | 一种除臭喷雾设备 | |
CN209254149U (zh) | 一种适用于喷雾干燥机的雾化装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20200929 Address after: 276800 new energy automobile industrial park, No.57, Shanhe Road, Chaohe Town, Wulian County, Rizhao City, Shandong Province Applicant after: Meiruo Technology Co.,Ltd. Address before: 310014, Zhejiang City, No. 18 Chao Wang Road, Zhejiang University of Technology Applicant before: Liang Ya |
|
TA01 | Transfer of patent application right | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP02 | Change in the address of a patent holder |
Address after: 276800 No.57 Shanhe Road, Shibei Economic Development Zone, Wulian County, Rizhao City, Shandong Province Patentee after: Meiruo Technology Co.,Ltd. Address before: 276800 new energy automobile industrial park, 57 Shanhe Road, Chaohe Town, Wulian County, Rizhao City, Shandong Province Patentee before: Meiruo Technology Co.,Ltd. |
|
CP02 | Change in the address of a patent holder |