CN108493746A - A kind of production method of miniature ridge waveguide and the laser with the waveguide - Google Patents
A kind of production method of miniature ridge waveguide and the laser with the waveguide Download PDFInfo
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- CN108493746A CN108493746A CN201810454173.9A CN201810454173A CN108493746A CN 108493746 A CN108493746 A CN 108493746A CN 201810454173 A CN201810454173 A CN 201810454173A CN 108493746 A CN108493746 A CN 108493746A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
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Abstract
The invention discloses a kind of production method of miniature ridge waveguide and with the laser of the waveguide, comprise the steps of：To LiNbO3Crystal is polished, and after cleaning polishing sample surface；The ytterbium film of one layer of Nano grade thickness is evaporated in plane of crystal, and processing is diffused in hot environment；Soft proton exchange processing is carried out to crystal, forms planar optical waveguide；Laser resonator film is plated in slab guide both ends of the surface；Using diamond scribing cutting technique, ridge structure is cut into；By coupling pump light into ridge waveguide laser, the laser of 1061nm is generated.Present invention reduces photorefractive damages, keep the original crystalline phase of crystal to improve laser frequency efficiency to reduce the damage of lattice in crystal, produce stable cw lasing.
Description
Technical field
The present invention relates to a kind of waveguide fabrication method and laser, the especially a kind of production method and tool of miniature ridge waveguide
There is the laser of the waveguide.
Background technology
In recent years, with fiber optic communication, material processing, the rapid development for measuring the technologies such as control, medical treatment, to laser light source
Increasingly higher demands are proposed, source mass largely determines the performance of optical system, by constantly grinding
Study carefully and develop, waveguide laser can generate a kind of new pattern laser light source, in performances such as transfer efficiency, laser generation and beam qualities
Aspect has significant advantage, while showing good development prospect at the integrated aspect of light.
Waveguide is the basis of integrated optics basic composition unit and all optical communication, according to the light direction of propagation in the waveguide
By being limited, optical waveguide can be divided into planar optical waveguide and ridge optical waveguide.Planar optical waveguide is that structure is most simple, prepares
The most ripe optical waveguide of technique.But such waveguide only in one direction to the restricted effect of light, the limitation to light
Effect is weaker, and there are diffraction phenomenas on waveguide horizontal direction, and with it, to make integrated optical wave guide device, there are certain offices
It is sex-limited.Therefore, if ridge structure is made in slab guide, since ridge waveguide upper surface and two sides directly connect with air
It touches, contrast of refractive index is high, has very strong restriction ability to laser beam, can effectively improve laser frequency efficiency.And ridged
Waveguide has very superior anti-photorefraction performance, enhances the stability of wavelength convert, improves the transfer efficiency of wavelength.Most
Closely studies have shown that by carrying out resonant cavity plated film to Waveguide end face, suitable pump light is used to carry out waveguide as gain media
Pumping, will export corresponding waveguide laser.Compared with general body laser, waveguide laser can using optical waveguide structure
Energy is limited in the waveguide of section very little, the energy density of light can be effectively improved, reduce pumping threshold, to effectively
Improve slope efficiency in ground.The material for being used to prepare waveguide laser at this stage has very much, such as LiNbO3, LiTaO3, glass
Deng, if but doping with rare-earth ions in the material, the electric light, acousto-optic and nonlinear effect of laser can be effectively improved, and use
The laser that this material makes can be used for medical domain, nowadays useful band Doped ions laser successful treatment canthus
The report of membrane disease.1992, T.Funchter of University of Southampton et al. was produced successively with ion exchange technique
Mix bait (Er3+) waveguide laser, which has many advantages, such as small, and integrated level is high.2001, U.S. E.Berton etc.
Doping Nd3+ has produced single-frequency, mode locking waveguide laser to people in commercial glass for the first time, and obtains on the market extensively
Utilization.In addition, it is also a kind of material for being attracted attention to adulterate ytterbium ion in crystal, there is very strong polarization absorption, it is high
Absorption coefficient, smaller to the dependence of pumping wavelength, laser threshold is relatively low, while can generate the laser of 1061nm, integrated
Optics and optical communication field have important application.
Ion implantation, Ti diffusion methods and proton exchange can be used in preparation for waveguide laser, but these are prepared
Technique is also faced with some problems, for example, ion implantation is since implantation dosage is larger, injection length is longer, waveguide fabrication at
This is higher, and in ion implantation process, injection ion causes damage to a certain extent in end-of-range to lattice structure, and
The presence of these damages can increase the absorption of waveguide and the loss of scattering, reduce wavelength conversion efficiency.2009, Southampton was big
It learns J.K.Jones et al. and is prepared for waveguide laser using Ti methods, although Ti diffusions can produce low-loss waveguide, by
In Ti diffusions, there are serious photorefractive damages, and to generate stable cw lasing, which greatly limits it
Application.To seek better preparation method, Osaka, Japan university F.Masatoshi is prepared for using annealed proton exchange process
Lithium niobate waveguides laser, although reducing the photorefractive damage during preparing waveguide laser, proton exchange makes crystal
In lattice destroyed, even if additional annealing process, repaired the lattice structure that part is destroyed, but surface compared with
The nonlinear factor and electro-optic coefficient being destroyed in 1 μm of shallow region still can not restore completely.
Invention content
Technical problem to be solved by the invention is to provide a kind of production method of miniature ridge waveguide and with the waveguide
Laser reduces the damage of lattice in crystal, improves laser frequency efficiency.
In order to solve the above technical problems, the technical solution adopted in the present invention is：
A kind of production method of miniature ridge waveguide, it is characterised in that comprise the steps of：
Step 1：To LiNbO3Crystal is polished, and after cleaning polishing sample surface；
Step 2：The ytterbium film of one layer of Nano grade thickness is evaporated in plane of crystal, and processing is diffused in hot environment；
Step 3：Soft proton exchange processing is carried out to crystal, forms planar optical waveguide；
Step 4：Laser resonator film is plated in slab guide both ends of the surface；
Step 5：Using diamond scribing cutting technique, ridge structure is cut into；
Step 6：By coupling pump light into ridge waveguide laser, the laser of 1061nm is generated.
Further, the step 1 is specially
1.1 utilize the method for chemical-mechanical grinding to crystal end-face polishing treatment；
1.2 successively start the cleaning processing the crystal after polishing using acetone soln, absolute ethyl alcohol, distilled water；It is respectively clear
It washes 15 minutes.
Further, the step 2 is specially
The ytterbium film that a layer thickness is 30nm is deposited on lithium columbate crystal surface using precision machinery electron beam evaporation technique, is connect
It and crystal is placed in high-temperature atmosphere furnace, in order to prevent waveguide surface peroxide breaks down, to carrying ytterbium film under aerobic environment
Crystal carry out High temperature diffusion processing, diffusion temperature be arranged at 1100 degrees Celsius, diffusion time is set as 30 hours.
Further, soft proton exchange is specially in the step 3
3.1 mix lithium benzoate with benzoic acid in certain proportion, in increasing displacement liquid in lithium concentration, benzene first
The ratio that sour lithium is occupied is a key factor, defines lithium benzoate concentration value and isWherein ρ is soft son
Exchange threshold value, wLiBAFor the weight of lithium benzoate powder, wBAThe weight of benzoic acid powder；
3.2 by diffusion theory it is found that ion-exchange speed, by the concentration gradient etc. on diffusion coefficient, temperature, diffusing surface
What factor determined, and the target of soft sub- exchange temperature is to be that a step completes two processes of proton exchange and annealing, institute
With the soft sub- exchange temperature of fixation for 300 DEG C, in-furnace temperature is controlled by adjusting the temp controlled meter of Muffle furnace, is by temperature setting
300 DEG C, after certain constant temperature time is fully warmed-up by chip, rotating glass tube by certain tumbler makes benzoic acid
Chip is submerged with lithium benzoate solution, starts to exchange, after continuing 4 days soft proton exchanges, being rotated further by glass tube makes chip from displacement
It is detached in liquid, takes out chip；
3.3 after Muffle furnace is cooling and is close to room temperature, are first cleaned by ultrasonic with acetone, absolute ethyl alcohol, deionized water successively
Plane of crystal each ten minutes, removes the impression of the hand, grease and dust of plane of crystal, and it is miscellaneous can to remove plane of crystal for acetone first
Matter, then absolute ethyl alcohol be dissolved in acetone again, last deionized water rinses the ethyl alcohol of remained on surface, is finally completed entire cleaning
Journey.
Further, the step 4 is specially
Laser resonator film is plated in two polished end faces of slab guide, one end that wave guide direction is entered in light wave plates
The anti-reflection film of 918nm and the high-reflecting film of 1061nm plate 1061nm's in the one end in another direction of light wave output waveguide
The high-reflecting film of anti-reflection film and 918nm forms waveguide laser device.
Further, the step 5 is specially
Using diamond scribing cutting technique, ridge structure is cut into, cutting width is 8 μm, and depth of cut is 30 μm；It cuts
During cutting, the blade particle mesh size used is #4800, and particle diameter is 2 μm, while the blade for selecting resin to paste.
A kind of miniature ridge waveguide laser, it is characterised in that：Including first laser generator, the first optical fiber, the first lens,
Second lens, ridge waveguide, second laser generator, the second optical fiber, the third lens, the 4th lens, dichroic mirror and the 5th lens, the
One laser generator, the first optical fiber, the first lens, the second lens are successively set on from left to right on the left of ridge waveguide, second laser
Generator, the second optical fiber, the third lens, the 4th lens, dichroic mirror are successively set on from right to left on the right side of ridge waveguide, and dichroic mirror inclines
Oblique 45 degree of settings, the 5th lens are arranged on the downside of dichroic mirror, and ridge waveguide uses the miniature ridge ripple of claim 1-6 any one of them
The production method led is made.
Further, ridge waveguide left end plating 918nm high thoroughly, 1061nm high-reflecting films, right end plate 1061nm high it is saturating,
918nm50% transmission films.
Further, the dichroic mirror 10 plate 1061nm high instead, 918nm high transmittance films.
Further, the first laser generator and second laser generator send out 918nm pump lights.
Compared with prior art, the present invention haing the following advantages and effect：
1, the present invention increases lithium concentration in displacement liquid, slows down using soft sub- exchange system for waveguide laser
The outside diffusion velocity of lithium ion in lithium niobate lattice, reaches the purpose for slowing down proton exchange speed.Photorefractive damage is reduced, is protected
The original crystalline phase of crystal is held, to reduce the damage of lattice in crystal, laser frequency efficiency is improved, produces stable company
Continuous wave laser generation.
2, laser of the present invention reduces the volume of laser resonator, increases resonance using waveguide as gain media
The optical power density of intracavitary, to realize efficient waveguide laser output.
3, the present invention avoids using lens and speculum, reduces by plating anti-reflection film and high-reflecting film at waveguide both ends
The quantity of component needed for laser greatly reduces the size and cost of laser, improves the integrated level of laser system.
Description of the drawings
Fig. 1 is a kind of flow chart of the production method of miniature ridge waveguide of the present invention.
Fig. 2 is the schematic diagram of the miniature ridge waveguide of the present invention.
Fig. 3 is the mode distributions figure of 918nm and 1061nm.
Fig. 4 is a kind of schematic diagram of miniature ridge waveguide laser of the present invention.
Specific implementation mode
The present invention is described in further detail below in conjunction with the accompanying drawings and by embodiment, and following embodiment is to this hair
Bright explanation and the invention is not limited in following embodiments.
As shown, a kind of production method of miniature ridge waveguide of the present invention, comprises the steps of：
Step 1：To LiNbO3Crystal is polished, and after cleaning polishing sample surface；
1.1 utilize the method for chemical-mechanical grinding to crystal end-face polishing treatment；
1.2 successively start the cleaning processing the crystal after polishing using acetone soln, absolute ethyl alcohol, distilled water；It is respectively clear
It washes 15 minutes.
Step 2：The ytterbium film of one layer of Nano grade thickness is evaporated in plane of crystal, and processing is diffused in hot environment；
The ytterbium film that a layer thickness is 30nm is deposited on lithium columbate crystal surface using precision machinery electron beam evaporation technique, such as
In Fig. 2 shown in ytterbium diffusion layer 2, then crystal is placed in high-temperature atmosphere furnace, in order to prevent waveguide surface peroxide breaks down,
High temperature diffusion processing is carried out to the crystal with ytterbium film under aerobic environment, diffusion temperature setting is at 1100 degrees Celsius, diffusion time
It is set as 30 hours.
Step 3：Soft proton exchange processing is carried out to crystal, forms planar optical waveguide；
Soft proton exchange is specially
3.1 mix lithium benzoate with benzoic acid in certain proportion, in increasing displacement liquid in lithium concentration, benzene first
The ratio that sour lithium is occupied is a key factor, defines lithium benzoate concentration value and isWherein ρ is soft son
Exchange threshold value, wLiBAFor the weight of lithium benzoate powder, wBAThe weight of benzoic acid powder；
3.2 by diffusion theory it is found that ion-exchange speed, by the concentration gradient etc. on diffusion coefficient, temperature, diffusing surface
What factor determined, and the target of soft sub- exchange temperature is to be that a step completes two processes of proton exchange and annealing, institute
With the soft sub- exchange temperature of fixation for 300 DEG C, in-furnace temperature is controlled by adjusting the temp controlled meter of Muffle furnace, is by temperature setting
300 DEG C, after certain constant temperature time is fully warmed-up by chip, rotating glass tube by certain tumbler makes benzoic acid
Chip is submerged with lithium benzoate solution, starts to exchange, after continuing 4 days soft proton exchanges, being rotated further by glass tube makes chip from displacement
It is detached in liquid, takes out chip；
3.3 after Muffle furnace is cooling and is close to room temperature, are first cleaned by ultrasonic with acetone, absolute ethyl alcohol, deionized water successively
Plane of crystal each ten minutes, removes the impression of the hand, grease and dust of plane of crystal, and it is miscellaneous can to remove plane of crystal for acetone first
Matter, then absolute ethyl alcohol be dissolved in acetone again, last deionized water rinses the ethyl alcohol of remained on surface, is finally completed entire cleaning
Journey.
Step 4：Laser resonator film is plated in slab guide both ends of the surface；
Plate laser resonator film in two polished end faces of slab guide, as laser resonator input terminal plated film 4 in Fig. 2,
Shown in laser resonator output end plated film 5, one end that wave guide direction is entered in light wave plates the anti-reflection film and 1061nm of 918nm
High-reflecting film plates the high-reflecting film of the anti-reflection film and 918nm of 1061nm, shape in the one end in another direction of light wave output waveguide
At waveguide laser device.
In actual use, waveguide laser exports in order to obtain：Usable ti sapphire laser generates centre wavelength
The continuous pump lights of 918nm pump Yb as described in pump light 6 in Fig. 2:LiNbO3Waveguide, to generate stable 1061nm waveguides
Laser exports, as shown in waveguide laser 7 in Fig. 2.
Step 5：Using diamond scribing cutting technique, ridge structure is cut into, cutting width is 8 μm, and depth of cut is
30μm.In cutting process, the blade particle mesh size used is #4800, and particle diameter is 2 μm, while considering LiNbO3
Crystal is kind of a fragile crystal material, and hardness is moderate, therefore the blade for selecting resin to paste.
Step 6：By coupling pump light into ridge waveguide laser, the laser of 1061nm is generated.
A kind of miniature ridge waveguide laser, including first laser generator 8, the first optical fiber 9, the first lens 10, second are thoroughly
Mirror 11, ridge waveguide 12, second laser generator 13, the second optical fiber 14, the third lens 15, the 4th lens 16, dichroic mirror 17 and
Five lens 18, first laser generator 8, the first optical fiber 9, the first lens 10, the second lens 11 are successively set on ridge from left to right
12 left side of waveguide, second laser generator 13, the second optical fiber 14, the third lens 15, the 4th lens 16, dichroic mirror 17 are from right to left
It is successively set on 12 right side of ridge waveguide, dichroic mirror 17 tilts 45 degree of settings, and the setting of the 5th lens 18 is in 17 downside of dichroic mirror, ridge ripple
12 are led to be made of the production method of miniature ridge waveguide.
Ridge waveguide left end plate 918nm high thoroughly, 1061nm high-reflecting films, right end plates that 1061nm high is saturating, 918nm50% transmission films.
Dichroic mirror 10 plate 1061nm high instead, 918nm high transmittance films.First laser generator and second laser generator send out 918nm pumpings
Light.
918nm pump lights enter ridge by first laser generator 8 by the first optical fiber 9, the first lens 10, the second lens 11
12 waveguide resonant cavity of waveguide.And 12 left end of ridge waveguide plating 918nm high thoroughly, 1061nm high-reflecting films, right end plate 1061nm high it is saturating,
918nm50% transmission films.It is in 45 degree of angles, dichroic mirror with 12 end face of ridge waveguide that 12 right end of ridge waveguide, which has dichroic mirror 17, dichroic mirror 17,
17 plating 1061nm high are anti-, 918nm high transmittance films, and right end is respectively that the 4th lens 16, the third lens 15, the second optical fiber 14, second are sharp
Optical generator 13.Second laser generator 13 and first laser generator 1 are simultaneously emitted by 918nm pump lights, pass through optical fiber, lens
Directive resonant cavity generates 1061nm laser, projects from 12 right side of ridge waveguide, is reflected through dichroic mirror 17, into the 5th lens 18, production
Raw 1061nm laser.
The present invention reduces the volume of laser resonator, increases using ridge optical waveguide as the gain media of laser
Optical power density in resonant cavity, so as to realize stable waveguide laser output.Soft proton exchange system is used simultaneously
It is fast to external diffusion to slow down lithium ion in lithium niobate lattice by increasing lithium concentration in displacement liquid for standby waveguide laser
Degree, reaches the purpose for slowing down proton exchange speed.Photorefractive damage is also reduced, the original crystalline phase of crystal is kept, to reduce
The damage of lattice, improves laser frequency efficiency in crystal.In addition, soft sub- exchange temperature is increased to 300 DEG C, keeping
Under the premise of crystal crystalline phase is not damaged, proton exchange and annealing process are disposably completed, simplifies preparation process, is shortened
Preparation time.On this basis, to the technique prepare ridge waveguide carry out simulation analysis, the results are shown in Figure 3, from figure we
918nm and 1061nm optical maser wavelengths are can be seen that, can be limited in well in soft proton exchange ridge waveguide and be passed
Defeated, we can also be seen that the foundational model field of 918nm and 1061nm wavelength lasers is all affixed on the upper surface of ridge waveguide from figure,
Therefore the mould field overlap factor of different laser is larger, and then improves laser frequency efficiency.
Described in this specification above content is only illustrations made for the present invention.Technology belonging to the present invention
The technical staff in field can do various modifications or supplement to described specific embodiment or substitute by a similar method, only
The guarantor of the present invention should all be belonged to without departing from the content or beyond the scope defined by this claim of description of the invention
Protect range.
Claims (10)
1. a kind of production method of miniature ridge waveguide, it is characterised in that comprise the steps of：
Step 1：To LiNbO3Crystal is polished, and after cleaning polishing sample surface；
Step 2：The ytterbium film of one layer of Nano grade thickness is evaporated in plane of crystal, and processing is diffused in hot environment；
Step 3：Soft proton exchange processing is carried out to crystal, forms planar optical waveguide；
Step 4：Laser resonator film is plated in slab guide both ends of the surface；
Step 5：Using diamond scribing cutting technique, ridge structure is cut into；
Step 6：By coupling pump light into ridge waveguide laser, the laser of 1061nm is generated.
2. a kind of production method of miniature ridge waveguide described in accordance with the claim 1, it is characterised in that：The step 1 is specially
1.1 utilize the method for chemical-mechanical grinding to crystal end-face polishing treatment；
1.2 successively start the cleaning processing the crystal after polishing using acetone soln, absolute ethyl alcohol, distilled water；Each self-cleaning 15
Minute.
3. a kind of production method of miniature ridge waveguide described in accordance with the claim 1, it is characterised in that：The step 2 is specially
The ytterbium film that a layer thickness is 30nm is deposited on lithium columbate crystal surface using precision machinery electron beam evaporation technique, then will
Crystal is placed in high-temperature atmosphere furnace, in order to prevent waveguide surface peroxide breaks down, to the crystalline substance with ytterbium film under aerobic environment
Body carries out High temperature diffusion processing, and diffusion temperature is arranged at 1100 degrees Celsius, and diffusion time is set as 30 hours.
4. a kind of production method of miniature ridge waveguide described in accordance with the claim 1, it is characterised in that：It is soft in the step 3
Son exchanges
3.1 mix lithium benzoate with benzoic acid in certain proportion, in increasing displacement liquid in lithium concentration, lithium benzoate
The ratio occupied is a key factor, defines lithium benzoate concentration value and isWherein ρ is soft proton exchange
Threshold value, wLiBAFor the weight of lithium benzoate powder, wBAThe weight of benzoic acid powder；
3.2 by diffusion theory it is found that ion-exchange speed, by factors such as concentration gradients on diffusion coefficient, temperature, diffusing surface
It determines, and the target of soft sub- exchange temperature is to be that a step completes two processes of proton exchange and annealing, so solid
Fixed soft sub- exchange temperature is 300 DEG C, and in-furnace temperature is controlled by adjusting the temp controlled meter of Muffle furnace, is 300 by temperature setting
DEG C, after certain constant temperature time is fully warmed-up by chip, by certain tumbler rotate glass tube make benzoic acid and
Lithium benzoate solution submerges chip, starts to exchange, after continuing 4 days soft proton exchanges, being rotated further by glass tube makes chip from displacement liquid
In detach, take out chip；
3.3 after Muffle furnace is cooling and is close to room temperature, are first cleaned by ultrasonic crystal successively with acetone, absolute ethyl alcohol, deionized water
Surface each ten minutes, removes the impression of the hand, grease and dust of plane of crystal, and acetone first can remove plane of crystal impurity, connect
It absolute ethyl alcohol and is dissolved in acetone again, last deionized water rinses the ethyl alcohol of remained on surface, is finally completed entire cleaning process.
5. a kind of production method of miniature ridge waveguide described in accordance with the claim 1, it is characterised in that：The step 4 is specially
Laser resonator film is plated in two polished end faces of slab guide, one end that wave guide direction is entered in light wave plates 918nm
Anti-reflection film and 1061nm high-reflecting film, plate the anti-reflection film of 1061nm in the one end in another direction of light wave output waveguide
With the high-reflecting film of 918nm, waveguide laser device is formed.
6. a kind of production method of miniature ridge waveguide described in accordance with the claim 1, it is characterised in that：The step 5 is specially
Using diamond scribing cutting technique, ridge structure is cut into, cutting width is 8 μm, and depth of cut is 30 μm；It cuts through
Cheng Zhong, the blade particle mesh size used are #4800, and particle diameter is 2 μm, while the blade for selecting resin to paste.
7. a kind of miniature ridge waveguide laser, it is characterised in that：Including first laser generator, the first optical fiber, the first lens,
Two lens, ridge waveguide, second laser generator, the second optical fiber, the third lens, the 4th lens, dichroic mirror and the 5th lens, first
Laser generator, the first optical fiber, the first lens, the second lens are successively set on from left to right on the left of ridge waveguide, second laser hair
Raw device, the second optical fiber, the third lens, the 4th lens, dichroic mirror are successively set on from right to left on the right side of ridge waveguide, and dichroic mirror tilts
45 degree of settings, the 5th lens are arranged on the downside of dichroic mirror, and ridge waveguide uses the miniature ridge waveguide of claim 1-6 any one of them
Production method be made.
8. miniature ridge waveguide laser according to claim 7, it is characterised in that：The ridge waveguide left end plates 918nm high
Thoroughly, 1061nm high-reflecting films, right end plate that 1061nm high is saturating, 918nm50% transmission films.
9. miniature ridge waveguide laser according to claim 7, it is characterised in that：The dichroic mirror 10 plates 1061nm high
Instead, 918nm high transmittance films.
10. miniature ridge waveguide laser according to claim 7, it is characterised in that：The first laser generator and
Dual-laser generator sends out 918nm pump lights.
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| CN108574194A (en) * | 2018-07-02 | 2018-09-25 | 南京天正明日自动化有限公司 | A kind of miniature ridge waveguide laser, miniature laser and preparation method thereof |
| CN110133798A (en) * | 2019-07-02 | 2019-08-16 | 山东大学 | The method that ridge optical waveguide is prepared using diamond dicing saw |
| CN110764188A (en) * | 2019-10-23 | 2020-02-07 | 天津大学 | Preparation method of lithium niobate ridge type optical waveguide |
| CN111129920A (en) * | 2019-12-30 | 2020-05-08 | 上海交通大学 | Preparation method of distributed Bragg reflection laser based on erbium-doped lithium niobate thin film |
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| OLEKSANDR STEPANENKO等: "Highly confining planar proton exchanged waveguides on z-cut LiNbO3 without degrading its nonlinear coefficients: the HISoPE process", 《IEEE PHOTONICS TECHNOLOGY LETTERS》 * |
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| CN108574194A (en) * | 2018-07-02 | 2018-09-25 | 南京天正明日自动化有限公司 | A kind of miniature ridge waveguide laser, miniature laser and preparation method thereof |
| CN110133798A (en) * | 2019-07-02 | 2019-08-16 | 山东大学 | The method that ridge optical waveguide is prepared using diamond dicing saw |
| CN110764188A (en) * | 2019-10-23 | 2020-02-07 | 天津大学 | Preparation method of lithium niobate ridge type optical waveguide |
| CN111129920A (en) * | 2019-12-30 | 2020-05-08 | 上海交通大学 | Preparation method of distributed Bragg reflection laser based on erbium-doped lithium niobate thin film |
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