CN108546925A - A kind of rose gold thin film and preparation method thereof prepared in metal surface - Google Patents
A kind of rose gold thin film and preparation method thereof prepared in metal surface Download PDFInfo
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- CN108546925A CN108546925A CN201810532334.1A CN201810532334A CN108546925A CN 108546925 A CN108546925 A CN 108546925A CN 201810532334 A CN201810532334 A CN 201810532334A CN 108546925 A CN108546925 A CN 108546925A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
The rose gold thin film and preparation method thereof that the invention discloses a kind of to prepare in metal surface, rose gold thin film is multilayered structure, including metallic matrix, which is stainless steel, the surface of metallic matrix is rose gold plate, there is TiN and Ti transition zones between rose gold plate and metallic matrix；Preparation method is to prepare TiN and Ti transition zones, rose gold plate respectively in metal surface by the way of medium frequency magnetron sputtering plated film；The rose gold plate of the metal base surface has very high intensity and scratch-resistant performance, and there is higher bond strength with metallic matrix, the rose gold thin film can be widely applied to the appearance decoration of various stainless steel watch cases, watchband, to improve the service life of watchcase, watchband；Preparation method is simple and fast, reduces conventional plating process and is endangered to caused by operator and environment, is brought great convenience to electroplating activity.
Description
Technical field
The present invention relates to the technical field of medium frequency magnetron sputtering plated film more particularly to a kind of roses prepared in metal surface
Gold thin film and preparation method thereof.
Background technology
Currently, conventional electroplated product is all that metal parts is immersed in electroplate liquid, using the principle of electrolysis by electric conductor
Layer overlay electroplated layer.Although can meet the needs of people to a certain extent, there is also some disadvantages simultaneously：One, often
The largely electroplating wastewater containing strong acid, highly basic, heavy metal chromium is will produce in rule electroplating technology, it is very big to worker's actual bodily harm, and
And it is easy polluted surface water and underground water, belong to heavy polluted industry；Secondly, that conventional plating is easy to cause coating layer thickness is uneven,
Influence appearance.On the other hand, Vacuum Deposition rose gold thin film is easy to change, the passivated processing of need, and present Passivation Treatment is usually
Potassium bichromate solution is soaked, potassium bichromate solution environmental pollution is larger, is not suitable for a large amount of use.
Invention content
Purpose of the present invention is to solve the above problems, a kind of rose gold thin film prepared in metal surface of invention and its preparation side
Method.
To achieve the goals above, the technical scheme is that：
A kind of rose gold thin film prepared in metal surface, including metallic matrix, the metal matrix material are stainless steel, rose
Rare gold thin film is multilayered structure, and the surface of metallic matrix is rose gold plate, have between rose gold plate and metallic matrix TiN and
Ti transition zones.
A method of preparing rose gold thin film in metal surface comprising following steps：
S1, pre-treatment：By metallic matrix sanding and polishing, it is sequentially placed into alcohol and acetone and is cleaned by ultrasonic each 10-15min,
Be put into vacuum drying chamber it is fully dry after be put into vacuum chamber of film coating machine rapidly, vacuum chamber of film coating machine background vacuum is 8.0 ×
10-3Pa is heated to 230 DEG C, soaking time 20-30min；
S2, Ion Cleaning：It is passed through Ar gas in vacuum chamber of film coating machine, pressure 0.3Pa opens grid bias power supply, voltage
250V, duty ratio 74.4, Glow Discharge Cleaning 20-30min；Bias is reduced to 200V, opens ion source Ion Cleaning 20-
30min is then turned on arc source Ti targets, bias 200-300V, target current 70A, ion bombardment Ti targets 3-4min；
S3, depositing Ti：Ar air pressures are adjusted to 0.36-0.39Pa, bias is reduced to 50-60V, electric arc to plate Ti3-5min；
S4, depositing TiN：Adjustment operating air pressure is 0.32-0.36Pa, bias 58V, Ti target current 50-60A；N2 is opened, is adjusted
Whole N2 flows are 110-130sccm, and depositing temperature is 120-200 DEG C, medium frequency magnetron sputtering depositing TiN 15-20min；
S5, deposition rose gold plate：Ti targets are closed, N2 is closed；Ar air pressures are adjusted to 0.9-1.8Pa, are biased into 100-
200V, opens gold target power supply, current-modulation 5-6A, and medium frequency magnetron sputtering deposits rose gold 60-70min；
S6, post-processing：Gold target power supply is closed, grid bias power supply, ion source and gas source are closed, keeps the temperature 20-25min, coating
Terminate；
S7, Passivation Treatment：The metallic matrix leaching gold and silver for being coated with rose gold thin film is protected into water, temperature is 30 DEG C, at passivation
5min is managed, drying is taken out.
Compared with prior art, the invention has the advantages and positive effects that：
Rose gold film design is multilayered structure by the present invention, and the surface of metallic matrix is rose gold plate, rose gold plating
There are TiN and Ti transition zones between layer and metallic matrix, to reduce residual stress, increases between rose gold thin film and metallic matrix
Bond strength；The rose gold thin film has good wearability, while having higher bond strength, appearance with metallic matrix
It is non-discolouring for rosiness, chromium is free of, so as to improve the service life of stainless steel watch band, watchcase；On the other hand, it prepares
Process is simple and fast, reduces conventional plating process and is endangered to caused by operator and environment, is brought to electroplating activity
Great convenience.
Description of the drawings
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention without having to pay creative labor, may be used also for those of ordinary skill in the art
With obtain other attached drawings according to these attached drawings.
Fig. 1 is the structural diagram of the present invention；
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment, any modification, equivalent replacement, improvement and so on should all be included in the protection scope of the present invention.
As shown in Figure 1, a kind of rose gold thin film prepared in metal surface, including metallic matrix 1,1 material of metallic matrix
Material is stainless steel, and rose gold thin film is multilayered structure, and the surface of metallic matrix 1 is rose gold plate 4, rose gold plate 4 and gold
There are TiN transition zones 3 and Ti transition zones 2 between category matrix 1.
Rose gold film design is multilayered structure by the present invention, and the surface of metallic matrix is rose gold plate, rose gold plating
There are TiN and Ti transition zones between layer and metallic matrix, to reduce residual stress, increases between rose gold thin film and metallic matrix
Bond strength；The rose gold thin film has good wearability, while having higher bond strength, appearance with metallic matrix
It is non-discolouring for rosiness, chromium is free of, so as to improve the service life of stainless steel watch band, watchcase.
A method of rose gold thin film being prepared in metal surface, the method is the side using medium frequency magnetron sputtering plated film
Formula prepares TiN and Ti transition zones, rose gold plate respectively in metal surface；It includes the following steps：
S1, pre-treatment：By metallic matrix sanding and polishing, it is sequentially placed into alcohol and acetone and is cleaned by ultrasonic each 10-15min use
With pollutants such as the oil stains that removes metal base surface, be put into vacuum drying chamber it is fully dry after be put into coating machine vacuum rapidly
Room, vacuum chamber of film coating machine background vacuum are 8.0 × 10-3Pa, are heated to 230 DEG C, soaking time 20-30min；
S2, Ion Cleaning：It is passed through Ar gas in vacuum chamber of film coating machine, pressure 0.3Pa opens grid bias power supply, voltage
250V, duty ratio 74.4, Glow Discharge Cleaning 20-30min；Bias is reduced to 200V, opens ion source Ion Cleaning 20-
30min is then turned on arc source Ti targets, bias 200-300V, target current 70A, ion bombardment Ti targets 3-4min；
S3, depositing Ti：Ar air pressures are adjusted to 0.36-0.39Pa, bias is reduced to 50-60V, electric arc to plate Ti3-5min；
S4, depositing TiN：Adjustment operating air pressure is 0.32-0.36Pa, bias 58V, Ti target current 50-60A；N2 is opened, is adjusted
Whole N2 flows are 110-130sccm, and depositing temperature is 120-200 DEG C, medium frequency magnetron sputtering depositing TiN 15-20min；
S5, deposition rose gold plate：Ti targets are closed, N2 is closed；Ar air pressures are adjusted to 0.9-1.8Pa, are biased into 100-
200V, opens gold target power supply, current-modulation 5-6A, and medium frequency magnetron sputtering deposits rose gold 60-70min；
S6, post-processing：Gold target power supply is closed, grid bias power supply, ion source and gas source are closed, keeps the temperature 20-25min, coating
Terminate；
S7, Passivation Treatment：The metallic matrix leaching gold and silver for being coated with rose gold thin film is protected into water, temperature is 30 DEG C, at passivation
5min is managed, drying is taken out.
Embodiment one, a kind of method preparing rose gold thin film in metal surface comprising following steps：
S1, pre-treatment：By metallic matrix sanding and polishing, it is sequentially placed into alcohol and acetone and is cleaned by ultrasonic each 10min, be put into
Vacuum chamber of film coating machine is put into after fully being dried in vacuum drying chamber rapidly, vacuum chamber of film coating machine background vacuum is 8.0 × 10-
3Pa is heated to 230 DEG C, soaking time 20min；
S2, Ion Cleaning：It is passed through Ar gas in vacuum chamber of film coating machine, pressure 0.3Pa opens grid bias power supply, voltage
250V, duty ratio 74.4, Glow Discharge Cleaning 20min；Bias is reduced to 200V, opens ion source Ion Cleaning 20min, then
Open arc source Ti targets, bias 200V, target current 70A, ion bombardment Ti targets 3min；
S3, depositing Ti：Ar air pressures are adjusted to 0.36Pa, bias is reduced to 50V, electric arc to plate Ti3min；
S4, depositing TiN：Adjustment operating air pressure is 0.32Pa, bias 58V, Ti target current 50A；N2 is opened, N2 flows are adjusted
For 110sccm, depositing temperature is 120 DEG C, medium frequency magnetron sputtering depositing TiN 15min；
S5, deposition rose gold plate：Ti targets are closed, N2 is closed；Ar air pressures are adjusted to 0.9Pa, are biased into 100V, are opened
Gold target power supply, current-modulation 5A, medium frequency magnetron sputtering deposit rose gold 60min；
S6, post-processing：Gold target power supply is closed, grid bias power supply, ion source and gas source are closed, keeps the temperature 20min, coating knot
Beam；
S7, Passivation Treatment：The metallic matrix leaching gold and silver for being coated with rose gold thin film is protected into water, temperature is 30 DEG C, at passivation
5min is managed, drying is taken out.
Embodiment two, a kind of method preparing rose gold thin film in metal surface comprising following steps：
S1, pre-treatment：By metallic matrix sanding and polishing, it is sequentially placed into alcohol and acetone and is cleaned by ultrasonic each 13min, be put into
Vacuum chamber of film coating machine is put into after fully being dried in vacuum drying chamber rapidly, vacuum chamber of film coating machine background vacuum is 8.0 × 10-
3Pa is heated to 230 DEG C, soaking time 25min；
S2, Ion Cleaning：It is passed through Ar gas in vacuum chamber of film coating machine, pressure 0.3Pa opens grid bias power supply, voltage
250V, duty ratio 74.4, Glow Discharge Cleaning 25min；Bias is reduced to 200V, opens ion source Ion Cleaning 25min, then
Open arc source Ti targets, bias 250V, target current 70A, ion bombardment Ti targets 3min；
S3, depositing Ti：Ar air pressures are adjusted to 0.38Pa, bias is reduced to 55V, electric arc to plate Ti4min；
S4, depositing TiN：Adjustment operating air pressure is 0.34Pa, bias 58V, Ti target current 55A；N2 is opened, N2 flows are adjusted
For 120sccm, depositing temperature is 160 DEG C, medium frequency magnetron sputtering depositing TiN 18min；
S5, deposition rose gold plate：Ti targets are closed, N2 is closed；Ar air pressures are adjusted to 1.5Pa, are biased into 150V, are opened
Gold target power supply, current-modulation 5A, medium frequency magnetron sputtering deposit rose gold 65min；
S6, post-processing：Gold target power supply is closed, grid bias power supply, ion source and gas source are closed, keeps the temperature 23min, coating knot
Beam；
S7, Passivation Treatment：The metallic matrix leaching gold and silver for being coated with rose gold thin film is protected into water, temperature is 30 DEG C, at passivation
5min is managed, drying is taken out.
Embodiment three, a kind of method preparing rose gold thin film in metal surface comprising following steps：
S1, pre-treatment：By metallic matrix sanding and polishing, it is sequentially placed into alcohol and acetone and is cleaned by ultrasonic each 15min, be put into
Vacuum chamber of film coating machine is put into after fully being dried in vacuum drying chamber rapidly, vacuum chamber of film coating machine background vacuum is 8.0 × 10-
3Pa is heated to 230 DEG C, soaking time 30min；
S2, Ion Cleaning：It is passed through Ar gas in vacuum chamber of film coating machine, pressure 0.3Pa opens grid bias power supply, voltage
250V, duty ratio 74.4, Glow Discharge Cleaning 30min；Bias is reduced to 200V, opens ion source Ion Cleaning 30min, then
Open arc source Ti targets, bias 300V, target current 70A, ion bombardment Ti targets 4min；
S3, depositing Ti：Ar air pressures are adjusted to 0.39Pa, bias is reduced to 60V, electric arc to plate Ti5min；
S4, depositing TiN：Adjustment operating air pressure is 0.36Pa, bias 58V, Ti target current 60A；N2 is opened, N2 flows are adjusted
For 130sccm, depositing temperature is 200 DEG C, medium frequency magnetron sputtering depositing TiN 20min；
S5, deposition rose gold plate：Ti targets are closed, N2 is closed；Ar air pressures are adjusted to 1.8Pa, are biased into 200V, are opened
Gold target power supply, current-modulation 6A, medium frequency magnetron sputtering deposit rose gold 70min；
S6, post-processing：Gold target power supply is closed, grid bias power supply, ion source and gas source are closed, keeps the temperature 25min, coating knot
Beam；
S7, Passivation Treatment：The metallic matrix leaching gold and silver for being coated with rose gold thin film is protected into water, temperature is 30 DEG C, at passivation
5min is managed, drying is taken out.
The preparation process of the present invention is simple and fast, reduces conventional plating process to caused by operator and environment
Harm, and metallic matrix external coating thickness is uniform, brings great convenience to electroplating activity；On the other hand, the present invention adopts
It with organic solution Passivation Treatment, avoids and is passivated using potassium bichromate solution, reduce passivation operation caused by environment
Pollution, protection is made that environment.
Claims (2)
1. a kind of rose gold thin film prepared in metal surface, including metallic matrix, which is stainless steel, special
Sign is：Rose gold thin film is multilayered structure, and the surface of metallic matrix is rose gold plate, rose gold plate and metallic matrix it
Between have TiN and Ti transition zones.
2. a kind of method preparing rose gold thin film in metal surface according to claim 1, it is characterised in that：It includes
Following steps：
S1, pre-treatment：By metallic matrix sanding and polishing, it is sequentially placed into alcohol and acetone and is cleaned by ultrasonic each 10-15min, be put into
Vacuum chamber of film coating machine is put into after fully being dried in vacuum drying chamber rapidly, vacuum chamber of film coating machine background vacuum is 8.0 × 10-
3Pa is heated to 230 DEG C, soaking time 20-30min；
S2, Ion Cleaning：It is passed through Ar gas in vacuum chamber of film coating machine, pressure 0.3Pa opens grid bias power supply, and voltage 250V is accounted for
Empty ratio 74.4, Glow Discharge Cleaning 20-30min；Bias is reduced to 200V, opens ion source Ion Cleaning 20-30min, then
Open arc source Ti targets, bias 200-300V, target current 70A, ion bombardment Ti targets 3-4min；
S3, depositing Ti：Ar air pressures are adjusted to 0.36-0.39Pa, bias is reduced to 50-60V, electric arc to plate Ti3-5min；
S4, depositing TiN：Adjustment operating air pressure is 0.32-0.36Pa, bias 58V, Ti target current 50-60A；N2 is opened, N2 is adjusted
Flow is 110-130sccm, and depositing temperature is 120-200 DEG C, medium frequency magnetron sputtering depositing TiN 15-20min；
S5, deposition rose gold plate：Ti targets are closed, N2 is closed；Ar air pressures are adjusted to 0.9-1.8Pa, are biased into 100-200V,
Gold target power supply, current-modulation 5-6A are opened, medium frequency magnetron sputtering deposits rose gold 60-70min；
S6, post-processing：Gold target power supply is closed, grid bias power supply, ion source and gas source are closed, keeps the temperature 20-25min, coating terminates；
S7, Passivation Treatment：It is 30 DEG C that the metallic matrix leaching gold and silver for being coated with rose gold thin film, which is protected water, temperature, Passivation Treatment
5min takes out drying.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109136844A (en) * | 2018-10-12 | 2019-01-04 | 佛山科学技术学院 | A kind of rose gold plate and its preparation process |
| CN109182824A (en) * | 2018-10-12 | 2019-01-11 | 佛山科学技术学院 | A kind of resistance to oxidation rose gold plate and its preparation process |
| CN109234564A (en) * | 2018-10-12 | 2019-01-18 | 佛山科学技术学院 | A kind of wear-resisting rose gold plate and its preparation process |
| CN111394703A (en) * | 2020-04-30 | 2020-07-10 | 森泰纳米科技(深圳)有限公司 | Vacuum-plated super nanometer functional gradient rose gold decorative composite layer and preparation method thereof |
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| CN109136844A (en) * | 2018-10-12 | 2019-01-04 | 佛山科学技术学院 | A kind of rose gold plate and its preparation process |
| CN109182824A (en) * | 2018-10-12 | 2019-01-11 | 佛山科学技术学院 | A kind of resistance to oxidation rose gold plate and its preparation process |
| CN109234564A (en) * | 2018-10-12 | 2019-01-18 | 佛山科学技术学院 | A kind of wear-resisting rose gold plate and its preparation process |
| CN111394703A (en) * | 2020-04-30 | 2020-07-10 | 森泰纳米科技(深圳)有限公司 | Vacuum-plated super nanometer functional gradient rose gold decorative composite layer and preparation method thereof |
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Application publication date: 20180918 |