CN108490626A - A kind of polarization beam splitting element and device - Google Patents
A kind of polarization beam splitting element and device Download PDFInfo
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- CN108490626A CN108490626A CN201810259495.8A CN201810259495A CN108490626A CN 108490626 A CN108490626 A CN 108490626A CN 201810259495 A CN201810259495 A CN 201810259495A CN 108490626 A CN108490626 A CN 108490626A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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Abstract
The present invention relates to polarization of electromagnetic wave beam splitting field, a kind of polarization beam splitting element and device are disclosed.The polarization beam splitting element includes the thin dielectric film and metallic film being periodically alternately superimposed, wherein one layer of thin dielectric film and one layer of metallic film constitute a cycle repetitive unit, the average dielectric constant for being repeated cyclically unit is zero.When light is to be parallel to polarization beam splitting component interface incidence, H mode in the light is with transverse magnetic wave since the dispersion relation difference in polarization beam splitting element detaches so as to realize, it is different with thickness accounting of the metallic film in being repeated cyclically unit according to thin dielectric film simultaneously, there are two types of operating modes for polarization beam splitting element tool, can flexibly be selected under different demands.The polarization beam splitting component structure of the structure is simple, easily prepared, material selection is extensive, and size is much smaller than existing polarization beam apparatus, is easily integrated, has a wide range of applications in optic communication, integrated optical circuit.
Description
Technical field
The invention belongs to polarization of electromagnetic wave beam splitting fields, and in particular to a kind of polarization beam splitting element and device.
Background technology
Polarised light has a wide range of applications in contemporary optics test and optical application.And common light wave is in generic media
When propagation, it is not to be in complete polarization state, but includes H mode (Transverse electric, TE) and transverse magnetic wave
The compound state of (Transverse magnetic, TM) two kinds of mutually orthogonal polarization states.Polarization beam apparatus can be both just
It hands over polarization state to be spatially separated, extensive, important application is suffered from traditional optical light path, optic communication, integrated optical circuit.
There are three types of traditional polarization beam apparatus, includes mainly：
The polarization beam apparatus of dielectric multilayer membrane structure.The polarization beam apparatus depends on Brewster's angle to realize partially
It shakes beam splitting, under Brewster's angle, the light waves of TM patterns wholly transmissive can pass through dielectric multilayer membrane structure, and TE patterns
Light wave, which has, to be greatly reflected back, therefore only includes the light wave of TE patterns in reflection light, to realize TE moulds
The separation of formula and TM pattern light waves.However, there is also some defects for the polarization beam apparatus of this dielectric multilayer membrane structure, such as
Very sensitive to incident angle dependence, size is larger, it is difficult to fully meet the demand of modern integrated optical circuit system.
Polarization beam apparatus based on anisotropic medium.The polarization beam apparatus is based primarily upon light wave in anisotropic medium
Birefringent phenomenon, i.e. refractive properties of the light wave of TE patterns and TM patterns in anisotropic medium are different.This polarization point
The design of beam device is simple, technology maturation, however size be often millimeter magnitude in addition bigger, it is difficult to minimize, may not apply to
Integrated optics design.
Two-dimensional photon crystal polarization beam dividing device.The polarization beam apparatus mainly utilizes the light wave of TE patterns and TM patterns in two dimension
The difference of optical property realizes the separation of different polarization in photonic crystal.For example, under specific frequency, TE patterns and TM patterns
Light wave be respectively at the forbidden band and passband of photonic crystal so that only the light wave of specific polarization can be transmitted through this
Photonic crystal.The size of this two-dimensional photon crystal polarization beam dividing device can accomplish micron dimension, so as in integreted phontonics
It is middle to play certain effect.However, its structure is complex, preparation process difficulty is larger, and manufacturing cost is higher.
Invention content
It is an object of the invention to overcome problem above existing for conventional polarization beam splitter, a kind of simple in structure, ruler is provided
It is very little wavelength magnitude and tool there are two types of operating mode polarization beam splitting element and device.
To achieve the goals above, the present invention provides a kind of polarization beam splitting element and devices, including：
Periodically alternately superposition formation is more for thin dielectric film and metallic film, the thin dielectric film and the metallic film
Film structure；
Wherein, a cycle repetitive unit is made of one layer of thin dielectric film and one layer of metallic film, institute
It is zero to state and be repeated cyclically the average dielectric constant of unit, is met,
fd+fm=1
fdεd+fmεm=0
Wherein, fdAnd fmIndicate every layer of thin dielectric film and every layer of metallic film in the periodically weight respectively
Thickness accounting in multiple unit, εdAnd εmThe relative dielectric constant of the thin dielectric film and the metallic film is indicated respectively；
When work, light is incident with the direction for being parallel to the multi-layer film structure interface, the light include H mode and
Transverse magnetic wave, it is different with dispersion relation of the transverse magnetic wave in the polarization beam splitting element by the H mode, described in realization
The separation of H mode and the transverse magnetic wave.
Further,
When H mode incidence, dispersion relation of the H mode in the polarization beam splitting element be,
When TM waves incident, dispersion relation of the transverse magnetic wave in the polarization beam splitting element be,
Wherein, ε⊥=εdεm/(εdfm+εmfr), a ＜ ＜ λ, kxIt is electromagnetic wave light described in the polarization beam splitting element
Wave vector in incident direction, kyIt is wave of the electromagnetic wave in the polarization beam splitting element in the light incident direction
Arrow, k0It is the wave vector of the light in free space, λ is the wavelength of the light, and a is the thickness for being repeated cyclically unit
Degree, the H mode refer to electromagnetic wave of the direction of an electric field perpendicular to the direction of propagation, the transverse magnetic wave refer to magnetic direction perpendicular to
The electromagnetic wave of the direction of propagation.
Further, the light is visible light.
Further, the same magnitude of wavelength of the thickness of the polarization beam splitting element and the light.
Further, the thickness is between 100nm~1000nm.
Further, the thin dielectric film and the metallic film are prepared by low-loss material.
Further, the thin dielectric film is air or silica, and the metallic film is gold or silver.
The present invention also provides a kind of polariz-ing beam splitting devices, including integral substrate, and on the integral substrate
The polarization beam splitting element.
By thin dielectric film and metallic film, periodically alternately superposition forms multi-layer film structure to the present invention, it is made averagely to be situated between
Electric constant is zero, different from dispersion relation of the transverse magnetic wave in polarization beam splitting element further according to H mode in light, to realize
To the polarization beam splitting effect of light.
Description of the drawings
Technical solution in technology in order to illustrate the embodiments of the present invention more clearly, in being described below to embodiment technology
Required attached drawing is briefly described, it should be apparent that, the accompanying drawings in the following description is only some realities of the present invention
Example is applied, it for those of ordinary skill in the art, without creative efforts, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 is the structural schematic diagram of polarization beam splitting element of the present invention；
Fig. 2 is the operating mode schematic diagram of polarization beam splitting device embodiments 1 of the present invention；
Fig. 3 is equal frequency curve charts when embodiment 1 works；
Fig. 4 is the transmission simulation drawing of the H mode and transverse magnetic wave when embodiment 1 works；
Fig. 5 is the H mode and field energy distribution schematic diagram of the transverse magnetic wave at Fig. 4 dotted lines when embodiment 1 works；
Fig. 6 is the operating mode schematic diagram of polarization beam splitting device embodiments 2 of the present invention；
Fig. 7 is equal frequency curve charts when embodiment 2 works；
Fig. 8 is the transmission simulation drawing of the H mode and transverse magnetic wave when embodiment 2 works；
Fig. 9 is the H mode and field energy distribution schematic diagram of the transverse magnetic wave at Fig. 8 dotted lines when embodiment 2 works.
Each symbolic indication is as follows in figure：
1, thin dielectric film, 2, metallic film, 3, be repeated cyclically unit,
4, polarization beam splitting element
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other without creative efforts
Embodiment shall fall within the protection scope of the present invention.
Referring to attached drawing 1, it is the structural schematic diagram of polarization beam splitting element of the present invention.The polarization beam splitting element includes dielectric
Periodically alternately superposition forms multilayer film knot along the y-axis direction for film 1 and metallic film 2, thin dielectric film 1 and metallic film 2
Structure, the multilayer film are polarization beam splitting element 4；Wherein, one layer of thin dielectric film and one layer of metallic film form a cycle
Repetitive unit 3, the average dielectric constant for being repeated cyclically unit 3 are zero, are met,
fd+fm=1
fdεd+fmεm=0
Wherein, fdAnd fmIndicate every layer of institute's thin dielectric film 1 and every layer of metallic film 2 in being repeated cyclically unit 3 respectively
Thickness accounting, εdAnd εmThe relative dielectric constant of thin dielectric film and metallic film is indicated respectively.
When the polarization beam splitting element 4 works, light is to be parallel to multi-layer film structure interface direction (x-axis direction) incidence, so
And light is not to be in complete polarization state, but includes H mode (electric field along the z-axis direction, Transverse
Electric, TE) and mutually orthogonal inclined of two kinds of transverse magnetic wave (magnetic field along the z-axis direction, Transverse magnetic, TM)
The compound state of polarization state.Therefore, for the electromagnetic wave of TE patterns, (frequencies such as i.e. are bent for dispersion relation in polarization beam splitting element 4
Line) be,
For the electromagnetic wave of TM patterns, the dispersion relation in polarization beam splitting element 4 is then,
Wherein, ε⊥=εdεm/(εdfm+εmfr), a ＜ ＜ λ, kxIt is electromagnetic wave light incidence side in polarization beam splitting element 4
Upward wave vector, kyIt is wave vector of the electromagnetic wave in polarization beam splitting element 4 in light incident direction, k0It is that institute's light exists
Wave vector in free space, λ are the wavelength of the light, and a is the thickness for being repeated cyclically unit 3, and H mode refers to electric field side
To the electromagnetic wave perpendicular to the direction of propagation, transverse magnetic wave refers to electromagnetic wave of the magnetic direction perpendicular to the direction of propagation.
Referring to attached drawing 3 and attached drawing 7, heavy line and fine dotted line indicate the polarization beam splitting element under TE patterns and TM patterns respectively
4 equal frequency curves.In a ＜ ＜ λ, the equal frequency curves of polarization beam splitting element 4 under TE patterns are the circle of a very little；TM
The equal frequency curves of polarization beam splitting element 4 under pattern are two parabolas.Therefore, TE waves and TM waves are in polarization beam splitting element 4
In optical property be entirely different, so as to realize the effect of beam splitting to it.
In conjunction with above-mentioned formula, since light is with x-axis direction incidence, ky=0, equal frequency curves under TE patterns at this time
kxAlways there is the solution more than zero, and then there are two types of situations for TM patterns：
First, fm0.5 ＜ f of ＜dWhen, due to ε⊥＞ 0, the intersection of two parabolas, there are two for the equal frequency curves under TM patterns
A kxSolution more than zero, two corresponding direction of energy flow of solution are different at this time, and the directions of propagation of corresponding TM waves is towards the two of x-axis
Side, at this time TE waves there are highly transmissive and TM waves to have on the both sides of the light incident direction in light incident direction highly transmissive；
Second is that fm0.5 ＞ f of ＞dWhen, due to ε⊥＜ 0, two parabolas are non-intersecting, and the equal frequency curves under TM patterns are not deposited
In kxSolution, at this time TM waves can not be propagated in polarization beam splitting element 4, TE waves have highly transmissive and TM waves in light incident direction
It is totally reflected in light incident direction.
Therefore, there are two kinds of works according to the difference of the thickness accounting of thin dielectric film and metallic film for polarization beam splitting element 4
Operation mode.It is illustrated respectively below by way of two preferred embodiments pair, two kinds of operating modes.
Embodiment 1
The parameter of thin dielectric film and metallic film is respectively εd=6, εm=-2, fd=0.25 and fm=0.75, periodically
The thickness of repetitive unit is a=λ 6.At this moment, the equal frequency curves of polarization beam splitting element 4 under TE and TM patterns respectively as in Fig. 3
Heavy line and fine dotted line shown in (normalized frequency fa/c=0.167), under TE patterns its be very little circle, be then under TM patterns
Two disjoint parabolas.In this case, when the light of TE patterns and TM mode mixtures is along being parallel to multilayer film knot
Interface direction (i.e. the directions the x) normal incidence of structure to multi-layer film structure side when, due to ky=0, according to fig. 3 in etc. frequencies it is bent
Line can be seen that the k existed under TE patterns at this time more than zeroxSolution, indicate that TE wave energy is enough and passed in polarization beam splitting element 4
It broadcasts；And for TM patterns, k is not present at this timexSolution, this shows that TM waves cannot be propagated in polarization beam splitting element, such as Fig. 2 institutes
Show.Based on such characteristic, effectively both polarised lights can be separated, as shown in Figure 4 and Figure 5.Black solid line in Fig. 5 and
Grey solid line indicates TE waves and field energy distribution situation of the TM waves at Fig. 4 dotted lines respectively, it can be seen that the TE waves in regional transmission
Amplitude be far longer than the amplitudes of TM waves, indicate that TE waves have highly transmissive and TM waves have then largely been reflected in incidence surface,
Substantially polarization beam splitting element 4 is penetrated without TM waves.
The thickness of the polarization beam splitting element 4 is only quarter-wave, belongs to sub-wavelength structure, in the feelings of visible light incidence
Under condition, thickness is only far smaller than existing polarization beam splitting device between 100nm~200nm.
Embodiment 2
The parameter of thin dielectric film and metallic film is respectively εd=1, εm=-4, fd=0.8 and fm=0.2, periodically weight
The thickness of multiple unit takes λ/8 a=.At this moment, the equal frequency curves of polarization beam splitting element 4 under TE and TM patterns respectively as in Fig. 7
Heavy line and fine dotted line shown in (normalized frequency fa/c=0.125), be the circle of very little under TE patterns, be under TM patterns
The parabola of two intersections.In this case, when the light of TE patterns and TM mode mixtures is along being parallel to multi-layer film structure
Interface direction (i.e. the directions x) normal incidence to multi-layer film structure side when, have ky=0, it can according to the equal frequency curves in Fig. 7
To find out, there is the k more than zero under TE patterns at this timexSolution, indicate that TE wave energy is enough and propagated in polarization beam splitting element 4；It is right
In TM patterns, two parabolical intersection points are k at this timexSolution, but the intersection point corresponding TM waves can flow the direction of propagation not
Together, it still can be considered two kxSolution, at this time the corresponding communication mode of TM waves deviate x-axis, transmit towards the both sides of incident direction, such as scheme
Shown in 6.Based on such characteristic, effectively both polarised lights can also be separated in such a mode.As shown in figure 8, from
The TE waves transmitted in polarization beam splitting element 4 are propagated mainly along the direction of incidence wave, and the TM transmitted from polarization beam splitting element
Wave is then divided into two beams up and down.Black solid line and grey solid line in Fig. 9 indicate TE waves and field energy of the TM waves at Fig. 8 dotted lines respectively
Distribution situation, it can be seen that the energy of TE waves is mainly distributed on center (i.e. along incident direction) in regional transmission, and saturating
The energy for the TM waves penetrated then is mainly distributed on the both sides of incident direction.According to the difference of Energy distribution position, the multi-layer film structure
Polarization beam splitting element can realize TE patterns and TM pattern light beams separation effect.
The thickness of the polarization beam splitting element 4 is 1.6 λ, and size is in wavelength magnitude, thick in the case of visible light incidence
Degree is equally much smaller than existing polarization beam splitting device between 600nm~1000nm.
By thin dielectric film and metallic film, periodically alternately superposition is formed the polarization beam splitting element and device of the present invention
Multi-layer film structure, it is zero to make its average dielectric constant, further according to H mode in light and transverse magnetic wave in polarization beam splitting element
Dispersion relation is different, to realize the polarization beam splitting effect to light；Further, existed according to thin dielectric film and metallic film
The thickness accounting being repeated cyclically in unit is different, and there are two types of operating modes for polarization beam splitting element tool, in practical applications can be with
Neatly selected；The polarization beam splitting component structure of the structure is simple simultaneously, prepares simply, and material selection is various, and such as electricity is situated between
Matter film can select the low-loss materials such as air, silica, metallic film can select your lower gold of gold, silver equal loss
Belong to；In addition to this size of polarization beam splitting element of the invention is easy to collect at wavelength magnitude (thickness is in 100nm~1000nm)
At there is extensive and important application prospect in traditional optical light path, optic communication, integrated optical circuit.
The above is only a preferred embodiment of the present invention, it is not intended to restrict the invention, it is noted that for this skill
For the those of ordinary skill in art field, without departing from the technical principles of the invention, can also make it is several improvement and
Modification, these improvements and modifications also should be regarded as protection scope of the present invention.
Claims (8)
1. a kind of polarization beam splitting element, which is characterized in that including：
Periodically alternately superposition forms multilayer film for thin dielectric film and metallic film, the thin dielectric film and the metallic film
Structure,
Wherein, a cycle repetitive unit is made of one layer of thin dielectric film and one layer of metallic film, the week
The average dielectric constant of phase property repetitive unit is zero, is met,
fd+fm=1
fdεd+fmεm=0
Wherein, fdAnd fmIndicate that every layer of thin dielectric film and every layer of metallic film are repeated cyclically list described respectively
Thickness accounting in member, εdAnd εmThe relative dielectric constant of the thin dielectric film and the metallic film is indicated respectively；
When work, light is incident with the direction for being parallel to the multi-layer film structure interface, and the light includes H mode and horizontal magnetic
Wave, it is different with dispersion relation of the transverse magnetic wave in the polarization beam splitting element by the H mode, realize the transverse electric
The separation of wave and the transverse magnetic wave.
2. polarization beam splitting element according to claim 1, it is characterised in that：
When the H mode incidence, dispersion relation of the H mode in the polarization beam splitting element be,
When the TM waves incident, dispersion relation of the transverse magnetic wave in the polarization beam splitting element be,
Wherein, ε⊥=εdεm/(εdfm+εmfr), a ＜ ＜ λ, kxIt is that electromagnetic wave light described in the polarization beam splitting element is incident
Wave vector on direction, kyIt is wave vector of the electromagnetic wave in the polarization beam splitting element in the light incident direction, k0It is
The wave vector of the light in free space, λ are the wavelength of the light, and a is the thickness for being repeated cyclically unit, described
H mode refers to electromagnetic wave of the direction of an electric field perpendicular to the direction of propagation, and the transverse magnetic wave refers to magnetic direction perpendicular to the direction of propagation
Electromagnetic wave.
3. polarization beam splitting element according to claim 1, it is characterised in that：The light is visible light.
4. polarization beam splitting element according to claim 3, it is characterised in that：The thickness of the polarization beam splitting element with it is described
The same magnitude of wavelength of light.
5. polarization beam splitting element according to claim 4, it is characterised in that：The thickness is between 100nm~1000nm.
6. polarization beam splitting element according to claim 1, it is characterised in that：The thin dielectric film and the metallic film
It is prepared by low-loss material.
7. polarization beam splitting element according to claim 6, it is characterised in that：The thin dielectric film is air or titanium dioxide
Silicon, the metallic film are gold or silver.
8. a kind of polariz-ing beam splitting device, it is characterised in that：Including integral substrate, and on the integral substrate according to power
Profit requires the polarization beam splitting element described in 1-3,6 any one.
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| CN113568099A (en) * | 2021-07-08 | 2021-10-29 | 武汉大学 | Visible light beam splitting filter film based on nano microcavity and design method thereof |
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