CN108539054B - Method for preparing cathode isolation column of organic light-emitting display device - Google Patents
Method for preparing cathode isolation column of organic light-emitting display device Download PDFInfo
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- CN108539054B CN108539054B CN201810332311.6A CN201810332311A CN108539054B CN 108539054 B CN108539054 B CN 108539054B CN 201810332311 A CN201810332311 A CN 201810332311A CN 108539054 B CN108539054 B CN 108539054B
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Abstract
The invention discloses a preparation method of a cathode isolation column of an organic light-emitting display device. Firstly, preparing an imprinting mold, and obtaining a pre-designed convex structure pattern on the mold; uniformly coating a layer of ultraviolet curing adhesive on the ITO substrate, and forming an imprinting layer after the ultraviolet curing adhesive is free to flow and level; pressing the mold into the imprinting layer to fill the convex structure pattern of the mold with the ultraviolet curing adhesive, and reacting, hardening and molding the ultraviolet curing adhesive through exposure; releasing the pressure to separate the mold from the ITO substrate; carrying out reactive ion etching on the ITO substrate to remove the residual ultraviolet curing glue, and obtaining a convex structure with the same proportion as the mold; inverting the ITO substrate, adhering ultraviolet curing glue on the top of the convex structure by a micro-contact method, and standing and forming; and (5) irradiating and curing by adopting a UV light source to obtain the cathode isolating column. The cathode isolation column is prepared at room temperature and normal pressure by adopting an ultraviolet imprinting technology, the process is simple, the steps are few, water vapor is not introduced, the service life of an OLED device is greatly prolonged, and the pixel resolution is obviously improved.
Description
Technical Field
The invention relates to a cathode isolation column technology of an organic light-emitting display device, in particular to a preparation method of the cathode isolation column of the organic light-emitting display device.
Background
Oled (organic Light Emitting display), an organic Light Emitting display device, has been widely focused and studied due to its characteristics of high brightness, wide viewing angle, flexibility, Light weight, and the like. An organic light-emitting device is typically composed of a first electrode (transparent anode), a light-emitting medium deposited on the first electrode, and a second electrode (cathode) deposited on the light-emitting medium. In order to realize high resolution and colorization of the passive matrix OLED and better solve the problems of low resolution of a cathode template, low device yield and the like, a stripe structure with an inverted trapezoid or T-shaped cross section is introduced as a cathode isolation column in research, so that different pixels of a light-emitting display device are separated, and the problem of short circuit between adjacent pixels is solved.
In the prior art, a cathode isolation column is generally prepared by an exposure method, for example, a first layer of photosensitive organic insulating material is spin-coated on a transparent substrate, generally photosensitive PI, and is subjected to pre-baking and post-baking exposure, an exposure pattern is a net structure or a strip structure, the width of a line is determined by a display resolution, namely, the interval between pixels, and then post-baking is performed. And spin-coating a second layer of photosensitive organic insulating material on the exposed organic insulating material, wherein the second layer of photosensitive organic insulating material is generally one of photoresists with the cross section of the line being capable of forming an inverted trapezoid shape with a large upper part and a small lower part after photoetching, and is generally a negative photoresist, and the second layer of organic insulating material is exposed after prebaking, and the exposure pattern is a straight line. The preparation method is manufactured through a secondary exposure process, water vapor is always left in the cathode isolation column after etching, or water vapor is always diffused and evaporated on the surface of the cathode isolation column, and the organic light-emitting material generates pixel shrinkage along the trend of the cathode isolation column due to the influence of the left water vapor, so that the service life of a light-emitting device is influenced.
Disclosure of Invention
The invention aims to provide a preparation method of a cathode isolation column of an organic light-emitting display device, which has the advantages of simple process, less steps, no introduction of water vapor, great improvement of the service life of the light-emitting device, and transparent ultraviolet curing glue, and can ensure that the whole area of an OLED device is transparent.
The technical problem to be solved by the invention is realized by adopting the following technical scheme.
The invention provides a preparation method of a cathode isolation column of an organic light-emitting display device, which comprises the following steps:
s1), preparing an imprinting mold, and obtaining a pre-designed convex structure pattern on the mold;
s2) uniformly coating a layer of ultraviolet curing glue on the ITO substrate, and forming an imprinting layer after the ultraviolet curing glue is free to flow and level;
s3) pressing the mold into the imprinting layer to fill the convex structure pattern of the mold with the ultraviolet curing glue, and exposing to react, harden and mold the ultraviolet curing glue;
s4) releasing the pressure to separate the mold from the ITO substrate;
s5) carrying out reactive ion etching on the ITO substrate to remove the residual ultraviolet curing glue, and obtaining a convex structure with the same proportion as the mold;
s6) inverting the ITO substrate, adhering ultraviolet curing glue on the top of the convex structure by a micro-contact method, and standing and forming;
s7) irradiating and curing by adopting a UV light source to obtain the cathode isolating column.
Further, the mold is made of an opaque metal material, and UV irradiation is performed on the ITO substrate side in step S7).
Further, the material of the mould is one of transparent quartz, polydimethylsiloxane or polymethyl methacrylate.
Further, in step S5), reactive ion etching is performed using the uv-curable glue as a mask, and the residual uv-curable glue is removed to obtain the desired convex structure on the ITO substrate.
Further, after the residual ultraviolet curing glue is removed by reactive ion etching in step S5), the reactive ion reacts with the ITO substrate to increase the carrier content of the ITO substrate.
Further, when the paste is applied by the micro-contact method in step S6), the ITO substrate is parallel to the plane of the ultraviolet curing paste in contact therewith.
Further, after the ITO substrate is inverted, the top of the convex structure is adhered with ultraviolet curing glue, the ITO substrate rises and stands, and glue solution on the convex structure is condensed into circular glue drops under the action of fluid mechanics.
Further, a UV light source is adopted for irradiation, so that the circular glue drops adhered to the convex structures are cured and formed, and the cathode isolating column is obtained.
Furthermore, the cathode isolation column is composed of a first part with a convex structure in cross section and a spherical second part, the spherical second part is arranged at the top end of the convex structure, and the cathode isolation column is transparent.
Further, the mold with the convex structure can be prepared by technical methods of electron beam lithography, plasma etching and laser holographic interference.
The preparation method of the cathode isolation column of the organic light-emitting display device adopts the ultraviolet imprinting technology to prepare the cathode isolation column at room temperature and normal pressure, has simple imprinting process and few steps, does not introduce water vapor, greatly prolongs the service life of the OLED device, obviously improves the pixel resolution, has transparent UV glue layer and can ensure that the whole area of the OLED device is transparent compared with the prior art.
Drawings
Fig. 1 is a flow chart of a method for manufacturing a cathode separation column of an organic light emitting display device according to the present invention.
Fig. 2 is a schematic structural diagram of a cathode isolation pillar according to an embodiment of the present invention.
Fig. 3a to 3f are flow charts of a method for fabricating a cathode separation column of an organic light emitting display device according to the present invention.
Detailed Description
To further illustrate the technical means and effects of the present invention adopted to achieve the predetermined objects, the following detailed description of the embodiments, structures, features and effects of the present invention will be made with reference to the accompanying drawings and examples.
The invention provides a preparation method of a cathode isolation column of an organic light-emitting display device. Referring to fig. 1 to 3f, the preparation method includes the following steps:
s1) as shown in fig. 3a, the imprint mold 11 is prepared, and a pre-designed convex structure pattern is obtained on the mold 11. Specifically, in this step, the imprint mold 11 is prepared by electron beam lithography using transparent quartz that is transparent and transparent to ultraviolet rays. In other embodiments, the imprint mold 11 may also be fabricated by using plasma etching, laser holographic interference, or other techniques.
S2) as shown in fig. 3b, a layer of uv curable glue is uniformly coated on the ITO substrate 10, and the uv curable glue is free to flow and form an imprinting layer 12. Specifically, the uv-curable paste is spin-coated on the ITO substrate 10, and the uv-curable paste is required to have good fluidity in this step. In order to prevent damage to the ITO substrate 10, a transparent flexible mold, such as Polydimethylsiloxane (PDMS), polymethyl methacrylate (PMMA), etc., may be used as the imprint mold 11, and an opaque metal material, such as nickel, silicon, chromium, etc., may also be used. In this case, UV irradiation is performed on the ITO substrate 10 side.
S3), as shown in fig. 3b, the mold 11 is pressed into the imprinting layer 12, so that the convex structure pattern of the mold 11 is filled with the uv-curable adhesive, and the uv-curable adhesive is cured and molded by chemical reaction through exposure. Specifically, ultraviolet light is used for irradiation, so that the ultraviolet curing glue of the imprinting layer 12 changes from a liquid state to a solid state, and the imprinting layer 121 with the same shape as the convex structure of the mold 11 is obtained.
S4) as shown in fig. 3c, the pressure is released to detach the mold 11 from the ITO substrate 10.
S5), as shown in fig. 3d, the ITO substrate 10 is subjected to reactive ion etching to remove the residual uv-curable glue, and a convex structure in equal proportion to the mold 11 is obtained. Specifically, the oxygen reactive ion etching is used to transfer the pattern etching to the ITO substrate 10 by using the solid uv-curable glue of the imprinting layer 121 as a mask, and the required convex structure 122 is obtained after removing the excess uv-curable glue on the ITO substrate 10. After the residual ultraviolet curing adhesive is removed by the oxygen reactive ion etching, the oxygen reactive ion continues to act on the ITO substrate 10, so that the carrier content of the ITO substrate can be increased, and the conductivity of the ITO substrate 10 can be improved.
S6), as shown in fig. 3e, the ITO substrate 10 is inverted, and uv-curable adhesive is adhered to the top of the convex structures 122 by a micro-contact method, and then the structure is formed by standing.
In this step, when applying glue by the micro-contact method, since the requirement of the contact position is high, precise mechanical control is usually adopted, and the ITO substrate 10 needs to be parallel to the glue surface of the ultraviolet curing glue 14 in contact, and the glue layer surface of the ultraviolet curing glue 14 needs to be flat and cannot shake. After the ITO substrate 10 is inverted, the top of the convex structure 122 is adhered with the ultraviolet curing glue, the ITO substrate 10 is lifted and stands still, and the glue solution on the convex structure 122 is condensed into a circular glue drop 141 under the action of fluid mechanics, as shown in fig. 3 f. The surface energy of the glue drops is lowest and most stable when the glue drops are spherical according to hydrodynamics by controlling the viscosity of the ultraviolet curing glue.
S7) as shown in fig. 3f, curing by irradiation with a UV light source to obtain the cathode separator 16. Specifically, a UV light source is used for irradiation, so that the circular glue drops 141 adhered to the convex structures 122 are cured and formed, and the cathode separation columns 16 are obtained.
In this embodiment, the cathode isolation column 16 is composed of a first portion having a convex cross section and a second portion having a spherical shape, the second portion having a spherical shape is disposed at the top end of the convex cross section, and the cathode isolation column 16 is transparent.
The preparation method of the cathode isolation column of the organic light-emitting display device adopts the ultraviolet imprinting technology to prepare the cathode isolation column at room temperature and normal pressure, has simple imprinting process and few steps, does not introduce water vapor, greatly prolongs the service life of the OLED device, obviously improves the pixel resolution, has transparent UV glue layer and can ensure that the whole area of the OLED device is transparent compared with the prior art.
As used herein, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, including not only those elements listed, but also other elements not expressly listed.
In this document, the terms front, back, upper and lower are used to define the components in the drawings and the positions of the components relative to each other, and are used for clarity and convenience of the technical solution. It is to be understood that the use of the directional terms should not be taken to limit the scope of the claims.
The features of the embodiments and embodiments described herein above may be combined with each other without conflict.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (10)
1. A preparation method of a cathode isolation column of an organic light-emitting display device is characterized by comprising the following steps:
s1), preparing an imprinting mold, and obtaining a pre-designed convex structure pattern on the mold;
s2) uniformly coating a layer of ultraviolet curing glue on the ITO substrate, and forming an imprinting layer after the ultraviolet curing glue is free to flow and level;
s3) pressing the mold into the imprinting layer to fill the convex structure pattern of the mold with the ultraviolet curing glue, and exposing to react, harden and mold the ultraviolet curing glue;
s4) releasing the pressure to separate the mold from the ITO substrate;
s5) carrying out reactive ion etching on the ITO substrate to remove the residual ultraviolet curing glue, and obtaining a convex structure with the same proportion as the mold;
s6) inverting the ITO substrate, adhering ultraviolet curing glue on the top of the convex structure by a micro-contact method, and standing and forming;
s7) adopting a UV light source to irradiate and solidify to obtain a cathode isolation column, wherein the cathode isolation column is composed of a first part with a convex structure in cross section and a second part with a spherical shape, and the second part with the spherical shape is arranged at the top end of the convex structure.
2. The method for manufacturing cathode separation columns of an organic light emitting display device according to claim 1, wherein the mold is made of an opaque metal material, and UV irradiation is performed on one side of the ITO substrate in step S7).
3. The method of manufacturing the cathode separation column of the organic light emitting display device according to claim 1, wherein the material of the mold is one of transparent quartz, polydimethylsiloxane, or polymethylmethacrylate.
4. The method for manufacturing the cathode separation post of the organic light emitting display device according to claim 1, wherein in step S5), the residual uv-curing glue is removed by reactive ion etching with the uv-curing glue as a mask to obtain the desired convex structure on the ITO substrate.
5. The method for manufacturing the cathode separation post of the organic light emitting display device according to claim 4, wherein after the residual uv-curable glue is removed by reactive ion etching in step S5), the reactive ion reacts with the ITO substrate to increase the carrier content of the ITO substrate.
6. The method for manufacturing the cathode separation column of the organic light emitting display device according to claim 1, wherein the ITO substrate is in parallel to a plane of the ultraviolet curing paste contacted when the paste is applied by the micro-contact method in step S6).
7. The method of claim 6, wherein after the ITO substrate is inverted, the top of the convex structure is adhered with an ultraviolet curing adhesive, the ITO substrate is raised and left, and the adhesive on the convex structure is condensed into circular adhesive drops under the action of fluid mechanics.
8. The method of claim 7, wherein the cathode separation column of the organic light emitting display device is obtained by irradiating with a UV light source to cure and mold the circular glue drops adhered to the convex structures.
9. The method of manufacturing the cathode separation column of the organic light emitting display device according to claim 1, wherein the cathode separation column is transparent.
10. The method of manufacturing the cathode separation column of the organic light emitting display device according to claim 1, wherein the mold having the convex structure may be manufactured by a technical method of electron beam lithography, plasma etching, laser holographic interference.
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| CN109285764B (en) * | 2018-09-28 | 2022-08-19 | 京东方科技集团股份有限公司 | Film layer patterning method and preparation method of organic light-emitting diode |
| CN111384269B (en) * | 2018-12-29 | 2021-08-03 | Tcl科技集团股份有限公司 | Quantum dot light-emitting diode and preparation method thereof |
| WO2020135107A1 (en) * | 2018-12-29 | 2020-07-02 | Oppo广东移动通信有限公司 | Oled pixel structure, oled display screen and electronic device |
| CN112162464A (en) * | 2020-10-15 | 2021-01-01 | 苏州印象镭射科技有限公司 | Metallization-free rapid laser plate making method |
| CN112349869B (en) * | 2021-01-06 | 2021-03-30 | 浙江宏禧科技有限公司 | Method for preparing OLED anode by nanoimprint lithography |
| CN112750968B (en) * | 2021-01-22 | 2022-06-21 | 深圳市与辰科技有限公司 | Manufacturing process of cathode isolation column of OLED display panel |
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| CN100446632C (en) * | 2005-09-30 | 2008-12-24 | 电子科技大学 | Production of isolating column of organic electroluminescent device |
| JP4702009B2 (en) * | 2005-11-22 | 2011-06-15 | セイコーエプソン株式会社 | LIGHT EMITTING DEVICE AND ELECTRONIC DEVICE |
| US20080128685A1 (en) * | 2006-09-26 | 2008-06-05 | Hiroyuki Honda | Organic semiconductor device, manufacturing method of same, organic transistor array, and display |
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| CN101304076B (en) * | 2008-06-23 | 2010-09-01 | 中国科学院长春应用化学研究所 | Method for processing cathode insulated column of organic luminous display device |
| CN106067478A (en) * | 2016-08-08 | 2016-11-02 | 深圳市华星光电技术有限公司 | Pixel defines the manufacture method of layer and the manufacture method of OLED |
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Address after: No.478 Zhongnan street, Suzhou Industrial Park, Jiangsu Province 215026 Patentee after: Suzhou Weiyeda Technology Co.,Ltd. Patentee after: SOOCHOW University Patentee after: Weiyeda Technology (Jiangsu) Co.,Ltd. Address before: No.478 Zhongnan street, Suzhou Industrial Park, Jiangsu Province 215026 Patentee before: IVTOUCH Co.,Ltd. Patentee before: SOOCHOW University Patentee before: Weiyeda Technology (Jiangsu) Co.,Ltd. |
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