CN108414952A - A kind of surface nano-structure magnetic measuring device - Google Patents
A kind of surface nano-structure magnetic measuring device Download PDFInfo
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- CN108414952A CN108414952A CN201810429089.1A CN201810429089A CN108414952A CN 108414952 A CN108414952 A CN 108414952A CN 201810429089 A CN201810429089 A CN 201810429089A CN 108414952 A CN108414952 A CN 108414952A
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- Prior art keywords
- probe
- lens
- force microscope
- atomic force
- sample
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
- G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/032—Measuring direction or magnitude of magnetic fields or magnetic flux using magneto-optic devices, e.g. Faraday or Cotton-Mouton effect
- G01R33/0325—Measuring direction or magnitude of magnetic fields or magnetic flux using magneto-optic devices, e.g. Faraday or Cotton-Mouton effect using the Kerr effect
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/12—Measuring magnetic properties of articles or specimens of solids or fluids
- G01R33/1215—Measuring magnetisation; Particular magnetometers therefor
Abstract
The present invention relates to a kind of electromagnetic detections of optical technology fields of measurement,A kind of surface nano-structure magnetic measuring device,Including laser,Delayer,Quarter wave plate,Concavees lens,Convex lens I,Plane mirror,Polarizing film,Beam splitter,Convex lens II,Lens platform,Atomic force microscope I,Probe I,Lens mount,Object lens,Sample,Hall plate,Sample stage,Signal generator,Oscillograph,Detector,Magnet,Preamplifier,Difference amplifier,Compensator,Analog-digital converter,Computer,Atomic force microscope II,Probe I I,Probe I and atomic force microscope probe and shape that probe I I is identical physical dimension are round platform,There is through-hole along round platform axis direction in probe I,On round platform bottom surface periphery by probe I near positive direction of the x-axis a bit,Cut away a wedge block in oblique axis side,Probe I bottom surface forms one with horizontal plane into the inclined-plane at five degree of angles,Magnet is made up of four identical sub- magnets cable connection.
Description
Technical field
The present invention relates to a kind of electromagnetic detections of optical technology fields of measurement, especially a kind of to be based on go-and-return measurement side
A kind of surface nano-structure magnetic measuring device of the low cost of method.
Background technology
Kerr magnetooptical effect measuring device is a kind of important means in material surface magnetism research, and operation principle is base
Kerr magnetooptical effect caused by interaction, can not only carry out monoatomic layer thickness material between Yu Youguang and magnetized medium
Magnetic detection, and can realize non-contact measurement, the magnetic order of magnetic ultrathin film, magnetic anisotropy, layer coupling and
There is important application in the research of the transformation behavior of magnetic ultrathin film etc..Kerr magnetooptical effect measuring device mainly passes through
Detect the magnetization that light intensity variation caused by polarization state variation of a branch of linearly polarized light after material surface reflection carries out sample surfaces
Observation, therefore the effect of its imaging is highly prone to optical element limitation, prior art defect one：Traditional uses micro objective
The microscopical spatial resolutions of focusing Ke Er determined that therefore the magnetization for being unable to get nanoscale is dynamic by optical diffraction limit
State feature；Prior art defect two：Device based on phase-sensitive detection method is complex, and expensive, a kind of surface
Nanostructure magnetic measuring device can solve the problems, such as.
Invention content
To solve the above-mentioned problems, the present invention provides a kind of surface nano-structure magnetic measuring device, and use is high-precision
Positioning device is not reducing device to obtain the magnetization information of nanoscale sample surfaces using the electronics element of low cost
Cost is reduced under the premise of performance.
The technical solution adopted in the present invention is：
A kind of surface nano-structure magnetic measuring device mainly include laser, delayer, quarter wave plate, concavees lens,
Convex lens I, plane mirror, polarizing film, beam splitter, convex lens II, lens platform, atomic force microscope I, probe I, lens mount, object lens,
Sample, Hall plate, sample stage, signal generator, oscillograph, detector, magnet, preamplifier, difference amplifier, compensation
Device, analog-digital converter, computer, atomic force microscope II, probe I I, input path and reflected light path, xyz sit for space right-angle
Mark system, x/y plane are horizontal plane, and the atomic force microscope II is identical as atomic force microscope I structures, and the probe I is located at original
The lower ends sub- force microscope I, the probe I I are located at the lower ends atomic force microscope II, and the object lens are located at lens mount lower end, described
Probe I and atomic force microscope probe and shape that probe I I is identical appearance size are round platform, and the upper bottom surface of the round platform is straight
Diameter is 2 microns, a diameter of 1 micron of bottom surface, the round platform axis perpendicular to horizontal plane, the laser beam of the laser transmitting according to
It is secondary through delayer, quarter wave plate, concavees lens, convex lens I, plane mirror, polarizing film, beam splitter, convex lens II, lens platform, atomic force
Microscope I, probe I, to form input path, the laser beam is irradiated to the reflected light of sample surfaces generation successively through probe
I, atomic force microscope I, lens platform, convex lens II, beam splitter, to form reflected light path, the reflected light is inclined by beam splitter
The detector is gone to, the lens platform is the light transmission disk of ten centimetres of diameter and has central shaft, the atomic force microscope
I, lens mount, atomic force microscope II are located at below lens platform and can be relative to the fine positions of lens platform, when saturating
When dressing table is rotated around central shaft, can atomic force microscope I or lens mount or atomic force microscope II be placed in sample respectively
Surface, it is contact-type atomic force microscope probe to have through-hole, the probe I I in the probe I, and Hall plate is located at sample
On platform, sample is directly contact prepared in by magnetically controlled sputter method by Hall plate upper surface, the Hall plate is 80 microns a length of,
Width is 50 microns, thickness is 150 nanometers, and characteristic impedance is 50 ohm, and the sample is 10 microns a length of, width is 9 microns, thickness is
50 nanometers, the laser cable connection computer, the magnet, signal generator, computer cable connection successively is described to show
Wave device cable connection Hall plate, the detector, preamplifier, difference amplifier, analog-digital converter, computer cable successively
Connection, the compensator cable connection difference amplifier；Near x-axis pros on round platform bottom surface periphery by the probe I
To a bit, a wedge block is cut away in oblique axis side, and probe I bottom surface forms one with horizontal plane into the inclined-plane at five degree of angles,
Probe I is made, closer to sample surfaces, probe I to be enabled to be scanned in sample surfaces along positive direction of the x-axis in positive direction of the x-axis side
When do not easily cause needle point deformation, to avoid through-hole from damaging；The magnet passes through cable connection group by four identical sub- magnets
At four sub- magnets are located at the vertex for the square that a length of side is 20 centimetres, and the Hall plate and sample are located at described
The centre of square, sample stage, Hall plate and sample can integrally rotate in x/y plane, and rotating range is positive and negative 45 degree；Institute
State the through-hole of probe I a diameter of 500 nanometers.
Apparatus of the present invention obtain the magnetization information of nanoscale sample surfaces using high-precision positioning device, are used for magnetic
The probe of light Ke Er signal measurements has through-hole, and its lower face has five degree of angle with sample surfaces, is swept in sample surfaces
Through-hole damage caused by needle point deformation is avoided when retouching, the service life is longer.In addition, electronics of the apparatus of the present invention using low cost
Element extracts the information of sample surfaces small magnetization fluctuation instead of the lock-in amplifier in techniques of phase-sensitive detecting technique, saves into
This.
The step of being measured using a kind of surface nano-structure magnetic measuring device be：
One, relay lens platforms make object lens be located at right over sample, determine the rough position of sample, and adjust separately with this
Positions of the atomic force microscope I and atomic force microscope II relative to lens platform；
Two, relay lens platforms make atomic force microscope II be located at right over sample, using probe I I to being wrapped on Hall plate
Region with sample is scanned, and to obtain surface topography image, primarily determines sample position, when probe I I is located at sample edge
When, enable probe I I retract, and record each position parameter in atomic force microscope II；
Three, relay lens platforms make atomic force microscope I be located at right over sample, and each position recorded in step 2 is joined
Number input atomic force microscope I, enables probe I be scanned along positive direction of the x-axis one direction in two micron ranges, i.e., along probe I
(12) front end is scanned close to the side of sample surfaces, sweep speed 3nm/s, is come by the sample surface profiles that are obtained in scanning true
Random sample product marginal position；
The upward retraction distance 50nm of four, probe Is, and close the scanning feedback of atomic force microscope I；
Five, adjust mirror position so that laser beam is mapped to by lens platform and atomic force microscope I in probe I；
Six, lasers launch laser, wavelength 700nm；
Seven, signal generators output frequencies control the current signal of magnet for the sine wave of 1Hz, and magnet generates magnetic field and uses
In excitation sample；
The light beam that eight, are reflected from sample surfaces passes through probe I, atomic force microscope I, lens platform, convex lens II, divides successively
Enter detector after beam device, detector exports corresponding current signal to preamplifier；
Nine, enable probe I be scanned along positive direction of the x-axis one direction in two micron ranges, i.e., along probe I front end close to sample
The side on surface is scanned, and after positive direction of the x-axis scans one micron of distance, enables probe I retraction 50nm, and be moved to this direction x
Then scanning starting position moves 2nm in positive direction of the y-axis, and probe I is enabled to approach sample surfaces again, start the directions x next time
Scanning finally obtains in x/y plane sample profile image in 1 micron × 1 micron range；
Ten, preamplifiers use 30Hz cutoff frequency, gain 5dB, compensator with exported from preamplifier it is straight
Signal Matching is flowed, then, two signals exported respectively from compensator and preamplifier subtract each other in difference amplifier, and by
Computer is inputted after 200 times of amplification；
11, are using z-axis as rotary shaft, specimen rotating holder, while Hall plate and sample being driven to rotate together, rotate one every time
Degree is tested from -45 degree to+45 degree per degree of rotation, repeats above step seven to step 9；
Data in 12, computers analytical procedures ten, obtain the hysteresis loop of sample.
The beneficial effects of the invention are as follows：
The present invention can measure single nanostructure, and sub-micro can be reached by dynamically measuring the magnetization of sample surfaces
The spatial resolution of rice magnitude, the round platform bottom surface of probe I have five degree of angle with horizontal plane, enable to probe I in sample
Needle point deformation is not easily caused when product surface scan, to avoid through-hole from damaging, increases probe service life, not against phase-sensitive detection
Technology come extract sample surfaces small magnetization fluctuation information, save cost.
Description of the drawings
It is further illustrated with reference to the figure of the present invention：
Fig. 1 is schematic diagram of the present invention；
Fig. 2 is lens platform upward view；
Fig. 3 is sample stage and magnet vertical view.
In figure, 1. lasers, 2. delayers, 3. quarter wave plates, 4. concavees lens, 5. convex lens I, 6. plane mirrors, 7. polarizations
Piece, 8. beam splitters, 9. convex lens II, 10. lens platforms, 11. atomic force microscope I, 12. probe Is, 13. lens mounts, 14. object lens,
15. sample, 16. Hall plates, 17. sample stages, 18. signal generators, 19. oscillographs, 20. detectors, 21. magnets, 22. is preposition
Amplifier, 23. difference amplifiers, 24. compensators, 25. analog-digital converters, 26. computers, 27. atomic force microscope II, 28.
Probe I I.
Specific implementation mode
If Fig. 1 is schematic diagram of the present invention, the lower right corner has xyz three-dimensional marks, and xyz is rectangular coordinate system in space, xy is flat
Face is horizontal plane, and the laser beam that the laser 1 emits is successively through delayer 2, quarter wave plate 3, concavees lens 4, convex lens I 5, flat
Face mirror 6, polarizing film 7, beam splitter 8, convex lens II 9, lens platform 10, atomic force microscope I 11, probe I 12, to be formed
Input path, the laser beam are irradiated to the reflected light of 15 surface of sample generation successively through probe I 12, atomic force microscope I
11, lens platform 10, convex lens II9, beam splitter 8, to form reflected light path, the reflected light is deflected to described by beam splitter 8
Detector 20, it is contact-type atomic force microscope probe, the spy to have through-hole, the probe I I 28 in the probe I 12
Needle I 12 and atomic force microscope probe and shape that probe I I 28 is identical appearance size are round platform, the upper bottom of the round platform
Face is 2 microns a diameter of, a diameter of 1 micron of bottom surface, and the round platform axis is located at sample stage 17 perpendicular to horizontal plane, Hall plate 16
On, sample 15 is directly contact prepared in by 16 upper surface of Hall plate by magnetically controlled sputter method, the Hall plate (16) is a length of
80 microns, width be 50 microns, thickness is 150 nanometers, characteristic impedance is 50 ohm, and 15 a length of 10 microns of the sample, width are 9 micro-
Rice, thickness are 50 nanometers, 1 cable connection computer 26 of the laser, the magnet 21, signal generator 18, computer 26
Cable connection successively, 19 cable connection Hall plate 16 of the oscillograph, the detector 20, preamplifier 22, differential amplification
Device 23, analog-digital converter 25, computer 26 cable connection successively, 24 cable connection difference amplifier 23 of the compensator；By
On the round platform bottom surface periphery of the probe I 12 near positive direction of the x-axis a bit, a wedge block is cut away in oblique axis side, visit
12 bottom surfaces of needle I form one with horizontal plane into the inclined-plane at five degree of angles so that probe I 12 is closer in positive direction of the x-axis side
Sample surfaces enable to probe I 12 not easily cause needle point deformation when sample surfaces scan along positive direction of the x-axis, to avoid
Through-hole damages；A diameter of 500 nanometers of the through-hole of the probe I 12.
If Fig. 2 is lens platform upward view, the atomic force microscope II 27 is identical as 11 structures of atomic force microscope I,
The probe I 12 is located at 11 lower ends atomic force microscope I, and the probe I I28 is located at the lower ends atomic force microscope II27, institute
It states object lens 14 and is located at 13 lower end of lens mount, the lens platform 10 is the light transmission disk of ten centimetres of diameter and has central shaft, described
Atomic force microscope I 11, lens mount 13, atomic force microscope II 27 are located at lens platform 10 below and can be opposite
In the fine position of lens platform 10, when lens platform 10 is rotated around central shaft, can respectively by atomic force microscope I 11 or
Lens mount 13 or atomic force microscope II 27 are placed in right over sample 15.
If Fig. 3 is sample stage and magnet vertical view, the magnet 21 passes through cable connection group by four identical sub- magnets
At four sub- magnets are located at the vertex for the square that a length of side is 20 centimetres, and the Hall plate and sample are located at described
The centre of square, sample stage 17, Hall plate and sample can integrally rotate in x/y plane, and rotating range is positive and negative 45 degree.
A kind of surface nano-structure magnetic measuring device includes mainly laser 1, delayer 2, quarter wave plate 3, recessed
Mirror 4, plane mirror 6, polarizing film 7, beam splitter 8, convex lens II 9, lens platform 10, atomic force microscope I 11, is visited convex lens I 5
Needle I 12, lens mount 13, object lens 14, sample 15, Hall plate 16, sample stage 17, signal generator 18, oscillograph 19, detector
20, magnet 21, preamplifier 22, difference amplifier 23, compensator 24, analog-digital converter 25, computer 26, atomic force microscopy
Mirror II 27, probe I I 28, input path and reflected light path, xyz is rectangular coordinate system in space, x/y plane is horizontal plane, described
Atomic force microscope II 27 is identical as 11 structures of atomic force microscope I, and the probe I 12 is located at atomic force microscope I 11
Lower end, the probe I I 28 are located at 27 lower ends atomic force microscope II, and the object lens 14 are located at 13 lower end of lens mount, the spy
Needle I 12 and atomic force microscope probe and shape that probe I I28 is identical appearance size are round platform, the upper bottom of the round platform
Face is 2 microns a diameter of, a diameter of 1 micron of bottom surface, and perpendicular to horizontal plane, what the laser 1 emitted swashs the round platform axis
Light beam is successively through delayer 2, quarter wave plate 3, concavees lens 4, convex lens I 5, plane mirror 6, polarizing film 7, beam splitter 8, convex lens
II9, lens platform 10, atomic force microscope I 11, probe I 12, to form input path, the laser beam is irradiated to sample
The reflected light that 15 surfaces generate is successively through probe I 12, atomic force microscope I 11, lens platform 10, convex lens II 9, beam splitter
8, to form reflected light path, the reflected light deflects to the detector 20 by beam splitter 8, and the lens platform 10 is diameter ten
Centimetre light transmission disk and have central shaft, the atomic force microscope I 11, lens mount 13, atomic force microscope II 27 divide
Not Wei Yu lens platform 10 below and can be relative to the fine position of lens platform 10, when lens platform 10 is rotated around central shaft
When, atomic force microscope I 11 or lens mount 13 or atomic force microscope II 27 can be placed in right over sample 15 respectively, institute
Stating has through-hole in probe I 12, the probe I I 28 is contact-type atomic force microscope probe, and Hall plate 16 is located at sample stage
On 17, sample 15 is directly contact prepared in by 16 upper surface of Hall plate by magnetically controlled sputter method, the Hall plate 16 is a length of
80 microns, width be 50 microns, thickness is 150 nanometers, characteristic impedance is 50 ohm, and 15 a length of 10 microns of the sample, width are 9 micro-
Rice, thickness are 50 nanometers, 1 cable connection computer 26 of the laser, the magnet 21, signal generator 18, computer 26
Cable connection successively, 19 cable connection Hall plate 16 of the oscillograph, the detector 20, preamplifier 22, differential amplification
Device 23, analog-digital converter 25, computer 26 cable connection successively, 24 cable connection difference amplifier 23 of the compensator；By
On the round platform bottom surface periphery of the probe I 12 near positive direction of the x-axis a bit, a wedge block is cut away in oblique axis side, visit
12 bottom surfaces of needle I form one with horizontal plane into the inclined-plane at five degree of angles so that probe I 12 is closer in positive direction of the x-axis side
Sample surfaces enable to probe I 12 not easily cause needle point deformation when sample surfaces scan along positive direction of the x-axis, to avoid
Through-hole damages；The magnet 21 is made up of four identical sub- magnets cable connection, and four sub- magnets are located at one
The vertex for the square that the length of side is 20 centimetres, the Hall plate and sample are located at the centre of the square, sample stage 17, Hall
Piece and sample can integrally rotate in x/y plane, and rotating range is positive and negative 45 degree；The through-hole of the probe I 12 it is straight
Diameter is 500 nanometers.
Apparatus of the present invention obtain the magnetization information of nanoscale sample surfaces using high-precision positioning device, are used for magnetic
The probe of light Ke Er signal measurements has through-hole, and its lower face has five degree of angle with sample surfaces, is swept in sample surfaces
Through-hole damage caused by needle point deformation is avoided when retouching, the service life is longer.In addition, electronics of the apparatus of the present invention using low cost
Element extracts the information of sample surfaces small magnetization fluctuation instead of the lock-in amplifier in techniques of phase-sensitive detecting technique, saves into
This.
Claims (2)
1. a kind of surface nano-structure magnetic measuring device includes mainly laser, delayer, quarter wave plate, concavees lens, convex lens
Mirror I, plane mirror, polarizing film, beam splitter, convex lens II, lens platform, atomic force microscope I, probe I, lens mount, object lens, sample
Product, Hall plate, sample stage, signal generator, oscillograph, detector, magnet, preamplifier, difference amplifier, compensator,
Analog-digital converter, computer, atomic force microscope II, probe I I, input path and reflected light path, xyz are rectangular space coordinate
System, x/y plane are horizontal plane, and the atomic force microscope II is identical as atomic force microscope I structures, and the probe I is located at atom
The lower ends force microscope I, the probe I I are located at the lower ends atomic force microscope II, and the object lens are located at lens mount lower end, the spy
Needle I and probe I I is the atomic force microscope probe of identical appearance size, and the laser beam of the laser transmitting is successively through delay
Device, quarter wave plate, concavees lens, convex lens I, plane mirror, polarizing film, beam splitter, convex lens II, lens platform, atomic force microscope I,
Probe I, to form input path, the laser beam is irradiated to the reflected light of sample surfaces generation successively through probe I, atomic force
Microscope I, lens platform, convex lens II, beam splitter, to form reflected light path, the reflected light is deflected to described by beam splitter
Detector, the lens platform be ten centimetres of diameter light transmission disk and have central shaft, the atomic force microscope I, lens mount,
Atomic force microscope II is located at below lens platform and can be relative to the fine position of lens platform, when lens platform is around it
When central axis, atomic force microscope I or lens mount or atomic force microscope II can be placed in right over sample respectively, institute
Stating has through-hole in probe I, the probe I I is contact-type atomic force microscope probe, and the probe I, the shape of probe I I are
Round platform, the upper bottom surface of the round platform is 2 microns a diameter of, a diameter of 1 micron of bottom surface, the round platform axis perpendicular to horizontal plane,
Hall plate is located on sample stage, and sample is directly contact prepared in Hall plate upper surface by magnetically controlled sputter method, it is described suddenly
Your piece is 80 microns a length of, width is 50 microns, thickness is 150 nanometers, and characteristic impedance is 50 ohm, the sample is 10 microns a length of,
Width is 9 microns, thickness is 50 nanometers,
It is characterized in that：The laser cable connection computer, the magnet, signal generator, computer cable connection successively,
The oscillograph cable connection Hall plate, the detector, preamplifier, difference amplifier, analog-digital converter, computer according to
Secondary cable connection, the compensator cable connection difference amplifier；Near x on round platform bottom surface periphery by the probe I
Axis positive direction a bit, a wedge block is cut away in oblique axis side, and probe I bottom surface forms one with horizontal plane into five degree of angles
Inclined-plane so that probe I, closer to sample surfaces, enables to probe I along positive direction of the x-axis in sample table in positive direction of the x-axis side
Needle point deformation is not easily caused when Surface scan, to avoid through-hole from damaging；The magnet passes through cable by four identical sub- magnets
Connection composition, four sub- magnets are located at the vertex for the square that a length of side is 20 centimetres, the Hall plate and sample position
In the centre of the square, sample stage, Hall plate and sample can integrally rotate in x/y plane, and rotating range is positive and negative 45
Degree.
2. a kind of surface nano-structure magnetic measuring device according to claim 1, it is characterized in that：The institute of the probe I
State through-hole a diameter of 500 nanometers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810429089.1A CN108414952A (en) | 2018-04-24 | 2018-04-24 | A kind of surface nano-structure magnetic measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810429089.1A CN108414952A (en) | 2018-04-24 | 2018-04-24 | A kind of surface nano-structure magnetic measuring device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108414952A true CN108414952A (en) | 2018-08-17 |
Family
ID=63137978
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| Application Number | Title | Priority Date | Filing Date |
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| CN201810429089.1A Withdrawn CN108414952A (en) | 2018-04-24 | 2018-04-24 | A kind of surface nano-structure magnetic measuring device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110961171A (en) * | 2018-09-30 | 2020-04-07 | 中国科学院上海微系统与信息技术研究所 | Low-temperature sample support |
-
2018
- 2018-04-24 CN CN201810429089.1A patent/CN108414952A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110961171A (en) * | 2018-09-30 | 2020-04-07 | 中国科学院上海微系统与信息技术研究所 | Low-temperature sample support |
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Application publication date: 20180817 |