CN108535520A - A kind of method of electromagnetic field near field measurement device and making electromagnetic probe - Google Patents
A kind of method of electromagnetic field near field measurement device and making electromagnetic probe Download PDFInfo
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- CN108535520A CN108535520A CN201810479196.5A CN201810479196A CN108535520A CN 108535520 A CN108535520 A CN 108535520A CN 201810479196 A CN201810479196 A CN 201810479196A CN 108535520 A CN108535520 A CN 108535520A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/07—Non contact-making probes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
- G01R29/08—Measuring electromagnetic field characteristics
Abstract
The invention discloses a kind of electromagnetic field near field measurement devices and the method for making electromagnetic probe, belong to electromagnetic near field fields of measurement.Including laser generator, electromagnetic probe, the first photodetector and three port circulators, electromagnetic probe includes fiber collimating lenses, the micro-nano fiber of integrated polarizing piece and quarter-wave plate, the non-linear nano wire within the scope of additional electromagnetic field and the reflecting element set gradually along the light path of laser；Laser beam carries tested electromagnetic field parameters information after entering electromagnetic probe under the electrooptic effect effect of non-linear nano wire, and along backtracking under the reflex of reflecting element.The information of electromagnetic field parameters to be measured is coupled in laser by laser by the electrooptic effect of non-linear nano wire.Laser for the first time after non-linear nano wire by the reflection of optical fiber grating structure again by non-linear nano wire, and be reflected back in micro-nano fiber, then laser is measured by photodetector, realize the measurement to electromagnetic field to be measured.
Description
Technical field
The present invention relates to electromagnetic near field fields of measurement, specifically, being related to a kind of electromagnetic field near field measurement device and making
The method of electromagnetic probe.
Background technology
In electromagnetic field near field measurement, need probe to be placed into the place close enough from testee or system, with
Acquisition accurately measures electromagnetic field parameters.Measurement means of the tradition based on electronics will inevitably be used respectively
Eka-gold attribute probe, such as antenna, waveguide, microwave probe etc..
Due to the characteristic of electromagnetic wave itself, when there is metallic substance to enter place, the distribution of field can be distorted.With electricity
For, the tangential electric field in metal surface of good conductivity can not exist, therefore electric field intensity can occur strongly along metal surface
Distortion, finally be left along metal surface normal electric field, there is electromagnetic field near field measurement to measured device or system interference
Greatly, parameter measurement resolution ratio and the problems such as low spatial resolution, cannot be satisfied the growing required precision of the detection field.
Also occur many relevant backoff algorithm researchs in recent years, but often relies on the priori of numerical simulation.This
A little prioris extremely do not meet with complicated actual electromagnetic field situation, and simulation process is complicated.Therefore part actual conditions
Under, the performance of this backoff algorithm is not largely effective.
Electromagnetic field measurements based on aeolotropic crystal electrooptic effect utilize nonmetallic materials, not only greatly reduce pair
The interference of tested electromagnetic field, and due to the high-resolution of its parameter measurement, the size of sensitive detection parts is also effectively reduced, to
Improve the spatial resolution of measurement.However, with electromagnetic field near-field measurement technique fast development be widely applied further,
More stringent requirements are proposed to electromagnetic field parameters Measurement Resolution and spatial resolution by people.
And be traditionally based on electrooptic effect electromagnetic field measurements technology and use discrete optical element, such as it is based on high-molecular compound
The polarizing film of material or aeolotropic crystal.These discrete optical elements are fundamentally by traditional probe based on electrooptic effect
Size is limited in millimeter magnitude, is reduced again by increasing probe size to increase the straightforward procedure of electromagnetic field parameters Measurement Resolution
The spatial resolution measured.The parameter measurement resolution ratio and spatial resolution of electromagnetic field near field probe can not be improved simultaneously.
Invention content
An object of the present invention is to provide a kind of electromagnetic field near field measurement device, can improve the spy of electromagnetic field near field simultaneously
The parameter measurement resolution ratio and spatial resolution of needle.
To achieve the goals above, electromagnetic field near field measurement device provided by the invention includes：
Laser generator, for emitting laser；
Electromagnetic probe includes being set gradually along light path：Fiber collimating lenses；Integrated polarizing piece and quarter-wave plate
Micro-nano fiber；Non-linear nano wire within the scope of additional electromagnetic field；With a reflecting element；Into the laser beam of electromagnetic probe
After being converted to circularly polarized light, is carried under the electrooptic effect effect of the non-linear nano wire and be tested electromagnetic field parameters information, and
Along backtracking under the reflex of the reflecting element；
First photodetector receives the reflected beams for carrying and being tested electromagnetic field parameters information, demodulates described outer
Power up the strength information in magnetic field.
In above-mentioned technical proposal, laser is transmitted to by micro-nano fiber on non-linear nano wire, non-linear nano wire due to
Refractive index of electrooptic effect under the action of additional electromagnetic field on certain directions changes, the information of electromagnetic field parameters to be measured with
The mode of optical phase modulation is coupled in laser.Electromagnetic probe uses reflective structure, laser to pass through non-linear nanometer for the first time
It by the reflection of reflecting element again by non-linear nano wire after line, and is reflected back in micro-nano fiber, then passes through the first photoelectricity
Detector measures laser, to realize the measurement to electromagnetic field parameters to be measured.Reflecting element can pass through fiber grating
Mechanism realizes.
Above-mentioned micro-nano fiber is a kind of optical fiber of diameter in sub-wavelength magnitude, small with size, loss is low, of low cost
The advantages that.Optical fiber grating structure may alternatively be integrated on wiener optical fiber.On micro-nano fiber integrated polarizing piece, quarter-wave plate and
The optical elements such as the optical fiber grating structure as speculum, and then electromagnetic probe is made, its size can be further decreased to micro-nano
Magnitude effectively improves the spatial resolution of electromagnetic field measurements.In addition, these optical elements have it is easy to process, it is low-cost
Advantage has higher engineering application value.
For laser in a fiber in transmission process it is possible that phase deteriorates, environment temperature may also can generate shadow to phase
It rings.In order to reduce these influences, specific scheme be further include that the phase being arranged between laser generator and electromagnetic probe is mended
Device is repaid, be arranged between the first photodetector and the electromagnetic probe and the light beam reflected from electromagnetic probe is divided into two
The second photodetector of the beam splitter of beam, the second photodetector being arranged between beam splitter and phase compensator and connection
Optimizing feedback control device；The two light beams that beam splitter separates pass through the first photodetector and the second photodetector respectively；
The optical signal demodulation for carrying the reflected beams for being tested electromagnetic field parameters information is to adjust electric signal by the second photodetector；Optimization
Feedback controller will need the phase information compensated to feed back to phase compensator and laser after receiving adjusting electric signal.
Control phase compensator by optimizing feedback control device and carry out phase compensation, phase that compensated optical fiber is brought deteriorate with
And the influence that environment temperature etc. is brought.First photodetector and the second photodetector can be spectrometer, light power meter or
PIN is managed.
Another specific scheme be further include one or three port circulators, be divided into first port input for laser, company
The second port of energization magnetic probe and the third port for connecting the first photodetector.The above phase compensator is actually disposed at
Between laser generator and first port, beam splitter is arranged at third port.By three port circulators realize emitting light paths with
The normal pass of reflected light path.
Another specific scheme be further include in the first photodetector be connected Output Display Unit, will show electric signal
It is shown by way of frequency spectrum or waveform.Convenient for observing and counting.
Another specific scheme is that polarizing film is made using micro-nano fiber-graphene broadband polarization characteristic.
The broadband polarization characteristic of micro-nano fiber-graphene micro-nano structure：Due to the photoconductivity of grapheme material, electromagnetism
Wave polarization will be affected, this is related with fermi level.If fermi level is just, TM patterns are supported；If fermi level is negative,
Then support TE patterns.If the electromagnetic wave of excitation is circular polarization, optical wavelength 532nm is estimated using two different fermi levels
Evaluation μ=0.1eV and 1.5eV.Then as μ=0.1eV, output TE polarization will change；As μ=1.5eV, TM wave polarizations are exported
It will change.
Another specific scheme surpasses sufacing using artificial electromagnetic for quarter-wave plate and is made.Realize sub- wave
Long thickness.
Further specific scheme is quarter-wave plate using the section of micro-nano fiber as substrate, including setting is in substrate week
The interior nucleus of the silicon nanowire array enclosed, silicon nanowires is monocrystalline silicon, and outer layer is equipped with a SiO2Clad.Also can be set up directly on
The endface of nano optical fibers, using end face as substrate.
Further specific scheme is that the array period of silicon nanowire array is 0.4 μm.Another more specific scheme
Thickness for monocrystalline silicon is 0.36 μm, the SiO2The thickness of clad is 0.24 μm.So that the insertion loss of entire device
It is very low, superior performance.
The second object of the present invention is to provide a kind of method making electromagnetic probe, is included the following steps：
It is followed by one section of micro-nano fiber in fiber collimating lenses；Then wide using micro-nano fiber-graphene on micro-nano fiber
Wave band polarization characteristic makes polarizing film, make light beam to be polarized direction consistent with polarizing film；Artificial electricity is utilized on micro-nano fiber again
The super sufacing of magnetic makes quarter-wave plate；Then non-linear nano wire is connect in micro-nano fiber end, is finally received non-linear
The end of rice noodles makes optical fiber grating structure, forms a speculum, makes laser by backtracking to micro-nano fiber.
Integrated, non-linear nano wire electrooptic effect, micro-nano fiber-alkene are wide using optical element on micro-nano fiber for the above method
The electromagnetic probe that the technologies such as wave band polarization characteristic and the super surface of artificial electromagnetic are made can improve electromagnetic field near field simultaneously
The parameter measurement resolution ratio and spatial resolution of probe.
Compared with prior art, beneficial effects of the present invention are：
Electromagnetic probe is fabricated to reflective structure by electromagnetic field near field measurement device provided by the invention, and laser passes through for the first time
It crosses after non-linear nano wire by the reflection of optical fiber grating structure again by non-linear nano wire, and is reflected back micro-nano fiber
In, then by photodetector laser is measured, to realize the measurement to electromagnetic field parameters to be measured.It can improve simultaneously
The parameter measurement resolution ratio and spatial resolution of electromagnetic field near field probe.
Description of the drawings
Fig. 1 is the structural scheme of mechanism of the electromagnetic probe of the embodiment of the present invention；
Fig. 2 is the electromagnetic field near field measurement apparatus structure schematic diagram of the embodiment of the present invention；
Fig. 3 is the schematic diagram of the electromagnetic probe of the embodiment of the present invention；
Fig. 4 is the quarter-wave plate micro-structure composition of the embodiment of the present invention；
Fig. 5 is that the silicon nanowire array of the embodiment of the present invention realizes the super surface high efficiency of artificial electromagnetic four of sub-wavelength thickness
The schematic diagram of/mono- 4 wave plate；
Fig. 6 is the polarization characteristic schematic diagram of micro-nano rice noodles-graphene broadband polarization characteristic of the embodiment of the present invention, (a)
Indicate the electromagnetic wave of input circular polarisation excitation；(b) indicate that output electromagnetism involves the TE moulds changed when fermi level μ=0.1eV
Formula；(c) indicate that output electromagnetism involves the TM patterns changed when fermi level μ=1.5eV.
Specific implementation mode
To make the object, technical solutions and advantages of the present invention clearer, with reference to embodiments and its attached drawing is to this hair
It is bright to be described further.
Embodiment
Referring to Fig. 1 to Fig. 4, the electromagnetic field near field measurement device of the present embodiment include laser generator 1, phase compensator 2,
Three port circulators 3, electromagnetic probe 4, beam splitter 5, the first photodetector 8, the second photoelectric measuring device 6, optimizing feedback control device 7
And Output Display Unit 9.
Wherein, laser generator 1 is for emitting laser, three port circulators 3 divide for first port 1., second port 2. with
And third port is 3..First photodetector 8 and the second photoelectric measuring device 6 are spectrometer, light power meter or PIN pipes.
Electromagnetic probe 4 includes fiber collimating lenses 41, micro-nano fiber 42, the non-linear nano wire 45 set gradually in an axial direction
With optical fiber grating structure 46, polarizing film 43 and quarter-wave plate 44 are integrated on micro-nano fiber 42.The making side of electromagnetic probe 4
Method is as follows：
It is followed by one section of micro-nano fiber 42 in fiber collimating lenses 41；Then micro-nano fiber-stone is used on micro-nano fiber 42
Black alkene broadband polarization characteristic makes polarizing film 43, make light beam to be polarized direction consistent with polarizing film 43；Again in micro-nano fiber 42
It is upper to make quarter-wave plate 44 using the super sufacing of artificial electromagnetic；Then non-linear nano wire is connect in 42 end of micro-nano fiber
45, optical fiber grating structure 46 finally is made in the end of non-linear nano wire 45, a speculum is formed, makes laser by backtracking
Into micro-nano fiber 42.
Polarizing film 43 is made using micro-nano fiber-graphene broadband polarization characteristic, due to the photoconduction of grapheme material
Rate, polarization of ele will be affected, this is related with fermi level.If fermi level is just, TM patterns are supported；If Fermi's energy
Grade is negative, then supports TE patterns.Referring to Fig. 6, if electromagnetic wave such as Fig. 6 (a) of excitation show circular polarization, optical wavelength is
532nm uses two different fermi level estimated value μ=0.1eV and 1.5eV.Then as μ=0.1eV, output TE polarization will
Greatly change, such as Fig. 6 (b)；As μ=1.5eV, output TM wave polarizations will change, such as Fig. 6 (c).
Quarter-wave plate 44 is substrate with the end face 441 of micro-nano fiber, including the silicon nanowires in substrate perimeter is arranged
The interior nucleus of array, silicon nanowires is monocrystalline silicon 442, and outer layer is equipped with a SiO2Clad 443.The thickness of the present embodiment monocrystalline silicon
It is 0.36 μm, SiO2The thickness of clad is 0.24 μm.The array period of silicon nanowire array is 0.4 μm.Fig. 5 is broadband wave
The transmittance curve of piece, solid line are TM waves transmitance and the relationship of wavelength, and dotted line is TE waves transmitance and the relationship of wavelength, left side
Longitudinal axis scale indicates transmitance.Chain-dotted line indicates that the phase difference of TM waves and TE waves, right side longitudinal axis scale indicate that phase difference, unit are
Degree.Understand that the phase difference of TM waves and TE waves is spent to -85 in ranges in -95 degree when wavelength is within the scope of 1.275um to 1.750um,
Meet wave plate engineer application requirement.And the wave band include optical fiber transmit wave band.Wave band, the transmission of TM waves are transmitted in 1550 optical fiber
Rate is about that the transmitance of 0.92, TE waves is about 0.77, and the insertion loss of entire device is very low, superior performance.
The electrooptic effect of non-linear nano wire, i.e., under DC Electric Field, refractive index can be with electric field strength
Variation so that cause light phase to change.As shown in figure 3, when light is by non-linear nano wire, phase can change, from
And so that its polarization state changes, and detects phase difference, you can detect the size of voltage or electric field strength.
The course of work of the electromagnetic field near field measurement device is as follows：
1) laser generator 1 sends out laser, by phase compensator 2.
2) phase compensator 2 carries out specific aim compensation, laser according to 7 feedack of optimizing feedback control device to phase
It is delivered to the first ports of three port circulators 3 1., and 2. will be in laser transfer to electromagnetic probe 4 by second port.
2-1) laser enters fiber collimating lenses 41, is collimated to light beam.
The polarization of light beam 2-2) is adjusted by the polarizing film 43 made based on micro-nano fiber-graphene broadband polarization characteristic
Direction so that the light beam after collimation reaches maximum output light intensity, obtains a branch of linearly polarized light.
2-3) quarter-wave plate 44 of the super surface texture of artificial electromagnetic makes linearly polarized light become circularly polarized light, later light wave
Into the non-linear nano wire 45 for playing electrooptic effect.
2-4) non-linear nano wire 45 powers up under magnetic fields outside, and due to electrooptic effect, refractive index is sent out on certain directions
Changing causes the light wave on different directions to generate phase difference.
2-5) make light beam along backtracking by the reflection of optical fiber grating structure 46, again by 45 He of non-linear nano wire
The quarter-wave plate 44 of the super surface texture of artificial electromagnetic, becomes linearly polarized light by circularly polarized light, after polarizing film 43,
The light beam for carrying external tested electromagnetic field parameters information is back to three port circulators 3 by the light intensity for filtering out specific direction.
3. the laser that three port circulators 2-6) are 2. coupled into from second port is exported from third port, laser has been at this time
Electromagnetic field parameters information to be measured is carried,
3) 3. light beam is output to beam splitter 5 by three port circulators 3 by third port, and light beam number is divided into two bundles.
4) wherein light beam will carry the reflected beams for being tested electromagnetic field parameters information by the second photodetector 6
Optical signal demodulation is to adjust electric signal, and be transmitted to optimizing feedback control device 7,
Optimizing feedback control device 7 will need the phase information compensated to feed back to phase compensator 2 by analyzing, simultaneously
Feed back to laser generator 1.
5) another beam signal will carry the reflected beams for being tested electromagnetic field parameters information by the first photodetector 8
Optical signal demodulation is display electric signal, into coaxial cable, is then passed to the progress frequency spectrum of Output Display Unit 9 or waveform is shown.
To realize the measurement of electric field.
The foregoing is merely the preferable performances of the present invention, are not intended to restrict the invention, it is all in spirit of that invention and
Within principle, any modification, equivalent replacement, improvement and so on should all be included in the protection scope of the present invention.
Claims (10)
1. a kind of electromagnetic field near field measurement device, which is characterized in that including：
Laser generator, for emitting laser；
Electromagnetic probe includes being set gradually along light path：Fiber collimating lenses；The micro-nano of integrated polarizing piece and quarter-wave plate
Optical fiber；Non-linear nano wire within the scope of additional electromagnetic field；With a reflecting element；Laser beam into electromagnetic probe is converted
After circularly polarized light, is carried under the electrooptic effect effect of the non-linear nano wire and be tested electromagnetic field parameters information, and in institute
It states under the reflex of reflecting element along backtracking；
First photodetector receives the reflected beams for carrying and being tested electromagnetic field parameters information, demodulates the outer power-up
The strength information in magnetic field.
2. electromagnetic field near field measurement device according to claim 1, it is characterised in that：
Further include the phase compensator being arranged between the laser generator and the electromagnetic probe, be arranged in first light
Between electric explorer and the electromagnetic probe and by beam splitter that the light beam reflected from the electromagnetic probe is divided into two bundles, set
Set the second photodetector and connection second photodetector between the beam splitter and the phase compensator
Optimizing feedback control device；
The two light beams that the beam splitter separates pass through the first photodetector and the second photodetector respectively；Second light
The optical signal demodulation for carrying the reflected beams for being tested electromagnetic field parameters information is to adjust electric signal by electric explorer；The optimization is anti-
Feedback controller, which receives, will need after the adjusting electric signal phase information that compensates to feed back to the phase compensator and described swash
Light device makes the phase that its compensated optical fiber is brought deteriorate.
3. electromagnetic field near field measurement device according to claim 1, it is characterised in that：
Further include one or three port circulators, is divided into first port, the second end of the connection electromagnetic probe inputted for laser
The third port of mouth and connection first photodetector.
4. electromagnetic field near field measurement device according to claim 1, it is characterised in that：
Further include the Output Display Unit being connected in first photodetector, the display electric signal is passed through into frequency spectrum or wave
The mode of shape is shown.
5. electromagnetic field near field measurement device according to claim 1, it is characterised in that：
The polarizing film is made using micro-nano fiber-graphene broadband polarization characteristic.
6. electromagnetic field near field measurement device according to claim 1, it is characterised in that：
The quarter-wave plate surpasses sufacing using artificial electromagnetic and is made.
7. electromagnetic field near field measurement device according to claim 6, it is characterised in that：
The quarter-wave plate is using the section of the micro-nano fiber as substrate, including the silicon in the substrate perimeter is arranged
The interior nucleus of nano-wire array, silicon nanowires is monocrystalline silicon, and outer layer is equipped with a SiO2Clad.
8. electromagnetic field near field measurement device according to claim 7, it is characterised in that：
The array period of the silicon nanowire array is 0.4 μm.
9. electromagnetic field near field measurement device according to claim 7, it is characterised in that：
The thickness of the monocrystalline silicon is 0.36 μm, the SiO2The thickness of clad is 0.24 μm.
10. a kind of method of electromagnetic probe of making as described in any claim in claim 1 to 9, which is characterized in that packet
Include following steps：
It is followed by one section of micro-nano fiber in fiber collimating lenses；Then micro-nano fiber-graphene broadband is used on micro-nano fiber
Polarization characteristic makes polarizing film, make light beam to be polarized direction consistent with polarizing film；It is super using artificial electromagnetic on micro-nano fiber again
Sufacing makes quarter-wave plate；Then non-linear nano wire is connect in micro-nano fiber end, finally in non-linear nano wire
End make optical fiber grating structure, formed a reflecting element, make laser by backtracking to micro-nano fiber.
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| CN201810479196.5A CN108535520A (en) | 2018-05-18 | 2018-05-18 | A kind of method of electromagnetic field near field measurement device and making electromagnetic probe |
| CN201910135641.0A CN109709361A (en) | 2018-05-18 | 2019-02-25 | A kind of method of electromagnetic field near field measurement device and production electromagnetic probe |
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| CN201910135641.0A Pending CN109709361A (en) | 2018-05-18 | 2019-02-25 | A kind of method of electromagnetic field near field measurement device and production electromagnetic probe |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109142891A (en) * | 2018-09-25 | 2019-01-04 | 北京理工大学 | Antenna near-field test probe and method based on Rydberg atom quantum coherence effect |
| CN109709361A (en) * | 2018-05-18 | 2019-05-03 | 浙江大学 | A kind of method of electromagnetic field near field measurement device and production electromagnetic probe |
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| JP5836683B2 (en) * | 2010-08-24 | 2015-12-24 | キヤノン株式会社 | Electromagnetic wave generating element, electromagnetic wave detecting element, time domain spectroscopic device |
| CN102111154B (en) * | 2010-12-31 | 2012-11-07 | 中国科学院国家授时中心 | Laser frequency stabilizing device for atomic clock |
| CN103134997B (en) * | 2013-01-30 | 2015-11-25 | 中国电子科技集团公司第三十八研究所 | A kind of lightening detection device based on optical principle |
| CN106093599B (en) * | 2016-06-21 | 2020-07-14 | 中国电子科技集团公司第三十八研究所 | Optical probe and electromagnetic field measuring equipment and measuring method thereof |
| CN107390146A (en) * | 2017-07-11 | 2017-11-24 | 昆明理工大学 | A kind of integrated light guide magnetic field measurement system and method |
| CN108535520A (en) * | 2018-05-18 | 2018-09-14 | 浙江大学 | A kind of method of electromagnetic field near field measurement device and making electromagnetic probe |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109709361A (en) * | 2018-05-18 | 2019-05-03 | 浙江大学 | A kind of method of electromagnetic field near field measurement device and production electromagnetic probe |
| CN109142891A (en) * | 2018-09-25 | 2019-01-04 | 北京理工大学 | Antenna near-field test probe and method based on Rydberg atom quantum coherence effect |
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