CN108551716A - A kind of plasma generating apparatus - Google Patents
A kind of plasma generating apparatus Download PDFInfo
- Publication number
- CN108551716A CN108551716A CN201810735642.4A CN201810735642A CN108551716A CN 108551716 A CN108551716 A CN 108551716A CN 201810735642 A CN201810735642 A CN 201810735642A CN 108551716 A CN108551716 A CN 108551716A
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- density gradient
- plasma
- metal mesh
- metal net
- anode metal
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- 239000002184 metal Substances 0.000 claims abstract description 95
- 229910052751 metal Inorganic materials 0.000 claims abstract description 95
- 238000010438 heat treatment Methods 0.000 claims description 15
- 229910045601 alloy Inorganic materials 0.000 claims description 13
- 239000000956 alloy Substances 0.000 claims description 13
- 229910000833 kovar Inorganic materials 0.000 claims description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000010407 anodic oxide Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 238000009826 distribution Methods 0.000 abstract description 10
- 230000005284 excitation Effects 0.000 abstract description 2
- 238000009827 uniform distribution Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 230000037237 body shape Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000005433 ionosphere Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
The present invention discloses a kind of plasma generating apparatus, including anode metal net, electron emitting device, density gradient adjust metal mesh, magnetic field generating arrangement and the first power supply.Electron emitting device is to the direction launching electronics of anode metal mesh, and magnetic field generating arrangement is in the axial magnetic field that applies of two metal meshes to constrain plasma.Voltage value by adjusting the first power supply adjusts plasma potential；Two parts will be divided by its plasma by adjusting metal mesh by density gradient, this two-part plasma has different electron density, therefore adjusts the radial distribution that metal mesh can adjust the electron density of plasma by density gradient.To realize electric potential uniform distribution, the generation of the controllable plasma of electron density gradient, and then unstability and the fluctuation of the plasma of electron density gradient excitation can be studied in laboratory conditions.
Description
Technical field
The present invention relates to technical field of plasma, more specifically to a kind of plasma generating apparatus.
Background technology
Electron density gradient is also referred to as electron pressure gradient, is a kind of important free energy source of plasma instability.
In solar-terrestrial physics, in solar wind, ionosphere and magnetosphere, the plasma instability and wave of the excitation of electron density gradient
It is dynamic, it is of great significance to the research of space science and safety satellite field.Traditional research method to this problem is to pass through
Launch Detection Satellite obtains the physical parameter in solar-terrestrial physics, resolution ratio and the satellite fortune of restricted clearance instrument with sounding rocket
Dynamic periodicity, the phenomenon that being excited to many density gradients, are difficult to study.Therefore, there is an urgent need for a kind of realization laboratory items now
The equipment that the electron density gradient of plasma is controlled under part.
Invention content
In view of this, the present invention proposes a kind of plasma generating apparatus, electric potential uniform to be realized is distributed, electron density is terraced
The generation for spending controllable plasma, to make laboratory research electron density gradient excite plasma unstability and
The purpose of fluctuation.
To achieve the goals above, it is proposed that scheme it is as follows：
A kind of plasma generating apparatus, including：
Anode metal net 1；
With the electron emitting device 2 of the anode metal net 1 being oppositely arranged on one side；
Density gradient tune described in metal mesh 3 is adjusted with the density gradient that the another side of the anode metal net 1 is oppositely arranged
It includes a circular through hole 31 to save metal mesh 3, and the density gradient adjusts net 3 and is grounded；
The cathode of positive the first power supply U1, the first power supply U1 being connect with the anode metal net 1 is grounded；
And adjust the axial magnetic field for applying magnetic field of metal mesh 3 in the anode metal net 1 and the density gradient
Generating means 4.
Optionally, the electron emitting device 2, including：
With the oxide-coated cathode plate 21 of the anode metal net 1 being oppositely arranged on one side；
To the heating device 22 of the anodic oxide cathode plate 21 heating；
And the second source that cathode is connect with the oxide-coated cathode plate 21, anode is connect with the anode metal net 1
U2。
Optionally, the heating device 22 specifically includes：
Third power supply U3；
And the heating wire R being connect with the third power supply U3.
Optionally, the oxide-coated cathode plate 21 is specially:
Spraying thermionic source made of oxide in nickel plate.
Optionally, plasma generating apparatus further includes：Shell 5；
The anode metal net 1, the electron emitting device 2, density gradient adjusting metal mesh 3 are arranged at described
In shell 5.
Optionally, the anode metal net 1 and the density gradient adjust metal mesh 3 and are fixed by kovar alloy stick 34
In the shell 5.
Optionally, the kovar alloy stick 34 and the frame 11 of the anode metal net 1 are connected through a screw thread.
Optionally, the kovar alloy stick 34 and the frame 32 of density gradient adjusting metal mesh 3 are connected through a screw thread.
Optionally, the shape of the anode metal net 1 is circle.
Optionally, the shape that the density gradient adjusts metal mesh 3 is annulus.
Compared with prior art, technical scheme of the present invention has the following advantages：
A kind of plasma generating apparatus that above-mentioned technical proposal provides, including：Anode metal net 1, electron emitting device
2, density gradient adjusts metal mesh 3, magnetic field generating arrangement 4 and the first power supply U1.Electron emitting device 2 to anode metal mesh 1 with
And density gradient adjusts the direction launching electronics of metal mesh 3, magnetic field generating arrangement 4 two metal meshes it is axial apply magnetic field with
Constrain plasma.By adjusting the voltage value of the first power supply U1, plasma potential can be adjusted；Since metal mesh can absorb
Fall a part of example and filter out a part of electronics, therefore adjusts metal mesh 3 by density gradient to pass through its plasma
It is divided into the body shape part that density gradient adjusts 31 part of circular through hole and density gradient adjusting metal mesh 3 of metal mesh 3, this
Two-part plasma has different electron density, therefore can adjust plasma by density gradient adjusting metal mesh 3
The radial distribution of the electron density of body.To realize electric potential uniform distribution, the life of the controllable plasma of electron density gradient
At so as to study unstability and the fluctuation of the plasma that electron density gradient excites in laboratory conditions.
Description of the drawings
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
The embodiment of invention for those of ordinary skill in the art without creative efforts, can also basis
The attached drawing of offer obtains other attached drawings.
Fig. 1 is a kind of structural schematic diagram of plasma generating apparatus provided in an embodiment of the present invention；
Fig. 2 is a kind of structural schematic diagram of anode metal net provided in an embodiment of the present invention；
Fig. 3 is the structural schematic diagram that a kind of density gradient provided in an embodiment of the present invention adjusts metal mesh；
Fig. 4 is a kind of structural schematic diagram of electronic emitter provided in an embodiment of the present invention；
Fig. 5 is a kind of structural schematic diagram of heating device provided in an embodiment of the present invention；
Fig. 6 is the structural schematic diagram of the specific installation site of metal mesh provided in an embodiment of the present invention；
Fig. 7 is the radial electron density distribution under different plasma electric current under experiment condition provided in an embodiment of the present invention
Figure；
Fig. 8 is the plasma electricity under different magnetic field size, anodic bias under experiment condition provided in an embodiment of the present invention
Bit distribution figure.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
It is a kind of plasma generating apparatus provided in this embodiment referring to Fig. 1, including：Anode metal net 1, electronics hair
Injection device 2, density gradient adjust metal mesh 3, magnetic field generating arrangement 4 and the first power supply U1.
The material of anode metal net 1 can be stainless steel.Specific anode metal net 1 is circle, as shown in Figure 2.
Electron emitting device 2 and the left side of anode metal net 1 are oppositely arranged, and electron emitting device 2 is to anode metal mesh 1
Direction launching electronics.
Density gradient adjusts metal mesh 3 and the right side of anode metal net 1 is oppositely arranged.Density gradient adjusts metal mesh 3
Including a circular through hole 31, density gradient adjusts net 3 and is grounded.Specifically, it is circular ring shape that density gradient, which adjusts metal mesh 3, such as
Shown in Fig. 3.The metal mesh of circular ring shape can influence the plasma by its corresponding annular region 33, the gold of the annular region 33
A part of ion can be sponged and filter out a part of electronics by belonging to net, and such plasma adjusts metal mesh 3 by density gradient
It is just divided into annulus and central cavity part two parts afterwards, they have different electron density.Therefore close by being arranged
The structure of degree gradient adjusting metal mesh 3 can adjust the radial distribution of the electron density of plasma, close to realize electronics
Spend the controllable, adjustable of gradient.
The material that density gradient adjusts metal mesh 3 can also be stainless steel.
The anode of first power supply U1 is connect with anode metal net 1；The cathode of first power supply U1 is grounded.The electricity of first power supply U1
Pressure value is generally between 0~50V, for controlling plasma potential.First power supply U1 uses current regulator power supply.Pass through anode
The plasma potential of metal mesh 1 can be close with the potential of the metal mesh, that is, U1, it is thus achieved that plasma current potential
Control.
Magnetic field generating arrangement 4 adjusts one magnetic field of the axial application of metal mesh 3 in anode metal net 1 and density gradient, with
Constrain plasma.
Referring to Fig. 4, the concrete structure of electronic emitter 2, including oxide-coated cathode plate 21, heating device 22 and are shown
Two power supply U2.Oxide-coated cathode plate 21 and the left side of anode metal net 1 are oppositely arranged.The setting of heating device 22 is in oxide the moon
The left side of pole plate 21, for being heated to anodic oxide cathode plate 21.The cathode of second source U2 connects with oxide-coated cathode plate 21
It connects, the anode of second source U2 is connect with anode metal net 1.When due to two power supplys altogether, the output between different electrical power
End may cause short circuit by the way that ground is connected, therefore the first power supply U1 be isolated with the ground of second source U2, therefore, it is electric be arranged second
The cathode of source U2 is isolated with ground.
Oxide-coated cathode plate 21 is specifically as follows spraying thermionic source made of oxide in nickel plate.Heating device
22 pairs of oxide anode plates 21 heat, and are used for the temperature of control oxide cathode plate 21, and oxide-coated cathode plate 21 is maintained to emit
The operating temperature of electronics.The voltage value of second source U2 is generally between 20~30V.
Referring to Fig. 5, the concrete structure of heating device 22 is shown, including third power supply U3 and connect with third power supply U3
Heating wire R.By adjusting the voltage value of third power supply U3, the temperature of heating wire R can be controlled, and then can be with control oxide
The temperature of cathode plate 21.
Referring to Fig. 6, the shell 5 that plasma generating apparatus may include is shown.Anode metal net 1, electron emission dress
2, density gradient adjusting metal mesh 3 is set to be arranged in shell 5.Anode metal net 1 and density gradient adjust metal mesh 3 and pass through
Kovar alloy stick 34 is fixed in shell 5.Supporting anodes metal mesh 1 and density gradient adjust the kovar alloy stick of metal mesh 3
34 be three kovar alloy sticks 34 for being mutually 120 °.Flange 51 is pre-designed on shell 5.Kovar alloy stick 34 is installed to flange
On 51.Kovar alloy stick 34 and the frame of anode metal net 1 are connected through a screw thread.Kovar alloy stick 34 adjusts gold with density gradient
Belong to the frame 32 of net 3 also by threaded connection.Make screw thread go deep into degree difference by rotating kovar alloy stick 34, thus plays
It adjusts anode metal net 1 or density gradient adjusts the position of metal mesh 3, so that two metal meshes are coaxial.First power supply U1's
Voltage value is excessively high may to be made to form electric discharge between anode monitoring net 1 and shell 5, influence experiment effect, therefore voltage should not be too high.
Fig. 7 shows the radial electron density distribution under different plasma electric current.The size of plasma current is
The size of current between the oxidation at voltages object cathode plate 21 and anode metal net 1 of second source U2.Experiment condition is magnetic field electricity
Stream B is fixed as 40A (corresponding magnetic field intensity is 160 Gausses), and the voltage U of the first power supply U1 is fixed as 10V, plasma current IP
Change in the range of 2A~6A.Anode metal net 1 is the circle of diameter 16cm, and it is outer diameter that density gradient, which adjusts metal mesh 3,
The circular ring shape of 16cm, internal diameter 8cm.The radial direction that probe is adjusted in density gradient in the plane other than 3 right side of metal mesh at half meter can
It is dynamic.The abscissa of Fig. 7 is the radial position of probe, adjusts the corresponding position in the center of circle of metal mesh 3 for density gradient at 22mm；
Ordinate is electron density.The first power supply U1 and second source U2 is opened, probe in detecting electron density is passed through.
From Fig. 7 it can be found that electron density is higher at the 22mm of center, under density is quick at the 50mm to 100mm
Drop, in 100mm or more, density is minimum, and decline slows down.Reduced density gradient adjusts the parameter of metal mesh 3 it can be found that annulus
Internal diameter be 8cm, outer diameter 16cm, therefore the position that electron density is begun to decline is (about 60mm present in internal radius
Set), density stops declining and maintains the position of reduced levels present in the outer diameter of annulus (about at 100mm).This shows this hair
It is bright to may be implemented to regulate and control electron density radial distribution using plasma generating apparatus, to realize controllable density level bands
Degree distribution.
Fig. 8 shows that the plasma potential under different magnetic field size, anodic bias is distributed.Abscissa is the radial direction of probe
Position adjusts the corresponding position in the center of circle of metal mesh 3 at 0 for density gradient；Ordinate is the current potential of plasma.Field supply
Value 10A, 20A, 30A and 40A (corresponding magnetic field intensity is respectively 40 Gausses, 80 Gausses, 120 gaussian sum, 160 Gauss)；First
The voltage value of power supply U1 is 10V, 25V, 50V and 70V.Anode metal net 1 is the circle of diameter 16cm, and density gradient adjusts gold
Category net 3 is the circular ring shape of outer diameter 16cm, internal diameter 8cm.Probe adjusts the plane other than 3 right side of metal mesh at half meter in density gradient
On it is radially-displaceable.The first power supply U1 and second source U2 is opened, probe in detecting plasma potential is passed through.
From figure 8, it is seen that under current experiment condition, plasma potential is more uniform in radial distribution, does not have
It changes significantly.Since entirely radially Potential distribution is uniform, the not generation of radial electric field.This demonstrate that our
Case is effective come the electric field methods for compensating the generation of electron density gradient by adjusting anodic bias.
To sum up, adjustable, the controllable position shape of independent electronic density can be realized through the invention, and compensates for electron density
It is unevenly distributed caused radial electric field, correlative study scheme is applicable to space plasma laboratory simulation equipment and work
In industry plasma application equipment.
Herein, relational terms such as first and second and the like be used merely to by an entity or operation with it is another
One entity or operation distinguish, and without necessarily requiring or implying between these entities or operation, there are any this reality
Relationship or sequence.Moreover, the terms "include", "comprise" or its any other variant are intended to the packet of nonexcludability
Contain, so that the process, method, article or equipment including a series of elements includes not only those elements, but also includes
Other elements that are not explicitly listed, or further include for elements inherent to such a process, method, article, or device.
In the absence of more restrictions, the element limited by sentence "including a ...", it is not excluded that including the element
Process, method, article or equipment in there is also other identical elements.
Each embodiment is described by the way of progressive in this specification, the highlights of each of the examples are with other
The difference of embodiment, just to refer each other for identical similar portion between each embodiment.
To the above description of disclosed embodiment of this invention, so that professional and technical personnel in the field is realized or use this
Invention.Various modifications to these embodiments will be apparent to those skilled in the art, institute herein
The General Principle of definition can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore,
The present invention is not intended to be limited to the embodiments shown herein, and is to fit to special with principles disclosed herein and novelty
The consistent widest range of point.
Claims (10)
1. a kind of plasma generating apparatus, which is characterized in that including：
Anode metal net (1)；
With the electron emitting device (2) of the anode metal net (1) being oppositely arranged on one side；
Metal mesh (3) described density gradient tune is adjusted with the density gradient that the another side of the anode metal net (1) is oppositely arranged
It includes a circular through hole (31) to save metal mesh (3), and the density gradient adjusts net (3) and is grounded；
Positive the first power supply (U1) being connect with the anode metal net (1), the cathode ground connection of first power supply (U1)；
And adjust the axial magnetic field for applying magnetic field of metal mesh (3) in the anode metal net (1) and the density gradient
Generating means (4).
2. equipment according to claim 1, which is characterized in that the electron emitting device (2), including：
With the oxide-coated cathode plate (21) of the anode metal net (1) being oppositely arranged on one side；
To the heating device (22) of the anodic oxide cathode plate (21) heating；
And the second source that cathode is connect with the oxide-coated cathode plate (21), anode is connect with the anode metal net (1)
(U2)。
3. equipment according to claim 2, which is characterized in that the heating device (22) specifically includes：
Third power supply (U3)；
And the heating wire (R) being connect with the third power supply (U3).
4. equipment according to claim 2, which is characterized in that the oxide-coated cathode plate (21) is specially:
Spraying thermionic source made of oxide in nickel plate.
5. equipment according to claim 1, which is characterized in that further include：Shell (5)；
The anode metal net (1), the electron emitting device (2), the density gradient adjust metal mesh (3) and are arranged at institute
It states in shell (5).
6. equipment according to claim 5, which is characterized in that the anode metal net (1) and the density gradient are adjusted
Metal mesh (3) is fixed on by kovar alloy stick (34) in the shell (5).
7. equipment according to claim 6, which is characterized in that the kovar alloy stick (34) and the anode metal net
(1) frame (11) is connected through a screw thread.
8. equipment according to claim 6, which is characterized in that the kovar alloy stick (34) is adjusted with the density gradient
The frame (32) of metal mesh (3) is connected through a screw thread.
9. equipment according to claim 1, which is characterized in that the shape of the anode metal net (1) is circle.
10. according to the equipment described in claim 1~10 any one, which is characterized in that the density gradient adjusts metal mesh
(3) shape is annulus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810735642.4A CN108551716A (en) | 2018-07-06 | 2018-07-06 | A kind of plasma generating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810735642.4A CN108551716A (en) | 2018-07-06 | 2018-07-06 | A kind of plasma generating apparatus |
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| Publication Number | Publication Date |
|---|---|
| CN108551716A true CN108551716A (en) | 2018-09-18 |
Family
ID=63493454
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810735642.4A Pending CN108551716A (en) | 2018-07-06 | 2018-07-06 | A kind of plasma generating apparatus |
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| Country | Link |
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| CN (1) | CN108551716A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109104806A (en) * | 2018-09-21 | 2018-12-28 | 中国人民解放军军事科学院国防工程研究院 | A kind of device and method of magnetic field control plasma |
| CN110364060A (en) * | 2019-06-26 | 2019-10-22 | 北京航空航天大学 | It is a kind of for studying the experimental provision of magnetic coil line |
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