CN108456869B - High-wear-resistance microgroove mold for mobile phone decorative patterns and preparation method thereof - Google Patents

High-wear-resistance microgroove mold for mobile phone decorative patterns and preparation method thereof Download PDF

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CN108456869B
CN108456869B CN201810327827.1A CN201810327827A CN108456869B CN 108456869 B CN108456869 B CN 108456869B CN 201810327827 A CN201810327827 A CN 201810327827A CN 108456869 B CN108456869 B CN 108456869B
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film
microgroove
mold
dry film
mobile phone
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CN108456869A (en
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王云飞
高志廷
张黎燕
李亚萍
殷挺峰
孟祥伟
岳金明
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Henan Mechanical and Electrical Vocational College
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

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Abstract

The invention discloses a preparation method of a high-wear-resistance microgroove die for mobile phone decorative patterns, which comprises the following specific steps: medicine for treating acute respiratory syndromeWashing: cleaning the high-alumina glass substrate; film pasting: coating a dry film on a high-alumina glass substrate; exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern; and (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, transferring the designed decorative pattern to the dry film; etching: etching the microgroove pattern on a plasma ICP etching machine; film coating: plating a polytetrafluoroethylene film on the microgrooves by adopting CVD chemical vapor deposition equipment; hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film. The microgroove decorative grain structure prepared by the microgroove mould is not deformed; the polytetrafluoroethylene film prepared by the invention has strong bonding force and long service life, can be circularly coated, and can be repeatedly coated once the Teflon film is damaged.

Description

High-wear-resistance microgroove mold for mobile phone decorative patterns and preparation method thereof
Technical Field
The invention belongs to the technical field of micro-nano molds, and particularly relates to a high-wear-resistance micro-groove mold for mobile phone decorative patterns and a preparation method thereof.
Background
The mobile phone exterior decoration is a bright point for mobile phone sales, has beautiful appearance and can arouse the purchasing desire of the public. The early film pasting technology is applied to the preparation of the mobile phone shell, and the film layer is easy to age and fall off, so that the color value of a new mobile phone is rapidly reduced after the new mobile phone is used for a period of time. The BYD automotive electronics company develops a Eu glue microgroove line decoration technology, and the solidified Eu glue microgroove is formed by stamping a microgroove mould and is prepared as follows: firstly, coating liquid Eu glue on a base material, secondly, embossing a microgroove decorative line by using a microgroove mould, and thirdly, heating the liquid Eu glue to 100 ℃ for solidification. The depth of the micro-groove is 10-15 μm, the width of the line is 60-100 μm, and the line shows beautiful patterns under the condition of light refraction and diffraction; and the service life of the cured Eu glue line pattern is longer than that of the film.
In practical production, the material of the micro-groove die for producing the micro-groove pattern is also cured Eu glue. The main process for preparing the microgroove mold comprises the following steps: photoetching-etching-assisted process, which is an extension of chip semiconductor manufacturing technology in industrial production. Because the Eu glue has good processing performance and simple process, the cured Eu glue has certain market share in the mold industry at present. However, the cured Eu adhesive has certain disadvantages as a mold material, one of which is the same as the mold base material and the molding base material, and is bonded during imprinting, and the other of which is softer and has certain deformation in lines. Therefore, a new material micro-groove mold is urgently needed to replace a cured Eu glue material mold, and the problems of bonding of the cured Eu glue mold and deformation of the imprinting micro-grooves are solved.
Disclosure of Invention
The invention aims to solve the technical problems of bonding of a cured Eu glue mold and deformation of an imprinting micro-groove, and provides a high-wear-resistance micro-groove mold for mobile phone decorative patterns and a preparation method thereof.
The object of the invention is achieved in the following way:
a preparation method of a high-wear-resistance microgroove mold for mobile phone decorative patterns comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate;
(2) film pasting: coating a dry film on a high-alumina glass substrate;
(3) exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern;
(4) and (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, transferring the designed decorative pattern to the dry film;
(5) etching: etching the microgroove pattern on a plasma ICP etching machine;
(6) film coating: plating a polytetrafluoroethylene film on the microgrooves by adopting CVD chemical vapor deposition equipment;
(7) hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film.
The content of alumina in the high-alumina glass matrix is 60-70%, and the balance is quartz; the thickness of the polytetrafluoroethylene film is 60-120 nm.
In the step (2), a RISTON LM8040 dry film is selected as a molding material, and the dry film is attached to a high-alumina glass substrate by using a film laminating machine; the temperature of the film laminating machine is adjusted to be 110 ℃ below zero, the rotating speed of the roller is 1 to 1.5m/min, and the selected linear pressure is 0.6 to 0.7 kg/cm.
In the step (3), a direct-writing photoetching machine is adopted to transfer the image to the dry film, and laser direct writing is to directly expose and draw a required pattern on the photoresist by controlling a switch of a series of laser pulses through a computer; the exposure light source is 405 nmLED 1.5W, and the direct writing speed is 120mm2And/min. The exposure time is 50-100 ms.
In the step (4), the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3The concentration of (2) is 1%, and the solution temperature is maintained at 20-25 ℃.
In the step (5), a chlorine corrosion resistant ICP etching machine is adopted to etch the sample, and the process parameters are as follows: BCl3The flow rate is 40-60sccm, the etching pressure is 2-3Pa, and the power is 200-400W; and (4) carrying out a photoresist removing process on the residual dry film by using oxygen plasma.
In the step (6), a PECVD coating machine is adopted to deposit the polytetrafluoroethylene film, and the process parameters are as follows: c4F8The flow rate of the deposition gas is 80-100sccm, the deposition gas pressure is 8-10Pa, and the power is 100-200W.
In the step (7), the temperature of the film hardening in the oven is 200-220 ℃, and the time is 60-80 min.
The high-wear-resistance microgroove die for the mobile phone decorative patterns prepared by any one of the methods.
Compared with the prior art, the microgroove mold provided by the invention has the advantages of simple preparation process, strong controllability and uniform product parameter performance; the invention adopts the direct-write photoetching technology, and can prepare a large-size micro-groove structure; the microgroove die prepared by the method has long service life; the mold is easy to demould; the microgroove decorative grain structure prepared by the microgroove mould is not deformed; the polytetrafluoroethylene film prepared by the invention has strong bonding force and long service life, can be circularly coated, and can be repeatedly coated once the Teflon film is damaged.
Drawings
Fig. 1 is a schematic view of a patch.
Fig. 2 is a schematic view of exposure.
Fig. 3 is a schematic development diagram.
Fig. 4 is a schematic diagram of etching.
FIG. 5 is a schematic view of a plating film.
FIG. 6 is a graph showing the results of lifetime and yield of the Eu micro-slot mold and the high-aluminum micro-slot mold manufactured according to the present invention.
Wherein 1 is a dry film; 2 is a high alumina glass matrix; 3 is the dry film after exposure; 4 is a micro-groove; 5 is a polytetrafluoroethylene film.
Detailed Description
As shown in fig. 1-5, a method for preparing a high wear-resistant microgroove mold for mobile phone decorative patterns comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate 1;
(2) film pasting: coating a dry film 2 on a high-alumina glass substrate 1;
(3) exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern;
(4) and (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, so that only the exposed dry film 3 remains on the high-alumina glass substrate 1, and transferring the designed decorative pattern onto the dry film;
(5) etching: etching the pattern of the microgrooves 4 on a plasma ICP etching machine;
(6) film coating: plating a polytetrafluoroethylene film 5 on the microgrooves by adopting CVD chemical vapor deposition equipment;
(7) hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film.
The content of alumina in the high-alumina glass base 1 is 60-70%, and the balance is quartz; the thickness of the polytetrafluoroethylene film 5 is 60-120 nm.
In the step (2), a RISTON LM8040 dry film is selected as a molding material, the dry film does not need a spin coater, and the dry film is attached to a high-alumina glass substrate by using a film laminating machine; the temperature of the film laminating machine is adjusted to be 110 ℃ below zero, the rotating speed of the roller is 1 to 1.5m/min, and the selected linear pressure is 0.6 to 0.7 kg/cm.
In the step (3), a direct-writing photoetching machine is adopted to transfer the image to the dry film, and laser direct writing is to directly expose and draw a required pattern on the photoresist by controlling a switch of a series of laser pulses through a computer; the exposure light source is 405 nm LED1.5W, and the direct writing speed is 120mm2And/min. The exposure time is 50-100 ms.
The RISTON LM8040 dry film is negative glue, the part irradiated by ultraviolet light is preserved, and the rest part is followed by Na2CO3The solution is washed away. The dry film reacts at the speed of laser light, the photoinitiator absorbs the energy of ultraviolet rays to generate polymerization reaction, the wavelength of the polymerization reaction received by the dry film is matched with the wavelength emitted by the photoetching machine, and the polymerization reaction better generates over reaction to form a strip-shaped hard film which is not longer matched with Na2CO3And (4) reacting the solution.
In the step (4), the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3The concentration of (2) is 1%, and the solution temperature is maintained at 20-25 ℃.
In the step (5), a chlorine corrosion resistant ICP etching machine is adopted to etch the sample, and the process parameters are as follows: BCl3The flow rate of the etching solution is 40-60sccm, the etching gas pressure is 2-3Pa, and the power is 200-400W.
By BCl3Etching gas to Al in ICP reaction ion etching machine2O3And etching the quartz substrate, wherein the reaction is shown in formulas (1) to (2):
Figure DEST_PATH_IMAGE001
（1）
Figure 939160DEST_PATH_IMAGE002
（2）
as can be seen from formulas (1) to (2): the resultant AlCl3、SiCl4Is a gaseous component and has volatility, and grooves are gradually formed on the surface of the high-alumina glass.
When the high-alumina glass substrate is etched, the dry film is also etched, the thickness of the RISTON LM8040 dry film is gradually reduced, and the residual dry film is subjected to a photoresist removing process by using oxygen plasma.
In the step (6), a PECVD coating machine is adopted to deposit the polytetrafluoroethylene film, and the process parameters are as follows: c4F8The flow rate of the deposition gas is 80-100sccm, the deposition gas pressure is 8-10Pa, and the power is 100-200W. The polytetrafluoroethylene film has the characteristic of non-adhesion, is easy to demould and reduces the defective rate of the Eu microgroove pattern.
In the step (7), the temperature of the film hardening in the oven is 200-220 ℃, and the time is 60-80 min. In the film hardening process, the deposited CFx polymer is modified, and C-C chain forms long chain to form similar-CF2-nThe long-chain structure of the film enhances the binding force of the film.
The high-wear-resistance microgroove die for the mobile phone decorative patterns prepared by any one of the methods.
Example 1:
a preparation method of a high-wear-resistance microgroove mold for mobile phone decorative patterns comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate; the content of alumina in the high-alumina glass matrix is 60 percent, and the balance is quartz; the thickness of the polytetrafluoroethylene film was 60 nm. And ultrasonically cleaning the substrate in acetone and ethanol for 5min, and drying the sample by using a nitrogen gun.
(2) Film pasting: coating a dry film on a high-alumina glass substrate; selecting a RISTON LM8040 dry film as a molding material, and attaching the dry film to a high-alumina glass substrate by using a film laminating machine; the temperature of the film laminating machine is adjusted to 100 ℃, the rotating speed of the roller is 1m/min, and the linear pressure is 0.6 kg/cm.
(3) Exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern; transferring the image onto the dry film by using a direct writing type photoetching machine, wherein the laser direct writing is to directly expose and draw a required pattern on the photoresist by controlling a switch of a series of laser pulses through a computer; the exposure light source is 405 nm LED1.5W, and the direct writing speed is 120mm2And/min. The exposure time was 50 ms.
(4) And (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, transferring the designed decorative pattern to the dry film; the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3Is 1%, and the solution temperature is maintained at 20 ℃.
(5) Etching: etching the microgroove pattern on a plasma ICP etching machine; etching the sample by adopting a chlorine corrosion resistant ICP etching machine, wherein the technological parameters are as follows: BCl3The flow rate of the etching solution is 40sccm, the etching gas pressure is 2Pa, and the power is 200W; and (4) carrying out a photoresist removing process on the residual dry film by using oxygen plasma.
(6) Film coating: plating a polytetrafluoroethylene film on the microgrooves by adopting CVD chemical vapor deposition equipment; the polytetrafluoroethylene film is deposited by a PECVD coating machine, and the process parameters are as follows: c4F8The flow rate of (1) was 80sccm, the deposition pressure was 8Pa, and the power was 100W.
(7) Hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film. The temperature of the film hardening in the oven is 200 ℃ and the time is 60 min.
The periodic thickness of a single microgroove in the prepared high-alumina glass microgroove mould is 100 mu m, and the depth is 5 mu m.
Example 2:
a preparation method of a high-wear-resistance microgroove mold for mobile phone decorative patterns comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate; the content of alumina in the high-alumina glass matrix is 62 percent, and the balance is quartz; the thickness of the polytetrafluoroethylene film was 70 nm. And ultrasonically cleaning the substrate in acetone and ethanol for 6min, and drying the sample by using a nitrogen gun.
(2) Film pasting: coating a dry film on a high-alumina glass substrate; selecting a RISTON LM8040 dry film as a molding material, and attaching the dry film to a high-alumina glass substrate by using a film laminating machine; the temperature of the film laminating machine is adjusted to 102 ℃, the rotating speed of the roller is 1.1m/min, and the linear pressure is 0.62 kg/cm.
(3) Exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern; transferring the image onto the dry film by using a direct writing type photoetching machine, wherein the laser direct writing is to directly expose and draw a required pattern on the photoresist by controlling a switch of a series of laser pulses through a computer; the exposure light source is 405 nm LED1.5W, and the direct writing speed is 120mm2And/min. The exposure time was 60 ms.
(4) And (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, transferring the designed decorative pattern to the dry film; the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3Was 1%, and the solution temperature was maintained at 21 ℃.
(5) Etching: etching the microgroove pattern on a plasma ICP etching machine; etching the sample by adopting a chlorine corrosion resistant ICP etching machine, wherein the technological parameters are as follows: BCl3The flow rate of the etching solution is 45sccm, the etching gas pressure is 2.2Pa, and the power is 250W; and (4) carrying out a photoresist removing process on the residual dry film by using oxygen plasma.
(6) Film coating: plating a polytetrafluoroethylene film on the microgrooves by adopting CVD chemical vapor deposition equipment; the polytetrafluoroethylene film is deposited by a PECVD coating machine, and the process parameters are as follows: c4F8The flow rate of (2) was 85sccm, the deposition gas pressure was 8.5Pa, and the power was 120W.
(7) Hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film. The temperature of the film hardening in the oven is 205 ℃ and the time is 65 min.
The periodic thickness of a single microgroove in the prepared high-alumina glass microgroove mould is 120 mu m, and the depth of the single microgroove is 6 mu m.
Example 3:
a preparation method of a high-wear-resistance microgroove mold for mobile phone decorative patterns comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate; the content of alumina in the high-alumina glass matrix is 64 percent, and the balance is quartz; the thickness of the polytetrafluoroethylene film was 80 nm. And ultrasonically cleaning the substrate in acetone and ethanol for 7min, and drying the sample by using a nitrogen gun.
(2) Film pasting: coating a dry film on a high-alumina glass substrate; selecting a RISTON LM8040 dry film as a molding material, and attaching the dry film to a high-alumina glass substrate by using a film laminating machine; the temperature of the film laminating machine is adjusted to 104 ℃, the rotating speed of the roller is 1.2m/min, and the linear pressure is 0.64 kg/cm.
(3) Exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern; transferring the image onto the dry film by using a direct writing type photoetching machine, wherein the laser direct writing is to directly expose and draw a required pattern on the photoresist by controlling a switch of a series of laser pulses through a computer; the exposure light source is 405 nm LED1.5W, and the direct writing speed is 120mm2And/min. The exposure time was 70 ms.
(4) And (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, transferring the designed decorative pattern to the dry film; the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3Was 1%, and the solution temperature was maintained at 22 ℃.
(5) Etching: etching the microgroove pattern on a plasma ICP etching machine; etching the sample by adopting a chlorine corrosion resistant ICP etching machine, wherein the technological parameters are as follows: BCl3The flow rate of the etching solution is 50sccm, the etching gas pressure is 2.4Pa, and the power is 300W; and (4) carrying out a photoresist removing process on the residual dry film by using oxygen plasma.
(6) Film coating: plating a polytetrafluoroethylene film on the microgrooves by adopting CVD chemical vapor deposition equipment; the polytetrafluoroethylene film is deposited by a PECVD coating machine, and the process parameters are as follows: c4F8At a flow rate of 90sccm, a deposition gas pressure of 9Pa, and a power of 140W.
(7) Hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film. The temperature of the film hardening in the oven is 210 ℃ and the time is 70 min.
The periodic thickness of a single microgroove in the prepared high-alumina glass microgroove mould is 110 mu m, and the depth is 8 mu m.
Example 4:
a preparation method of a high-wear-resistance microgroove mold for mobile phone decorative patterns comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate; the content of alumina in the high-alumina glass matrix is 66 percent, and the balance is quartz; the thickness of the polytetrafluoroethylene film was 90 nm. And ultrasonically cleaning the substrate in acetone and ethanol for 8min, and drying the sample by using a nitrogen gun.
(2) Film pasting: coating a dry film on a high-alumina glass substrate; selecting a RISTON LM8040 dry film as a molding material, and attaching the dry film to a high-alumina glass substrate by using a film laminating machine; the temperature of the film covering machine is adjusted to 106 ℃, the rotating speed of the roller is 1.3m/min, and the linear pressure is 0.66 kg/cm.
(3) Exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern; transferring the image onto the dry film by using a direct writing type photoetching machine, wherein the laser direct writing is to directly expose and draw a required pattern on the photoresist by controlling a switch of a series of laser pulses through a computer; the exposure light source is 405 nm LED1.5W, and the direct writing speed is 120mm2And/min. The exposure time was 80 ms.
(4) And (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, transferring the designed decorative pattern to the dry film; the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3Was 1%, and the solution temperature was maintained at 23 ℃.
(5) Etching: etching the microgroove pattern on a plasma ICP etching machine; etching the sample by adopting a chlorine corrosion resistant ICP etching machine, wherein the technological parameters are as follows: BCl3The flow rate of the etching solution is 52sccm, the etching gas pressure is 2.6Pa, and the power is 320W; and (4) carrying out a photoresist removing process on the residual dry film by using oxygen plasma.
(6) Film coating: plating on the micro-groove by CVD chemical vapor deposition equipmentA polytetrafluoroethylene film; the polytetrafluoroethylene film is deposited by a PECVD coating machine, and the process parameters are as follows: c4F8At a flow rate of 92sccm, a deposition gas pressure of 9.2Pa, and a power of 160W.
(7) Hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film. The temperature of the film hardening in the oven is 212 ℃ and the time is 72 min.
The periodic thickness of a single microgroove in the prepared high-alumina glass microgroove mould is 105 mu m, and the depth is 7 mu m.
Example 5:
a preparation method of a high-wear-resistance microgroove mold for mobile phone decorative patterns comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate; the content of alumina in the high-alumina glass matrix is 68 percent, and the balance is quartz; the thickness of the polytetrafluoroethylene film was 100 nm. And ultrasonically cleaning the substrate in acetone and ethanol for 9min, and drying the sample by using a nitrogen gun.
(2) Film pasting: coating a dry film on a high-alumina glass substrate; selecting a RISTON LM8040 dry film as a molding material, and attaching the dry film to a high-alumina glass substrate by using a film laminating machine; the temperature of the film covering machine is adjusted to 108 ℃, the rotating speed of the roller is 1.4m/min, and the linear pressure is 0.68 kg/cm.
(3) Exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern; transferring the image onto the dry film by using a direct writing type photoetching machine, wherein the laser direct writing is to directly expose and draw a required pattern on the photoresist by controlling a switch of a series of laser pulses through a computer; the exposure light source is 405 nm LED1.5W, and the direct writing speed is 120mm2And/min. The exposure time was 90 ms.
(4) And (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, transferring the designed decorative pattern to the dry film; the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3Was 1%, and the solution temperature was maintained at 24 ℃.
(5) Etching: etching the microgroove pattern on a plasma ICP etching machine;etching the sample by adopting a chlorine corrosion resistant ICP etching machine, wherein the technological parameters are as follows: BCl3The flow rate of the etching solution is 56sccm, the etching gas pressure is 2.8Pa, and the power is 360W; and (4) carrying out a photoresist removing process on the residual dry film by using oxygen plasma.
(6) Film coating: plating a polytetrafluoroethylene film on the microgrooves by adopting CVD chemical vapor deposition equipment; the polytetrafluoroethylene film is deposited by a PECVD coating machine, and the process parameters are as follows: c4F8The flow rate of (3) was 96sccm, the deposition gas pressure was 9.6Pa, and the power was 180W.
(7) Hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film. The temperature of the film hardening in the oven is 215 ℃ and the time is 75 min.
The periodic thickness of a single microgroove in the prepared high-alumina glass microgroove mould is 130 mu m, and the depth of the single microgroove is 9 mu m.
Example 6:
a preparation method of a high-wear-resistance microgroove mold for mobile phone decorative patterns comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate; the content of alumina in the high-alumina glass matrix is 70 percent, and the balance is quartz; the thickness of the polytetrafluoroethylene film was 120 nm. And ultrasonically cleaning the substrate in acetone and ethanol for 10min, and drying the sample by using a nitrogen gun.
(2) Film pasting: coating a dry film on a high-alumina glass substrate; selecting a RISTON LM8040 dry film as a molding material, and attaching the dry film to a high-alumina glass substrate by using a film laminating machine; the temperature of the film laminating machine is adjusted to 110 ℃, the rotating speed of the roller is 1.5m/min, and the linear pressure is 0.7 kg/cm.
(3) Exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern; transferring the image onto the dry film by using a direct writing type photoetching machine, wherein the laser direct writing is to directly expose and draw a required pattern on the photoresist by controlling a switch of a series of laser pulses through a computer; the exposure light source is 405 nm LED1.5W, and the direct writing speed is 120mm2And/min. The exposure time was 100 ms.
(4) And (3) developing: the exposed sample was placed in 1% Na2CO3Is developed in the solution of (a) to (b),transferring the designed decoration pattern to the dry film; the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3Is 1%, and the solution temperature is maintained at 25 ℃.
(5) Etching: etching the microgroove pattern on a plasma ICP etching machine; etching the sample by adopting a chlorine corrosion resistant ICP etching machine, wherein the technological parameters are as follows: BCl3The flow rate of the etching solution is 60sccm, the etching gas pressure is 3Pa, and the power is 400W; and (4) carrying out a photoresist removing process on the residual dry film by using oxygen plasma.
(6) Film coating: plating a polytetrafluoroethylene film on the microgrooves by adopting CVD chemical vapor deposition equipment; the polytetrafluoroethylene film is deposited by a PECVD coating machine, and the process parameters are as follows: c4F8The flow rate of (2) is 100sccm, the deposition pressure is 10Pa, and the power is 200W.
(7) Hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film. The temperature of the film hardening in the oven is 220 ℃ and the time is 80 min.
The periodic thickness of a single microgroove in the prepared high-alumina glass microgroove mould is 125 mu m, and the depth is 6 mu m.
The model of the laser direct writing photoetching machine adopted by the invention is SVG 4A-100;
the model of the plasma ICP etching machine adopted by the invention is ICP-8101;
the model of the plasma PECVD film plating machine adopted by the invention is PECVD-601.
On a roller press, the polytetrafluoroethylene-plated high-aluminum micro-groove die and the common Eu glue micro-groove die are adopted to prepare a mobile phone micro-groove decorative pattern product, and the performance of the two dies is compared and tested, and as can be seen from figure 6, when the micro-groove die prepared by the method is adopted, the service life of the die is prolonged, and the product percent of pass is improved.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various changes and modifications can be made without departing from the overall concept of the present invention, and these should also be considered as the protection scope of the present invention.

Claims (9)

1. A preparation method of a high-wear-resistance microgroove mold for mobile phone decorative patterns is characterized by comprising the following steps: the method comprises the following specific steps:
(1) cleaning: cleaning the high-alumina glass substrate;
(2) film pasting: coating a dry film on a high-alumina glass substrate;
(3) exposure: exposing a graph on the dry film by using a laser direct writing exposure machine according to the designed decorative pattern;
(4) and (3) developing: the exposed sample was placed in 1% Na2CO3Developing in the solution, transferring the designed decorative pattern to the dry film;
(5) etching: etching the microgroove pattern on a plasma ICP etching machine;
(6) film coating: plating a polytetrafluoroethylene film on the microgrooves by adopting CVD chemical vapor deposition equipment;
(7) hardening the film: and (3) placing the mold template in an oven, and hardening the polytetrafluoroethylene film.
2. The method for preparing the high-abrasion-resistance microgroove mold for the mobile phone decorative patterns according to claim 1, wherein the method comprises the following steps: the content of alumina in the high-alumina glass matrix is 60-70%, and the balance is quartz; the thickness of the polytetrafluoroethylene film is 60-120 nm.
3. The method for preparing the high-abrasion-resistance microgroove mold for the mobile phone decorative patterns according to claim 1, wherein the method comprises the following steps: in the step (2), a RISTON LM8040 dry film is selected as a molding material, and the dry film is attached to a high-alumina glass substrate by using a film laminating machine; the temperature of the film laminating machine is adjusted to be 110 ℃ below zero, the rotating speed of the roller is 1 to 1.5m/min, and the selected linear pressure is 0.6 to 0.7 kg/cm.
4. The method for preparing the high-abrasion-resistance microgroove mold for the mobile phone decorative patterns according to claim 1, wherein the method comprises the following steps: in the step (3), a direct-writing photoetching machine is adopted to transfer the image to the dry film, and the laser direct-writing is to control a series of lasers by a computerThe switch of the pulse, expose and draw the desired pattern on photoresist directly; the exposure light source is 405 nm LED1.5W, and the direct writing speed is 120mm2/min，
The exposure time is 50-100 ms.
5. The method for preparing the high-abrasion-resistance microgroove mold for the mobile phone decorative patterns according to claim 1, wherein the method comprises the following steps: in the step (4), the developing solution is composed of deionized water and anhydrous Na2CO3Is prepared from Na2CO3The concentration of (2) is 1%, and the solution temperature is maintained at 20-25 ℃.
6. The method for preparing the high-abrasion-resistance microgroove mold for the mobile phone decorative patterns according to claim 1, wherein the method comprises the following steps: in the step (5), a chlorine corrosion resistant ICP etching machine is adopted to etch the sample, and the process parameters are as follows: BCl3The flow rate is 40-60sccm, the etching pressure is 2-3Pa, and the power is 200-400W; and (4) carrying out a photoresist removing process on the residual dry film by using oxygen plasma.
7. The method for preparing the high-abrasion-resistance microgroove mold for the mobile phone decorative patterns according to claim 1, wherein the method comprises the following steps: in the step (6), a PECVD coating machine is adopted to deposit the polytetrafluoroethylene film, and the process parameters are as follows: c4F8The flow rate of the deposition gas is 80-100sccm, the deposition gas pressure is 8-10Pa, and the power is 100-200W.
8. The method for preparing the high-abrasion-resistance microgroove mold for the mobile phone decorative patterns according to claim 1, wherein the method comprises the following steps: in the step (7), the temperature of the film hardening in the oven is 200-220 ℃, and the time is 60-80 min.
9. A high abrasion-resistant microgroove mold for a decorative pattern of a cellular phone manufactured by any one of the methods of claims 1 to 8.
CN201810327827.1A 2018-04-12 2018-04-12 High-wear-resistance microgroove mold for mobile phone decorative patterns and preparation method thereof Expired - Fee Related CN108456869B (en)

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