CN108470626A - Electrode material and preparation method thereof - Google Patents
Electrode material and preparation method thereof Download PDFInfo
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- CN108470626A CN108470626A CN201810206006.2A CN201810206006A CN108470626A CN 108470626 A CN108470626 A CN 108470626A CN 201810206006 A CN201810206006 A CN 201810206006A CN 108470626 A CN108470626 A CN 108470626A
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- 239000007772 electrode material Substances 0.000 title claims abstract description 39
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- 229910052751 metal Inorganic materials 0.000 claims abstract description 76
- 239000002184 metal Substances 0.000 claims abstract description 73
- 239000010949 copper Substances 0.000 claims description 54
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 51
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 48
- 229910052802 copper Inorganic materials 0.000 claims description 46
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 43
- 239000000243 solution Substances 0.000 claims description 40
- 238000006243 chemical reaction Methods 0.000 claims description 37
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 36
- 239000011159 matrix material Substances 0.000 claims description 35
- 239000000126 substance Substances 0.000 claims description 34
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 32
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims description 22
- 238000009713 electroplating Methods 0.000 claims description 22
- 229910052759 nickel Inorganic materials 0.000 claims description 22
- 238000005516 engineering process Methods 0.000 claims description 21
- 238000001027 hydrothermal synthesis Methods 0.000 claims description 18
- 229910052697 platinum Inorganic materials 0.000 claims description 16
- 235000019270 ammonium chloride Nutrition 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 12
- 229910002651 NO3 Inorganic materials 0.000 claims description 11
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 11
- 150000003839 salts Chemical class 0.000 claims description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 238000005660 chlorination reaction Methods 0.000 claims description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims description 10
- 150000004706 metal oxides Chemical class 0.000 claims description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 9
- 235000010299 hexamethylene tetramine Nutrition 0.000 claims description 9
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 9
- 150000004692 metal hydroxides Chemical class 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 6
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 claims description 6
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims description 6
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 claims description 6
- 238000011065 in-situ storage Methods 0.000 claims description 6
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 229960004011 methenamine Drugs 0.000 claims description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 6
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 5
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 claims description 4
- 229910016506 CuCo2O4 Inorganic materials 0.000 claims description 3
- 229910003168 MnCo2O4 Inorganic materials 0.000 claims description 3
- 229910005949 NiCo2O4 Inorganic materials 0.000 claims description 3
- 229910005802 NiMn2O4 Inorganic materials 0.000 claims description 3
- 229910005798 NiMnO3 Inorganic materials 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000012298 atmosphere Substances 0.000 claims description 3
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 claims description 3
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 claims description 3
- 229910001981 cobalt nitrate Inorganic materials 0.000 claims description 3
- UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(II,III) oxide Inorganic materials [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 claims description 3
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 claims description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 3
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical group [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 claims description 3
- 229940099596 manganese sulfate Drugs 0.000 claims description 3
- 235000007079 manganese sulphate Nutrition 0.000 claims description 3
- 239000011702 manganese sulphate Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 3
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical group [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052723 transition metal Inorganic materials 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- 235000005074 zinc chloride Nutrition 0.000 claims description 3
- 239000011592 zinc chloride Substances 0.000 claims description 3
- 229910021503 Cobalt(II) hydroxide Inorganic materials 0.000 claims description 2
- 229910001338 liquidmetal Inorganic materials 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims 1
- VQWQYXBWRCCZGX-UHFFFAOYSA-N acetic acid;manganese Chemical compound [Mn].CC(O)=O.CC(O)=O VQWQYXBWRCCZGX-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 229910017604 nitric acid Inorganic materials 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000011149 active material Substances 0.000 abstract description 22
- 238000004070 electrodeposition Methods 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- QPLDLSVMHZLSFG-UHFFFAOYSA-N CuO Inorganic materials [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 4
- 229910003289 NiMn Inorganic materials 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 3
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000005518 electrochemistry Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000004146 energy storage Methods 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229940071125 manganese acetate Drugs 0.000 description 2
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 2
- 229910000357 manganese(II) sulfate Inorganic materials 0.000 description 2
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229910016507 CuCo Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- 229910003266 NiCo Inorganic materials 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000006258 conductive agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000002001 electrolyte material Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910021508 nickel(II) hydroxide Inorganic materials 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/24—Electrodes characterised by structural features of the materials making up or comprised in the electrodes, e.g. form, surface area or porosity; characterised by the structural features of powders or particles used therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/30—Electrodes characterised by their material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/30—Electrodes characterised by their material
- H01G11/46—Metal oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
- H01G11/86—Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/13—Energy storage using capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Battery Electrode And Active Subsutance (AREA)
Abstract
Electrode material and preparation method thereof.The invention discloses a kind of three-dimensional high heat conduction electrochemical capacitance electrodes and preparation method thereof.The electrode has three-D space structure, using high-thermal conductive metal as heat conduction core, and powers on deposited porous metal structure back loading high capacitance active material in heat conduction core.There is higher specific capacitance, excellent energy and power density, and good cycle using ultracapacitor prepared by the three-dimensional high heat conduction electrode, cheap, in telecommunications, the fields such as mobile device have great application potential.
Description
Technical field
The present invention relates to a kind of three-dimensional high heat conduction electrochemical capacitance electrode materials and preparation method thereof more particularly to one kind to answer
Electrode material and preparation method thereof for ultracapacitor.
Background technology
It is well known that the energy plays key player during the survival and development of human society.The world today is to changing
Depending on unduly for stone fuel not only makes it i.e. will be exhausted, but also the danger of various aspects is brought to natural environment, animals and plants and the mankind
Evil.Paid much attention to by researcher and business circles for this purpose, developing and producing renewable and clean energy resource.Currently, developed or
New energy being developed includes wind energy, nuclear energy, solar energy, ocean energy, Hydrogen Energy etc..In order to fully develop and utilize these
New energy needs the energy storage device to match therewith.There are many purposes as a kind of novel energy-storing element for ultracapacitor.It is not only
Itself can serve as common power, moreover it is possible to merge use with common batteries or fuel cell.In addition, ultracapacitor is in energy storage
The high power density shown with output facet can make up the defect of secondary cell.Research in relation to ultracapacitor at this stage
It focuses mostly in electrode material.
The performance of entire electrochemical energy storing device depends mainly on electrode material.Currently, most of electrochemical energy storing devices
Electrode preparation method it is as follows：By with electro-chemical activity metal oxide or bimetallic oxide, sulfide powder with
Solvents N-methyl -2- pyrroles are added after polymer adhesive (PVDF, polyvinyladine floride) mixing in conductive agent (carbon black, acetylene carbon black)
After pyrrolidone, uniform paste is stirred to get, is then coated in copper foil of affluxion body or nickel foam.But this preparation side
The electrode that method makes due to the use of the very low polymer adhesive of thermal conductivity, all pay no attention to by the internal resistance of entire electrode and thermal conductivity
Think, easy to produce huge heat in fast charging and discharging, and is difficult to be dispersed into environment, this stability for device
All it is very unfavorable with cycle performance.For conventional power supply thermal management scheme as increased device air flowing nearby, use is heat sink
Deng being all indirectly to take away the heat of device to play the role of cooling, however these are all without fundamentally solving devices
Heat dissipation problem.
Currently, the heat conduction research about electrochemical capacitance electrode is less, and it is higher using cost mostly, prepares more complicated
Graphene transmits heat, and at low cost, and the high-thermal conductive metal of technology maturation but rarely has people's research.
Invention content
In view of this, a kind of three-dimensional high heat conduction electrochemical capacitance electrode material and preparation method thereof, the electrode material with
High thermal conductivity and high-ratio surface.
In order to achieve the above purpose, present invention employs the following technical solutions：
A kind of electrode material, wherein the electrode material includes metal heat-conducting matrix, porous metallic layers and electro-chemical activity
Substance, for the porous metallic layers electroplating deposition on the surface of the metal heat-conducting matrix, the electroactive substance is in situ
Growth is formed on the porous metallic layers.
Wherein, the metal heat-conducting matrix is the single metal simple-substance with high thermal conductivity or two or more metal lists
The material of the alloy of matter composition, the porous metallic layers is any one in metallic copper, nickel, iron, aluminium or zinc.
Wherein, the electroactive substance is metal oxide, the metal hydroxides for including transition metal element
Or bimetallic oxide.
Wherein, the metal oxide is Co3O4、MnO2, NiO or CuO, the metal hydroxides is Cu (OH)2、Co
(OH)2Or Ni (OH)2, the bimetallic oxide is NiMn2O4、MnCo2O4、CuCo2O4、NiMnO3Or NiCo2O4。
The present invention also provides a kind of preparation method of electrode material as described above, this method includes：
Metal heat-conducting matrix is provided；
Using the metal heat-conducting matrix as cathode, electroplating technology is carried out in basic electroplate liquid, in the metal heat-conducting base
Deposition forms porous metallic layers on the surface of body；Include that the porous metallic layers correspond to metal material in the basis electroplate liquid
Metal chlorination salt；
The metal heat-conducting matrix for being formed with porous metallic layers is positioned in the first reaction solution and carries out hydro-thermal reaction, described
Growth in situ forms electroactive substance on porous metallic layers；It include the electro-chemical activity object in first reaction solution
The corresponding metallic element of matter.
Wherein, include metal chlorination salt and ammonium chloride in the basic electroplate liquid, the metal chlorination salt be copper chloride,
Nickel chloride, iron chloride, aluminium chloride or zinc chloride, a concentration of 0.1M~0.5M of the metal chlorination salt, the ammonium chloride it is dense
Degree is 2M~3M；It is anode using the metal heat-conducting matrix as cathode, platinum plate electrode, current density is in the electroplating technology
2A/cm2~3A/cm2, the time is 40s~100s.
Wherein, first reaction solution is the mixed aqueous solution of chlorate, ammonium chloride and sodium hydroxide, shape after hydro-thermal reaction
At electroactive substance be metal hydroxides；A concentration of 1mM~5mM of the chlorate, the concentration of the ammonium chloride
For 4mM~8mM, a concentration of 1mM~3mM of the sodium hydroxide；The chlorate is nickel chloride, copper chloride or cobalt chloride.
Wherein, it carries out also carrying out the high temperature anneal in the atmosphere of nitrogen after hydro-thermal reaction, the electrification being correspondingly formed
Active material is metal oxide.
Wherein, first reaction solution is the mixed aqueous solution of nitrate, acetate and methenamine, shape after hydro-thermal reaction
At electroactive substance be bimetallic oxide；A concentration of 0.02M~0.05M of the nitrate, the acetate
A concentration of 0.01M~0.03M, a concentration of 0.01M~0.03M of the methenamine；The nitrate is nickel nitrate, copper nitrate
Or cobalt nitrate, the acetate are copper acetate or manganese acetate.
Wherein, first reaction solution is the mixed aqueous solution of two kinds of sulfate, and the electrochemistry formed after hydro-thermal reaction is lived
Property substance be bimetallic oxide；A concentration of 0.01M~0.04M of the sulfate, described two sulfate be selected from nickel sulfate,
Arbitrary two kinds in manganese sulfate, cobaltous sulfate and copper sulphate.
Compared with prior art, a kind of three-dimensional high heat conduction electrochemical capacitance electrode provided by the present invention and preparation method thereof,
Method is simple and practicable, and yield is high, energy consumption is smaller.Material structure is three-dimensional porous, and larger ratio table is possessed while electric conductivity is high
Area can not only provide quick electron transmission channel, also increase active material bond area, meanwhile, electrolyte and activity
The contact area of substance also greatly increases, and can effectively shorten the diffusion length of ion, to obtain larger specific capacitance.This is three-dimensional
High heat conduction electrode is a kind of ultracapacitor haveing excellent performance, and can be provided simultaneously with high power density and high-energy density, is one
The novel electrode material of kind has great application potential in the field.
Description of the drawings
Fig. 1 is the flow diagram of the preparation method of electrode material provided in an embodiment of the present invention.
Specific implementation mode
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with the accompanying drawings to the specific reality of the present invention
The mode of applying is described in detail.The example of these preferred embodiments is illustrated in the accompanying drawings.Shown in attached drawing and according to
The embodiments of the present invention of attached drawing description are only exemplary, and the present invention is not limited to these embodiments.
Here, it should also be noted that, in order to avoid having obscured the present invention because of unnecessary details, in the accompanying drawings only
It shows the structure and/or processing step closely related with scheme according to the present invention, and is omitted little with relationship of the present invention
Other details.
The present embodiment provides firstly a kind of electrode material, wherein the electrode material includes metal heat-conducting matrix, porous
Metal layer and electroactive substance, the porous metallic layers electroplating deposition are described on the surface of the metal heat-conducting matrix
Electroactive substance growth in situ is formed on the porous metallic layers.
The present invention also provides a kind of preparation methods of electrode material as described above, and refering to fig. 1, this method includes step
Suddenly：
S1, metal heat-conducting matrix 1 is provided.The metal heat-conducting matrix 1 is the single metal simple-substance with high thermal conductivity
Or the alloy of two or more metal simple-substance compositions.Specifically, the metal heat-conducting matrix 1 can select to be that gold, silver, copper etc. are single
One metal or two or more metal alloys.
S2, with the metal heat-conducting matrix 1 it is cathode, electroplating technology is carried out in basic electroplate liquid, is led in the metal
Deposition forms porous metallic layers 2 on the surface of hot basal body 1.Specifically, the material of the porous metallic layers 2 can be selected as metal
Any one in copper, nickel, iron, aluminium or zinc.Wherein, include that the porous metallic layers correspond to metal in the basic electroplate liquid
The metal chlorination salt of material.
In the preferred scheme, include metal chlorination salt and ammonium chloride, the metal chlorination in the basic electroplate liquid
A concentration of 0.1M~0.5M of salt, a concentration of 2M~3M of the ammonium chloride；In the electroplating technology, with the metal heat-conducting base
Body is cathode, platinum plate electrode is anode, current density 2A/cm2~3A/cm2, the time is 40s~100s.Wherein, the metal
Chlorate is copper chloride, nickel chloride, iron chloride, aluminium chloride or zinc chloride.
S3, it the metal heat-conducting matrix 1 for being formed with porous metallic layers 2 is positioned in the first reaction solution carries out hydro-thermal reaction,
Growth in situ forms electroactive substance 3 on the porous metallic layers 2.Specifically, the electroactive substance is packet
Metal oxide, metal hydroxides containing transition metal element or bimetallic oxide.For example, the metal oxide is
Co3O4、MnO2, NiO or CuO, the metal hydroxides is Cu (OH)2、Co(OH)2Or Ni (OH)2, the bimetallic oxide
For NiMn2O4、MnCo2O4、CuCo2O4、NiMnO3Or NiCo2O4.Wherein, include the electrochemistry in first reaction solution
The corresponding metallic element of active material.
In the first preferred scheme, first reaction solution is the mixing water of chlorate, ammonium chloride and sodium hydroxide
Solution, the electroactive substance formed after hydro-thermal reaction are metal hydroxides.Wherein, a concentration of 1mM of the chlorate
~5mM, a concentration of 4mM~8mM of the ammonium chloride, a concentration of 1mM~3mM of the sodium hydroxide；The chlorate is chlorine
Change nickel, copper chloride or cobalt chloride.In the first preferred scheme, the temperature for carrying out hydro-thermal reaction is 40~80 DEG C, when reaction
Between be 13~16 hours.
Further, it in the first preferred scheme, carries out carrying out height also in the atmosphere of nitrogen after hydro-thermal reaction
Temperature annealing, the electroactive substance being correspondingly formed are metal oxide.Carry out the high temperature anneal temperature be 350~
450 DEG C, annealing time is 1~2 hour.
In second of preferred scheme, first reaction solution is the mixing water of nitrate, acetate and methenamine
Solution, the electroactive substance formed after hydro-thermal reaction are bimetallic oxide.Wherein, the nitrate is a concentration of
0.02M~0.05M, a concentration of 0.01M~0.03M of the acetate, a concentration of 0.01M~0.03M of the methenamine；
The nitrate is nickel nitrate, copper nitrate or cobalt nitrate, and the acetate is copper acetate or manganese acetate.Second of preferred side
In case, the temperature for carrying out hydro-thermal reaction is 60~100 DEG C, and the reaction time is 13~16 hours.
In the third preferred scheme, first reaction solution is the mixed aqueous solution of two kinds of sulfate, hydro-thermal reaction
The electroactive substance formed afterwards is bimetallic oxide.Wherein, a concentration of 0.01M~0.04M of the sulfate, it is described
Arbitrary two kinds in nickel sulfate, manganese sulfate, cobaltous sulfate and copper sulphate of two kinds of sulfate.In second of preferred scheme,
The temperature for carrying out hydro-thermal reaction is 300~400 DEG C, and the reaction time is 13~16 hours.
The following provide some specific embodiments of the present invention.Illustrate to simplify, the metal heat-conducting in following embodiment
Matrix is by taking copper foil as an example.
【Embodiment 1】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.1M NiCl of 100ml are taken2·6H2O+2M NH4Cl electroplating technology) is carried out, in 2.5A/cm2Electricity
Electro-deposition 60s under current density obtains the porous metallic layers for including nickel, wherein the area deposited is 1cm2.It is anti-to prepare 20ml first
It answers liquid and is transferred in hydro-thermal axe, wherein first reaction solution includes 0.03M Ni (NO3)2·6H2O、0.01M Mn
(COOH)2·6H2O and 0.02M methenamines.The copper electrode that deposited porous nickel is put into hydro-thermal axe, 14 are kept the temperature at 80 DEG C
Hour, active material NiMn is obtained on porous metallic layers2O4, prepare electrode material.After taking out electrode, deionized water is used
Several times with ethyl alcohol cleaning, and it is dry.
Using the thermal conductivity that laser heat conducting instrument test calculates prepared metallic copper combination electrode is 300W m-1K-1, far
Higher than thermal conductivity (the 1.7632W m of the comparison electrode prepared using traditional rubbing method-1K-1).What the present embodiment was prepared
The conductivity of electrode is 1 × 10-6Ω·cm
【Embodiment 2】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.2M NiCl of 100ml are taken2·6H2O+2.5M NH4Cl electroplating technology) is carried out, in 3A/cm2Electricity
Electro-deposition 40s under current density obtains the porous metallic layers for including nickel, wherein the area deposited is 1cm2.It is reacted with 20ml first
Liquid is simultaneously transferred in hydro-thermal axe, wherein first reaction solution includes 0.05M Ni (NO3)2·6H2O、0.03M Mn
(COOH)2·6H2O and 0.03M methenamines.The copper electrode that deposited porous nickel is put into hydro-thermal axe, 13 are kept the temperature at 70 DEG C
Hour, active material NiMn is obtained on porous metallic layers2O4, prepare electrode material.
【Embodiment 3】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.5M NiCl of 100ml are taken2·6H2O+3M NH4Cl electroplating technology) is carried out, in 2A/cm2Electric current
Electro-deposition 100s under density obtains the porous metallic layers for including nickel, wherein the area deposited is 1cm2.With the first reaction solutions of 20ml
And be transferred in hydro-thermal axe, wherein first reaction solution includes 0.02M Ni (NO3)2·6H2O、0.01M Mn(COOH)2·
6H2O and 0.01M methenamines).The copper electrode that deposited porous nickel is put into hydro-thermal axe, 15 hours are kept the temperature at 60 DEG C,
Active material NiMn is obtained on porous metallic layers2O4, prepare electrode material.
【Embodiment 4】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.1M FeCl of 100ml are taken3·6H2O+2M NH4Cl) carry out electroplating technology.In 3A/cm2Electric current
Electro-deposition 100s under density is obtained and is wrapped iron-containing porous metallic layers, wherein the area deposited is 1cm2.With the first reaction solutions of 40ml
And be transferred in hydro-thermal axe, wherein first reaction solution includes 1mM NiCl2、4mM NH4Cl and 1mmol NaOH.It will deposition
Porous electrode is put into hydro-thermal axe, at 55 DEG C keeps the temperature 14 hours, and active material Ni (OH) is obtained on porous metallic layers2,
Prepare electrode material.
【Embodiment 5】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.4M NiCl of 100ml are taken2·6H2O+3M NH4Cl electroplating technology) is carried out, in 2A/cm2Electric current
Electro-deposition 60s under density obtains the porous metallic layers for including nickel, wherein the area deposited is 1cm2.With the first reaction solutions of 40ml
And be transferred in hydro-thermal axe, wherein first reaction solution includes 2mM CuCl2、4mM NH4Cl and 2mmol NaOH.It will deposition
The copper electrode of porous nickel is put into hydro-thermal axe, at 50 DEG C keeps the temperature 15 hours, and active material Cu is obtained on porous metallic layers
(OH)2, prepare electrode material.
【Embodiment 6】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.5M FeCl of 100ml are taken3·6H2O+2M NH4Cl electroplating technology) is carried out, in 3A/cm2Electric current
Electro-deposition 80s under density is obtained and is wrapped iron-containing porous metallic layers, wherein the area deposited is 1cm2.With the first reaction solutions of 40ml
And be transferred in hydro-thermal axe, wherein first reaction solution includes 5mM CuCl2、6mM NH4Cl and 3mmol NaOH.It will deposition
The copper electrode of porous nickel is put into hydro-thermal axe, at 80 DEG C keeps the temperature 14 hours, and substance C u is obtained on porous metallic layers
(OH)2, fire is taken off at 400 DEG C in nitrogen atmosphere 2 hours, prepare the electrode material that active material is CuO.
【Embodiment 7】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.3M CuCl of 100ml are taken2·6H2O+2.5M NH4Cl electroplating technology) is carried out, in 3A/cm2Electricity
Electro-deposition 100s under current density obtains the porous metallic layers for including copper, wherein the area deposited is 1cm2.It is reacted with 40ml first
Liquid is simultaneously transferred in hydro-thermal axe, wherein first reaction solution includes 3mM NiCl2、8mM NH4Cl and 2mmol NaOH.It will sink
The copper electrode for having accumulated Porous Cu is put into hydro-thermal axe, keeps the temperature 13 hours at 55 DEG C, active material is obtained on porous metallic layers
Ni(OH)2.After taking out electrode, is cleaned and dried with deionized water and ethyl alcohol.Fire 1 is finally taken off at 450 DEG C in nitrogen atmosphere
Hour, prepare the electrode material that active material is NiO.
【Embodiment 8】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.1M NiCl of 100ml are taken2·6H2O+2M NH4Cl electroplating technology) is carried out, in 3A/cm2Electric current
Electro-deposition 40s under density obtains the porous metallic layers for including nickel, wherein the area deposited is 1cm2.With the first reaction solutions of 40ml
And be transferred in hydro-thermal axe, wherein first reaction solution includes 4mM CuCl2、8mM NH4Cl and 3mmol NaOH.It will deposition
The copper electrode of porous nickel is put into hydro-thermal axe, at 55 DEG C keeps the temperature 14 hours, and active material Cu is obtained on porous metallic layers
(OH)2.After taking out electrode, is cleaned and dried with deionized water and ethyl alcohol.It is small that fire 2 is finally taken off at 350 DEG C in nitrogen atmosphere
When, prepare the electrode material that active material is CuO.
【Embodiment 9】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.1M CuCl of 100ml are taken2·6H2O+2M NH4Cl electroplating technology) is carried out, in 3A/cm2Electric current
Electro-deposition 80s under density obtains the porous metallic layers for including copper, wherein the area deposited is 1cm2.With the first reaction solutions of 40ml
And be transferred in hydro-thermal axe, wherein first reaction solution includes 2mM CoCl2、5mM NH4Cl and 2mM NaOH.It will deposited
The copper electrode of Porous Cu is put into hydro-thermal axe, and 15 hours are kept the temperature at 55 DEG C, and active material Co is obtained on porous metallic layers
(OH)2.After taking out electrode, is cleaned and dried with deionized water and ethyl alcohol.It is small that fire 2 is finally taken off at 400 DEG C in nitrogen atmosphere
When, it is Co to prepare active material3O4Electrode material.
【Embodiment 10】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.1M NiCl of 100ml are taken2·6H2O+2M NH4Cl electroplating technology) is carried out, in 3A/cm2Electric current
Electro-deposition 60s under density obtains the porous metallic layers for including nickel, wherein the area deposited is 1cm2.With the first reaction solutions of 100ml
And be transferred in hydro-thermal axe, wherein first reaction solution includes 0.02M MnSO4With 0.01M CoSO4.Porous nickel will be deposited
Copper electrode put into hydro-thermal axe, keep the temperature 14 hours at 350 DEG C, active material MnCo obtained on porous metallic layers2O4, system
It is standby to obtain electrode material.
【Embodiment 11】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.1M CuCl of 100ml are taken2·6H2O+2M NH4Cl electroplating technology) is carried out, in 2A/cm2Electric current
Electro-deposition 80s under density obtains the porous metallic layers for including copper, wherein the area deposited is 1cm2.With the first reaction solutions of 100ml
And be transferred in hydro-thermal axe, wherein first reaction solution includes 0.02M NiSO4With 0.04M CoSO4.Porous Cu will be deposited
Copper electrode put into hydro-thermal axe, keep the temperature 13 hours at 400 DEG C, active material NiCo obtained on porous metallic layers2O4, system
It is standby to obtain electrode material.
【Embodiment 12】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.1M NiCl of 100ml are taken2·6H2O+2M NH4Cl electroplating technology) is carried out, in 2A/cm2Electric current
Electro-deposition 100s under density obtains the porous metallic layers for including nickel, wherein the area deposited is 1cm2.It is reacted with 100ml first
Liquid is simultaneously transferred in hydro-thermal axe, wherein first reaction solution includes 0.01M CuSO4With 0.04M CoSO4.It will deposited porous
The copper electrode of nickel is put into hydro-thermal axe, and 16 hours are kept the temperature at 300 DEG C, and active material CuCo is obtained on porous metallic layers2O4,
Prepare electrode material.
【Embodiment 13】
Copper sheet is cut into 1*4cm2Rectangle as metal heat-conducting matrix.Metal copper sheet is connect into cathode, platinum plate electrode
Anode is connect, basic bath (the 0.1M NiCl of 100ml are taken2·6H2O+2M NH4Cl electroplating technology) is carried out, in 2A/cm2Electric current
Electro-deposition 100s under density obtains the porous metallic layers for including nickel, wherein the area deposited is 1cm2.It is reacted with 100ml first
Liquid is simultaneously transferred in hydro-thermal axe, wherein first reaction solution includes 0.01M NiSO4With 0.03M MnSO4.It will deposited porous
The copper electrode of nickel is put into hydro-thermal axe, and 15 hours are kept the temperature at 350 DEG C, and active material NiMn is obtained on porous metallic layers2O4,
Prepare electrode material.
In conclusion a kind of three-dimensional high heat conduction electrochemical capacitance electrode provided by the present invention and preparation method thereof, method letter
Single easy, yield is high, energy consumption is smaller.Material structure is three-dimensional porous, larger specific surface area is possessed while electric conductivity is high, no
But quick electron transmission channel can be provided, active material bond area is also increased, meanwhile, electrolyte and active material connect
Contacting surface product also greatly increases, and can effectively shorten the diffusion length of ion, to obtain larger specific capacitance.This three-dimensional high heat conduction electricity
Pole is a kind of ultracapacitor haveing excellent performance, and can be provided simultaneously with high power density and high-energy density, is a kind of novel
Electrode material has great application potential in the field.
It is pointed out that the technical concepts and features of above-described embodiment only to illustrate the invention, it is ripe its object is to allow
The personage for knowing technique cans understand the content of the present invention and implement it accordingly, and the protection model of the present invention can not be limited with this
It encloses.Any equivalent change or modification in accordance with the spirit of the invention should be covered by the protection scope of the present invention.
Claims (10)
1. a kind of electrode material, which is characterized in that including metal heat-conducting matrix, porous metallic layers and electroactive substance, institute
Porous metallic layers electroplating deposition is stated on the surface of the metal heat-conducting matrix, the electroactive substance growth in situ is formed
In on the porous metallic layers.
2. electrode material according to claim 1, which is characterized in that the metal heat-conducting matrix is with high thermal conductivity
Single metal simple-substance or two or more metal simple-substances composition alloy, the materials of the porous metallic layers be metallic copper, nickel,
Any one in iron, aluminium or zinc.
3. high heat conduction electrode according to claim 1 or 2, which is characterized in that the electroactive substance is to include
Metal oxide, metal hydroxides or the bimetallic oxide of transition metal element.
4. high heat conduction electrode according to claim 3, which is characterized in that the metal oxide is Co3O4、MnO2、NiO
Or CuO, the metal hydroxides are Cu (OH)2、Co(OH)2Or Ni (OH)2, the bimetallic oxide is NiMn2O4、
MnCo2O4、CuCo2O4、NiMnO3Or NiCo2O4。
5. a kind of preparation method of electrode material as described in claim 1-4 is any, which is characterized in that this method includes：
Metal heat-conducting matrix is provided；
Using the metal heat-conducting matrix as cathode, electroplating technology is carried out in basic electroplate liquid, in the metal heat-conducting matrix
Deposition forms porous metallic layers on surface；It include the gold that the porous metallic layers correspond to metal material in the basis electroplate liquid
Belong to chlorate；
The metal heat-conducting matrix for being formed with porous metallic layers is positioned in the first reaction solution and carries out hydro-thermal reaction, described porous
Growth in situ forms electroactive substance on metal layer；Include the electroactive substance pair in first reaction solution
The metallic element answered.
6. the preparation method of electrode material according to claim 5, which is characterized in that include in the basis electroplate liquid
Metal chlorination salt and ammonium chloride, the metal chlorination salt are copper chloride, nickel chloride, iron chloride, aluminium chloride or zinc chloride, the gold
Belong to a concentration of 0.1M~0.5M, a concentration of 2M~3M of the ammonium chloride of chlorate；In the electroplating technology, with the metal
Heat conduction substrate is cathode, platinum plate electrode is anode, current density 2A/cm2~3A/cm2, the time is 40s~100s.
7. the preparation method of electrode material according to claim 5, which is characterized in that first reaction solution is chlorination
The mixed aqueous solution of salt, ammonium chloride and sodium hydroxide, the electroactive substance formed after hydro-thermal reaction are metal hydroxides；
A concentration of 1mM~5mM of the chlorate, a concentration of 4mM~8mM of the ammonium chloride, a concentration of 1mM of the sodium hydroxide
~3mM；The chlorate is nickel chloride, copper chloride or cobalt chloride.
8. the preparation method of electrode material according to claim 5, which is characterized in that carry out hydro-thermal reaction later also in nitrogen
The high temperature anneal is carried out in the atmosphere of gas, the electroactive substance being correspondingly formed is metal oxide.
9. the preparation method of electrode material according to claim 5, which is characterized in that first reaction solution is nitric acid
The mixed aqueous solution of salt, acetate and methenamine, the electroactive substance formed after hydro-thermal reaction are bimetallic oxide；
A concentration of 0.02M~0.05M of the nitrate, a concentration of 0.01M~0.03M of the acetate, the methenamine
A concentration of 0.01M~0.03M；The nitrate is nickel nitrate, copper nitrate or cobalt nitrate, and the acetate is copper acetate or acetic acid
Manganese.
10. the preparation method of electrode material according to claim 5, which is characterized in that first reaction solution is two kinds
The mixed aqueous solution of sulfate, the electroactive substance formed after hydro-thermal reaction are bimetallic oxide；The sulfate
A concentration of 0.01M~0.04M, described two sulfate in nickel sulfate, manganese sulfate, cobaltous sulfate and copper sulphate arbitrary two
Kind.
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| CN110323081A (en) * | 2019-06-14 | 2019-10-11 | 电子科技大学 | Nickel hydroxide/basic carbonate cobalt composite material method is prepared on a current collector |
| CN110676063A (en) * | 2019-08-19 | 2020-01-10 | 深圳职业技术学院 | High-conductivity cobalt hydroxide electrode material, preparation method thereof, electrode and capacitor |
| CN112397318A (en) * | 2020-10-15 | 2021-02-23 | 南京大学 | Foamed nickel Cu (OH)2@Ni3S2Core-shell nanowire composite capacitor material and preparation method thereof |
| CN112875765A (en) * | 2021-01-18 | 2021-06-01 | 欣旺达电动汽车电池有限公司 | NiMnO3Preparation method of bimetal oxide and energy storage device |
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